Gotowe bibliografie tematyczne / Focused Ion Beam machining

Spis treści

  1. Artykuły w czasopismach
  2. Rozprawy doktorskie
  3. Książki
  4. Części książek
  5. Streszczenia konferencji
  6. Raporty organizacyjne

Gotowa bibliografia na temat „Focused Ion Beam machining”

Autor: Grafiati
Data publikacji: 6 września 2023

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Artykuły w czasopismach na temat "Focused Ion Beam machining"

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Allen, D. M., P. Shore, R. W. Evans, et al. "Ion beam, focused ion beam, and plasma discharge machining." CIRP Annals 58, no. 2 (2009): 647–62. http://dx.doi.org/10.1016/j.cirp.2009.09.007.

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Hung, N. P., Y. Q. Fu, and M. Y. Ali. "Focused ion beam machining of silicon." Journal of Materials Processing Technology 127, no. 2 (2002): 256–60. http://dx.doi.org/10.1016/s0924-0136(02)00153-x.

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Young, Richard J. "Micro-machining using a focused ion beam." Vacuum 44, no. 3-4 (1993): 353–56. http://dx.doi.org/10.1016/0042-207x(93)90182-a.

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Chen, Yan, Li Bao An, and Xiao Xia Yang. "Recent Development of Focused Ion Beam System and Application." Advanced Materials Research 753-755 (August 2013): 2578–81. http://dx.doi.org/10.4028/www.scientific.net/amr.753-755.2578.

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Ultra-precision machining is used for many engineering applications where the traditional processes fail to work. Focused ion beam (FIB) technology is a very important part of the ultra-precision machining. It can realize the precise positioning, microscopic observation and micro machining. This paper introduces the FIB system and its application. FIB system contains ion source, focusing and scanning equipment and sample station. FIB technique has many unique and important functions. It is widely used in semiconductor device fabrication and circuit failure analysis. It can realize sample etchi
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Sun, Ji Ning, Xi Chun Luo, Wen Long Chang, and James M. Ritchie. "Fabrication of Freeform Micro Optics by Focused Ion Beam." Key Engineering Materials 516 (June 2012): 414–19. http://dx.doi.org/10.4028/www.scientific.net/kem.516.414.

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In this work, two kinds of freeform micro optics were successfully fabricated by using focused ion beam machining. A divergence compensation method was applied to optimize the machining process. Both dynamic variation of the sputter yield and the extra ion flux contributed by the beam tail were taken into consideration. Measurement results on the surface topography indicated that 3-fold improvement of the relative divergence was achieved for both optics when compared with conventional focused ion beam milling without any corrections. Furthermore, investigations on the influences of scanning st
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Atiqah, N., I. H. Jaafar, Mohammad Yeakub Ali, and B. Asfana. "Application of Focused Ion Beam Micromachining: A Review." Advanced Materials Research 576 (October 2012): 507–10. http://dx.doi.org/10.4028/www.scientific.net/amr.576.507.

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Fabrication of micro and nanoscale components are in high demand for various applications in diversified fields that include automotive, electronics, communication and medicine. Focused ion beam (FIB) machining is one of the techniques for microfabrication of micro devices. This paper presents a review of FIB machining technology that include its parameter, responses, its important component systems, as well as the fundamentals of imaging, milling (etching) and deposition techniques. The application of FIB in micromachining is also presented.
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Taniguchi, Jun, Shin-ichi Satake, Takaki Oosumi, Akihisa Fukushige, and Yasuo Kogo. "Dwell time adjustment for focused ion beam machining." Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 307 (July 2013): 248–52. http://dx.doi.org/10.1016/j.nimb.2013.02.039.

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Kitamura, Masaru, Eijiro Koike, Noboru Takasu, and Tetsuro Nishimura. "Focused Ion Beam Machining for Optical Microlens Fabrication." Japanese Journal of Applied Physics 41, Part 1, No. 6A (2002): 4019–21. http://dx.doi.org/10.1143/jjap.41.4019.

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Davies, ST, and B. Khamsehpour. "Focused ion beam machining and deposition for nanofabrication." Vacuum 47, no. 5 (1996): 455–62. http://dx.doi.org/10.1016/0042-207x(95)00235-9.

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Jiang, Xiao Xiao, Feng Wen Wang, Zhen He Ma, Qiong Chan Gu, Jiang Tao Lv, and Guang Yuan Si. "Arbitrary Structures Fabricated by Focused Ion Beam Milling." Advanced Materials Research 661 (February 2013): 66–69. http://dx.doi.org/10.4028/www.scientific.net/amr.661.66.

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Optical components at the nanoscale are crucial for developing photonics and integrated optics. Device with ultrasmall dimensions is of particular importance for nanoscience and electronic technology. Among all the manufacturing tools, the focused ion beam is a critical candidate for machining and processing optical devices at the nanoscale. Here, we experimentally demonstrate the fabrication of nanodevices with arbitrary shapes and different potential applications using focused ion beam techniques.
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Rozprawy doktorskie na temat "Focused Ion Beam machining"

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Evans, R. "Focused ion beam machining of hard materials for micro engineering applications." Thesis, Cranfield University, 2009. http://dspace.lib.cranfield.ac.uk/handle/1826/4417.

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The Focused Ion Beam (FIB) milling of single crystal diamond was investigated and the beam drift and mill yield were quantified. The effect of water assistance on the milling of diamond was found to double the yield. The surface morphology that spontaneously forms during milling was measured and the mechanisms behind its formation investigated. The effect of gallium implantation on the diamond crystal structure was measured by x-ray diffraction. Chemical vapour deposited polycrystalline diamond (PCD) has been machined into micro scale turning tools using a combination of laser processing and F
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Chitsaz, Charandabi Sahand. "Development of a Lorentz force drive system for a torsional paddle microresonator using Focused Ion Beam machining." Thesis, University of Birmingham, 2014. http://etheses.bham.ac.uk//id/eprint/4872/.

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This thesis focuses on the concept, design, fabrication and characterisation of a torsional micro paddle resonator. The ultimate intention is to use the device for rapid detection of anthrax bacteria. A comprehensive research was carried out to review the state of the art in MEMS based mass sensing. Various driving and detection strategies were investigated and discussed. Based on evidence from literature, a novel approach was adopted to realise a device with improved functionality and overcome currently existing drawbacks. The working principle of the proposed device is based on electromagnet
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Zhang, Haoyu. "Application of focused ion beam for micro-machining and controlled quantum dot formation on patterned GaAs substrate." Thesis, University of Sheffield, 2013. http://etheses.whiterose.ac.uk/6408/.

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This project is a study based on the application of focused ion beam (FIB) instrumentation, which has been widely used in fields such as electronic engineering, materials science, semiconductor technology and nanotechnology. We used a Ga+ source focused ion beam column from Orsay Physics mounted on a JEOL 6500F scanning electron microscopy, which forms a SEM-FIB dual-beam instrument. This project consists of a few experimental projects based on the applications of the FIB in electronic engineering. The experimental work will demonstrate the micro-machining capability of the FIB system. The pro
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Castro, Olivier de. "Development of a Versatile High-Brightness Electron Impact Ion Source for Nano-Machining, Nano-Imaging and Nano-Analysis." Thesis, Université Paris-Saclay (ComUE), 2016. http://www.theses.fr/2016SACLS468/document.

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Les nano-applications utilisant des faisceaux d'ions focalisés nécessitent des sources d'ions à haute brillance avec une faible dispersion en énergie (ΔE) ce qui permet une excellente résolution latérale et un courant d'ions suffisamment élevé pour induire des vitesses d'érosion raisonnables et des rendements élevés d'émission électronique et ionique. Les objectifs de cette thèse sont le développement d'une source d'ions basée sur l'impact électronique ayant une brillance réduite Br de 10³ – 10⁴ A m⁻² sr ⁻ ¹ V⁻ ¹, une dispersion en énergie ΔE ≲ 1 eV et un choix polyvalent d'ions. Le premier co
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Latif, Adnan. "Nanofabrication using focused ion beam." Thesis, University of Cambridge, 2000. https://www.repository.cam.ac.uk/handle/1810/34605.

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Focused ion beam (FIB) technique uses a focused beam of ions to scan the surface of aspecimen, analogous to the way scanning electron microscope (SEM) utilizes electrons. Recent developments in the FIB technology have led to beam spot size below 10 nm,which makes FIB suitable for nanofabrication. This project investigated thenanofabrication aspect of the FIB technique, with device applications perspective inseveral directions. Project work included construction of an in-situ FIB electricalmeasurement system and development of its applications, direct measurements ofnanometer scale FIB cuts and
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Naik, Jay Prakash. "Nanowires fabricated by Focused Ion Beam." Thesis, University of Birmingham, 2013. http://etheses.bham.ac.uk//id/eprint/4638/.

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This thesis reports research on nanowires fabricated by FIB lithography with experiments to understand their mechanical, electrical and hydrodynamic properties. Au nanowires fabricated on Si\(_3\)N\(_4\) membranes with width below 50nm exhibit liquid like instabilities and below \(\sim\)20nm the instabilities grow destroying the nanowires due to the Rayleigh- Plateau instability. Stability is better in the case for Si substrates than for the insulators Si0\(_2\) and Si\(_3\)N\(_4\). A series of 4-terminal resistance measurements were carried out on a "platinum" nanowire grown by FIB-induced de
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Wong, Ka Chun. "Focused Ion Beam Nanomachining of Thermoplastic Polymers." Thesis, North Carolina State University, 2013. http://pqdtopen.proquest.com/#viewpdf?dispub=3538536.

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<p> Commercially available Ga<sup>+</sup> focused ion beam (FIB) instruments with nanometer size probe allows for in situ materials removal (sputtering) and addition (deposition) on a wide range of material. These spatially precise processes have enabled a wide range of nanofacbrication operations (e.g. specimen preparation for analysis by scanning electron microscope, transmission electron microscope, and secondary ion mass spectrometer). While there exists an established knowledge of FIB methods for sample preparation of hard materials, but FIB methodology remain underdeveloped for soft mate
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Sabouri, Aydin. "Nanofabrication by means of focused ion beam." Thesis, University of Birmingham, 2015. http://etheses.bham.ac.uk//id/eprint/5987/.

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Focused ion beam (FIB) systems have been used widely in micro/nano technology due to their unique capabilities. In this fabrication technique, ions are accelerated towards the sample surfaces and substrate atoms are removed. Despite the ubiquity of this method, several problems remain unsolved and are not fully understood. In this thesis, the effects of FIB machining and its halo effects on substrate are investigated. A novel detector which can perform measurements of the current density profile of the generated beam, was successfully demonstrated. The effect of ion solid interactions for 30ke
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Della, Ratta Anthony D. (Anthony David). "Focused ion beam induced deposition of copper." Thesis, Massachusetts Institute of Technology, 1993. http://hdl.handle.net/1721.1/12418.

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Shedd, Gordon M. 1954. "Focused ion beam assisted deposition of gold." Thesis, Massachusetts Institute of Technology, 1986. http://hdl.handle.net/1721.1/14947.

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Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Nuclear Engineering, 1986.<br>MICROFICHE COPY AVAILABLE IN ARCHIVES AND SCIENCE.<br>Bibliography: leaves 75-76.<br>by Gordon M. Shedd.<br>M.S.
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Książki na temat "Focused Ion Beam machining"

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Foster, C. P. J. A comparison of electro discharge machining, laser & focused ion beam micromachining technologies. TWI, 1998.

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Yao, Nan, ed. Focused Ion Beam Systems. Cambridge University Press, 2007. http://dx.doi.org/10.1017/cbo9780511600302.

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Nan, Yao, ed. Focused ion beam systems: Basics and applications. Cambridge University Press, 2007.

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Bachmann, Maja D. Manipulating Anisotropic Transport and Superconductivity by Focused Ion Beam Microstructuring. Springer International Publishing, 2020. http://dx.doi.org/10.1007/978-3-030-51362-7.

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Córdoba Castillo, Rosa. Functional Nanostructures Fabricated by Focused Electron/Ion Beam Induced Deposition. Springer International Publishing, 2014. http://dx.doi.org/10.1007/978-3-319-02081-5.

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Orloff, Jon. High Resolution Focused Ion Beams: FIB and its Applications: The Physics of Liquid Metal Ion Sources and Ion Optics and Their Application to Focused Ion Beam Technology. Springer US, 2003.

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1934-, Swanson Lynwood, and Utlaut Mark William 1949-, eds. High resolution focused ion beams: FIB and its applications : the physics of liquid metal ion sources and ion optics and their application to focused ion beam technology. Kluwer Academic/Plenum Publishers, 2003.

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Orloff, Jon. High resolution focused ion beams: FIB and its applications ; the physics of liquid metal ion sources and ion optics and their application to focused ion beam technology. Kluwer Academic/Plenum Publishers, 2003.

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Fernandez-Pacheco, Amalio. Studies of Nanoconstrictions, Nanowires and Fe₃O₄ Thin Films: Electrical Conduction and Magnetic Properties. Fabrication by Focused Electron/Ion Beam. Springer-Verlag Berlin Heidelberg, 2011.

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Japan-U.S. Seminar on Focused Ion Beam Technology and Applications (1987 Osaka, Japan and Mie-ken, Japan). Proceedings of the Japan-U.S. Seminar on Focused Ion Beam Technology and Applications: 15-19 November 1987, Senri Hankyu Hotel, Osaka, and 20 November 1987, Shima Kanko Hotel, Mie Prefect, Japan. Edited by Harriott Lloyd R, Nihon Gakujutsu Shinkōkai, National Science Foundation (U.S.), and American Vacuum Society. Published for the American Vacuum Society by the American Institute of Physics, 1988.

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Części książek na temat "Focused Ion Beam machining"

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Kamaliya, Bhaveshkumar, and Rakesh G. Mote. "Nanofabrication Using Focused Ion Beam." In Advanced Machining Science. CRC Press, 2022. http://dx.doi.org/10.1201/9780429160011-9.

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Bachmann, Maja D. "Focused Ion Beam Micro-machining." In Manipulating Anisotropic Transport and Superconductivity by Focused Ion Beam Microstructuring. Springer International Publishing, 2020. http://dx.doi.org/10.1007/978-3-030-51362-7_2.

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Fu, Yongqi, and Lumin Wang. "Focused Ion Beam Machining and Deposition." In Ion Beams in Nanoscience and Technology. Springer Berlin Heidelberg, 2009. http://dx.doi.org/10.1007/978-3-642-00623-4_20.

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Campbell, L. C. I., D. T. Foord, and C. J. Humphreys. "‘Nano-machining’ using a focused ion beam." In Electron Microscopy and Analysis 1997. CRC Press, 2022. http://dx.doi.org/10.1201/9781003063056-170.

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Yang, Hongyi, and Svetan Rachev. "Focused Ion Beam Micro Machining and Micro Assembly." In Precision Assembly Technologies and Systems. Springer Berlin Heidelberg, 2010. http://dx.doi.org/10.1007/978-3-642-11598-1_9.

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Patil, Deepak. "Focused Ion Beam Machining as a Technology for Long Term Sustainability." In Smart Technologies for Improved Performance of Manufacturing Systems and Services. CRC Press, 2023. http://dx.doi.org/10.1201/9781003346623-12.

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Kawasegi, Noritaka. "Ion Beam Machining." In Toxinology. Springer Netherlands, 2018. http://dx.doi.org/10.1007/978-981-10-6588-0_16-1.

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Kawasegi, Noritaka. "Ion Beam Machining." In Toxinology. Springer Netherlands, 2018. http://dx.doi.org/10.1007/978-981-10-6588-0_16-2.

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Fang, Fengzhou, and Zong Wei Xu. "Ion Beam Machining." In CIRP Encyclopedia of Production Engineering. Springer Berlin Heidelberg, 2018. http://dx.doi.org/10.1007/978-3-642-35950-7_6485-4.

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Kawasegi, Noritaka. "Ion Beam Machining." In Micro/Nano Technologies. Springer Singapore, 2018. http://dx.doi.org/10.1007/978-981-13-0098-1_16.

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Streszczenia konferencji na temat "Focused Ion Beam machining"

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Tan, Shida, Richard H. Livengood, Yuval Greenzweig, Yariv Drezner, Roy Hallstein, and Chris Scheffler. "Characterization of Ion Beam Current Distribution Influences on Nanomachining." In ISTFA 2012. ASM International, 2012. http://dx.doi.org/10.31399/asm.cp.istfa2012p0436.

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Abstract The requirements for focused ion beam (FIB) systems to provide higher image resolution and machining precision continue to increase with the continuation of Moore’s Law. Due to the shrinking geometry and increasing complex structures and materials, it is ever more critical to scale the entire ion probe. The necessity for comprehensive analysis of the ion beam profile and understanding how the ion beam current distribution profile influences different aspects of nanomachining are becoming increasingly important and more challenging.
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Tihanyi, P., D. K. Wagner, H. J. Vollmer, et al. "High Power Laser with a Chemically Assisted Ion Beam Etched Mirror." In Semiconductor Lasers. Optica Publishing Group, 1987. http://dx.doi.org/10.1364/sla.1987.wa5.

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There has been considerable interest in the development of high performance lasers that can be integrated with other opto-electronic components on the same chip. Generally, this involves fabricating one of the laser mirrors by a technique other than by cleaving. Techniques that have been explored are reactive ion etching(1), hybrid wet and reactive ion etching and focused ion beam machining.
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Kim, Sang-Jae, and Koji Iwasaki. "Development of focused-ion-beam (FIB) machining systems for fabricating 3-D micro- and nano- structures." In 2007 Digest of papers Microprocesses and Nanotechnology. IEEE, 2007. http://dx.doi.org/10.1109/imnc.2007.4456202.

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Tan, Shida, Richard H. Livengood, Roy Hallstein, et al. "Neon Ion Microscope Nanomachining Considerations." In ISTFA 2011. ASM International, 2011. http://dx.doi.org/10.31399/asm.cp.istfa2011p0040.

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Abstract Nanomachining capability scaling both in the areas of machining precision and novel gas chemistries are required for focused ion beam technology to keep pace with process technology advancement. In this paper, we review the nanomachining potential for the Helium Ion Microscope (HIM) and the Neon Ion Microscope (NIM). The paper also includes an in depth analysis of NIM imaging resolution, subsurface material interaction, and nanomachining performance.
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Zhou, Jack, and Guoliang Yang. "Modeling and Simulation of Focused Ion Beam Based Single Digital Nano Hole Fabrication for DNA and Macromolecule Characterization." In ASME 2008 International Manufacturing Science and Engineering Conference collocated with the 3rd JSME/ASME International Conference on Materials and Processing. ASMEDC, 2008. http://dx.doi.org/10.1115/msec_icmp2008-72033.

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In this paper we describe a top down nano-fabrication method to make single-digit nanoholes that we aim to use for DNA and RNA characterization. There are three major steps towards the fabrication of a single-digit nanohole. 1) Preparing the freestanding thin film by epitaxial deposition and electrochemical etching. 2) Making sub-micro holes (0.2 μm to 0.02μm) by focused ion beam (FIB), electron beam (EB), atomic force microscope (AFM), or other methods. 3) Reducing the hole to less than 10 nm by epitaxial deposition, FIB or EB induced deposition. One specific aim for this paper is to model, s
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Nonaka, Shinri, Tastuhiro Mori, Yasuyuki Takata, and Masamichi Kohno. "The Effect of the Laser Beam Wavelength and Pulse Width on Micro Grooving: Comparison of Nanosecond and Femtosecond Laser." In ASME 2012 10th International Conference on Nanochannels, Microchannels, and Minichannels collocated with the ASME 2012 Heat Transfer Summer Conference and the ASME 2012 Fluids Engineering Division Summer Meeting. American Society of Mechanical Engineers, 2012. http://dx.doi.org/10.1115/icnmm2012-73135.

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Processing technique of micro grooves and channels is very important to study the phenomenon of fluids in micro scale. Micro grooves and microchannels play an important role in various devices, such as μ-TAS (Micro-Total Analysis Systems) and micro reactors. Laser processing is currently widely used for drilling and grooving of various materials including metals, polymers, glasses and composite materials, since laser machining can avoid the problems that conventional machining methods have. For example wear of a working tool, lowering of processing accuracy, and wear debris becoming contaminan
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Li, J., J. N. Sun, M. M. Miliar, et al. "Focussed ion beam machining of an in-fibre 45° mirror for fibre end sensors." In Fifth European Workshop on Optical Fibre Sensors, edited by Leszek R. Jaroszewicz. SPIE, 2013. http://dx.doi.org/10.1117/12.2025714.

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Scheffler, Christopher M., Richard H. Livengood, Haripriya E. Prakasam, Michael W. Phaneuf, and Ken Lagarec. "Patterning in an Imperfect World—Limitations of Focused Ion Beam Systems and Their Effects on Advanced Applications at the 14 nm Process Node." In ISTFA 2016. ASM International, 2016. http://dx.doi.org/10.31399/asm.cp.istfa2016p0382.

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Abstract This paper provides information on ion beam dose delivery and machining a perfect pattern in an ideal world and summarizes the various beam control limitations of the current generation systems. It discusses conventional and proposed solutions to these limitations and highlights their effect on minimum dimension nanomachining applications at the 14 nm Si process node and beyond. The paper highlights the solutions that can be implemented to help negate inconsequential effects of systems. With that in mind, the most significant of these factors in limiting a tool's ability to complete a
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Jarausch, Konrad, John F. Richards, Lloyd Denney, Alex Guichard, and Phillip E. Russell. "Site Specific 2-D Implant Profiling Using FIB Assisted SCM." In ISTFA 2002. ASM International, 2002. http://dx.doi.org/10.31399/asm.cp.istfa2002p0467.

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Abstract Advances in semiconductor technology are driving the need for new metrology and failure analysis techniques. Failures due to missing, or misregistered implants are particularly difficult to resolve. Two-dimensional implant profiling techniques such as scanning capacitance microscopy (SCM) rely on polish preparation, which makes reliably targeting sub 0.25 um structures nearly impossible.[1] Focused ion beam (FIB) machining is routinely used to prepare site-specific cross-sections for electron microscopy inspection; however, FIB induced artifacts such as surface amorphization and Ga io
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Lorut, Frédéric, Alexia Valéry, Nicolas Chevalier, and Denis Mariolle. "FIB-Based Sample Preparation for Localized SCM and SSRM." In ISTFA 2018. ASM International, 2018. http://dx.doi.org/10.31399/asm.cp.istfa2018p0209.

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Abstract Dopants imaging using scanning capacitance microscopy (SCM) and scanning spreading resistance microscopy are used for identifying doped areas within a device, the latter being analyzed either in a top view or in a side view. This paper presents a sample preparation workflow based on focused ion beam (FIB) use. A discussion is then conducted to assess advantages of the method and factors to monitor vigilantly. Dealing with FIB machining, any sample preparation geometry can be achieved, as it is for transmission electron microscopy (TEM) sample preparation: cross-section, planar, or inv
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Raporty organizacyjne na temat "Focused Ion Beam machining"

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Melngailis, John. Focused Ion Beam Implantation. Defense Technical Information Center, 1992. http://dx.doi.org/10.21236/ada249662.

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Jiang, X., Q. Ji, A. Chang, and K. N. Leung. Mini RF-driven ion source for focused ion beam system. Office of Scientific and Technical Information (OSTI), 2002. http://dx.doi.org/10.2172/802041.

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Pellerin, J. G., D. Griffis, and P. E. Russell. Development of a focused ion beam micromachining system. Office of Scientific and Technical Information (OSTI), 1988. http://dx.doi.org/10.2172/476649.

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Tegtmeier, Eric, Mary Hill, Daniel Rios, and Juan Duque. Focused Ion Beam analysis of non radioactive samples. Office of Scientific and Technical Information (OSTI), 2021. http://dx.doi.org/10.2172/1766960.

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Harmer, M. P. A Focused-Ion Beam (FIB) Nano-Fabrication and Characterization Facility. Defense Technical Information Center, 2002. http://dx.doi.org/10.21236/ada408750.

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Mayer, Thomas Michael, David Price Adams, V. Carter Hodges, and Michael J. Vasile. Focused ion beam techniques for fabricating geometrically-complex components and devices. Office of Scientific and Technical Information (OSTI), 2004. http://dx.doi.org/10.2172/918768.

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Lamartine, B. C. Liquid metal focused ion beam etch sensitization and related data transmission processes. Office of Scientific and Technical Information (OSTI), 1998. http://dx.doi.org/10.2172/562504.

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Dolph, Melissa C., and Christopher Santeufemio. Exploring Cryogenic Focused Ion Beam Milling as a Group III-V Device Fabrication Tool. Defense Technical Information Center, 2013. http://dx.doi.org/10.21236/ada597233.

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Miller, J. D., R. F. Schneider, D. J. Weidman, H. S. Uhm, and K. T. Nguyen. Plasma Wakefield Effects On High-Current Relativistic Electron Beam Transport In The Ion-Focused Regime. Defense Technical Information Center, 1992. http://dx.doi.org/10.21236/ada338876.

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