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Jamal, Deen M., Electrochemical Society. Dielectric Science and Technology Division., Electrochemical Society Electronics Division i Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (4th : 1997 : Montreal, Quebec), red. Silicon nitride and silicon dioxide thin insulating films: Proceedings of the Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films. Pennington, New Jersey: Electrochemical Society, 1997.
Znajdź pełny tekst źródłaSymposium on Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Emerging Dielectrics (9th 2007 Chicago, Ill.). Silicon nitride, silicon dioxide, and emerging dielectrics 9. Redaktorzy Sah R. E, Electrochemical Society. Dielectric Science and Technology Division. i Electrochemical Society Meeting. Pennington, N.J: Electrochemical Society, 2007.
Znajdź pełny tekst źródłaSymposium on Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Emerging Dielectrics (9th 2007 Chicago, Ill.). Silicon nitride, silicon dioxide, and emerging dielectrics 9. Redaktorzy Sah R. E, Electrochemical Society. Dielectric Science and Technology Division. i Electrochemical Society Meeting. Pennington, N.J: Electrochemical Society, 2007.
Znajdź pełny tekst źródłaLuches, Armando. Laser-assisted deposition of boron nitride thin films and nanotubes. Hauppauge, N.Y: Nova Science Publisher's, 2010.
Znajdź pełny tekst źródłaSymposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (1988 Chicago, Ill.). Proceedings of the Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films. Pennington, NJ: Electrochemical Society, 1989.
Znajdź pełny tekst źródłaSymposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (2nd 1986 San Diego, Calif.). Proceedings of the Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films. Pennington, NJ (10 S. Main St., Pennington 08534-2696: Electrochemical Society), 1987.
Znajdź pełny tekst źródłaSymposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (7th 2003 Paris, France). Silicon nitride and silicon dioxide thin insulating films VII: Proceedings of the international symposium. Redaktorzy Sah R. E, Electrochemical Society. Dielectric Science and Technology Division., Electrochemical Society Electronics Division i Electrochemical Society Meeting. Pennington, NJ: Electrochemical Society, 2003.
Znajdź pełny tekst źródłaSymposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (5th 1999 Seattle, Wash.). Silicon nitride and silicon dioxide thin insulating films: Proceedings of the fifth international symposium. Pennington, NJ (10 S. Main St., Pennington 08534-2696: Electrochemical Society), 1999.
Znajdź pełny tekst źródłaSymposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (3rd 1994 San Francisco, Calif.). Proceedings of the Third Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films. Pennington, NJ (10 S. Main St., Pennington 08534-2696: Electrochemical Society), 1994.
Znajdź pełny tekst źródłaSymposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (8th 2005 Québec, Québec). Silicon nitride, silicon dioxide thin insulating films, and other emerging diele[c]trics VIII: Proceedings of the international symposium. Redaktorzy Sah R. E, Electrochemical Society. Dielectric Science and Technology Division., Electrochemical Society Electronics Division i Electrochemical Society Meeting. Pennington, N.J: Electrochemical Society, 2005.
Znajdź pełny tekst źródłaSymposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (8th 2005 Québec, Québec). Silicon nitride, silicon dioxide thin insulating films, and other emerging diele[c]trics VIII: Proceedings of the international symposium. Redaktorzy Sah R. E, Electrochemical Society. Dielectric Science and Technology Division., Electrochemical Society Electronics Division i Electrochemical Society Meeting. Pennington, N.J: Electrochemical Society, 2005.
Znajdź pełny tekst źródłaFong, Chee Yong. Sol-gel spin coating growth of gallium nitride thin films: A simple, safe, and cheap approach. Pulau Pinang: Penerbit Universiti Sains Malaysia, 2018.
Znajdź pełny tekst źródłaBliznakovska, Blagica. Analysis methods and techniques for hard thin layer-coatings characterization: In particular on titanium nitride. Jülich: Forschungszentrum Jülich, 1993.
Znajdź pełny tekst źródłaFriedhelm, Bechstedt, Meyer B. K, Stutzmann M i Deutsche Forschungsgemeinschaft, red. Group III-nitrides and their heterostructures: Growth, characterization and applications. Weinheim: Wiley-VCH, 2003.
Znajdź pełny tekst źródłaBliznakovska, Blagica. PACVD of TiN. Jülich: Forschungszentrum Jülich, 1995.
Znajdź pełny tekst źródłaSloof, Willem Gerrit. Internal stresses and microstructure of layer/substrate assemblies: Analysis of TiC and TiN coatings chemically vapour deposited on various substrates. Delft, Netherlands: Delft University Press, 1996.
Znajdź pełny tekst źródłaMunns, Clifford B. X-ray diffraction studies of evaporated gold thin films deposited on aluminum nitride substrates. Monterey, Calif: Naval Postgraduate School, 1994.
Znajdź pełny tekst źródłaHabraken, F. H. P. M., red. LPCVD silicon nitride and oxynitride films: Material and applications in integrated circuit technology. Berlin: Springer-Verlag, 1991.
Znajdź pełny tekst źródłaH, Carter Calvin, i Materials Research Society. Meeting Symposium D., red. Diamond, SiC and nitride wide bandgap semiconductors: Symposium held April 4-8, 1994, San Francisco, California, U.S. Pittsburgh, PA: Materials Research Society, 1994.
Znajdź pełny tekst źródła1953-, Prelas Mark Antonio, North Atlantic Treaty Organization. Scientific Affairs Division. i NATO Advanced Research Workshop on Diamond Based Composites (1997 : Saint Petersburg, Russia), red. Diamond based composites: And related materials. Dordrecht: Kluwer Academic Publishers, 1997.
Znajdź pełny tekst źródłaMusil, Jindřich. Tenké vrstvy nitridu titanu. Praha: Academia, 1989.
Znajdź pełny tekst źródłaJohn Wiley & Sons. Technical Insights., red. Supertough coatings: Emerging trends in DLCs, nitrides, borides, and oxides. Wyd. 2. Englewood, NJ: Technical Insights, 1998.
Znajdź pełny tekst źródłaG, Pensl, i International Conference on Silicon Carbide and Related Materials (7th : 1998 : Stockholm, Sweden), red. Silicon carbide, III-nitrides and related materials: ICSCIII-N'97 : Proceedings of the 7th International Conference on Silicon Carbide, III-Nitrides and Related Materials, Stockholm, Sweden, September 1997. Uetikon-Zurich, Switzerland: Trans Tech Publications, 1998.
Znajdź pełny tekst źródłaInternational Seminar Diamond Films (3rd 1996 Saint Petersburg, Russia). Diamond & diamond-like film applications: Nucleation and growth, modeling and phase equilibria, properties and characterization, diamond-like carbon, wide bandgap, nitrides and carbides : proceedings Third International Symposium on Diamond Films, St. Petersburg, Russia, June 16-19, 1996. Lancaster: Technomic Pub. Co., 1998.
Znajdź pełny tekst źródłaInternational Conference on Silicon Carbide and Related Materials (1999 Research Triangle Park, N.C.). Silicon carbide and related materials--1999: ICSCRM'99 : proceedings of the International Conference on Silicon Carbide and Related Materials--1999, Research Triangle Park, North Carolina, USA, October 10-15, 1999. Redaktorzy Carter Calvin H, Devaty Robert Philip 1954- i Rohrer Gregory S. Uetikon-Zurich, Switzerland: Trans Tech Publications, 2000.
Znajdź pełny tekst źródłaA, Ponce Fernando, red. III-V nitrides: Symposium held December 2-6, 1996, Boston, Massachusetts, U.S.A. Pittsburgh, Pa: Materials Research Society, 1997.
Znajdź pełny tekst źródłaSurowiec, Catherine A., i Roger B. N. Smither. This film is dangerous: A celebration of nitrate film. Redaktorzy International Federation of Film Archives i International Federation of Film Archives. Congress. Bruxelles, Belgium: FIAF, 2002.
Znajdź pełny tekst źródłaMiyoshi, Kazuhisa. Surface design and engineering toward wear-resistant, self-lubricating diamond films and coatings. [Cleveland, Ohio]: National Aeronautics and Space Administration, Lewis Research Center, 1999.
Znajdź pełny tekst źródłaMiyoshi, Kazuhisa. Surface design and engineering toward wear-resistant, self-lubricating diamond films and coatings. [Cleveland, Ohio]: National Aeronautics and Space Administration, Lewis Research Center, 1999.
Znajdź pełny tekst źródłaE, Voss Kenneth, red. Materials and processes for environmental protection: Symposium held April 5-7, 1994, San Francisco, California, U.S.A. Pittsburgh, PA: Materials Research Society, 1994.
Znajdź pełny tekst źródłaInternational Conference on Silicon Carbide and Related Materials (9th 2001 Tsukuba, Japan). Silicon carbide and related materials: ICSCRM2001, proceedings of the International Conference on Silicon Carbide and Related Materials, Tsukuba, Japan, October 28 - November 2, 2001. Uetikon-Zuerich, Switzerland: Trans Tech Publications, 2002.
Znajdź pełny tekst źródłaKapoor, Vikram J. Silicon Nitride and Silicon Dioxide Thin Insulating Films. Electrochemical Society, 1987.
Znajdź pełny tekst źródła(Editor), R. E. Sah, M. J. Deen (Editor), J. F. Zhang (Editor), J. Yota (Editor) i Y. Kamakura (Editor), red. Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Other Emerging Dielectrics VIII 2005. Electrochemical Society, 2005.
Znajdź pełny tekst źródłaSilicon Nitride and Silicon Dioxide Thin Insulating Films VII: Proceedings of the International Symposium. Not Avail, 2003.
Znajdź pełny tekst źródłaDeen, M. Jamal. Silicon Nitride and Silicon Dioxide Thin Insulating Films: Proceedings of the Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (Proceedings; V. 97-9). Electrochemical Society, 1997.
Znajdź pełny tekst źródłaSilicon nitride and silicon dioxide thin insulating films: Proceedings of the sixth international symposium. Pennington, NJ: Electrochemical Society, 2001.
Znajdź pełny tekst źródła(Editor), Friedhelm Bechstedt, Bruno K. Meyer (Editor) i Martin Stutzmann (Editor), red. Priority Programme of the Deutsche Forschungsgemeinschaft: Group III-Nitrides and Their Heterostructures: Growth, Characterization and Applications. Wiley-VCH, 2003.
Znajdź pełny tekst źródłaŽukauskaitė, Agnė, red. Piezoelectric Aluminium Scandium Nitride (AlScN) Thin Films: Material Development and Applications in Microdevices. MDPI, 2023. http://dx.doi.org/10.3390/books978-3-0365-6366-4.
Pełny tekst źródłaAdhesion, friction, and wear of plasma-deposited thin silicon nitride films at temperatures to 700⁰C. Cleveland, Ohio: Lewis Research Center, NASA, 1989.
Znajdź pełny tekst źródłaCarter, Calvin H., i Gennady Gildenblat. Diamond, Sic and Nitride Wide Bandgap Semiconductors: Symposium Held April 4-8, 1994, San Francisco, California, U.S.A. (Materials Research Society Symposium Proceedings). Materials Research Society, 1994.
Znajdź pełny tekst źródłaAuciello, Orlando, red. Ultrananocrystalline Diamond Coatings for Next-Generation High-Tech and Medical Devices. Cambridge University Press, 2022. http://dx.doi.org/10.1017/9781316105177.
Pełny tekst źródłaBergonzo, Philippe, Richard B. Jackman, Milos Nesladek, Kian Ping Loh i Butler James E. Diamond Electronics and Bioelectronics - Fundamentals to Applications III: Volume 1203. University of Cambridge ESOL Examinations, 2014.
Znajdź pełny tekst źródłaDiamond Electronics and Bioelectronics - Fundamentals to Applications III: Volume 1203. Cambridge University Press, 2010.
Znajdź pełny tekst źródłaSemi-annual progress report on a study of reactive plasma deposited thin films. Greensboro, N.C: North Carolina Agricultural and Technical State University, Dept. of Physics, 1986.
Znajdź pełny tekst źródłaSemi-annual progress report on a study of reactive plasma deposited thin films. Greensboro, N.C: North Carolina Agricultural and Technical State University, Dept. of Physics, 1986.
Znajdź pełny tekst źródłaWiley. Supertough Coatings: Emerging Trends in DLCs, Nitrides, Borides, and Oxides, 2nd Edition. Technical Insights/John Wiley & Sons, 1998.
Znajdź pełny tekst źródła(Editor), G. Pensl, B. Monemar (Editor) i H. Morkoc (Editor), red. Silicon Carbid, III-Nitrides & Related Materials: Proceedings of the 7th International Conference on Silicon Carbide, III-Nitrides & Related Materials (Materials Science Forum,). Scitec Publications, 1998.
Znajdź pełny tekst źródłaDiamond Electronics Vol. 1039: Fundamentals to Applications II. Cambridge University Press, 2008.
Znajdź pełny tekst źródłaDiamond Electronics: Fundamentals to Applications: Symposium Held November 27-30, 2006, Boston, Massachusetts, U.S.A. (Materials Research Society Symposium Proceedings). Materials Research Society, 2007.
Znajdź pełny tekst źródła(Editor), Calvin H. Carter, Robert P. Devaty (Editor) i Gregory S. Rohrer (Editor), red. Silicon Carbide and Related Materials-1999 (Materials Science Forum). Trans Tech Publications, 2000.
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