Artículos de revistas sobre el tema "STM lithography"
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Dobrik, G., L. Tapasztó, P. Nemes-Incze, Ph Lambin y L. P. Biró. "Crystallographically oriented high resolution lithography of graphene nanoribbons by STM lithography". physica status solidi (b) 247, n.º 4 (15 de enero de 2010): 896–902. http://dx.doi.org/10.1002/pssb.200982953.
Texto completoMarrian, C. R. K. y E. A. Dobisz. "High-resolution lithography with a vacuum STM". Ultramicroscopy 42-44 (julio de 1992): 1309–16. http://dx.doi.org/10.1016/0304-3991(92)90440-u.
Texto completoZhang, L. B., J. X. Shi, Ju Long Yuan, Shi Ming Ji y M. Chang. "The Advancement of SPM-Based Nanolithography". Materials Science Forum 471-472 (diciembre de 2004): 353–57. http://dx.doi.org/10.4028/www.scientific.net/msf.471-472.353.
Texto completoYang, Ye y Wan Sheng Zhao. "Fabrication of the Nanoscale Flat-Bottomed and Lamellar Structures on HOPG Surface by STM-Based Electric Lithography". Key Engineering Materials 562-565 (julio de 2013): 45–51. http://dx.doi.org/10.4028/www.scientific.net/kem.562-565.45.
Texto completoKleineberg, U., A. Brechling, M. Sundermann y U. Heinzmann. "STM Lithography in an Organic Self-Assembled Monolayer". Advanced Functional Materials 11, n.º 3 (junio de 2001): 208–12. http://dx.doi.org/10.1002/1616-3028(200106)11:3<208::aid-adfm208>3.0.co;2-x.
Texto completoVetrone, J. y Y. W. Chung. "Changes in tip structure measured during STM lithography". Applied Surface Science 78, n.º 3 (julio de 1994): 331–38. http://dx.doi.org/10.1016/0169-4332(94)90022-1.
Texto completoDobrik, Gergely, Levente Tapasztó y László Biró. "Nanometer wide ribbons and triangles by STM lithography of graphene". Nanopages 7, n.º 1 (junio de 2012): 1–7. http://dx.doi.org/10.1556/nano.2010.00001.
Texto completoTucker, J. R. y T. C. Shen. "Prospects for atomically ordered device structures based on STM lithography". Solid-State Electronics 42, n.º 7-8 (julio de 1998): 1061–67. http://dx.doi.org/10.1016/s0038-1101(97)00302-x.
Texto completoKASU, Makoto y Naoki KOBAYASHI. "Nanoscale Semiconductor Processes Using STM and AFM Lithographies. Nanometer-scale GaAs Selective Growth Using STM Lithography." Hyomen Kagaku 19, n.º 11 (1998): 734–41. http://dx.doi.org/10.1380/jsssj.19.734.
Texto completoLeuschner, R., E. Günther, G. Falk, A. Hammerschmidt, K. Kragler, I. W. Rangelow y J. Zimmermann. "Bilayer resist process for exposure with low-voltage electrons (STM-lithography)". Microelectronic Engineering 30, n.º 1-4 (enero de 1996): 447–50. http://dx.doi.org/10.1016/0167-9317(95)00284-7.
Texto completoWang, Guang Long, Min Gao, Li Shuang Feng, Yi Dun, Jian Guo Hou y Jie Tang. "Nanostructures and Nanodevices Special Fabrication and Characterization". Key Engineering Materials 483 (junio de 2011): 243–48. http://dx.doi.org/10.4028/www.scientific.net/kem.483.243.
Texto completoYang, Ye y Zuhua Fang. "Nanoscale electric discharge‐induced FLG peeling off during the STM electric lithography". Micro & Nano Letters 12, n.º 10 (octubre de 2017): 793–98. http://dx.doi.org/10.1049/mnl.2017.0383.
Texto completoSAKURAI, Makoto, Carsten THIRSTRUP y Masakazu AONO. "Nanoscale Semiconductor Processes Using STM and AFM Lithographies. Formation of Silicon Dangling Bonds Using STM Lithography and Its Decoration." Hyomen Kagaku 19, n.º 11 (1998): 708–15. http://dx.doi.org/10.1380/jsssj.19.708.
Texto completoMühl, T. y S. Myhra. "Electro-oxidative lithography by STM as a proximity electrode of electrically conducting DLC". Journal of Physics: Conference Series 61 (1 de abril de 2007): 841–46. http://dx.doi.org/10.1088/1742-6596/61/1/168.
Texto completoMol, J. A., S. P. C. Beentjes y S. Rogge. "A low temperature surface preparation method for STM nano-lithography on Si(100)". Applied Surface Science 256, n.º 16 (junio de 2010): 5042–45. http://dx.doi.org/10.1016/j.apsusc.2010.03.052.
Texto completoChen, Fan, Anhong Zhou y Haeyeon Yang. "The effects of strain on STM lithography on HS-ssDNA/Au (111) surface". Applied Surface Science 255, n.º 15 (mayo de 2009): 6832–39. http://dx.doi.org/10.1016/j.apsusc.2009.03.003.
Texto completoJede, Ralf y George Lanzarotta. "Using a SEM to “Write” Sub Micron Structures". Microscopy Today 1, n.º 4 (junio de 1993): 4–5. http://dx.doi.org/10.1017/s1551929500067389.
Texto completoSavouchkina, A., A. Foelske-Schmitz, V. A. Guzenko, D. Weingarth, G. G. Scherer, A. Wokaun y R. Kötz. "In situ STM study of Pt-nanodot arrays on HOPG prepared by electron-beam lithography". Electrochemistry Communications 13, n.º 5 (mayo de 2011): 484–87. http://dx.doi.org/10.1016/j.elecom.2011.02.027.
Texto completoOhtsuka, Kenichi y Kenji Yonei. "Nanometer-Scale Surface Modification Using Scanning Tunneling Microscope (STM)-Based Lithography with Conductive Layer on Resist". Japanese Journal of Applied Physics 41, Part 2, No. 6B (15 de junio de 2002): L667—L668. http://dx.doi.org/10.1143/jjap.41.l667.
Texto completoISHIBASHI, Masayoshi, Seiji HEIKE, Hiroshi KAJIYAMA, Yasuo WADA y Tomihiro HASHIZUME. "Nanoscale Semiconductor Processes Using STM and AFM Lithographies. Ten-nanometer Level Lithography Using Scanning Probe Microscopy." Hyomen Kagaku 19, n.º 11 (1998): 722–26. http://dx.doi.org/10.1380/jsssj.19.722.
Texto completoTosic, Dragana, Zoran Markovic, Svetlana Jovanovic, Momir Milosavljevic y Biljana Todorovic-Markovic. "Comparative analysis of different methods for graphene nanoribbon synthesis". Chemical Industry 67, n.º 1 (2013): 147–56. http://dx.doi.org/10.2298/hemind120403056t.
Texto completoHersam, M. C., G. C. Abeln y J. W. Lyding. "An approach for efficiently locating and electrically contacting nanostructures fabricated via UHV-STM lithography on Si(100)". Microelectronic Engineering 47, n.º 1-4 (junio de 1999): 235–37. http://dx.doi.org/10.1016/s0167-9317(99)00203-8.
Texto completoPavlova, T. V., V. M. Shevlyuga, B. V. Andryushechkin, G. M. Zhidomirov y K. N. Eltsov. "Local removal of silicon layers on Si(1 0 0)-2 × 1 with chlorine-resist STM lithography". Applied Surface Science 509 (abril de 2020): 145235. http://dx.doi.org/10.1016/j.apsusc.2019.145235.
Texto completoSundermann, M., J. Hartwich, K. Rott, D. Meyners, E. Majkova, U. Kleineberg, M. Grunze y U. Heinzmann. "Nanopatterning of Au absorber films on Mo/Si EUV multilayer mirrors by STM lithography in self-assembled monolayers". Surface Science 454-456 (mayo de 2000): 1104–9. http://dx.doi.org/10.1016/s0039-6028(00)00208-9.
Texto completoFoelske-Schmitz, A., A. Peitz, V. A. Guzenko, D. Weingarth, G. G. Scherer, A. Wokaun y R. Kötz. "In situ electrochemical STM study of platinum nanodot arrays on highly oriented pyrolythic graphite prepared by electron beam lithography". Surface Science 606, n.º 23-24 (diciembre de 2012): 1922–33. http://dx.doi.org/10.1016/j.susc.2012.07.040.
Texto completoAONO, Masakazu, Chun-Sheng JIANG, Tomonobu NAKAYAMA, Taichi OKUDA, Shan QIAO, Makoto SAKURAI, Carsten THIRSTRUP y Zang-Hua WU. "Nanoscale Semiconductor Processes Using STM and AFM Lithographies. The Present and Future of Nano-Lithography Using Scanning Probes. How to Measure the Properties of Nano-Lithographed Structures." Hyomen Kagaku 19, n.º 11 (1998): 698–707. http://dx.doi.org/10.1380/jsssj.19.698.
Texto completoDzurak, A. S., M. Y. Simmons, A. R. Hamilton, R. G. Clark, R. Brenner, T. M. Buehler, N. J. Curson et al. "Construction of a silicon-based solid state quantum computer". Quantum Information and Computation 1, Special (diciembre de 2001): 82–95. http://dx.doi.org/10.26421/qic1.s-8.
Texto completoYang, Ye y Wansheng Zhao. "Investigation of the nanoscale features fabricated on the HOPG surface induced by STM electric lithography under different voltage regions in ambient conditions". Precision Engineering 37, n.º 2 (abril de 2013): 473–82. http://dx.doi.org/10.1016/j.precisioneng.2012.12.004.
Texto completoSmolyaninov, Igor I. "Scanning Probe Microscopy of Surface Plasmons". International Journal of Modern Physics B 11, n.º 21 (20 de agosto de 1997): 2465–510. http://dx.doi.org/10.1142/s021797929700126x.
Texto completoYang, Ye y Jun Lin. "Study of the electrode tool wear and the probe tip sharpening phenomena during the nanoscale STM electric discharge lithography of the bulk HOPG surface". Journal of Materials Processing Technology 234 (agosto de 2016): 150–57. http://dx.doi.org/10.1016/j.jmatprotec.2016.03.022.
Texto completoYamamoto, Hiroki, Guy Dawson, Takahiro Kozawa y Alex P. G. Robinson. "Lamellar Orientation of a Block Copolymer via an Electron-Beam Induced Polarity Switch in a Nitrophenyl Self-Assembled Monolayer or Si Etching Treatments". Quantum Beam Science 4, n.º 2 (27 de marzo de 2020): 19. http://dx.doi.org/10.3390/qubs4020019.
Texto completoPark, Jun Han, Dan Hee Yun, Yong Won Ma, Cheong Yeol Gwak y Bo Sung Shin. "Prism-Based Laser Interference Lithography System for Simple Multibeam Interference Lithography". Science of Advanced Materials 12, n.º 3 (1 de marzo de 2020): 398–402. http://dx.doi.org/10.1166/sam.2020.3650.
Texto completoFischer, Ulrich Christian, Carsten Hentschel, Florian Fontein, Linda Stegemann, Christiane Hoeppener, Harald Fuchs y Stefanie Hoeppener. "Near-field photochemical and radiation-induced chemical fabrication of nanopatterns of a self-assembled silane monolayer". Beilstein Journal of Nanotechnology 5 (3 de septiembre de 2014): 1441–49. http://dx.doi.org/10.3762/bjnano.5.156.
Texto completoZhang, Man, Liang-Ping Xia, Sui-Hu Dang, A.-Xiu Cao, Qi-Ling Deng y Chun-Lei Du. "A Novel Nanoimprint Lithography Thiol-ene Resist for Sub-70 nm Nanostructures". Science of Advanced Materials 12, n.º 6 (1 de junio de 2020): 779–83. http://dx.doi.org/10.1166/sam.2020.3721.
Texto completoYou, Dong-Bin, Jun-Han Park, Bo-Seok Kang, Dan-Hee Yun y Bo Sung Shin. "A Fundamental Study of a Surface Modification on Silicon Wafer Using Direct Laser Interference Patterning with 355-nm UV Laser". Science of Advanced Materials 12, n.º 4 (1 de abril de 2020): 516–19. http://dx.doi.org/10.1166/sam.2020.3658.
Texto completoDu, Hua, Hui Min Xie, Hai Chang Jiang, Li Jian Rong, Qi Ang Luo, Chang Zhi Gu y Ya-Pu Zhao. "Strain Analysis on Porous TiNi SMA Using SEM Moiré Method". Key Engineering Materials 326-328 (diciembre de 2006): 79–82. http://dx.doi.org/10.4028/www.scientific.net/kem.326-328.79.
Texto completoZhang, Hui Yong. "Nano Structures Constructed by AFM Based Lithography". Advanced Materials Research 815 (octubre de 2013): 490–95. http://dx.doi.org/10.4028/www.scientific.net/amr.815.490.
Texto completoHu, Qin. "Thermal Evolution of Compound Nanoparticles on Moulds Machined by Focused-Ion-Beam for Micro/Nano Lithography". Journal of Nano Research 18-19 (julio de 2012): 307–15. http://dx.doi.org/10.4028/www.scientific.net/jnanor.18-19.307.
Texto completoGuo, XiaoWei, Jinglei Du, Xiangang Luo, Qiling Deng y Chunlei Du. "RET simulations for SLM-based maskless lithography". Microelectronic Engineering 85, n.º 5-6 (mayo de 2008): 929–33. http://dx.doi.org/10.1016/j.mee.2008.01.055.
Texto completoToyofuku, Takashi, Shinya Nishimura, Kazuya Miyashita y Jun-Ichi Shirakashi. "10 Micrometer-Scale SPM Local Oxidation Lithography". Journal of Nanoscience and Nanotechnology 10, n.º 7 (1 de julio de 2010): 4543–47. http://dx.doi.org/10.1166/jnn.2010.2356.
Texto completoKim, Kwang-Ryul, Junsin Yi, Sung-Hak Cho, Nam-Hyun Kang, Myung-Woo Cho, Bo-Sung Shin y Byoungdeog Choi. "SLM-based maskless lithography for TFT-LCD". Applied Surface Science 255, n.º 18 (junio de 2009): 7835–40. http://dx.doi.org/10.1016/j.apsusc.2009.05.022.
Texto completoSexton, B. A. y R. J. Marnock. "Characterization of High Resolution Resists and Metal Shims by Scanning Probe Microscopy". Microscopy and Microanalysis 6, n.º 2 (marzo de 2000): 129–36. http://dx.doi.org/10.1007/s100059910012.
Texto completoYang, Ki Yeon, Jong Woo Kim, Sung Hoon Hong y Heon Lee. "Patterning of the Self-Assembled Monolayer Using the Zero Residual Nano-Imprint Lithography". Solid State Phenomena 124-126 (junio de 2007): 523–26. http://dx.doi.org/10.4028/www.scientific.net/ssp.124-126.523.
Texto completoKim, Seonjun y Young Tae Cho. "Replication and Surface Treatment of Micro Pattern Generated by Entanglement of Nanowires". Science of Advanced Materials 12, n.º 3 (1 de marzo de 2020): 403–6. http://dx.doi.org/10.1166/sam.2020.3651.
Texto completoSeo, Manseung y Haeryung Kim. "Delta lithography method to increase CD uniformity and throughput of SLM-based maskless lithography". Microelectronic Engineering 87, n.º 5-8 (mayo de 2010): 1135–38. http://dx.doi.org/10.1016/j.mee.2009.10.053.
Texto completoHasegawa, Akihiro, Ryo-Il Kang y Katsufusa Shono. "Electron beam direct lithography system using the SEM". Electronics and Communications in Japan (Part II: Electronics) 75, n.º 11 (1992): 51–61. http://dx.doi.org/10.1002/ecjb.4420751106.
Texto completoHuang, Cheng, Markus Moosmann, Jiehong Jin, Tobias Heiler, Stefan Walheim y Thomas Schimmel. "Polymer blend lithography: A versatile method to fabricate nanopatterned self-assembled monolayers". Beilstein Journal of Nanotechnology 3 (4 de septiembre de 2012): 620–28. http://dx.doi.org/10.3762/bjnano.3.71.
Texto completoYamamoto, Takamichi, Hideki Maekawa y Tsutomu Yamamura. "AFM Anodization Lithography on Transparent Conductive Substrates". Journal of Nanoscience and Nanotechnology 8, n.º 8 (1 de agosto de 2008): 3838–42. http://dx.doi.org/10.1166/jnn.2008.191.
Texto completoFarehanim, M. A., U. Hashim, Norhayati Soin, A. H. Azman, S. Norhafizah, M. F. Fatin y R. M. Ayub. "Fabrication of Aluminum Interdigitated Electrode for Biosensor Application Using Conventional Lithography". Advanced Materials Research 1109 (junio de 2015): 118–22. http://dx.doi.org/10.4028/www.scientific.net/amr.1109.118.
Texto completoLauria, John, Ronald Albright, Olga Vladimirsky, Maarten Hoeks, Roel Vanneer, Bert van Drieenhuizen, Luoqi Chen, Luc Haspeslagh y Ann Witvrouw. "SLM device for 193nm lithographic applications". Microelectronic Engineering 86, n.º 4-6 (abril de 2009): 569–72. http://dx.doi.org/10.1016/j.mee.2008.11.022.
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