Gotowa bibliografia na temat „Lithography”
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Artykuły w czasopismach na temat "Lithography"
Vandаlovskyi, V. "Artistic and technical features of the lithographic manner mixed technique". Research and methodological works of the National Academy of Visual Arts and Architecture, nr 27 (27.02.2019): 92–98. http://dx.doi.org/10.33838/naoma.27.2018.92-98.
Pełny tekst źródłaKwon, B., i Jong H. Kim. "Importance of Molds for Nanoimprint Lithography: Hard, Soft, and Hybrid Molds". Journal of Nanoscience 2016 (22.06.2016): 1–12. http://dx.doi.org/10.1155/2016/6571297.
Pełny tekst źródłaWen, Zaoxia, Xingyu Liu, Wenxiu Chen, Ruolin Zhou, Hao Wu, Yongmei Xia i Lianbin Wu. "Progress in Polyhedral Oligomeric Silsesquioxane (POSS) Photoresists: A Comprehensive Review across Lithographic Systems". Polymers 16, nr 6 (19.03.2024): 846. http://dx.doi.org/10.3390/polym16060846.
Pełny tekst źródłaLund, Sarah E. "Fossils: Lithography’s Porous Time and Eugène Delacroix’s Faust Marginalia". Nineteenth Century Studies 35 (listopad 2023): 1–32. http://dx.doi.org/10.5325/ninecentstud.35.0001.
Pełny tekst źródłaPrakoso, Emmanuel Putro, Inovensius Hugo Bima Wicaksana, Nick Soedarso i Rina Carina. "TEKNIK CETAK DATAR KITCHEN LITHOGRAPY SEBAGAI MEDIA EKSPRESI DESAIN PADA METODE REPRODUKSI GRAFIKA". Jurnal Dimensi DKV Seni Rupa dan Desain 4, nr 2 (1.10.2019): 155. http://dx.doi.org/10.25105/jdd.v4i2.5888.
Pełny tekst źródłaWu, Yu, i Zihao Xiao. "The Recent Progress of Lithography Machine and the State-of-art Facilities". Highlights in Science, Engineering and Technology 5 (7.07.2022): 155–65. http://dx.doi.org/10.54097/hset.v5i.737.
Pełny tekst źródłaVoznyuk G. V., Grigorenko I. N., Mitrofanov M. I., Nikolaev V. V. i Evtikhiev V. P. "Subwave textured surfaces for the radiation coupling from the waveguide". Technical Physics Letters 48, nr 3 (2022): 76. http://dx.doi.org/10.21883/tpl.2022.03.52896.19103.
Pełny tekst źródłaSharma, Ekta, Reena Rathi, Jaya Misharwal, Bhavya Sinhmar, Suman Kumari, Jasvir Dalal i Anand Kumar. "Evolution in Lithography Techniques: Microlithography to Nanolithography". Nanomaterials 12, nr 16 (11.08.2022): 2754. http://dx.doi.org/10.3390/nano12162754.
Pełny tekst źródłaZhang, Zhen. "Optimization of Triple Periodic Bilayer Stacks and Aerial Image Performance Analysis". International Journal of Electronics and Electrical Engineering 8, nr 3 (wrzesień 2020): 53–57. http://dx.doi.org/10.18178/ijeee.8.3.53-57.
Pełny tekst źródłaSeo, Manseung, Haeryung Kim i Masahiko Onosato. "Lithography Using a Microelectronic Mask". Journal of Robotics and Mechatronics 18, nr 6 (20.12.2006): 816–23. http://dx.doi.org/10.20965/jrm.2006.p0816.
Pełny tekst źródłaRozprawy doktorskie na temat "Lithography"
Benoit-Renault, Viviane. "La lithographie en Bretagne (1819-1914)". Thesis, Paris 4, 2014. http://www.theses.fr/2014PA040217.
Pełny tekst źródłaIn the history of print, the study of lithography in province has long been neglected. The first founding worksonly date back to the last forty years. The purpose of this thesis on the history of art is to address this shortcomingby analysing lithography in historical Brittany between 1819 and 1914 bearing an interdisciplinarity mind open toeconomic and social history.Initially this research will be based on the study of lithographic printing. Following a general overviewon the evolution of the number of workshops and their geographical breakdown, leading and secondarylithographic centres are being considered. On the other hand, autographic printing which established itself andcame into competition with the lithographic workshops is being analysed with an emphasis on tin-plate printingworkshops being a characteristic feature of Brittany. Beyond this historical study, the following chapter paints aportrait of the printers and that of the lithographic production scene which being a social environment. It is aworld whereby the painter mingles with the professional lithographer, the drawing lover, the printer and thecraftsman. The reality of the printing world is being addressed in the third chapter with a particular focus on theworkshop and the history of the equipment specific to printing (plates and moulds). Subsequently the workshop isseen as a world in its own right with its celebrations and codes responsible for the working cohesion. This unitywill be accentuated in the second half of the XIX century with the constitution of lithographers unions. Thanksto the creation of a lithographs inventory drawn upon the austerity regarding registration of copyright and printpublic funds, the analysis of the print production in Brittany reveals an unexpected thematic diversity. The artisticprint on sheet, collections or illustrated albums is analysed from a stylistic and iconographic point of view.Finally, the study of useful lithography and the tin-box will bring this chapter to a close.Print trade which formsthe last link in the production chain is recounted through its merchants, a trade being transformed throughout XIXcentury, door-to-door and casual sellers. Lastly, the topic of the diffusion of print in Brittany is put forward asbeing the market place of Breton lithography within a national and international network
Hauser, Hubert [Verfasser], i Holger [Akademischer Betreuer] Reinecke. "Nanoimprint lithography for solar cell texturisation = Nanoimprint Lithographie fuer die Solarzellentexturierung". Freiburg : Universität, 2013. http://d-nb.info/1123476160/34.
Pełny tekst źródłaZheng, Zijian. "Soft lithography and nanoimprint lithography for applications in polymer electronics". Thesis, University of Cambridge, 2007. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.613415.
Pełny tekst źródłaKandulski, Witold. "Shadow nanosphere lithography". [S.l.] : [s.n.], 2007. http://deposit.ddb.de/cgi-bin/dokserv?idn=985533013.
Pełny tekst źródłaMusgraves, J. David. "Maskless Projection Lithography". Scholarship @ Claremont, 2003. http://scholarship.claremont.edu/pomona_theses/17.
Pełny tekst źródłaSchmidt, Aaron Jerome 1979. "Contact thermal lithography". Thesis, Massachusetts Institute of Technology, 2004. http://hdl.handle.net/1721.1/27116.
Pełny tekst źródłaIncludes bibliographical references (p. 65-67).
Contact thermal lithography is a method for fabricating microscale patterns using heat transfer. In contrast to photolithography, where the minimum achievable feature size is proportional to the wavelength of light used in the exposure process, thermal lithography is limited by a thermal diffusion length scale and the geometry of the situation. In this thesis the basic principles of thermal lithography are presented. A traditional chrome-glass photomask is brought into contact with a wafer coated with a thermally sensitive polymer. The mask-wafer combination is flashed briefly with high intensity light, causing the chrome features heat up and conduct heat locally to the polymer, transferring a pattern. Analytic and finite element models are presented to analyze the heating process and select appropriate geometries and heating times. In addition, an experimental version of a contact thermal lithography system has been constructed and tested. Early results from this system are presented, along with plans for future development.
by Aaron Jerome Schmidt.
S.M.
Brodsky, Colin John. "Graft polymerization lithography". Access restricted to users with UT Austin EID Full text (PDF) from UMI/Dissertation Abstracts International, 2001. http://wwwlib.umi.com/cr/utexas/fullcit?p3024998.
Pełny tekst źródłaBaker, Mark. "Metastable Atom Lithography". Thesis, Griffith University, 2008. http://hdl.handle.net/10072/365477.
Pełny tekst źródłaThesis (PhD Doctorate)
Doctor of Philosophy (PhD)
School of Biomolecular and Physical Sciences
Faculty of Science
Full Text
Park, Jea Woo. "Lithography Hotspot Detection". PDXScholar, 2017. https://pdxscholar.library.pdx.edu/open_access_etds/3781.
Pełny tekst źródłaMeyers, Bernard C. "Nagual interpretations /". Online version of thesis, 1990. http://hdl.handle.net/1850/10953.
Pełny tekst źródłaKsiążki na temat "Lithography"
Landis, Stefan, red. Lithography. Hoboken, NJ USA: John Wiley & Sons, Inc., 2013. http://dx.doi.org/10.1002/9781118557662.
Pełny tekst źródłaShappo, Aleksandr. Lithography. Minsk]: Shappo.org, 2016.
Znajdź pełny tekst źródłaBrighton, University Of. Lithography. Brighton: University of Brighton, 1993.
Znajdź pełny tekst źródłaSotomayor Torres, Clivia M., red. Alternative Lithography. Boston, MA: Springer US, 2003. http://dx.doi.org/10.1007/978-1-4419-9204-8.
Pełny tekst źródłaStampfl, Jürgen, Robert Liska i Aleksandr Ovsianikov, red. Multiphoton Lithography. Weinheim, Germany: Wiley-VCH Verlag GmbH & Co. KGaA, 2016. http://dx.doi.org/10.1002/9783527682676.
Pełny tekst źródłaMa, Xu, i Gonzalo R. Arce. Computational Lithography. Hoboken, NJ, USA: John Wiley & Sons, Inc., 2010. http://dx.doi.org/10.1002/9780470618943.
Pełny tekst źródłaMoreau, Wayne M. Semiconductor Lithography. Boston, MA: Springer US, 1988. http://dx.doi.org/10.1007/978-1-4613-0885-0.
Pełny tekst źródłaOzel, Tuncay. Coaxial Lithography. Cham: Springer International Publishing, 2016. http://dx.doi.org/10.1007/978-3-319-45414-6.
Pełny tekst źródłaLandis, Stefan, red. Nano-Lithography. Hoboken, NJ USA: John Wiley & Sons, Inc., 2013. http://dx.doi.org/10.1002/9781118622582.
Pełny tekst źródłaR, Arce Gonzalo, red. Computational lithography. Hoboken, N.J: Wiley, 2010.
Znajdź pełny tekst źródłaCzęści książek na temat "Lithography"
Anner, George E. "Lithography". W Planar Processing Primer, 439–91. Dordrecht: Springer Netherlands, 1990. http://dx.doi.org/10.1007/978-94-009-0441-5_11.
Pełny tekst źródłaVeendrick, Harry. "Lithography". W Bits on Chips, 151–66. Cham: Springer International Publishing, 2018. http://dx.doi.org/10.1007/978-3-319-76096-4_9.
Pełny tekst źródłaKim, Dae-Eun, i In-Ha Sung. "Lithography". W Encyclopedia of Tribology, 1994–2007. Boston, MA: Springer US, 2013. http://dx.doi.org/10.1007/978-0-387-92897-5_1051.
Pełny tekst źródłaEl-Kareh, Badih. "Lithography". W Fundamentals of Semiconductor Processing Technology, 169–260. Boston, MA: Springer US, 1995. http://dx.doi.org/10.1007/978-1-4615-2209-6_4.
Pełny tekst źródłaMorita, Hiroshi. "Lithography". W Computer Simulation of Polymeric Materials, 389–96. Singapore: Springer Singapore, 2016. http://dx.doi.org/10.1007/978-981-10-0815-3_29.
Pełny tekst źródłaWidmann, Dietrich, Hermann Mader, Hans Friedrich, Walter Heywang i Rudolf Müller. "Lithography". W Technology of Integrated Circuits, 95–167. Berlin, Heidelberg: Springer Berlin Heidelberg, 2000. http://dx.doi.org/10.1007/978-3-662-04160-4_4.
Pełny tekst źródłaGooch, Jan W. "Lithography". W Encyclopedic Dictionary of Polymers, 431. New York, NY: Springer New York, 2011. http://dx.doi.org/10.1007/978-1-4419-6247-8_6976.
Pełny tekst źródłaSarangan, Andrew. "Lithography". W Nanofabrication, 139–207. Boca Raton : CRC Press, Taylor & Francis Group, 2017. | Series: Optical sciences and applications of light: CRC Press, 2016. http://dx.doi.org/10.1201/9781315370514-6.
Pełny tekst źródłaGatzen, Hans H., Volker Saile i Jürg Leuthold. "Lithography". W Micro and Nano Fabrication, 313–95. Berlin, Heidelberg: Springer Berlin Heidelberg, 2015. http://dx.doi.org/10.1007/978-3-662-44395-8_6.
Pełny tekst źródłaMizuno, Fumio. "Lithography". W Ultraclean Surface Processing of Silicon Wafers, 398–413. Berlin, Heidelberg: Springer Berlin Heidelberg, 1998. http://dx.doi.org/10.1007/978-3-662-03535-1_29.
Pełny tekst źródłaStreszczenia konferencji na temat "Lithography"
Lum, Bernice M., Andrew R. Neureuther i Glenn D. Kubiak. "Modeling Soft X-Ray Projection Lithography". W Soft X-Ray Projection Lithography. Washington, D.C.: Optica Publishing Group, 1993. http://dx.doi.org/10.1364/sxray.1993.tud.10.
Pełny tekst źródłaVoelkel, Reinhard, Uwe Vogler, Arianna Bramati, Andreas Erdmann, Nezih Ünal, Ulrich Hofmann, Marc Hennemeyer, Ralph Zoberbier, David Nguyen i Juergen Brugger. "Lithographic process window optimization for mask aligner proximity lithography". W SPIE Advanced Lithography, redaktorzy Kafai Lai i Andreas Erdmann. SPIE, 2014. http://dx.doi.org/10.1117/12.2046332.
Pełny tekst źródłaMcCallum, Martin. "Some lithographic limits of back end lithography". W Microelectronic and MEMS Technologies, redaktorzy Chris A. Mack i Tom Stevenson. SPIE, 2001. http://dx.doi.org/10.1117/12.425217.
Pełny tekst źródłaHawryluk, A. M., D. R. Kania, P. Celliers, L. DaSilva, A. Stith, D. Stewart i S. Mrowka. "EUV Reticle Pattern Repair Experiments using 10 KeV Neon Ions". W Extreme Ultraviolet Lithography. Washington, D.C.: Optica Publishing Group, 1994. http://dx.doi.org/10.1364/eul.1994.rmm.204.
Pełny tekst źródłaSasian, Jose M. "New developments in the design of ring field projection cameras for EUV lithography". W International Optical Design Conference. Washington, D.C.: Optica Publishing Group, 1998. http://dx.doi.org/10.1364/iodc.1998.lthd.1.
Pełny tekst źródłaTrucano, Timothy G., Dennis E. Grady, Richard E. Olson i Archie Farnsworth. "Computational Analysis of Debris Formation in SXPL Laser-Plasma Sources". W Soft X-Ray Projection Lithography. Washington, D.C.: Optica Publishing Group, 1993. http://dx.doi.org/10.1364/sxray.1993.tud.12.
Pełny tekst źródłaSweatt, William C. "High Efficiency Condenser Design for Illuminating a Ring Field". W Soft X-Ray Projection Lithography. Washington, D.C.: Optica Publishing Group, 1993. http://dx.doi.org/10.1364/sxray.1993.mb.5.
Pełny tekst źródłaMarrian, Christie R., Elizabeth A. Dobisz i John A. Dagata. "Scanning tunneling microscope lithography: a viable lithographic technology?" W Micro - DL Tentative, redaktor Martin C. Peckerar. SPIE, 1992. http://dx.doi.org/10.1117/12.136012.
Pełny tekst źródłaNeisser, Mark, Harry J. Levinson, Stefan Wurm, David Kyser, Takeo Watanabe, Ken Macwilliams, Hidemi Ishiuchi i in. "Lithography". W 2021 IEEE International Roadmap for Devices and Systems Outbriefs. IEEE, 2021. http://dx.doi.org/10.1109/irds54852.2021.00017.
Pełny tekst źródłaHawryluk, Andrew M. "Reflection Masks for Soft X-Ray Projection Lithography". W Soft X-Ray Projection Lithography. Washington, D.C.: Optica Publishing Group, 1991. http://dx.doi.org/10.1364/sxray.1991.fc2.
Pełny tekst źródłaRaporty organizacyjne na temat "Lithography"
Park, Jea. Lithography Hotspot Detection. Portland State University Library, styczeń 2000. http://dx.doi.org/10.15760/etd.5665.
Pełny tekst źródłaLewis, Aaron. Wavelength Independent Optical Lithography. Fort Belvoir, VA: Defense Technical Information Center, czerwiec 1986. http://dx.doi.org/10.21236/ada171935.
Pełny tekst źródłaJi, Qing. Maskless, resistless ion beam lithography. Office of Scientific and Technical Information (OSTI), styczeń 2003. http://dx.doi.org/10.2172/809301.
Pełny tekst źródłaZotter, Beth. Holographic Lithography for Industrial Nanomanufacturing. Office of Scientific and Technical Information (OSTI), marzec 2020. http://dx.doi.org/10.2172/1614764.
Pełny tekst źródłaBrowning, R., i R. F. Pease. Low Voltage Electron Beam Lithography. Fort Belvoir, VA: Defense Technical Information Center, kwiecień 1994. http://dx.doi.org/10.21236/ada281046.
Pełny tekst źródłaNAVAL RESEARCH LAB WASHINGTON DC. Low Voltage Electron Beam Lithography. Fort Belvoir, VA: Defense Technical Information Center, marzec 1995. http://dx.doi.org/10.21236/ada293396.
Pełny tekst źródłaLiu, Weidong. Low Voltage Electron Beam Lithography. Fort Belvoir, VA: Defense Technical Information Center, czerwiec 1995. http://dx.doi.org/10.21236/ada296625.
Pełny tekst źródłaBrowning, R., i R. F. Pease. Low Voltage Electron Beam Lithography. Fort Belvoir, VA: Defense Technical Information Center, październik 1992. http://dx.doi.org/10.21236/ada263360.
Pełny tekst źródłaBrowning, R., i R. F. Pease. Low Voltage Electron Beam Lithography. Fort Belvoir, VA: Defense Technical Information Center, luty 1993. http://dx.doi.org/10.21236/ada265358.
Pełny tekst źródłaCramer, Corson, Alicia Raftery i Andrew Nelson. Lithography-based Ceramics Manufacturing Technologies. Office of Scientific and Technical Information (OSTI), wrzesień 2019. http://dx.doi.org/10.2172/1659632.
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