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Artykuły w czasopismach na temat "O2 plasma treated polyimide"
Suzuki, Takeharu, Philip Tanner i David V. Thiel. "O2 plasma treated polyimide-based humidity sensors". Analyst 127, nr 10 (27.08.2002): 1342–46. http://dx.doi.org/10.1039/b205085d.
Pełny tekst źródłaIWAMORI, Satoru, Shigeki NAKAHARA, Noriyuki YANAGAWA i Mitsuru SADAMOTO. "Dry Etching of Polyimide Film with NF3-O2 Plasma." SHINKU 43, nr 1 (2000): 48–53. http://dx.doi.org/10.3131/jvsj.43.48.
Pełny tekst źródłaLamontagne, B., O. M. Küttel i M. R. Wertheimer. "Etching of polymers in microwave/radio-frequency O2–CF4 plasma". Canadian Journal of Physics 69, nr 3-4 (1.03.1991): 202–6. http://dx.doi.org/10.1139/p91-033.
Pełny tekst źródłaEgitto, F. D. "Plasma etching of organic materials. I. Polyimide in O2–CF4". Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 3, nr 3 (maj 1985): 893. http://dx.doi.org/10.1116/1.583078.
Pełny tekst źródłaGawdzik, Barbara, i Magdalena Sobiesiak. "Chemical composition of plasma treated polyimide microspheres". Applied Surface Science 214, nr 1-4 (maj 2003): 52–57. http://dx.doi.org/10.1016/s0169-4332(03)00353-2.
Pełny tekst źródłaLin, Fangbing, Wei Li, Yusi Tang, Huiqi Shao, Chuanli Su, Jinhua Jiang i Nanliang Chen. "High-Performance Polyimide Filaments and Composites Improved by O2 Plasma Treatment". Polymers 10, nr 7 (22.06.2018): 695. http://dx.doi.org/10.3390/polym10070695.
Pełny tekst źródłaWu, Shien‐Yang, Denice D. Denton i Ressano De Souza‐Machado. "Dielectric behavior of O2/CF4 plasma etched polyimide exposed to humid environments". Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 11, nr 2 (marzec 1993): 291–300. http://dx.doi.org/10.1116/1.578728.
Pełny tekst źródłaChen, Chih-Cheng, Fang-Hsing Wang, Sheng-Cheng Chang i Cheng-Fu Yang. "Using Oxygen Plasma Pretreatment to Enhance the Properties of F-Doped ZnO Films Prepared on Polyimide Substrates". Materials 11, nr 9 (22.08.2018): 1501. http://dx.doi.org/10.3390/ma11091501.
Pełny tekst źródłaMomose, Y., T. Ohaku, H. Chuma, S. Okazaki, T. Saruta, M. Masui i M. Takeuchi. "Electrical properties of O2 plasma treated solid surfaces". Journal of Applied Polymer Science 46 (1990): 153–72. http://dx.doi.org/10.1002/app.1990.070460009.
Pełny tekst źródłaLee, Su Bin, i Yoon-Kee Kim. "Adhesion Improvement of Polyimide/Metal Interface by He/O2 /NF3 Atmospheric Pressure Plasma". Plasma Processes and Polymers 6, S1 (czerwiec 2009): S525—S529. http://dx.doi.org/10.1002/ppap.200931111.
Pełny tekst źródłaRozprawy doktorskie na temat "O2 plasma treated polyimide"
Suzuki, Takeharu, i n/a. "Integrated, Intelligent Sensor Fabrication Strategies for Environmental Monitoring". Griffith University. School of Microelectronic Engineering, 2004. http://www4.gu.edu.au:8080/adt-root/public/adt-QGU20040813.131206.
Pełny tekst źródłaSuzuki, Takeharu. "Integrated, Intelligent Sensor Fabrication Strategies for Environmental Monitoring". Thesis, Griffith University, 2004. http://hdl.handle.net/10072/367295.
Pełny tekst źródłaThesis (PhD Doctorate)
Doctor of Philosophy (PhD)
School of Microelectronic Engineering
Full Text
Ma, Jong-Bong. "Adhesion of sputtered copper to plasma-treated polyimide substances /". Online version of thesis, 1991. http://hdl.handle.net/1850/11023.
Pełny tekst źródłaLiu, Chia-Chun, i 劉佳浚. "Atmospheric-pressure plasma treated polyimide films for liquid crystal devices". Thesis, 2018. http://ndltd.ncl.edu.tw/handle/qbav26.
Pełny tekst źródła國立交通大學
照明與能源光電研究所
107
In this study, we investigate the characteristics of polyimide (PI) films treated by atmospheric-pressure (AP) plasma for liquid crystal devices (LCDs). By changing the irradiation time of AP plasma, the LCs can be effectively oriented on the PI films and the pretilt angle can be controlled. In order to find out how the AP plasma cause the orientation of the liquid crystal, we use atomic force microscope (AFM) and X-ray photoelectron spectroscopy (XPS) to analyze the morphology and chemical features of AP plasma treated PI films, respectively. From AFM results, we do not observe anisotropic topography changes of PI films after AP plasma treatment. The XPS results show that the change of C 1s components before and after plasma irradiation are possibly the main reason of liquid crystal orientation in azimuthal plane.
Tsai, Han-Chang, i 蔡瀚章. "Study on shear strength of the PC injection molding adhesion on the O2 plasma treated surface PPS". Thesis, 2015. http://ndltd.ncl.edu.tw/handle/hvab9d.
Pełny tekst źródła國立高雄應用科技大學
化學工程與材料工程系碩士在職專班
103
The experiment illustrates the melted PC(Polycarbonate) through injection machine is successfully jointed with PPS(Polyphenylene sulfide). The PPS needs to be sandblasted and treated with O2 Plasma, and preheated to the constant temperature. The joint strength of PC and PPS could achieve above 500kg which is the best strength of joint, measured by homemade shear strength tester. The experiment also proves advantage of PPS surface treatment: 1. sandblasting can remove impurities on surface. 2. O2 plasma treating on surface can increase surface roughness, cleaning and modification of functional group on polymeric substrates. The experiment improves traditional epoxy bonding of Retaining Ring that usually takes longer time. It can save time and cost of processing without considering the quality of epoxy glue. The joint strength 500kg of this experiment is greater than that of traditional epoxy bonding 350~400kg.
Huang, Meng Chiou, i 黃孟秋. "Study on the mechanism of controlling the pretilt angle of liquid crystals on the plasma-treated polyimide film surface and the magnetic nanoparticles". Thesis, 2008. http://ndltd.ncl.edu.tw/handle/4b6zk9.
Pełny tekst źródła國立交通大學
電子物理系所
96
The widely-used mechanical rubbing method in the liquid crystal display industries has some drawbacks such as leaving the dust, static charges, and scratches on the treated surfaces. Besides, it is also difficult to satisfy the demands for multi-domain pattern and high pretilt angle. To overcome these limitations, a non-contact surface treatment on the polyimide film by using a diode type plasma system has been studied. A capability of inducing high pretilt angle is found in this work. The influences of treating time and plasma energy on the alignment effect are discussed. A significant amount of maghemite nanoparticles are deposited on the polyimide surfaces treated by the plasma beam at the same time. To find out the mechanism of surface alignment with high pretilt angle, the relation between the surface roughness and the size of coated nanoparticles has been characterized by using scanning electron microscope (SEM) and atomic force microscope (AFM). Further investigations on the change of chemical bonds on the treated surfaces have also been carried out by using x-ray photoelectron spectroscopy (XPS).
Streszczenia konferencji na temat "O2 plasma treated polyimide"
Xiaoliang, Tang, Qiu Gao, Chen Xiaoli i Ren Zhongfu. "Dyeing Behavior of Atmospheric Dielectric Barrier Discharge Ar-O2 Plasma Treated Poly(ethylene terephthalate) Fabric". W 2007 IEEE Pulsed Power Plasma Science Conference. IEEE, 2007. http://dx.doi.org/10.1109/ppps.2007.4346135.
Pełny tekst źródłaZhang, Letao, Xiaoliang Zhou, Hongyang Zuo, Hongyu He, Mengda Xu i Kunpeng He. "Post-Oven Induced Surface Hydrophobicity Degradation of CF4 Plasma Treated Polyimide Photo Resistance". W 2021 IEEE 4th International Conference on Electronics Technology (ICET). IEEE, 2021. http://dx.doi.org/10.1109/icet51757.2021.9450974.
Pełny tekst źródłaChou, Shang-Chih, Yao-Yi Cheng, Pi-Sheng Ku i Hung-Han Ko. "Study on NH3 plasma-treated polyimide/MWNT composites on electrical and surface properties". W 2011 IEEE 4th International Nanoelectronics Conference (INEC). IEEE, 2011. http://dx.doi.org/10.1109/inec.2011.5991705.
Pełny tekst źródłaLu, Q., Y. Liu, G. Han, C. Fang, Y. Shao, J. Zhang i Y. Hao. "Experimental Investigation of the Contact Resistance of Graphene/MoS2 Interface Treated with O2 Plasma". W 2017 International Conference on Solid State Devices and Materials. The Japan Society of Applied Physics, 2017. http://dx.doi.org/10.7567/ssdm.2017.ps-13-20.
Pełny tekst źródłaKim, Donginn, Hyeong-Sang Lee, Kwang Min Chun, Jung-Ho Hwang, Kyo Seung Lee i Bae-Hyeock Chun. "Comparison of Soot Oxidation by NO2 Only and Plasma-Treated Gas Containing NO2, O2, and Hydrocarbons". W SAE Powertrain & Fluid Systems Conference & Exhibition. 400 Commonwealth Drive, Warrendale, PA, United States: SAE International, 2002. http://dx.doi.org/10.4271/2002-01-2704.
Pełny tekst źródłaMa, Shenglin, Ying Li, Xin Sun, Xiaomei Yu i Yufeng Jin. "Study of polyimide as sacrificial layer with O2 plasma releasing for its application in MEMS capacitive FPA fabrication". W High Density Packaging (ICEPT-HDP). IEEE, 2009. http://dx.doi.org/10.1109/icept.2009.5270696.
Pełny tekst źródłaYoo, Ha Jin, Chang Gil Son, Eun Ha Choi, Guangsup Cho, Gi Chung Kwon, Won Tea Cho i Sang Gi Park. "Influence of O2 plasma treatment on H2 post-treated BZO thin films for TCO of a-Si solar cell". W 2010 IEEE 37th International Conference on Plasma Sciences (ICOPS). IEEE, 2010. http://dx.doi.org/10.1109/plasma.2010.5534131.
Pełny tekst źródłaKADOCHNIKOV, I. N., i I. V. ARSENTIEV. "STATE-TO-STATE MODEL FOR HYDROGENAIR COMBUSTION". W 9th International Symposium on Nonequilibrium Processes, Plasma, Combustion, and Atmospheric Phenomena. TORUS PRESS, 2020. http://dx.doi.org/10.30826/nepcap9b-04.
Pełny tekst źródłaLu, Dong, Vanissa Lim, B. Ramana Murthy, Rakesh Kumar, Du An Yan, Alastair D. Trigg i Ping Yang. "Study of Porous Organic Ultra Low K Materials After Treatment With Various Etching and Cleaning Plasma". W ISTFA 2004. ASM International, 2004. http://dx.doi.org/10.31399/asm.cp.istfa2004p0423.
Pełny tekst źródłaHan, Jeahyeong, Daniel Joe, Rich I. Masel i Mark A. Shannon. "AFM Verification of CFn Surface Treatment Effect and Its Correlation to Stiction Reduction in Microvalves". W ASME 2008 International Design Engineering Technical Conferences and Computers and Information in Engineering Conference. ASMEDC, 2008. http://dx.doi.org/10.1115/detc2008-49842.
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