Artykuły w czasopismach na temat „Near-field scanning optical lithography”
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Wegscheider, S., A. Kirsch, J. Mlynek i G. Krausch. "Scanning near-field optical lithography". Thin Solid Films 264, nr 2 (sierpień 1995): 264–67. http://dx.doi.org/10.1016/0040-6090(95)05818-4.
Pełny tekst źródłaCredgington, Daniel, Oliver Fenwick, Ana Charas, Jorge Morgado, Klaus Suhling i Franco Cacialli. "High-Resolution Scanning Near-Field Optical Lithography of Conjugated Polymers". Advanced Functional Materials 20, nr 17 (6.07.2010): 2842–47. http://dx.doi.org/10.1002/adfm.201000202.
Pełny tekst źródłaSun, Shuqing, Karen S. L. Chong i Graham J. Leggett. "Nanoscale Molecular Patterns Fabricated by Using Scanning Near-Field Optical Lithography". Journal of the American Chemical Society 124, nr 11 (marzec 2002): 2414–15. http://dx.doi.org/10.1021/ja017673h.
Pełny tekst źródłaTseng, Ampere A. "Recent developments in nanofabrication using scanning near-field optical microscope lithography". Optics & Laser Technology 39, nr 3 (kwiecień 2007): 514–26. http://dx.doi.org/10.1016/j.optlastec.2005.11.002.
Pełny tekst źródłaCotton, Daniel V., Christopher J. Fell i Paul C. Dastoor. "Fabricating semi-conducting polymer photonic structures via near-field scanning optical lithography". Synthetic Metals 159, nr 5-6 (marzec 2009): 456–61. http://dx.doi.org/10.1016/j.synthmet.2008.11.007.
Pełny tekst źródłaMicek, Patrik, Dusan Pudis, Peter Gaso, Jana Durisova i Daniel Jandura. "Microring Zone Structure for Near-Field Probes". Coatings 11, nr 11 (5.11.2021): 1363. http://dx.doi.org/10.3390/coatings11111363.
Pełny tekst źródłaFalcón Casas, Ignacio, i Wolfgang Kautek. "Subwavelength Nanostructuring of Gold Films by Apertureless Scanning Probe Lithography Assisted by a Femtosecond Fiber Laser Oscillator". Nanomaterials 8, nr 7 (16.07.2018): 536. http://dx.doi.org/10.3390/nano8070536.
Pełny tekst źródłaLin, Y., M. H. Hong, W. J. Wang, Y. Z. Law i T. C. Chong. "Sub-30 nm lithography with near-field scanning optical microscope combined with femtosecond laser". Applied Physics A 80, nr 3 (luty 2005): 461–65. http://dx.doi.org/10.1007/s00339-004-3093-0.
Pełny tekst źródłaSmolyaninov, Igor I. "Scanning Probe Microscopy of Surface Plasmons". International Journal of Modern Physics B 11, nr 21 (20.08.1997): 2465–510. http://dx.doi.org/10.1142/s021797929700126x.
Pełny tekst źródłaCotton, Daniel V., Christopher J. Fell, Warwick J. Belcher i Paul C. Dastoor. "The origin of fine structure in near-field scanning optical lithography of an electroactive polymer". Journal of Physics D: Applied Physics 41, nr 19 (19.09.2008): 195107. http://dx.doi.org/10.1088/0022-3727/41/19/195107.
Pełny tekst źródłaRoszkiewicz, Agata, Amrita Jain, Marian Teodorczyk i Wojciech Nasalski. "Formation and Characterization of Hole Nanopattern on Photoresist Layer by Scanning Near-Field Optical Microscope". Nanomaterials 9, nr 10 (12.10.2019): 1452. http://dx.doi.org/10.3390/nano9101452.
Pełny tekst źródłaFoglietti, V., E. Cianci i G. Giannini. "Progress toward the fabrication of scanning near field optical probe: pattern definition by e-beam lithography". Microelectronic Engineering 57-58 (wrzesień 2001): 807–11. http://dx.doi.org/10.1016/s0167-9317(01)00483-x.
Pełny tekst źródłaBacker, Scott A., Itai Suez, Zachary M. Fresco, Jean M. J. Fréchet, Josh A. Conway, Shantha Vedantam, Hyojune Lee i Eli Yablonovitch. "Evaluation of new materials for plasmonic imaging lithography at 476 nm using near field scanning optical microscopy". Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 25, nr 4 (2007): 1336. http://dx.doi.org/10.1116/1.2757184.
Pełny tekst źródłaCredgington, Daniel, Oliver Fenwick, Ana Charas, Jorge Morgado, Klaus Suhling i Franco Cacialli. "Conjugated Polymers: High-Resolution Scanning Near-Field Optical Lithography of Conjugated Polymers (Adv. Funct. Mater. 17/2010)". Advanced Functional Materials 20, nr 17 (8.09.2010): n/a. http://dx.doi.org/10.1002/adfm.201090074.
Pełny tekst źródłaArena, A., F. Bonsignore, S. Patanè i G. Saitta. "Optical Properties of Laser-dye-doped Polyvinylcarbazole Films Coated with Polycarbonate". Journal of Materials Research 17, nr 6 (czerwiec 2002): 1490–94. http://dx.doi.org/10.1557/jmr.2002.0221.
Pełny tekst źródłaDing, Li, Jin Qin, Yang Chen i Liang Wang. "Numerical and experimental study of near-field scanning optical lithography using nanoscale bowtie apertures with ultrasmall gap size". Journal of Micro/Nanolithography, MEMS, and MOEMS 15, nr 3 (29.09.2016): 031611. http://dx.doi.org/10.1117/1.jmm.15.3.031611.
Pełny tekst źródłaCotton, Daniel V., Christopher J. Fell, Warwick J. Belcher i Paul C. Dastoor. "Real poly(p-phenylene vinylene) features from near-field scanning optical lithography and the implications for further modelling". Journal of Physics D: Applied Physics 48, nr 32 (10.07.2015): 325101. http://dx.doi.org/10.1088/0022-3727/48/32/325101.
Pełny tekst źródłaInglis, William, Martyn C. Davies, Clive J. Roberts, Saul J. B. Tendler i Philip M. Williams. "Micro-Patterning of Polymers for High Resolution Microscopy Analysis". Microscopy and Microanalysis 7, S2 (sierpień 2001): 128–29. http://dx.doi.org/10.1017/s1431927600026714.
Pełny tekst źródłaMadsen, S., S. I. Bozhevolnyi, K. Birkelund, M. Müllenborn, J. M. Hvam i F. Grey. "Oxidation of hydrogen-passivated silicon surfaces by scanning near-field optical lithography using uncoated and aluminum-coated fiber probes". Journal of Applied Physics 82, nr 1 (lipiec 1997): 49–53. http://dx.doi.org/10.1063/1.365847.
Pełny tekst źródłaKwon, S. J., Y. M. Jeong i S. H. Jeong. "Fabrication of high-aspect-ratio silicon nanostructures using near-field scanning optical lithography and silicon anisotropic wet-etching process". Applied Physics A 86, nr 1 (27.10.2006): 11–18. http://dx.doi.org/10.1007/s00339-006-3744-4.
Pełny tekst źródłaLin, Zhenyuan, i Minghui Hong. "Femtosecond Laser Precision Engineering: From Micron, Submicron, to Nanoscale". Ultrafast Science 2021 (1.12.2021): 1–22. http://dx.doi.org/10.34133/2021/9783514.
Pełny tekst źródłaBraun, Kai, Florian Laible, Otto Hauler, Xiao Wang, Anlian Pan, Monika Fleischer i Alfred J. Meixner. "Active optical antennas driven by inelastic electron tunneling". Nanophotonics 7, nr 9 (7.09.2018): 1503–16. http://dx.doi.org/10.1515/nanoph-2018-0080.
Pełny tekst źródłaOnuki, Teppei, Takashi Tokizaki, Hirotaka Ojima, Jun Shimizu i Li Bo Zhou. "Improvement in Oxide-Pattern Sizes Controllability on Scanning Probe Nanolithography". Advanced Materials Research 126-128 (sierpień 2010): 701–6. http://dx.doi.org/10.4028/www.scientific.net/amr.126-128.701.
Pełny tekst źródłaShamsuddin, Liyana, Khairudin Mohamed i Alsadat Rad Maryam. "The Investigation of Microstructures Fabrication on Quartz Substrate Employing Electron Beam Lithography (EBL) and ICP-RIE Process". Advanced Materials Research 980 (czerwiec 2014): 69–73. http://dx.doi.org/10.4028/www.scientific.net/amr.980.69.
Pełny tekst źródłaKerth, R. T., K. Jain i M. R. Latta. "Excimer laser projection lithography on a full-field scanning projection system". IEEE Electron Device Letters 7, nr 5 (maj 1986): 299–301. http://dx.doi.org/10.1109/edl.1986.26380.
Pełny tekst źródłaHolz, Mathias, Elshad Guliyev, Ahmad Ahmad, Tzvetan Ivanov, Alexander Reum, Martin Hofmann, Claudia Lenk i in. "Field-emission scanning probe lithography tool for 150 mm wafer". Journal of Vacuum Science & Technology B 36, nr 6 (listopad 2018): 06JL06. http://dx.doi.org/10.1116/1.5048357.
Pełny tekst źródłaHofmann, Martin, Stephan Mecholdt, Markus Mohr, Mathias Holz, Stefano Dallorto, Eberhard Manske, Hans-Jörg Fecht i Ivo W. Rangelow. "Nanoscale lift-off process using field emission scanning probe lithography". Journal of Vacuum Science & Technology B 37, nr 6 (listopad 2019): 061803. http://dx.doi.org/10.1116/1.5122272.
Pełny tekst źródłaLi, Juan, Hu Yang, Yong Qiang Zhao i Chao Rong Li. "Artificially Induced Defects in Photonic Crystals and their Optical Properties". Advanced Materials Research 800 (wrzesień 2013): 298–301. http://dx.doi.org/10.4028/www.scientific.net/amr.800.298.
Pełny tekst źródłaLu Sen, 鲁森, 杨开明 Yang Kaiming, 朱煜 Zhu Yu, 王磊杰 Wang Leijie i 张鸣 Zhang Ming. "Design and Analysis of Scanning Beam Interference Lithography Optical System Based on Far-Field Interference". Acta Optica Sinica 38, nr 6 (2018): 0605001. http://dx.doi.org/10.3788/aos201838.0605001.
Pełny tekst źródłaUlrich, Georg, Emanuel Pfitzner, Arne Hoehl, Jung-Wei Liao, Olga Zadvorna, Guillaume Schweicher, Henning Sirringhaus i in. "Thermoelectric nanospectroscopy for the imaging of molecular fingerprints". Nanophotonics 9, nr 14 (21.08.2020): 4347–54. http://dx.doi.org/10.1515/nanoph-2020-0316.
Pełny tekst źródłaBehzadirad, Mahmoud, Ashwin K. Rishinaramangalam, Daniel Feezell, Tito Busani, Christoph Reuter, Alexander Reum, Mathias Holz i in. "Field emission scanning probe lithography with GaN nanowires on active cantilevers". Journal of Vacuum Science & Technology B 38, nr 3 (maj 2020): 032806. http://dx.doi.org/10.1116/1.5137901.
Pełny tekst źródłaKotlyar, V. V., S. S. Stafeev, L. O'Faolain i M. V. Kotlyar. "High numerical aperture metalens to generate an energy backflow". Computer Optics 44, nr 5 (październik 2020): 691–98. http://dx.doi.org/10.18287/2412-6179-co-742.
Pełny tekst źródłaMohiddon, Md Ahamad, L. D. Varma Sangani i M. Ghanashyam Krishna. "Scanning near field optical microscopy of gold nano-disc arrays fabricated by electron beam lithography and their application as surface enhanced Raman scattering substrates". Chemical Physics Letters 588 (listopad 2013): 160–66. http://dx.doi.org/10.1016/j.cplett.2013.10.008.
Pełny tekst źródłaMamyrbayev, Talgat, Alexander Opolka, Alexey Ershov, Josephine Gutekunst, Pascal Meyer, Katsumasa Ikematsu, Atsushi Momose i Arndt Last. "Development of an Array of Compound Refractive Lenses for Sub-Pixel Resolution, Large Field of View, and Time-Saving in Scanning Hard X-ray Microscopy". Applied Sciences 10, nr 12 (16.06.2020): 4132. http://dx.doi.org/10.3390/app10124132.
Pełny tekst źródłaFang, Wei, Jian Lei, Pengda Zhang, Fei Qin, Meiling Jiang, Xufeng Zhu, Dejiao Hu, Yaoyu Cao i Xiangping Li. "Multilevel phase supercritical lens fabricated by synergistic optical lithography". Nanophotonics 9, nr 6 (18.04.2020): 1469–77. http://dx.doi.org/10.1515/nanoph-2020-0064.
Pełny tekst źródłaLenk, Claudia, Martin Hofmann, Tzvetan Ivanov, Ahmad Ahmad, Steve Lenk, Ivo W. Rangelow, Alexander Reum i in. "Sharp GaN nanowires used as field emitter on active cantilevers for scanning probe lithography". Journal of Vacuum Science & Technology B 36, nr 6 (listopad 2018): 06JL04. http://dx.doi.org/10.1116/1.5048190.
Pełny tekst źródłaChen, Henry J. H., Tzu Nien Lee, Shin-Lun Tseng, Sun-Zen Chen i Po-Wen Chiu. "Characterizations of Ion-Sensitive Field-Effect Transistors with Silicon Wire Array Channels and Stack-Sensing Membrane". Journal of The Electrochemical Society 169, nr 3 (1.03.2022): 037511. http://dx.doi.org/10.1149/1945-7111/ac5ad9.
Pełny tekst źródłaLenk, Claudia, Yana Krivoshapkina, Martin Hofmann, Steve Lenk, Tzvetan Ivanov, Ivo W. Rangelow, Ahmad Ahmad i in. "High-throughput process chain for single electron transistor devices based on field-emission scanning probe lithography and Smart Nanoimprint lithography technology". Journal of Vacuum Science & Technology B 37, nr 2 (marzec 2019): 021603. http://dx.doi.org/10.1116/1.5067269.
Pełny tekst źródłaSaekow, B., S. Porntheeraphat, Sakon Rahong, S. Jaruvanawat i J. Nukeaw. "High Refractive Index Dielectric Prepared by Electron Beam Evaporation for Photonic Crystal Optical Biosensor Application". Advanced Materials Research 93-94 (styczeń 2010): 545–48. http://dx.doi.org/10.4028/www.scientific.net/amr.93-94.545.
Pełny tekst źródłaKasahara, Haruo, Tsutomu Shishido, Norihiko Samoto i Nobuo Shimazu. "Performances by the electron optical system of low energy electron beam proximity projection lithography tool with a large scanning field". Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 23, nr 6 (2005): 2754. http://dx.doi.org/10.1116/1.2062435.
Pełny tekst źródłaSrisuai, N., Mati Horprathum, P. Eiamchai, P. Chindaudom, S. Boonruang i Somyod Denchitcharoen. "Development of Nanohole Array Patterned by Laser Interference Lithography Technique". Key Engineering Materials 675-676 (styczeń 2016): 41–44. http://dx.doi.org/10.4028/www.scientific.net/kem.675-676.41.
Pełny tekst źródłaHoe, Zheng-Yu, Chun-Chieh Chang, Jia-Jin Jason Chen, Chung-Kun Yen, Shao-Yu Wang, Yu-Hsuan Kao, Wei-Ming Li, Wen-Fan Chen i Cheng-Tang Pan. "Enhancement of PVDF Sensing Characteristics by Retooling the Near-Field Direct-Write Electrospinning System". Sensors 20, nr 17 (28.08.2020): 4873. http://dx.doi.org/10.3390/s20174873.
Pełny tekst źródłaZhang, Yang, Shulin Gu, Kun Tang, Jiandong Ye, Haixiong Ge, Zhengrong Yao, Shunming Zhu i Youdou Zheng. "Fabrication and Characterization of Highly Oriented N-Doped ZnO Nanorods by Selective Area Epitaxy". Journal of Nanomaterials 2015 (2015): 1–9. http://dx.doi.org/10.1155/2015/854074.
Pełny tekst źródłaIshak, N. S., N. Zainal, F. C. Seman i S. M. Shah. "Fabrication and characterisation of Frequency Selective Surface (FSS) for Terahertz Sensing Application". Journal of Physics: Conference Series 2250, nr 1 (1.04.2022): 012010. http://dx.doi.org/10.1088/1742-6596/2250/1/012010.
Pełny tekst źródłaVolkova, Kseniia, Julia Heupel, Sergei Trofimov, Fridtjof Betz, Rémi Colom, Rowan W. MacQueen, Sapida Akhundzada i in. "Optical and Spin Properties of NV Center Ensembles in Diamond Nano-Pillars". Nanomaterials 12, nr 9 (29.04.2022): 1516. http://dx.doi.org/10.3390/nano12091516.
Pełny tekst źródłaStevanović, Magdalena M., Nenad Filipović, Maja Kuzmanović, Nina Tomić, Dušan Ušjak, Marina Milenković, Kai Zheng, Juergen Stampfl i Aldo R. Boccaccini. "Synthesis and characterization of a collagen-based composite material containing selenium nanoparticles". Journal of Biomaterials Applications 36, nr 10 (27.02.2022): 1800–1811. http://dx.doi.org/10.1177/08853282211073731.
Pełny tekst źródłaGupta, Ankur, Poonam Sundriyal, Aviru Basu, Kapil Manoharan, Rishi Kant i Shantanu Bhattacharya. "Nano-finishing of MEMS-based platforms for optimum optical sensing". Journal of Micromanufacturing 3, nr 1 (13.11.2019): 39–53. http://dx.doi.org/10.1177/2516598419862676.
Pełny tekst źródłaCHAKRABORTY, PURUSHOTTAM. "LAYERED SYNTHETIC MICROSTRUCTURES AS OPTICAL ELEMENTS FOR THE EXTREME ULTRAVIOLET AND SOFT X-RAYS". International Journal of Modern Physics B 05, nr 13 (10.08.1991): 2133–228. http://dx.doi.org/10.1142/s0217979291000845.
Pełny tekst źródłaNidhi, Tashi Nautiyal i Samaresh Das. "Large-Scale Synthesis of Nickel Sulfide for Electronic Device Applications". MRS Advances 5, nr 52-53 (2020): 2727–35. http://dx.doi.org/10.1557/adv.2020.339.
Pełny tekst źródłaChen, Y., F. Carcenac, C. Ecoffet, D. J. Lougnot i H. Launois. "Mold-assisted near-field optical lithography". Microelectronic Engineering 46, nr 1-4 (maj 1999): 69–72. http://dx.doi.org/10.1016/s0167-9317(99)00017-9.
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