Articoli di riviste sul tema "STM lithography"
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Dobrik, G., L. Tapasztó, P. Nemes-Incze, Ph Lambin e L. P. Biró. "Crystallographically oriented high resolution lithography of graphene nanoribbons by STM lithography". physica status solidi (b) 247, n. 4 (15 gennaio 2010): 896–902. http://dx.doi.org/10.1002/pssb.200982953.
Testo completoMarrian, C. R. K., e E. A. Dobisz. "High-resolution lithography with a vacuum STM". Ultramicroscopy 42-44 (luglio 1992): 1309–16. http://dx.doi.org/10.1016/0304-3991(92)90440-u.
Testo completoZhang, L. B., J. X. Shi, Ju Long Yuan, Shi Ming Ji e M. Chang. "The Advancement of SPM-Based Nanolithography". Materials Science Forum 471-472 (dicembre 2004): 353–57. http://dx.doi.org/10.4028/www.scientific.net/msf.471-472.353.
Testo completoYang, Ye, e Wan Sheng Zhao. "Fabrication of the Nanoscale Flat-Bottomed and Lamellar Structures on HOPG Surface by STM-Based Electric Lithography". Key Engineering Materials 562-565 (luglio 2013): 45–51. http://dx.doi.org/10.4028/www.scientific.net/kem.562-565.45.
Testo completoKleineberg, U., A. Brechling, M. Sundermann e U. Heinzmann. "STM Lithography in an Organic Self-Assembled Monolayer". Advanced Functional Materials 11, n. 3 (giugno 2001): 208–12. http://dx.doi.org/10.1002/1616-3028(200106)11:3<208::aid-adfm208>3.0.co;2-x.
Testo completoVetrone, J., e Y. W. Chung. "Changes in tip structure measured during STM lithography". Applied Surface Science 78, n. 3 (luglio 1994): 331–38. http://dx.doi.org/10.1016/0169-4332(94)90022-1.
Testo completoDobrik, Gergely, Levente Tapasztó e László Biró. "Nanometer wide ribbons and triangles by STM lithography of graphene". Nanopages 7, n. 1 (giugno 2012): 1–7. http://dx.doi.org/10.1556/nano.2010.00001.
Testo completoTucker, J. R., e T. C. Shen. "Prospects for atomically ordered device structures based on STM lithography". Solid-State Electronics 42, n. 7-8 (luglio 1998): 1061–67. http://dx.doi.org/10.1016/s0038-1101(97)00302-x.
Testo completoKASU, Makoto, e Naoki KOBAYASHI. "Nanoscale Semiconductor Processes Using STM and AFM Lithographies. Nanometer-scale GaAs Selective Growth Using STM Lithography." Hyomen Kagaku 19, n. 11 (1998): 734–41. http://dx.doi.org/10.1380/jsssj.19.734.
Testo completoLeuschner, R., E. Günther, G. Falk, A. Hammerschmidt, K. Kragler, I. W. Rangelow e J. Zimmermann. "Bilayer resist process for exposure with low-voltage electrons (STM-lithography)". Microelectronic Engineering 30, n. 1-4 (gennaio 1996): 447–50. http://dx.doi.org/10.1016/0167-9317(95)00284-7.
Testo completoWang, Guang Long, Min Gao, Li Shuang Feng, Yi Dun, Jian Guo Hou e Jie Tang. "Nanostructures and Nanodevices Special Fabrication and Characterization". Key Engineering Materials 483 (giugno 2011): 243–48. http://dx.doi.org/10.4028/www.scientific.net/kem.483.243.
Testo completoYang, Ye, e Zuhua Fang. "Nanoscale electric discharge‐induced FLG peeling off during the STM electric lithography". Micro & Nano Letters 12, n. 10 (ottobre 2017): 793–98. http://dx.doi.org/10.1049/mnl.2017.0383.
Testo completoSAKURAI, Makoto, Carsten THIRSTRUP e Masakazu AONO. "Nanoscale Semiconductor Processes Using STM and AFM Lithographies. Formation of Silicon Dangling Bonds Using STM Lithography and Its Decoration." Hyomen Kagaku 19, n. 11 (1998): 708–15. http://dx.doi.org/10.1380/jsssj.19.708.
Testo completoMühl, T., e S. Myhra. "Electro-oxidative lithography by STM as a proximity electrode of electrically conducting DLC". Journal of Physics: Conference Series 61 (1 aprile 2007): 841–46. http://dx.doi.org/10.1088/1742-6596/61/1/168.
Testo completoMol, J. A., S. P. C. Beentjes e S. Rogge. "A low temperature surface preparation method for STM nano-lithography on Si(100)". Applied Surface Science 256, n. 16 (giugno 2010): 5042–45. http://dx.doi.org/10.1016/j.apsusc.2010.03.052.
Testo completoChen, Fan, Anhong Zhou e Haeyeon Yang. "The effects of strain on STM lithography on HS-ssDNA/Au (111) surface". Applied Surface Science 255, n. 15 (maggio 2009): 6832–39. http://dx.doi.org/10.1016/j.apsusc.2009.03.003.
Testo completoJede, Ralf, e George Lanzarotta. "Using a SEM to “Write” Sub Micron Structures". Microscopy Today 1, n. 4 (giugno 1993): 4–5. http://dx.doi.org/10.1017/s1551929500067389.
Testo completoSavouchkina, A., A. Foelske-Schmitz, V. A. Guzenko, D. Weingarth, G. G. Scherer, A. Wokaun e R. Kötz. "In situ STM study of Pt-nanodot arrays on HOPG prepared by electron-beam lithography". Electrochemistry Communications 13, n. 5 (maggio 2011): 484–87. http://dx.doi.org/10.1016/j.elecom.2011.02.027.
Testo completoOhtsuka, Kenichi, e Kenji Yonei. "Nanometer-Scale Surface Modification Using Scanning Tunneling Microscope (STM)-Based Lithography with Conductive Layer on Resist". Japanese Journal of Applied Physics 41, Part 2, No. 6B (15 giugno 2002): L667—L668. http://dx.doi.org/10.1143/jjap.41.l667.
Testo completoISHIBASHI, Masayoshi, Seiji HEIKE, Hiroshi KAJIYAMA, Yasuo WADA e Tomihiro HASHIZUME. "Nanoscale Semiconductor Processes Using STM and AFM Lithographies. Ten-nanometer Level Lithography Using Scanning Probe Microscopy." Hyomen Kagaku 19, n. 11 (1998): 722–26. http://dx.doi.org/10.1380/jsssj.19.722.
Testo completoTosic, Dragana, Zoran Markovic, Svetlana Jovanovic, Momir Milosavljevic e Biljana Todorovic-Markovic. "Comparative analysis of different methods for graphene nanoribbon synthesis". Chemical Industry 67, n. 1 (2013): 147–56. http://dx.doi.org/10.2298/hemind120403056t.
Testo completoHersam, M. C., G. C. Abeln e J. W. Lyding. "An approach for efficiently locating and electrically contacting nanostructures fabricated via UHV-STM lithography on Si(100)". Microelectronic Engineering 47, n. 1-4 (giugno 1999): 235–37. http://dx.doi.org/10.1016/s0167-9317(99)00203-8.
Testo completoPavlova, T. V., V. M. Shevlyuga, B. V. Andryushechkin, G. M. Zhidomirov e K. N. Eltsov. "Local removal of silicon layers on Si(1 0 0)-2 × 1 with chlorine-resist STM lithography". Applied Surface Science 509 (aprile 2020): 145235. http://dx.doi.org/10.1016/j.apsusc.2019.145235.
Testo completoSundermann, M., J. Hartwich, K. Rott, D. Meyners, E. Majkova, U. Kleineberg, M. Grunze e U. Heinzmann. "Nanopatterning of Au absorber films on Mo/Si EUV multilayer mirrors by STM lithography in self-assembled monolayers". Surface Science 454-456 (maggio 2000): 1104–9. http://dx.doi.org/10.1016/s0039-6028(00)00208-9.
Testo completoFoelske-Schmitz, A., A. Peitz, V. A. Guzenko, D. Weingarth, G. G. Scherer, A. Wokaun e R. Kötz. "In situ electrochemical STM study of platinum nanodot arrays on highly oriented pyrolythic graphite prepared by electron beam lithography". Surface Science 606, n. 23-24 (dicembre 2012): 1922–33. http://dx.doi.org/10.1016/j.susc.2012.07.040.
Testo completoAONO, Masakazu, Chun-Sheng JIANG, Tomonobu NAKAYAMA, Taichi OKUDA, Shan QIAO, Makoto SAKURAI, Carsten THIRSTRUP e Zang-Hua WU. "Nanoscale Semiconductor Processes Using STM and AFM Lithographies. The Present and Future of Nano-Lithography Using Scanning Probes. How to Measure the Properties of Nano-Lithographed Structures." Hyomen Kagaku 19, n. 11 (1998): 698–707. http://dx.doi.org/10.1380/jsssj.19.698.
Testo completoDzurak, A. S., M. Y. Simmons, A. R. Hamilton, R. G. Clark, R. Brenner, T. M. Buehler, N. J. Curson et al. "Construction of a silicon-based solid state quantum computer". Quantum Information and Computation 1, Special (dicembre 2001): 82–95. http://dx.doi.org/10.26421/qic1.s-8.
Testo completoYang, Ye, e Wansheng Zhao. "Investigation of the nanoscale features fabricated on the HOPG surface induced by STM electric lithography under different voltage regions in ambient conditions". Precision Engineering 37, n. 2 (aprile 2013): 473–82. http://dx.doi.org/10.1016/j.precisioneng.2012.12.004.
Testo completoSmolyaninov, Igor I. "Scanning Probe Microscopy of Surface Plasmons". International Journal of Modern Physics B 11, n. 21 (20 agosto 1997): 2465–510. http://dx.doi.org/10.1142/s021797929700126x.
Testo completoYang, Ye, e Jun Lin. "Study of the electrode tool wear and the probe tip sharpening phenomena during the nanoscale STM electric discharge lithography of the bulk HOPG surface". Journal of Materials Processing Technology 234 (agosto 2016): 150–57. http://dx.doi.org/10.1016/j.jmatprotec.2016.03.022.
Testo completoYamamoto, Hiroki, Guy Dawson, Takahiro Kozawa e Alex P. G. Robinson. "Lamellar Orientation of a Block Copolymer via an Electron-Beam Induced Polarity Switch in a Nitrophenyl Self-Assembled Monolayer or Si Etching Treatments". Quantum Beam Science 4, n. 2 (27 marzo 2020): 19. http://dx.doi.org/10.3390/qubs4020019.
Testo completoPark, Jun Han, Dan Hee Yun, Yong Won Ma, Cheong Yeol Gwak e Bo Sung Shin. "Prism-Based Laser Interference Lithography System for Simple Multibeam Interference Lithography". Science of Advanced Materials 12, n. 3 (1 marzo 2020): 398–402. http://dx.doi.org/10.1166/sam.2020.3650.
Testo completoFischer, Ulrich Christian, Carsten Hentschel, Florian Fontein, Linda Stegemann, Christiane Hoeppener, Harald Fuchs e Stefanie Hoeppener. "Near-field photochemical and radiation-induced chemical fabrication of nanopatterns of a self-assembled silane monolayer". Beilstein Journal of Nanotechnology 5 (3 settembre 2014): 1441–49. http://dx.doi.org/10.3762/bjnano.5.156.
Testo completoZhang, Man, Liang-Ping Xia, Sui-Hu Dang, A.-Xiu Cao, Qi-Ling Deng e Chun-Lei Du. "A Novel Nanoimprint Lithography Thiol-ene Resist for Sub-70 nm Nanostructures". Science of Advanced Materials 12, n. 6 (1 giugno 2020): 779–83. http://dx.doi.org/10.1166/sam.2020.3721.
Testo completoYou, Dong-Bin, Jun-Han Park, Bo-Seok Kang, Dan-Hee Yun e Bo Sung Shin. "A Fundamental Study of a Surface Modification on Silicon Wafer Using Direct Laser Interference Patterning with 355-nm UV Laser". Science of Advanced Materials 12, n. 4 (1 aprile 2020): 516–19. http://dx.doi.org/10.1166/sam.2020.3658.
Testo completoDu, Hua, Hui Min Xie, Hai Chang Jiang, Li Jian Rong, Qi Ang Luo, Chang Zhi Gu e Ya-Pu Zhao. "Strain Analysis on Porous TiNi SMA Using SEM Moiré Method". Key Engineering Materials 326-328 (dicembre 2006): 79–82. http://dx.doi.org/10.4028/www.scientific.net/kem.326-328.79.
Testo completoZhang, Hui Yong. "Nano Structures Constructed by AFM Based Lithography". Advanced Materials Research 815 (ottobre 2013): 490–95. http://dx.doi.org/10.4028/www.scientific.net/amr.815.490.
Testo completoHu, Qin. "Thermal Evolution of Compound Nanoparticles on Moulds Machined by Focused-Ion-Beam for Micro/Nano Lithography". Journal of Nano Research 18-19 (luglio 2012): 307–15. http://dx.doi.org/10.4028/www.scientific.net/jnanor.18-19.307.
Testo completoGuo, XiaoWei, Jinglei Du, Xiangang Luo, Qiling Deng e Chunlei Du. "RET simulations for SLM-based maskless lithography". Microelectronic Engineering 85, n. 5-6 (maggio 2008): 929–33. http://dx.doi.org/10.1016/j.mee.2008.01.055.
Testo completoToyofuku, Takashi, Shinya Nishimura, Kazuya Miyashita e Jun-Ichi Shirakashi. "10 Micrometer-Scale SPM Local Oxidation Lithography". Journal of Nanoscience and Nanotechnology 10, n. 7 (1 luglio 2010): 4543–47. http://dx.doi.org/10.1166/jnn.2010.2356.
Testo completoKim, Kwang-Ryul, Junsin Yi, Sung-Hak Cho, Nam-Hyun Kang, Myung-Woo Cho, Bo-Sung Shin e Byoungdeog Choi. "SLM-based maskless lithography for TFT-LCD". Applied Surface Science 255, n. 18 (giugno 2009): 7835–40. http://dx.doi.org/10.1016/j.apsusc.2009.05.022.
Testo completoSexton, B. A., e R. J. Marnock. "Characterization of High Resolution Resists and Metal Shims by Scanning Probe Microscopy". Microscopy and Microanalysis 6, n. 2 (marzo 2000): 129–36. http://dx.doi.org/10.1007/s100059910012.
Testo completoYang, Ki Yeon, Jong Woo Kim, Sung Hoon Hong e Heon Lee. "Patterning of the Self-Assembled Monolayer Using the Zero Residual Nano-Imprint Lithography". Solid State Phenomena 124-126 (giugno 2007): 523–26. http://dx.doi.org/10.4028/www.scientific.net/ssp.124-126.523.
Testo completoKim, Seonjun, e Young Tae Cho. "Replication and Surface Treatment of Micro Pattern Generated by Entanglement of Nanowires". Science of Advanced Materials 12, n. 3 (1 marzo 2020): 403–6. http://dx.doi.org/10.1166/sam.2020.3651.
Testo completoSeo, Manseung, e Haeryung Kim. "Delta lithography method to increase CD uniformity and throughput of SLM-based maskless lithography". Microelectronic Engineering 87, n. 5-8 (maggio 2010): 1135–38. http://dx.doi.org/10.1016/j.mee.2009.10.053.
Testo completoHasegawa, Akihiro, Ryo-Il Kang e Katsufusa Shono. "Electron beam direct lithography system using the SEM". Electronics and Communications in Japan (Part II: Electronics) 75, n. 11 (1992): 51–61. http://dx.doi.org/10.1002/ecjb.4420751106.
Testo completoHuang, Cheng, Markus Moosmann, Jiehong Jin, Tobias Heiler, Stefan Walheim e Thomas Schimmel. "Polymer blend lithography: A versatile method to fabricate nanopatterned self-assembled monolayers". Beilstein Journal of Nanotechnology 3 (4 settembre 2012): 620–28. http://dx.doi.org/10.3762/bjnano.3.71.
Testo completoYamamoto, Takamichi, Hideki Maekawa e Tsutomu Yamamura. "AFM Anodization Lithography on Transparent Conductive Substrates". Journal of Nanoscience and Nanotechnology 8, n. 8 (1 agosto 2008): 3838–42. http://dx.doi.org/10.1166/jnn.2008.191.
Testo completoFarehanim, M. A., U. Hashim, Norhayati Soin, A. H. Azman, S. Norhafizah, M. F. Fatin e R. M. Ayub. "Fabrication of Aluminum Interdigitated Electrode for Biosensor Application Using Conventional Lithography". Advanced Materials Research 1109 (giugno 2015): 118–22. http://dx.doi.org/10.4028/www.scientific.net/amr.1109.118.
Testo completoLauria, John, Ronald Albright, Olga Vladimirsky, Maarten Hoeks, Roel Vanneer, Bert van Drieenhuizen, Luoqi Chen, Luc Haspeslagh e Ann Witvrouw. "SLM device for 193nm lithographic applications". Microelectronic Engineering 86, n. 4-6 (aprile 2009): 569–72. http://dx.doi.org/10.1016/j.mee.2008.11.022.
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