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Artykuły w czasopismach na temat "FIB"
Liu, Ta-Wei, Chung-Feng Huang, Ming-Lun Yeh, Pei-Chien Tsai, Tyng-Yuan Jang, Jee-Fu Huang, Chia-Yen Dai, Wan-Long Chuang i Ming-Lung Yu. "Less liver fibrosis marker increment in overweight chronic hepatitis B patients observed by age-adjusted Fibrosis-4 Index". BMJ Open Gastroenterology 7, nr 1 (grudzień 2020): e000543. http://dx.doi.org/10.1136/bmjgast-2020-000543.
Pełny tekst źródłaHaub, Michael, Thomas Guenther, Martin Bogner i André Zimmermann. "Use of PtC Nanotips for Low-Voltage Quantum Tunneling Applications". Micromachines 13, nr 7 (28.06.2022): 1019. http://dx.doi.org/10.3390/mi13071019.
Pełny tekst źródłaKamada, Yoshihiro, Kensuke Munekage, Takashi Nakahara, Hideki Fujii, Yoshiyuki Sawai, Yoshinori Doi, Hideyuki Hyogo i in. "The FIB-4 Index Predicts the Development of Liver-Related Events, Extrahepatic Cancers, and Coronary Vascular Disease in Patients with NAFLD". Nutrients 15, nr 1 (23.12.2022): 66. http://dx.doi.org/10.3390/nu15010066.
Pełny tekst źródłaHu, Fupin, Jessica A. O'Hara, Jesabel I. Rivera i Yohei Doi. "Molecular Features of Community-Associated Extended-Spectrum-β-Lactamase-Producing Escherichia coli Strains in the United States". Antimicrobial Agents and Chemotherapy 58, nr 11 (18.08.2014): 6953–57. http://dx.doi.org/10.1128/aac.03321-14.
Pełny tekst źródłaHaub, Michael, Thomas Günther, Martin Bogner i André Zimmermann. "Investigation of Focused Ion and Electron Beam Platinum Carbon Nano-Tips with Transmission Electron Microscopy for Quantum Tunneling Vacuum Gap Applications". Applied Sciences 11, nr 24 (11.12.2021): 11793. http://dx.doi.org/10.3390/app112411793.
Pełny tekst źródłaTashima, Janet, i Jay Lindquist. "Combining Focused Ion Beam and Scanning Electron Microscopy for IC Fab Support and Defect Review". Microscopy Today 4, nr 3 (kwiecień 1996): 18–19. http://dx.doi.org/10.1017/s1551929500067961.
Pełny tekst źródłaDonoso N., Tania, i María Isabel Villegas T. "Percepción materna del ajuste socioemocional de sus hijos preescolares: Estudio descriptivo y comparativo de familias separadas e intactas con alto y bajo nivel de ajuste marital". Revista de Psicología 9, nr 1 (1.01.2000): 29. http://dx.doi.org/10.5354/0719-0581.2000.18544.
Pełny tekst źródłaSteinbaum, Ellen. "A Fib". JAMA 325, nr 11 (16.03.2021): 1114. http://dx.doi.org/10.1001/jama.2020.25268.
Pełny tekst źródłaCórdoba, Rosa. "Editorial for the Special Issue on Nanofabrication with Focused Electron/Ion Beam Induced Processing". Micromachines 12, nr 8 (28.07.2021): 893. http://dx.doi.org/10.3390/mi12080893.
Pełny tekst źródłaPhaneuf, Michael W., i Jian Li. "FIB Techniques for Analysis of Metallurgical Specimens". Microscopy and Microanalysis 6, S2 (sierpień 2000): 524–25. http://dx.doi.org/10.1017/s143192760003511x.
Pełny tekst źródłaRozprawy doktorskie na temat "FIB"
Ostřížek, Petr. "Elektrotransportní vlastnosti nanostruktur připravených metodou FIB". Master's thesis, Vysoké učení technické v Brně. Fakulta strojního inženýrství, 2011. http://www.nusl.cz/ntk/nusl-229474.
Pełny tekst źródłaMucke, S. "Herstellung von Nanometer-Strukturen mittels feinfokussiertem Ionenstrahl (FIB)". Forschungszentrum Dresden, 2010. http://nbn-resolving.de/urn:nbn:de:bsz:d120-qucosa-28940.
Pełny tekst źródłaMucke, S. "Herstellung von Nanometer-Strukturen mittels feinfokussiertem Ionenstrahl (FIB)". Forschungszentrum Rossendorf, 2004. https://hzdr.qucosa.de/id/qucosa%3A21721.
Pełny tekst źródłaClaude, Jean-Benoît. "Etude des mécanismes de nanogravure par FIB-LMAIS". Thesis, Aix-Marseille, 2017. http://www.theses.fr/2017AIXM0445/document.
Pełny tekst źródłaThe reduction of device sizes represents a major issue in microelectronic industry which motivates several teams of researchers to develop nanopatterning with atomic resolution. In this context, maskless nanostructuration techniques are well-adapted and have an important potential for the nearest future in labs and industry. The aim of the project I worked on is the connection in a Ultra-High-Vacuum (UHV) environment between a Dual-Beam, equipped with a FIB (Focused Ion Beam) and a SEM (Scanning Electron Microscopy) and a MBE (Molecular Beam Epitaxy) cluster, which is the highest-controlled deposition technique. The UHV environment is the solution for an absolute cleanliness and represents a relevant way to fabricate functionalized devices for micro-nanoelectronics, optoelectronics, photovoltaic, spintronic, plasmonic, etc… This UHV connection combining FIB nanostructuration and epitaxy growth technique provides a unique platform to elaborate tridimensional structures with milling/deposition steps. Among different applications, we decided to focus on silicon based nanostructures. Regarding silicon nanostructures. The main challenge for microelectronics industry and for the researchers in this field is the realization of optoelectronics devices fully integrated in silicon systems. This requires to convert silicon based materials into absorber/emitter of light. One of the most promising way to change the electronic structure and to get a direct bandgap is the combination of chemical functionalization and quantum confinement into silicon based nano-objects
Guellil, Imene. "Nano-fonctionnalisation par FIB haute résolution de silicium". Electronic Thesis or Diss., Aix-Marseille, 2022. http://www.theses.fr/2022AIXM0361.
Pełny tekst źródłaThe goal of this work is to develop a process for the elaboration of silicon-germanium (SiGe) quantum dots (QDs) with compositions ranging from Si to pure Ge, and allowing to obtain semiconducting QDs with sufficiently small sizes to obtain quantum confinement. For this purpose, we have used a combination of different techniques: molecular beam epitaxy, focused ion beam lithography (FIBL) and heterogeneous solid state dewetting. In this context, the aim of this research is on the one hand to develop a new FIB that can be coupled to the ultra-high vacuum molecular beam epitaxy growth chamber, and on the other hand to realize two applications: (i) nanopatterns for the self-organisation of Si and Ge QDs and (ii) nano-implantations of Si and Ge. We used FIBL with energy-filtered liquid metal alloy ion sources (LMAIS) using non-polluting ions (Si and Ge) for the milling of conventional microelectronic substrates such as SiGe on silicon-on-insulator (SGOI). The nanopatterns must be totally free of pollution and with variable and perfectly controlled characteristics (size, density, depth). The morphology of the nanopatterns is then characterized in-situ by scanning electron microscopy (SEM), and the depth is determined ex-situ by atomic force microscopy (AFM). The nanopatterns made by FIBL were compared on the one hand to plasma etchings with He and Ne and on the other hand to the etchings obtained by electronic lithography (EBL). Nanoimplantations of Si and Ge ions were realised in diamond and in ultra-thin SGOI for the fabrication of local defects
Claude, Jean-Benoît. "Etude des mécanismes de nanogravure par FIB-LMAIS". Electronic Thesis or Diss., Aix-Marseille, 2017. http://www.theses.fr/2017AIXM0445.
Pełny tekst źródłaThe reduction of device sizes represents a major issue in microelectronic industry which motivates several teams of researchers to develop nanopatterning with atomic resolution. In this context, maskless nanostructuration techniques are well-adapted and have an important potential for the nearest future in labs and industry. The aim of the project I worked on is the connection in a Ultra-High-Vacuum (UHV) environment between a Dual-Beam, equipped with a FIB (Focused Ion Beam) and a SEM (Scanning Electron Microscopy) and a MBE (Molecular Beam Epitaxy) cluster, which is the highest-controlled deposition technique. The UHV environment is the solution for an absolute cleanliness and represents a relevant way to fabricate functionalized devices for micro-nanoelectronics, optoelectronics, photovoltaic, spintronic, plasmonic, etc… This UHV connection combining FIB nanostructuration and epitaxy growth technique provides a unique platform to elaborate tridimensional structures with milling/deposition steps. Among different applications, we decided to focus on silicon based nanostructures. Regarding silicon nanostructures. The main challenge for microelectronics industry and for the researchers in this field is the realization of optoelectronics devices fully integrated in silicon systems. This requires to convert silicon based materials into absorber/emitter of light. One of the most promising way to change the electronic structure and to get a direct bandgap is the combination of chemical functionalization and quantum confinement into silicon based nano-objects
Rose, Philip David. "High-resolution in situ FIB lithography of MBE GaAs". Thesis, University of Cambridge, 1998. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.624802.
Pełny tekst źródłaKonečný, Martin. "Aplikace KPM na povrchu grafén/Si modifikovaném metodou FIB". Master's thesis, Vysoké učení technické v Brně. Fakulta strojního inženýrství, 2013. http://www.nusl.cz/ntk/nusl-230836.
Pełny tekst źródłaElFallagh, Fathi Ali. "3D Analysis of Indentation Damage by FIB tomography and TEM". Thesis, University of Sheffield, 2008. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.500111.
Pełny tekst źródłaHouel, Arnaud. "Ecriture directe de motifs nanométriques assistée par STM et FIB". Aix-Marseille 2, 2002. http://www.theses.fr/2002AIX22063.
Pełny tekst źródłaKsiążki na temat "FIB"
Wang, Zhiming M., red. FIB Nanostructures. Cham: Springer International Publishing, 2013. http://dx.doi.org/10.1007/978-3-319-02874-3.
Pełny tekst źródłaill, Swanson Maggie, i Wetzel Rick ill, red. The fib. Waterbury, CT: Letter People Co., 2002.
Znajdź pełny tekst źródłaThe big fib. London: Puffin, 2011.
Znajdź pełny tekst źródłaillustrator, Hedderwick Mairi, red. The big fib. Edinburgh: Barrington Stoke, 2015.
Znajdź pełny tekst źródłaAnderson, Melissa. The big fib. Salt Lake City, Utah: Shadow Mountain, 2010.
Znajdź pełny tekst źródłaLayton, George. The fib: And other stories. London: HarperCollins, 1994.
Znajdź pełny tekst źródłaFarrell, Darren. Doug-Dennis and the flyaway fib. New York: Dial Books for Young Readers, 2010.
Znajdź pełny tekst źródłaAyatrohaedi. FS-FIB UI di mata Ayatrohaedi. Depok: Fakultas Ilmu Pengetahuan Budaya, Universitas Indonesia, 2007.
Znajdź pełny tekst źródłafib. fib Model Code for Concrete Structures 2010. Weinheim, Germany: Wiley-VCH Verlag GmbH & Co. KGaA, 2013. http://dx.doi.org/10.1002/9783433604090.
Pełny tekst źródłaIan, Hislop, red. Lord Gnome's complete fib and lie diet. London: Private Eye, 1991.
Znajdź pełny tekst źródłaCzęści książek na temat "FIB"
Labille, Jérôme, Natalia Pelinovskaya, Céline Botta, Jean-Yves Bottero, Armand Masion, Dilip S. Joag, Richard G. Forbes i in. "FIB-SEM". W Encyclopedia of Nanotechnology, 824. Dordrecht: Springer Netherlands, 2012. http://dx.doi.org/10.1007/978-90-481-9751-4_100246.
Pełny tekst źródłaBauch, Jürgen, i Rüdiger Rosenkranz. "FIB - Ionenfeinstrahltechnik". W Physikalische Werkstoffdiagnostik, 14–15. Berlin, Heidelberg: Springer Berlin Heidelberg, 2017. http://dx.doi.org/10.1007/978-3-662-53952-1_7.
Pełny tekst źródłaPrieto, Gonzalo. "FIB-SEM Tomography". W Encyclopedia of Membranes, 770–72. Berlin, Heidelberg: Springer Berlin Heidelberg, 2016. http://dx.doi.org/10.1007/978-3-662-44324-8_2211.
Pełny tekst źródłaPrieto, Gonzalo. "FIB-SEM Tomography". W Encyclopedia of Membranes, 1–3. Berlin, Heidelberg: Springer Berlin Heidelberg, 2015. http://dx.doi.org/10.1007/978-3-642-40872-4_2211-1.
Pełny tekst źródłaGiannuzzi, Lucille A. "FIB-SEM for Biomaterials". W Biological Field Emission Scanning Electron Microscopy, 517–32. Chichester, UK: John Wiley & Sons, Ltd, 2019. http://dx.doi.org/10.1002/9781118663233.ch24.
Pełny tekst źródłaLi, Jian, i Pei Liu. "On FIB Milling Parameters". W The Minerals, Metals & Materials Series, 3–9. Cham: Springer International Publishing, 2018. http://dx.doi.org/10.1007/978-3-319-72484-3_1.
Pełny tekst źródła"Fibs Don't Fib". W Technical Analysis of the Currency Market, 99–112. Hoboken, NJ, USA: John Wiley & Sons, Inc., 2015. http://dx.doi.org/10.1002/9781119201496.ch7.
Pełny tekst źródła"FIB-SEM". W Encyclopedia of Biophysics, 759. Berlin, Heidelberg: Springer Berlin Heidelberg, 2013. http://dx.doi.org/10.1007/978-3-642-16712-6_100318.
Pełny tekst źródła"FIB-SEM". W Encyclopedia of Nanotechnology, 1169. Dordrecht: Springer Netherlands, 2016. http://dx.doi.org/10.1007/978-94-017-9780-1_100332.
Pełny tekst źródłaFine, Michael, James W. Peters i Robert S. Lawrence. "A. FIB". W The Nature of Health, 127–30. CRC Press, 2018. http://dx.doi.org/10.1201/9781315365398-19.
Pełny tekst źródłaStreszczenia konferencji na temat "FIB"
Michael, Joseph. "Introduction to FIB and applications: Plasma FIB and laser." W Proposed for presentation at the CCEM Lecture Series on Electron and Ion Microscopy held June 7-11, 2021 in Hamilton , Ontario, Canado. US DOE, 2021. http://dx.doi.org/10.2172/1870975.
Pełny tekst źródłaStegmann, Heiko, Hubert Schulz i James Whitby. "FIB-SIMS in FIB-SEMs—Practical Aspects for Physical Failure Analysis". W ISTFA 2022. ASM International, 2022. http://dx.doi.org/10.31399/asm.cp.istfa2022p0257.
Pełny tekst źródłaGadkari, Kaustubh, M. Lawrence Weikum, Dan Massey i Christos Papadopoulos. "Pragmatic router FIB caching". W 2015 IFIP Networking Conference (IFIP Networking). IEEE, 2015. http://dx.doi.org/10.1109/ifipnetworking.2015.7145296.
Pełny tekst źródłaSuzuki, Eiji, Josh Adams, Calvin Ball, Tim McCready i Sonya Robinson. "FIB on Test Board". W ISTFA 2016. ASM International, 2016. http://dx.doi.org/10.31399/asm.cp.istfa2016p0402.
Pełny tekst źródłaBonifacio, C. S., P. Nowakowski, M. J. Campin, M. L. Ray i P. E. Fischione. "Low Energy Ar Ion Milling of FIB TEM Specimens from 14 nm and Future FinFET Technologies". W ISTFA 2018. ASM International, 2018. http://dx.doi.org/10.31399/asm.cp.istfa2018p0241.
Pełny tekst źródłaMoore, Thomas M. "Nanomechanical Characterization in the FIB". W ISTFA 2005. ASM International, 2005. http://dx.doi.org/10.31399/asm.cp.istfa2005p0209.
Pełny tekst źródłaSarrar, Nadi, Robert Wuttke, Stefan Schmid, Marcin Bienkowski i Steve Uhlig. "Leveraging locality for FIB aggregation". W GLOBECOM 2014 - 2014 IEEE Global Communications Conference. IEEE, 2014. http://dx.doi.org/10.1109/glocom.2014.7037090.
Pełny tekst źródłaYun-Ru Wu, Shu-Yi Kao i Shih-Arn Hwang. "Minimizing ECO routing for FIB". W 2010 International Symposium on VLSI Design, Automation and Test (VLSI-DAT). IEEE, 2010. http://dx.doi.org/10.1109/vdat.2010.5496675.
Pełny tekst źródłaGiannuzzi, Lucille A. "Multi-signal FIB/SEM tomography". W SPIE Defense, Security, and Sensing. SPIE, 2012. http://dx.doi.org/10.1117/12.919821.
Pełny tekst źródłaKaufmann, Henry C., William B. Thompson i Gregory J. Dunn. "Fib Mask Repair With Microtrim". W 1986 Microlithography Conferences, redaktor Phillip D. Blais. SPIE, 1986. http://dx.doi.org/10.1117/12.963669.
Pełny tekst źródłaRaporty organizacyjne na temat "FIB"
Shul, Randy J., Michael J. Rye, Greg Salazar i Steve Ball. FEI FIB/SEM Failure Analysis. Office of Scientific and Technical Information (OSTI), styczeń 2019. http://dx.doi.org/10.2172/1492079.
Pełny tekst źródłaCampbell, A. N., D. M. Tanner, J. M. Soden, E. Adams, M. Gibson, M. Abramo, A. Doyle i D. K. Stewart. Electrical and chemical characterization of FIB-deposited insulators. Office of Scientific and Technical Information (OSTI), październik 1997. http://dx.doi.org/10.2172/532558.
Pełny tekst źródłaOgura, K. S., S. B. Donald i B. W. Chung. Improving Microstructural Quantification in 3D FIB-SEM Tomography. Office of Scientific and Technical Information (OSTI), wrzesień 2019. http://dx.doi.org/10.2172/1566797.
Pełny tekst źródłaTrotter, G. Terminology for Forwarding Information Base (FIB) based Router Performance. RFC Editor, grudzień 2001. http://dx.doi.org/10.17487/rfc3222.
Pełny tekst źródłaHarmer, M. P. A Focused-Ion Beam (FIB) Nano-Fabrication and Characterization Facility. Fort Belvoir, VA: Defense Technical Information Center, listopad 2002. http://dx.doi.org/10.21236/ada408750.
Pełny tekst źródłaTegtmeier, Eric, i Caitlin Taylor. Single Crystal UO2 cube creation using a Xe Plasma FIB. Office of Scientific and Technical Information (OSTI), październik 2020. http://dx.doi.org/10.2172/1688725.
Pełny tekst źródłaBradley, J., Z. Dai, G. Graham i N. Teslich. Final Report - SRNL Agreement #AC51296V SEM, FIB, TEM Studies of CZT Samples. Office of Scientific and Technical Information (OSTI), sierpień 2007. http://dx.doi.org/10.2172/924965.
Pełny tekst źródłaWall, M., M. Fluss i C. Schaldach. Dual Beam FIB for Imaging, Nano-Sectioning and Sample Preparation of Spores: Initial Results. Office of Scientific and Technical Information (OSTI), kwiecień 2004. http://dx.doi.org/10.2172/892791.
Pełny tekst źródłaGillor, Osnat, Stefan Wuertz, Karen Shapiro, Nirit Bernstein, Woutrina Miller, Patricia Conrad i Moshe Herzberg. Science-Based Monitoring for Produce Safety: Comparing Indicators and Pathogens in Water, Soil, and Crops. United States Department of Agriculture, maj 2013. http://dx.doi.org/10.32747/2013.7613884.bard.
Pełny tekst źródłaIto, Takatoshi, i Masahiro Yamada. Did the Reform Fix the London Fix Problem? Cambridge, MA: National Bureau of Economic Research, kwiecień 2017. http://dx.doi.org/10.3386/w23327.
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