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Littérature scientifique sur le sujet « Phase change materials, phase change memories, first principles simulations, molecular dynamics »
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Articles de revues sur le sujet "Phase change materials, phase change memories, first principles simulations, molecular dynamics"
Bernasconi, M. « Atomistic Simulations of Phase Change Materials for Electronic Memories ». International Journal of Nanoscience 18, no 03n04 (2 avril 2019) : 1940082. http://dx.doi.org/10.1142/s0219581x19400829.
Texte intégralWang, Jiong, Dongyu Cui, Yi Kong et Luming Shen. « Unusual Force Constants Guided Distortion-Triggered Loss of Long-Range Order in Phase Change Materials ». Materials 14, no 13 (24 juin 2021) : 3514. http://dx.doi.org/10.3390/ma14133514.
Texte intégralNoé, Pierre, Anthonin Verdy, Francesco d’Acapito, Jean-Baptiste Dory, Mathieu Bernard, Gabriele Navarro, Jean-Baptiste Jager, Jérôme Gaudin et Jean-Yves Raty. « Toward ultimate nonvolatile resistive memories : The mechanism behind ovonic threshold switching revealed ». Science Advances 6, no 9 (février 2020) : eaay2830. http://dx.doi.org/10.1126/sciadv.aay2830.
Texte intégralKojima, Takashi, et Masataka Koishi. « Mechanisms of Mechanical Behavior of Filled Rubber by Coarse-Grained Molecular Dynamics Simulations ». Tire Science and Technology 48, no 2 (7 janvier 2020) : 78–106. http://dx.doi.org/10.2346/tire.20.160117.
Texte intégralDel Tatto, Vittorio, Paolo Raiteri, Mattia Bernetti et Giovanni Bussi. « Molecular Dynamics of Solids at Constant Pressure and Stress Using Anisotropic Stochastic Cell Rescaling ». Applied Sciences 12, no 3 (21 janvier 2022) : 1139. http://dx.doi.org/10.3390/app12031139.
Texte intégralCui, Xiandai, Xiaomin Cheng, Hong Xu, Bei Li et Jiaoqun Zhu. « Enhancement of thermophysical coefficients in nanofluids : A simulation study ». International Journal of Modern Physics B 34, no 25 (15 septembre 2020) : 2050222. http://dx.doi.org/10.1142/s0217979220502227.
Texte intégralWei, Benxiang, Joseph M. Flitcroft et Jonathan M. Skelton. « Structural Dynamics, Phonon Spectra and Thermal Transport in the Silicon Clathrates ». Molecules 27, no 19 (29 septembre 2022) : 6431. http://dx.doi.org/10.3390/molecules27196431.
Texte intégralSun, Liang, Yu-Xing Zhou, Xu-Dong Wang, Yu-Han Chen, Volker L. Deringer, Riccardo Mazzarello et Wei Zhang. « Ab initio molecular dynamics and materials design for embedded phase-change memory ». npj Computational Materials 7, no 1 (8 février 2021). http://dx.doi.org/10.1038/s41524-021-00496-7.
Texte intégralKohary, K., V. M. Burlakov, D. Nguyen-Manh et D. G. Pettifor. « Modeling InSe Phase-change Materials ». MRS Proceedings 803 (2003). http://dx.doi.org/10.1557/proc-803-hh3.7.
Texte intégralMicoulaut, M., W. Wełnic et M. Wuttig. « Structure of the liquid and the crystal of the phase-change materialSnSe2 : First-principles molecular dynamics ». Physical Review B 78, no 22 (31 décembre 2008). http://dx.doi.org/10.1103/physrevb.78.224209.
Texte intégralThèses sur le sujet "Phase change materials, phase change memories, first principles simulations, molecular dynamics"
GABARDI, SILVIA. « First principles simulations of phase change materials for data storage ». Doctoral thesis, Università degli Studi di Milano-Bicocca, 2015. http://hdl.handle.net/10281/76292.
Texte intégralPhase change materials based on chalcogenide alloys are of great technological importance because of their use in optical data storage devices (DVDs) and electronic non-volatile memories of new concept, the Phase Change Memory cell (PCM). These applications rely on a fast (50 ns) and reversible change between the crystalline and the amorphous phases upon heating. The two phases correspond to the two states of the memory that can be discriminated thanks to a large difference in their optical and electronic properties. Although Ge2Sb2Te5 (GST) is the compound presently used as active layer in PCMs, alternative materials with a higher crystallization temperature are under scrutiny in order to increase the thermal stability of the PCM devices. In this respect, we analysed, by means of ab-initio molecular dynamics simulations, different high crystallization temperature alloys with composition In3Sb1Te2, In13Sb11Te3 and Ga4Sb6Te3, which have been experimentally proposed as substitute of GST. However, the structural properties and the microscopical reason of the high thermal stability of the amorphous phases of these compounds is still unclear. We, thus, generated models of the amorphous phase of few hundreds of atoms by quenching from the melt in few hundreds of ps aiming at finding out a relation between the structural properties of the amorphous phase and the high crystallization temperature of these alloys. The topology of our amorphous models turned out to be mostly tetrahedral which differs from the octahedral-like geometry of the crystalline phases. The presence of tetrahedral structures in the amorphous which are absent in the crystalline phase, probably hinders the crystallization process resulting in a higher crystallization temperature with respect to GST which display a mostly octahedral-like structures in both amorphous and the crystalline phase. In the second part of this work we addressed the issue of the resistance drift phenomenon, which consists of an increase of the electrical resistance of the amorphous phase with time. This effect is detrimental in PCMs since it changes the electrical characteristics of the devices. This process is believed to be due to an aging of the amorphous phase which modifies during time the defect states in the proximity of the valence and conduction band edges which control the electrical conductivity. The microscopic origin of the structural relaxations leading to the drift is still unknown. To address this problem, we generated large models (about two thousand atoms) of amorphous GeTe by quenching from the melt in 100 ps with classical molecular dynamics simulations by using a neural-network potential. Once relaxed by first principles, the models showed the presence of several in-gap states localized on chains of Ge atoms. After an annealing at 500 K, performed to accelerate the drift process, Ge chains and homopolar Ge-Ge bonds reduce in number resulting in a band gap widening and a reduction of the Urbach tails at the band edges which can account for the increase of the resistance. We thus propose that the resistance drift originates from structural relaxations leading to the removal of Ge chains.