Articoli di riviste sul tema "Lithography"
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Vandаlovskyi, V. "Artistic and technical features of the lithographic manner mixed technique". Research and methodological works of the National Academy of Visual Arts and Architecture, n. 27 (27 febbraio 2019): 92–98. http://dx.doi.org/10.33838/naoma.27.2018.92-98.
Testo completoKwon, B., e Jong H. Kim. "Importance of Molds for Nanoimprint Lithography: Hard, Soft, and Hybrid Molds". Journal of Nanoscience 2016 (22 giugno 2016): 1–12. http://dx.doi.org/10.1155/2016/6571297.
Testo completoWen, Zaoxia, Xingyu Liu, Wenxiu Chen, Ruolin Zhou, Hao Wu, Yongmei Xia e Lianbin Wu. "Progress in Polyhedral Oligomeric Silsesquioxane (POSS) Photoresists: A Comprehensive Review across Lithographic Systems". Polymers 16, n. 6 (19 marzo 2024): 846. http://dx.doi.org/10.3390/polym16060846.
Testo completoLund, Sarah E. "Fossils: Lithography’s Porous Time and Eugène Delacroix’s Faust Marginalia". Nineteenth Century Studies 35 (novembre 2023): 1–32. http://dx.doi.org/10.5325/ninecentstud.35.0001.
Testo completoPrakoso, Emmanuel Putro, Inovensius Hugo Bima Wicaksana, Nick Soedarso e Rina Carina. "TEKNIK CETAK DATAR KITCHEN LITHOGRAPY SEBAGAI MEDIA EKSPRESI DESAIN PADA METODE REPRODUKSI GRAFIKA". Jurnal Dimensi DKV Seni Rupa dan Desain 4, n. 2 (1 ottobre 2019): 155. http://dx.doi.org/10.25105/jdd.v4i2.5888.
Testo completoWu, Yu, e Zihao Xiao. "The Recent Progress of Lithography Machine and the State-of-art Facilities". Highlights in Science, Engineering and Technology 5 (7 luglio 2022): 155–65. http://dx.doi.org/10.54097/hset.v5i.737.
Testo completoVoznyuk G. V., Grigorenko I. N., Mitrofanov M. I., Nikolaev V. V. e Evtikhiev V. P. "Subwave textured surfaces for the radiation coupling from the waveguide". Technical Physics Letters 48, n. 3 (2022): 76. http://dx.doi.org/10.21883/tpl.2022.03.52896.19103.
Testo completoSharma, Ekta, Reena Rathi, Jaya Misharwal, Bhavya Sinhmar, Suman Kumari, Jasvir Dalal e Anand Kumar. "Evolution in Lithography Techniques: Microlithography to Nanolithography". Nanomaterials 12, n. 16 (11 agosto 2022): 2754. http://dx.doi.org/10.3390/nano12162754.
Testo completoZhang, Zhen. "Optimization of Triple Periodic Bilayer Stacks and Aerial Image Performance Analysis". International Journal of Electronics and Electrical Engineering 8, n. 3 (settembre 2020): 53–57. http://dx.doi.org/10.18178/ijeee.8.3.53-57.
Testo completoSeo, Manseung, Haeryung Kim e Masahiko Onosato. "Lithography Using a Microelectronic Mask". Journal of Robotics and Mechatronics 18, n. 6 (20 dicembre 2006): 816–23. http://dx.doi.org/10.20965/jrm.2006.p0816.
Testo completoPanzarasa, Guido, e Guido Soliveri. "Photocatalytic Lithography". Applied Sciences 9, n. 7 (27 marzo 2019): 1266. http://dx.doi.org/10.3390/app9071266.
Testo completoChoi, Young Joo, Ran Namgung, Jun Soo Kim, Dae Seok Song, Hyeon Park, Shin-hyo Bae, Min-Ki Chon et al. "Stochastic defect removal coating for high-performance extreme ultraviolet lithography". Journal of Vacuum Science & Technology B 40, n. 4 (luglio 2022): 042602. http://dx.doi.org/10.1116/6.0001723.
Testo completoMeijer, Rob, Peter Thomson e Lysbeth Croiset van Uchelen-Brouwer. "The History of the Lithographie Royale, 1818-25". Quaerendo 31, n. 4 (2001): 281–306. http://dx.doi.org/10.1163/157006901x00173.
Testo completoPugachev, Mikhail V., Aliaksandr I. Duleba, Arslan A. Galiullin e Aleksandr Y. Kuntsevich. "Micromask Lithography for Cheap and Fast 2D Materials Microstructures Fabrication". Micromachines 12, n. 8 (21 luglio 2021): 850. http://dx.doi.org/10.3390/mi12080850.
Testo completoTsarik, K. A. "Focused Ion Beam Exposure of Ultrathin Electron-Beam Resist for Nanoscale Field-Effect Transistor Contacts Formation". Proceedings of Universities. Electronics 26, n. 5 (2021): 353–62. http://dx.doi.org/10.24151/1561-5405-2021-26-5-353-362.
Testo completoYonghui Zhang, Yonghui Zhang, Zihui Zhang Zihui Zhang, Chong Geng Chong Geng, Shu Xu Shu Xu, Tongbo Wei Tongbo Wei e and Wen'gang Bi and Wen'gang Bi. "Versatile nanosphere lithography technique combining multiple-exposure nanosphere lens lithography and nanosphere template lithography". Chinese Optics Letters 15, n. 6 (2017): 062201–62205. http://dx.doi.org/10.3788/col201715.062201.
Testo completoLi, Mu Jun, Hui Chun Ye e Lian Guan Shen. "A Fast Method for Analyzing the Effect of Mask Error on Photolithography Pattern Quality". Advanced Materials Research 291-294 (luglio 2011): 3097–102. http://dx.doi.org/10.4028/www.scientific.net/amr.291-294.3097.
Testo completoDiaconu-Catan, Oxana. "The value of lithography in artistic creation". Studiul artelor şi culturologie: istorie, teorie, practică, n. 1(44) (febbraio 2024): 66–73. http://dx.doi.org/10.55383/amtap.2023.1.12.
Testo completoMullen, Eleanor, e Michael A. Morris. "Green Nanofabrication Opportunities in the Semiconductor Industry: A Life Cycle Perspective". Nanomaterials 11, n. 5 (22 aprile 2021): 1085. http://dx.doi.org/10.3390/nano11051085.
Testo completoPark, Sang Wook, Hyun Jin Yoon, Hee Young Oh, Yong Il Kim, Gi Jin Kwun e Hai Won Lee. "Synthesis of Resists Containing a Photoacid Generator Group for Atomic Force Microscope Lithography". Solid State Phenomena 121-123 (marzo 2007): 697–700. http://dx.doi.org/10.4028/www.scientific.net/ssp.121-123.697.
Testo completoLiu, Fan, Guo Dong Gu, Chun Hong Zeng, Hai Jun Li, Wei Wang, Bao Shun Zhang e Jin She Yuan. "Fabrication of 50nm T-Gate on GaN Substrate". Advanced Materials Research 482-484 (febbraio 2012): 2341–44. http://dx.doi.org/10.4028/www.scientific.net/amr.482-484.2341.
Testo completoFallica, Roberto. "Beyond grayscale lithography: inherently three-dimensional patterning by Talbot effect". Advanced Optical Technologies 8, n. 3-4 (26 giugno 2019): 233–40. http://dx.doi.org/10.1515/aot-2019-0005.
Testo completoAtthi, Nithi, Areerat Sriklad, Wutthinan Jeamsaksiri, Charndet Hruanun, Amporn Poyai e Rardchawadee Silapunt. "Trimming Lithography: An Alternative Technology for Sub-Resolution and Sub-Wavelength Patterning". ECTI Transactions on Electrical Engineering, Electronics, and Communications 10, n. 2 (10 aprile 2012): 198–207. http://dx.doi.org/10.37936/ecti-eec.2012102.170419.
Testo completoStewart, Michael D., e C. Grant Willson. "Imprint Materials for Nanoscale Devices". MRS Bulletin 30, n. 12 (dicembre 2005): 947–51. http://dx.doi.org/10.1557/mrs2005.248.
Testo completoSHEN, T. C. "ROLE OF SCANNING PROBES IN NANOELECTRONICS: A CRITICAL REVIEW". Surface Review and Letters 07, n. 05n06 (ottobre 2000): 683–88. http://dx.doi.org/10.1142/s0218625x00000695.
Testo completoVoznesenskiy, Sergey, e Aleksandr Nepomnyaschiy. "Dose Characteristics of Multilayer Chitosan-Metal-Dielectric Nanostructures for Electronic Nanolithography". Solid State Phenomena 245 (ottobre 2015): 195–99. http://dx.doi.org/10.4028/www.scientific.net/ssp.245.195.
Testo completoSievers, Gianni. "Learning How to Print in Colonial North India: The Nizami Press in Budaun and the First Urdu Manual on the Art of Lithography". Philological Encounters 8, n. 1 (16 marzo 2023): 73–109. http://dx.doi.org/10.1163/24519197-bja10038.
Testo completoBorodin, B. R., F. A. Benimetskiy e P. A. Alekseev. "Mechanical frictional scanning probe lithography of TMDCs". Journal of Physics: Conference Series 2103, n. 1 (1 novembre 2021): 012090. http://dx.doi.org/10.1088/1742-6596/2103/1/012090.
Testo completoDING, Yucheng. "Next generation lithography——imprint lithography". Chinese Journal of Mechanical Engineering 43, n. 03 (2007): 1. http://dx.doi.org/10.3901/jme.2007.03.001.
Testo completoNalivaiko, V. I., e M. A. Ponomareva. "Promising developments of chalcogenide nanoresists for optical, x-ray and electron beam lithography". Interexpo GEO-Siberia 8, n. 1 (18 maggio 2022): 33–36. http://dx.doi.org/10.33764/2618-981x-2022-8-1-33-36.
Testo completoZhang, Yuhang, Guanghui He, Feng Zhang, Yongfu Li e Guoxing Wang. "The study of lithographic variation in resistive random access memory". Journal of Semiconductors 45, n. 5 (1 maggio 2024): 052303. http://dx.doi.org/10.1088/1674-4926/45/5/052303.
Testo completoWATT, F., A. A. BETTIOL, J. A. VAN KAN, E. J. TEO e M. B. H. BREESE. "ION BEAM LITHOGRAPHY AND NANOFABRICATION: A REVIEW". International Journal of Nanoscience 04, n. 03 (giugno 2005): 269–86. http://dx.doi.org/10.1142/s0219581x05003139.
Testo completode Kerkhof, Mark van, Edgar Osorio, Vladimir Krivtsun, Maxim Spiridonov, Dmitry Astakhov e Viacheslav Medvedev. "Miniature plasma source for in situ extreme ultraviolet lithographic scanner cleaning". Journal of Vacuum Science & Technology B 40, n. 2 (marzo 2022): 022601. http://dx.doi.org/10.1116/6.0001636.
Testo completoKim, Kibeom, Sangkwon Han, Jinsik Yoon, Sunghoon Kwon, Hun-Kuk Park e Wook Park. "Lithographic resolution enhancement of a maskless lithography system based on a wobulation technique for flow lithography". Applied Physics Letters 109, n. 23 (5 dicembre 2016): 234101. http://dx.doi.org/10.1063/1.4967373.
Testo completoHeilandová, Lucie. "The First Lithographic Workshops in Brno and Early Lithography in Moravia". Acta Musei Nationalis Pragae – Historia litterarum 63, n. 3-4 (2019): 57–65. http://dx.doi.org/10.2478/amnpsc-2018-0008.
Testo completoBerggren, Karl K. "Lithography". Nanoscale 3, n. 7 (2011): 2662. http://dx.doi.org/10.1039/c1nr90018h.
Testo completoTejeda, R. O., E. G. Lovell e R. L. Engelstad. "In-Plane Gravity Loading of a Circular Membrane". Journal of Applied Mechanics 67, n. 4 (5 maggio 2000): 837–39. http://dx.doi.org/10.1115/1.1308581.
Testo completoFang, Bin, Jiafeng Feng, Hongxiang Wei, Xiufeng Han, Baoshun Zhang e Zhongming Zeng. "Fabrication of Spin-Transfer Nano-Oscillator by Colloidal Lithography". Journal of Nanomaterials 2015 (2015): 1–6. http://dx.doi.org/10.1155/2015/973957.
Testo completoTian, Weicheng. "Research progress of laser lithography". Journal of Physics: Conference Series 2608, n. 1 (1 ottobre 2023): 012016. http://dx.doi.org/10.1088/1742-6596/2608/1/012016.
Testo completoLiu, Junjun, Dong Wang, Yitan Li, Haihua Wang, Huan Chen, Qianqian Wang e Wenbing Kang. "Exceptional Lithography Sensitivity Boosted by Hexafluoroisopropanols in Photoresists". Polymers 16, n. 6 (15 marzo 2024): 825. http://dx.doi.org/10.3390/polym16060825.
Testo completoErdmann, Andreas, David Reibold, Tim Fühner e Peter Evanschitzky. "Photomasks for Semiconductor Lithography: From Simple Shadow Casters to Complex 3D Scattering Objects". Advances in Science and Technology 55 (settembre 2008): 173–80. http://dx.doi.org/10.4028/www.scientific.net/ast.55.173.
Testo completoAhmad Kamal, Ahmad Syazwan, Cheng-Chieh Lin, Zhiyu Wang, Di Xing, Yang-Chun Lee, Mu-Hsin Chen, Ya-Lun Ho, Chun-Wei Chen e Jean-Jacques Delaunay. "CsPbBr3 nanocrystals plasmonic distributed Bragg reflector waveguide laser". Applied Physics Letters 122, n. 7 (13 febbraio 2023): 071104. http://dx.doi.org/10.1063/5.0128232.
Testo completoDomonkos, Mária, Pavel Demo e Alexander Kromka. "Nanosphere Lithography for Structuring Polycrystalline Diamond Films". Crystals 10, n. 2 (14 febbraio 2020): 118. http://dx.doi.org/10.3390/cryst10020118.
Testo completoВознюк, Г. В., И. Н. Григоренко, М. И. Митрофанов, В. В. Николаев e В. П. Евтихиев. "Субволновые текстурированные поверхности для вывода излучения из волновода". Письма в журнал технической физики 48, n. 6 (2022): 51. http://dx.doi.org/10.21883/pjtf.2022.06.52214.19103.
Testo completoTEO, SELIN H. G., A. Q. LIU, G. L. SIA, C. LU, J. SINGH, M. B. YU e H. Q. SUN. "DEEP UV LITHOGRAPHY FOR PILLAR TYPE NANOPHOTONIC CRYSTAL". International Journal of Nanoscience 04, n. 04 (agosto 2005): 559–66. http://dx.doi.org/10.1142/s0219581x05003577.
Testo completoBin Yu, Bin Yu, Wei Jia Wei Jia, Changhe Zhou Changhe Zhou, Hongchao Cao Hongchao Cao e Wenting Sun Wenting Sun. "Grating imaging scanning lithography". Chinese Optics Letters 11, n. 8 (2013): 080501–80503. http://dx.doi.org/10.3788/col201311.080501.
Testo completoLin, Jian-Shian, Chieh-Lung Lai, Ya-Chun Tu, Cheng-Hua Wu e Yoshimi Takeuchi. "A Uniform Pressure Apparatus for Micro/Nanoimprint Lithography Equipment". International Journal of Automation Technology 3, n. 1 (5 gennaio 2009): 84–88. http://dx.doi.org/10.20965/ijat.2009.p0084.
Testo completoLee, Su Yong, Do Young Noh, Hae Cheol Lee, Chung-Jong Yu, Yeukuang Hwu e Hyon Chol Kang. "Direct-write X-ray lithography using a hard X-ray Fresnel zone plate". Journal of Synchrotron Radiation 22, n. 3 (2 aprile 2015): 781–85. http://dx.doi.org/10.1107/s1600577515003306.
Testo completoHruby, Jill. "LIGA Technologies and Applications". MRS Bulletin 26, n. 4 (aprile 2001): 337–40. http://dx.doi.org/10.1557/mrs2001.76.
Testo completoOKAZAKI, SHINJI. "CURRENT ISSUES AND FUTURE PROSPECTS OF LITHOGRAPHY". International Journal of High Speed Electronics and Systems 16, n. 01 (marzo 2006): 375–87. http://dx.doi.org/10.1142/s0129156406003709.
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