Gotowe bibliografie tematyczne / Microwave-Assisted Deposition

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Gotowa bibliografia na temat „Microwave-Assisted Deposition”

Autor: Grafiati

Data publikacji: 6 września 2023

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Artykuły w czasopismach na temat "Microwave-Assisted Deposition"

Kang, In-Je, Chang-Hyun Cho, Hyonu Chang, Soo-Ouk Jang, Hyun-Jae Park, Dae-Gun Kim, Kyung-Min Lee i Ji-Hun Kim. "Characteristics of Plasma Flow for Microwave Plasma Assisted Aerosol Deposition". Nanomaterials 11, nr 7 (29.06.2021): 1705. http://dx.doi.org/10.3390/nano11071705.

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To validate the possibility of the developed microwave plasma source with a novel structure for plasma aerosol deposition, the characteristics of the plasma flow velocity generated from the microwave plasma source were investigated by a Mach probe with pressure variation. Simulation with the turbulent model was introduced to deduce calibration factor of the Mach probe and to compare experimental measurements for analyses of collisional plasma conditions. The results show calibration factor does not seem to be a constant parameter and highly dependent on the collision parameter. The measured plasma flow velocity, which witnessed fluctuations produced by a shock flow, was between 400 and 700 m/s. The optimized conditions for microwave plasma assisted aerosol deposition were derived by the results obtained from analyses of the parameters of microwave plasma jet. Under the optimized conditions, Y2O3 coatings deposited on an aluminum substrate were investigated using scanning electron microscope. The results presented in this study show the microwave plasma assisted aerosol deposition with the developed microwave plasma source is highly feasible for thick films with >50 μm.

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VANDENBULCKE, L., P. BOU, R. HERBIN, V. CHOLET i C. BENY. "MICROWAVE PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION OF DIAMOND". Le Journal de Physique Colloques 50, nr C5 (maj 1989): C5–177—C5–188. http://dx.doi.org/10.1051/jphyscol:1989525.

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Zhou, Huan, Maryam Nabiyouni i Sarit B. Bhaduri. "Microwave assisted apatite coating deposition on Ti6Al4V implants". Materials Science and Engineering: C 33, nr 7 (październik 2013): 4435–43. http://dx.doi.org/10.1016/j.msec.2013.06.043.

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Wu, Yong Qiang, i Si Kai Sun. "Microwave Assisted Eletroless Copper Plating on Carbon Nanotubes". Advanced Materials Research 399-401 (listopad 2011): 741–46. http://dx.doi.org/10.4028/www.scientific.net/amr.399-401.741.

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This paper firstly attempt to use microwave technology to assist carbon nanotubes by chemical copper plating, and comparated with the conventional method of copper plating, concluded the advantages of the microwave-assisted chemical deposition ,and try to develop a new technology of carbon nanotube composites.

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Kumar, Rajesh, Rajesh Kumar Singh, Alfredo R. Vaz i Stanislav A. Moshkalev. "Microwave-assisted synthesis and deposition of a thin ZnO layer on microwave-exfoliated graphene: optical and electrochemical evaluations". RSC Advances 5, nr 83 (2015): 67988–95. http://dx.doi.org/10.1039/c5ra09936f.

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A rapid and facile microwave-assisted method has been developed for the deposition of a zinc oxide layer on partially microwave exfoliated graphene. The as-prepared hybrids demonstrate enhanced electrochemical properties and show quenching phenomena.

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SATO, Yoichiro. "Diamond film grown by microwave plasma-assisted vapor deposition." Journal of the Japan Society for Precision Engineering 53, nr 10 (1987): 1511–14. http://dx.doi.org/10.2493/jjspe.53.1511.

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Ibiyemi, Abideen A., Ayodeji O. Awodugba, Olusola Akinrinola i Abass A. Faremi. "Zinc-doped CdS nanoparticles synthesized by microwave-assisted deposition". Journal of Semiconductors 38, nr 9 (wrzesień 2017): 093002. http://dx.doi.org/10.1088/1674-4926/38/9/093002.

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Chaudhuri, TapasK, i Anjana Kothari. "Microwave-Assisted Chemical Bath Deposition of Nanostructured ZnO Particles". Journal of Nanoscience and Nanotechnology 9, nr 9 (1.09.2009): 5578–85. http://dx.doi.org/10.1166/jnn.2009.1119.

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Laimer, J., i S. Matsumoto. "Pulsed microwave plasma-assisted chemical vapour deposition of diamond". International Journal of Refractory Metals and Hard Materials 14, nr 1-3 (styczeń 1996): 179–84. http://dx.doi.org/10.1016/0263-4368(96)83432-9.

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Ndiege, Nicholas, Mark Shannon i Richard I. Masel. "Silicon Nanowires Synthesized via Microwave-Assisted Chemical Vapor Deposition". Electrochemical and Solid-State Letters 10, nr 11 (2007): K55. http://dx.doi.org/10.1149/1.2774970.

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Rozprawy doktorskie na temat "Microwave-Assisted Deposition"

Jayathilake, D. Subhashi Y. "Microwave-assisted synthesis and processing of transparent conducting oxides and thin film fabrication by aerosol-assisted deposition". Thesis, Loughborough University, 2017. https://dspace.lboro.ac.uk/2134/32450.

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Transparent conducting oxides (TCOs) have become an integral part of modern life through their essential role in touchscreen technology. The growing demand for cheap and superior transparent conducting layers, primarily driven by the smart phone market, has led to renewed efforts to develop novel TCOs. Currently, the most widely used material for transparent conducting applications is Sn-doped indium oxide (ITO), which has outstanding optical and electrical properties. This material is expensive though, due to the extensive use of In, and efforts to develop new low-cost transparent conducting oxides (TCO) have become increasingly important. Similarly attempts to reduce the cost of the fabrication and post-sintering steps used in making doped metal oxide thin films through innovative technologies have gained a lot of attention. With these points in mind, this research project has focused on the development of a novel low-cost aerosol assisted physical deposition method for TCO thin film fabrication and the development of new highly conducting materials to replace the expensive ITO for TCO applications. In this study, a new and simple aerosol assisted vapour deposition technique (i.e AACT) is developed to fabricate TCO films using TCO nanoparticle suspensions. Firstly, to test the validity of the method, ITO thin films are fabricated on float glass substrates from a nanoparticle suspension. The influence of the deposition parameters on the structural and opto-electronic properties of the thin films are investigated to understand the intricacies of the process. In order to investigate the fabrication of replacement materials for ITO, a range of doped zinc oxide powders are synthesised and processed using microwave radiation. Nominally, Al doped ZnO (AZO), Ga doped ZnO (GZO), Si doped ZnO (SZO), Cu doped ZnO (CZO) and Mn doped ZnO (MZO) singly doped ZnO powders are all investigated to determine the best metal dopants for transparent conducting ZnO. AZO and GZO pellets are found to present the best electrical conductivity for the singly doped microwave fabricated powders with values of 4.4 x 10-3 and 4.3 x 10-3 Ω.cm achieved reproducibly. In an effort to further improve the properties of ZnO, co-doping experiments, utilising the two best dopants from the previous work (i.e. Al and Ga) is investigated. ZnO structures that are co-doped with Al and Ga (AGZO) are found to exhibit significantly enhanced electrical properties than the singly doped powders. Typically, electrical conductivity value of 5.6 x 10-4 Ω.cm is obtained for AGZO pellets, which is an order of magnitude better than the previously fabricated materials. Finally, the best AZO, GZO and AGZO materials are utilised to fabricate thin films using the previously verified AACT technique. Further investigations into the opto-electrical properties of the resulting thin films is presented prior to the utilisation of the best films in a practical application. Transparent heaters are fabricated using the best AGZO thin films, which are capable of reaching a mean temperature of 132.3 °C after applying a voltage of 18 V for 10 min. This work highlights the potential for using highly conducting AGZO, particularly fabricated by the microwave synthesis route, as a potential alternative for ITO in a wide variety of applications. The research also highlights the advantages of using microwaves in the thermal processing of TCO materials which significantly reduces the energy impact of the production process.

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Wangensteen, Ted. "Growth And Characterization Of Functional Nanoparticulate Films By A Microwave Plasma-Assisted Spray Deposition Process". Scholar Commons, 2012. http://scholarcommons.usf.edu/etd/4417.

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Nanoparticle and nanoparticulate films have been grown by a unique approach combining a microwave and nebulized droplets where the concentration and thus the resulting particle size can be controlled. The goal of such a scalable approach was to achieve it with the least number of steps, and without using expensive high purity chemicals or the precautions necessary to work with such chemicals. This approach was developed as a result of first using a laser unsuccessfully to achieve the desired films and particles. Some problems with the laser approach for growing desired films were solved by substituting the higher energy microwave for the laser. Additionally, several materials were first attempted to be grown with the laser and the microwave, and what was learned as result of failures was implemented to successfully demonstrate the technique. The microwave system was characterized by using direct temperature measurements and models. Where possible, the temperature of deposition was determined using thermocouples. In the region of the waveguide, the elemental spectral lines were measured, and the temperature was calculated from measured spectral peaks. From the determined temperature, a diffusion calculation modeled the rate of heat transfer to the nebulized droplets. The result of the diffusion calculations explained the reason for the failure of the laser technique, and success for the microwave technique for simple chemistries. The microwave assisted spray pyrolysis (MPAS) technique was used to grow ZnO nanoparticles of varying size. The properties of the different size particles was measured by optical spectroscopy and magnetic measurements and was correlated to the defects created. The MPAS technique was used to grow films of Ca3Co4O9 containing varying sizes of nanoparticulates. The resistivity, Seebeck coefficient, and the power factor (PF) measured in the temperature range of 300-700 K for films grown by MPAS process with varying concentrations of calcium and cobalt chlorides are presented. Films with larger nanoparticles showed a trend toward higher PFs than those with smaller nanoparticles. Films with PFs as high as 220 μW/mK 2 were observed in films containing larger nanoparticles.

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Merlak, Marek Radoslaw. "Design and Characterization of Microwave Assisted Plasma Spray Deposition System: Application to Eu Doped Y₂O₃ Nano-Particle Coatings". Scholar Commons, 2010. https://scholarcommons.usf.edu/etd/1711.

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This thesis presents a Microwave Plasma Assisted Spray Deposition (MPASD) system design, characterization, and application to produce nano-sized particle coatings of metal oxides. A commercially available rectangular waveguide microwave power delivery system is utilized to initiate and sustain the plasma discharge within the customized plasma applicator where micron-sized droplets of a metal ion solution are heated to evaporate the solvent and thermally process the resulting nano-sized particles. The investigation of optimum conditions for oxygen, argon, and air plasma ignition in the MPASD system was presented. Measured electron temperature of the plasma was between 6000K and 40000K for the plasma conditions used in the MPASD process. Successful deposition of Y2O3:Eu nano-particles using the MPASD system was achieved. MPASD process allows control of the particle's properties, shown through XRD and photoluminescence studies of the Y2O3:Eu coatings. The MPASD process settings effect on particles activated doping concentration and, as a result, its photoluminescence was shown.

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Hsiang, Chen-chih, i 項承智. "Epitaxial growth of ZnO by microwave-assisted chemical bath deposition". Thesis, 2017. http://ndltd.ncl.edu.tw/handle/w9pmt8.

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碩士
國立交通大學
材料科學與工程學系所
106
Microwave-assisted chemical bath deposition (MWCBD) is a newly developed method for rapid synthesis of single-crystalline ZnO nanorods. In this study, MWCBD was used to synthesize ZnO with high-quality epitaxial ZnO film, using hexahydrate zinc nitrate (Zn(NO3)2∙6H2O) as the Zn2+ source, hexamethylenetetramine (HMT, C6H12N4) as pH buffer, GaN/sapphire as the substrate with small lattice mismatch with ZnO, at temperature less than 100°C. Also, the effect of sodium citrate (Na3C6H5O7) as the capping agent on lateral growth of ZnO rod for continuous film formation has been explored based on the evolution of the measured aspect ratio of height-to-width in the microwave environment. Additionally, the effects of temperature, concentration, and time on pH change of aqueous solutions with precipitation of ZnO powders and during microwave heating were evaluated. When the heating temperature is increased, the color of the aqueous solution as seen from the visual appearance becomes more pure white as more precipitated ZnO powders were produced and the pH value decreases from 6.8 to about 5.5. Increasing the concentration of zinc nitrate precursor results in the higher quantity of ZnO powders and reduction of the pH value of the aqueous solution. In the study of ZnO epitaxy on GaN, scanning electron microscopy observations in top view and cross-section show that thin film of epitaxial ZnO in thickness of about 1 μm can be effectively grown on GaN/sapphire with MWCBD by adding sodium citrate to the solution to enhance the lateral growth of ZnO rods with coalescence. It is found that to reach an aspect ratio of height to width of 0.83, the concentration of sodium citrate is required to increase to 0.04 mM which can still have an average growth rate of ~ 1 m/h. The film quality as characterized by x-ray diffraction in –scan shows a full width at half maximum of the (0004) rocking curve in 860 arcsec, which is twice as high as substrate of GaN, whereas it is 1288 arcsec for (303 ̅2) FWHM slightly increased from 1078 arcsec for GaN, suggesting that ZnO film quality is mainly affected by screw dislocations formed in rod nucleation.

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Yen-ChenLin i 林彥辰. "Microwave Plasma Assisted Chemical Vapor Deposition of Single Crystal Diamond". Thesis, 2018. http://ndltd.ncl.edu.tw/handle/3f6cd7.

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Wu, Chih-Chung, i 吳致中. "The copper indium selenide precursor synthesized by microwave-assisted hydro-/solvo-thermal method and its film fabricated by electrophoresis deposition". Thesis, 2008. http://ndltd.ncl.edu.tw/handle/24414721488942660708.

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碩士
國立臺灣科技大學
化學工程系
96
The objective of the presented study is to fabricate uniform, dense CuInSe2 thin film for next-generation solar cells by employing electrophoresis deposition technique (EPD). The study can be divided into two parts, including synthesis of CuInSe2 particles and preparation of CuInSe2 thin films by using EPD technique. First, the viability of microwave-assisted solvo- and hydro-thermal method in the preparation of CuInSe2 materials is investigated. For microwave-assisted solvo-thermal method, pure chalcopyrite structure of the materials was achieved within 30 min with ethylenediamine as solvent, indicating the success in synthesis of CuInSe2 materials. The results showed great improvement for synthesis of CuInSe2 since materials can only be synthesized with at least 20-fold time with conventional heating. The morphologies of the synthesized CuInSe2 materials can be controlled with appropriate pretreatment, however, it is not suitable for the subsequent EPD technique. Therefore, low cost and environmental friendly microwave-assisted hydrothermal method was employed instead of solvothermal one for possible use in thin film fabrication by EPD. It was found that stoichiometric CuInSe2 precursors are able to be synthesized with uniform morphology at the condition of 180 oC for 30 mins. Reduction of the process time is also observed as well. Further the chalcopyrite CuInSe2 particles can be obtained by the post reduction process at 500℃ in H2. On the other hand, deposition of the CuInSe2 thin film by EPD technique was performed with the hydrothermal-derived CuInSe2 precursors. The technique possesses the characteristics of short processing time and precise control in film thickness. Nevertheless, the prepared thin films are porous even after reduction at 600 oC. The fact may result from the loss of oxygen during reduction process as well as the originally porous nature for the precursor thin film. The behavior can be the guide for the future improvement. Besides, the reduced CuInSe2 thin film was analyzed by Raman and XPS, in which only chalcopyrite structure was shown without any impurities.

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Li, Wei-Shuo, i 李偉碩. "Ultra-Sensitive Dopamine Biosensor Using Microwave-Assisted Solution Phase Deposition of a 3-Aminopropyltriethoxysilane and Polydimethylsiloxane-Treated Silica Nanoparticle Mixture as the Sensing Membrane". Thesis, 2015. http://ndltd.ncl.edu.tw/handle/74322536277384179214.

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碩士
國立暨南國際大學
應用材料及光電工程學系
103
In this thesis, microwave-assisted solution phase deposition (MW-SPD) method was used for growing the large-area sensing membrane of a 3-aminopropyltriethoxysilane (γ-APTES) and polydimethylsiloxane (PDMS)-treated silica nanoparticles mixture (γ-APTES+NPs) on polysilicon wires in the batch fabrication of dopamine biosensors. We investigated to grow the γ-APTES+NPs membrane using a solution contained mixture of γ-APTES+NPs and C2H5OH in a microwave oven with fixed power at 90 W. To characterize the film properties, γ-APTES+NPs films were prepared by MW-SPD with different deposit times or ultraviolet(UV) light exposure at different stages during deposition. The effects of microwave annealing on film property were also studied. In order to prove theγ-APTES were incorporated with silica nanoparticles during MW-SPD, we conducted the analyses including atomic force microscopy(AFM), ellipsometer, dynamic light scattering (DLS), micro-Raman spectroscopy and X-ray photoelectron spectrometer (XPS). It was found that MW-SPD could reduce the deposition time of γ-APTES+NPs significantly. The best deposition time for SPD at room temperature was 6 hours, but for the MW-SPD was only 15 minutes. The detectable range of the dopamine biosensor using γ-APTES+NPs as sensing membrane could be improved from 1×10-15 M ~ 1×10-3 M to 1×10-20 M ~ 1×10-3 M by MW-SPD process. The lowest detection limit was improved by 5 orders of magnitude. The UV illumination could further improve the biosensor with a detectable range of 1×10-24 M ~ 1×10-3 M. The lowest detection limit for dopamine was improved by 9 orders of magnitude for γ-APTES+NPs with MW-SPD+UV process.. As for the microwave annealing processes, we found that the sensitivity of the lowest detection limit for theγ-APTES+NPs prepared by the SPD could be significantly improved by the post microwave annealing treatment. For γ-APTES+NPs growing by a 6 hour SPD, a 15 minute microwave anneal could improve the detectable range from 1×10-15 M ~ 1×10-3 M to 10-21 M ~ 1×10-3 M. The lowest detection limit for dopamine was improved by 6 orders of magnitude. From Raman spectra of the membranes, enhanced absorption peaks of Si-O-Si bond were observed in all the films incorporated with silica NPs, especially for γ-APTES+NPs using MW-SPD process. The XPS analyses showed that the percentage of Si on the γ-APTES+NPs surface was larger than theγ-APTES. The silica nanoparticles were proved to be incorporated in γ-APTES during SPD. Because the thicknesses of γ-APTES+NPs membranes were in between 1nm and 3nm, it was reasonable to believe that the diameters of the incorporated silica nanoparticles were in the range of 1nm-3nm, resulting in ultra-high surface to volume ratio for the film and ultra-sensitive lowest detection limit for dopamine.

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Wen, Jia-Ru, i 溫佳儒. "Ultra-sensitive dopamine biosensor using microwave-assisted solution phase deposition of a 3-aminopropyltriethoxysilane and dimethyldichlorosilane-treated silica nanoparticle mixture as the sensing membrane". Thesis, 2015. http://ndltd.ncl.edu.tw/handle/87206716063173936081.

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碩士
國立暨南國際大學
應用材料及光電工程學系
103
In this thesis, solution phase deposition (SPD) and microwave-assisted solution phase deposition (MW-SPD) methods were used for growing the large-area sensing membrane of a 3-aminopropyltriethoxysilane (γ-APTES) and dimethyldichlorosilane (DDS)-treated silica nanoparticles mixture (γ-APTES+NPs) on polysilicon wires in the batch fabrication of dopamine biosensors. We compared the characteristics of the γ-APTES+NPs membrane prepared by SPD and MW-SPD at fixed power using a solution contained mixture of γ-APTES+NPs and C2H5OH. We investigated the hotplate and microwave annealing (MWA) effects on the sensitivity of dopamine detection. The effects of ultraviolet (UV) light exposure at different stages during deposition on the film properties were also studied.. In order to prove the DDS-treated silica nanoparticles were incorporated with γ-APTES during SPD and MW-SPD, we conducted the analyses including ellipsometer, dynamic light scattering (DLS) and micro-Raman spectroscopy. It was found that MW-SPD could reduce the deposition time of γ-APTES+NPs significantly. The best deposition time for SPD at room temperature was 6 hours, but for the MW-SPD was only 15 minutes. The detectable range of the dopamine biosensor using γ-APTES+NPs as sensing membrane could be improved from 1×10-21 M ~ 1×10-3 M to 1×10-25 M ~ 1×10-3 M by MW-SPD process. The lowest detection limit was improved by 4 orders of magnitude. The UV illumination could further improve the biosensor with a detectable range of 1×10-27 M ~ 1×10-3 M. The lowest detection limit for dopamine was improved by 6 orders of magnitude for γ-APTES+NPs with MW-SPD+UV process. As for the microwave annealing processes, we found that the sensitivity of the lowest detection limit for the γ-APTES+NPs prepared by SPD could be significantly improved by the post-deposition of microwave annealing. For γ-APTES+NPs growing by a 6 hour SPD, a 15 minute microwave anneal could improve the detectable range from 1×10-21 M ~10-3 M to 1×10-27 M ~ 1×10-3 M. The lowest detection limit for dopamine was improved by 6 orders of magnitude. The UV illumination after microwave annealing could further improve the biosensor with a detectable range of 1×10-30 M ~ 1×10-3 M. The lowest detection limit for dopamine was improved by 9 orders of magnitude. From the Raman spectra of the membranes, enhanced absorption peaks of Si-O-Si bond were observed in all the films incorporated with silica NPs, especially for γ-APTES+NPs using MW-SPD process. The number of Si-O-Si bonds increased as the NPs incorporated with the γ-APTES. The absorption peaks of Si-O-Si bond were also enhanced for all the films with ultraviolet (UV) light exposure. The γ-APTES+NPs using SPD+MWA+UV process showed the highest absorption peak of Si-O-Si bond. The sensitivity of lowest detection limit increased with the value of absorption peak of Si-O-Si bond. Because the thicknesses of γ-APTES+NPs membranes were in between 1nm and 3nm, it was reasonable to believe that the diameters of the incorporated silica nanoparticles were in the range of 1nm-3nm, resulting in ultra-high surface to volume ratio for the film and ultra-sensitive lowest detection limit for dopamine.

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Jena, Anirudha. "Development of Metal Oxide/Composite Nanostructures via Microwave-Assisted Chemical Route and MOCVD : Study of their Electrochemical, Catalytic and Sensing Applications". Thesis, 2012. https://etd.iisc.ac.in/handle/2005/3233.

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Książki na temat "Microwave-Assisted Deposition"

Bastani-Parizi, Hamideh. Chemical kinetic calculations of the gas phase in atmospheric microwave plasma-assisted chemical vapor deposition of diamond. Ottawa: National Library of Canada, 1993.

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Części książek na temat "Microwave-Assisted Deposition"

Purniawan, A., E. Hamzah i M. R. M. Toff. "Surface Roughness and Morphology Analysis Using an Atomic Force Microscopy of Polycrystalline Diamond Coated Si₃N₄ Deposited by Microwave Plasma Assisted Chemical Vapor Deposition". W Solid State Phenomena, 153–60. Stafa: Trans Tech Publications Ltd., 2008. http://dx.doi.org/10.4028/3-908451-50-7.153.

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Asmussen, Jes, i Timothy Grotjohn. "Microwave Plasma-Assisted Diamond Film Deposition". W Diamond Films Handbook. CRC Press, 2002. http://dx.doi.org/10.1201/9780203910603.ch7.

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Bandas, Cornelia, Carmen Lazau, Mircea Nicolaescu, Corina Orha, Aniela Pop i Simona Caprarescu. "Microwave-assisted Hydrothermal Deposition of Reduced Graphene Oxide on Ti Foil". W Current Topics and Emerging Issues in Materials Sciences Vol. 1, 19–47. B P International (a part of SCIENCEDOMAIN International), 2023. http://dx.doi.org/10.9734/bpi/cteims/v1/18639d.

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Ning, Ke, i Guang Zhu. "Microwave-Assisted Chemical Bath Deposition Method for Quantum Dot-Sensitized Solar Cells". W Functional Nanomaterial for Photoenergy Conversion, 209–42. WORLD SCIENTIFIC, 2020. http://dx.doi.org/10.1142/9789811222405_0005.

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Matsubara, Yoshio, Koji Miyake, Hideaki Tahara, Shuichi Nogawa i Junzo Ishikawa. "OXYGEN ION SOURCE WITH MICROWAVE PLASMA (MP) CATHODE FOR ION BEAM ASSISTED DEPOSITION". W Ion Implantation Technology–92, 475–78. Elsevier, 1993. http://dx.doi.org/10.1016/b978-0-444-89994-1.50103-4.

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"Fabrication Techniques for Quantum Dots". W Materials Research Foundations, 53–80. Materials Research Forum LLC, 2021. http://dx.doi.org/10.21741/9781644901250-2.

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The nanotechnological expansion involves the innovation and designing of materials at the nanoscale regime with controlled properties. Production of nanomaterials with good crystallinity, shape control, and narrow distribution of size plays a significant role in QD-based devices and applications. Various strategies ranging from simple wet chemical methods to advanced atomic layer deposition strategies have been employed for the production of QDs. In this chapter, a prominent and detailed discussion of conventional techniques in addition to the up-to-date development in the synthesis of recent QDs is given. Synthesis routes based on the microwave or ultrasonically assisted and cluster-seed process are of great significance.

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Streszczenia konferencji na temat "Microwave-Assisted Deposition"

Grotjohn, Timothy A., Ayan Bhattacharya i Steven Zajac. "Microwave plasma-assisted deposition of boron doped single crystal diamond". W 2016 IEEE International Conference on Plasma Science (ICOPS). IEEE, 2016. http://dx.doi.org/10.1109/plasma.2016.7534222.

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Badzian, Andrzej R., Teresa Badzian i Dave Pickrell. "Crystallization Of Diamonds By Microwave Plasma Assisted Chemical Vapor Deposition". W 32nd Annual Technical Symposium, redaktorzy Albert Feldman i Sandor Holly. SPIE, 1989. http://dx.doi.org/10.1117/12.948136.

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Gu, Y., J. Lu, T. A. Grotjohn, T. Schuelke i J. Asmussen. "Microwave plasma assisted reactor design for high deposition rate diamond synthesis". W 2011 IEEE 38th International Conference on Plasma Sciences (ICOPS). IEEE, 2011. http://dx.doi.org/10.1109/plasma.2011.5993127.

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Mahajan, J. R. "ZnO nano flowers formation by microwave assisted chemical bath deposition technique". W INDIAN VACUUM SOCIETY SYMPOSIUM ON THIN FILMS: SCIENCE AND TECHNOLOGY. AIP, 2012. http://dx.doi.org/10.1063/1.4732399.

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Weimer, Wayne A., Frank M. Cerio i Curtis E. Johnson. "Plasma parameters in microwave-plasma-assisted chemical vapor deposition of diamond". W San Diego, '91, San Diego, CA, redaktorzy Albert Feldman i Sandor Holly. SPIE, 1991. http://dx.doi.org/10.1117/12.48275.

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Meierbachtol, C. S., T. A. Grotjohn i B. Shanker. "Computational modeling of moderate pressure microwave plasma-assisted chemical vapor deposition reactors". W 2012 IEEE 39th International Conference on Plasma Sciences (ICOPS). IEEE, 2012. http://dx.doi.org/10.1109/plasma.2012.6383719.

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Tran, D. T., T. A. Grotjohn i J. Asmussen. "Synthesis of ultrananocrystalline diamond films by microwave plasma assisted chemical vapor deposition system". W The 33rd IEEE International Conference on Plasma Science, 2006. ICOPS 2006. IEEE Conference Record - Abstracts. IEEE, 2006. http://dx.doi.org/10.1109/plasma.2006.1707163.

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Muneyoshi, T. "Growth mechanism of carbon nanotubes grown by microwave plasma-assisted chemical vapor deposition". W NANONETWORK MATERIALS: Fullerenes, Nanotubes, and Related Systems. AIP, 2001. http://dx.doi.org/10.1063/1.1420053.

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PAULEAU, Y., V. M. ANISHCHIK, A. K. KULESHOV, M. V. ASTASHYNSKAYA i M. P. SAMTSOV. "STRUCTURE OF NICKEL/CARBON NANOCOMPOSITE FILMS FORMED BY MICROWAVE PLASMA-ASSISTED DEPOSITION TECHNIQUE". W Reviews and Short Notes to Nanomeeting-2005. WORLD SCIENTIFIC, 2005. http://dx.doi.org/10.1142/9789812701947_0117.

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Chou, Kevin, Raymond Thompson, Feng Qin, Dustin Nolen i Chao Miao. "Nanostructured Diamond Coatings for Dry Drilling". W ASME/STLE 2009 International Joint Tribology Conference. ASMEDC, 2009. http://dx.doi.org/10.1115/ijtc2009-15072.

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Streszczenie:

In this study, nanostructured diamond (NSD) films were grown, by microwave plasma assisted chemical vapor deposition (MP-CVD) technology, on WC-Co drills for performance enhancement in dry drilling of A390 alloys. Surface cobalt was removed by a well-controlled precision etching process. H2/CH4 gas mixture with a small amount of N2 was applied to produce NSD films. Moreover, slight hone was applied to the cutting edges prior to the NSD deposition to relieve residual stresses generated by thermal mismatch in depositions. The results show feasibility of dry drilling of A390 alloys by NSD coated drills, substantially outperforming carbide drills.

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