Gotowe bibliografie tematyczne / Near-field scanning optical lithography

Gotowa bibliografia na temat „Near-field scanning optical lithography”

Autor: Grafiati
Data publikacji: 4 czerwca 2021
Data aktualizacji: 29 stycznia 2023

Utwórz poprawne odniesienie w stylach APA, MLA, Chicago, Harvard i wielu innych

Wybierz rodzaj źródła:

Spis treści

Zobacz listy aktualnych artykułów, książek, rozpraw, streszczeń i innych źródeł naukowych na temat „Near-field scanning optical lithography”.

Przycisk „Dodaj do bibliografii” jest dostępny obok każdej pracy w bibliografii. Użyj go – a my automatycznie utworzymy odniesienie bibliograficzne do wybranej pracy w stylu cytowania, którego potrzebujesz: APA, MLA, Harvard, Chicago, Vancouver itp.

Możesz również pobrać pełny tekst publikacji naukowej w formacie „.pdf” i przeczytać adnotację do pracy online, jeśli odpowiednie parametry są dostępne w metadanych.

Artykuły w czasopismach na temat "Near-field scanning optical lithography"

1

Wegscheider, S., A. Kirsch, J. Mlynek i G. Krausch. "Scanning near-field optical lithography". Thin Solid Films 264, nr 2 (sierpień 1995): 264–67. http://dx.doi.org/10.1016/0040-6090(95)05818-4.

Pełny tekst źródła
Style APA, Harvard, Vancouver, ISO itp.
2

Credgington, Daniel, Oliver Fenwick, Ana Charas, Jorge Morgado, Klaus Suhling i Franco Cacialli. "High-Resolution Scanning Near-Field Optical Lithography of Conjugated Polymers". Advanced Functional Materials 20, nr 17 (6.07.2010): 2842–47. http://dx.doi.org/10.1002/adfm.201000202.

Pełny tekst źródła
Style APA, Harvard, Vancouver, ISO itp.
3

Sun, Shuqing, Karen S. L. Chong i Graham J. Leggett. "Nanoscale Molecular Patterns Fabricated by Using Scanning Near-Field Optical Lithography". Journal of the American Chemical Society 124, nr 11 (marzec 2002): 2414–15. http://dx.doi.org/10.1021/ja017673h.

Pełny tekst źródła
Style APA, Harvard, Vancouver, ISO itp.
4

Tseng, Ampere A. "Recent developments in nanofabrication using scanning near-field optical microscope lithography". Optics & Laser Technology 39, nr 3 (kwiecień 2007): 514–26. http://dx.doi.org/10.1016/j.optlastec.2005.11.002.

Pełny tekst źródła
Style APA, Harvard, Vancouver, ISO itp.
5

Cotton, Daniel V., Christopher J. Fell i Paul C. Dastoor. "Fabricating semi-conducting polymer photonic structures via near-field scanning optical lithography". Synthetic Metals 159, nr 5-6 (marzec 2009): 456–61. http://dx.doi.org/10.1016/j.synthmet.2008.11.007.

Pełny tekst źródła
Style APA, Harvard, Vancouver, ISO itp.
6

Micek, Patrik, Dusan Pudis, Peter Gaso, Jana Durisova i Daniel Jandura. "Microring Zone Structure for Near-Field Probes". Coatings 11, nr 11 (5.11.2021): 1363. http://dx.doi.org/10.3390/coatings11111363.

Pełny tekst źródła
Streszczenie:
Recent advances in Surface Plasmon Resonance (SPR) technologies have shown the possibility of transmission enhancement of localized modes propagating through sub-diffraction wide slits and apertures, resulting in the strong near-field focusing of metallic planar nanostructures. This work presents a new approach to the fabrication of high-resolution near-field optical probes using 3D lithography in combination with numerical finite difference time domain (FDTD) simulations. A narrow 500 nm depth of field focus area was observed both by numerical analysis and near field scanning optical microscopy (NSOM) measurements. Further research and optimization are planned in order to achieve subwavelength focal regions and increased signal intensities.
Style APA, Harvard, Vancouver, ISO itp.
7

Falcón Casas, Ignacio, i Wolfgang Kautek. "Subwavelength Nanostructuring of Gold Films by Apertureless Scanning Probe Lithography Assisted by a Femtosecond Fiber Laser Oscillator". Nanomaterials 8, nr 7 (16.07.2018): 536. http://dx.doi.org/10.3390/nano8070536.

Pełny tekst źródła
Streszczenie:
Optical methods in nanolithography have been traditionally limited by Abbe’s diffraction limit. One method able to overcome this barrier is apertureless scanning probe lithography assisted by laser. This technique has demonstrated surface nanostructuring below the diffraction limit. In this study, we demonstrate how a femtosecond Yb-doped fiber laser oscillator running at high repetition rate of 46 MHz and a pulse duration of 150 fs can serve as the laser source for near-field nanolithography. Subwavelength features were generated on the surface of gold films down to a linewidth of 10 nm. The near-field enhancement in this apertureless scanning probe lithography setup could be determined experimentally for the first time. Simulations were in good agreement with the experiments. This result supports near-field tip-enhancement as the major physical mechanisms responsible for the nanostructuring.
Style APA, Harvard, Vancouver, ISO itp.
8

Lin, Y., M. H. Hong, W. J. Wang, Y. Z. Law i T. C. Chong. "Sub-30 nm lithography with near-field scanning optical microscope combined with femtosecond laser". Applied Physics A 80, nr 3 (luty 2005): 461–65. http://dx.doi.org/10.1007/s00339-004-3093-0.

Pełny tekst źródła
Style APA, Harvard, Vancouver, ISO itp.
9

Smolyaninov, Igor I. "Scanning Probe Microscopy of Surface Plasmons". International Journal of Modern Physics B 11, nr 21 (20.08.1997): 2465–510. http://dx.doi.org/10.1142/s021797929700126x.

Pełny tekst źródła
Streszczenie:
Recent development of novel scanning probe techniques such as Scanning Tunneling Microscopy (STM), Atomic Force Microscopy (AFM), and Near-Field Optical Microscopy (NFOM) has opened new ways to study local field distribution of surface electromagnetic waves. A lot of experimental efforts have been concentrated on the study of surface plasmons (SP). Different techniques allow to excite and probe SPs with wavelengths from 1 nm down to the optical range along its entire dispersion curve. Large number of phenomena have been studied directly, such as SP scattering by individual defects, strong and weak localization of SP, SP induced local field enhancement, light emission from the tunneling junction, etc. Scanning probe techniques allow not only topography and field mapping but also surface modification and lithography on the nanometer scale. Combination of these features in the same experimental setup proved to be extremely useful in SP studies. For example, some prototype two dimensional optical elements able to control SP propagation have been demonstrated.
Style APA, Harvard, Vancouver, ISO itp.
10

Cotton, Daniel V., Christopher J. Fell, Warwick J. Belcher i Paul C. Dastoor. "The origin of fine structure in near-field scanning optical lithography of an electroactive polymer". Journal of Physics D: Applied Physics 41, nr 19 (19.09.2008): 195107. http://dx.doi.org/10.1088/0022-3727/41/19/195107.

Pełny tekst źródła
Style APA, Harvard, Vancouver, ISO itp.
Więcej źródeł

Rozprawy doktorskie na temat "Near-field scanning optical lithography"

1

Chong, Karen S. L. "Fabrication of molecular nanostructures by scanning near-field optical (SNOM) lithography". Thesis, University of Sheffield, 2004. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.422175.

Pełny tekst źródła
Style APA, Harvard, Vancouver, ISO itp.
2

Fenwick, Oliver. "Scanning near-field optical lithography and microscopy of conjugated polymer structures". Thesis, University College London (University of London), 2007. http://discovery.ucl.ac.uk/1445444/.

Pełny tekst źródła
Streszczenie:
This thesis is concerned with the use of the scanning near-field optical microscope (SNOM) to pattern and image conjugated polymer structures. The SNOM is one of just a few optical instruments which are capable of breaking the diffraction limit which limits conventional microscopes to a resolution of approximately half a wavelength. It does so by directing light onto a sub-wavelength aperture at the apex of a probe, establishing a local evanescent field of subwavelength dimensions around the aperture. Conjugated polymers on the other hand are an interesting class of materials which have semiconducting properties and a rich photophysics making them suitable for use in novel light-emitting diodes, transistors and solar cells. I demonstrate direct patterning of several conjugated polymers using the SNOM with a resolution extending below 100 nm and attempt to explain the resolution of the lithography through simulations using the Bethe-Bouwkamp model of the field surrounding a sub-wavelength aperture. In particular the modelling focuses on the role of the film thickness and reflections from the substrate. Further experiments demonstrate that thermal effects which can be caused by heating of the SNOM probe do not play a role in lithography with the SNOM in this case. However, I demonstrate the use of a scanning thermal microscope to do a novel and purely thermal lithography on one of the same conjugated polymers. Resolutions of 120 nm are demonstrated, and finite element analysis is used to show that significant improvements in resolution should be possible by optimisation of the probe and the polymer film. In addition, I present simulations of imaging artefacts caused by topography on samples under SNOM investigation, and use the same model to look at the potential of the SNOM to obtain information about sub-surface objects. SNOM images are presented of blends and supramolecular fibres of conjugated polymers.
Style APA, Harvard, Vancouver, ISO itp.
3

Pendery, Joel S. "Nanoscale Patterning and Imaging of Liquid Crystals and Colloids at Surfaces". Case Western Reserve University School of Graduate Studies / OhioLINK, 2014. http://rave.ohiolink.edu/etdc/view?acc_num=case1396623443.

Pełny tekst źródła
Style APA, Harvard, Vancouver, ISO itp.
4

Dvořák, Petr. "Studium vlastností povrchových plazmonových polaritonů na magnetických materiálech". Master's thesis, Vysoké učení technické v Brně. Fakulta strojního inženýrství, 2011. http://www.nusl.cz/ntk/nusl-229810.

Pełny tekst źródła
Streszczenie:
The diploma thesis deals with the experimental study of surface plasmon polaritons (SPPs) on nano-structures with the Au/Co/Au multilayer. Plasmonic structures were prepared by the electron beam lithography and by the focused ion beam. A Scanning optical near-field microscope was used for detection of surface plasmon polaritons. SPPs were confirmed by the experiment with different polarizations of the illuminating light. Furthermore, differences in plasmon interference wavelengths was measured for different surface dielectric functions. Finally, the decantation of the SPPs interference image was measured in dependence on the external magnetic field.
Style APA, Harvard, Vancouver, ISO itp.
5

Leong, Siang Huei. "Apertureless scanning near-field optical microscopy". Thesis, University of Cambridge, 2004. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.615953.

Pełny tekst źródła
Style APA, Harvard, Vancouver, ISO itp.
6

Melville, David O. S. "Planar Lensing Lithography: Enhancing the Optical Near Field". Thesis, University of Canterbury. Electrical and Computer Engineering, 2006. http://hdl.handle.net/10092/1091.

Pełny tekst źródła
Streszczenie:
In 2000, a controversial paper by John Pendry surmised that a slab of negative index material could act as a perfect lens, projecting images with resolution detail beyond the limits of conventional lensing systems. A thin silver slab was his realistic suggestion for a practical near-field superlens - a 'poor-mans perfect lens'. The superlens relied on plasmonic resonances rather than negative refraction to provide imaging. This silver superlens concept was experimentally verified by the author using a novel near-field lithographic technique called Planar Lensing Lithography (PLL), an extension of a previously developed Evanescent Near-Field Optical Lithography (ENFOL) technique. This thesis covers the computational and experimental efforts to test the performance of a silver superlens using PLL, and to compare it with the results produced by ENFOL. The PLL process was developed by creating metal patterned conformable photomasks on glass coverslips and adapting them for use with an available optical exposure system. After sub-diffraction-limited ENFOL results were achieved with this system additional spacer and silver layers were deposited onto the masks to produce a near-field test platform for the silver superlens. Imaging through a silver superlens was achieved in a near-field lithography environment for sub-micron, sub-wavelength, and sub-diffraction-limited features. The performance of PLL masks with 120-, 85-, 60-, and 50-nm thick silver layers was investigated. Features on periods down to 145-nm have been imaged through a 50-nm thick silver layer into a thin photoresist using a broadband mercury arc lamp. The quality of the imaging has been improved by using 365 nm narrowband exposures, however, resolution enhancement was not achieved. Multiple layer silver superlensing has also been experimentally investigated for the first time; it was proposed that a multi-layered superlens could achieve better resolution than a single layer lens for the same total silver thickness. Using a PLL mask with two 30-nm thick silver layers gave 170-nm pitch sub-diffraction-limited resolution, while for a single layer mask with the same total thickness (60 nm) resolution was limited to a 350-nm pitch. The proposed resolution enhancement was verified, however pattern fidelity was reduced, the result of additional surface roughness. Simulation and analytical techniques have been used to investigate and understand vi ABSTRACT the enhancements and limitations of the PLL technique. A Finite-Difference Time- Domain (FDTD) tool was written to produce full-vector numerical simulations and this provided both broad- and narrowband results, allowing image quality as a function of grating period to be investigated. An analytical T-matrix method was also derived to facilitate computationally efficient performance analysis for grating transmission through PLL stacks. Both methods showed that there is a performance advantage for PLL over conventional near-field optical lithography, however, the performance of the system varies greatly with grating period. The advantages of PLL are most prominent for multi-layer lenses. The work of this thesis indicates that the utilisation of plasmonic resonances in PLL and related techniques can enhance the performance of near-field lithography.
Style APA, Harvard, Vancouver, ISO itp.
7

LeBlanc, Philip R. "Dual-wavelength scanning near-field optical microscopy". Thesis, McGill University, 2002. http://digitool.Library.McGill.CA:80/R/?func=dbin-jump-full&object_id=82911.

Pełny tekst źródła
Streszczenie:
A dual-wavelength Scanning Near-Field Optical Microscope was developed in order to investigate near-field contrast mechanisms as well as biological samples in air. Using a helium-cadmium laser, light of wavelengths 442 and 325 nanometers is coupled into a single mode optical fiber. The end of the probe is tapered to a sub-wavelength aperture, typically 50 nanometers, and positioned in the near-field of the sample. Light from the aperture is transmitted through the sample and detected in a confocal arrangement by two photomultiplier tubes. The microscope has a lateral topographic resolution of 10 nanometers, a vertical resolution of 0.1 nanometer and an optical resolution of 30 nanometers. Two alternate methods of producing the fiber probes, heating and pulling, or acid etching, are compared and the metal coating layer defining the aperture is discussed. So-called "shear-force" interactions between the tip and sample are used as the feedback mechanism during raster scanning of the sample. An optical and topographic sample standard was developed to calibrate the microscope and extract the ultimate resolution of the instrument. The novel use of two wavelengths enables the authentication of true near-field images, as predicted by various models, as well as the identification of scanning artifacts and the deconvolution of often highly complicated relationships between the topographical and optical images. Most importantly, the use of two wavelengths provides information on the chemical composition of the sample. Areas of a polystyrene film are detected by a significant change in the relative transmission of the two wavelengths with a resolution of 30 nanometers. As a biological application, a preliminary investigation of the composition of Black Spruce wood cell fibers was performed. Comparisons of the two optical channels reveal the expected lignin distributions in the cell wall.
Style APA, Harvard, Vancouver, ISO itp.
8

McNab, Sharee J. "Evanescent near-field optical lithography : overcoming the diffraction limit". Thesis, University of Canterbury. Electrical and Electronic Engineering, 2001. http://hdl.handle.net/10092/6655.

Pełny tekst źródła
Streszczenie:
Concepts of optical resolution limits have been transformed in the past two decades with the development of near-field optical microscopy. Resolutions of λ/40 have been demonstrated by taking advantage of additional information present the near field of an object. These resolutions are far higher than what diffraction-limited lens-based optical systems are capable of. Attempts have been made to replicate these resolutions for lithography using a scanning probe based optical equivalent, but these systems suffer from low throughput owing to their serial nature. A desirable alternative would be replication of all the patterns within a field in a single flood exposure in a manner similar to how optical projection lithography replicates the field of a mask, but with the additional resolution available from working in the near field. This is the basis of evanescent near-field optical lithography, the subject of this thesis. Evanescent near-field optical lithography (ENFOL) brings traditional contact lithography into the near-near field using a combination of conformable masks and ultra-thin photoresists. This thesis describes a study of ENFOL both experimentally and via electromagnetic simulations to evaluate what the resolution limit might be. The fabrication of membrane masks is described, a key component for the ENFOL exposure. The characteristics of an ENFOL exposure using broad-band light are investigated from exposures into thick resist. These exposures demonstrate the trend of decreasing depth of field as the period of grating structures is reduced. ENFOL's requirement of a thin imaging photoresist for high resolution lithography complicates the pattern transfer step essential to translate the photoresist image into a useful material for devices. The development of an additive pattern transfer process is described, that utilises a trilayer resist scheme to enable lift-off metallisation. NiCr gratings with periods down to 270nm have been fabricated using this process subsequent to an ENFOL exposure. Wire-grid polarisers consisting of 270nm-period NiCr gratings on glass substrates have been fabricated and their polarisation properties measured at visible wavelengths. Simulation results of exposures of sub-wavelength grating structures are presented that investigate the fundamental limit to resolution for contact lithography techniques such as ENFOL. A full-vector, rigorous electromagnetic simulation technique, the multiple multipole program is used to provide information about the near field of subwavelength gratings. The potential for λ/20 resolution is indicated; a tantalising prospect for optical lithography and well below the diffraction limit of conventional optical projection-based lithographies. Perhaps the most critical parameter for an evanescent exposure, the depth of field, was characterised and a linear relationship shown between the depth of field and grating period. The effect of parameters such as grating duty cycle, absorber material and thickness on the exposure are observed with the intention to optimise the experimental setup. Interesting interference phenomena are observed in simulation results for exposures. where the effective exposure wavelength is equivalent to the grating period. In particular a period halving occurs in the transverse magnetic polarisation due to interference of the first diffracted orders. A novel interference technique - evanescent interference lithography is proposed that takes advantage of an enhanced period halving at an exposure wavelength corresponding to a grating resonance.
Style APA, Harvard, Vancouver, ISO itp.
9

Sefa-Ntiri, Baah. "Embedded metal mask evanescent near field optical lithography (EMM-ENFOL)". Thesis, University of Birmingham, 2008. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.522037.

Pełny tekst źródła
Style APA, Harvard, Vancouver, ISO itp.
10

Wright, Alan James. "Distortion in conformable masks for evanescent near field optical lithography". Thesis, University of Canterbury. Electrical and Computer Engineering, 2007. http://hdl.handle.net/10092/1161.

Pełny tekst źródła
Streszczenie:
In this thesis the in-plane pattern distortion resulting from the use of Evanescent Near Field Optical Lithography (ENFOL) masks was investigated. ENFOL is a high resolution low-cost technique of lithography that is able to pattern features beyond the diffraction limit of light. Due to its use of the evanescent near field, ENFOL requires the use of conformable masks for intimate contact. Such masks can stretch and skew as they come into contact with silicon substrates and therefore distort the high resolution features patterned on them. It was desired to measure this distortion to ascertain the patterning performance of ENFOL masks and possibly correct for any uniform distortion found. To this end a sophisticated measuring process was successfully demonstrated. This involved the use of a Raith 150 Electron Beam Lithography (EBL) system with precision laser interferometer stage and metrology software module for automated measurements. Custom software was written for the Raith to enable it to take additional measurements to compensate for electron beam drift. Processing algorithms were then employed to using the measurements to compensate for beam drift and correcting for shift and rotation systematic errors. The performance of the in-plane distortion measuring process was found to have a precision of 60nm. With the ability to measure distortion, ENFOL masks were used to pattern substrates and distortion was found to be large, on the order of 1µm. This is much larger than desired for sub 100nm patterning as is expected of ENFOL. The distortions were non-uniform patterns of localised displacements. This, the observation of Newton's rings beneath a test mask and the observation of a single particle distortion across measurements of the same mask across different loadings in the EBL pointed to particulate contamination causing the distortion. In order to prove beyond doubt that particulate contamination was the cause of the spurious distortions, mechanical modelling using the Finite Element Method (FEM) of analysis was employed. The results from this matched the distortions observed experimentally, particles 20-40µm modelling the observed distortion.
Style APA, Harvard, Vancouver, ISO itp.
Więcej źródeł

Książki na temat "Near-field scanning optical lithography"

1

Zhang, Peng. Development of a near-field scanning optical microscope and its application in studying the optical mode localization of self-affine Ag colloidal films. Ottawa: National Library of Canada = Bibliothèque nationale du Canada, 1998.

Znajdź pełny tekst źródła
Style APA, Harvard, Vancouver, ISO itp.
2

Yang, Seung Yun. Imaging silver nanowire using near-field scanning optical microscope. 2001.

Znajdź pełny tekst źródła
Style APA, Harvard, Vancouver, ISO itp.
3

Nagy, Noémi Zsuzsanna. Development of a hybrid near-field scanning optical chemical probe microscope. 2002.

Znajdź pełny tekst źródła
Style APA, Harvard, Vancouver, ISO itp.
4

Nagy, Noemi Zsuzsanna. Development of a hybrid near-field scanning optical chemical probe microscope. 2002, 2002.

Znajdź pełny tekst źródła
Style APA, Harvard, Vancouver, ISO itp.
5

Atomic Force Microscopy, Scanning Nearfield Optical Microscopy and Nanoscratching: Application to Rough and Natural Surfaces (NanoScience and Technology). Springer, 2006.

Znajdź pełny tekst źródła
Style APA, Harvard, Vancouver, ISO itp.
6

Martin, Francis L., i Hubert M. Pollock. Microspectroscopy as a tool to discriminate nanomolecular cellular alterations in biomedical research. Redaktorzy A. V. Narlikar i Y. Y. Fu. Oxford University Press, 2017. http://dx.doi.org/10.1093/oxfordhb/9780199533053.013.8.

Pełny tekst źródła
Streszczenie:
This article considers the use of microspectroscopy for discriminating nanomolecular cellular alterations in biomedical research. It begins with an overview of some existing mid-infrared microspectroscopy techniques, including FTIR microspectroscopy and Raman microspectroscopy. It then discusses near-field techniques such as scanning near-field optical microscopy, near-field Raman microscopy, and photothermal microspectroscopy (PTMS). It also examines promising alternative sources of IR light, possible advantages of using normal atomic force microscopy probes, experimental procedures for PTMS, and prospects for high spatial resolution in near-field FTIR spectroscopy. Finally, it describes the spectroscopic detection of small particles, along with the use of the analysis paradigm to discriminate nanomolecular cellular alterations in biomedical research.
Style APA, Harvard, Vancouver, ISO itp.
7

Narlikar, A. V., i Y. Y. Fu, red. Oxford Handbook of Nanoscience and Technology. Oxford University Press, 2017. http://dx.doi.org/10.1093/oxfordhb/9780199533053.001.0001.

Pełny tekst źródła
Streszczenie:
This Handbook presents important developments in the field of nanoscience and technology, focusing on the advances made with a host of nanomaterials including DNA and protein-based nanostructures. Topics include: optical properties of carbon nanotubes and nanographene; defects and disorder in carbon nanotubes; roles of shape and space in electronic properties of carbon nanomaterials; size-dependent phase transitions and phase reversal at the nanoscale; scanning transmission electron microscopy of nanostructures; the use of microspectroscopy to discriminate nanomolecular cellular alterations in biomedical research; holographic laser processing for three-dimensional photonic lattices; and nanoanalysis of materials using near-field Raman spectroscopy. The volume also explores new phenomena in the nanospace of single-wall carbon nanotubes; ZnO wide-bandgap semiconductor nanostructures; selective self-assembly of semi-metal straight and branched nanorods on inert substrates; nanostructured crystals and nanocrystalline zeolites; unusual properties of nanoscale ferroelectrics; structural, electronic, magnetic, and transport properties of carbon-fullerene-based polymers; fabrication and characterization of magnetic nanowires; and properties and potential of protein-DNA conjugates for analytic applications.
Style APA, Harvard, Vancouver, ISO itp.

Części książek na temat "Near-field scanning optical lithography"

1

Falcón Casas, Ignacio, i Wolfgang Kautek. "Apertureless Scanning Near-Field Optical Lithography". W Laser Micro-Nano-Manufacturing and 3D Microprinting, 113–32. Cham: Springer International Publishing, 2020. http://dx.doi.org/10.1007/978-3-030-59313-1_3.

Pełny tekst źródła
Style APA, Harvard, Vancouver, ISO itp.
2

Narushima, Tetsuya. "Scanning Near-Field Optical Microscopy/Near-Field Scanning Optical Microscopy". W Compendium of Surface and Interface Analysis, 577–82. Singapore: Springer Singapore, 2018. http://dx.doi.org/10.1007/978-981-10-6156-1_93.

Pełny tekst źródła
Style APA, Harvard, Vancouver, ISO itp.
3

Fischer, U. Ch. "Scanning Near Field Optical Microscopy". W Scanning Microscopy, 76–84. Berlin, Heidelberg: Springer Berlin Heidelberg, 1992. http://dx.doi.org/10.1007/978-3-642-84810-0_5.

Pełny tekst źródła
Style APA, Harvard, Vancouver, ISO itp.
4

Fischer, U. C. "Scanning Near-Field Optical Microscopy". W Scanning Probe Microscopy, 161–210. Berlin, Heidelberg: Springer Berlin Heidelberg, 1998. http://dx.doi.org/10.1007/978-3-662-03606-8_7.

Pełny tekst źródła
Style APA, Harvard, Vancouver, ISO itp.
5

Hartschuh, Achim. "Scanning Near-Field Optical Microscopy". W Encyclopedia of Nanotechnology, 3508–21. Dordrecht: Springer Netherlands, 2016. http://dx.doi.org/10.1007/978-94-017-9780-1_283.

Pełny tekst źródła
Style APA, Harvard, Vancouver, ISO itp.
6

Saiki, Toshiharu. "Near-Field Scanning Optical Microscope". W Roadmap of Scanning Probe Microscopy, 23–33. Berlin, Heidelberg: Springer Berlin Heidelberg, 2007. http://dx.doi.org/10.1007/978-3-540-34315-8_4.

Pełny tekst źródła
Style APA, Harvard, Vancouver, ISO itp.
7

Zhu, Yimei, Hiromi Inada, Achim Hartschuh, Li Shi, Ada Della Pia, Giovanni Costantini, Amadeo L. Vázquez de Parga i in. "Scanning Near-Field Optical Microscopy". W Encyclopedia of Nanotechnology, 2280–92. Dordrecht: Springer Netherlands, 2012. http://dx.doi.org/10.1007/978-90-481-9751-4_283.

Pełny tekst źródła
Style APA, Harvard, Vancouver, ISO itp.
8

Cefalì, Eugenio, Salvatore Patanè i Maria Allegrini. "Near-Field Optical Litography". W Scanning Probe Microscopy in Nanoscience and Nanotechnology, 757–93. Berlin, Heidelberg: Springer Berlin Heidelberg, 2009. http://dx.doi.org/10.1007/978-3-642-03535-7_21.

Pełny tekst źródła
Style APA, Harvard, Vancouver, ISO itp.
9

Hrynevych, M., D. J. Butler, K. A. Nugent i A. Roberts. "A Scanning Near-Field Optical Microscope with Optical Distance Control". W Near Field Optics, 391–98. Dordrecht: Springer Netherlands, 1993. http://dx.doi.org/10.1007/978-94-011-1978-8_45.

Pełny tekst źródła
Style APA, Harvard, Vancouver, ISO itp.
10

Paesler, M. A., E. L. Buckland, P. J. Moyer i B. I. Yakobson. "Sensing Tip Morphology in Scanning Optical Microscopes". W Near Field Optics, 287–94. Dordrecht: Springer Netherlands, 1993. http://dx.doi.org/10.1007/978-94-011-1978-8_32.

Pełny tekst źródła
Style APA, Harvard, Vancouver, ISO itp.

Streszczenia konferencji na temat "Near-field scanning optical lithography"

1

Wegscheider, S. "Scanning Near-Field Optical Lithography". W Proceedings of European Meeting on Lasers and Electro-Optics. IEEE, 1996. http://dx.doi.org/10.1109/cleoe.1996.562553.

Pełny tekst źródła
Style APA, Harvard, Vancouver, ISO itp.
2

Routley, Ben S., John L. Holdsworth i Andrew J. Fleming. "Optimization of near-field scanning optical lithography". W SPIE Advanced Lithography, redaktorzy Douglas J. Resnick i Christopher Bencher. SPIE, 2015. http://dx.doi.org/10.1117/12.2086073.

Pełny tekst źródła
Style APA, Harvard, Vancouver, ISO itp.
3

Cotton, Daniel, Christopher Fell, Benjamin Duck, Jordan Downs i Paul Dastoor. "Near-field scanning optical lithography of PPV for functional devices". W 2006 International Conference on Nanoscience and Nanotechnology. IEEE, 2006. http://dx.doi.org/10.1109/iconn.2006.340676.

Pełny tekst źródła
Style APA, Harvard, Vancouver, ISO itp.
4

Froehlich, Fred F., Tomas D. Milster i R. Uber. "High-resolution optical lithography with a near-field scanning subwavelength aperture". W San Diego '92, redaktorzy Chandrasekhar Roychoudhuri i Wilfrid B. Veldkamp. SPIE, 1993. http://dx.doi.org/10.1117/12.138895.

Pełny tekst źródła
Style APA, Harvard, Vancouver, ISO itp.
5

Pudis, D., J. Skriniarova, I. Lettrichova, A. Laurencikova, A. Bencurova, J. Kovac i J. Novak. "Near-field scanning optical microscopy and lithography for LED characterization and semiconductor patterning". W XIX Polish-Slovak-Czech Optical Conference on Wave and Quantum Aspects of Contemporary Optics, redaktorzy Agnieszka Popiolek-Masajada i Waclaw Urbanczyk. SPIE, 2014. http://dx.doi.org/10.1117/12.2087168.

Pełny tekst źródła
Style APA, Harvard, Vancouver, ISO itp.
6

Shao, Dongbing, i Shaochen Chen. "Surface-Plasmons-Assisted Nanoscale Photolithography". W ASME 4th Integrated Nanosystems Conference. ASMEDC, 2005. http://dx.doi.org/10.1115/nano2005-87058.

Pełny tekst źródła
Streszczenie:
Photolithography has remained a useful micro-fabrication technology because of its high throughput, low cost, simplicity, and reproducibility over the past several decades. However its resolution is limited at a sub-wavelength scale due to optical diffraction. Among all different approaches to overcoming this problem, such as electron-beam lithography, imprint lithography and scanning probe lithography, near-field optical lithography inherits many merits of the traditional photolithography method. Major drawbacks of this approach include low contrast, low transmission and low density.
Style APA, Harvard, Vancouver, ISO itp.
7

Fletcher, D. A., K. B. Crozier, G. S. Kino, C. F. Quate i K. E. Goodson. "Fabrication of High-Index Refractive Microlenses for Near-Field Optics". W ASME 1999 International Mechanical Engineering Congress and Exposition. American Society of Mechanical Engineers, 1999. http://dx.doi.org/10.1115/imece1999-0282.

Pełny tekst źródła
Streszczenie:
Abstract The minimum spatial resolution of optical systems in the diffraction limit is approximately the free space wavelength divided by twice the numerical aperture (NA) of the system. NA is defined as the product of the index of refraction at the focal point and the sine of the maximum convergence angle of the light. Resolution below the diffraction limit in air can be achieved with a solid immersion lens (SIL) by scanning a sample within the near field of a spot formed in a high refractive-index lens material in the manner of Mansfield and Kino (1990). This paper presents a technique for microfabricating high-NA SILs in silicon with diameters on the order of 10 μm. Silicon has a higher index than previously demonstrated SILs, and it transmits well in the mid-infrared and near-infrared wavelength ranges, making it an ideal choice for high-resolution thermometry and spectroscopy. However, traditional methods for manufacturing SILs are time consuming, labor intensive, and expensive and cannot typically be used to make lenses smaller than 1 mm in diameter. We review current microlens fabrication techniques and describe the fabrication process developed for this work. We include a method for lens formation using acetone vapor to reflow photoresist pillars that can be used to make aspherical as well as spherical lenses. Microlenses etched in single-crystal silicon with diameters on the order of 10 μm and NAs as high as 3.0 are shown. Wafer-scale fabrication offers the opportunity to integrate microlenses onto MEMs structures such as scanning probes for optical imaging, lithography, spectroscopy, and thermometry with high optical efficiency and spatial resolution.
Style APA, Harvard, Vancouver, ISO itp.
8

Hofmann, Martin, Cemal Aydogan, Ivo W. Rangelow, Mahmut Bicer, Arda D. Yalcinkaya, Hamdi Torun, Burkhard Volland, Onur Ates, Claudia Lenk i B. Erdem Alaca. "Fabrication of optical nanodevices through field-emission scanning probe lithography and cryogenic etching". W Novel Patterning Technologies 2018, redaktorzy Eric M. Panning i Martha I. Sanchez. SPIE, 2018. http://dx.doi.org/10.1117/12.2305268.

Pełny tekst źródła
Style APA, Harvard, Vancouver, ISO itp.
9

Chimmalgi, Anant, Taeyoul Choi i Costas P. Grigoropoulos. "Nanostructuring With Scanning Probe Microscope Tip Irradiated With Femtosecond Laser". W ASME 2002 International Mechanical Engineering Congress and Exposition. ASMEDC, 2002. http://dx.doi.org/10.1115/imece2002-33858.

Pełny tekst źródła
Streszczenie:
Nanostructures, which have characteristic dimensions that are difficult to achieve by conventional optical lithography techniques, are finding ever-increasing applications in a variety of fields. High resolution, reliability and throughput fabrication of these nanostructures is essential if applications incorporating nanodevices are to gain widespread acceptance. Owing to the minimal thermal and mechanical damage, ultra-short pulsed laser radiation has been shown to be effective for precision material processing and surface micro-modification. In this work, nanostructuring based on local field enhancement in the near field of a Scanning Probe Microscope (SPM) probe tip irradiated with femtosecond laser pulses has been studied. High spatial resolution (~10–12nm), flexibility in the choice of the substrate material and possibility of massive integration of the tips make this method highly attractive for nanomodification. We report results of nanostructuring of gold thin film utilizing an 800nm femtosecond laser system in conjunction with a commercial SPM in ambient air. Further, Finite Difference Time Domain (FDTD) simulation results for the spatial distribution of the laser field intensity beneath the tip are presented. Potential applications of this method include nanolithography, nanodeposition, high-density data storage, as well as various biotechnology related applications.
Style APA, Harvard, Vancouver, ISO itp.
10

Jakkinapalli, Aravind, Balaji Baskar i Sy-Bor Wen. "Femtosecond Two-Photon 3D Lightfield Lithography". W ASME 2021 Heat Transfer Summer Conference collocated with the ASME 2021 15th International Conference on Energy Sustainability. American Society of Mechanical Engineers, 2021. http://dx.doi.org/10.1115/ht2021-62290.

Pełny tekst źródła
Streszczenie:
Abstract Based on the successful single-photon 3D light field photolithography we demonstrated in the last year, we extend the methodology to femtosecond 3D light field lithography. Compared with our previous single-photon work with UV LED light, using femtosecond light and the associated two-photon light absorption in 3D light field lithography can cure photoresist only around designed voxel locations in a 3D space. Such a two-photon scheme can prevent the unwilling curing of photoresists along the optical paths of rays before arriving at designed voxel locations, which is observed in our previous UV LED-based single-photon 3D light field lithography. The experimental scheme of femtosecond two-photon 3D light field lithography starts from delivering uniform femtosecond laser pulses to a spatial light modulator. The designed pixel map is presented on the spatial light modulator and then delivered to a microlens array to construct a 3D virtual image in the free space. By compressing the 3D virtual image in a photoresist layer with a microscope system, we can successfully generate different microscale 3D patterns without relying on scanning processes as in traditional 3D lithography. In this study, we present preliminary results of (a) algorithms developed to generated 3D patterns with femtosecond light, which should satisfy additional constraints when femtosecond light is used, and (b) 3D patterns generated in photoresists with femtosecond two-photon 3D light field lithography.
Style APA, Harvard, Vancouver, ISO itp.

Raporty organizacyjne na temat "Near-field scanning optical lithography"

1

Nakakura, Craig Y., i Aaron Michael Katzenmeyer. Novel Applications of Near-Field Scanning Optical Microscopy (NSOM). Office of Scientific and Technical Information (OSTI), wrzesień 2018. http://dx.doi.org/10.2172/1475250.

Pełny tekst źródła
Style APA, Harvard, Vancouver, ISO itp.
2

Yan, M., J. McWhirter, T. Huser i W. Siekhaus. Defect studies of optical materials using near-field scanning optical microscopy and spectroscopy. Office of Scientific and Technical Information (OSTI), styczeń 2001. http://dx.doi.org/10.2172/15004114.

Pełny tekst źródła
Style APA, Harvard, Vancouver, ISO itp.
3

Barbara, Paul F. Ultrafast Near-Field Scanning Optical Microscopy (NSOM) of Emerging Display Technology Media: Solid State Electronic Structure and Dynamics,. Fort Belvoir, VA: Defense Technical Information Center, maj 1995. http://dx.doi.org/10.21236/ada294879.

Pełny tekst źródła
Style APA, Harvard, Vancouver, ISO itp.
4

Nowak, Derek. The Design of a Novel Tip Enhanced Near-field Scanning Probe Microscope for Ultra-High Resolution Optical Imaging. Portland State University Library, styczeń 2000. http://dx.doi.org/10.15760/etd.361.

Pełny tekst źródła
Style APA, Harvard, Vancouver, ISO itp.
Możesz być także zainteresowany rozszerzonymi bibliografiami na temat „Near-field scanning optical lithography” dla poszczególnych typów źródeł:
Artykuły w czasopismach Rozprawy doktorskie
Oferujemy zniżki na wszystkie plany premium dla autorów, których prace zostały uwzględnione w tematycznych zestawieniach literatury. Skontaktuj się z nami, aby uzyskać unikalny kod promocyjny!

Do bibliografii