Tesi sul tema "Lithography"
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Benoit-Renault, Viviane. "La lithographie en Bretagne (1819-1914)". Thesis, Paris 4, 2014. http://www.theses.fr/2014PA040217.
Testo completoIn the history of print, the study of lithography in province has long been neglected. The first founding worksonly date back to the last forty years. The purpose of this thesis on the history of art is to address this shortcomingby analysing lithography in historical Brittany between 1819 and 1914 bearing an interdisciplinarity mind open toeconomic and social history.Initially this research will be based on the study of lithographic printing. Following a general overviewon the evolution of the number of workshops and their geographical breakdown, leading and secondarylithographic centres are being considered. On the other hand, autographic printing which established itself andcame into competition with the lithographic workshops is being analysed with an emphasis on tin-plate printingworkshops being a characteristic feature of Brittany. Beyond this historical study, the following chapter paints aportrait of the printers and that of the lithographic production scene which being a social environment. It is aworld whereby the painter mingles with the professional lithographer, the drawing lover, the printer and thecraftsman. The reality of the printing world is being addressed in the third chapter with a particular focus on theworkshop and the history of the equipment specific to printing (plates and moulds). Subsequently the workshop isseen as a world in its own right with its celebrations and codes responsible for the working cohesion. This unitywill be accentuated in the second half of the XIX century with the constitution of lithographers unions. Thanksto the creation of a lithographs inventory drawn upon the austerity regarding registration of copyright and printpublic funds, the analysis of the print production in Brittany reveals an unexpected thematic diversity. The artisticprint on sheet, collections or illustrated albums is analysed from a stylistic and iconographic point of view.Finally, the study of useful lithography and the tin-box will bring this chapter to a close.Print trade which formsthe last link in the production chain is recounted through its merchants, a trade being transformed throughout XIXcentury, door-to-door and casual sellers. Lastly, the topic of the diffusion of print in Brittany is put forward asbeing the market place of Breton lithography within a national and international network
Hauser, Hubert [Verfasser], e Holger [Akademischer Betreuer] Reinecke. "Nanoimprint lithography for solar cell texturisation = Nanoimprint Lithographie fuer die Solarzellentexturierung". Freiburg : Universität, 2013. http://d-nb.info/1123476160/34.
Testo completoZheng, Zijian. "Soft lithography and nanoimprint lithography for applications in polymer electronics". Thesis, University of Cambridge, 2007. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.613415.
Testo completoKandulski, Witold. "Shadow nanosphere lithography". [S.l.] : [s.n.], 2007. http://deposit.ddb.de/cgi-bin/dokserv?idn=985533013.
Testo completoMusgraves, J. David. "Maskless Projection Lithography". Scholarship @ Claremont, 2003. http://scholarship.claremont.edu/pomona_theses/17.
Testo completoSchmidt, Aaron Jerome 1979. "Contact thermal lithography". Thesis, Massachusetts Institute of Technology, 2004. http://hdl.handle.net/1721.1/27116.
Testo completoIncludes bibliographical references (p. 65-67).
Contact thermal lithography is a method for fabricating microscale patterns using heat transfer. In contrast to photolithography, where the minimum achievable feature size is proportional to the wavelength of light used in the exposure process, thermal lithography is limited by a thermal diffusion length scale and the geometry of the situation. In this thesis the basic principles of thermal lithography are presented. A traditional chrome-glass photomask is brought into contact with a wafer coated with a thermally sensitive polymer. The mask-wafer combination is flashed briefly with high intensity light, causing the chrome features heat up and conduct heat locally to the polymer, transferring a pattern. Analytic and finite element models are presented to analyze the heating process and select appropriate geometries and heating times. In addition, an experimental version of a contact thermal lithography system has been constructed and tested. Early results from this system are presented, along with plans for future development.
by Aaron Jerome Schmidt.
S.M.
Brodsky, Colin John. "Graft polymerization lithography". Access restricted to users with UT Austin EID Full text (PDF) from UMI/Dissertation Abstracts International, 2001. http://wwwlib.umi.com/cr/utexas/fullcit?p3024998.
Testo completoBaker, Mark. "Metastable Atom Lithography". Thesis, Griffith University, 2008. http://hdl.handle.net/10072/365477.
Testo completoThesis (PhD Doctorate)
Doctor of Philosophy (PhD)
School of Biomolecular and Physical Sciences
Faculty of Science
Full Text
Park, Jea Woo. "Lithography Hotspot Detection". PDXScholar, 2017. https://pdxscholar.library.pdx.edu/open_access_etds/3781.
Testo completoMeyers, Bernard C. "Nagual interpretations /". Online version of thesis, 1990. http://hdl.handle.net/1850/10953.
Testo completoChen, Ying. "PATTERNING ELASTOMER, THERMOPLASTICS AND SHAPE MEMORYMATERIAL BY UVO LITHOGRAPHY AND SOFT LITHOGRAPHY". University of Akron / OhioLINK, 2017. http://rave.ohiolink.edu/etdc/view?acc_num=akron1491264216402058.
Testo completoColburn, Matthew Earl. "Step and flash imprint lithography : a low-pressure, room-temperature nanoimprint lithography /". Access restricted to users with UT Austin EID Full text (PDF) from UMI/Dissertation Abstracts International, 2001. http://wwwlib.umi.com/cr/utexas/fullcit?p3025205.
Testo completoKim, Hyung-Jun. "Automation of soft lithography". Thesis, Massachusetts Institute of Technology, 2006. http://hdl.handle.net/1721.1/38290.
Testo completoIncludes bibliographical references (leaves 79-82).
This dissertation is a final documentation of the project whose goal is demonstrating manufacturability of soft lithography. Specifically, our target is creating micron scale patterns of resists on a 3 square inch, relatively large area in case of soft lithography, flexible substrate using microcontact printing in order to forming electronic circuit patterns for flexible displays. At first, the general principles and characteristics of soft lithography are reviewed in order to provide the snapshot of soft lithography technologies, and the key factors that affect the productivity and quality of microcontact printing are discussed because such factors should be understood in advanced to develop current lab-based microcontact printing science into plant manufacturing technology. We proposed a prototype for automated of microcontact printing process adopting a continuous reel-to-reel design, ideal for mass production, as well as printing-side-up design in order to minimize the distortion of relief features of PDMS stamp. The machine we created not only demonstrated the manufacturability of microcontact printing, our initial project goal, but also high scalability for mass production. The machine can print micron scale patterns on a 7 square inch plastic sheet, four times bigger than initial target area, at once.
by Hyung-Jun Kim.
M.Eng.
Tsai, Hsin-Yu Sidney. "Absorbance modulation optical lithography". Thesis, Massachusetts Institute of Technology, 2007. http://hdl.handle.net/1721.1/42253.
Testo completoThis electronic version was submitted by the student author. The certified thesis is available in the Institute Archives and Special Collections.
Includes bibliographical references (p. 91-94).
In this thesis, the concept of absorbance-modulation optical lithography (AMOL) is described, and the feasibility experimentally verified. AMOL is an implementation of nodal lithography, which is not bounded by the diffraction limit of incident lights. Experimental results showed promising capability of AMOL and matched well with simulation. Several key elements of the AMOL system are discussed: the material systems of AMOL, limitations on the material and optical systems presented, and the design and fabrication of spiral phase elements that generate ring-shaped beams required by AMOL.
by Hsin-Yu Sidney Tsai.
S.M.
Rius, Suñé Gemma. "Electron beam lithography for Nanofabrication". Doctoral thesis, Universitat Autònoma de Barcelona, 2008. http://hdl.handle.net/10803/3404.
Testo completoLa EBL se basa en la definición de motivos submicrónicos mediante el rastreo de un haz energético de electrones sobre una resina. La naturaleza de los electrones y el desarrollo the haces extremadamente finos y su control preciso establecen la plataforma ideal para los requerimientos de la Nanofabricación. El uso de la EBL para el desarrollo de un gran número de nanoestructuras, nanodispositivos y nanosistemas ha sido, y continúa siendo, crucial para las aplicaciones de producción de máscaras, prototipaje o dispositivos discretos para la investigación fundamental. Su éxito radica en la alta resolución, flexibilidad y compatibilidad de la EBL con otros procesos de fabricación convencionales.
El objetivo de esta tesis es el avance en el conocimiento, desarrollo y aplicación de la EBL en las areas de los micro/nanosistemas y la nanoelectrónica. El presente documento refleja parte del trabajo realizado en el Laboratorio de Nanofabricación del Instituto de Microelectrónica de Barcelona IMB-CNM-CSIC durante los últimos cinco años. Debido a la falta de experiencia previa en el IMB en la utilización de la EBL, ha sido necesario el desarrollo y consolidación de una serie de procesos, lo que ha condicionado parcialmente la investigación, tal y como recoge la memoria.
Entre los aspectos relevantes compilados en esta tesis, en cuanto a innovación tecnológica, cabe destacar diversos avances en procesos tecnológicos basados en la EBL. Una nueva resina de tono negativo ha sido caracterizada y disponible para su uso en nanofabricación. La optimización de la EBL se ha llevado a cabo mediante métodos de corrección del efecto de proximidad. Se ha establecido el proceso de integración de estructuras nanomecánicas en circuitos CMOS, así como la fabricación de dispositivos basados en nanotubos de carbono. En concreto, el primer FET basado en un sólo nanotubo de carbono fabricado en España. Finalmente, la compatibilidad y viabilidad de los métodos de fabricación basados en haces de partículas se ha estudiado mediante el análisis del efecto de los haces de partículas cargadas sobre dispositivos. Por otro lado, esta memoria no sólo contiene la descripción de los principales resultados obtenidos, sinó que pretende aportar información general sobre procesos de nanofabricación basados en haces de electrones para ser utilizados en futuras investigaciones de este area.
Electron beam lithography (EBL) has consolidated as one of the most common techniques for patterning at the nanoscale meter range. It has enabled the nanofabrication of structures and devices within the research field of nanotechnology and nanoscience.
EBL is based on the definition of submicronic features by the scanning of a focused energetic beam of electrons on a resist. The nature of electrons and the development of extremely fine beams and its flexible control provide the platform to satisfy the requirements of Nanofabrication. Use of EBL for the development of a wide range of nanostructures, nanodevices and nanosystems has been, and continues to be, crucial for the applications of mask production, prototyping and discrete devices for fundamental research and it relies on its high resolution, flexibility and compatibility with other conventional fabrication processes.
The purpose of this thesis is to advance in the knowledge, development and application of electron beam lithography in the areas of micro/nano systems and nanoelectronics. In this direction, this memory reflects part of the work performed at the Nanofabrication Laboratory of the IMB-CNM. Since there was no previous experience on EBL at CNM, the need for developing a set of processes has determined partially the work.
The variety of topics that concern to nanoscience and nanotechnology is enormous. Chapter 1 briefly sintetizes nanoscale related aspects. This section aims to frame the contents of this thesis, coherently. Also for completeness, it is intended to address the specific subjects under discussion or contained in the following chapters and it is based or oriented to the experimental results that will be presented.
Chapter 2 is a general overview of the EBL technique from the point of view of the system and the physical interaction of the process. In particular, the characteristics of the SEM and specifications of the lithographic capabilities of the system that is used are presented.
In chapter 3, irradiation effect on resists is studied. The chemical behaviour of different polymeric materials is correlated with theoretical simulations for two types of resists: methacrylic based positive resists and epoxy based negative resists. The first is used for validation of the modelization and to describe the general performance of EBL on different conditions. The second covers the experiments oriented to establish the performance parameters of a new resist and comparison with another existing negative electron beam resist. Proximity effect correction concludes with the correlation of theory and experimental results for both types of resists, positive and negative.
Chapter 4 is an example of the fabrication and optimization of a micro/nanosystem for sensing at the nanoscale. In particular, nanoresonators are developed with two approaches (EBL and FIB) and enhanced response is achieved by their integration on CMOS circuitry.
Chapter 5 presents carbon nanotube (CNT) based devices that are realized and implemented for applications in nanoelectronics and sensing. First, different fabrication approaches for contacting CNTs are discussed. Then, the results of electrical characterization of the devices are presented. Finally, technology development for the use of these devices for sensing is established.
The last chapter embraces all the previous sections and pays attention to the effect of electron beam on the devices. In particular, electron induced effect is studied on nanomechanical structures integrated in circuits and CNT based devices, in order to evaluate EBL based fabrication, SEM characterization or more fundamental aspects. Advanced characterization techniques are used together with simulations, both assessing a deeper understanding of the results. Electrical measurements and AFM based techniques are used to characterise the effect of the electron irradiation by changes in their performance characteristics, charging, surface potential imaging, etc.
Main results and solved challenges are summarized in the conclusive chapter 7 that finishes with this document.
Harris, Lee George. "Physicochemical lithography of functional nanolayers". Thesis, Durham University, 2006. http://etheses.dur.ac.uk/9358/.
Testo completoHubbard, Graham John. "Nanoimprint lithography using disposable masters". Thesis, University of Bath, 2011. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.576992.
Testo completoKonijn, Mark. "Multilevel Nanoengineering for Imprint Lithography". Thesis, University of Canterbury. Electrical and Computer Engineering, 2005. http://hdl.handle.net/10092/1071.
Testo completoYoung, Richard James Hendley. "Electroluminescent devices via soft lithography". Thesis, Brunel University, 2017. http://bura.brunel.ac.uk/handle/2438/17139.
Testo completoFarhoud, Maya S. (Maya Sami). "Interferometric lithography and selected applications". Thesis, Massachusetts Institute of Technology, 1997. http://hdl.handle.net/1721.1/10457.
Testo completoLiu, Dixi. "NEMS by sidewall transfer lithography". Thesis, Imperial College London, 2015. http://hdl.handle.net/10044/1/31868.
Testo completoYao, Peng. "Developing three-dimensional lithography and chemical lithography for applications on micro/nano photonics and electronics". Access to citation, abstract and download form provided by ProQuest Information and Learning Company; downloadable PDF file, 206 p, 2007. http://proquest.umi.com/pqdweb?did=1397913021&sid=11&Fmt=2&clientId=8331&RQT=309&VName=PQD.
Testo completoHeard, P. J. "Applications of scanning ion beam lithography". Thesis, University of Cambridge, 1985. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.372653.
Testo completoYang, Yugu. "Feedback Control for Electron Beam Lithography". UKnowledge, 2012. http://uknowledge.uky.edu/ece_etds/9.
Testo completoFILHO, HENRIQUE DUARTE DA FONSECA. "METALLIC NANOSTRUCTURE FABRICATION BY AFM LITHOGRAPHY". PONTIFÍCIA UNIVERSIDADE CATÓLICA DO RIO DE JANEIRO, 2004. http://www.maxwell.vrac.puc-rio.br/Busca_etds.php?strSecao=resultado&nrSeq=6061@1.
Testo completoNesta dissertação de mestrado, nós desenvolvemos um processo de litografia baseado na técnica de microscopia de força atômica. O estudo do processo de litografia aqui utilizado inicia-se com a deposição e caracterização de filmes finos de sulfeto de arsênio amorfo (a-As2S3) em substratos de silício e a deposição de uma camada metálica de alumínio, utilizada como máscara, sobre a superfície do a-As2S3. O microscópio de força atômica é utilizado para escrever os padrões de forma controlada na camada metálica, e para tal, a influencia dos parâmetros de controle do microscópio na realização da litografia foi analisada. Para a transferência do padrão litografado realiza-se um posterior processo de fotossensibilização e dissolução química do a-As2S3 com uma solução de K2CO3. Após a dissolução, uma camada de ouro foi depositada por erosão catódica DC, seguido de uma nova dissolução, desta vez com NaOH resultando na transferência de nanoestruturas de Au para o substrato de silício.
In this dissertation, we have developed a lithography process based on the atomic force microscopy of technique. The study of the lithography process starts with the deposition and characterization of amorphous arsenic sulfide thin films (a-As2S3) in silicon substrates and the deposition of a metallic aluminum layer, used as mask, on the surface of the a-As2S3. An atomic force microscope was used to write patterns in a controlled way on the metallic layer. Therefore, the influence of microscope feedback system on the accomplishment of the lithography was analyzed. In order to transfer the lithographed pattern to a silicon substrate, the a- As2S3 was exposed to a UV light source and was dissolved with a K2CO3 solution. Then, a thin gold layer was deposited by sputtering DC, and a new dissolution, now with NaOH was performed, leading to the deposition of Au nanostructures onto the silicon substrate.
Dongxu, Yang. "Novel resists for next generation lithography". Thesis, University of Birmingham, 2016. http://etheses.bham.ac.uk//id/eprint/6532/.
Testo completoBong, Ki Wan. "Advanced flow lithography and barcoded particles". Thesis, Massachusetts Institute of Technology, 2012. http://hdl.handle.net/1721.1/76479.
Testo completoCataloged from PDF version of thesis.
Includes bibliographical references (p. 120-138).
Anisotropic multifunctional particles have drawn much attention, leading to wide ranges of applications from biomedical areas to electronics. Despite their enormous potentials, particles with geometrically and chemically complex patterns are not widely used because existing methodologies have limitations in large scale, facile production and suffer from constraints of functionality and morphology. For example, the geometries of multifunctional particles prepared by liquid-phase particle synthesis have been mainly restricted to spheres, deformed spheres, or cylinders. This geometrical restriction has resulted from the tendency of liquid systems to adopt arrangements that minimize surface energy. Although template-assisted particle fabrication can overcome this, these methods are largely ineffective at producing particles with chemical anisotropy or patterning, as the precursor liquid is simply isolated in a non-wetting template and then crosslinked in situ. Currently, a technique that can provide both geometrical and chemical complexities to particles has been missing. Distinguished with the above techniques, flow lithography (FL) has been emerging as a powerful synthesis tool that enables the creation of microparticles with complex morphologies and chemical patterns. Combining photolithography with microfluidic methods, FL has provided precise control over particle size, shape, and chemical patchiness. However, in the primitive versions of FL, particle geometry and chemical patterning has been restricted to 2D and 1D, respectively. Also, these techniques have required the use of polydimethylsiloxane (PDMS) devices, greatly limiting the range of precursor materials which can be processed in FL. Here, we present advanced flow lithography to achieve much higher degree of geometrical and chemical complexity than before. For example, lock release lithography (LRL) can be used to introduce three-dimensional (3D) morphologies, and provide chemical anisotropy in the x-y dimensions (in-plane dimensions) of particles. Also, hydrodynamic focusing lithography (HFL) was developed to offer z-directional (particle height direction) chemical anisotropy to particles. Lastly, oxygen-free flow lithography was a technique designed to extend current PDMS-based FL to any kinds of devices and allow for the creation of particles from previously inaccessible reagents such as organic solvents. In this thesis, we have also demonstrated advanced barcoded particles as one application of advanced flow lithography. Previously, barcoded hydrogel particles were created as a promising diagnostic tool for high-throughput screening and multiplexed detection of biomolecules. Utilizing advanced flow lithography, we have added advanced functions to the hydrogel particles introducing magnetic beads, tri-layered structures or near-infrared sensing materials. As the first advanced barcoded particles, we present magnetic barcoded hydrogel particles that had led to practical applications in the efficient orientation and separation of the barcoded particles. Also, we show reinforced barcoded particles that combine the usually orthogonal characteristics of an open porous capture region for biomolecule detection with strong structural properties that resist deformation in flow. Finally, we demonstrate near-infrared barcoded particles which can exhibit label-free and real time detection of target molecules.
by Ki Wan Bong.
Ph.D.
Paudel, Trilochan. "Nanosphere Lithography for Nano Optical Applications". Thesis, Boston College, 2011. http://hdl.handle.net/2345/3155.
Testo completoThesis advisor: Krzysztof Kempa
Many different techniques are available to create nanopatterns in nanoscale devices. However, a few are flexible and inexpensive enough to be practical in the nanotechnology. Here, we study the nanosphere lithography (NSL) based on a self-assembly of microspheres. Using this technique, we have developed various patterns in metallic films, ranging from honeycomb arrays of "quasi-triangles" to circular holes. These various patterns have been used subsequently either as nano-optical structures directly, with remarkable optical and plasmonic properties, or as substrates for further nano-processing. In one such nano-processing, the "quasi-triangle" patterns were used as a catalyst for carbon nanotube growth. The resulting aligned arrays of carbon nanotubes were employed in nanocoax solar cells. In another nano-processing, the arrays were used as masks for electrodeposition. In addition to the nano processing and measurements, we have employed the FDTD computer simulations, to develop a full understanding of the nano-optical and plasmonic properties of the developed structures
Thesis (PhD) — Boston College, 2011
Submitted to: Boston College. Graduate School of Arts and Sciences
Discipline: Physics
Kim, Hyunsu. "Interference lithography with extreme ultraviolet light". Thesis, University of Southampton, 2016. https://eprints.soton.ac.uk/410353/.
Testo completoMack, Chris Alan. "Modeling solvent effects in optical lithography /". Digital version accessible at:, 1998. http://wwwlib.umi.com/cr/utexas/main.
Testo completoDedman, Emma Ruth. "Characterisation of photonic crystals fabricated by holographic lithography". Thesis, University of Oxford, 2004. http://ora.ox.ac.uk/objects/uuid:35f8c1da-fca7-4086-aab3-fdda5ce346c6.
Testo completoMehrotra, Prateek. "High Aspect Ratio Lithographic Imaging at Ultra-high Numerical Apertures: Evanescent Interference Lithography with Resonant Reflector Underlayers". Thesis, University of Canterbury. Electrical and Computer Engineering, 2012. http://hdl.handle.net/10092/6935.
Testo completoRommel, Marcus [Verfasser], e Jürgen [Akademischer Betreuer] Weis. "High resolution electron beam lithography : an improved understanding of a versatile lithography technique / Marcus Rommel ; Betreuer: Jürgen Weis". Stuttgart : Universitätsbibliothek der Universität Stuttgart, 2018. http://d-nb.info/1162893567/34.
Testo completoShi, Shichang. "Lithography : friendly routing via forbidden pitch avoidance /". View the Table of Contents & Abstract, 2004. http://sunzi.lib.hku.hk/hkuto/record/B30469636.
Testo completoHansson, Björn. "Laser-Plasma Sources for Extreme-Ultraviolet Lithography". Doctoral thesis, KTH, Physics, 2003. http://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-3677.
Testo completoThis thesis describes the development and characterizationof a liquidxenon- jet laser-plasma source forextreme-ultraviolet (EUV) radiation. It is shown how thissource may be suitable for production-scale EUV lithography(EUVL).
EUVL is one of the main candidates to succeeddeep-ultraviolet (DUV) lithography for large-scalemanufacturing of integrated circuits (IC). However, a majorobstacle towards the realization of EUVL is the currentunavailability of a source meeting the tough requirements onespecially power and cleanliness for operation in an EUVLstepper. The liquid-xenon-jet laser-plasma concept has keyadvantages that may make it suitable for EUVL since, e.g., itsplasma consists only of the inert noble gas xenon and since theliquidjet target technology enables plasma operation at largedistances from the source-hardware thereby reducing sputteringand to allowing for high-power operation.
At the beginning of the work described in this thesis, aspatial instability of the liquid-xenon-jet made stableoperation of a plasma at practical distances from the nozzleorifice dicult. However, an invention of a stabilization methodbased on applying localized heating to the tip of thejet-forming nozzle, resulted in stable jet operation. Thelongitudinal droplet stability of a liquid-droplet laser-plasmasource has also been investigated and improved.
Continuous improvements of especially the laser-power toEUV-radiation conversion eciency (CE) and the stability oflaser-plasma operation at large distances (several centimeter)from the nozzle are reported for the liquidxenon- jet laserplasma source. Furthermore, this source is characterizedregarding many parameters relevant for EUVL operationincluding, ion emission from the plasma and related sputteringof nearby components, source size and shape, therepetition-rate limit of the source and non-EUV emission fromthe plasma.
Although the main focus of the thesis has been thedevelopment and characterization of a liquid-xenon-jetlaser-plasma source for production-scale EUVL, the source mayalso be suitable for small field applications that benefit fromthe high potential brightness of the source. A method to scanthe plasma and thus minimize the photon losses whilemaintaining the object plane uniformity was developed.Furthermore, the first operation of a liquidtin- jet laserplasma is reported. Quantitative EUV flux measurements yieldrecord CE, but quantitative contamination measurements alsoindicate that a liquid-tin-jet laser plasma is not likely to beapplicable as a source for EUVL.
Hoskins, Trevor P. J. II. "Characterization of Substituted Polynorbornenes for Advanced Lithography". Diss., Georgia Institute of Technology, 2005. http://hdl.handle.net/1853/8727.
Testo completoVallejo, Rogelio Murillo. "Magnetic media patterned by laser interference lithography". Enschede : University of Twente [Host], 2006. http://doc.utwente.nl/55932.
Testo completoLee, Fung Ying. "Fabrication of nanoparticle arrays by holographic lithography /". View abstract or full-text, 2007. http://library.ust.hk/cgi/db/thesis.pl?PHYS%202007%20LEE.
Testo completoGleason, Russell. "Nanosphere lithography applied to magnetic thin films". Thesis, California State University, Long Beach, 2013. http://pqdtopen.proquest.com/#viewpdf?dispub=1524199.
Testo completoMagnetic nanostructures have widespread applications in many areas of physics and engineering, and nanosphere lithography has recently emerged as promising tool for the fabrication of such nanostructures. The goal of this research is to explore the magnetic properties of a thin film of ferromagnetic material deposited onto a hexagonally close-packed monolayer array of polystyrene nanospheres, and how they differ from the magnetic properties of a typical flat thin film. The first portion of this research focuses on determining the optimum conditions for depositing a monolayer of nanospheres onto chemically pretreated silicon substrates (via drop-coating) and the subsequent characterization of the deposited nanosphere layer with scanning electron microscopy. Single layers of permalloy (Ni80Fe20) are then deposited on top of the nanosphere array via DC magnetron sputtering, resulting in a thin film array of magnetic nanocaps. The coercivities of the thin films are measured using a home-built magneto-optical Kerr effect (MOKE) system in longitudinal arrangement. MOKE measurements show that for a single layer of permalloy (Py), the coercivity of a thin film deposited onto an array of nanospheres increases compared to that of a flat thin film. In addition, the coercivity increases as the nanosphere size decreases for the same deposited layer. It is postulated that magnetic exchange decoupling between neighboring nanocaps suppresses the propagation of magnetic domain walls, and this pinning of the domain walls is thought to be the primary source of the increase in coercivity.
Watson, Scott M. D. "Scanning probe lithography of chemically functionalised surfaces". Thesis, Durham University, 2008. http://etheses.dur.ac.uk/2055/.
Testo completoHe, X. "Nanoimprint lithography for applications in photovoltaic devices". Thesis, University of Cambridge, 2010. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.603915.
Testo completoShi, Shichang, e 石世長. "Lithography: friendly routing via forbidden pitch avoidance". Thesis, The University of Hong Kong (Pokfulam, Hong Kong), 2004. http://hub.hku.hk/bib/B44570168.
Testo completoLi, Jia, e 李佳. "Computational imaging technologies for optical lithography extension". Thesis, The University of Hong Kong (Pokfulam, Hong Kong), 2014. http://hdl.handle.net/10722/206757.
Testo completopublished_or_final_version
Electrical and Electronic Engineering
Doctoral
Doctor of Philosophy
Colburn, Matthew Earl 1974. "Step and flash imprint lithography : a low-pressure, room-temperature nanoimprint lithograph". 2001. http://hdl.handle.net/2152/10298.
Testo completoWang, Yun Wen, e 王韻雯. "Study of Achromatic Interference Lithography Technology Used in Large-Area Lithography". Thesis, 2015. http://ndltd.ncl.edu.tw/handle/e83jpf.
Testo completoCHUANG, CHING MIN, e 莊清閔. "Improved Lithography Resolution by Varying I-LINE Optical Lithography Numerical Aperture". Thesis, 2012. http://ndltd.ncl.edu.tw/handle/41063964861734146495.
Testo completo長庚大學
電子工程學系
100
DRAM (Dynamic Random-Access Memory) is required for larger and larger capacity memory chips with the progress of technology. The IC (Integrated Circuit) manufacturers certainly want to make a largest memory capacity with small wafer size. All they have to do is reducing cost by decreasing the feature size for reaching the requirement of advanced DRAM in next generation. In this study, a process step of via hole was researched. The maximum resolution of window target is 335 nm (CD PATTEM) by KrF (248 nm). However, I-Line wavelength is 365 nm, still can not reach the best focus. Therefore, an I-Line exposure with changing parameters of aperture was used for improving the resolution, and it has reached the same efficiency similar to KrF. In our research, by changing the aperture of conventional and annular and adding a mask with the aperture size of 0.62, the minimum value is 0.2833 μm which was measured by SEM. This result proves that we can have a higher resolution by improved I-Line exposure. Although there still need to improve, technology factories would have the best resolution with lowest cost in the future.
Yi-MingLin e 林奕名. "Extreme ultraviolet interferometric lithography - fabrication of transmission grating by using nanoimprint lithography". Thesis, 2011. http://ndltd.ncl.edu.tw/handle/12689475218057827616.
Testo completoTuffli, Andrea Lynne. "Imaging in EUV lithography". 1998. http://catalog.hathitrust.org/api/volumes/oclc/39618084.html.
Testo completoTypescript. eContent provider-neutral record in process. Description based on print version record. Includes bibliographical references (leaves 71-75).
Lin, Chien-Hung, e 林建宏. "Ultrasonic Nanoimprint Lithography Technology". Thesis, 2007. http://ndltd.ncl.edu.tw/handle/72340773981514108296.
Testo completo國立清華大學
微機電工程研究所
95
In this study, we report an ultrasonic nanoimprint lithography (U-NIL) method which can overcome the drawbacks of energy consumption and long process time occurred in conventional NIL methods. Instead of using heaters in conventional NIL, the proposed U-NIL employs an ultrasonic source located on the top of mold to generate high frequency vibration causing the increase of temperature to soften and to melt the thermoplastic polymer. The ultrasonic source is induced by the transducer consisting of a number of piezoelectric ceramic discs, sandwiched between two aluminum metal blocks. A novel ultrasonic NIL technology and ultrasonic imprinted machine have been developed and set up. To investigate the effects of imprinted resist thickness and mold geometries on the polymer flow and the temperature distribution of U-NIL through numerical have been simulated. In simulations, the velocity fields in imprinting stage and the temperature distributions in ultrasonic vibrations are performed under the variations of convexity width, cavity width, and thickness of imprinted polymer resist. Moreover, the combined effects of the imprinting stage and ultrasonic vibrations in U-NIL process are discussed. The experimental results demonstrated that vibratory energy could be concentrated in transferring the topography of mold’s surface into the polymer. We conclude that the proposed U-NIL process has the potential to become a novel nanoimprinting method.
Lin, Ting-Hsu, e 林庭旭. "Development of Dielectrophoretic Lithography". Thesis, 2009. http://ndltd.ncl.edu.tw/handle/86680491845025442508.
Testo completo國立交通大學
奈米科技研究所
98
Because the lithography technique is progressing continuously, the dimension of transistor device is getting smaller. Recently, development of traditional optical lithography technique is reaching the limit, and it's not practical to have an advanced optical lithography system with shorter light wavelength. Hence the researchers keep investigating the new way for next generation lithography. There are many methods have been demonstrated. In this thesis, we propose a new forming technique controlling UV curable liquid by applying an electric field and than solidifying the material. The fabrication process of the device uses simply planar patterned electrode without any 3-D structure. The technique is based on the EWOD and DEP force. Actuating materials by applying an ac electric field could avoid the light diffraction limit. Besides, we can quantitatively control liquid volume. Furthermore, the waste material was reduced. We successfully drive the curable materials. By tuning up the experimental parameters and the composition of materials, microstructures were built.