Gotowa bibliografia na temat „CARRIER RELIABILITY”

One of the main problems encountered when scaling down is the hot carrier induced degradation of MOSFETs. This problem has been studied intensively during the past decade, under both static and dynamic stress conditions. In this period it has evolved from a more or less academic research topic to one of the most stringent constraints guaranteeing the lifetime of sub-micron devices. New drain engineering technique leads to the extensive usage of lateral doped drain structures. In these devices the peak of the lateral field is lowered by reducing the doping concentration near the drain and by providing a smooth junction transition instead of an abrupt one. Therefore, the amount of hot carrier generation for a given supply voltage and the influence of a certain physical damage on the electrical characteristics is decreased dramatically. A complete understanding of the hot carrier degradation problem in sub-micron 0.25um LD MOSFETs is presented in this work. First we discuss the degradation mechanisms observed under, for circuit operation, somewhat artificial but well-controlled uniform-substrate hot electron and substrate hot-hole injection conditions. Then the more realistic case of static channel hot carrier degradation is treated, and some important process-related effects are illustrated, followed by the behavior under the most relevant case for real operation, namely dynamic degradation. An Accurate and practical parameter extraction is used to obtain the LD MOSFETs model parameters, with the experiment verification. Good agreement between the model simulation and experiment is achieved. The gate charge transfer performance is examined to demonstrate the hot carrier effect. Furthermore, In order to understand the dynamic stress on the LD MOSFET and its effect on RF circuit, the hot-carrier injection experiment in which dynamic stress with different duty cycle applied to a LD MOS transistor is presented. A Class-C power amplifier is used to as an example to demonstrate the effect of dynamic stress on RF circuit performance. Finally, the strategy for improving hot carrier reliability and a forecast of the hot carrier reliability problem for nano-technologies are discussed. The main contribution of this work is, it systemically research the hot carrier reliability issue on the sub-micron lateral doped drain MOSFETs, which is induced by static and dynamic voltage stress; The stress condition mimics the typical application scenarios of LD MOSFET. Model parameters extraction technique is introduced with the aid of the current device modeling tools, the performance degradation model can be easily implement into the existing computer-aided tools. Therefore, circuit performance degradation can be accurately estimated in the design stage. CMOS technologies are constantly scaled down. The production on 65 nm is on the market. With the reduction in geometries, the devices become more vulnerable to hot carrier injection (HCI). HCI reliability is a must for designs implemented with new processes. Reliability simulation needs to be implemented in PDK libraries located on the modeling stage. The use of professional tools is a prerequisite to develop accurate device models, from DC to GHz, including noise modeling and nonlinear HF effects, within a reasonable time. Designers need to learn to design for reliability and they should be educated on additional reliability analyses. The value is the reduction of failure and redesign costs.<br>Ph.D.<br>School of Electrical Engineering and Computer Science<br>Engineering and Computer Science<br>Electrical Engineering

The objective of the research presented in this thesis was to investigate the effects of wearout processes on the performance and reliability of CMOS bistable circuits. The main wearout process affecting reliability of submicron MOS devices was identified as hot-carrier stress (and the resulting degradation in circuit performance). The effect of hot-carrier degradation on the resolving time leading to metastability of the bistable circuits also have been investigated. Hot-carrier degradation was identified as a major reliability concern for CMOS bistable circuits designed using submicron technologies. The major hot-carrier effects are the impact ionisation of hot- carriers in the channel of a MOS device and the resulting substrate current and gate current generation. The substrate current has been used as the monitor for the hot-carrier stress and have developed a substrate current model based on existing models that have been extended to incorporate additional effects for submicron devices. The optimisation of the substrate current model led to the development of degradation and life-time models. These are presented in the thesis. A number of bistable circuits designed using 0.7 micron CMOS technology design rules were selected for the substrate current model analysis. The circuits were simulated using a set of optimised SPICE model parameters and the stress factors on each device was evaluated using the substrate current model implemented as a post processor to the SPICE simulation. Model parameters for each device in the bistable were degraded according to the stress experienced and simulated again to determine the degradation in characteristic timing parameters for a predetermined stress period. A comparative study of the effect of degradation on characteristic timing parameters for a number of latch circuits was carried out. The life-times of the bistables were determined using the life-time model. The bistable circuits were found to enter a metastable state under critical timing conditions. The effect of hot-carrier stress induced degradation on the metastable state operation of the bistables were analysed. Based on the analysis of the hot-carrier degradation effects on the latch circuits, techniques are suggested to reduce hot-carrier stress and to improve circuit life-time. Modifications for improving hot- carrier reliability were incorporated into all the bistable circuits which were re-simulated to determine the improvement in life-time and reliability of the circuits under hot-carrier stress. The improved circuits were degraded based on the new stress factors and the degradation effects on the critical timing parameters evaluated and these were compared with those before the modifications. The improvements in the life-time and the reliability of the selected bistable circuits were quantified. It has been demonstrated that the hot-carrier reliability for all the selected bistable circuits can be improved by design techniques to reduce the stress on identified critically stressed devices.