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1

Rubinstein, Marvin. Electrochemical metallizing. New York, NY: Van Nostrand Reinhold, 1986.

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2

Moran, Robert. Markets for metallizing technologies. Norwalk, CT: Business Communications Co., 1995.

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3

Rubinstein, Marvin. Electrochemical metallizing: Principles and practice. New York: Van Nostrand Reinhold, 1987.

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4

Rubinstein, Marvin. Das Tampongalvanisieren. Saulgau/Württ: E.G. Leuze, 1985.

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5

Richard, Suchentrunk, a cura di. Metallizing of plastics: A handbook of theory and practice. Materials Park, Ohio: ASM International, 1993.

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6

Munich), NATO Advanced Research Workshop on Metallization and Metal-Semiconductor Interfaces (1988 Technical University of. Metallization and metal-semiconductor interfaces. New York: Plenum Press, 1989.

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7

Symposium on Electromigration of Metals (1984 New Orleans, La.). Proceedings of the Symposium on Electromigration of Metals and First International Symposium on Multilevel Metallization and Packaging. Pennington, NJ: Electrochemical Society, 1985.

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8

1951-, Andricacos Panayotis C., a cura di. Electrochemical synthesis and modification of materials: Symposium held December 2-5, 1996, Boston, Massachusetts, U.S.A. Pittsburgh, Pa: Materials Research Society, 1997.

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9

Krishna, Shenai, a cura di. VLSI metallization: Physics and technologies. Boston: Artech House, 1991.

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10

Symposium on Electrochemically Deposited Thin Films (1996 San Antonio, Tex.). Proceedings of the Third Symposium on Electrochemically Deposited Thin Films. A cura di Paunovic Milan, Scherson D, Electrochemical Society Electrodeposition Division e Electrochemical Society. Physical Electrochemistry Division. Pennington, NJ: Electrochemical Society, 1997.

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11

S, Fatemi Navid, Korényi-Both András L. 1937- e United States. National Aeronautics and Space Administration., a cura di. Au/Zn contacts to [rho]-InP: Electrical and metallurgical characteristics and the relationship between them. [Washington, D.C.]: National Aeronautics and Space Administration, 1994.

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12

S, Fatemi Navid, Korényi-Both András L. 1937- e United States. National Aeronautics and Space Administration., a cura di. Au/Zn contacts to [rho]-InP: Electrical and metallurgical characteristics and the relationship between them. [Washington, D.C.]: National Aeronautics and Space Administration, 1994.

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13

S, Fatemi Navid, Korényi-Both András L. 1937- e United States. National Aeronautics and Space Administration., a cura di. Au/Zn contacts to [rho]-InP: Electrical and metallurgical characteristics and the relationship between them. [Washington, D.C.]: National Aeronautics and Space Administration, 1994.

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14

S, Fatemi Navid, Korényi-Both András L. 1937- e United States. National Aeronautics and Space Administration., a cura di. Au/Zn contacts to [rho]-InP: Electrical and metallurgical characteristics and the relationship between them. [Washington, D.C.]: National Aeronautics and Space Administration, 1994.

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15

International, Symposium on Electrochemical Methods in Corrosion Research (3rd 1988 Zürich Switzerland). Electrochemical methods in corrosion research: Proceedings of the 3rd International Symposium held in Zürich, Switzerland, July 12-15, 1988. Aedermannsdorf, Switzerland: Trans Tech Publications, 1989.

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16

P, Murarka S., a cura di. Advanced metallization for devices and circuits--science, technology, and manufacturability: Symposium held April 4-8, 1994, San Francisco, California, U.S.A. Pittsburgh, Pa: Materials Research Society, 1994.

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17

Advanced Metallization Conference (1999 Orlando, Fla.). Advanced Metallization Conference 1999 (AMC 1999): Proceedings of the conference held September 28-30, 1999, in Orlando, Florida, sponsored by Continuing Education in Engineering, University Extension, University of California at Berkeley, California, U.S.A. An Asian session of this conference was held October 14-15, 1999, in Tokyo, Japan. A cura di Gross Mihal E e University of California, Berkeley. Continuing Education in Engineering. Warrendale, Pa: Materials Research Society, 2000.

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18

1934-, Sacher Edward, Pireaux Jean-Jacques 1950-, Kowalczyk Steven P. 1948- e American Chemical Society. Division of Polymer Chemistry., a cura di. Melallization [i.e. Metallization] of polymers. Washington, DC: American Chemical Society, 1990.

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19

International, Conference on the Simulation of Electrochemical Processes (3rd 2009 Bologna Italy). Electrochemical process simulation III. Southampton: WIT, 2009.

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20

Kroll, Darwin E. Metallization of CVD diamond using metal oxide intermediate layers for electronics packaging. Monterey, Calif: Naval Postgraduate School, 1997.

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21

International Conference on the Simulation of Electrochemical Processes (2nd 2007 Myrtle Beach, South Carolina). Simulation of electrochemical processes II. A cura di DeGiorgi V. G, Brebbia C. A e Adey R. A. Southampton: WIT, 2007.

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22

E, Chen Fusen, Murarka S. P e Society of Photo-optical Instrumentation Engineers., a cura di. Microelectronics technology and process integration: 20-21 October 1994, Austin, Texas. Bellingham, Wash., USA: SPIE, 1994.

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23

Symposium on Multilevel Metallization, Interconnection, and Contact Technologies (1986 : San Diego, Calif.). Proceedings of the Symposium on Multilevel Metallization, Interconnection, and Contact Technologies. Pennington, NJ (10 S. Main St., Pennington 08534-2896): Electrochemical Society, Inc., 1987.

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24

1955-, Toprac Anthony J., Dang Kim, Society of Photo-optical Instrumentation Engineers. e Solid State Technology (Organization), a cura di. Process, equipment, and materials control in integrated circuit manufacturing IV: 22-24 September, 1998, Santa Clara, California. Bellingham, Washington: SPIE, 1998.

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25

State-of-the-Art, Program on Compound Semiconductors (13th 1990 Seattle Wash ). Proceedings of the Thirteenth State-of-the Art Program on Compound Semiconductors (SOTAPOCS XIII) and the Symposium on Metallization of III-V Compound Semiconductors. Pennington, NJ (10 S. Main St., Pennington 08534-2896): Electrochemical Society, 1991.

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26

F, Filter William, a cura di. Materials reliability in microelectronics VI: Symposium held April 8-12, 1996, San Francisco, California, U.S.A. Pittsburgh, Pa: Materials Research Society, 1996.

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27

1955-, Toprac Anthony J., Dang Kim, Society of Photo-optical Instrumentation Engineers. e Electrochemical Society, a cura di. Process, equipment, and materials control in integrated circuit manufacturing V: 22-23 September, 1999, Santa Clara, California. Bellingham, Wash., USA: SPIE, 1999.

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28

S, Rathore Harzara, Schwartz G. C, Susko R. A, Electrochemical Society. Dielectrics and Insulation Division. e Electrochemical Society Electronics Division, a cura di. Proceedings of the symposia on reliability of semiconductor devices and interconnection and multilevel metallization, interconnection, and contact technologies. Pennington, NJ (10 S. Main St., Pennington 08534-2896): Electrochemical Society, 1989.

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29

International Symposium on Patterning Science and Technology (2nd 1991 Phoenix, Ariz.). Proceedings of the symposia on Patterning Science and Technology II [and] Interconnection and Contact Metallization for ULSI. Pennington, NJ: Electrochemical Society, 1992.

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30

European Workshop: Materials for Advanced Metallization (1997 Villard-de-Lans, France). MAM '97, abstracts booklet: European Workshop: Materials for Advanced Metallization, Villard-de-Lans, France, March 16-19, 1997. Paris, France: Société française du vide, 1997.

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31

Sh, Gildenblat Gennady, Schwartz Gary P e Society of Photo-optical Instrumentation Engineers., a cura di. Metallization: Performance and reliability issues for VLSI and ULSI ; 12-13 September 1991, San Jose, California. Bellingham, Wash: SPIE, 1991.

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32

S, Cale Timothy, Pintchovski Fabio S, Blewer R. S e University of California, Berkeley. Continuing Education in Engineering., a cura di. Advanced metallization for ULSI applications, 1992: Proceedings of the conference held October 20-22, 1992, in Tempe, Arizona. Pittsburgh, Pa: Materials Research Society., 1993.

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33

P, Favreau David, Shacham-Diamand Yosi, Horiike Yasuhiro e University of California, Berkeley. Continuing Education in Engineering., a cura di. Advanced metallization for ULSI applications in 1993: Proceedings of the conference held October 5-7, 1993, San Diego, California, U.S.A., and October 26-27, 1993, Tokyo, Japan sponsored by Continuing Education in Engineering, University Extension, University of California, Berkeley, U.S.A. Pittsburgh, PA: Materials Research Society, 1994.

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34

Mart, Graef, Patel Divyesh N, Society of Photo-optical Instrumentation Engineers. e Electrochemical Society, a cura di. Multilevel interconnect technology III: 22-23 September 1999, Santa Clara, California. Bellingham, Wash., USA: SPIE, 1999.

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35

N, Patel Divyesh, Graef Mart, Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International., Solid State Technology (Organization) e Electrochemical Society, a cura di. Multilevel interconnect technology: 1-2 October 1997, Austin, Texas. Bellingham, Wash: SPIE, 1997.

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36

Advanced, Metallization Conference (2004 San Diego Calif and Tokyo Japan). Advanced Metallization Conference 2004 (AMC 2004): Proceedings of the conference held October 19-21, 2004, in San Diego, California, U.S.A., and September 28-29, 2004, University of Tokyo, Tokyo, Japan. Warrendale, Pa: Materials Research Society, 2005.

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37

Symposium on Electrochemical Processing in ULSI Fabrication (3rd 2000 Toronto, Ont.). Electrochemical processing in ULSI fabricatrion III: Proceedings of the International Symposium. A cura di Andricacos Panayotis C. 1951-, Electrochemical Society Electrodeposition Division, Electrochemical Society. Dielectric Science and Technology Division., Electrochemical Society Electronics Division e Electrochemical Society Meeting. Pennington, N.J: Electrochemical Society, 2002.

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38

Robin, Cheung, e University of California, Berkeley. Continuing Education in Engineering., a cura di. Advanced metallization and interconnect systems for ULSI applications in 1997: Proceedings of the conference held September 30-October 2,1997, in San Diego, California, sponsored by Continuing Education in Engineering, University Extension, University of California at Berkeley, California, U.S.A., a parallel session of the conference was held from October 21-22, 1997, in Tokyo, Japan. Warrendale, Pa: Materials Research Society, 1998.

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39

H, Hoang Hoang, e Society of Photo-optical Instrumentation Engineers., a cura di. Multilevel interconnection: Issues that impact competitiveness : 27-28 September 1993, Monterey, California. Bellingham, Wash., USA: SPIE, 1993.

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40

Symposium on Interconnect and Contact Metallization (1997 Paris, France). Proceedings of the Symposium on Interconnect and Contact Metallization. A cura di Rathore Harzara S, Electrochemical Society. Dielectric Science and Technology Division., Electrochemical Society Electronics Division e Electrochemical Society Electrodeposition Division. Pennington, NJ: Electrochemical Society, 1998.

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41

R, Wilson Syd, Tracy Clarence J e Freeman John L, a cura di. Handbook of multilevel metallization for integrated circuits: Materials, technology, and applications. Park Ridge, N.J., U.S.A: Noyes, 1993.

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42

1937-, Tu K. N., e Materials Research Society Meeting, a cura di. Advanced metallization for future ULSI: Symposium held April 8-11, 1996, San Francisco, California, U.S.A. Pittsburgh, Pa: Materials Research Society, 1996.

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43

Robert, Havemann, e University of California, Berkeley. Continuing Education in Engineering., a cura di. Advanced metallization and interconnect systems for ULSI applications in 1996: Proceedings of the conference held October 1-3, 1996, in Boston, Massachusetts, sponsored by Continuing Education in Engineering, University Extension, University of California at Berkeley, California, U.S.A., a parallel session of the conference was held from October 23-24, 1996, in Tokyo, Japan. Pittsburgh, Pa: Materials Research Society, 1997.

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44

Hidekazu, Okabayashi, Shingubara Shoso, Ho P. S e International Workshop on Stress-Induced Phenomena in Metallization (4th : 1997 : Tokyo, Japan), a cura di. Stress induced phenomena in metallization: Fourth international workshop, Tokyo, Japan, June, 1997. Woodbury, N.Y: American Institute of Physics, 1998.

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45

Mart, Graef, Patel Divyesh N, Society of Photo-optical Instrumentation Engineers., Solid State Technology (Organization), Electrochemical Society e American Vacuum Society, a cura di. Multilevel interconnect technology II: 23-24 September, Santa Clara, California. Bellingham, Washington: SPIE, 1998.

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46

Advanced Metallization Conference (2005 Colorado Springs, Colo. and Tokyo, Japan). Advanced Metallization Conference 2005 (AMC 2005): Proceedings of the conference held September 27-29, 2005, in Colorado Springs, Colorado, U.S.A., and October 13-14, 2005, University of Tokyo, Tokyo, Japan. A cura di Brongersma Sywert H e University of California, Berkeley. Continuing Education in Engineering. Warrendale, Pa: Materials Research Society, 2006.

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47

S, Ho P., a cura di. Stress-induced phenomena in metallization: Seventh International Workshop on Stress-Induced Phenomena in Metallization, Austin, Texas, 14-16 June 2004. Melville, N.Y: American Institute of Physics, 2004.

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48

C, Ellwanger Russell, Wang Shi-Qing e University of California, Berkeley. Continuing Education in Engineering., a cura di. Advanced metallization and interconnect systems for ULSI applications in 1995: Proceedings of the conference held October 3-5, 1995 in Portland, Oregon, sponsored by Continuing Education in Engineering, University Extension, University of California at Berkeley, U.S.A., a parallel session of the conference was held from October 24- 25, 1995 in Tokyo, Japan. Pittsburgh, Pa: Materials Research Society, 1996.

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49

Proceedings of the symposia on interconnects, contact metallization, and multilevel metallization and reliability for semiconductor devices, interconnects, and thin insulator materials. Pennington, NJ: Electrochemical Society, 1993.

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50

Batra, Inder P. Metallization and Metal-Conductor Interfaces. Springer, 1989.

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