Gotowe bibliografie tematyczne / Film thickness

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  1. Artykuły w czasopismach
  2. Rozprawy doktorskie
  3. Książki
  4. Części książek
  5. Streszczenia konferencji
  6. Raporty organizacyjne

Gotowa bibliografia na temat „Film thickness”

Autor: Grafiati
Data publikacji: 4 czerwca 2021
Data aktualizacji: 22 lutego 2023

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Artykuły w czasopismach na temat "Film thickness"

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Wanarattikan, Pornsiri, Piya Jitthammapirom, Rachsak Sakdanuphab i Aparporn Sakulkalavek. "Effect of Grain Size and Film Thickness on the Thermoelectric Properties of Flexible Sb2Te3 Thin Films". Advances in Materials Science and Engineering 2019 (8.01.2019): 1–7. http://dx.doi.org/10.1155/2019/6954918.

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In this work, stoichiometric Sb2Te3 thin films with various thicknesses were deposited on a flexible substrate using RF magnetron sputtering. The grain size and thickness effects on the thermoelectric properties, such as the Seebeck coefficient (S), electrical conductivity (σ), power factor (PF), and thermal conductivity (k), were investigated. The results show that the grain size was directly related to film thickness. As the film thickness increased, the grain size also increased. The Seebeck coefficient and electrical conductivity corresponded to the grain size of the films. The mean free path of carriers increases as the grain size increases, resulting in a decrease in the Seebeck coefficient and increase in electrical conductivity. Electrical conductivity strongly affects the temperature dependence of PF which results in the highest value of 7.5 × 10−4 W/m·K2 at 250°C for film thickness thicker than 1 µm. In the thermal conductivity mechanism, film thickness affects the dominance of phonons or carriers. For film thicknesses less than 1 µm, the behaviour of the phonons is dominant, while both are dominant for film thicknesses greater than 1 µm. Control of the grain size and film thickness is thus critical for controlling the performance of Sb2Te3 thin films.
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Chen, Yen-Hua, i Kuo-Jui Tu. "Thickness Dependent on Photocatalytic Activity of Hematite Thin Films". International Journal of Photoenergy 2012 (2012): 1–6. http://dx.doi.org/10.1155/2012/980595.

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Hematite (Fe2O3) thin films with different thicknesses are fabricated by the rf magnetron sputtering deposition. The effects of film thicknesses on the photocatalytic activity of hematite films have been investigated. Hematite films possess a polycrystalline hexagonal structure, and the band gap decreases with an increase of film thickness. Moreover, all hematite films exhibit good photocatalytic ability under visible-light irradiation; the photocatalytic activity of hematite films increases with the increasing film thickness. This is because the hematite film with a thicker thickness has a rougher surface, providing more reaction sites for photocatalysis. Another reason is a lower band gap of a hematite film would generate more electron-hole pairs under visible-light illumination to enhance photocatalytic efficiency. Experimental data are well fitted with Langmuir-Hinshelwood kinetic model. The photocatalytic rate constant of hematite films ranges from 0.052 to 0.068 min-1. This suggests that the hematite film is a superior photocatalyst under visible-light irradiation.
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Chanthong, Thawatchai, Weerawat Intaratat i Thanate Na Wichean. "Effect of Thickness on Electrical and Optical Properties of ZnO:Al Films". Trends in Sciences 20, nr 3 (18.01.2023): 6372. http://dx.doi.org/10.48048/tis.2023.6372.

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Zinc oxide (ZnO:Al) films were prepared on a substrate of different thicknesses by sputtering at 1×10−2 mbar argon gas pressure and 200 W power. The effect of film thickness on the structural, electrical, and optical properties was investigated by X-ray diffraction (XRD), 4-point probe technique, and ultraviolet-visible spectroscopy. The XRD film crystal structure study revealed that all sample films at thicknesses of 66, 106, 150 and 193 nm, respectively, exhibited planar Hexagonal wurtzite crystal structure (002), and ZnO crystals were grown along the c-axis. The ZnO:Al film at a thickness of 66 nm had the highest strain and the smallest crystal size compared to other films. The electrical resistivity decreases with increasing film thickness. The sample at 193 nm has the lowest resistivity (1.37 Ω.m). The results showed that light transmission revealed that all sample films had high transparency in the white and near-UV region at a wavelength of 350 to 800 nm, with an average light transmittance shift of 85 - 95 %. The energy band gap increased with the film thickness of 3.49(66 nm), 3.55(106 nm), and 3.59(150 nm) eV, and decreased to 3.57 eV at 193 nm, respectively. HIGHLIGHTS The different thicknesses Zinc oxide (ZnO:Al) films were prepared by sputtering at 1×10-2 mbar argon gas pressure and 200 W power was used to study the effect of film thickness on the structural, electrical, and optical properties The electrical resistivity changing of ZnO:Al film depends on the film thickness. The electrical resistivity is reduced with increasing ZnO:Al film thickness The ZnO:Al film are highlighted by their characteristics for light transmission at the wavelengths between 350 and 800 nm, and exhibited exceptional transparency in the white and near-UV range GRAPHICAL ABSTRACT
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ESWARAMOORTHI, VELUCHAMY, i RAYAR VICTOR WILLIAMS. "EFFECT OF THICKNESS ON MICROSTRUCTURE, DIELECTRIC AND OPTICAL PROPERTIES OF SINGLE LAYER Ba0.6Sr0.4TiO3 THIN FILM". Surface Review and Letters 21, nr 02 (kwiecień 2014): 1450020. http://dx.doi.org/10.1142/s0218625x14500206.

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Single layered Ba 0.6 Sr 0.4 TiO 3 (BST) thin films were prepared on stainless steel (304) and quartz substrates by solution method. The microstructure, grain size, surface morphology and thickness of the films were reported on the basis of X-ray diffraction (XRD), atomic force microscopy (AFM), field emission scanning electron microscopy (FESEM) and UV-visible spectrometer. Variation in thickness influences the microstructure of the films. The single layered thin film had uniform crack-free surface morphology. The low frequency dielectric constants for the films of thicknesses 663, 476 and 451 nm were found to be 1246, 859 and 703, respectively at room temperature. The dielectric loss values for different thicknesses were found to be 0.238%, 0.170% and 0.120% for 100 kHz and 0.043%, 0.029 % and 0.028% for 1 kHz. The dielectric properties changed significantly with thickness of the film as well as with frequency. The tunability of the single layered BST film increased with film thickness. The refractive index, bandgap and thickness of the single layered thin film were calculated by using envelope method and Tauc's relation from the UV-visible transmission spectrum. The bandgap increases with the film thickness. These results show that this single layered film will be a potential material for tunable devices application.
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Xiao, Na, Bo Yang, Fei Fei Du, Yan Wu, Xiang Zhao i Gao Wu Qin. "Hardness and Texture Evolution of Sputtered TiN Thin Films with Different Thicknesses on Ti6Al4V Substrate". Key Engineering Materials 709 (wrzesień 2016): 91–94. http://dx.doi.org/10.4028/www.scientific.net/kem.709.91.

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In this present work, TiN films with various thicknesses (from 0.3 μm to 2 μm) were deposited by DC reactive magnetron sputtering on Ti6Al4V substrates. The evolution of texture and microstructure were studied by X-ray diffraction and Scanning Electron Microscopy, respectively. The XRD characterization indicates that the preferred texture of TiN films is changed from (111) to (100) with increasing the film thickness. The microstructure characterization shows that their microstructure transform from continuous into columnar with increasing the TiN film thickness. It is considered these results are arised from the change of overall energy including surface energy and strain energy with the film thickness. The hardness of TiN film increases with increasing the film thickness.
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Greculeasa, Simona Gabriela, Anda-Elena Stanciu, Aurel Leca, Andrei Kuncser, Luminita Hrib, Cristina Chirila, Iuliana Pasuk i Victor Kuncser. "Influence of Thickness on the Magnetic and Magnetotransport Properties of Epitaxial La0.7Sr0.3MnO3 Films Deposited on STO (0 0 1)". Nanomaterials 11, nr 12 (14.12.2021): 3389. http://dx.doi.org/10.3390/nano11123389.

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Epitaxial La0.7Sr0.3MnO3 films with different thicknesses (9–90 nm) were deposited on SrTiO3 (0 0 1) substrates by pulsed laser deposition. The films have been investigated with respect to morpho-structural, magnetic, and magneto-transport properties, which have been proven to be thickness dependent. Magnetic contributions with different switching mechanisms were evidenced, depending on the perovskite film thickness. The Curie temperature increases with the film thickness. In addition, colossal magnetoresistance effects of up to 29% above room temperature were evidenced and discussed in respect to the magnetic behavior and film thickness.
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He, Li, Chen, Qian, Geng, Bi, Mu, Hou i Chou. "Thickness Dependence of Ferroelectric and Optical Properties in Pb(Zr0.53Ti0.47)O3 Thin Films". Sensors 19, nr 19 (20.09.2019): 4073. http://dx.doi.org/10.3390/s19194073.

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As a promising functional material, ferroelectric Pb(ZrxTi1−x)O3 (PZT) are widely used in many optical and electronic devices. Remarkably, as the film thickness decreases, the materials’ properties deviate gradually from those of solid materials. In this work, multilayered PZT thin films with different thicknesses are fabricated by Sol-Gel technique. The thickness effect on its microstructure, ferroelectric, and optical properties has been studied. It is found that the surface quality and the crystalline structure vary with the film thickness. Moreover, the increasing film thickness results in a significant increase in remnant polarization, due to the interfacial layer effect. Meanwhile, the dielectric loss and tunability are strongly dependent on thickness. In terms of optical properties, the refractive index of PZT films increase with the increasing thickness, and the photorefractive effect are also influenced by the thickness, which could all be related to the film density and photovoltaic effect. Besides, the band gap decreases as the film thickness increases. This work is significant for the application of PZT thin film in optical and optoelectronic devices.
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Kubota, Rurika, Akinori Tateyama, Takahisa Shiraishi, Yoshiharu Ito, Minoru Kurosawa i Hiroshi Funakubo. "Film thickness dependence of ferroelectric properties in polar-axis-oriented epitaxial tetragonal (Bi,K)TiO3 films prepared by hydrothermal method". AIP Advances 12, nr 3 (1.03.2022): 035241. http://dx.doi.org/10.1063/5.0084170.

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Tetragonal (00l)-oriented epitaxial (Bi,K)TiO3 films were grown at 240 °C on (100) cSrRuO3//(100)SrTiO3 substrates by the hydrothermal method. KOH aqueous solutions and Bi(NO3)3 · 5H2O and TiO2 powders were used as the starting materials. Film thickness was controlled from 33 to 1200 nm by changing the deposition time, and the Bi/(Bi+K) ratio in the A-site of perovskite ABO3 was almost constant for all film thicknesses. Polar-axis (00l)-oriented epitaxial (Bi,K)TiO3 films were obtained without a secondary phase and/or other orientation for all thickness ranges. Large ferroelectricity with the remanent polarization ( Pr) of about 84 µC/cm2, comparable to previously reported lead-based ferroelectric films, was observed for (Bi,K)TiO3 films down to 33 nm in thickness. On the other hand, Ec increased with decreasing film thickness, but did not show strong film thickness dependence like other perovskite ferroelectric films. These data are very useful for understanding the degradation mechanism of ferroelectric thin films.
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Kusano, Eiji. "Dependence of film structure on the film structure-independent equivalent film thickness in magnetron sputtering deposition of Ag thin films". Journal of Vacuum Science & Technology A 40, nr 5 (wrzesień 2022): 053405. http://dx.doi.org/10.1116/6.0001989.

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In this work, I have investigated the structures and properties of Ag thin films deposited by magnetron sputtering onto glass substrates with temperatures of 150 and 600 °C for film structure-independent equivalent film thicknesses in the range of 20–400 nm. The Ag thin film morphologies observed using scanning electron microscopy and atomic force microscopy showed the following distinguishable changes: an Ag thin film with an equivalent film thickness of 20 nm deposited at a substrate temperature of 150 °C displayed a film microstructure of oblate grains separated by voids, while those with equivalent film thicknesses of 50 nm or more displayed microstructures consisting of flat-topped grains without any obvious voids between them. In comparison, an Ag thin film with an equivalent film thickness of 20 nm deposited at a substrate temperature of 600 °C displayed a microstructure consisting of isolated spherically shaped grains with a uniform diameter of approximately 40 nm and spaced at uniform intervals; an Ag thin film with an equivalent film thickness of 50 nm displayed a microstructure of more oblate grains; Ag thin films with equivalent film thicknesses of 100 and 200 nm displayed microstructures of highly isolated, flat-topped, mound-shaped grains; and an Ag thin film with an equivalent film thickness of 400 nm displayed a microstructure of continuous flat-topped, mound-shaped grains. In addition, the Ag thin films with equivalent film thicknesses of 20 and 50 nm deposited at 600 °C exhibited higher compressive stresses. The quantitative results of optical-transmittance and electrical resistivity measurements were consistent with the changes in thin film morphology. The morphological structures of the Ag thin films deposited at 600 °C result from the high surface diffusivity of the Ag atoms, which do not wet the glass substrate, whereas the morphologies of the Ag thin films deposited at 150 °C result from in-place grain growth following the formation of multiple nuclei because of the low surface diffusivity of the Ag atoms at this temperature. The observed thin film microstructures are unexplained by the classical structure model for sputter-deposited metal thin films, which does not consider either the high surface diffusivity of adatoms that do not wet the substrate or the increase in surface area required to dissipate the energy accumulating in grains during film deposition. The results obtained in this study provide a fundamental description and explanation of the grain structure of metal thin films with thicknesses of a few tens of nanometers or less.
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Zhang, Weiguang, Jijun Li, Yongming Xing, Xiaomeng Nie, Fengchao Lang, Shiting Yang, Xiaohu Hou i Chunwang Zhao. "Experimental Study on the Thickness-Dependent Hardness of SiO2 Thin Films Using Nanoindentation". Coatings 11, nr 1 (27.12.2020): 23. http://dx.doi.org/10.3390/coatings11010023.

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SiO2 thin films are widely used in micro-electro-mechanical systems, integrated circuits and optical thin film devices. Tremendous efforts have been devoted to studying the preparation technology and optical properties of SiO2 thin films, but little attention has been paid to their mechanical properties. Herein, the surface morphology of the 500-nm-thick, 1000-nm-thick and 2000-nm-thick SiO2 thin films on the Si substrates was observed by atomic force microscopy. The hardnesses of the three SiO2 thin films with different thicknesses were investigated by nanoindentation technique, and the dependence of the hardness of the SiO2 thin film with its thickness was analyzed. The results showed that the average grain size of SiO2 thin film increased with increasing film thickness. For the three SiO2 thin films with different thicknesses, the same relative penetration depth range of ~0.4–0.5 existed, above which the intrinsic hardness without substrate influence can be determined. The average intrinsic hardness of the SiO2 thin film decreased with the increasing film thickness and average grain size, which showed the similar trend with the Hall-Petch type relationship.
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Rozprawy doktorskie na temat "Film thickness"

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Wang, Dong. "Fatigue behavior of thin Cu films film thickness and interface effects /". Karlsruhe : Forschungszentrum Karlsruhe, 2007. http://d-nb.info/98578797X/34.

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Duszynski, Marek. "Measurement of lubricant film thickness in reciprocating engines". Thesis, Imperial College London, 1999. http://hdl.handle.net/10044/1/8268.

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Makihara, Hiroshi. "Water film thickness in the clay-water system". Diss., The University of Arizona, 1999. http://etd.library.arizona.edu/etd/GetFileServlet?file=file:///data1/pdf/etd/azu_e9791_1999_20_sip1_w.pdf&type=application/pdf.

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Binnington, P. G. "The measurement of rotary shaft seal film thickness". Thesis, Durham University, 1991. http://etheses.dur.ac.uk/1121/.

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Wang, Dong. "Binder Film Thickness Effect on Aggregate Contact Behavior". Thesis, Virginia Tech, 2007. http://hdl.handle.net/10919/34510.

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This study presents a study on the binder film thickness effect on aggregate contact behavior. As a three-phase material composed of aggregates, asphalt binder and air voids, asphalt mixture could be considered as a visco-elastic material in the low stress level. Since the behavior of the mixture depends largely on the relationship of different components, a well developed contact model for micro-structural modeling is very important for understanding the deformation mechanism of the mixture. In this study, the contact modeling of asphalt mixture was reviewed and the numerical tools used to investigate the micromechanical behavior of asphalt mixture will also be introduced. By using the cabinet x-ray tomography system, the displacement and resistant force of a system of particles bonded by a thin layer binder are measured and recorded. Then, the results are compared with the theoretical solutions of a normal compliance model for a system comprised of two elastic particles bonded by a thin layer of visco-elastic binder. A closed-form time-dependent relationship between the contact forces and the relative particle/binder movements was developed. A reasonable agreement between experiments results and model predicted results is obtained combined with parametric analysis.
Master of Science
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Sauter, Linda Xenia. "Microstructural and film thickness effects on the thermomechanical behavior of thin Au films". Stuttgart : Max-Planck-Inst. für Metallforschung, 2007. http://d-nb.info/995370753/34.

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Wang, Dong [Verfasser]. "Fatigue behavior of thin Cu films : film thickness and interface effects / Dong Wang". Karlsruhe : Forschungszentrum Karlsruhe, 2007. http://d-nb.info/98578797X/34.

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Sauter, Linda Xenia. "Microstructural and film thickness effects on the thermomechanical behavior of thin Au films". [S.l. : s.n.], 2006. http://nbn-resolving.de/urn:nbn:de:bsz:93-opus-31632.

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Deutsch, Eric J. (Eric Joseph). "Piston ring friction analysis from oil film thickness measurements". Thesis, Massachusetts Institute of Technology, 1994. http://hdl.handle.net/1721.1/36435.

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Lord, John. "Film thickness measurements for the characterization of EHL contacts". Licentiate thesis, Luleå, 2001. http://urn.kb.se/resolve?urn=urn:nbn:se:ltu:diva-16934.

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This licentiate thesis describes experimental techniques related to the investigation of elastohydrodynamic lubrication of point contacts as well as measurements and evaluation of results from laboratory tests. Elastohydrodynamic lubrication is one of the most severe forms of lubrication when a medium (often a liquid) is expected to separate two surfaces in a mechanical device under extremely high pressures and shear strain rates as well as with very thin lubricant films. These criteria set high demands on both the surfaces themselves and the lubricant. In order to simulate elastohydrodynamic lubrication, a ball and disc apparatus, of which there are many different types and configurations, can be used. These produce images (interferograms) of the actual conjunction by employing the phenomena of optical interference. In the work presented in this thesis, a computer controlled ball and disc apparatus has been used to investigate two different types of interferogram evaluation methods; the HSI and the Multi Channel method. Lubricant behaviour at low rolling speeds and hence very thin lubricating films, was also studied. It was seen that some lubricants create very thin boundary layers preventing direct contact between the ball and disc. It was also concluded that the measurement of very thin lubricant films requires interferogram evaluation methods which do not depend upon model based calibrations. At high slide/roll ratios, and often with lubricants possessing a high pressure-viscosity coefficient, dimples may form within the normally flat central contact region. The cause of this phenomena has been disputed, but studies suggest that differences in the thermal properties of the contacting bodies may be the cause. Experiments which caused such dimples were used as the basis for evaluating the hybrid film thickness evaluation scheme which takes account of the influence of pressure on the lubricant's refractive index. This proved useful since dimple formation causes abnormally high pressures which would, with other techniques, reduce the accuracy of the film thickness measurements. The shear rates which occur in a sliding contact affects the rheological and thermal properties of the lubricant within the conjunction. This results in a reduction in film thickness from that predicted by isothermal assumptions. It was shown that this reduction is not only affected by operating conditions, but is also lubricant type dependent. Experiments indicated that an ester base fluid possessed characteristics which gave less film thickness reduction as compared to a mineral and a Poly-a-olefin base fluid.
Godkänd; 2001; 20070314 (ysko)
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Książki na temat "Film thickness"

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Perilloux, Bruce. Thin-film design: Modulated thickness and other stopband design methods. Bellingham, WA: SPIE Press, 2002.

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Thin-film design: Modulated thickness and other stopband design methods. Bellingham, WA: SPIE Press, 2002.

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Olechowski, Mark Joseph. Analysis of single and multi-grade lubricant film thickness in a diesel engine. Springfield, Va: Available from the National Technical Information Service, 1990.

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National Association of Corrosion Engineers. Holiday detection of internal tubular coatings of less than 250um (10mils) dry film thickness. Houston: NACE, 1994.

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Ingles, Edward N. Instrumentation of a diesel engine for oil film thickness measurement using fiber optics and laser fluorescence. Springfield, Va: Available from the National Technical Information Service, 1991.

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National Association of Corrosion Engineers. Holiday detection of internal tubular coatings of less than 10 mils (0.25 mm) dry film thickness. Houston: NACE, 1989.

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Ingles, Edward N. Instrumentation of a diesel engine for oil film thickness measurement using fiber optics and laser fluorescence. Springfield, Va: Available from the National Technical Information Service, 1991.

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National Association of Corrosion Engineers. Holiday detection of internal tubular coatings of 10 to 30 mils(0.25to 0.76 mm) dry film thickness. Houston: NACE, 1989.

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United States. National Aeronautics and Space Administration., red. System for the growth of bulk SiC crystals by modified CVD techniques: Final report. [Washington, DC: National Aeronautics and Space Administration, 1994.

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W, McConley Marc, i United States. National Aeronautics and Space Administration., red. Stability of thin liquid sheet flows. [Washington, DC: National Aeronautics and Space Administration, 1997.

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Części książek na temat "Film thickness"

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Schweizer, Peter M. "Film Thickness and Film Thickness Uniformity". W Premetered Coating Methods, 387–452. Cham: Springer International Publishing, 2022. http://dx.doi.org/10.1007/978-3-031-04180-8_9.

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Gooch, Jan W. "Film Thickness". W Encyclopedic Dictionary of Polymers, 304. New York, NY: Springer New York, 2011. http://dx.doi.org/10.1007/978-1-4419-6247-8_4935.

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Michaelis, Klaus. "Gear Film Thickness". W Encyclopedia of Lubricants and Lubrication, 732–35. Berlin, Heidelberg: Springer Berlin Heidelberg, 2014. http://dx.doi.org/10.1007/978-3-642-22647-2_66.

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Gooch, Jan W. "Film, Thickness Gauge". W Encyclopedic Dictionary of Polymers, 304. New York, NY: Springer New York, 2011. http://dx.doi.org/10.1007/978-1-4419-6247-8_4936.

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Gooch, Jan W. "Wet Film Thickness". W Encyclopedic Dictionary of Polymers, 809. New York, NY: Springer New York, 2011. http://dx.doi.org/10.1007/978-1-4419-6247-8_12792.

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England, Craig D., Laurie Bechtler, Steve Zierer, Lisa Gassaway, Barbara Miner i Steve Bill. "Metal Film Thickness Standards". W Advances in X-Ray Analysis, 707–12. Boston, MA: Springer US, 1997. http://dx.doi.org/10.1007/978-1-4615-5377-9_78.

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Larsson, Roland. "EHL Film Thickness Behavior". W Encyclopedia of Tribology, 817–27. Boston, MA: Springer US, 2013. http://dx.doi.org/10.1007/978-0-387-92897-5_639.

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Predöhl, W., i Bernd Schroeter. "Die Control System of Film Thickness Distribution". W Film Processing, 58–72. München: Carl Hanser Verlag GmbH & Co. KG, 1999. http://dx.doi.org/10.3139/9783446401792.004.

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Kumar, Punit, i M. M. Khonsari. "Film Thickness Formulas: Line Contacts". W Encyclopedia of Tribology, 1091–96. Boston, MA: Springer US, 2013. http://dx.doi.org/10.1007/978-0-387-92897-5_641.

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Kumar, Punit, i M. M. Khonsari. "Film Thickness Formulas: Point Contacts". W Encyclopedia of Tribology, 1096–99. Boston, MA: Springer US, 2013. http://dx.doi.org/10.1007/978-0-387-92897-5_642.

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Streszczenia konferencji na temat "Film thickness"

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Mavraki, A., i P. M. Cann. "Lubricating Film Thickness Measurements on Bovine Serum". W STLE/ASME 2008 International Joint Tribology Conference. ASMEDC, 2008. http://dx.doi.org/10.1115/ijtc2008-71037.

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In this paper lubricant film thickness for bovine serum (BS) was measured in a ball-on-disc optical device under steady-state rolling and sliding. Tests were carried out for a range of BS concentrations and substrate materials (M52100 steel and chromium coatings) in both low (MPa) and high-pressure (GPa) configurations. The results show that BS forms films 2–50 nm thick over the speed range although this depends on the contact pressure. However there was significant scatter in these results, possibly due to the inherent nature of the fluid, which is an inhomogeneous biological sample. Clearly this will contribute to scatter in wear results. In some cases thick (up to 100nm) films were formed at low speeds under both sliding and rolling conditions, this behaviour was considered representative of high-viscosity surface layers rather than solid films. However residual films of 13–17nm were also measured under static loading. These are attributed to the adsorption of protein molecules and will provide surface protection during stance or on initiation of gait. A small number of results at under low pressure sliding conditions indicated that much thicker films were formed than at high pressures. One interesting aspect of the results is that they are not representative of a simple Newtonian fluid and thus have considerable implications for the development of predictive film thickness models.
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Pan, Ru-Pin, S. M. Chen i Ci-Ling Pan. "Novel interferometric method for NLC film thickness measurement". W OSA Annual Meeting. Washington, D.C.: Optica Publishing Group, 1989. http://dx.doi.org/10.1364/oam.1989.ths6.

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Accurate determination of the thickness of nematic liquid crystal (NLC) films is essential in the study of the physical proper ties and use of these films. We demonstrate a novel interferometric method in which the birefringence of the NCL material is utilized. A probe laser polarized at an angle 45° off the incident plane is focused onto the sample at an arbitrary angle θ. The NLC film induces an optical path difference between the o-ray and the e-ray components of the transmitted light, and interference fringe spacing is used to calculate film thickness. This method is not affected by the substrate; it can be used to measure standard cells as well as NLC films with a free surface, i.e., NLC films with one surface exposed to the air.
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Herescu, Alexandru, i Jeffrey S. Allen. "Film Deposition in Non-Wetting Tubes: An Experimental Film Thickness Law". W ASME 2015 International Mechanical Engineering Congress and Exposition. American Society of Mechanical Engineers, 2015. http://dx.doi.org/10.1115/imece2015-50217.

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Deposition of a liquid film on non-wetting tubular surfaces gives rise to the unexpected behavior of simultaneously coexisting thick and thin films. Experiments show that a discontinuity in the film thickness, a jump between the thick and thin films being laid from the meniscus towards the bounding moving contact line, occurs after a considerably thicker than the expected Bretherton film is deposited. Bretherton assumed the film to be uniform and, unlike the case of a non-wetting surface, the visco-capillary deposition process was not affected by the presence of a contact line. In reality this phenomenon lies at the confluence between a dewetting process and the deposition itself, being the result of the influence claimed by the dynamics of the zone adjacent to the moving contact line. The film thickness is calculated directly from the experimental data and a correlation is obtained by matching the measured and the theoretical shock velocities associated with the hydraulic jump. The non-wetting film is significantly thicker than Bretherton’s prediction and follows in turn a different law which is determined experimentally. The non-wetting film thickness is found to vary as hR4/3, hR being the Ca-dependent non-dimensional Bretherton film thickness.
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Clark, Wayne D., Mark E. Keefer i Dawn-Marie Cook. "Film thickness measurement of amorphous silicon". W SPIE'S 1993 Symposium on Microlithography, redaktor Michael T. Postek. SPIE, 1993. http://dx.doi.org/10.1117/12.148976.

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Horie, Masahiro, Nariaki Fujiwara, Masahiko Kokubo i Hiroshi Kakiuchida. "Spectroscopic multilayer film thickness measurement system". W SPIE's 1996 International Symposium on Microlithography, redaktor Susan K. Jones. SPIE, 1996. http://dx.doi.org/10.1117/12.240125.

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Kelly-Zion, Peter, William Collins i Diana Glawe. "Application of Laser Interferometry for Transient Film Thickness Measurements". W ASME 2004 Heat Transfer/Fluids Engineering Summer Conference. ASMEDC, 2004. http://dx.doi.org/10.1115/ht-fed2004-56693.

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A laser interferometry technique for making transient measurements of film thickness of the order of 10 to more than 1000 μm is described. The basis for these measurements was reported previously [1] but the technique was applied to solid glass slides and a slowly thinning silicone oil film. The current work describes an adaptation of the technique for the measurement of rapidly changing film thickness, as occurs with evaporating films. A beam from a helium-neon laser is focused on the film at an oblique angle. Some of the laser light is reflected off of the top surface of the film and some is reflected off of the bottom surface. The light reflected from the two surfaces forms a concentric interference fringe pattern which is projected onto a screen and recorded by a high-speed camera. The film thickness is directly related to the spacing of the fringes. To demonstrate the technique, measurements of the time-varying thickness of three evaporating films are presented and experimental considerations are discussed.
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Kondo, Nobuyuki, Nariaki Fujiwara i Atsushi Abe. "Film thickness measurement of ultrathin film using UV wavelength light". W Micro - DL Tentative, redaktor Michael T. Postek, Jr. SPIE, 1992. http://dx.doi.org/10.1117/12.59825.

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He, Ping, Chao Liu, Qi Li i Shengmei Cao. "Non-contact measurement of plastic film thickness". W 2014 33rd Chinese Control Conference (CCC). IEEE, 2014. http://dx.doi.org/10.1109/chicc.2014.6896241.

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Jekauc, Igor, Elizabeth Donohue i Bill Roberts. "Enhancing film thickness metrology optical coefficient control". W Microlithography 2004, redaktor Richard M. Silver. SPIE, 2004. http://dx.doi.org/10.1117/12.535231.

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Dentinger, Paul M., Gregory F. Cardinale, Craig C. Henderson, Aaron Fisher i Avijit K. Ray-Chaudhuri. "Photoresist film thickness for extreme ultraviolet lithography". W Microlithography 2000, redaktor Elizabeth A. Dobisz. SPIE, 2000. http://dx.doi.org/10.1117/12.390098.

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Raporty organizacyjne na temat "Film thickness"

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Thomas, J. K., i R. S. Ondrejcin. Aluminum oxide film thickness and emittance. Office of Scientific and Technical Information (OSTI), listopad 1991. http://dx.doi.org/10.2172/7102414.

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Thomas, J. K., i R. S. Ondrejcin. Aluminum oxide film thickness and emittance. Office of Scientific and Technical Information (OSTI), listopad 1991. http://dx.doi.org/10.2172/10174397.

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Rao, Vikram, i Ronald G. Polcawich. Reducing Film Thickness in Lead Zirconate Titanate Thin Film Capacitors. Fort Belvoir, VA: Defense Technical Information Center, grudzień 2007. http://dx.doi.org/10.21236/ada474969.

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B. R. Marshall. Glue Film Thickness Measurements by Spectral Reflectance. Office of Scientific and Technical Information (OSTI), wrzesień 2010. http://dx.doi.org/10.2172/991875.

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Wu, Qihau, Kathryn Kremer i Stephen Gibbons. Determination of nanomaterials’ film thickness using filmetrics F40-UV thin-film analyzer; Standard Operating Procedure Series : Characterization (C). Engineer Research and Development Center (U.S.), sierpień 2019. http://dx.doi.org/10.21079/11681/33627.

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Mohri, Masayasu, Shin Kenei, Kuniaki Takahashi, Tohru Komoriya i Sukumar Chakravarthy. Development of the Prediction Methods for the Film Thickness in the Electrodeposition Painting. Warrendale, PA: SAE International, wrzesień 2005. http://dx.doi.org/10.4271/2005-08-0537.

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Poirier, M., F. Fernando Fondeur i S. Samuel Fink. DETERMINATION OF LIQUID FILM THICKNESS FOLLOWING DRAINING OF CONTACTORS, VESSELS, AND PIPES IN THE MCU PROCESS. Office of Scientific and Technical Information (OSTI), czerwiec 2006. http://dx.doi.org/10.2172/891655.

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Sitek, M., i S. Lottes. Computational Analysis of Water Film Thickness During Rain Events for Assessing Hydroplaning Risk Part 2: Rough Road Surfaces. Office of Scientific and Technical Information (OSTI), lipiec 2020. http://dx.doi.org/10.2172/1677647.

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Lottes, S., M. Sitek i N. Sinha. Computational Analysis of Water Film Thickness During Rain Events for Assessing Hydroplaning Risk, Part 1: Nearly Smooth Road Surfaces. Office of Scientific and Technical Information (OSTI), lipiec 2020. http://dx.doi.org/10.2172/1674976.

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Schunk, Peter Randall, William P. King, Amy Cha-Tien Sun i Harry D. Rowland. Impact of polymer film thickness and cavity size on polymer flow during embossing : towards process design rules for nanoimprint lithography. Office of Scientific and Technical Information (OSTI), sierpień 2006. http://dx.doi.org/10.2172/893154.

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