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Littérature scientifique sur le sujet « Mask-off »

Auteur : Grafiati

Publié le 9 mars 2023

Mis à jour le 10 mars 2023

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Articles de revues sur le sujet "Mask-off"

UFEMA, JOY. « Taking the mask off ». Nursing 35, n^o 2 (février 2005) : 66–67. http://dx.doi.org/10.1097/00152193-200502000-00045.

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Fo, Dario. « Hands off the Mask ! » New Theatre Quarterly 5, n^o 19 (août 1989) : 207–9. http://dx.doi.org/10.1017/s0266464x00003274.

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Dario Fo needs no introduction, though he is less well known for his work as a critical theorist of theatre than in his role as a playwright. The original Theatre Quarterly was the first journal to publish his critical writing in English, and two of his more recent essays-‘Theatre of Situation’ and ‘Retrieving the Past. Exposing the Present’ - appeared in one of the earliest issues of New Theatre Quarterly. NTQ2 (1985). Here, we are pleased to publish Fo's brief but stimulating study of the conventions and the ‘language’ of theatrical masks, in which he outlines typologies stretching from Ancient Greece to commedia and beyond, and suggests some of the distinctive requirements for the contemporary actor of performing in mask. The translation is by Gail Macdonald.

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Vogel, Lauren. « Vaccinate or mask pays off ». Canadian Medical Association Journal 187, n^o 1 (8 décembre 2014) : 19. http://dx.doi.org/10.1503/cmaj.109-4959.

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Sembiring, Bunga Mari. « FORMULASI SEDIAAN MASKER GEL Peel-off EKSTRAK DAUN KECOMBRANG (Etlingera elatior) SEBAGAI PERAWATAN PADA KULIT WAJAH ». Jurnal Penelitian Farmasi & ; Herbal 3, n^o 2 (30 avril 2021) : 29–34. http://dx.doi.org/10.36656/jpfh.v3i2.656.

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Kecombrang (Etlingera elatior) leaves contain flavonoid compounds, saponins, alkoloid, and tannins. Based on the compounds owned kecombrang leaves can be used as a peel off gel mask. The purpose of this study was to make a peel off gel mask formulation of kecombrang (Etlingera elatior) leaf extract as a treatment for facial skin. The gel peel off mask formulation was made with 4 formulations, F0 = 0%, FI = 10%, FII = 15%, FIII = 20%. Extraction method is done using maceration method with 96% ethanol solvent. Evaluation of peel off gel mask preparations, including organoleptic tests (color, odor, shape), pH measurement of preparations, homogeneity test, dry time test, spreadability test. Peel off gel mask preparations that have effectiveness as treatments for facial skin are FIII formulations with a concentration of 15% that meet the evaluation test requirements, and positive control (Naturgo) which has had better effectiveness test results. The results of the evaluation test of peel off gel mask preparation, including organoleptic test (color, odor, shape), pH measurement of the preparation, homogeneity test, dry time test, dispersion test according to the gel preparation parameters.

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Khairunnisa, Amalia, Pratika Viogenta, Nani Kartinah, Fathur Rahman et Mulia Mulia. « Peel-off Kefir Mask Arachi (Arachis hypogaea L.) : Characterization and Antioxidant Activity ». Borneo Journal of Pharmacy 5, n^o 1 (28 février 2022) : 42–47. http://dx.doi.org/10.33084/bjop.v5i1.2597.

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This study aims to determine the best formulation for the peel-off mask Arachi or peanut (Arachis hypogaea L). Arachis hypogaea kefir as an active ingredient is added with variations in the concentration of F1 (0.5%) and F2 (2%) (w/v). Organoleptic tests, homogeneity, dry time, and pH were carried out on the peel-off mask that had been made. Antioxidant test (DPPH methods) was performed on masks F1 and F2. The results showed that the peel-off mask of A. hypogaea kefir had the best antioxidant activity at a concentration of 2% (F2) kefir with an IC50 value of 1.865 ppm and was very active. The characteristics of the peel-off mask have good physical stability, proven by not experiencing a change in color, odor, being homogeneous, having good dispersion power, and having a dry time ranging from 10-23 minutes. The pH value of the peel-off mask preparation is 4.52, and it is appropriate with SNI and the pH balance of normal human skin. The peel-off mask of A. hypogaea kefir can be produced because has good physical stability and antioxidant activity.

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Agustien, Gina Septiani, Nitya Nurul Fadilah et Dina Fitri Nusyifa. « UJI STABILITAS FISIK SEDIAAN MASKER GEL PEEL-OFF EKSTRAK ETANOL DAUN KENITU (Chrysophyllum cainito L.) ». Jurnal Insan Farmasi Indonesia 5, n^o 2 (31 décembre 2022) : 210–18. http://dx.doi.org/10.36387/jifi.v5i2.1064.

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Kenitu leaves contain flavonoids which function as antioxidants that can counteract the bad effects of free radicals, the antioxidant effect will be better if formulated in topical dosage forms. One of the topical dosage forms for use on the face is a peel-off gel mask, its use is easy to remove like an elastic membrane. This study aims to determine the physical stability of the peel-off gel mask preparation of kenitu leaves ethanol extract. The research method was experimental by making three peel-off gel mask formulations based on variations in extract concentration, namely F1 (2%), F2 (4%) and F3 (8%). Evaluations were carried out on the physical stability of the preparation, including organoleptic observations, homogeneity, pH, adhesion, dispersibility, drying time of the preparation, and viscosity. The results showed that the physical stability test of the peel-off gel mask preparation of kenitu leaves ethanol extract could be formulated in the form of a peel-off gel mask preparation, and the best mask formula was F1 with an extract concentration of 2%.

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Bradley, Louise. « In All Candour : Taking Off the Mask ». World Social Psychiatry 2, n^o 3 (2020) : 184. http://dx.doi.org/10.4103/wsp.wsp_8_20.

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Istvan, Marion, Edouard‐Jules Laforgue, Marylène Guerlais, Pascale Jolliet et Caroline Victorri‐Vigneau. « ZORRO : When the mask falls off—Comment ». British Journal of Clinical Pharmacology 88, n^o 5 (5 octobre 2021) : 2450–51. http://dx.doi.org/10.1111/bcp.15086.

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Annisa, Annisa, Andi Tenri Kawareng et Niken Indriyanti. « Formulasi Sediaan Masker Gel Peel Off dari Minyak Atsiri Sereh (Cymbopogon citratus) ». Proceeding of Mulawarman Pharmaceuticals Conferences 14 (31 décembre 2021) : 348–53. http://dx.doi.org/10.25026/mpc.v14i1.599.

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Lemongrass (Cymbopogon citratus) is one of the essential oil producing plants known as Lemongrass oil with the main content of citral compounds. Lemongrass essential oil is known to have antioxidant activity. The antioxidant activity of lemongrass oil can be used for skin care in the form of a peel off gel mask. The purpose of this study was to formulate a peel off gel mask preparation from lemongrass essential oil (Cymbopogon citratus) and to know the results of the physical evaluation of the peel off gel mask. The peel off gel mask was made in three formulas with different concentrations of PVA, namely F1 (10%), F2 (13%), and F3 (16%). Physical evaluation tests include organoleptic tests, homogeneity, viscosity, pH, dispersion, and drying time. The peel off gel mask in the three formulas was obtained in the form of a thick gel, white in color, and had a characteristic lemongrass smell. The results obtained based on the physical evaluation showed that the three formulas had met the required standard parameters.

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Cahya, Cucu Arum Dwi, Aminah Syarifuddin et Ahmad Syukur Syukur. « EFEKTIFITAS EKSTRAK ETANOL DAUN SAWI HIJAU (Brassica rapa Var. Parachinensis) SEBAGAI PELEMBAB KULIT DENGAN SEDIAAN MASKER PEEL-OFF ». JURNAL FARMASIMED (JFM) 2, n^o 1 (31 octobre 2019) : 6–15. http://dx.doi.org/10.35451/jfm.v2i1.292.

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Green mustard plants can be formulater into peel-off masks to moisturize the skin, because based on previous research green mustard leaves cointain flavonoids as antioxidants which can moisturize the skin. The purpose of this study was to find out green mustard leaves can be formulated into peel-off mask preparations and to find out the preparation and to find out the preparation off peel off mask with etanol extract of green mustard leaves can moisturize the skin. This study uses an experimental method. Green mustard leaves are extracted by maceration. In this study, a skin analyzer was usee as a mesure of skin moisture level after using peel off mask from a variety of dosage formulations which were divided into 5 preparations, blank (without mask, 3%,4%,5%), postive control (using peel off masks on the market). The Anova test results show a sig value of 0,000 or p<0,005 so it is concluded that the variabel has a difference. The conclusion of this study proves that the ethanol extract of green mustard leaves can be used as a peel-off mask for skin moisturizer, where the higher the concentration of mustard leaf extract, the higher the moisture vlue of the skin.

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Thèses sur le sujet "Mask-off"

Bahlke, Matthias Erhard. « A novel sublimable mask lift-off method for patterning thin films ». Thesis, Massachusetts Institute of Technology, 2011. http://hdl.handle.net/1721.1/65325.

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Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2011.
Cataloged from PDF version of thesis.
Includes bibliographical references (p. 39-42).
Photolithography's accuracy and scalability has made it the method for sub-micron-scale definition of single-crystal semiconductor devices for over half a century. Unfortunately, organic semiconductor devices are chemically incompatible with the types of resists, solvents, and etchants traditionally used. This work investigates the use of a chemically inert resist that relies on phase changes for lift-off patterning thin films of organic semiconductors and metals.
by Matthias Erhard Bahlke.
S.M.

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Yaacoub, Hala K. « ‘Take off your mask’ : professional identities and professional development of part-time instructors ». Thesis, University of Leicester, 2009. http://hdl.handle.net/2381/4377.

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Questions of identity have been mostly related to war and internal clashes among different sects and parties during a major part of Lebanon’s contemporary history. People were often killed and tortured because of their presumed identities. For more peaceful and educational purposes, this study investigates the professional identities of part-time instructors at one Lebanese HE institution. Three key related questions are addressed. A major question has to do with investigating the professional identities of these instructors, another question deals with what it means to be a part-time instructor and a third with the professional development practices of these part-timers. The two latter objectives have a high impact in crafting the first. A case study was carried out at the American Oriental University (AOU) were 26 part-timers and three full-timers (ex-part-timers) were interviewed. To triangulate the data, four of the participants were asked to participate in diary writing. In addition, document checking was carried out. The part-timers were chosen to represent the wider population of part-timers at the University. Thus, they were chosen to illustrate particular factors characterising part-timers, such as gender, seniority, educational standing, number of work sites and type of part-time choice. Thematic and discourse analysis were used to analyse the data and investigate the different models of those part-timers’ professional identities. Analysis revealed that each part-timer’s professional identity is unique and exists on a continuum ranging from highly democratic to highly managerial. The former is characterised by being democratic, collaborative and based on trust, while the latter is individualistic, competitive and externally-regulated (Day and Sachs, 2004). The neo-liberal forces prevailing in the current educational arena, however, rendered these identities more inclined towards the managerial end (Apple, 2003). Each identity was rendered unique on the continuum not only because of multiplicity of forces impacting it, but rather because of the different sources and intensities of these forces, and thus their unorthodox effects.

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CHATTERJEE, TANAYA. « It’s all about the Eyes : A multi-level investigation into the effects of gaze ». Doctoral thesis, Università degli Studi di Milano-Bicocca, 2022. http://hdl.handle.net/10281/379112.

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I nostri tre studi ci forniscono un progresso nella conoscenza dei diversi meccanismi in gioco nella percezione della direzione dello sguardo, nel comportamento di seguire lo sguardo e nell'attenzione congiunta, sia a livello comportamentale che neurofisiologico. In particolare, la presente tesi porta prove dell'interazione e del corso temporale dei meccanismi cognitivi e neurali (processi bottom-up e top-down) che vengono reclutati quando si vede lo sguardo di altre persone. Questo equilibrio è possibilmente mantenuto al fine di prendere giustamente in considerazione o ignorare le informazioni provenienti dagli occhi di un'altra persona a seconda dei nostri obiettivi, dell'intenzione e del comportamento corrente.
our three studies provide us with an advance in knowledge on the different mechanisms at play in the perception of gaze direction, gaze following behavior and joint attention, both at the behavioral and neurophysiological level. Specifically, the present thesis brings evidence of the interplay and time course of the cognitive and neural mechanisms (bottom-up and top-down processes) that are recruited when seeing other people’s gaze. This balance is possibly maintained in order to justifiably take into account or disregard information coming from another person’s eyes depending upon our goals, intention and current behavior.

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Vieira, Rafael Pinto. « Desenvolvimento e estudo de eficácia clínica por métodos instrumentais de bases de uso tópico contendo extrato de soja fermentado ». Universidade de São Paulo, 2008. http://www.teses.usp.br/teses/disponiveis/9/9139/tde-18022009-094300/.

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Máscaras faciais são preparações cosméticas utilizadas desde a Antigüidade e, atualmente, têm seu uso difundido em função de suas características multifuncionais. Dentre os efeitos atribuídos a estas preparações, temos: limpeza profunda; ações tonificante, adstringente, hidratante e tensora na pele e sensação de bem-estar. Podem ser classificadas conforme sua aplicação, componentes ou grau de risco. As máscaras peel off à base de álcool polivinílico são formulações que, após a aplicação e secagem, formam um filme oclusivo sobre a face e, após sua remoção, conferem maciez, limpeza e ação tensora à pele, retirando células mortas do estrato córneo, resíduos e outros materiais depositados. O extrato de soja obtido pela fermentação do leite de soja pelo Bifidobacterium animale possui açúcares, aminoácidos, peptídeos, proteínas e alto teor de isoflavonas na forma livre, quando comparado ao leite não fermentado. Seu uso em formulações cosméticas visa combater os efeitos do envelhecimento cutâneo, propiciando hidratação, efeito tensor e emoliência à pele. Bases cosméticas de máscaras faciais peel off e emulsão óleo em água, acrescidas ou não de extrato de soja fermentado 5% p/p foram avaliadas em estudos de estabilidade física e físico-química em diversas condições de temperatura e períodos de avaliação, visando obter as de melhor desempenho para estudos clínicos. Os resultados indicaram que as preparações aditivadas com o extrato mantiveram-se estáveis quanto às suas características nos testes de estabilidade, não apresentando variações significativas. As preparações foram submetidas aos estudos clínicos em voluntários com o objetivo de avaliar seus efeitos tensor, na hidratação e na perda de água transepidérmica. Os resultados comprovaram que, em um estudo cinético, a base cosmética de máscara facial peel off , contendo ou não o extrato de soja fermentado, não apresentou diferença estatisticamente significativa para as formulações de emulsão quantos à promoção de elasticidade e firmeza à pele e diminuição da perda de água transepidérmica, mas promoveu maior hidratação das camadas superficiais da pele que as preparações de emulsão óleo em água.
Facial masks are used since antiquity and, currently, its use has spread according to their multifunctional characteristics. Among the effects attributed to these preparations there are deep cleaning; invigorating, stringent, moisturizing and tensor actions and well-being sense. They can be classified according to their application, components or risk degree. Peel off facial masks based on polyvinyl alcohol are formulations that form a film on the face after application and drying. After their removal, they cause tenderness, cleaning and tensor action on the skin, removing dead cells of the stratum corneum other materials deposited. Soybean extract obtained from soymilk fermentation by Bifidobacterium animale has sugars, amino acids, peptides, proteins and high levels of free isoflavones, when compared to nonfermented milk. Its use in cosmetic formulations aims to avoid aging effects on skin, providing moisturizing, softness and tensor effect. Peel off facial masks and emulsions oil in water preparations, containing or not fermented soymilk 5% w/w were evaluated in physical and physical-chemistry stability studies in various temperature and time conditions, targeting the best formulations for clinical tests. Results indicated that preparations containing extract remained stable about their characteristics, showed no significant variations. Preparations were submitted to clinical studies in volunteers to evaluate tensor, moisturizing and transepidermal water loss effects. In a short-term study, results confirmed that peel off facial masks formulations, containing or not soybean fermented extract, showed no statistically significant difference in comparison to emulsion formulations on elasticity and firmness promotion and decreasing on transepidermal water loss. However, peel off facial masks provided greater hydration on skin surface layers than the oil in water emulsion preparations.

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ROBERTO, Nicoletta. « Satellite analysis of cloud characteristics at different temporal and spatial scales using visible and infrared wavelengths ». Doctoral thesis, Università degli studi di Ferrara, 2010. http://hdl.handle.net/11392/2389320.

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Clouds play a complex role in the earth systems at different temporal and spatial scales interacting with other components of the systems through a wide range of physical processes. In particular they affect the energetic balance as regulators of the atmospheric radiative fluxes and source/sink of latent heat. Moreover, they take part in the hydrological cycle storing water and producing precipitation. Finally, they are a meteorological phenomenon at local scale that impacts on the ground in different ways. Although this relevant role, a satisfactory level of knowledge of the mechanisms taking place inside clouds has not yet reached, and the cloud parameterisation is still a major source of uncertainties in climatic models. During last decades observations from space have been made possible more detailed studies of cloud structure, increasing the cloud knowledge in order to improve the meteorological forecast and to evaluate the role of clouds in the climate systems. The activity of this PhD has been devoted to set up a set of tools using satellite data to study the main characteristics of cloud systems at different spatial and temporal scales. In this work new retrieval algorithms to estimate cloud characteristics are presented. In order to analyse cloud systems that develop at different spatial and temporal scales two sets of clouds parameters at two different resolutions are drawn. At first, a set of high resolution cloud parameters (cloud mask, cloud optical thickness, cloud particles effective radius and cloud top temperature) have been estimated from data by Spinning Enhanced Visible and Infrared Imager (SEVIRI) on board Meteosat 8-9 at 3-5 km of spatial resolution and 15 minutes of temporal resolution. A cloud mask algorithm for SEVIRI has been developed taking advantage from its high temporal resolution using the temperature rate of change as measured at 10.8 mm. The comparison of this product to MODerate resolution Imaging Spectroradiometer cloud mask has shown a good agreement. Moreover, cloud optical thickness (t), and effective radius (re) are retrieved using SEVIRI data and simulations of radiative transfer by the model Santa Barbara Disort Atmospheric Radiative Transfer. The retrieval algorithm is based on the matching of measured reflectance by sensor with entries in look-up tables of simulated reflection functions generated by different t and re combinations. An application of high resolution parameters (t, re and cloud top temperature) has been following the temporal development of convective systems highlighting the convective life stages from satellite point of view. We have found that the cloud microphysical structure evolves in agreement with the conceptual model developed primarily by radar observations. In the last part of the work an analysis of wide scale cloud systems at synoptic/sub-synoptic scale has been carried out by using cloud parameter at lower temporal and spatial resolution (3 hours and 30 km) derived by International Satellite Cloud Climatology Project (ISCCP) database. The main characteristics of the cloud covers associated to Cut-off Low (COL) systems detected from 1992 to 2001 during the warm seasons in European/Mediterranean areas have been described. It has been found that the cloudiness size is related to the vertical structure of the COL: large size mostly characterize those systems that show a corresponding depression at the ground, small size or no cloudiness characterize systems dynamically confined to upper tropospheric levels. Moreover, the NAO index differently affects the cloud cover associated to COLs that develop in Mediterranean area from those that develop in Atlantic area.

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Tseng, Jin-chi, et 曾金池. « Study on the Optimization Simulation and Application of Annular Off-Axis Illumination and Attenuated Phase Shift Mask ». Thesis, 1995. http://ndltd.ncl.edu.tw/handle/85104331387172750793.

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碩士
國立交通大學
應用化學系
83
Off-Axis Illumination (OAI) has several merits when applied to microlithography. The most important merit is that depth of focus could be largely improved while conventional i-line process remain unchanged. Next, the application of OAI is quite easy, the simplest way to apply OAI is the adding of an aperture stop in stepper. The disadvantage of OAI is that the improvement is dependent of pattern orientation from types of quadrupole, dipole and slit. The homogeneity of illumination beam also needed to be improved. Annular OAI is not the best OAI for the improvement of resolution and depth of focus, however, annular OAI is independent of pattern orientation, therefore, its applicability to production line is higher than others. In this thesis, the Taguchi Genichi methodology of experimental design has been applied by using L9 and L18 orthogonal array to study the effects of optical parameters on the processes for 0.35 um linewidth patterns. Simulation study found out that NA 0.5, outer ring sigma equivalent 0.70 in annular OAI, inner ring sigma equivalent 0.35 in annular OAI and negative mask bias 0.03 um are the optimum design for 0.35 um dense line/space. The depth of focus improved by about 0.4 um. Faced with many variances in lithographic processes, the optimization of related factors for varied processes is the key issue. Simulation combined with Taguchi method could study such many variances economically and significantly.

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Chih-hung, Lin, et 林志鴻. « Study of Embedded Materials of Attenuated Phase-Shifting Mask and Simulation of Imaging by Dipole Off-Axis Illumination ». Thesis, 2004. http://ndltd.ncl.edu.tw/handle/52237924768457294660.

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碩士
國立交通大學
應用化學系所
92
Embedded attenuated phase-shifting mask (EAPSM) and off-axis illumination (OAI) are most popular resolution enhancement techniques (RETs). Hence, we do some research to these two techniques in this paper. The points of the first part are optical properties of materials of embedded layer for 193 nm (ArF) & 248 nm (KrF) lithography. And the second part is the simulation of application of attenuated phase-shifting mask with off-axis illumination. No matter what kind of method we use to deposit thin film, it can’t be completely smooth. And the rough surface of thin film will cause the scattering light. Hence, when we use UV/VIS spectrometer to do metrology of reflectance (R) and transmittance (T) will get smaller results than the true values. The error will get larger when roughness gets larger. So, it is necessary to modify the metrology values of R and T by roughness as a modification factor. When we use the modified results to the R-T method, the resulting refraction (n) and extinction coefficient (k) are close to the metrology results of Variable Angle Spectroscopic Ellipsometer (VASE), and better than n&k analyzer. Also, the cost is cheaper, so that the modified R-T method is very useful in getting n & k. In the simulation part, the software we use is KLA-Tencor’s Prolith v. 8.0. By choosing proper parameters, we study the side lobe, aerial image and resist profile in dipole illumination. By different space width, we can get different distance between space and side lobe. And we try to derive a formula. By adding two modification factors of numerical aperture (NA) and distance between the two illumination holes, the calculation results are very close to the true values, According to the simulation results, the side lobe in vertical orientation is much smaller than parallel orientation in dipole illumination, so it has a smaller effect to lithography process. In dipole illumination, the vertical orientation is off-axis illumination and the parallel orientation is like in-axis illumination. So we can get larger depth of focus (DOF) in vertical orientation. We also can see deeper resist profile in vertical orientation than parallel orientation with the same develop condition. If we adjust the develop condition to make the same space width, we can see significant side lobe in resist profile with parallel orientation. Otherwise, we found the s-polarized light has better interference. With vertical dipole illumination, we can get better image quality. And the unpolarized light has a middle quality, the p-polarized is worst. We also discuss the variation of aerial image contrast for s-polarized, unpolarized and p-polarized light with different NA, pole-distance (σcenter), pole radius (σradius), space width and line width. For future immersion lithography and higher NA lens, the s-polarized light will become more important.

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Lu, Yi-Fen, et 呂怡芬. « Take off the Mask : narrate the change of the novice teacher who shuttle to dance classes and ordinary classes ». Thesis, 2010. http://ndltd.ncl.edu.tw/handle/82453276668630343096.

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碩士
國立中央大學
學習與教學研究所
98
To be a teacher has been the dream of my life, it’s the dream that I am living now and it’s the dream that I have had since I was just a little girl. During my university life I forged my mind and my will; I was very optimistic and energetic, I was complete and happy, but unfortunately when my dream of becoming a teacher came true I had to learn the hard way that life is not that simple, I was frustrated and I started to lose confidence on what I was doing and why I was doing it. It was a hard process that had many ups and downs, but it was a process that helped me become a more mature person who already knows what to be a teacher really means. In this Thesis, I would like to share the experience about a freshman changing during the first five years of her educational and professional life.

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Lin, Ren-Jang, et 林仁章. « Study on the Optimization of Optical Proximity Correction Applied to Attenuated Phase-Shifting Mask with Annular off-Axis Illumination and Conventiona Illumination ». Thesis, 1996. http://ndltd.ncl.edu.tw/handle/78440596484266114153.

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碩士
國立交通大學
應用化學研究所
84
In i-line (365 nm) lithographic processes, denser and also narrower linewidth will generate serious proximity effect, decrease depth of focus (DOF) and resolution. It is not easy to have a resolution better than 0.35 μm and a DOF greater than 1.25 μm while still meet the design rules for all different patterns. The apphcation of phase-shifting Mask (PSM) and off-axis illurmnation (OAI) could increase both DOF and resolution, besides, optical proximity correction (OPC) on mask would also improve DOF and resolution. L9 and L18 orthogonal arrays of Taguchi method have been applied to the 0.35 μm processes to study the effects of optical parameters and OPC. Under the combination of attenuated PSM and annular OAI, the OPC by assisted line/space (L/S) resulted in the larger exposure latitude (EL), in which dense L/S increased ~11%, isolated line (IL) ~5%, isolated space (IS) ~1%. For improvement of DOF, dense US increased ~6.7%, IL ~3.4%, IS ~4.5 %. Under the combination of attenuated PSM and conventional illmnmation, regarding the exposure latitude (EL), dense L/S increased ~8%, IL ~6%, IS ~2%. regarding improvement of DOF, dense L/S increased ~1.1%, IL~2.8 %, IS~2.8 %. OPC by pattern bias indicated that only EL of dense L/S could be improved. EL increased ~5%. Pattern bias did not show improvement to both IL and IS. DOF was improved only slightly. The comparisons between assisted L/S and pattern bias indicated that assisted L/S is better method for OPC. Due to the demanding of narrower linewidth, the process parameters keep increasing. The optimization of related process parameters is the key issue for the success of lithography. Simulation combined with Taguchi method could study and analyze these parameters economically and integrately.

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Hu, Guo-Xin, et 胡國信. « The Study and Simulation of the Contact-Hole Pattern Phase Shifting Mask with the Benefit of Lens Pupil Filters by Off-Axis Illumination ». Thesis, 2006. http://ndltd.ncl.edu.tw/handle/68769404978831314636.

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Livres sur le sujet "Mask-off"

Thomasius, Christian. Larva legis aquiliae : The mask of the lex aquilia torn off : the action for damage done : a legal treatise. Oxford : Hart Pub., 2000.

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Bey, Tiano. Mask on, Mask Off ? Lulu Press, Inc., 2021.

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Clemes, Daryl. Mask Off. BookBaby, 2020.

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Lee, Crystal. Mask Off. Independently Published, 2019.

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Mask Off. Independently Published, 2021.

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R, Smith. Mask Off. CreateSpace Independent Publishing Platform, 2016.

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Joy, Jess, et Charlotte Mia. Taking off the Mask. HarperCollins Publishers Limited, 2023.

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Thomas, Erica. Takin' off the MASK. Divine Publications LLC, 2022.

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Washington, Teri. Take off the Mask. Third Dimension Publishing, 2003.

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Carr, Krystal. Bare Witness : Mask Off. MTE Publishing, 2019.

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Plus de sources

Chapitres de livres sur le sujet "Mask-off"

Joaquin, M. Ernita, et Thomas J. Greitens. « The Mask Is Off ». Dans American Administrative Capacity, 15–40. Cham : Springer International Publishing, 2021. http://dx.doi.org/10.1007/978-3-030-80564-7_2.

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Hastuti, Rini Tri, et Regia Desty Rakhmayanti. « Antioxidant Activity of Peel Off Mask Preparation with Green Apple (Malus domesticus) Juice and Ultrasonic Extraction ». Dans Proceedings of the First International Conference on Medical Technology (ICoMTech 2021), 3–10. Dordrecht : Atlantis Press International BV, 2022. http://dx.doi.org/10.2991/978-94-6463-018-3_2.

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« Front Matter ». Dans Mask Off, i—iv. Pluto Press, 2019. http://dx.doi.org/10.2307/j.ctvpbnnkh.1.

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« See you at the crossroads : ». Dans Mask Off, 72–85. Pluto Press, 2019. http://dx.doi.org/10.2307/j.ctvpbnnkh.10.

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« It goes down in the DM’s : ». Dans Mask Off, 86–95. Pluto Press, 2019. http://dx.doi.org/10.2307/j.ctvpbnnkh.11.

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« Slamdunk the funk : ». Dans Mask Off, 96–107. Pluto Press, 2019. http://dx.doi.org/10.2307/j.ctvpbnnkh.12.

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« Conclusion : ». Dans Mask Off, 108–18. Pluto Press, 2019. http://dx.doi.org/10.2307/j.ctvpbnnkh.13.

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« Resources ». Dans Mask Off, 119–22. Pluto Press, 2019. http://dx.doi.org/10.2307/j.ctvpbnnkh.14.

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« Table of Contents ». Dans Mask Off, v. Pluto Press, 2019. http://dx.doi.org/10.2307/j.ctvpbnnkh.2.

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« Acknowledgements ». Dans Mask Off, vi. Pluto Press, 2019. http://dx.doi.org/10.2307/j.ctvpbnnkh.3.

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Actes de conférences sur le sujet "Mask-off"

Nenyei, Z., J. Niess, W. Lerch, W. Dietl, P. J. Timans et P. Pichler. « Pattern Effects with the Mask off... » Dans 2006 14th International Conference on Advanced Thermal Processing of Semiconductors. IEEE, 2006. http://dx.doi.org/10.1109/rtp.2006.367998.

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Beyer, Dirk, Richard J. F. van Haren, Steffen Steinert, Christian Roelofs, Orion Mouraille, Koen D’havé et Leon van Dijk. « Off-line mask-to-mask registration characterization as enabler for computational overlay ». Dans Photomask Technology, sous la direction de Emily E. Gallagher et Peter D. Buck. SPIE, 2017. http://dx.doi.org/10.1117/12.2280635.

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Kim, Byung-Gook, Sung Soo Suh, Byung-Sung Kim, Sang-Gyun Woo, Han-Ku Cho, Vikram Tolani, Grace Dai et al. « Trade-off between inverse lithography mask complexity and lithographic performance ». Dans Photomask and NGL Mask Technology XVI, sous la direction de Kunihiro Hosono. SPIE, 2009. http://dx.doi.org/10.1117/12.824299.

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Zhang, Hongbo, Qiliang Yan, Lin Zhang, Ebo Croffie, Peter Brooker, Qian Ren et Yongfa Fan. « Efficient full-chip mask 3D model for off-axis illumination ». Dans SPIE Photomask Technology, sous la direction de Thomas B. Faure et Paul W. Ackmann. SPIE, 2013. http://dx.doi.org/10.1117/12.2026650.

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Croffie, Ebo H., Kunal N. Taravade, Neal Callan, Keuntaek Park et Gregory P. Hughes. « Analysis of off-axis-illumination-based phase-edge/chromeless mask technologies ». Dans Microlithography 2004, sous la direction de Bruce W. Smith. SPIE, 2004. http://dx.doi.org/10.1117/12.536172.

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Oh, Hye-Keun, Jung-Woung Goo, Sug-Soon Yim, Tak-Hyun Yoon, Seung-Wook Park, Byoung Sub Nam, Hoyoung Kang, Cheol-Hong Kim et Woo-Sung Han. « Exposure of a halftone mask by conventional and off-axis illumination ». Dans SPIE's 1994 Symposium on Microlithography, sous la direction de Timothy A. Brunner. SPIE, 1994. http://dx.doi.org/10.1117/12.175421.

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Zhao, Yajie, Qingguo Xu, Weikai Chen, Chao Du, Jun Xing, Xinyu Huang et Ruigang Yang. « Mask-off : Synthesizing Face Images in the Presence of Head-mounted Displays ». Dans 2019 IEEE Conference on Virtual Reality and 3D User Interfaces (VR). IEEE, 2019. http://dx.doi.org/10.1109/vr.2019.8797925.

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Kim, Young-Seok, Seok Ho Song, Jong Ung Lee, Sung Hyun Oh, Yong Kyoo Choi, Munsik Kim, Beom-Hoan O, Se-Geun Park, El-Hang Lee et Seung Gol Lee. « Design of pattern-specific mask grating for giving the effect of an off-axis illumination ». Dans 24th European Mask and Lithography Conference. SPIE, 2008. http://dx.doi.org/10.1117/12.798809.

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Kim, Hyoungjoon, Jongwook Kye, Dae-Yup Lee, Sang-Gyun Woo, Hoyoung Kang et Young-Bum Koh. « Fabrication of dense contact patterns using halftone phase-shifting mask with off-axis illumination ». Dans Symposium on Photomask and X-Ray Mask Technology, sous la direction de Hideo Yoshihara. SPIE, 1996. http://dx.doi.org/10.1117/12.245224.

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Cheng, Lin, Peng-fei Cao, Jia Liu et Xiao-ping Zhang. « Near-field diffraction simulation on three-dimensional mask model with off-axis illumination ». Dans 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies : Design, Manufacturing, and Testing of Micro- and Nano-Optical devices and Systems, sous la direction de Sen Han, Masaomi Kameyama et Xiangang Luo. SPIE, 2009. http://dx.doi.org/10.1117/12.832103.

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