Articoli di riviste sul tema "RF sputtering"
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Yokogawa, Yoshiyuki, Taishi Morishima, Mitunori Uno, Masakazu Kurachi, Yutaka Doi, Harumi Kawaki e Masato Hotta. "Wettability and Durability of Si-O Coatings on Zirconia Substrate by RF-Magnetron Plasma Sputtering". Key Engineering Materials 782 (ottobre 2018): 189–94. http://dx.doi.org/10.4028/www.scientific.net/kem.782.189.
Testo completoPark, Min Woo, Wang Woo Lee, Jae Gab Lee e Chong Mu Lee. "A Comparison of the Mechanical Properties of RF- and DC- Sputter-Deposited Cr Thin Films". Materials Science Forum 546-549 (maggio 2007): 1695–98. http://dx.doi.org/10.4028/www.scientific.net/msf.546-549.1695.
Testo completoZhao, Haili, Jingpei Xie e Aixia Mao. "Effects of Bottom Layer Sputtering Pressures and Annealing Temperatures on the Microstructures, Electrical and Optical Properties of Mo Bilayer Films Deposited by RF/DC Magnetron Sputtering". Applied Sciences 9, n. 7 (3 aprile 2019): 1395. http://dx.doi.org/10.3390/app9071395.
Testo completoBiederman, H., P. Bílková, J. Ježek, P. Hlídek e D. Slavínská. "RF magnetron sputtering of polymers". Journal of Non-Crystalline Solids 218 (settembre 1997): 44–49. http://dx.doi.org/10.1016/s0022-3093(97)00196-8.
Testo completoStelmashuk, V., H. Biederman, D. Slavı́nská, M. Trchová e P. Hlidek. "Rf magnetron sputtering of polypropylene". Vacuum 75, n. 3 (luglio 2004): 207–15. http://dx.doi.org/10.1016/j.vacuum.2004.02.007.
Testo completoMorohashi, Shin'ichi, Atsunori Matsuo, Toshihiro Hara, Shogo Tsujimura e Masanori Kawanishi. "SiO2Insulation Layer Fabricated using RF Magnetron Facing Target Sputtering and Conventional RF Magnetron Sputtering". Japanese Journal of Applied Physics 40, Part 1, No. 8 (15 agosto 2001): 4876–77. http://dx.doi.org/10.1143/jjap.40.4876.
Testo completoMa, Wei Hong, e Chang Long Cai. "Studying on Thickness Control of ITO Films Deposited Using RF Magnetron Sputtering". Advanced Materials Research 415-417 (dicembre 2011): 1921–24. http://dx.doi.org/10.4028/www.scientific.net/amr.415-417.1921.
Testo completoJin, Chun Long, Ha Na Shim, Eou Sik Cho e Sang Jik Kwon. "Effect of Pulsed-DC Power on the Zinc Oxide Window Layer of CIGS Solar Cells Deposited by In-Line Sputtering Methods". Advanced Materials Research 805-806 (settembre 2013): 131–35. http://dx.doi.org/10.4028/www.scientific.net/amr.805-806.131.
Testo completoLee, Chong Mu, Choong Mo Kim, Sook Joo Kim e Yun Kyu Park. "Enhancement of the Quality of the ZnO Thin Films by Optimizing the Process Parameters of High-Temperature RF Magnetron Sputtering". Key Engineering Materials 336-338 (aprile 2007): 581–84. http://dx.doi.org/10.4028/www.scientific.net/kem.336-338.581.
Testo completoWatazu, Akira, Katsuhiko Kimoto, Sonoda Tsutomu, Kinya Tanaka, Tomoji Sawada, Minoru Toyoda e Naobumi Saito. "Ti-Ca-P Films Formed by RF Magnetron Sputtering Method Using Dual Targets". Materials Science Forum 544-545 (maggio 2007): 495–98. http://dx.doi.org/10.4028/www.scientific.net/msf.544-545.495.
Testo completoXiu, Xian Wu, Li Xu e Cheng Qiang Zhang. "Influence of Sputtering Power on Molybdenum-Doped Zinc Oxide Films Grown by RF Magnetron Sputtering". Advanced Materials Research 873 (dicembre 2013): 426–30. http://dx.doi.org/10.4028/www.scientific.net/amr.873.426.
Testo completoFribourg-Blanc, E., E. Cattan, D. Remiens, M. Dupont e D. Osmont. "rf-sputtering of PMNT thin films". Le Journal de Physique IV 11, PR11 (dicembre 2001): Pr11–145—Pr11–149. http://dx.doi.org/10.1051/jp4:20011123.
Testo completoKoenig, H. R., e L. I. Maissel. "Application of rf discharges to sputtering". IBM Journal of Research and Development 44, n. 1.2 (gennaio 2000): 106–10. http://dx.doi.org/10.1147/rd.441.0106.
Testo completoNomura, Ichirou, Takayuki Miyazaki e Takeo Nishimura. "Novel method in rf bias sputtering". Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 39, n. 1-4 (marzo 1989): 99–103. http://dx.doi.org/10.1016/0168-583x(89)90749-0.
Testo completoWen, Dong Cherng, Chun Yao Hsu e Chun Yuan Wu. "Effect of Sputtering Parameters on Photocatalytic Activity of Anatase TiO2 Films Deposited at Room Temperature". Advanced Materials Research 518-523 (maggio 2012): 724–27. http://dx.doi.org/10.4028/www.scientific.net/amr.518-523.724.
Testo completoKhalaf, Mohammed K. "Effect of sputtering power on optical Properties of RF sputtering deposited Ti6Al4V Thin Films". Iraqi Journal of Physics (IJP) 15, n. 33 (8 gennaio 2019): 71–77. http://dx.doi.org/10.30723/ijp.v15i33.142.
Testo completoZhao, Zhenqian, Min Yu Yin, Sang Jik Kwon e Eou-Sik Cho. "Effects of Radio-Frequency Sputtering Power on Low Temperature Formation of MoS2 Thin Films on Soda-Lime Glass Substrates". Journal of Nanoscience and Nanotechnology 20, n. 8 (1 agosto 2020): 4892–98. http://dx.doi.org/10.1166/jnn.2020.17849.
Testo completoNi, Zegang, Yuan Zhong, Xingfu Tao, Wei Li, Huifang Gao e Yan Yao. "Effects of Radio Frequency Bias on the Structure Parameters and Mechanical Properties of Magnetron-Sputtered Nb Films". Crystals 12, n. 2 (14 febbraio 2022): 256. http://dx.doi.org/10.3390/cryst12020256.
Testo completoNOIKAEW, Busarin, Laksana WANGMOOKLANG, Saisamorn NIYOMSOAN e Siriporn LARPKIATTAWORN. "Preparation of transparent alumina thin films deposited by RF magnetron sputtering". Journal of Metals, Materials and Minerals 31, n. 2 (27 giugno 2021): 96–103. http://dx.doi.org/10.55713/jmmm.v31i2.1066.
Testo completoLiu, Jiaqi, Kazuya Tajima, Imane Abdellaoui, Muhammad Monirul Islam, Shigeru Ikeda e Takeaki Sakurai. "Effect of Radio-Frequency Power on the Composition of BiVO4 Thin-Film Photoanodes Sputtered from a Single Target". Energies 14, n. 8 (10 aprile 2021): 2122. http://dx.doi.org/10.3390/en14082122.
Testo completoHuguenin-Love, James, Noel T. Lauer, Rodney J. Soukup, Ned J. Ianno, Štepan Kment e Zdenek Hubička. "The Deposition of 3C-SiC Thin Films onto the (111) and (110) Faces of Si Using Pulsed Sputtering of a Hollow Cathode". Materials Science Forum 645-648 (aprile 2010): 131–34. http://dx.doi.org/10.4028/www.scientific.net/msf.645-648.131.
Testo completoJeon, Yong-Su, Yeo-Chun Yun e Seong-Su Kim. "Microstructure and Electrical Properties of In2O3Thin Films Fabricated by RF Magnetron Sputtering". Korean Journal of Materials Research 12, n. 4 (1 aprile 2002): 290–95. http://dx.doi.org/10.3740/mrsk.2002.12.4.290.
Testo completoYao, Yan Ping, e Bao Xue Bo. "Composition Study of Amorphous InxAs1-x Films Prepared by Radio-Frequency Sputtering". Applied Mechanics and Materials 568-570 (giugno 2014): 1653–57. http://dx.doi.org/10.4028/www.scientific.net/amm.568-570.1653.
Testo completoPark, Sang-Shik. "Preparation and Electrical Properties of BiFeO3Films by RF Magnetron Sputtering". Korean Journal of Materials Research 19, n. 5 (27 maggio 2009): 253–58. http://dx.doi.org/10.3740/mrsk.2009.19.5.253.
Testo completoXu, Li Hai, Yu Xing Xu, Cong Wang e Tian Min Wang. "Preparation and Properties of Ce0.9Sm0.1O1.95 as the Electrolytes of IT-SOFC". Key Engineering Materials 336-338 (aprile 2007): 398–400. http://dx.doi.org/10.4028/www.scientific.net/kem.336-338.398.
Testo completoHwang, Shun Fa, e Wen Bin Li. "PZT Thin Films Deposited by RF Magnetron Sputtering". Applied Mechanics and Materials 302 (febbraio 2013): 8–13. http://dx.doi.org/10.4028/www.scientific.net/amm.302.8.
Testo completoHomma, Yoshio, e Sukeyoshi Tsunekawa. "Planar Deposition of Aluminum by RF/DC Sputtering with RF Bias". Journal of The Electrochemical Society 132, n. 6 (1 giugno 1985): 1466–72. http://dx.doi.org/10.1149/1.2114145.
Testo completoTumanov, N. A., D. V. Kirillov e E. V. Vorob’ev. "Investigation of a high-frequency magnetron sputtering system operation modes during copper thin films deposition". Journal of Physics: Conference Series 2270, n. 1 (1 maggio 2022): 012055. http://dx.doi.org/10.1088/1742-6596/2270/1/012055.
Testo completoLI, WENHAO. "SYNTHESIS OF CUPROUS OXIDE THIN FILMS BY RF-MAGNETRON SPUTTERING". Surface Review and Letters 25, n. 02 (febbraio 2018): 1850051. http://dx.doi.org/10.1142/s0218625x18500518.
Testo completoPhelps, Justin Ryan, Ashwin Kumar Saikumar, Reza Abdolvand e Kalpathy B. Sundaram. "Comparison of RF and High Impulse Magnetron Sputtered Gallium-Doped Zinc Oxide Thin Films". Coatings 13, n. 1 (31 dicembre 2022): 71. http://dx.doi.org/10.3390/coatings13010071.
Testo completoYu, Jie, Wen Hui Ma, Hang Sheng Lin, Hong Yan Sun, Xiu Hua Chen e Bin Yang. "Fabrication of LSGM Thin Film Electrolyte on LSCM Anode by RF Magnetron Sputtering for IT-SOFC". Materials Science Forum 675-677 (febbraio 2011): 81–84. http://dx.doi.org/10.4028/www.scientific.net/msf.675-677.81.
Testo completoAchoi, M. F., Mohd Nor Asiah, Mohamad Rusop e Saifollah Abdullah. "A Comparative Study of TiO2 Nanocoated Mild Steel Surface Properties between Short and Long Sputtering Time of RF Magnetron". Advanced Materials Research 667 (marzo 2013): 562–68. http://dx.doi.org/10.4028/www.scientific.net/amr.667.562.
Testo completoda Cunha, António F., F. Kurdzesau e Pedro M. P. Salomé. "Cu(In,Ga)Se2 Prepared by a 2 and 3-Stage Hybrid RF-Magnetron Sputtering and Se Evaporation Method: Properties and Solar Cell Performance". Materials Science Forum 514-516 (maggio 2006): 93–97. http://dx.doi.org/10.4028/www.scientific.net/msf.514-516.93.
Testo completoTang, Hui Dong, Shou Hong Tan e Zheng Ren Huang. "SiC Coatings Deposited by RF Magnetron Sputtering". Key Engineering Materials 280-283 (febbraio 2007): 1309–12. http://dx.doi.org/10.4028/www.scientific.net/kem.280-283.1309.
Testo completoMASUDA, Haruho, Kyoichiro YASUDA, Michihiko TAKEDA e Akira YOSHIDA. "Preparation of ZnSe films by RF sputtering." SHINKU 30, n. 5 (1987): 481–84. http://dx.doi.org/10.3131/jvsj.30.481.
Testo completoCho, Jaekyong, Manabu Gomi e Masanori Abe. "Ferromagnetic (LaSr)MnO3Films Deposited by RF Sputtering". Japanese Journal of Applied Physics 29, Part 1, No. 9 (20 settembre 1990): 1686–89. http://dx.doi.org/10.1143/jjap.29.1686.
Testo completoYazawa, Ichiro, Norio Terada, Katsuhiro Matsutani, Ryoji Sugise, Masatoshi Jo e Hideo Ihara. "Orientation of CaCuO2Thin Films in RF Sputtering". Japanese Journal of Applied Physics 29, Part 2, No. 4 (20 aprile 1990): L566—L568. http://dx.doi.org/10.1143/jjap.29.l566.
Testo completoRamos, Manuel, John Nogan, Manuela Ortíz-Díaz, Jose L. Enriquez-Carrejo, Claudia A. Rodriguez-González, Jose Mireles-Jr-Garcia, Carlos Ornelas e Abel Hurtado-Macias. "Mechanical properties of RF-sputtering MoS2thin films". Surface Topography: Metrology and Properties 5, n. 2 (12 giugno 2017): 025003. http://dx.doi.org/10.1088/2051-672x/aa7421.
Testo completoPaven-Thivet, Le, C. Malibert, Ph Houdy e P. A. Albouy. "RF-sputtering deposition of Al/Al2O3 multilayers". Thin Solid Films 336, n. 1-2 (dicembre 1998): 373–76. http://dx.doi.org/10.1016/s0040-6090(98)01288-7.
Testo completoMechnich, Peter. "Y2SiO5 coatings fabricated by RF magnetron sputtering". Surface and Coatings Technology 237 (dicembre 2013): 88–94. http://dx.doi.org/10.1016/j.surfcoat.2013.08.015.
Testo completoCarabias, I., A. Martinez, M. A. Garcia, E. Pina, J. M. Gonzalez, A. Hernando e P. Crespo. "Magnetostrictive thin films prepared by RF sputtering". Journal of Magnetism and Magnetic Materials 290-291 (aprile 2005): 823–25. http://dx.doi.org/10.1016/j.jmmm.2004.11.373.
Testo completoSilva Filho, José Maria Clemente da, Nelson Fabián Villegas Borrero, Gustavo Alexandre Viana, Rafael Borges Merlo e Francisco Chagas Marques. "Lead Iodide Thin Films via rf Sputtering". Crystal Growth & Design 20, n. 3 (24 gennaio 2020): 1531–37. http://dx.doi.org/10.1021/acs.cgd.9b01250.
Testo completoSpencer, AG, e RP Howson. "Rf oscillations in dc planar sputtering magnetrons". Vacuum 38, n. 6 (gennaio 1988): 497–98. http://dx.doi.org/10.1016/0042-207x(88)90595-7.
Testo completoHomma, Yoshio, Sukeyoshi Tunekawa, Akira Satou e Tomoguki Terada. "Planarization Mechanism of RF‐Biased Al Sputtering". Journal of The Electrochemical Society 140, n. 3 (1 marzo 1993): 855–60. http://dx.doi.org/10.1149/1.2056173.
Testo completoTamai, Fujio, e Yuji Kawakami. "Reflecting Multi-Layer Coatings by RF Sputtering". Materials Science Forum 502 (dicembre 2005): 309–14. http://dx.doi.org/10.4028/www.scientific.net/msf.502.309.
Testo completoMalavasi, L., M. C. Mozzati, G. Chiodelli, C. B. Azzoni e G. Flor. "RF sputtering deposition of MgMn2O4spinel thin films". Journal of Materials Science 39, n. 5 (marzo 2004): 1671–75. http://dx.doi.org/10.1023/b:jmsc.0000016168.47812.88.
Testo completoMiyazaki, Takayuki, e Sadao Adachi. "Low‐temperature silicon homoepitaxy by rf sputtering". Journal of Applied Physics 72, n. 11 (dicembre 1992): 5471–73. http://dx.doi.org/10.1063/1.351991.
Testo completoYasuda, K., A. Yoshida, M. Takeda, H. Masuda e I. Akasaki. "Boron nitride films prepared by RF sputtering". physica status solidi (a) 90, n. 1 (16 luglio 1985): K7—K9. http://dx.doi.org/10.1002/pssa.2210900146.
Testo completoCHAHBOUN, N., K. ELASSALI, A. KHIARA, E. AMEZIANE e T. BEKKAY. "Growth of CuAlTe2 films by RF sputtering". Solar Energy Materials and Solar Cells 32, n. 2 (febbraio 1994): 213–18. http://dx.doi.org/10.1016/0927-0248(94)90305-0.
Testo completoChoopun, Supab, Niyom Hongsith, Sornchai Tanunchai, Torranin Chairuangsri, Chatchai Krua-in, Somsorn Singkarat, Thirapat Vilaithong, Pongsri Mangkorntong e Nikorn Mangkorntong. "Single-crystalline ZnO nanobelts by RF sputtering". Journal of Crystal Growth 282, n. 3-4 (settembre 2005): 365–69. http://dx.doi.org/10.1016/j.jcrysgro.2005.05.020.
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