Książki na temat „Integrated measurements”
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Oettinger, Frank F. Thermal resistance measurements. Gaithersburg, MD: U.S. Dept. of Commerce, National Institute of Standards and Technology, 1990.
Znajdź pełny tekst źródłaOettinger, Frank F. Thermal resistance measurements. Gaithersburg, MD: U.S. Dept. of Commerce, National Institute of Standards and Technology, 1990.
Znajdź pełny tekst źródłaWiesław, Marciniak, i Przewłocki Henryk M, red. Diagnostic measurements in LSI/VLSI integrated circuits production. Singapore: World Scientific, 1991.
Znajdź pełny tekst źródłaMagrab, Edward B. Computer integrated experimentation. Berlin: Springer-Verlag, 1991.
Znajdź pełny tekst źródła1954-, Rubio Antonio, red. Thermal testing of integrated circuits. Boston: Kluwer Academic Publishers, 2002.
Znajdź pełny tekst źródłaEisenstadt, William Richard. High frequency measurements of integrated circuit devices and interconnect. Stanford, CA: StanfordUniversity, 1986.
Znajdź pełny tekst źródłaCorporation, Psychological, red. Integrated assessment system.: Swinging. San Antonio, Tex: Psychological Corporation, 1992.
Znajdź pełny tekst źródłaAltet, Josep. Thermal Testing of Integrated Circuits. Boston, MA: Springer US, 2002.
Znajdź pełny tekst źródłaMagrab, Edward B. Computer Integrated Experimentation. Berlin, Heidelberg: Springer Berlin Heidelberg, 1991.
Znajdź pełny tekst źródłaHoy, Bennett Marylyn, Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International. i SPIE Symposium on Microlithography (1994 : San Jose, Calif.), red. Integrated circuit metrology, inspection, and process control VIII: 28 February-2 March, San Jose, California. Bellingham, Wash., USA: SPIE, 1994.
Znajdź pełny tekst źródłaHoy, Bennett Marylyn, Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International. i SPIE Symposium on Microlithography (1994 : San Jose, Calif.), red. Integrated circuit metrology, inspection, and process control VIII: 28 February-2 March, San Jose, California. Bellingham, Wash., USA: SPIE, 1994.
Znajdź pełny tekst źródłaCorporation, Psychological, red. Integrated assessment system.: Paper clips. San Antonio, Tex: Psychological Corporation, 1992.
Znajdź pełny tekst źródłaCorporation, Psychological, red. Integrated assessment system.: Roller coasters. San Antonio, Tex: Psychological Corporation, 1992.
Znajdź pełny tekst źródłaUniversity of Wisconsin--Madison. Water Resources Center. i Geological Survey (U.S.). Water Resources Division. Wisconsin District., red. An integrated water-monitoring network for Wisconsin. Madison, WI: Wisconsin Water Resources Center, University of Wisconsin-Madison, 1998.
Znajdź pełny tekst źródłaCorporation, Psychological, red. Integrated assessment system.: Clean water. San Antonio, Tex: Psychological Corp., 1992.
Znajdź pełny tekst źródłaCorporation, Psychological, red. Integrated assessment system.: Spinning tops. San Antonio, Tex: Psychological Corporation, 1992.
Znajdź pełny tekst źródłaCorporation, Psychological, red. Integrated assessment system.: Send it flying. San Antonio, Tex: Psychological Corporation, 1992.
Znajdź pełny tekst źródłaCorporation, Psychological, red. Integrated assessment system.: Animals of long ago. San Antonio, Tex: Psychological Corporation, 1992.
Znajdź pełny tekst źródłaHoy, Bennett Marylyn, Society of Photo-optical Instrumentation Engineers. i Semiconductor Equipment and Materials International., red. Integrated circuit metrology, inspection, and process control IX: 20-22 February 1995, Santa Clara, California. Bellingham, Wash., USA: SPIE, 1995.
Znajdź pełny tekst źródłaN, Varner Ruth, Potzick James E i National Institute of Standards and Technology (U.S.), red. Antireflecting-chromium linewidth standard, SRM 475, for calibration of optical microscope linewidth measuring systems. Gaithersburg, MD: U.S. Dept. of Commerce, National Institute of Standards and Technology, 1992.
Znajdź pełny tekst źródłaN, Varner Ruth, Potzick James E i National Institute of Standards and Technology (U.S.), red. Antireflecting-chromium linewidth standard, SRM 475, for calibration of optical microscope linewidth measuring systems. Gaithersburg, MD: U.S. Dept. of Commerce, National Institute of Standards and Technology, 1992.
Znajdź pełny tekst źródłaHarald, Bosse, Bodermann Bernd, Silver Richard M, Wissenschaftliche Gesellschaft Lasertechnik, SPIE Europe, European Optical Society i Society of Photo-optical Instrumentation Engineers., red. Modeling aspects in optical metrology: 18-19 June 2007, Munich, Germany. Bellingham, Wash: SPIE, 2007.
Znajdź pełny tekst źródłaEurope, SPIE, European Optical Society, Wissenschaftliche Gesellschaft Lasertechnik i SPIE (Society), red. Modeling aspects in optical metrology II: 15-16 June 2009, Munich, Germany. Bellingham, Wash: SPIE, 2009.
Znajdź pełny tekst źródłaIEEE International Symposium on Virtual and Intelligent Measurement Systems (7th 2002 Girdwood, Anchorage, Alaska). VIMS 2002: 2002 IEEE International Symposium on Virtual and Intelligent Measurement Systems : Distributed intelligent sensing for advanced integrated virtual environments : Alyeska resort, Girdwood, Alaska, USA, 19-20 May 2002. Piscataway, N.J: IEEE, 2002.
Znajdź pełny tekst źródłaDickey, Donyall D. The integrated approach to student achievement: A results-driven model for improving performance, leadership, and the culture of instruction at your school. Highlands, TX: aha Process, Inc., 2010.
Znajdź pełny tekst źródłaVezzetti, Carol F. Antireflecting-chromium linewidth standard, SRM 475, for calibration of optical microscope linewidth measuring systems. Gaithersburg, MD: U.S. Dept. of Commerce, National Institute of Standards and Technology, 1992.
Znajdź pełny tekst źródłaVezzetti, Carol F. Antireflecting-chromium linewidth standard, SRM 475, for calibration of optical microscope linewidth measuring systems. Gaithersburg, MD: U.S. Dept. of Commerce, National Institute of Standards and Technology, 1992.
Znajdź pełny tekst źródłaVezzetti, Carol F. Antireflecting-chromium linewidth standard, SRM 475, for calibration of optical microscope linewidth measuring systems. Gaithersburg, MD: U.S. Dept. of Commerce, National Institute of Standards and Technology, 1992.
Znajdź pełny tekst źródłaVezzetti, Carol F. Antireflecting-chromium linewidth standard, SRM 475, for calibration of optical microscope linewidth measuring systems. Gaithersburg, MD: U.S. Dept. of Commerce, National Institute of Standards and Technology, 1992.
Znajdź pełny tekst źródłaXuping, Zhang, Zhongguo yi qi yi biao xue hui, Zhongguo guang xue xue hui, SPIE (Society) i Zhongguo yi qi yi biao xue hui. Optoelectronic-Mechanic Technology and System Integration Chapter, red. 2009 International Conference on Optical Instruments and Technology: Optoelectronic devices and integration : 19-21 October 2009, Shanghai, China. Bellingham, Wash: SPIE, 2009.
Znajdź pełny tekst źródłaVezzetti, Carol F. Antireflecting-Chromium linewidth standard, SRM 475, for calibration of optical microscope linewidth measuring systems. Gaithersburg, Md: U.S. Dept. of Commerce, Technology Administration, National Institute of Standards and Technology, 1992.
Znajdź pełny tekst źródłaE, Martner Brooks, i Wave Propagation Laboratory, red. A Field evaluation of remote sensor measurements of wind, temperature, and moisture for ARM integrated sounding system research. Boulder, Colo: United States Dept. of Commerce, National Oceanic and Atmospheric Administration, Environmental Research Laboratories, Wave Propagation Laboratory, 1991.
Znajdź pełny tekst źródłaGiannetti, Rosario. Turning up the heat!: A unit of study investigating heat energy : an integrated unit for grade 7. [Ontario: s.n.], 2001.
Znajdź pełny tekst źródłaVezzetti, Carol F. Bright-chromium linewidth standard, SRM 476, for calibration of optical microscope linewidth measuring systems. Gaithersburg, Md: U.S. Dept. of Commerce, National Institute of Standards and Technology, 1991.
Znajdź pełny tekst źródłaVezzetti, Carol F. Bright-chromium linewidth standard, SRM 476, for calibration of optical microscope linewidth measuring systems. Gaithersburg, MD: U.S. Dept. of Commerce, National Institute of Standards and Technology, 1991.
Znajdź pełny tekst źródłaVezzetti, Carol F. Bright-chromium linewidth standard, SRM 476, for calibration of optical microscope linewidth measuring systems. Gaithersburg, Md: U.S. Dept. of Commerce, National Institute of Standards and Technology, 1991.
Znajdź pełny tekst źródłaVezzetti, Carol F. Bright-chromium linewidth standard, SRM 476, for calibration of optical microscope linewidth measuring systems. Gaithersburg, Md: U.S. Dept. of Commerce, National Institute of Standards and Technology, 1991.
Znajdź pełny tekst źródłaSeaward, P. Gareth R. Integrated maternal serum screening and nuchal skin fold thickness measurements in the second trimester prenatal diagnosis of fetal down syndrome. Ottawa: National Library of Canada, 2003.
Znajdź pełny tekst źródłaPeters, Norman E. Hydrologic data from the Integrated-Lake Watershed Acidification Study in the west-central Adirondack Mountains, New York, October 1977 through January 1982. Denver, Colo: U.S. Dept. of the Interior, U.S. Geological Survey, 1987.
Znajdź pełny tekst źródłaPeters, Norman E. Hydrologic data from the Integrated-Lake Watershed Acidification Study in the west-central Adirondack Mountains, New York, October 1977 through January 1982. Denver, Colo: U.S. Dept. of the Interior, U.S. Geological Survey, 1987.
Znajdź pełny tekst źródłaS, Murdoch Peter, Dalton Frank N, University of Virginia i Geological Survey (U.S.), red. Hydrologic data from the Integrated-Lake Watershed Acidification Study in the west-central Adirondack Mountains, New York, October 1977 through January 1982. Denver, Colo: U.S. Dept. of the Interior, U.S. Geological Survey, 1987.
Znajdź pełny tekst źródłaRincón-Mora, Gabriel A. Voltage references: From diodes to precision high-order bandgap circuits. Piscataway, NJ: IEEE Press, 2002.
Znajdź pełny tekst źródłaUnited States. National Aeronautics and Space Administration, red. Final report entitled Comparison of long-wave and shortwave irradiances at satellite altitude with integrated scanner measurements using the nimbus 7 ERB data set. [Washington, D.C: National Aeronautics and Space Administration, 1986.
Znajdź pełny tekst źródłaHouse, Frederick Bishop. Final report entitled Comparison of long-wave and shortwave irradiances at satellite altitude with integrated scanner measurements using the nimbus 7 ERB data set. [Washington, D.C: National Aeronautics and Space Administration, 1986.
Znajdź pełny tekst źródłaS, Heyman Joseph, i Electronics Reliability and Measurement Technology Workshop (1986 : NASA Langley Research Center), red. Electronics reliability and measurement technology: Nondestructive evaluation. Park Ridge, N.J., U.S.A: Noyes Data Corp., 1988.
Znajdź pełny tekst źródłaKourtev, Ivan S. Timing Optimization Through Clock Skew Scheduling. Boston, MA: Springer US, 2000.
Znajdź pełny tekst źródłaDartman, Torbjo rn. Procams integrated ego-meter system: The computer system : computerised garment distribution system for taking individual measurements of customers in shops connected on-line to garment manufacturing factories. [Go teborg?]: Chalmers Teknicka Ho gakda, 1987.
Znajdź pełny tekst źródłaIEEE International Conference on Microelectronic Test Structures (1997 Monterey, Calif.). 1997 IEEE International Conference on Microelectronic Test Structures proceedings: March 17-20, 1997, Monterey, California. Piscataway, NJ: IEEE Service Center, 1997.
Znajdź pełny tekst źródłaPiziali, Andrew. Functional verification coverage measurement and analysis. Boston: Kluwer Academic Publishers, 2004.
Znajdź pełny tekst źródłaPiziali, Andrew. Functional verification coverage measurement and analysis. Boston: Kluwer Academic Publishers, 2004.
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