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Gotowe bibliografie tematyczne / Ion Beam Lithography / Książki

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Książki na temat „Ion Beam Lithography”

Autor: Grafiati

Data publikacji: 4 czerwca 2021

Data aktualizacji: 31 stycznia 2023

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Sprawdź 36 najlepszych książek naukowych na temat „Ion Beam Lithography”.

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1

Gu, Wenqi. Dian zi shu bao guang wei na jia gong ji shu. Beijing: Beijing gong ye da xue chu ban she, 2004.

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2

The physics of submicron lithography. New York: Plenum Press, 1992.

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3

Popov, V. K. Raschet i proektirovanie ustroĭstv ėlektronnoĭ i ionnoĭ litografii. Moskva: "Radio i svi͡a︡zʹ", 1985.

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4

International Symposium on Electron, Ion, and Photon Beams (2nd 1984 Tarrytown, N.Y.). Proceedings of the 1984 International Symposium on Electron, Ion, and Photon Beams, 29 May-1 June, 1984, Westchester Marriott Hotel, Tarrytown, New York. Redaktorzy Kelly J, American Vacuum Society i American Institute of Physics. New York: Published for the American Vacuum Society by the American Institute of Physics, 1985.

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5

Dian zi shu sao miao pu guang ji shu. [Peking]: Yu hang chu ban she, 1985.

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6

S, Khokle W., red. Patterning of material layers in submicron region. New York: J. Wiley, 1993.

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7

1931-, Bethge Klaus, red. Ion tracks and microtechnology: Principles and applications. Braunschweig: Vieweg, 1990.

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8

T, Reid David, red. Rapid prototyping & manufacturing: Fundamentals of stereolithography. Dearborn, MI: Society of Manufacturing Engineers in cooperation with the Computer and Automated Systems Association of SME, 1992.

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9

1975-, Ma Xiangguo, i Li Wenping 1976-, red. Ju jiao li zi shu wei na jia gong ji shu. Beijing: Beijing gong ye da xue chu ban she, 2006.

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10

service), SpringerLink (Online, red. Stereolithography: Materials, Processes and Applications. Boston, MA: Springer Science+Business Media, LLC, 2011.

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11

Stereolithography and other RP&M technologies: From rapid prototyping to rapid tooling. Dearborn, Mich: Society of Manufacturing Engineers in cooperation with the Rapid Prototyping Association of SME, 1996.

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12

D, Blais Phillip, i Society of Photo-optical Instrumentation Engineers., red. Electron-beam, x-ray, and ion-beam lithographies VI: [proceedings] 5-6 March 1987, Santa Clara, California. Bellingham, Wash., USA: The Society, 1987.

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13

W, Yanof Arnold, i Society of Photo-optical Instrumentation Engineers., red. Electron-beam, X-ray, and ion-beam technology: Submicrometer lithographies VII : 2-4 March 1988, Santa Clara, California. Bellingham, Wash., USA: The Society, 1988.

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14

D, Blais Phillip, i Society of Photo-optical Instrumentation Engineers., red. Electron-beam, x-ray & ion-beam techniques for submicrometer lithographies V: 11-12 March 1986, Santa Clara, California. Bellingham, Wash., USA: SPIE--the International Society for Optical Engineering, 1986.

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15

W, Yanof Arnold, Society of Photo-optical Instrumentation Engineers. i SPIE Symposium on Microlithography (1989 : San Jose, Calif.), red. Electron-beam, X-ray, and ion-beam technology: Submicrometer lithographies VIII : 1-3 March 1989, San Jose, California. Bellingham, Wash., USA: SPIE, 1989.

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16

D, Blais Phillip, i International Society for Hybrid Microelectronics., red. Electron-beam, X-ray, & ion-beam techniques for submicrometer lithographies V: 11-12 March, 1986, Santa Clara, California. Bellinham, Wash., USA: SPIE--the International Society for Optical Engineering, 1986.

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17

1946-, Peckerar Martin Charles, i Society of Photo-optical Instrumentation Engineers., red. Electon-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing: 6-7 March 1991, San Jose, California. Bellingham, Wash: SPIE, 1991.

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18

D, Blais Phillip, i International Society for Hybrid Microelectronics., red. Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV: March 14-15, 1985, Santa Clara, California. Bellingham, Wash., USA: SPIE--the International Society for Optical Engineering, 1985.

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19

Yanof, Arnold W. Electron-Beam, X Ray, and Ion-Beam Technology; Submicrometer Lithographics VII (Proceedings of SPIE--the International Society for Optical Engineering). Society of Photo Optical, 1988.

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20

M, Warlaumont John, Society of Photo-optical Instrumentation Engineers. i Semiconductor Equipment and Materials International., red. Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V: 20-21 February 1995, Santa Clara, California. Bellingham, Wash., USA: SPIE, 1995.

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21

E, Seeger David, Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International. i SEMATECH (Organization), red. Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI: 11-13 March 1996, Santa Clara, California. Bellingham, Wash: SPIE, 1996.

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22

Keskinbora, Kahraman. Prototyping Micro- and Nano-Optics with Focused Ion Beam Lithography. SPIE, 2019. http://dx.doi.org/10.1117/3.2531118.

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23

O, Patterson David, i Society of Photo-optical Instrumentation Engineers., red. Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III: 1-2 March 1993, San Jose, California. Bellingham, Wash: The Society, 1993.

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24

1946-, Peckerar Martin Charles, i Society of Photo-optical Instrumentation Engineers., red. Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing II: 8-9 March 1992, San Jose, California. Bellingham, Wash: SPIE, 1992.

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25

O, Patterson David, Society of Photo-optical Instrumentation Engineers. i Semiconductor Equipment and Materials International., red. Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV: 28 February-1 March 1994, San Jose, California. Bellingham, Wash: SPIE, 1994.

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26

James, Bondur, Reinberg Alan R i Society of Photo-optical Instrumentation Engineers., red. Dry processing for submicrometer lithography: 12-13 October 1989, Santa Clara, California. Bellingham, Wash., USA: The Society, 1990.

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27

Ann, MacDonald Carolyn, i Society of Photo-optical Instrumentation Engineers., red. EUV, X-ray, and neutron optics and sources: 21-23 July 1999, Denver, Colorado. Bellingham, Wash., USA: SPIE, 1999.

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28

Spohr, Reimar. Ion Tracks and Microtechnology: Principles and Applications. Springer Vieweg. in Springer Fachmedien Wiesbaden GmbH, 2012.

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29

Jacobs, Paul F. Rapid Prototyping & Manufacturing: Fundamentals of Stereolithography. Mcgraw-Hill (Tx), 1993.

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30

Rapid prototyping & manufacturing: Fundamentals of stereolithography. Dearborn, MI: Society of Manufacturing Engineers in cooperation with the Computer and Automated Systems Association of SME, 1992.

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31

Springer i Joachim Bargon. Methods and Materials in Microelectronic Technology. Springer, 2012.

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32

Bargon, Joachim. Methods and Materials in Microelectronic Technology. Springer London, Limited, 2013.

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33

Gallop, J., i L. Hao. Superconducting Nanodevices. Redaktor A. V. Narlikar. Oxford University Press, 2017. http://dx.doi.org/10.1093/oxfordhb/9780198738169.013.17.

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This article reviews recent progress in superconducting nanodevices, with particular emphasis on fabrication methods developed for superconducting nanowires and nanoscale Josephson junctions based on different barrier materials. It evaluates the future potential of superconducting nanodevices, including nano-superconducting quantum interference devices (nanoSQUIDs), in light of improvements in nanoscale fabrication and manipulation techniques, along with their likely impacts on future quantum technology and measurement. The article first considers efforts to realize devices at the physical scale of 100 nm and below before discussing different types of Josephson junction such as trilayer junctions. It also describes the use of focused ion beam milling and electron beam lithography techniques for junction fabrication at the nanoscale and the improved energy sensitivity detectable with a nanoSQUID. Finally, it looks at a range of applications for nanoSQUIDs, superconducting single photon detectors, and other superconducting nanodevices.

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34

Hong, M. H. Laser applications in nanotechnology. Redaktorzy A. V. Narlikar i Y. Y. Fu. Oxford University Press, 2017. http://dx.doi.org/10.1093/oxfordhb/9780199533060.013.24.

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This article discusses a variety of laser applications in nanotechnology. The laser has proven to be one of many mature and reliable manufacturing tools, with applications in modern industries, from surface cleaning to thin-film deposition. Laser nanoengineering has several advantages over electron-beam and focused ion beam processing. For example, it is a low-cost, high-speed process in air, vacuum or chemical environments and also has the capability to fulfill flexible integration control. This article considers laser nanotechnology in the following areas: pulsed laser ablation for nanomaterials synthesis; laser nanoprocessing to make nanobumps for disk media nanotribology and anneal ultrashort PN junctions; surface nanopatterning with near-field, and light-enhancement effects; and large-area parallel laser nanopatterning by laser interference lithography and laser irradiation through a microlens array. Based on these applications, the article argues that the laser will continue to be one of the highly potential nanoengineering means in next-generation manufacturing.

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35

McGuiness, C. L., R. K. Smith, M. E. Anderson, P. S. Weiss i D. L. Allara. Nanolithography using molecular films and processing. Redaktorzy A. V. Narlikar i Y. Y. Fu. Oxford University Press, 2017. http://dx.doi.org/10.1093/oxfordhb/9780199533060.013.23.

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This article focuses on the use of molecular films as building blocks for nanolithography. More specifically, it reviews efforts aimed at utilizing organic molecular assemblies in overcoming the limitations of lithography, including self-patterning and directed patterning. It considers the methods of patterning self-assembled organic monolayer films through soft-lithographic methods such as microcontact printing and nanoimprint lithography, through direct ‘write’ or ‘machine’ processes with a nanometer-sized tip and through exposure to electron or photon beams. It also discusses efforts to pattern the organic assemblies via the physicochemical self-assembling interactions, including patterning via phase separation of chemically different molecules and insertion of guest adsorbates into host matrices. Furthermore, it examines the efforts that have been made to couple patterned molecular assemblies with inorganic thin-film growth methods to form spatially constrained, three-dimensional thin films. Finally, it describes a hybrid self-assembly/conventional lithography (i.e. molecular rulers) approach to forming nanostructures.

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36

Hazzard-Donald, Katrina. Healin’ da Sick, Raisin’ da Daid. University of Illinois Press, 2017. http://dx.doi.org/10.5406/illinois/9780252037290.003.0007.

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This chapter examines Hoodoo as health care and the role of the African American midwife in the old tradition black belt Hoodoo complex. Scholarship has totally overlooked a discussion of traditional Hoodoo healers: treaters, midwives, and root doctors. Even African Americans who know anything of contemporary Hoodoo will usually not immediately associate it with medicinal herbalism. Hoodoo marketeers were neither interested in nor had access to this aspect of Hoodoo. This chapter considers how Hoodoo midwives, treaters, and root doctors mastered treatments and developed their regional pharmacopoeia. It discusses one technique used by all three types of Hoodoo health care providers: the method of using string to tie sacred healing knots. It also describes nine types of healing amulets used in Hoodoo: single-knot string amulet; multiknot amulet; root necklace; prayer bead necklace; prayer cloth; biblical scroll; walking cane; religious lithography; and silver coin.

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