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1

Oettinger, Frank F. Thermal resistance measurements. Gaithersburg, MD: U.S. Dept. of Commerce, National Institute of Standards and Technology, 1990.

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2

Oettinger, Frank F. Thermal resistance measurements. Gaithersburg, MD: U.S. Dept. of Commerce, National Institute of Standards and Technology, 1990.

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3

Wiesław, Marciniak, i Przewłocki Henryk M, red. Diagnostic measurements in LSI/VLSI integrated circuits production. Singapore: World Scientific, 1991.

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4

Magrab, Edward B. Computer integrated experimentation. Berlin: Springer-Verlag, 1991.

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5

1954-, Rubio Antonio, red. Thermal testing of integrated circuits. Boston: Kluwer Academic Publishers, 2002.

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6

Eisenstadt, William Richard. High frequency measurements of integrated circuit devices and interconnect. Stanford, CA: StanfordUniversity, 1986.

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7

Corporation, Psychological, red. Integrated assessment system.: Swinging. San Antonio, Tex: Psychological Corporation, 1992.

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8

Altet, Josep. Thermal Testing of Integrated Circuits. Boston, MA: Springer US, 2002.

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9

Magrab, Edward B. Computer Integrated Experimentation. Berlin, Heidelberg: Springer Berlin Heidelberg, 1991.

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10

Hoy, Bennett Marylyn, Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International. i SPIE Symposium on Microlithography (1994 : San Jose, Calif.), red. Integrated circuit metrology, inspection, and process control VIII: 28 February-2 March, San Jose, California. Bellingham, Wash., USA: SPIE, 1994.

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11

Hoy, Bennett Marylyn, Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International. i SPIE Symposium on Microlithography (1994 : San Jose, Calif.), red. Integrated circuit metrology, inspection, and process control VIII: 28 February-2 March, San Jose, California. Bellingham, Wash., USA: SPIE, 1994.

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12

Corporation, Psychological, red. Integrated assessment system.: Paper clips. San Antonio, Tex: Psychological Corporation, 1992.

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13

Corporation, Psychological, red. Integrated assessment system.: Roller coasters. San Antonio, Tex: Psychological Corporation, 1992.

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14

University of Wisconsin--Madison. Water Resources Center. i Geological Survey (U.S.). Water Resources Division. Wisconsin District., red. An integrated water-monitoring network for Wisconsin. Madison, WI: Wisconsin Water Resources Center, University of Wisconsin-Madison, 1998.

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15

Corporation, Psychological, red. Integrated assessment system.: Clean water. San Antonio, Tex: Psychological Corp., 1992.

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16

Corporation, Psychological, red. Integrated assessment system.: Spinning tops. San Antonio, Tex: Psychological Corporation, 1992.

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17

Corporation, Psychological, red. Integrated assessment system.: Send it flying. San Antonio, Tex: Psychological Corporation, 1992.

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18

Corporation, Psychological, red. Integrated assessment system.: Animals of long ago. San Antonio, Tex: Psychological Corporation, 1992.

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19

Hoy, Bennett Marylyn, Society of Photo-optical Instrumentation Engineers. i Semiconductor Equipment and Materials International., red. Integrated circuit metrology, inspection, and process control IX: 20-22 February 1995, Santa Clara, California. Bellingham, Wash., USA: SPIE, 1995.

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20

N, Varner Ruth, Potzick James E i National Institute of Standards and Technology (U.S.), red. Antireflecting-chromium linewidth standard, SRM 475, for calibration of optical microscope linewidth measuring systems. Gaithersburg, MD: U.S. Dept. of Commerce, National Institute of Standards and Technology, 1992.

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21

N, Varner Ruth, Potzick James E i National Institute of Standards and Technology (U.S.), red. Antireflecting-chromium linewidth standard, SRM 475, for calibration of optical microscope linewidth measuring systems. Gaithersburg, MD: U.S. Dept. of Commerce, National Institute of Standards and Technology, 1992.

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22

Harald, Bosse, Bodermann Bernd, Silver Richard M, Wissenschaftliche Gesellschaft Lasertechnik, SPIE Europe, European Optical Society i Society of Photo-optical Instrumentation Engineers., red. Modeling aspects in optical metrology: 18-19 June 2007, Munich, Germany. Bellingham, Wash: SPIE, 2007.

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23

Europe, SPIE, European Optical Society, Wissenschaftliche Gesellschaft Lasertechnik i SPIE (Society), red. Modeling aspects in optical metrology II: 15-16 June 2009, Munich, Germany. Bellingham, Wash: SPIE, 2009.

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24

IEEE International Symposium on Virtual and Intelligent Measurement Systems (7th 2002 Girdwood, Anchorage, Alaska). VIMS 2002: 2002 IEEE International Symposium on Virtual and Intelligent Measurement Systems : Distributed intelligent sensing for advanced integrated virtual environments : Alyeska resort, Girdwood, Alaska, USA, 19-20 May 2002. Piscataway, N.J: IEEE, 2002.

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25

Dickey, Donyall D. The integrated approach to student achievement: A results-driven model for improving performance, leadership, and the culture of instruction at your school. Highlands, TX: aha Process, Inc., 2010.

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26

Vezzetti, Carol F. Antireflecting-chromium linewidth standard, SRM 475, for calibration of optical microscope linewidth measuring systems. Gaithersburg, MD: U.S. Dept. of Commerce, National Institute of Standards and Technology, 1992.

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27

Vezzetti, Carol F. Antireflecting-chromium linewidth standard, SRM 475, for calibration of optical microscope linewidth measuring systems. Gaithersburg, MD: U.S. Dept. of Commerce, National Institute of Standards and Technology, 1992.

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28

Vezzetti, Carol F. Antireflecting-chromium linewidth standard, SRM 475, for calibration of optical microscope linewidth measuring systems. Gaithersburg, MD: U.S. Dept. of Commerce, National Institute of Standards and Technology, 1992.

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29

Vezzetti, Carol F. Antireflecting-chromium linewidth standard, SRM 475, for calibration of optical microscope linewidth measuring systems. Gaithersburg, MD: U.S. Dept. of Commerce, National Institute of Standards and Technology, 1992.

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30

Xuping, Zhang, Zhongguo yi qi yi biao xue hui, Zhongguo guang xue xue hui, SPIE (Society) i Zhongguo yi qi yi biao xue hui. Optoelectronic-Mechanic Technology and System Integration Chapter, red. 2009 International Conference on Optical Instruments and Technology: Optoelectronic devices and integration : 19-21 October 2009, Shanghai, China. Bellingham, Wash: SPIE, 2009.

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31

Vezzetti, Carol F. Antireflecting-Chromium linewidth standard, SRM 475, for calibration of optical microscope linewidth measuring systems. Gaithersburg, Md: U.S. Dept. of Commerce, Technology Administration, National Institute of Standards and Technology, 1992.

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32

E, Martner Brooks, i Wave Propagation Laboratory, red. A Field evaluation of remote sensor measurements of wind, temperature, and moisture for ARM integrated sounding system research. Boulder, Colo: United States Dept. of Commerce, National Oceanic and Atmospheric Administration, Environmental Research Laboratories, Wave Propagation Laboratory, 1991.

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33

Giannetti, Rosario. Turning up the heat!: A unit of study investigating heat energy : an integrated unit for grade 7. [Ontario: s.n.], 2001.

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34

Vezzetti, Carol F. Bright-chromium linewidth standard, SRM 476, for calibration of optical microscope linewidth measuring systems. Gaithersburg, Md: U.S. Dept. of Commerce, National Institute of Standards and Technology, 1991.

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35

Vezzetti, Carol F. Bright-chromium linewidth standard, SRM 476, for calibration of optical microscope linewidth measuring systems. Gaithersburg, MD: U.S. Dept. of Commerce, National Institute of Standards and Technology, 1991.

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36

Vezzetti, Carol F. Bright-chromium linewidth standard, SRM 476, for calibration of optical microscope linewidth measuring systems. Gaithersburg, Md: U.S. Dept. of Commerce, National Institute of Standards and Technology, 1991.

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37

Vezzetti, Carol F. Bright-chromium linewidth standard, SRM 476, for calibration of optical microscope linewidth measuring systems. Gaithersburg, Md: U.S. Dept. of Commerce, National Institute of Standards and Technology, 1991.

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38

Seaward, P. Gareth R. Integrated maternal serum screening and nuchal skin fold thickness measurements in the second trimester prenatal diagnosis of fetal down syndrome. Ottawa: National Library of Canada, 2003.

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39

Peters, Norman E. Hydrologic data from the Integrated-Lake Watershed Acidification Study in the west-central Adirondack Mountains, New York, October 1977 through January 1982. Denver, Colo: U.S. Dept. of the Interior, U.S. Geological Survey, 1987.

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40

Peters, Norman E. Hydrologic data from the Integrated-Lake Watershed Acidification Study in the west-central Adirondack Mountains, New York, October 1977 through January 1982. Denver, Colo: U.S. Dept. of the Interior, U.S. Geological Survey, 1987.

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41

S, Murdoch Peter, Dalton Frank N, University of Virginia i Geological Survey (U.S.), red. Hydrologic data from the Integrated-Lake Watershed Acidification Study in the west-central Adirondack Mountains, New York, October 1977 through January 1982. Denver, Colo: U.S. Dept. of the Interior, U.S. Geological Survey, 1987.

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42

Rincón-Mora, Gabriel A. Voltage references: From diodes to precision high-order bandgap circuits. Piscataway, NJ: IEEE Press, 2002.

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43

United States. National Aeronautics and Space Administration, red. Final report entitled Comparison of long-wave and shortwave irradiances at satellite altitude with integrated scanner measurements using the nimbus 7 ERB data set. [Washington, D.C: National Aeronautics and Space Administration, 1986.

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44

House, Frederick Bishop. Final report entitled Comparison of long-wave and shortwave irradiances at satellite altitude with integrated scanner measurements using the nimbus 7 ERB data set. [Washington, D.C: National Aeronautics and Space Administration, 1986.

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45

S, Heyman Joseph, i Electronics Reliability and Measurement Technology Workshop (1986 : NASA Langley Research Center), red. Electronics reliability and measurement technology: Nondestructive evaluation. Park Ridge, N.J., U.S.A: Noyes Data Corp., 1988.

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46

Kourtev, Ivan S. Timing Optimization Through Clock Skew Scheduling. Boston, MA: Springer US, 2000.

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47

Dartman, Torbjo rn. Procams integrated ego-meter system: The computer system : computerised garment distribution system for taking individual measurements of customers in shops connected on-line to garment manufacturing factories. [Go teborg?]: Chalmers Teknicka Ho gakda, 1987.

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48

IEEE International Conference on Microelectronic Test Structures (1997 Monterey, Calif.). 1997 IEEE International Conference on Microelectronic Test Structures proceedings: March 17-20, 1997, Monterey, California. Piscataway, NJ: IEEE Service Center, 1997.

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49

Piziali, Andrew. Functional verification coverage measurement and analysis. Boston: Kluwer Academic Publishers, 2004.

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50

Piziali, Andrew. Functional verification coverage measurement and analysis. Boston: Kluwer Academic Publishers, 2004.

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