Gotowa bibliografia na temat „Photolithographie UV”
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Artykuły w czasopismach na temat "Photolithographie UV"
Ballandras, S., i D. Hauden. "Applications aux microtechniques de la photolithographie profonde par UV et par rayonnement synchrotron". Annales de Physique 19 (październik 1994): C1–73—C1–85. http://dx.doi.org/10.1051/anphys/1994022.
Pełny tekst źródłaCasalboni, M., L. Dominici, V. Foglietti, F. Michelotti, E. Orsini, C. Palazzesi, F. Stella i P. Prosposito. "Bragg Grating Optical Filters by UV Nanoimprinting". Journal of Nanomaterials 2012 (2012): 1–5. http://dx.doi.org/10.1155/2012/186429.
Pełny tekst źródłaGuijt, Rosanne M., i Michael C. Breadmore. "Maskless photolithography using UV LEDs". Lab on a Chip 8, nr 8 (2008): 1402. http://dx.doi.org/10.1039/b800465j.
Pełny tekst źródłaNoniewicz, Konrad, Zbigniew K. Brzozowski i Irmina Zadrozna. "UV-sensitive polyarylates as photolithographic emulsions". Journal of Applied Polymer Science 60, nr 7 (16.05.1996): 1071–82. http://dx.doi.org/10.1002/(sici)1097-4628(19960516)60:7<1071::aid-app19>3.0.co;2-3.
Pełny tekst źródłaMagklaras, Aris, Panayiotis Alefragis, Christos Gogos, Christos Valouxis i Alexios Birbas. "A Genetic Algorithm-Enhanced Sensor Marks Selection Algorithm for Wavefront Aberration Modeling in Extreme-UV (EUV) Photolithography". Information 14, nr 8 (28.07.2023): 428. http://dx.doi.org/10.3390/info14080428.
Pełny tekst źródłaGordillo, H., I. Suárez, R. Abargues, P. Rodríguez-Cantó, S. Albert i J. P. Martínez-Pastor. "Polymer/QDs Nanocomposites for Waveguiding Applications". Journal of Nanomaterials 2012 (2012): 1–9. http://dx.doi.org/10.1155/2012/960201.
Pełny tekst źródłaWu, Chun-Ying, Heng Hsieh i Yung-Chun Lee. "Contact Photolithography at Sub-Micrometer Scale Using a Soft Photomask". Micromachines 10, nr 8 (18.08.2019): 547. http://dx.doi.org/10.3390/mi10080547.
Pełny tekst źródłaCritchley, Kevin, Lixin Zhang, Hitoshi Fukushima, Masaya Ishida, Tatsuya Shimoda, Richard J. Bushby i Stephen D. Evans. "Soft-UV Photolithography using Self-Assembled Monolayers". Journal of Physical Chemistry B 110, nr 34 (sierpień 2006): 17167–74. http://dx.doi.org/10.1021/jp0630370.
Pełny tekst źródłaHoriuchi, S., T. Fujita, T. Hayakawa i Y. Nakao. "Micropatterning of Metal Nanoparticles via UV Photolithography". Advanced Materials 15, nr 17 (3.09.2003): 1449–52. http://dx.doi.org/10.1002/adma.200305270.
Pełny tekst źródłaZaki, M., Uda Hashim, Mohd Khairuddin Md Arshad, M. Nurfaiz, M. F. M. Fathil, A. H. Azman i R. M. Ayub. "Optimization on Conventional Photolithography Process of 0.98 μm Gap Design for Micro Gap Biosensor Application". Applied Mechanics and Materials 754-755 (kwiecień 2015): 524–29. http://dx.doi.org/10.4028/www.scientific.net/amm.754-755.524.
Pełny tekst źródłaRozprawy doktorskie na temat "Photolithographie UV"
Regagnon, Théo. "Modélisation in vitro du muscle sur membrane silicone microstructurée par photolithographie UV". Electronic Thesis or Diss., Université de Montpellier (2022-....), 2023. http://www.theses.fr/2023UMONS073.
Pełny tekst źródłaOur aim was to propose an in vitro model of differentiated and aligned human skeletal myotubes. To this end, we describe the micropatterning on a PDMS [poly(dimethylsiloxane)] substrate of EETMOS [2-(3,4 epoxycyclohexylethyltrimethoxysilane)] an organic-inorganic hybrid polymer to produce a network of parallel lines that can be stretchable to optimize differenciation.The EETMOS-based resin was synthesized by sol-gel process and polymerized using UV-photolithography. Human primary myoblasts were seeded onto the microstructurated substrate to be, after proliferation, stretched to differentiate into aligned myotubes.The effect of the spacing between the parallel lines and their height was assessed by immunofluorescence. After an optimization of the model, we ended up with 30µm large myotubes reached with a 75µm spacing and 8 µm high microstructures. Then we functionalized the silicone with the use of silylated peptide ligands derived from extracellular matrix adhesion proteins to avoid detachment of the myotubes from their support. A stretching protocol was then optimized (10% from L0, 1Hz, two cycles of 1h stretching / 2h rest / 1h stretching with 20h rest in between). An improvement in the expression of sarcomere proteins and myogenic regulatory factors (MyoG) was observed with stretching in relation to better differentiation of the myogenic progeniteur. The in vitro model that we propose would be a very useful tool to evaluate in a patient, from a microbiopsy, his muscular responses to mechanical stress
Stehlin, Fabrice. "Photolithographie UV-profond d'oxoclusters métalliques : Des processus photochimiques aux applications en nanofabrication". Phd thesis, Université de Haute Alsace - Mulhouse, 2013. http://tel.archives-ouvertes.fr/tel-01067489.
Pełny tekst źródłaStehlin, Fabrice. "Photolithographie UV-profond d’oxoclusters métalliques : Des processus photochimiques aux applications en nanofabrication". Thesis, Mulhouse, 2013. http://www.theses.fr/2013MULH8376/document.
Pełny tekst źródłaThe main purpose of this thesis is to provide a material precursor of metal oxides (ZrO2, TiO2, HfO2) compatible with DUV interference photolithography technique. Transition metal oxoclusters (MOC) obtained by complexation of an organic ligand and a partial hydrolysis have been proposed as building blocks. DUV irradiation (193 nm) allows a direct excitation of the MOC, which leads a photo-induced crosslinking and gives to the material a negative photoresist character. A detailed spectroscopic study allowed proposing a mechanism of photocrosslinking. This study relied primarily on in situ techniques to follow the photochemical reaction by spectroscopic ellipsometry and RT-FTIR. The nanostructuring was performed by interferometric DUV lithography at 193 nm and could be extended to 2-photon stereolithography. DUV-IL was chosen for its potential to write nanostructures on relatively large areas, in standard atmosphere and temperature conditions. Furthermore, in the case of TiOC, the nanostructures can be fully mineralised at room temperature by an additionnal photochemical treatment. For ZrOC and HfOC, an additional thermal annealing step allows to obtain a crystalline structure MO2
Liu, Xiyuan. "Design, analysis and fabrication of micro optical systems involving UV-deep lithography - with an application in atomic physics". [S.l. : s.n.], 2008. http://nbn-resolving.de/urn:nbn:de:bsz:180-madoc-21393.
Pełny tekst źródłaServera, Marc. "Etude d'un système de masquage pour microlithographie sensible en UV profond et développable par plasma d'oxygène". Montpellier 2, 1990. http://www.theses.fr/1990MON20092.
Pełny tekst źródłaYeh, Chun-Cheng. "ZnO micro- and nanostructures from Deep-UV photosensitive solutions for electronic and magnetic applications". Thesis, Mulhouse, 2017. http://www.theses.fr/2017MULH1359/document.
Pełny tekst źródłaIn this thesis, an in-depth investigation to the photosensitive zinc methacrylate (ZnMAA) precursor was made. Zinc methacrylate can be crosslinked under DUV (193 nm) irradiation. The photo-induced solidification is attributed to the partial decomposition of the ZnMAA complex, which gives rise to the following hydrolysis-condensation reactions and the formation of Zn-O-Zn networks. The bonding variation and decomposition of organic species caused by DUV irradiation were carefully investigated by FTIR, XPS and ellipsometry and discussed in Chapter III. DUV irradiation provokes clivage of MAA ligands from zinc cations. However, the intensity of MAA ligands can only be reduced to ~2/3 of its initial intensity regardless the extension of irradiation time, implying only a small amount oxide network can be induced by DUV irradiation. The small amount of Zn-O-Zn networks inside the photo-irradiated regions can effectively decrease the solubility of photo-irradiated regions in polar solvents, which makes ZnMAA precursor just like a negative tone resist and able to be patterned into two-dimensional structures by DUV lithography. Due to good photosensitivity to DUV light (193 nm), the dimension of DUV-patterned ZnMAA structures can be decreased to sub-micro by using binary masks and the effects of each pattering step including (i) DUV exposure, (ii) prebaking and (iii) development on the size and shape of DUV-patterned ZnMAA structures are discussed in Chapter IV. In order to fabricate nanoscale ZnMAA structures, a home-made DUV interference system was used to pattern ZnMAA precursor and 300 nm periodic lines were successfully made. Applications as TFT transistor, gaz sensor and magnetic materials are shown
Liu, Chao. "Optical modeling and resist metrology for deep-UV photolithography". Texas A&M University, 2005. http://hdl.handle.net/1969.1/4233.
Pełny tekst źródłaMcAdams, Christopher Lee. "Polymers and photoactive compounds for non-chemically amplified deep-UV photoresists /". Full text (PDF) from UMI/Dissertation Abstracts International, 2000. http://wwwlib.umi.com/cr/utexas/fullcit?p3004335.
Pełny tekst źródłaKAOU, LARBI NEILA. "Conception et realisation d'un dispositif en silicium permettant une connexion passive entre un circuit d'optique integree et un ruban de fibres optiques". Besançon, 1999. http://www.theses.fr/1999BESA2045.
Pełny tekst źródłaArbring, Theresia. "The impact of geometrical variations on the transport properties of organic electronic ion pumps". Thesis, Linköpings universitet, Fysik och elektroteknik, 2013. http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-94544.
Pełny tekst źródłaStreszczenia konferencji na temat "Photolithographie UV"
Harned, Noreen. "Deep-UV photolithography cluster performance". W SPIE's 1994 Symposium on Microlithography, redaktor Timothy A. Brunner. SPIE, 1994. http://dx.doi.org/10.1117/12.175487.
Pełny tekst źródłaBauer, Harry H., Matthias Heller i Norbert Kaiser. "Optical coatings for UV photolithography systems". W Optical Instrumentation & Systems Design. SPIE, 1996. http://dx.doi.org/10.1117/12.246823.
Pełny tekst źródłaDunn, Diana D., Katherine C. Norris i Linda K. Somerville. "0.5-um deep-UV photolithography manufacturing". W SPIE's 1994 Symposium on Microlithography, redaktor Timothy A. Brunner. SPIE, 1994. http://dx.doi.org/10.1117/12.175464.
Pełny tekst źródłaRuff, Bruce, Elizabeth Tai i Robert Brown. "Broadband Deep-UV High NA Photolithography System". W 1989 Microlithography Conferences, redaktor Burn J. Lin. SPIE, 1989. http://dx.doi.org/10.1117/12.953173.
Pełny tekst źródłaDunn, Diana D., James A. Bruce i Michael S. Hibbs. "Deep-UV photolithography linewidth variation from reflective substrates". W Optical/Laser Microlithography IV, redaktor Victor Pol. SPIE, 1991. http://dx.doi.org/10.1117/12.44770.
Pełny tekst źródłaYapici, Murat Kaya, i Ilyas Farhat. "UV-LED exposure system for low-cost photolithography". W SPIE Advanced Lithography, redaktorzy Kafai Lai i Andreas Erdmann. SPIE, 2014. http://dx.doi.org/10.1117/12.2046123.
Pełny tekst źródłaMontemezzani, G., St Pfändler i P. Günter. "Photorefractive properties of Bi4Ge3O12 crystals in the ultraviolet spectral range". W Photorefractive Materials, Effects, and Devices II. Washington, D.C.: Optica Publishing Group, 1991. http://dx.doi.org/10.1364/pmed.1991.ma5.
Pełny tekst źródłaDu, Liqun, Shenmiao Zhu, Jiang Qin i Chong Liu. "Numerical and experimental study on SU-8 UV photolithography". W 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, redaktorzy Li Yang, Yaolong Chen, Ernst-Bernhard Kley i Rongbin Li. SPIE, 2007. http://dx.doi.org/10.1117/12.783364.
Pełny tekst źródłaK M, Dhivakar, i Anshu Sarje. "A Versatile, Low-Cost UV Exposure System for Photolithography". W 2021 Smart Technologies, Communication and Robotics (STCR). IEEE, 2021. http://dx.doi.org/10.1109/stcr51658.2021.9588848.
Pełny tekst źródłaZhang, Lidan, Shengyuan Chang, Xi Chen, Yimin Ding, Md Tarek Rahman, Yao, Duan, Pavel Terekhov i Xingjie Ni. "Wafer-scale single-aperture near-infrared metalens fabricated by deep UV photolithography". W CLEO: QELS_Fundamental Science. Washington, D.C.: Optica Publishing Group, 2022. http://dx.doi.org/10.1364/cleo_qels.2022.ff2d.4.
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