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Artykuły w czasopismach na temat "OPTOELECTRONIC DEVICE APPLICATIONS"
Sang, Xianhe, Yongfu Wang, Qinglin Wang, Liangrui Zou, Shunhao Ge, Yu Yao, Xueting Wang, Jianchao Fan i Dandan Sang. "A Review on Optoelectronical Properties of Non-Metal Oxide/Diamond-Based p-n Heterojunction". Molecules 28, nr 3 (30.01.2023): 1334. http://dx.doi.org/10.3390/molecules28031334.
Pełny tekst źródłaGao, Q., H. J. Joyce, S. Paiman, J. H. Kang, H. H. Tan, Y. Kim, L. M. Smith i in. "Nanowires for optoelectronic device applications". physica status solidi (c) 6, nr 12 (grudzień 2009): 2678–82. http://dx.doi.org/10.1002/pssc.200982528.
Pełny tekst źródłaHeutz, Sandrine, Paul Sullivan, Brett M. Sanderson, Stephan M. Schultes i Tim S. Jones. "Molecular Thin Films for Optoelectronic Applications". Solid State Phenomena 121-123 (marzec 2007): 373–76. http://dx.doi.org/10.4028/www.scientific.net/ssp.121-123.373.
Pełny tekst źródłaLi, Ziwei, Boyi Xu, Delang Liang i Anlian Pan. "Polarization-Dependent Optical Properties and Optoelectronic Devices of 2D Materials". Research 2020 (29.08.2020): 1–35. http://dx.doi.org/10.34133/2020/5464258.
Pełny tekst źródłaJeon, Jaeho, Yajie Yang, Haeju Choi, Jin-Hong Park, Byoung Hun Lee i Sungjoo Lee. "MXenes for future nanophotonic device applications". Nanophotonics 9, nr 7 (13.05.2020): 1831–53. http://dx.doi.org/10.1515/nanoph-2020-0060.
Pełny tekst źródłaXu, Wangqiong, Ying Lu, Weibin Lei, Fengrui Sui, Ruru Ma, Ruijuan Qi i Rong Huang. "FIB-Assisted Fabrication of Single Tellurium Nanotube Based High Performance Photodetector". Micromachines 13, nr 1 (22.12.2021): 11. http://dx.doi.org/10.3390/mi13010011.
Pełny tekst źródłaJamal-Eddine, Zane, Yuewei Zhang i Siddharth Rajan. "Recent Progress in III-Nitride Tunnel Junction-Based Optoelectronics". International Journal of High Speed Electronics and Systems 28, nr 01n02 (marzec 2019): 1940012. http://dx.doi.org/10.1142/s0129156419400123.
Pełny tekst źródłaVazhdaev, Konstantin, Marat Urakseev, Azamat Allaberdin i Kostantin Subkhankulov. "OPTOELECTRONIC DEVICES BASED ON DIFFRACTION GRATINGS FROM STANDING ELASTIC WAVES". Electrical and data processing facilities and systems 18, nr 3-4 (2022): 151–58. http://dx.doi.org/10.17122/1999-5458-2022-18-3-4-151-158.
Pełny tekst źródłaHeydari Gharahcheshmeh, Meysam, i Karen K. Gleason. "Recent Progress in Conjugated Conducting and Semiconducting Polymers for Energy Devices". Energies 15, nr 10 (17.05.2022): 3661. http://dx.doi.org/10.3390/en15103661.
Pełny tekst źródłaXu, Heng Rui, i Ping Liu. "Patterning Method for Nanowire Transparent Conductive Films". Materials Science Forum 1036 (29.06.2021): 66–76. http://dx.doi.org/10.4028/www.scientific.net/msf.1036.66.
Pełny tekst źródłaRozprawy doktorskie na temat "OPTOELECTRONIC DEVICE APPLICATIONS"
Guptah, Vinod Kumar. "Growth on patterned substrates for optoelectronic device applications". Thesis, University College London (University of London), 1998. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.267027.
Pełny tekst źródłaAlexandropoulos, Dimitrios. "Theoretical studies of GaInNAs for optoelectronic device applications". Thesis, University of Essex, 2003. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.274313.
Pełny tekst źródłaPratt, Andrew Richard. "Control of indium migration on patterned substrates for optoelectronic device applications". Thesis, Imperial College London, 1995. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.307775.
Pełny tekst źródłaGrudowski, Paul A. "The metalorganic chemical vapor deposition of III-V nitrides for optoelectronic device applications /". Digital version accessible at:, 1998. http://wwwlib.umi.com/cr/utexas/main.
Pełny tekst źródłaXin, Huoping. "Gas-source molecular beam epitaxy of GaInNAs and Ga(In)NP for electronic and optoelectronic device applications /". Diss., Connect to a 24 p. preview or request complete full text in PDF format. Access restricted to UC campuses, 2000. http://wwwlib.umi.com/cr/ucsd/fullcit?p9970681.
Pełny tekst źródłaKim, Danny. "Dry passivation studies of GaAs(110) surfaces by Gallium Oxide thin films deposited by electron cyclotron resonance plasma reactive molecular beam epitaxy for optoelectronic device applications". Thesis, National Library of Canada = Bibliothèque nationale du Canada, 2001. http://www.collectionscanada.ca/obj/s4/f2/dsk3/ftp05/MQ63140.pdf.
Pełny tekst źródłaCheung, Chor-keung. "The construction of a focused low energy positron beam facility and its application in the study of various optoelectronic materials". View the Table of Contents & Abstract, 2006. http://sunzi.lib.hku.hk/hkuto/record/B36995770.
Pełny tekst źródłaCheung, Chor-keung, i 張初強. "The construction of a focused low energy positron beam facility and its application in the study of various optoelectronic materials". Thesis, The University of Hong Kong (Pokfulam, Hong Kong), 2006. http://hub.hku.hk/bib/B37434925.
Pełny tekst źródłaLi, Cheng. "Metal oxide films for optoelectronic device application". Thesis, University of Cambridge, 2014. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.648598.
Pełny tekst źródłaDavis, Nathaniel J. L. K. "Applications of spectral management in optoelectronic devices". Thesis, University of Cambridge, 2017. https://www.repository.cam.ac.uk/handle/1810/263670.
Pełny tekst źródłaKsiążki na temat "OPTOELECTRONIC DEVICE APPLICATIONS"
M, Razeghi, Society of Photo-optical Instrumentation Engineers., Europtica Services I. C, American Physical Society i International Conference on Physical Concepts of Materials for Novel Optoelectronic Device Applications (1990 : Aachen, Germany), red. Physical concepts of materials for novel optoelectronic device applications II: Device physics and applications : 28 October-2 November 1990, Aachen, Federal Republic of Germany. Bellingham, Wash., USA: SPIE, 1991.
Znajdź pełny tekst źródłaLitton, Cole W., Donald C. Reynolds i Thomas C. Collins, red. Zinc Oxide Materials for Electronic and Optoelectronic Device Applications. Chichester, UK: John Wiley & Sons, Ltd, 2011. http://dx.doi.org/10.1002/9781119991038.
Pełny tekst źródłaLitton, Cole W. Zinc oxide materials for electronic and optoelectronic device applications. Chichester: Wiley, 2011.
Znajdź pełny tekst źródłaFabio, Beltram, Gornik E, European Optical Society, International Centre for Science and High Technology. i Society of Photo-optical Instrumentation Engineers., red. Physical concepts and materials for novel optoelectronic device applications II: International symposium, 24-27 May 1993, Trieste, Italy. Bellingham, Wash., USA: SPIE, 1993.
Znajdź pełny tekst źródłaM, Razeghi, Society of Photo-optical Instrumentation Engineers., Europtica Services I. C i American Physical Society, red. Physical concepts of materials for novel optoelectronic device applications I: Materials growth and characterization : 28 October-2 November 1990, Aachen, Federal Republic of Germany. Bellingham, Wash., USA: SPIE, 1991.
Znajdź pełny tekst źródła1948-, Chen David, red. Semiconductor optoelectronic device manufacturing and applications: 7-9 November 2001, Nanjing, China. Bellingham, Wash., USA: SPIE, 2001.
Znajdź pełny tekst źródłaAndreas, Ostendorf, Society of Photo-optical Instrumentation Engineers i European Optical Society, red. Laser micromachining for optoelectronic device fabrication: 30 October 2002, Brugge, Belgium. Bellingham, Washington: SPIE, 2003.
Znajdź pełny tekst źródłaSymposium, L. on III-V. Nitrides Semiconductors and Ceramics (1997 Strasbourg France). III-V nitrides, semiconductors, and ceramics: From material growth to device applications : proceedings of Symposium L on III-V Nitrides, Semiconductors, and Ceramics : from material growth to device applications of the 1997 ICAM/E-MRS Spring Conference, Strasbourg, France, June 16-20, 1997. Amsterdam: Elsevier, 1997.
Znajdź pełny tekst źródłaSun, I.-Chung Miles. Photoluminescence and optical anisotropy of GaAs/AlGaAs quantum dots for optoelectronic device applications. Ottawa: National Library of Canada, 2002.
Znajdź pełny tekst źródłaApplied optics fundamentals and device applications: Nano, MOEMS, and biotechnology. Boca Raton, FL: Taylor & Francis, 2011.
Znajdź pełny tekst źródłaCzęści książek na temat "OPTOELECTRONIC DEVICE APPLICATIONS"
Springholz, G., i G. Bauer. "9.8 Optoelectronic device applications". W Growth and Structuring, 538–40. Berlin, Heidelberg: Springer Berlin Heidelberg, 2013. http://dx.doi.org/10.1007/978-3-540-68357-5_103.
Pełny tekst źródłaLi, Chaoyang, Xin Li i Dapeng Wang. "Fabrication of ZnO Thin Film and Nanostructures for Optoelectronic Device Applications". W Oxide Thin Films, Multilayers, and Nanocomposites, 239–71. Cham: Springer International Publishing, 2015. http://dx.doi.org/10.1007/978-3-319-14478-8_12.
Pełny tekst źródłaCollins, T. C., i R. J. Hauenstein. "Fundamental Properties of ZnO". W Zinc Oxide Materials for Electronic and Optoelectronic Device Applications, 1–28. Chichester, UK: John Wiley & Sons, Ltd, 2011. http://dx.doi.org/10.1002/9781119991038.ch1.
Pełny tekst źródłaBagnall, D. M. "Room Temperature Stimulated Emission and ZnO-Based Lasers". W Zinc Oxide Materials for Electronic and Optoelectronic Device Applications, 265–84. Chichester, UK: John Wiley & Sons, Ltd, 2011. http://dx.doi.org/10.1002/9781119991038.ch10.
Pełny tekst źródłaZhong, Jian, i Yicheng Lu. "ZnO-Based Ultraviolet Detectors". W Zinc Oxide Materials for Electronic and Optoelectronic Device Applications, 285–329. Chichester, UK: John Wiley & Sons, Ltd, 2011. http://dx.doi.org/10.1002/9781119991038.ch11.
Pełny tekst źródłaMakino, Takayuki, Yusaburo Segawa, Masashi Kawasaki i Hideomi Koinuma. "Room-Temperature Stimulated Emission from ZnO Multiple Quantum Wells Grown on Lattice-Matched Substrates". W Zinc Oxide Materials for Electronic and Optoelectronic Device Applications, 331–49. Chichester, UK: John Wiley & Sons, Ltd, 2011. http://dx.doi.org/10.1002/9781119991038.ch12.
Pełny tekst źródłaReynolds, D. C., C. W. Litton i T. C. Collins. "Optical Properties of ZnO". W Zinc Oxide Materials for Electronic and Optoelectronic Device Applications, 29–60. Chichester, UK: John Wiley & Sons, Ltd, 2011. http://dx.doi.org/10.1002/9781119991038.ch2.
Pełny tekst źródłaClaflin, B., i D. C. Look. "Electrical Transport Properties in Zinc Oxide". W Zinc Oxide Materials for Electronic and Optoelectronic Device Applications, 61–86. Chichester, UK: John Wiley & Sons, Ltd, 2011. http://dx.doi.org/10.1002/9781119991038.ch3.
Pełny tekst źródłaBrillson, Leonard J. "ZnO Surface Properties and Schottky Contacts". W Zinc Oxide Materials for Electronic and Optoelectronic Device Applications, 87–112. Chichester, UK: John Wiley & Sons, Ltd, 2011. http://dx.doi.org/10.1002/9781119991038.ch4.
Pełny tekst źródłaJanotti, Anderson, i Chris G. Van de Walle. "Native Point Defects and Doping in ZnO". W Zinc Oxide Materials for Electronic and Optoelectronic Device Applications, 113–34. Chichester, UK: John Wiley & Sons, Ltd, 2011. http://dx.doi.org/10.1002/9781119991038.ch5.
Pełny tekst źródłaStreszczenia konferencji na temat "OPTOELECTRONIC DEVICE APPLICATIONS"
Tidrow, Meimei Z., William A. Beck, William W. Clark III, Herbert K. Pollehn, John W. Little, Nibir K. Dhar, Richard P. Leavitt i in. "Device physics and focal plane array applications of QWIP and MCT". W Optoelectronics '99 - Integrated Optoelectronic Devices, redaktorzy Gail J. Brown i Manijeh Razeghi. SPIE, 1999. http://dx.doi.org/10.1117/12.344591.
Pełny tekst źródłaDohler, Gottfried H. "Optoelectronic Device Applications Of Doping Superlattices". W 1987 Symposium on the Technologies for Optoelectronics, redaktor Alfred R. Adams. SPIE, 1988. http://dx.doi.org/10.1117/12.943403.
Pełny tekst źródłaYu, Jae Su, Jung Woo Leem, Yeong Hwan Ko i Hee Kwan Lee. "Semiconductor nanostructures towards optoelectronic device applications". W SPIE OPTO, redaktorzy Manijeh Razeghi, Eric Tournie i Gail J. Brown. SPIE, 2012. http://dx.doi.org/10.1117/12.907968.
Pełny tekst źródłaJen, Alex K. Y., Hong Ma, Xiaoming Wu, Jianyao Wu, Sen Liu, Seth R. Marder, Larry R. Dalton i Ching-Fong Shu. "Recent development of highly efficient chromophores and polymers for electro-optic device applications". W Optoelectronics '99 - Integrated Optoelectronic Devices, redaktor Bernard Kippelen. SPIE, 1999. http://dx.doi.org/10.1117/12.348388.
Pełny tekst źródłaBawendi, Moungi. "Nanocrystals for thin film optoelectronic device applications". W LEOS 2008 - 21st Annual Meeting of the IEEE Lasers and Electro-Optics Society (LEOS 2008). IEEE, 2008. http://dx.doi.org/10.1109/leos.2008.4688712.
Pełny tekst źródłaBrongersma, Mark L. "Optoelectronic device applications of metafilms (Conference Presentation)". W Metamaterials, Metadevices, and Metasystems 2017, redaktorzy Nader Engheta, Mikhail A. Noginov i Nikolay I. Zheludev. SPIE, 2017. http://dx.doi.org/10.1117/12.2276207.
Pełny tekst źródłaGao, Q., H. Joyce, S. Paiman, J. H. Kang, H. H. Tan, H. E. Jackson, L. M. Smith, J. M. Yarrison-Rice, Jin Zou i C. Jagadish. "Compound semiconductor nanowires for optoelectronic device applications". W 2011 ICO International Conference on Information Photonics (IP). IEEE, 2011. http://dx.doi.org/10.1109/ico-ip.2011.5953760.
Pełny tekst źródłaYAMAGUCHI, K. "Optoelectronic integrated circuit device technology and applications". W Optical Fiber Communication Conference. Washington, D.C.: OSA, 1988. http://dx.doi.org/10.1364/ofc.1988.wf1.
Pełny tekst źródłaFischer, I. A., F. Oliveira, A. Benedetti, S. Chiussi i J. Schulze. "(Si)GeSn nanostructures for optoelectronic device applications". W 2016 39th International Convention on Information and Communication Technology, Electronics and Microelectronics (MIPRO). IEEE, 2016. http://dx.doi.org/10.1109/mipro.2016.7522099.
Pełny tekst źródłaGan, Yi, Jun Zhang, Shan Jiang, Xiaodong Huang, Ning Zhou i Ligang Deng. "Applications of ICP in optoelectronic device fabrication". W Asia-Pacific Optical Communications, redaktorzy Chung-En Zah, Yi Luo i Shinji Tsuji. SPIE, 2005. http://dx.doi.org/10.1117/12.575729.
Pełny tekst źródłaRaporty organizacyjne na temat "OPTOELECTRONIC DEVICE APPLICATIONS"
Spahn, Olga B., Andrew A. Allerman, Kent D. Choquette, Gregory A. Vawter, John F. Klem, Charles T. Sullivan, John P. Sullivan i in. Selective Oxidation Technology and its Applications Toward Electronic and Optoelectronic Devices. Office of Scientific and Technical Information (OSTI), lipiec 1999. http://dx.doi.org/10.2172/9462.
Pełny tekst źródłaBACA, ALBERT G., RONALD D. BRIGGS, ANDREW A. ALLERMAN, CHRISTINE C. MITCHELL, ARTHUR J. FISCHER, CAROL I. ASHBY, ALAN F. WRIGHT i RANDY J. SHUL. High Al-Content AlInGaN Devices for Next Generation Electronic and Optoelectronic Applications. Office of Scientific and Technical Information (OSTI), grudzień 2001. http://dx.doi.org/10.2172/789599.
Pełny tekst źródłaOsgood, Richard M., i Jr. Selective Processing Techniques for Electronic and Optoelectronic Applications: Quantum-Well Devices and Integrated Optic Circuits. Fort Belvoir, VA: Defense Technical Information Center, wrzesień 1999. http://dx.doi.org/10.21236/ada369792.
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