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1

Pathak, Anand P., Devesh K. Avasthi i Bhupendra N. Dev. "Ion beam analysis". Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 266, nr 8 (kwiecień 2008): iii. http://dx.doi.org/10.1016/j.nimb.2008.03.093.

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2

FUJIMOTO, Fuminori. "Ion beam analysis." Bunseki kagaku 40, nr 11 (1991): 577–97. http://dx.doi.org/10.2116/bunsekikagaku.40.11_577.

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Kramer, Edward J. "Ion-Beam Analysis of Polymer Surfaces and Interfaces". MRS Bulletin 21, nr 1 (styczeń 1996): 37–42. http://dx.doi.org/10.1557/s0883769400035144.

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Ion-beam analysis of chemical composition as a function of depth is by now well-established for inorganic materials and is an important method of investigating growth of thin films. It has been applied to polymers much more recently, perhaps because fairly obvious problems with radiation damage discouraged workers in this field initially. Ion-beam analysis has developed, however, into a analytical tool that complements other methods, such as x-ray photoelectron spectroscopy and neutron reflection, very well. The purpose of this short article is to give the reader an introduction to its current uses in polymers.The ion beams of ion-beam analysis are typically highly energetic (1–5 MeV) beams of 4He++. While other beams are used, for example, 3He and 15N, alpha particle beams are used in the vast majority of experiments reported in the literature. Two major categories of experiments are carried out with such beams. Rutherford backscattering (RBS) spectrometry to detect heavy elements in the polymer and forward recoil spectrometry (FRES) (also known as elastic recoil detection) to detect the isotopes hydrogen and deuterium. The basic principles for each method are similar.
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Al-Bayati, A. H., K. G. Orrman-Rossiter, D. G. Armour, J. A. Van den Berg i S. E. Donnelly. "Ion beam deposition and in-situ ion beam analysis". Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 63, nr 1-2 (styczeń 1992): 109–19. http://dx.doi.org/10.1016/0168-583x(92)95179-u.

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Mingay, D. W., V. M. Prozesky i P. B. Kotzé. "Prompt ion beam analysis by pulsed beams". Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 35, nr 3-4 (grudzień 1988): 339–43. http://dx.doi.org/10.1016/0168-583x(88)90293-5.

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Cookson, J. A., i T. W. Conlon. "MeV ion-beam analysis". Journal of Research of the National Bureau of Standards 93, nr 3 (maj 1988): 473. http://dx.doi.org/10.6028/jres.093.123.

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Ishii, Yasuyuki, i Takeru Ohkubo. "Analysis of Ion-Species of a Dedicated Duoplasmatron-type Ion Source for a 100 keV-Rage Compact Ion-Microbeam System". Journal of Physics: Conference Series 2326, nr 1 (1.10.2022): 012013. http://dx.doi.org/10.1088/1742-6596/2326/1/012013.

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Abstract Hydrogen-ion beam species generated by a dedicated duoplasmatron-type ion source that was developed for a MeV compact ion-microbeam system was experimentally analyzed in a test bench to study the ion source feature. Bimolecular and trimolecular hydrogen-ion beams were mainly generated by the duoplasmatron-type ion source. The ratio of the two different molecular hydrogen-ion beams was controlled by turning hydrogen-gas pressure. This experiment showed that the duoplasmatron-type ion source could produce a single molecular hydrogen-ion beam for ion-microbeam applications.
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8

Bahng, Jungbae, Yuncheol Kim, Young-woo Lee, Jinsung Yu, Seung-Hee Nam, Bong-Hyuk Choi i Yongbae Jeon. "Multi-filament ion source for uniform ion beam generation". Journal of Physics: Conference Series 2743, nr 1 (1.05.2024): 012054. http://dx.doi.org/10.1088/1742-6596/2743/1/012054.

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Abstract Ion beams are employed in various fields such as semiconductor manufacturing, surface modification and material science. The uniformity of ion beams is crucial in many applications, but conventional ion sources that use a single filament often limit the uniformity and intensity of the ion beam. This paper presents a study that aims to optimize a multi-filament ion source to enhance the uniformity of ion beams. The study includes a detailed explanation of the ion source components and design, methods for measuring ion beam uniformity with its experimental design, followed by results, analysis, discussions and conclusions, completed by suggestions for future research directions. The experimental results demonstrate that the use of a multi-filament ion source improves ion beam uniformity compared to a single-filament ion source. An optimal design for the ion source components and new approaches for improving ion beam uniformity are described. The study’s results provide important information for improving ion beam uniformity and offer a technical basis for providing high-quality products and services in various industries.
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9

Matuo, Youichirou, Yoshinobu Izumi, Ayako N. Sakamoto, Yoshihiro Hase, Katsuya Satoh i Kikuo Shimizu. "Molecular Analysis of Carbon Ion-Induced Mutations in DNA Repair-Deficient Strains of Saccharomyces cerevisiae". Quantum Beam Science 3, nr 3 (2.07.2019): 14. http://dx.doi.org/10.3390/qubs3030014.

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Mutations caused by ion beams have been well-studied in plants, including ornamental flowers, rice, and algae. It has been shown that ion beams have several significantly interesting features, such as a high biological effect and unique mutation spectrum, which is in contrast to low linear energy transfer (LET) radiation such as gamma rays. In this study, the effects of double strand breaks and 8-oxo-2′-deoxyguanosine (8-oxodG) caused by ion-beam irradiation were examined. We irradiated repair-gene-inactive strains rad52, ogg1, and msh2 using carbon ion beams, analyzed the lethality and mutagenicity, and characterized the mutations. High-LET carbon ion-beam radiation was found to cause oxidative base damage, such as 8-oxodG, which can lead to mutations. The present observations suggested that nucleotide incorporation of oxidative damage gave only a limited effect on cell viability and genome fidelity. The ion-beam mutations occurred predominantly in 5′-ACA-3′ sequences, and we detected a hotspot at around +79 to +98 in URA3 in wild-type and mutant lines, suggesting the presence of a mutation-susceptible region.
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10

Martinsson, Bengt G., i Hans-Christen Hansson. "Ion beam thermography — analysis of chemical compounds using ion beam techniques". Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 34, nr 2 (sierpień 1988): 203–8. http://dx.doi.org/10.1016/0168-583x(88)90744-6.

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11

Ujihira, Y. "Chemical analysis by ion beam". International Journal of Radiation Applications and Instrumentation. Part A. Applied Radiation and Isotopes 37, nr 1 (styczeń 1986): 83–84. http://dx.doi.org/10.1016/0883-2889(86)90220-0.

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12

Sasaki, Yuichi, Kenichiro Yoshida, Fumitaka Nishiyama, Takafumi Yao, Ziqiang Zhu, Hiroshi Mori i Mitsuo Kawashima. "Ion Beam Analysis of ZnSe". Japanese Journal of Applied Physics 31, Part 2, No. 4B (15.04.1992): L449—L451. http://dx.doi.org/10.1143/jjap.31.l449.

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13

Szökefalvi-Nagy, Z. "Ion beam analysis of metalloproteins". Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 109-110 (kwiecień 1996): 234–38. http://dx.doi.org/10.1016/0168-583x(95)00913-2.

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14

Bethge, K. "Ion beam analysis of nitrogen". Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 66, nr 1-2 (marzec 1992): 146–57. http://dx.doi.org/10.1016/0168-583x(92)96148-r.

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15

Zhou, Lin, Yi Fan Dai, Xu Hui Xie, Chang Jun Jiao i Sheng Yi Li. "Analysis of Correcting Ability of Ion Beam Figuring". Key Engineering Materials 364-366 (grudzień 2007): 470–75. http://dx.doi.org/10.4028/www.scientific.net/kem.364-366.470.

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In ion beam figuring process, typically, the smaller ion beam diameter has a good ability to “correct” the optical surface error, i.e. the smaller ion beam diameter indicates the higher material removal efficiency ε. The material removal efficiency is defined as the ratio of the volume of desired material removal to that of the real material removal. However the smaller ion beam diameter always results in more processing time, which usually decreases the process reliability. In this paper, the relationship between the material removal efficiency and the ion beam diameter is analyzed. The theoretical result shows that the material removal efficiency is a negative exponential function of the ratio of ion beam diameter to the spatial error wavelength, (i.e. d/λ). And when d/λ= 0.5, the material removal efficiency is 87%, which is acceptable in ion beam figuring process. When d/λ = 1, it rapidly decreases to 58%, which is unacceptable. According to theoretical analysis and simulation results, we recommend that d/λ should be less than 0.5 in order to obtain acceptable material removal efficiency in ion beam figuring process.
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16

METSON, J. B., i M. J. GUSTAFSSON. "COMPLEMENTARY TECHNIQUES TO HIGH ENERGY ION BEAM ANALYSIS". Modern Physics Letters B 15, nr 28n29 (20.12.2001): 1402–10. http://dx.doi.org/10.1142/s0217984901003329.

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Ion beam analysis methods generally rely on either the scattering of a high energy primary particle, or secondary process arising from the stopping of this particle in the substrate. The information typically obtained is the identification and quantitation of elements present, often resolved in terms of their depth distribution. However, there are a variety of techniques which offer complementary information on the structure composition and chemistry of a surface. These are typified by rather softer interactions with the surface, typified by low energy (kV) ion beams or photons, which interact with the surface in rather more complex manner than higher energy ion beams. The combination of energy and momentum transfer for the ion beams, makes these methods less quantitative, but opens up the potential for more chemically detailed information on the nature of the surface. Secondary ion mass spectrometry (SIMS), both static and dynamic, and X-ray Photoelectron Spectroscopy (XPS) will be discussed in some detail. SIMS offers excellent compositional depth profiling capability, but offers poor quantitation, while XPS offers unparalleled chemical detail, but limited lateral and depth resolution. The underlying processes which dictate the strengths and limitations of these techniques are discussed, along with a number of typical applications to the analysis of oxide films and polymeric materials.
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17

KATAYAMA, Mitsuhiro, i Masakazu AONO. "Fundamentals and Present Aspects of Ion Beam Technology IV. Ion Beam Analysis". RADIOISOTOPES 44, nr 6 (1995): 412–28. http://dx.doi.org/10.3769/radioisotopes.44.6_412.

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18

Orbons, S. M., L. van Dijk, M. Bozkurt, P. N. Johnston, P. Reichart i D. N. Jamieson. "Focused ion beam machined nanostructures depth profiled by macrochannelling ion beam analysis". Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 249, nr 1-2 (sierpień 2006): 747–51. http://dx.doi.org/10.1016/j.nimb.2006.03.179.

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19

Madala, Surendra. "Plasma FIB Provides Vital Delayering and Site-Specific Failure Analysis Capabilities for Larger-Scale Structures". EDFA Technical Articles 18, nr 1 (1.02.2016): 30–35. http://dx.doi.org/10.31399/asm.edfa.2016-1.p030.

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Abstract Plasma focused ion beam (PFIB) systems can generate ion beams with much higher current and are therefore able to remove larger volumes of material at much faster rates while still maintaining precise control of the beam and its milling action. This article explains how the improved performance of PFIB is leading to new applications in delayering, deprocessing, and site-specific failure analysis.
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20

Schlemm, H. "Ion beam impurity analysis of radio-frequency mass filtered broad ion beams". Review of Scientific Instruments 69, nr 2 (luty 1998): 1191–93. http://dx.doi.org/10.1063/1.1148662.

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21

Appleton, B. R., R. A. Zuhr, T. S. Noggle, N. Herbots, S. J. Pennycook i G. D. Alton. "Ion Beam Deposition". MRS Bulletin 12, nr 2 (marzec 1987): 52–59. http://dx.doi.org/10.1557/s0883769400068408.

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Ion beam processing of materials has a tradition at Oak Ridge National Laboratory that is as old as the laboratory itself. Consequently, when we began looking for a competitive way to participate in the excitement and new physics beginning to emerge from the fabrication and study of artificially structured materials, it was natural to look for a growth technique that incorporated ion beam processing. Our division, the Solid State Division, has a variety of ion implantation and ion beam analysis accelerators which are integrated with pulsed-laser sources into ultrahigh vacuum (UHV) surface analysis and processing chambers. These facilities allow us to do ion beam and laser processing of materials in UHV at temperatures from liquid helium to several hundred degrees centigrade and to study these alterations in situ by a variety of ion beam (ion scattering, ion channeling, nuclear reactions, etc.) and surface analysis (low energy electron diffraction, Auger, etc.) techniques. Since isotope separation has been done continually at ORNL for almost 45 years, the idea and advantages for altering this technique to do materials fabrication in UHV were immediately obvious. In the following article we will briefly review the history of the ion beam deposition (IBD) concept, describe our preliminary apparatus, and point out the inherent advantages of IBD for fabricating and studying artificially structured materials. Recent results obtained by IBD will be presented.
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22

Jia-Richards, Oliver. "Quantification of ionic-liquid ion source beam composition from time-of-flight data". Journal of Applied Physics 132, nr 7 (21.08.2022): 074501. http://dx.doi.org/10.1063/5.0094699.

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Ionic-liquid ion sources produce beams of charged particles through evaporation and acceleration of ions and charged droplets from the surface of an ionic liquid. The composition of the emitted beam can impact the performance of ion sources for various applications such as focused beams for microfabrication and space propulsion. Numerical inference is considered for quantification of the beam composition of an ionic-liquid ion source through determining the current fraction of different species along with providing uncertainty in inferred values. An analysis of previously presented data demonstrates the ability to quantify the presence of ion clusters, including the distinct presence of heavy ion clusters such as heptamers. Quantification of beam composition will be an important technique for quantitative comparison of different time-of-flight data.
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23

Ishii, K., i S. Morita. "Depth profiling by ion-beam analysis". Acta Physica Hungarica 65, nr 2-3 (czerwiec 1989): 151–57. http://dx.doi.org/10.1007/bf03156058.

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24

Knapp, J. A., J. C. Barbour i B. L. Doyle. "Ion beam analysis for depth profiling". Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 10, nr 4 (lipiec 1992): 2685–90. http://dx.doi.org/10.1116/1.577959.

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25

Biron, Isabelle, i S. bastien Beauchoux. "Ion beam analysis of Mosan enamels". Measurement Science and Technology 14, nr 9 (29.07.2003): 1564–78. http://dx.doi.org/10.1088/0957-0233/14/9/308.

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Moncoffre, N., G. Barbier, E. Leblond, Ph Martin i H. Jaffrezic. "Diffusion studies using ion beam analysis". Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 140, nr 3-4 (maj 1998): 402–8. http://dx.doi.org/10.1016/s0168-583x(98)00116-5.

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Szilágyi, E. "Energy spread in ion beam analysis". Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 161-163 (marzec 2000): 37–47. http://dx.doi.org/10.1016/s0168-583x(99)00671-0.

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Sjöland, K. A., F. Munnik i U. Wätjen. "Uncertainty budget for Ion Beam Analysis". Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 161-163 (marzec 2000): 275–80. http://dx.doi.org/10.1016/s0168-583x(99)00911-8.

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Szilágyi, E., E. Kótai i D. G. Merkel. "Ion-beam analysis of insulator samples". Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 450 (lipiec 2019): 184–88. http://dx.doi.org/10.1016/j.nimb.2018.08.026.

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Nordlund, K. "Molecular dynamics for ion beam analysis". Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 266, nr 8 (kwiecień 2008): 1886–91. http://dx.doi.org/10.1016/j.nimb.2007.11.056.

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31

Raepsaet, C., H. Khodja, P. Bossis, Y. Pipon i D. Roudil. "Ion beam analysis of radioactive samples". Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 267, nr 12-13 (czerwiec 2009): 2245–49. http://dx.doi.org/10.1016/j.nimb.2009.03.022.

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Sofield, CJ, i JA Cookson. "Ion beam analysis of thin films". Vacuum 35, nr 10-11 (październik 1985): 513. http://dx.doi.org/10.1016/0042-207x(85)90386-0.

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33

Boerma, D. O. "Materials analysis using ion beam techniques". Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 50, nr 1-4 (kwiecień 1990): 77–90. http://dx.doi.org/10.1016/0168-583x(90)90335-r.

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David, Daniel. "New trends in ion-beam analysis". Surface Science Reports 16, nr 7 (listopad 1992): 333–75. http://dx.doi.org/10.1016/0167-5729(92)90001-r.

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Leavitt, J. A., L. C. McIntyre, M. D. Ashbaugh, R. P. Cox, Z. Lin i R. B. Gregory. "Ion-beam analysis of silicon carbide". Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 118, nr 1-4 (wrzesień 1996): 613–16. http://dx.doi.org/10.1016/0168-583x(95)01462-4.

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Vickridge, I. C., I. W. M. Brown, T. C. Ekström i W. J. Trompetter. "Ion beam analysis of sialon ceramics". Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 118, nr 1-4 (wrzesień 1996): 608–12. http://dx.doi.org/10.1016/0168-583x(96)00244-3.

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Malmqvist, Klas G. "Ion beam analysis for the environment". Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 85, nr 1-4 (marzec 1994): 84–94. http://dx.doi.org/10.1016/0168-583x(94)95791-6.

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Demortier, Guy. "Ion beam analysis of gold jewelry". Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 64, nr 1-4 (luty 1992): 481–87. http://dx.doi.org/10.1016/0168-583x(92)95520-2.

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Kuiper, A. E. T., i F. H. P. M. Habraken. "Ion beam analysis of interface reactions". Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 64, nr 1-4 (luty 1992): 739–43. http://dx.doi.org/10.1016/0168-583x(92)95569-d.

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40

Rizzutto, M. A., N. Added, M. H. Tabacniks, F. Falla-Sotelo, J. F. Curado, C. Francci, R. A. Markarian i in. "Teeth characterization using ion beam analysis". Journal of Radioanalytical and Nuclear Chemistry 269, nr 3 (wrzesień 2006): 683–87. http://dx.doi.org/10.1007/s10967-006-0286-3.

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41

Balaji, S., S. Amirthapandian, B. K. Panigrahi, S. Kalavathi, G. Mangamma, Ajay Gupta, K. G. M. Nair i A. K. Tyagi. "Study of ion beam mixing in Pt/Co bilayer by ion beam analysis". Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 266, nr 8 (kwiecień 2008): 1692–96. http://dx.doi.org/10.1016/j.nimb.2008.01.055.

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Tan, Qiuyun, Kun Zhu, Pingping Gan, Qi Fu, Haipeng Li, Matt Easton, Shuo Liu i in. "Beam commissioning and analysis of a continuous-wave window-type deuteron radio-frequency quadrupole". International Journal of Modern Physics E 29, nr 02 (luty 2020): 1950111. http://dx.doi.org/10.1142/s0218301319501118.

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As high-intensity beams are required for various applications, high-power, high-current, continuous-wave (CW) radio-frequency quadrupole (RFQ) accelerators have become a research focus in recent years and also a direction for development in the future. To master and accumulate the advanced technology in design, fabrication and operation of high-current CW RFQs, the RFQ group at Peking University has built a window-type CW RFQ, operating at 162.5[Formula: see text]MHz, to accelerate a 50-mA deuteron beam from 50[Formula: see text]keV to 1[Formula: see text]MeV. It is the first relatively high-frequency window-type CW RFQ in the world. A [Formula: see text] ion beam extracted from an electron cyclotron resonance (ECR) ion source was used for the beam commissioning because deuteron beam acceleration will produce a serious radiation risk. We compared and analyzed the measurement results obtained during the beam commissioning with simulations. The data show good consistency in many respects. For the discrepancies, we explain the issues in detail. We achieved stable and robust acceleration of about 1.5[Formula: see text]mA CW [Formula: see text] for 1[Formula: see text]h. Finally, we discuss the differences between [Formula: see text] ion beam acceleration and deuteron beam acceleration.
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43

Ma, Xiaoyun, Mengling Zhang, Wanbin Meng, Xiaoli Lu, Ziheng Wang i Yanshan Zhang. "Analysis of the Dose Drop at the Edge of the Target Area in Heavy Ion Radiotherapy". Computational and Mathematical Methods in Medicine 2021 (11.11.2021): 1–6. http://dx.doi.org/10.1155/2021/4440877.

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Background. The dose distribution of heavy ions at the edge of the target region will have a steep decay during radiotherapy, which can better protect the surrounding organs at risk. Objective. To analyze the dose decay gradient at the back edge of the target region during heavy ion radiotherapy. Methods. Treatment planning system (TPS) was employed to analyze the dose decay at the edge of the beam under different incident modes and multiple dose segmentation conditions during fixed beam irradiation. The dose decay data of each plan was collected based on the position where the rear edge of the beam began to fall rapidly. Uniform scanning mode was selected in heavy ion TPS. Dose decay curves under different beam setup modes were drawn and compared. Results. The dose decay data analysis showed that in the case of single beam irradiation, the posterior edge of the beam was 5 mm away, and the posterior dose could drop to about 20%. While irradiation in opposite direction, the posterior edge of the beam was 5 mm away, and the dose could drop to about 50%. In orthogonal irradiation of two beams, the posterior edge of the beam could drop to about 30-38% in a distance of 5 mm. Through the data analysis in the TPS, the sharpness of the dose at the back edge of the heavy ion beam is better than that at the lateral edge, but the generated X-ray contamination cannot be ignored. Conclusions. The effect of uneven CT value on the dose decay of heavy ion beam should also be considered in clinical treatment.
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44

Wang, Y. Q. "Ion beam analysis of ion-implanted polymer thin films". Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 161-163 (marzec 2000): 1027–32. http://dx.doi.org/10.1016/s0168-583x(99)00989-1.

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Kennedy, V. J., A. Markwitz, U. D. Lanke, A. McIvor, H. J. Trodahl i A. Bittar. "Ion beam analysis of ion-assisted deposited amorphous GaN". Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 190, nr 1-4 (maj 2002): 620–24. http://dx.doi.org/10.1016/s0168-583x(01)01279-4.

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46

Barradas, N. P. "Advanced data analysis techniques for ion beam analysis". Surface and Interface Analysis 35, nr 9 (2003): 760–69. http://dx.doi.org/10.1002/sia.1599.

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47

Calligaro, T., J. C. Dran, B. Moignard, L. Pichon, J. Salomon i Ph Walter. "Ion beam analysis with external beams: Recent set-up improvements". Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 188, nr 1-4 (kwiecień 2002): 135–40. http://dx.doi.org/10.1016/s0168-583x(01)01062-x.

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48

Brogden, Valerie, Cameron Johnson, Chad Rue, Jeremy Graham, Kurt Langworthy, Stephen Golledge i Ben McMorran. "Material Sputtering with a Multi-Ion Species Plasma Focused Ion Beam". Advances in Materials Science and Engineering 2021 (13.01.2021): 1–9. http://dx.doi.org/10.1155/2021/8842777.

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Streszczenie:
Focused ion beams are an essential tool for cross-sectional material analysis at the microscale, preparing TEM samples, and much more. New plasma ion sources allow for higher beam currents and options to use unconventional ion species, resulting in increased versatility over a broader range of substrate materials. In this paper, we present the results of a four-material study from five different ion species at varying beam energies. This, of course, is a small sampling of the enormous variety of potential specimen and ion species combinations. We show that milling rates and texturing artifacts are quite varied. Therefore, there is a need for a systematic exploration of how different ion species mill different materials. There is so much to be done that it should be a community effort. Here, we present a publicly available automation script used to both measure sputter rates and characterize texturing artifacts as well as a collaborative database to which anyone may contribute. We also put forth some ideas for new applications of focused ion beams with novel ion species.
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49

Patel, S., P. Varma, M. S. Tiwari i N. Shukla. "Effect of ion beam on electromagnetic ion cyclotron instability in hot anisotropic plasma-particle aspect analysis". Annales Geophysicae 29, nr 8 (30.08.2011): 1469–78. http://dx.doi.org/10.5194/angeo-29-1469-2011.

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Abstract. Using the general loss-cone distribution function electromagnetic ion cyclotron (EMIC) instability affected by up going ion beam has been studied by investigating the trajectories of charged particles. The plasma consisting of resonant and non-resonant particles has been considered. It is assumed that the resonant particles participate in energy exchange with the wave, whereas non-resonant particles support the oscillatory motion of the wave. The effect of ion beam velocity on the dispersion relation, growth rate, parallel and perpendicular resonant energy of the EMIC wave with general loss-cone distribution function in hot anisotropic plasma is described by particle aspect approach. The effect of beam anisotropy and beam density on electromagnetic ion cyclotron instabilities is investigated. Growth length is derived for EMIC waves in hot anisotropic plasma. It is found that the effect of the ion beam is to reduce the energy of transversely heated ions, whereas the thermal anisotropy of the background plasma acts as a source of free energy for the EMIC wave and enhances the growth rate. It is observed that ion beam velocity opposite to the wave propagation and its density reduces the growth rate and enhance the reduction in perpendicularly heated ions energy. The effect of ion beam anisotropy on EMIC wave is also discussed. These results are determined for auroral acceleration region. It is also found that the EMIC wave emissions occur by extracting energy of perpendicularly heated ions in the presence of an up flowing ion beam.
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50

OURA, Kenjiro. "Fundamentals and Present Aspects of Ion Beam Technology. IV. Ion Beam Analysis. 7. Elastic recoil detection analysis." RADIOISOTOPES 44, nr 5 (1995): 364–68. http://dx.doi.org/10.3769/radioisotopes.44.364.

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