Littérature scientifique sur le sujet « Fragile structure cleaning »
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Articles de revues sur le sujet "Fragile structure cleaning"
Akanishi, Yuya, Quoc Toan Le et Efrain Altamirano Sánchez. « Removal of Post Etch Residue on BEOL Low-K with Nanolift ». Solid State Phenomena 314 (février 2021) : 277–81. http://dx.doi.org/10.4028/www.scientific.net/ssp.314.277.
Texte intégralMercadier, Thomas, Philippe Garnier, Virginie Loup, Raluca Tiron, Song Zhang, Ayumi Higuchi et Naser Belmiloud. « Evaluation and Optimization of Particle Removal with a Resist Peeling Method ». Solid State Phenomena 346 (14 août 2023) : 268–74. http://dx.doi.org/10.4028/p-art4vs.
Texte intégralGuglielmi, Vittoria, Valeria Comite, Chiara Andrea Lombardi, Andrea Bergomi, Elisabetta Boanini, Roberto Bonomi, Elisa Monfasani, Letizia Sassi, Mattia Borelli et Paola Fermo. « Restoration of a Textile Artefact : A Comparison of Cleaning Procedures Applied to a Historical Tapestry from the Quirinale Palace (Rome) ». Applied Sciences 13, no 4 (19 février 2023) : 2669. http://dx.doi.org/10.3390/app13042669.
Texte intégralUzcategui, Angela Caira, Anastasiya Serdyukova et Ana Vega Ramiro. « The Conservation Study of a Funeral Coat of Arms (huvudbaner) with a Focus on Cleaning and Consolidation ». Acta Academiae Artium Vilnensis, no 108 (20 mars 2023) : 78–100. http://dx.doi.org/10.37522/aaav.108.2023.150.
Texte intégralLi, Xiang, Hua Liu, Yingbing Zhang et Zuozhen Liu. « Durable, self-cleaning and anti-fouling superhydrophobic coating based on double epoxy layer ». Materials Research Express 9, no 2 (1 février 2022) : 026404. http://dx.doi.org/10.1088/2053-1591/ac5074.
Texte intégralVan Beek, Constance, et Matthew Brown. « Three dimensional preparation of a late Cretaceous sturgeon from Montana : a case study. » Geological Curator 9, no 3 (septembre 2010) : 149–53. http://dx.doi.org/10.55468/gc222.
Texte intégralShi, He, Xiaoxiao Ni, Jiaqi Zhang, Rongchao Cheng, Lili Yan, Jianhua Wang, Rentong Liu et Yuan geng. « Clay-free biodiesel-based drilling fluid suitable for high temperature ». Journal of Physics : Conference Series 2459, no 1 (1 mars 2023) : 012020. http://dx.doi.org/10.1088/1742-6596/2459/1/012020.
Texte intégralIaccarino Idelson, A., S. Pannuzi, A. Brunetto, G. Galanti, C. Giovannone, V. Massa, C. Serino et F. Vischetti. « USE OF 3D TECHNOLOGIES WITHIN THE CONSERVATION OF THE ANCIENT WINDOWS OF THE BASILICA OF S. SABINA IN ROME. CONSTRUCTION OF EXHIBITION STANDS IN CARBON COMPOSITE ON A MILLED STRUCTURE ». ISPRS - International Archives of the Photogrammetry, Remote Sensing and Spatial Information Sciences XLII-5/W1 (16 mai 2017) : 593–98. http://dx.doi.org/10.5194/isprs-archives-xlii-5-w1-593-2017.
Texte intégralHattori, Takeshi. « Non-Aqueous/Dry Cleaning Technology without Causing Damage to Fragile Nano-Structures ». ECS Transactions 25, no 5 (17 décembre 2019) : 3–14. http://dx.doi.org/10.1149/1.3202630.
Texte intégralVereecke, Guy, Frank Holsteyns, Sophia Arnauts, S. Beckx, P. Jaenen, Karine Kenis, M. Lismont et al. « Evaluation of Megasonic Cleaning for Sub-90nm Technologies ». Solid State Phenomena 103-104 (avril 2005) : 141–46. http://dx.doi.org/10.4028/www.scientific.net/ssp.103-104.141.
Texte intégralThèses sur le sujet "Fragile structure cleaning"
Mercadier, Thomas. « Retrait particulaire par étalement et retrait d’un film de résine ». Electronic Thesis or Diss., Université Grenoble Alpes, 2023. http://www.theses.fr/2023GRALT095.
Texte intégralEfficient particle contamination removal is crucial in maximizing yield within the microelectronics industry. However, conventional particle removal techniques may become impractical when dealing with complex and fragile surface structures, as their application can potentially cause physical damage. This challenge has led to the development of new cleaning processes based on innovative concepts, such as a resist film lift off approach. The resist film lift-off leads to the particle removal due to the particle surface bonded to the resist. One of these particle removal processes is studied in this manuscript. In this process, the resist film is composed of two immiscible organic polymers. The process consists of the resist spin-coating followed by a diluted ammonia dispense at room temperature. Thanks to the latter chemical step, one of the polymers is dissolved inducing the delamination and lift-off of the remaining polymer with drag and lift forces.This manuscript sheds light on the critical role of the organization of two immiscible polymers within the resist film in the context of film lift-off. The organization of these polymers was shown to depend on the substrate surface energy through Tof SIMS analysis. For instance, on a hydrophilic substrate, the soluble polymer exhibits a pronounced affinity for the interface. Such an organization on hydrophilic surface minimizes the interfacial area that needs to be delaminated during the resist removal step. Consequently, the effectiveness of ammonia-based film removal relies on the substrate’s surface energy and is only achievable if the substrate surface energy is below 66mN/m.This manuscript provides valuable insights into the modification of the polymers’ organization. The tuning of some parameters from the resist formulation as the blend ratio or the resist thickness and the addition of a bake after the coating are shown to modify this surface energy peeling limit. Additionally, a Particle Removal Efficiency study was conducted on blanket wafers to determine and understand how these three parameters influence cleaning efficiency. It has led to the optimization of process efficiency. This optimized process efficiency was evaluated on structured surfaces. The results showcased its capability to efficiently remove particles while preserving the integrity of delicate structures.This PhD project has contributed to broadening the comprehension of particle removal using a resist peeling process. Moreover, it has demonstrated the potential application of this method in an industrial context
Actes de conférences sur le sujet "Fragile structure cleaning"
Ehlbeck, Jörg, Uta Schnabel, Manfred Stieber, Jörn Winter, Martin Polak, Udo Krohmann et Klaus-Dieter Weltmann. « New methods for reprocessing of medical devices based on plasma treatment ». Dans 13th International Conference on Plasma Surface Engineering September 10 - 14, 2012, in Garmisch-Partenkirchen, Germany. Linköping University Electronic Press, 2013. http://dx.doi.org/10.3384/wcc2.380-383.
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