Letteratura scientifica selezionata sul tema "Lithography"
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Articoli di riviste sul tema "Lithography"
Vandаlovskyi, V. "Artistic and technical features of the lithographic manner mixed technique". Research and methodological works of the National Academy of Visual Arts and Architecture, n. 27 (27 febbraio 2019): 92–98. http://dx.doi.org/10.33838/naoma.27.2018.92-98.
Testo completoKwon, B., e Jong H. Kim. "Importance of Molds for Nanoimprint Lithography: Hard, Soft, and Hybrid Molds". Journal of Nanoscience 2016 (22 giugno 2016): 1–12. http://dx.doi.org/10.1155/2016/6571297.
Testo completoWen, Zaoxia, Xingyu Liu, Wenxiu Chen, Ruolin Zhou, Hao Wu, Yongmei Xia e Lianbin Wu. "Progress in Polyhedral Oligomeric Silsesquioxane (POSS) Photoresists: A Comprehensive Review across Lithographic Systems". Polymers 16, n. 6 (19 marzo 2024): 846. http://dx.doi.org/10.3390/polym16060846.
Testo completoLund, Sarah E. "Fossils: Lithography’s Porous Time and Eugène Delacroix’s Faust Marginalia". Nineteenth Century Studies 35 (novembre 2023): 1–32. http://dx.doi.org/10.5325/ninecentstud.35.0001.
Testo completoPrakoso, Emmanuel Putro, Inovensius Hugo Bima Wicaksana, Nick Soedarso e Rina Carina. "TEKNIK CETAK DATAR KITCHEN LITHOGRAPY SEBAGAI MEDIA EKSPRESI DESAIN PADA METODE REPRODUKSI GRAFIKA". Jurnal Dimensi DKV Seni Rupa dan Desain 4, n. 2 (1 ottobre 2019): 155. http://dx.doi.org/10.25105/jdd.v4i2.5888.
Testo completoWu, Yu, e Zihao Xiao. "The Recent Progress of Lithography Machine and the State-of-art Facilities". Highlights in Science, Engineering and Technology 5 (7 luglio 2022): 155–65. http://dx.doi.org/10.54097/hset.v5i.737.
Testo completoVoznyuk G. V., Grigorenko I. N., Mitrofanov M. I., Nikolaev V. V. e Evtikhiev V. P. "Subwave textured surfaces for the radiation coupling from the waveguide". Technical Physics Letters 48, n. 3 (2022): 76. http://dx.doi.org/10.21883/tpl.2022.03.52896.19103.
Testo completoSharma, Ekta, Reena Rathi, Jaya Misharwal, Bhavya Sinhmar, Suman Kumari, Jasvir Dalal e Anand Kumar. "Evolution in Lithography Techniques: Microlithography to Nanolithography". Nanomaterials 12, n. 16 (11 agosto 2022): 2754. http://dx.doi.org/10.3390/nano12162754.
Testo completoZhang, Zhen. "Optimization of Triple Periodic Bilayer Stacks and Aerial Image Performance Analysis". International Journal of Electronics and Electrical Engineering 8, n. 3 (settembre 2020): 53–57. http://dx.doi.org/10.18178/ijeee.8.3.53-57.
Testo completoSeo, Manseung, Haeryung Kim e Masahiko Onosato. "Lithography Using a Microelectronic Mask". Journal of Robotics and Mechatronics 18, n. 6 (20 dicembre 2006): 816–23. http://dx.doi.org/10.20965/jrm.2006.p0816.
Testo completoTesi sul tema "Lithography"
Benoit-Renault, Viviane. "La lithographie en Bretagne (1819-1914)". Thesis, Paris 4, 2014. http://www.theses.fr/2014PA040217.
Testo completoIn the history of print, the study of lithography in province has long been neglected. The first founding worksonly date back to the last forty years. The purpose of this thesis on the history of art is to address this shortcomingby analysing lithography in historical Brittany between 1819 and 1914 bearing an interdisciplinarity mind open toeconomic and social history.Initially this research will be based on the study of lithographic printing. Following a general overviewon the evolution of the number of workshops and their geographical breakdown, leading and secondarylithographic centres are being considered. On the other hand, autographic printing which established itself andcame into competition with the lithographic workshops is being analysed with an emphasis on tin-plate printingworkshops being a characteristic feature of Brittany. Beyond this historical study, the following chapter paints aportrait of the printers and that of the lithographic production scene which being a social environment. It is aworld whereby the painter mingles with the professional lithographer, the drawing lover, the printer and thecraftsman. The reality of the printing world is being addressed in the third chapter with a particular focus on theworkshop and the history of the equipment specific to printing (plates and moulds). Subsequently the workshop isseen as a world in its own right with its celebrations and codes responsible for the working cohesion. This unitywill be accentuated in the second half of the XIX century with the constitution of lithographers unions. Thanksto the creation of a lithographs inventory drawn upon the austerity regarding registration of copyright and printpublic funds, the analysis of the print production in Brittany reveals an unexpected thematic diversity. The artisticprint on sheet, collections or illustrated albums is analysed from a stylistic and iconographic point of view.Finally, the study of useful lithography and the tin-box will bring this chapter to a close.Print trade which formsthe last link in the production chain is recounted through its merchants, a trade being transformed throughout XIXcentury, door-to-door and casual sellers. Lastly, the topic of the diffusion of print in Brittany is put forward asbeing the market place of Breton lithography within a national and international network
Hauser, Hubert [Verfasser], e Holger [Akademischer Betreuer] Reinecke. "Nanoimprint lithography for solar cell texturisation = Nanoimprint Lithographie fuer die Solarzellentexturierung". Freiburg : Universität, 2013. http://d-nb.info/1123476160/34.
Testo completoZheng, Zijian. "Soft lithography and nanoimprint lithography for applications in polymer electronics". Thesis, University of Cambridge, 2007. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.613415.
Testo completoKandulski, Witold. "Shadow nanosphere lithography". [S.l.] : [s.n.], 2007. http://deposit.ddb.de/cgi-bin/dokserv?idn=985533013.
Testo completoMusgraves, J. David. "Maskless Projection Lithography". Scholarship @ Claremont, 2003. http://scholarship.claremont.edu/pomona_theses/17.
Testo completoSchmidt, Aaron Jerome 1979. "Contact thermal lithography". Thesis, Massachusetts Institute of Technology, 2004. http://hdl.handle.net/1721.1/27116.
Testo completoIncludes bibliographical references (p. 65-67).
Contact thermal lithography is a method for fabricating microscale patterns using heat transfer. In contrast to photolithography, where the minimum achievable feature size is proportional to the wavelength of light used in the exposure process, thermal lithography is limited by a thermal diffusion length scale and the geometry of the situation. In this thesis the basic principles of thermal lithography are presented. A traditional chrome-glass photomask is brought into contact with a wafer coated with a thermally sensitive polymer. The mask-wafer combination is flashed briefly with high intensity light, causing the chrome features heat up and conduct heat locally to the polymer, transferring a pattern. Analytic and finite element models are presented to analyze the heating process and select appropriate geometries and heating times. In addition, an experimental version of a contact thermal lithography system has been constructed and tested. Early results from this system are presented, along with plans for future development.
by Aaron Jerome Schmidt.
S.M.
Brodsky, Colin John. "Graft polymerization lithography". Access restricted to users with UT Austin EID Full text (PDF) from UMI/Dissertation Abstracts International, 2001. http://wwwlib.umi.com/cr/utexas/fullcit?p3024998.
Testo completoBaker, Mark. "Metastable Atom Lithography". Thesis, Griffith University, 2008. http://hdl.handle.net/10072/365477.
Testo completoThesis (PhD Doctorate)
Doctor of Philosophy (PhD)
School of Biomolecular and Physical Sciences
Faculty of Science
Full Text
Park, Jea Woo. "Lithography Hotspot Detection". PDXScholar, 2017. https://pdxscholar.library.pdx.edu/open_access_etds/3781.
Testo completoMeyers, Bernard C. "Nagual interpretations /". Online version of thesis, 1990. http://hdl.handle.net/1850/10953.
Testo completoLibri sul tema "Lithography"
Landis, Stefan, a cura di. Lithography. Hoboken, NJ USA: John Wiley & Sons, Inc., 2013. http://dx.doi.org/10.1002/9781118557662.
Testo completoShappo, Aleksandr. Lithography. Minsk]: Shappo.org, 2016.
Cerca il testo completoBrighton, University Of. Lithography. Brighton: University of Brighton, 1993.
Cerca il testo completoSotomayor Torres, Clivia M., a cura di. Alternative Lithography. Boston, MA: Springer US, 2003. http://dx.doi.org/10.1007/978-1-4419-9204-8.
Testo completoStampfl, Jürgen, Robert Liska e Aleksandr Ovsianikov, a cura di. Multiphoton Lithography. Weinheim, Germany: Wiley-VCH Verlag GmbH & Co. KGaA, 2016. http://dx.doi.org/10.1002/9783527682676.
Testo completoMa, Xu, e Gonzalo R. Arce. Computational Lithography. Hoboken, NJ, USA: John Wiley & Sons, Inc., 2010. http://dx.doi.org/10.1002/9780470618943.
Testo completoMoreau, Wayne M. Semiconductor Lithography. Boston, MA: Springer US, 1988. http://dx.doi.org/10.1007/978-1-4613-0885-0.
Testo completoOzel, Tuncay. Coaxial Lithography. Cham: Springer International Publishing, 2016. http://dx.doi.org/10.1007/978-3-319-45414-6.
Testo completoLandis, Stefan, a cura di. Nano-Lithography. Hoboken, NJ USA: John Wiley & Sons, Inc., 2013. http://dx.doi.org/10.1002/9781118622582.
Testo completoR, Arce Gonzalo, a cura di. Computational lithography. Hoboken, N.J: Wiley, 2010.
Cerca il testo completoCapitoli di libri sul tema "Lithography"
Anner, George E. "Lithography". In Planar Processing Primer, 439–91. Dordrecht: Springer Netherlands, 1990. http://dx.doi.org/10.1007/978-94-009-0441-5_11.
Testo completoVeendrick, Harry. "Lithography". In Bits on Chips, 151–66. Cham: Springer International Publishing, 2018. http://dx.doi.org/10.1007/978-3-319-76096-4_9.
Testo completoKim, Dae-Eun, e In-Ha Sung. "Lithography". In Encyclopedia of Tribology, 1994–2007. Boston, MA: Springer US, 2013. http://dx.doi.org/10.1007/978-0-387-92897-5_1051.
Testo completoEl-Kareh, Badih. "Lithography". In Fundamentals of Semiconductor Processing Technology, 169–260. Boston, MA: Springer US, 1995. http://dx.doi.org/10.1007/978-1-4615-2209-6_4.
Testo completoMorita, Hiroshi. "Lithography". In Computer Simulation of Polymeric Materials, 389–96. Singapore: Springer Singapore, 2016. http://dx.doi.org/10.1007/978-981-10-0815-3_29.
Testo completoWidmann, Dietrich, Hermann Mader, Hans Friedrich, Walter Heywang e Rudolf Müller. "Lithography". In Technology of Integrated Circuits, 95–167. Berlin, Heidelberg: Springer Berlin Heidelberg, 2000. http://dx.doi.org/10.1007/978-3-662-04160-4_4.
Testo completoGooch, Jan W. "Lithography". In Encyclopedic Dictionary of Polymers, 431. New York, NY: Springer New York, 2011. http://dx.doi.org/10.1007/978-1-4419-6247-8_6976.
Testo completoSarangan, Andrew. "Lithography". In Nanofabrication, 139–207. Boca Raton : CRC Press, Taylor & Francis Group, 2017. | Series: Optical sciences and applications of light: CRC Press, 2016. http://dx.doi.org/10.1201/9781315370514-6.
Testo completoGatzen, Hans H., Volker Saile e Jürg Leuthold. "Lithography". In Micro and Nano Fabrication, 313–95. Berlin, Heidelberg: Springer Berlin Heidelberg, 2015. http://dx.doi.org/10.1007/978-3-662-44395-8_6.
Testo completoMizuno, Fumio. "Lithography". In Ultraclean Surface Processing of Silicon Wafers, 398–413. Berlin, Heidelberg: Springer Berlin Heidelberg, 1998. http://dx.doi.org/10.1007/978-3-662-03535-1_29.
Testo completoAtti di convegni sul tema "Lithography"
Lum, Bernice M., Andrew R. Neureuther e Glenn D. Kubiak. "Modeling Soft X-Ray Projection Lithography". In Soft X-Ray Projection Lithography. Washington, D.C.: Optica Publishing Group, 1993. http://dx.doi.org/10.1364/sxray.1993.tud.10.
Testo completoVoelkel, Reinhard, Uwe Vogler, Arianna Bramati, Andreas Erdmann, Nezih Ünal, Ulrich Hofmann, Marc Hennemeyer, Ralph Zoberbier, David Nguyen e Juergen Brugger. "Lithographic process window optimization for mask aligner proximity lithography". In SPIE Advanced Lithography, a cura di Kafai Lai e Andreas Erdmann. SPIE, 2014. http://dx.doi.org/10.1117/12.2046332.
Testo completoMcCallum, Martin. "Some lithographic limits of back end lithography". In Microelectronic and MEMS Technologies, a cura di Chris A. Mack e Tom Stevenson. SPIE, 2001. http://dx.doi.org/10.1117/12.425217.
Testo completoHawryluk, A. M., D. R. Kania, P. Celliers, L. DaSilva, A. Stith, D. Stewart e S. Mrowka. "EUV Reticle Pattern Repair Experiments using 10 KeV Neon Ions". In Extreme Ultraviolet Lithography. Washington, D.C.: Optica Publishing Group, 1994. http://dx.doi.org/10.1364/eul.1994.rmm.204.
Testo completoSasian, Jose M. "New developments in the design of ring field projection cameras for EUV lithography". In International Optical Design Conference. Washington, D.C.: Optica Publishing Group, 1998. http://dx.doi.org/10.1364/iodc.1998.lthd.1.
Testo completoTrucano, Timothy G., Dennis E. Grady, Richard E. Olson e Archie Farnsworth. "Computational Analysis of Debris Formation in SXPL Laser-Plasma Sources". In Soft X-Ray Projection Lithography. Washington, D.C.: Optica Publishing Group, 1993. http://dx.doi.org/10.1364/sxray.1993.tud.12.
Testo completoSweatt, William C. "High Efficiency Condenser Design for Illuminating a Ring Field". In Soft X-Ray Projection Lithography. Washington, D.C.: Optica Publishing Group, 1993. http://dx.doi.org/10.1364/sxray.1993.mb.5.
Testo completoMarrian, Christie R., Elizabeth A. Dobisz e John A. Dagata. "Scanning tunneling microscope lithography: a viable lithographic technology?" In Micro - DL Tentative, a cura di Martin C. Peckerar. SPIE, 1992. http://dx.doi.org/10.1117/12.136012.
Testo completoNeisser, Mark, Harry J. Levinson, Stefan Wurm, David Kyser, Takeo Watanabe, Ken Macwilliams, Hidemi Ishiuchi et al. "Lithography". In 2021 IEEE International Roadmap for Devices and Systems Outbriefs. IEEE, 2021. http://dx.doi.org/10.1109/irds54852.2021.00017.
Testo completoHawryluk, Andrew M. "Reflection Masks for Soft X-Ray Projection Lithography". In Soft X-Ray Projection Lithography. Washington, D.C.: Optica Publishing Group, 1991. http://dx.doi.org/10.1364/sxray.1991.fc2.
Testo completoRapporti di organizzazioni sul tema "Lithography"
Park, Jea. Lithography Hotspot Detection. Portland State University Library, gennaio 2000. http://dx.doi.org/10.15760/etd.5665.
Testo completoLewis, Aaron. Wavelength Independent Optical Lithography. Fort Belvoir, VA: Defense Technical Information Center, giugno 1986. http://dx.doi.org/10.21236/ada171935.
Testo completoJi, Qing. Maskless, resistless ion beam lithography. Office of Scientific and Technical Information (OSTI), gennaio 2003. http://dx.doi.org/10.2172/809301.
Testo completoZotter, Beth. Holographic Lithography for Industrial Nanomanufacturing. Office of Scientific and Technical Information (OSTI), marzo 2020. http://dx.doi.org/10.2172/1614764.
Testo completoBrowning, R., e R. F. Pease. Low Voltage Electron Beam Lithography. Fort Belvoir, VA: Defense Technical Information Center, aprile 1994. http://dx.doi.org/10.21236/ada281046.
Testo completoNAVAL RESEARCH LAB WASHINGTON DC. Low Voltage Electron Beam Lithography. Fort Belvoir, VA: Defense Technical Information Center, marzo 1995. http://dx.doi.org/10.21236/ada293396.
Testo completoLiu, Weidong. Low Voltage Electron Beam Lithography. Fort Belvoir, VA: Defense Technical Information Center, giugno 1995. http://dx.doi.org/10.21236/ada296625.
Testo completoBrowning, R., e R. F. Pease. Low Voltage Electron Beam Lithography. Fort Belvoir, VA: Defense Technical Information Center, ottobre 1992. http://dx.doi.org/10.21236/ada263360.
Testo completoBrowning, R., e R. F. Pease. Low Voltage Electron Beam Lithography. Fort Belvoir, VA: Defense Technical Information Center, febbraio 1993. http://dx.doi.org/10.21236/ada265358.
Testo completoCramer, Corson, Alicia Raftery e Andrew Nelson. Lithography-based Ceramics Manufacturing Technologies. Office of Scientific and Technical Information (OSTI), settembre 2019. http://dx.doi.org/10.2172/1659632.
Testo completo