Artículos de revistas sobre el tema "Tin-oxygen"
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Okamoto, H. "O-Sn (Oxygen-Tin)". Journal of Phase Equilibria & Diffusion 27, n.º 2 (1 de abril de 2006): 202. http://dx.doi.org/10.1361/154770306x97740.
Texto completoOkamoto, H. "O−Sn (Oxygen-Tin)". Journal of Phase Equilibria and Diffusion 27, n.º 2 (marzo de 2006): 202. http://dx.doi.org/10.1007/s11669-006-0063-6.
Texto completoWang, Sheng y Teruo Hori. "Oxygen evolution sensitized by tin porphyrin in microheterogeneous system and membrane systems". Journal of Porphyrins and Phthalocyanines 07, n.º 01 (enero de 2003): 37–41. http://dx.doi.org/10.1142/s1088424603000069.
Texto completoRaghavan, V. "Fe-O-Sn (Iron-Oxygen-Tin)". Journal of Phase Equilibria and Diffusion 31, n.º 4 (21 de abril de 2010): 372. http://dx.doi.org/10.1007/s11669-010-9715-7.
Texto completoIvanov A. F., Egorov F. S., Platonov N. D., Matukhin V. L. y Terukov E. I. "Influence of the oxygen during the deposition of an indium tin oxide thin film by magnetron sputtering for heterojunction solar cells". Semiconductors 56, n.º 3 (2022): 225. http://dx.doi.org/10.21883/sc.2022.03.53063.9747.
Texto completoWu, Xiao Wen, Jian Xin Zhang, Yang Wang y Amin Huang. "Structure and Properties of Ti/TiN/Sb-SnO2 Electrodes with Plasma Sprayed TiN Interlayer". Advanced Materials Research 602-604 (diciembre de 2012): 1613–16. http://dx.doi.org/10.4028/www.scientific.net/amr.602-604.1613.
Texto completoLaimböck, Paul. "In-Line Oxygen Sensors for the Glass Melt and the Float Bath". Advanced Materials Research 39-40 (abril de 2008): 443–46. http://dx.doi.org/10.4028/www.scientific.net/amr.39-40.443.
Texto completoReuter, Hans y Hilko Wilberts. "On the structural diversity anions coordinate to the butterfly-shaped [(R2Sn)3O(OH)2]2+ cations and vice versa". Canadian Journal of Chemistry 92, n.º 6 (junio de 2014): 496–507. http://dx.doi.org/10.1139/cjc-2013-0517.
Texto completoMoatti, A., R. Bayati, S. Singamaneni y J. Narayan. "Epitaxial integration of TiO2 with Si(100) through a novel approach of oxidation of TiN/Si(100) epitaxial heterostructure". MRS Advances 1, n.º 37 (2016): 2629–34. http://dx.doi.org/10.1557/adv.2016.463.
Texto completoBeensh-Marchwicka, Grazyna y Lubomila Krol-Stepniewska. "Reproducibility of Properties of SnOxThin Films Prepared by Reactive Sputtering". ElectroComponent Science and Technology 11, n.º 4 (1985): 271–80. http://dx.doi.org/10.1155/apec.11.271.
Texto completoChoi, Jaewon, Wonjin Jeon, Dongjin Kang, Doowon Kang y Jungyol Jo. "Hydrogen-Assisted Sputtering Growth of TiN on Ceramic Substrates". Coatings 9, n.º 4 (17 de abril de 2019): 255. http://dx.doi.org/10.3390/coatings9040255.
Texto completoLyutov, Dimitar, Plamen V. Petkov, Nasko Gorunski, Boyan Todorov y Hristo Iliev. "Investigation of selected materials stability for future application in development of small fast modular reactors (SFMR)". MATEC Web of Conferences 387 (2023): 05002. http://dx.doi.org/10.1051/matecconf/202338705002.
Texto completoHuang, Amin, Jian Xin Zhang, Xiao Wen Wu y Yang Wang. "Structure and Performance of Ti/TiN/PbO2 Electrodes with Plasma-Sprayed TiN Interlayer". Applied Mechanics and Materials 325-326 (junio de 2013): 40–42. http://dx.doi.org/10.4028/www.scientific.net/amm.325-326.40.
Texto completoAgbede, Oluseye O., G. H. Kelsall y K. Hellgardt. "A novel molten tin reformer: Kinetics of oxygen dissolution in molten tin". Chemical Engineering Science 231 (febrero de 2021): 116273. http://dx.doi.org/10.1016/j.ces.2020.116273.
Texto completoKarami, Hassan y Somayyeh Babaei. "Application of Tin Sulfide-Tin Dioxide Nanocomposite as Oxygen Gas-Sensing Agent". International Journal of Electrochemical Science 8, n.º 11 (noviembre de 2013): 12078–87. http://dx.doi.org/10.1016/s1452-3981(23)13245-7.
Texto completoWen, Shijie, G. Campet y J. Portier. "Influence of Thermal Treatment Under Various Oxygen Pressures on The Electronic Properties of Ceramics and Single Crystals of Pure and Tin-Doped Indium Oxide". Active and Passive Electronic Components 14, n.º 4 (1992): 191–98. http://dx.doi.org/10.1155/1992/56168.
Texto completoZhu, Dongsheng, Wanli Kang, Dewen Dong, Qun Liu y Lin Xu. "A Novel Macrocyclic Dimeric Dicarboxylato Distannoxane Assembled from a Flexible Dicarboxylic Acid". Journal of Chemical Research 2007, n.º 10 (octubre de 2007): 577–79. http://dx.doi.org/10.3184/030823407x255524.
Texto completoItoh, Satoshi, Hiroki Osamura y Kimihiko Komada. "Thermodynamics of Indium-Tin-Oxygen Ternary System". MATERIALS TRANSACTIONS 52, n.º 6 (2011): 1192–99. http://dx.doi.org/10.2320/matertrans.m-m2011806.
Texto completoKhirunenko, Lyudmila I., Yu V. Pomozov y Mikhail G. Sosnin. "Oxygen Precipitation in Silicon Doped with Tin". Solid State Phenomena 82-84 (noviembre de 2001): 111–14. http://dx.doi.org/10.4028/www.scientific.net/ssp.82-84.111.
Texto completoKamp, B., R. Merkle y J. Maier. "Chemical diffusion of oxygen in tin dioxide". Sensors and Actuators B: Chemical 77, n.º 1-2 (junio de 2001): 534–42. http://dx.doi.org/10.1016/s0925-4005(01)00694-3.
Texto completoHARRISON, P. G. "ChemInform Abstract: Transformations Involving Tin-Oxygen Bonds". ChemInform 23, n.º 42 (21 de agosto de 2010): no. http://dx.doi.org/10.1002/chin.199242256.
Texto completoUngureanu, Ana-Maria, Ovidiu Oprea, Bogdan Vasile, Corina Andronescu, Georgeta Voicu y Ioana Jitaru. "Temperature effect over structure and photochemical properties of nanostructured SnO2 powders". Open Chemistry 12, n.º 9 (1 de septiembre de 2014): 909–17. http://dx.doi.org/10.2478/s11532-013-0400-7.
Texto completoHan, Dongsuk, Jaehyung Park, Minsoo Kang, Hyeongtag Jeon y Jongwan Park. "Improvement in the Positive Bias Temperature Stability of SnOx-Based Thin Film Transistors by Hf and Zn Doping". Journal of Nanoscience and Nanotechnology 15, n.º 10 (1 de octubre de 2015): 7606–10. http://dx.doi.org/10.1166/jnn.2015.11155.
Texto completoAbdul Basyir, Abdul Basyir, Robby Kurnia Robby Kurnia, Cherly Firdharini Cherly Firdharini, Didik Aryanto Didik Aryanto, Wahyu Bambang Widayatno Wahyu Bambang Widayatno y Agus Sukarto Wismogroho Agus Sukarto Wismogroho. "Investigation of Effect of Various Hot Gas Atomisation and Melting Pot Temperatures on Tin Alloy Powder Product". Sains Malaysiana 51, n.º 9 (30 de septiembre de 2022): 3027–41. http://dx.doi.org/10.17576/jsm-2022-5109-23.
Texto completoЧувенкова, Ольга Александровна, Николай Игоревич Бойков, Станислав Викторович Рябцев, Елена Владимировна Паринова, Ратибор Григорьевич Чумаков, Алексей Михайлович Лебедев, Дмитрий Смирнов et al. "Electronic structure and composition of tin oxide thin epitaxial and magnetron layers according to synchrotron XANES studies". Конденсированные среды и межфазные границы 26, n.º 1 (28 de febrero de 2024): 153–60. http://dx.doi.org/10.17308/kcmf.2024.26/11897.
Texto completoGeoffroy, C., G. Campet, F. Menil, J. Portier, J. Salardenne y G. Couturier. "Optical and Electrical Properties of SnO2:F Thin Films Obtained by R.F. Sputtering With Various Targets". Active and Passive Electronic Components 14, n.º 3 (1991): 111–18. http://dx.doi.org/10.1155/1991/85965.
Texto completoBecker, Martin, Angelika Polity, Davar Feili y Bruno K. Meyer. "Deposition of tin oxides by Ion-Beam-Sputtering". MRS Proceedings 1494 (2012): 153–58. http://dx.doi.org/10.1557/opl.2012.1650.
Texto completoWang, Qi, Zhi Jian Peng, Yang Wang y Xiu Li Fu. "Deposition and Electrical Resistivity of Oxygen-Deficient Tin Oxide Films Prepared by RF Magnetron Sputtering at Different Powers". Solid State Phenomena 281 (agosto de 2018): 504–9. http://dx.doi.org/10.4028/www.scientific.net/ssp.281.504.
Texto completoLin, Yichao, Minghui Guo, Jin Liu, Laijin Tian y Xicheng Liu. "Synthesis and structural characterization of the complexes of 2-(menthoxycarbonyl)ethyltin chloride". Main Group Metal Chemistry 42, n.º 1 (25 de mayo de 2019): 37–45. http://dx.doi.org/10.1515/mgmc-2019-0003.
Texto completoMukhamedshina, D. M., A. I. Fedosimova, E. A. Dmitriyeva, I. A. Lebedev, E. A. Grushevskaya, S. A. Ibraimova, K. A. Mit’ y A. S. Serikkanov. "Influence of Plasma Treatment on Physical Properties of Thin SnO2 Films Obtained from SnCl4 Solutions with Additions of NH4F and NH4OH". Eurasian Chemico-Technological Journal, n.º 1 (20 de febrero de 2019): 57. http://dx.doi.org/10.18321/ectj791.
Texto completoIngold, K. U. y Gino A. DiLabio. "Is the oxygen “side-on”, or “end-on” and fluctional, in peroxyl radicals with magnetically equivalent oxygen atoms?" Canadian Journal of Chemistry 88, n.º 11 (noviembre de 2010): 1053–56. http://dx.doi.org/10.1139/v10-071.
Texto completoWan, C. F., R. D. McGrath, W. F. Keenan y S. N. Frank. "LPCVD of Tin Oxide from Tetramethyltin and Oxygen". Journal of The Electrochemical Society 136, n.º 5 (1 de mayo de 1989): 1459–63. http://dx.doi.org/10.1149/1.2096941.
Texto completoTompkins, Harland G. y James A. Sellers. "Oxidation of TiN in an oxygen plasma asher". Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 12, n.º 4 (julio de 1994): 2446–50. http://dx.doi.org/10.1116/1.579191.
Texto completoSeidel, F., H. R. Stock y P. Mayr. "Carbon, nitrogen and oxygen implantation into TiN coatings". Surface and Coatings Technology 108-109 (octubre de 1998): 271–75. http://dx.doi.org/10.1016/s0257-8972(98)00562-3.
Texto completoRaghavan, V. "Fe-O-Sn-Zn (Iron-Oxygen-Tin-Zinc)". Journal of Phase Equilibria and Diffusion 31, n.º 4 (21 de abril de 2010): 387–88. http://dx.doi.org/10.1007/s11669-010-9722-8.
Texto completoRaghavan, V. "ChemInform Abstract: Fe-O-Sn (Iron-Oxygen-Tin)". ChemInform 42, n.º 6 (13 de enero de 2011): no. http://dx.doi.org/10.1002/chin.201106217.
Texto completoAmato-Wierda, Carmela y Derk A. Wierda. "Chemical vapor deposition of titanium nitride thin films from tetrakis(dimethylamido)titanium and hydrazine as a coreactant". Journal of Materials Research 15, n.º 11 (noviembre de 2000): 2414–24. http://dx.doi.org/10.1557/jmr.2000.0347.
Texto completoMortazavi, S. Mohammad Reza, Fereshteh Rashchi y Rasoul Khayyam Nekouei. "Characterization of Nano-Structured Tin Oxide Film Prepared by Anodic Oxidation Process". Advanced Materials Research 829 (noviembre de 2013): 366–70. http://dx.doi.org/10.4028/www.scientific.net/amr.829.366.
Texto completoPaskaleva, Albena, Boris Hudec, Peter Jancovic, Karol Fröhlich y Dencho Spassov. "The influence of technology and switching parameters on resistive switching behavior of Pt/HfO2/TiN MIM structures". Facta universitatis - series: Electronics and Energetics 27, n.º 4 (2014): 621–30. http://dx.doi.org/10.2298/fuee1404621p.
Texto completoCzerwiński, Andrzej, Agata Skwarek, Mariusz Płuska, Jacek Ratajczak y Krzysztof Witek. "Tin Pest and Tin Oxidation on Tin-Rich Lead-Free Alloys Investigated by Electron Microscopy Methods". Solid State Phenomena 186 (marzo de 2012): 275–78. http://dx.doi.org/10.4028/www.scientific.net/ssp.186.275.
Texto completoKong, Xianqi y T. Bruce Grindley. "Control of regioselectivity in reactions of dialkylstannylene acetals. Part I. A dramatic reversal of regioselectivity in mono-p-toluenesulfonation reactions". Canadian Journal of Chemistry 72, n.º 12 (1 de diciembre de 1994): 2396–404. http://dx.doi.org/10.1139/v94-306.
Texto completoPanjan, Peter, Aljaž Drnovšek, Pal Terek, Aleksandar Miletić, Miha Čekada y Matjaž Panjan. "Comparative Study of Tribological Behavior of TiN Hard Coatings Deposited by Various PVD Deposition Techniques". Coatings 12, n.º 3 (22 de febrero de 2022): 294. http://dx.doi.org/10.3390/coatings12030294.
Texto completoMoskalewicz, Tomasz, Maciej Warcaba, Sławomir Zimowski y Alicja Łukaszczyk. "Improvement of the Ti-6Al-4V Alloy’s Tribological Properties and Electrochemical Corrosion Resistance by Nanocomposite TiN/PEEK708 Coatings". Metallurgical and Materials Transactions A 50, n.º 12 (10 de octubre de 2019): 5914–24. http://dx.doi.org/10.1007/s11661-019-05484-7.
Texto completoZeinati, Aseel, Durga Misra, Dina H. Triyoso, Sophia Rogalskyj, K. Imakita, Kandabara Tapily, Steven Consiglio, Cory S. Wajda y Gert J. Leusink. "Impact of Bottom Electrode in HfO2-Based Rram Devices on Switching Characteristics". ECS Meeting Abstracts MA2023-01, n.º 29 (28 de agosto de 2023): 1783. http://dx.doi.org/10.1149/ma2023-01291783mtgabs.
Texto completoHerzog, Thomas, Naomi Weitzel y Sebastian Polarz. "Oxygen vacancy injection-induced resistive switching in combined mobile and static gradient doped tin oxide nanorods". Nanoscale 12, n.º 35 (2020): 18322–32. http://dx.doi.org/10.1039/d0nr03734f.
Texto completoHoleček, Jaroslav, Karel Handlíř, Antonín Lyčka, T. K. Chattopadhyay, B. Majee y A. K. Kumar. "Preparation and infrared and 13C, 17O, and 119Sn NMR spectra of some substituted di- and tri(1-butyl)tin phenoxyacetates and phenylthioacetates". Collection of Czechoslovak Chemical Communications 51, n.º 5 (1986): 1100–1111. http://dx.doi.org/10.1135/cccc19861100.
Texto completoZhang, Chun Min, Xiao Yong Liu, Lin Qing Zhang, Hong Liang Lu, Peng Fei Wang y David Wei Zhang. "Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing". Materials Science Forum 815 (marzo de 2015): 8–13. http://dx.doi.org/10.4028/www.scientific.net/msf.815.8.
Texto completoABDULSATTAR, MUDAR AHMED, ADEEBH L. RESNE, SHROK ABDULLAH, RIYADH J. MOHAMMED, NOON KADHUM ALARED y ELHAM HANIE NASER. "CHLORINE GAS SENSING OF SnO2 NANOCLUSTERS AS A FUNCTION OF TEMPERATURE: A DFT STUDY". Surface Review and Letters 26, n.º 04 (mayo de 2019): 1850172. http://dx.doi.org/10.1142/s0218625x1850172x.
Texto completoDmitriyeva, E. A., I. A. Lebedev, E. A. Grushevskaya, D. O. Murzalinov, A. S. Serikkanov, N. M. Tompakova, A. I. Fedosimova y A. T. Temiraliev. "The effect of three-minute exposure of oxygen plasma on the properties of tin oxide films". Bulletin of the Karaganda University. "Physics" Series 99, n.º 3 (30 de septiembre de 2020): 38–45. http://dx.doi.org/10.31489/2020ph3/38-45.
Texto completoSong, Seok-Kyun, Daeil Kim, Steven Kim, Seok-Keun Koh, Hyung-Jin Jung, Jeong-Young Lee y Hong-Koo Baik. "Structure and chemical characteristics of tin oxide films prepared by reactive-ion-assisted deposition as a function of oxygen ion beam energy". Journal of Materials Research 15, n.º 9 (septiembre de 2000): 1911–21. http://dx.doi.org/10.1557/jmr.2000.0277.
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