Artículos de revistas sobre el tema "RF sputtering"
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Yokogawa, Yoshiyuki, Taishi Morishima, Mitunori Uno, Masakazu Kurachi, Yutaka Doi, Harumi Kawaki y Masato Hotta. "Wettability and Durability of Si-O Coatings on Zirconia Substrate by RF-Magnetron Plasma Sputtering". Key Engineering Materials 782 (octubre de 2018): 189–94. http://dx.doi.org/10.4028/www.scientific.net/kem.782.189.
Texto completoPark, Min Woo, Wang Woo Lee, Jae Gab Lee y Chong Mu Lee. "A Comparison of the Mechanical Properties of RF- and DC- Sputter-Deposited Cr Thin Films". Materials Science Forum 546-549 (mayo de 2007): 1695–98. http://dx.doi.org/10.4028/www.scientific.net/msf.546-549.1695.
Texto completoZhao, Haili, Jingpei Xie y Aixia Mao. "Effects of Bottom Layer Sputtering Pressures and Annealing Temperatures on the Microstructures, Electrical and Optical Properties of Mo Bilayer Films Deposited by RF/DC Magnetron Sputtering". Applied Sciences 9, n.º 7 (3 de abril de 2019): 1395. http://dx.doi.org/10.3390/app9071395.
Texto completoBiederman, H., P. Bílková, J. Ježek, P. Hlídek y D. Slavínská. "RF magnetron sputtering of polymers". Journal of Non-Crystalline Solids 218 (septiembre de 1997): 44–49. http://dx.doi.org/10.1016/s0022-3093(97)00196-8.
Texto completoStelmashuk, V., H. Biederman, D. Slavı́nská, M. Trchová y P. Hlidek. "Rf magnetron sputtering of polypropylene". Vacuum 75, n.º 3 (julio de 2004): 207–15. http://dx.doi.org/10.1016/j.vacuum.2004.02.007.
Texto completoMorohashi, Shin'ichi, Atsunori Matsuo, Toshihiro Hara, Shogo Tsujimura y Masanori Kawanishi. "SiO2Insulation Layer Fabricated using RF Magnetron Facing Target Sputtering and Conventional RF Magnetron Sputtering". Japanese Journal of Applied Physics 40, Part 1, No. 8 (15 de agosto de 2001): 4876–77. http://dx.doi.org/10.1143/jjap.40.4876.
Texto completoMa, Wei Hong y Chang Long Cai. "Studying on Thickness Control of ITO Films Deposited Using RF Magnetron Sputtering". Advanced Materials Research 415-417 (diciembre de 2011): 1921–24. http://dx.doi.org/10.4028/www.scientific.net/amr.415-417.1921.
Texto completoJin, Chun Long, Ha Na Shim, Eou Sik Cho y Sang Jik Kwon. "Effect of Pulsed-DC Power on the Zinc Oxide Window Layer of CIGS Solar Cells Deposited by In-Line Sputtering Methods". Advanced Materials Research 805-806 (septiembre de 2013): 131–35. http://dx.doi.org/10.4028/www.scientific.net/amr.805-806.131.
Texto completoLee, Chong Mu, Choong Mo Kim, Sook Joo Kim y Yun Kyu Park. "Enhancement of the Quality of the ZnO Thin Films by Optimizing the Process Parameters of High-Temperature RF Magnetron Sputtering". Key Engineering Materials 336-338 (abril de 2007): 581–84. http://dx.doi.org/10.4028/www.scientific.net/kem.336-338.581.
Texto completoWatazu, Akira, Katsuhiko Kimoto, Sonoda Tsutomu, Kinya Tanaka, Tomoji Sawada, Minoru Toyoda y Naobumi Saito. "Ti-Ca-P Films Formed by RF Magnetron Sputtering Method Using Dual Targets". Materials Science Forum 544-545 (mayo de 2007): 495–98. http://dx.doi.org/10.4028/www.scientific.net/msf.544-545.495.
Texto completoXiu, Xian Wu, Li Xu y Cheng Qiang Zhang. "Influence of Sputtering Power on Molybdenum-Doped Zinc Oxide Films Grown by RF Magnetron Sputtering". Advanced Materials Research 873 (diciembre de 2013): 426–30. http://dx.doi.org/10.4028/www.scientific.net/amr.873.426.
Texto completoFribourg-Blanc, E., E. Cattan, D. Remiens, M. Dupont y D. Osmont. "rf-sputtering of PMNT thin films". Le Journal de Physique IV 11, PR11 (diciembre de 2001): Pr11–145—Pr11–149. http://dx.doi.org/10.1051/jp4:20011123.
Texto completoKoenig, H. R. y L. I. Maissel. "Application of rf discharges to sputtering". IBM Journal of Research and Development 44, n.º 1.2 (enero de 2000): 106–10. http://dx.doi.org/10.1147/rd.441.0106.
Texto completoNomura, Ichirou, Takayuki Miyazaki y Takeo Nishimura. "Novel method in rf bias sputtering". Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 39, n.º 1-4 (marzo de 1989): 99–103. http://dx.doi.org/10.1016/0168-583x(89)90749-0.
Texto completoWen, Dong Cherng, Chun Yao Hsu y Chun Yuan Wu. "Effect of Sputtering Parameters on Photocatalytic Activity of Anatase TiO2 Films Deposited at Room Temperature". Advanced Materials Research 518-523 (mayo de 2012): 724–27. http://dx.doi.org/10.4028/www.scientific.net/amr.518-523.724.
Texto completoKhalaf, Mohammed K. "Effect of sputtering power on optical Properties of RF sputtering deposited Ti6Al4V Thin Films". Iraqi Journal of Physics (IJP) 15, n.º 33 (8 de enero de 2019): 71–77. http://dx.doi.org/10.30723/ijp.v15i33.142.
Texto completoZhao, Zhenqian, Min Yu Yin, Sang Jik Kwon y Eou-Sik Cho. "Effects of Radio-Frequency Sputtering Power on Low Temperature Formation of MoS2 Thin Films on Soda-Lime Glass Substrates". Journal of Nanoscience and Nanotechnology 20, n.º 8 (1 de agosto de 2020): 4892–98. http://dx.doi.org/10.1166/jnn.2020.17849.
Texto completoNi, Zegang, Yuan Zhong, Xingfu Tao, Wei Li, Huifang Gao y Yan Yao. "Effects of Radio Frequency Bias on the Structure Parameters and Mechanical Properties of Magnetron-Sputtered Nb Films". Crystals 12, n.º 2 (14 de febrero de 2022): 256. http://dx.doi.org/10.3390/cryst12020256.
Texto completoNOIKAEW, Busarin, Laksana WANGMOOKLANG, Saisamorn NIYOMSOAN y Siriporn LARPKIATTAWORN. "Preparation of transparent alumina thin films deposited by RF magnetron sputtering". Journal of Metals, Materials and Minerals 31, n.º 2 (27 de junio de 2021): 96–103. http://dx.doi.org/10.55713/jmmm.v31i2.1066.
Texto completoLiu, Jiaqi, Kazuya Tajima, Imane Abdellaoui, Muhammad Monirul Islam, Shigeru Ikeda y Takeaki Sakurai. "Effect of Radio-Frequency Power on the Composition of BiVO4 Thin-Film Photoanodes Sputtered from a Single Target". Energies 14, n.º 8 (10 de abril de 2021): 2122. http://dx.doi.org/10.3390/en14082122.
Texto completoHuguenin-Love, James, Noel T. Lauer, Rodney J. Soukup, Ned J. Ianno, Štepan Kment y Zdenek Hubička. "The Deposition of 3C-SiC Thin Films onto the (111) and (110) Faces of Si Using Pulsed Sputtering of a Hollow Cathode". Materials Science Forum 645-648 (abril de 2010): 131–34. http://dx.doi.org/10.4028/www.scientific.net/msf.645-648.131.
Texto completoJeon, Yong-Su, Yeo-Chun Yun y Seong-Su Kim. "Microstructure and Electrical Properties of In2O3Thin Films Fabricated by RF Magnetron Sputtering". Korean Journal of Materials Research 12, n.º 4 (1 de abril de 2002): 290–95. http://dx.doi.org/10.3740/mrsk.2002.12.4.290.
Texto completoYao, Yan Ping y Bao Xue Bo. "Composition Study of Amorphous InxAs1-x Films Prepared by Radio-Frequency Sputtering". Applied Mechanics and Materials 568-570 (junio de 2014): 1653–57. http://dx.doi.org/10.4028/www.scientific.net/amm.568-570.1653.
Texto completoPark, Sang-Shik. "Preparation and Electrical Properties of BiFeO3Films by RF Magnetron Sputtering". Korean Journal of Materials Research 19, n.º 5 (27 de mayo de 2009): 253–58. http://dx.doi.org/10.3740/mrsk.2009.19.5.253.
Texto completoXu, Li Hai, Yu Xing Xu, Cong Wang y Tian Min Wang. "Preparation and Properties of Ce0.9Sm0.1O1.95 as the Electrolytes of IT-SOFC". Key Engineering Materials 336-338 (abril de 2007): 398–400. http://dx.doi.org/10.4028/www.scientific.net/kem.336-338.398.
Texto completoHwang, Shun Fa y Wen Bin Li. "PZT Thin Films Deposited by RF Magnetron Sputtering". Applied Mechanics and Materials 302 (febrero de 2013): 8–13. http://dx.doi.org/10.4028/www.scientific.net/amm.302.8.
Texto completoHomma, Yoshio y Sukeyoshi Tsunekawa. "Planar Deposition of Aluminum by RF/DC Sputtering with RF Bias". Journal of The Electrochemical Society 132, n.º 6 (1 de junio de 1985): 1466–72. http://dx.doi.org/10.1149/1.2114145.
Texto completoTumanov, N. A., D. V. Kirillov y E. V. Vorob’ev. "Investigation of a high-frequency magnetron sputtering system operation modes during copper thin films deposition". Journal of Physics: Conference Series 2270, n.º 1 (1 de mayo de 2022): 012055. http://dx.doi.org/10.1088/1742-6596/2270/1/012055.
Texto completoLI, WENHAO. "SYNTHESIS OF CUPROUS OXIDE THIN FILMS BY RF-MAGNETRON SPUTTERING". Surface Review and Letters 25, n.º 02 (febrero de 2018): 1850051. http://dx.doi.org/10.1142/s0218625x18500518.
Texto completoPhelps, Justin Ryan, Ashwin Kumar Saikumar, Reza Abdolvand y Kalpathy B. Sundaram. "Comparison of RF and High Impulse Magnetron Sputtered Gallium-Doped Zinc Oxide Thin Films". Coatings 13, n.º 1 (31 de diciembre de 2022): 71. http://dx.doi.org/10.3390/coatings13010071.
Texto completoYu, Jie, Wen Hui Ma, Hang Sheng Lin, Hong Yan Sun, Xiu Hua Chen y Bin Yang. "Fabrication of LSGM Thin Film Electrolyte on LSCM Anode by RF Magnetron Sputtering for IT-SOFC". Materials Science Forum 675-677 (febrero de 2011): 81–84. http://dx.doi.org/10.4028/www.scientific.net/msf.675-677.81.
Texto completoAchoi, M. F., Mohd Nor Asiah, Mohamad Rusop y Saifollah Abdullah. "A Comparative Study of TiO2 Nanocoated Mild Steel Surface Properties between Short and Long Sputtering Time of RF Magnetron". Advanced Materials Research 667 (marzo de 2013): 562–68. http://dx.doi.org/10.4028/www.scientific.net/amr.667.562.
Texto completoda Cunha, António F., F. Kurdzesau y Pedro M. P. Salomé. "Cu(In,Ga)Se2 Prepared by a 2 and 3-Stage Hybrid RF-Magnetron Sputtering and Se Evaporation Method: Properties and Solar Cell Performance". Materials Science Forum 514-516 (mayo de 2006): 93–97. http://dx.doi.org/10.4028/www.scientific.net/msf.514-516.93.
Texto completoTang, Hui Dong, Shou Hong Tan y Zheng Ren Huang. "SiC Coatings Deposited by RF Magnetron Sputtering". Key Engineering Materials 280-283 (febrero de 2007): 1309–12. http://dx.doi.org/10.4028/www.scientific.net/kem.280-283.1309.
Texto completoMASUDA, Haruho, Kyoichiro YASUDA, Michihiko TAKEDA y Akira YOSHIDA. "Preparation of ZnSe films by RF sputtering." SHINKU 30, n.º 5 (1987): 481–84. http://dx.doi.org/10.3131/jvsj.30.481.
Texto completoCho, Jaekyong, Manabu Gomi y Masanori Abe. "Ferromagnetic (LaSr)MnO3Films Deposited by RF Sputtering". Japanese Journal of Applied Physics 29, Part 1, No. 9 (20 de septiembre de 1990): 1686–89. http://dx.doi.org/10.1143/jjap.29.1686.
Texto completoYazawa, Ichiro, Norio Terada, Katsuhiro Matsutani, Ryoji Sugise, Masatoshi Jo y Hideo Ihara. "Orientation of CaCuO2Thin Films in RF Sputtering". Japanese Journal of Applied Physics 29, Part 2, No. 4 (20 de abril de 1990): L566—L568. http://dx.doi.org/10.1143/jjap.29.l566.
Texto completoRamos, Manuel, John Nogan, Manuela Ortíz-Díaz, Jose L. Enriquez-Carrejo, Claudia A. Rodriguez-González, Jose Mireles-Jr-Garcia, Carlos Ornelas y Abel Hurtado-Macias. "Mechanical properties of RF-sputtering MoS2thin films". Surface Topography: Metrology and Properties 5, n.º 2 (12 de junio de 2017): 025003. http://dx.doi.org/10.1088/2051-672x/aa7421.
Texto completoPaven-Thivet, Le, C. Malibert, Ph Houdy y P. A. Albouy. "RF-sputtering deposition of Al/Al2O3 multilayers". Thin Solid Films 336, n.º 1-2 (diciembre de 1998): 373–76. http://dx.doi.org/10.1016/s0040-6090(98)01288-7.
Texto completoMechnich, Peter. "Y2SiO5 coatings fabricated by RF magnetron sputtering". Surface and Coatings Technology 237 (diciembre de 2013): 88–94. http://dx.doi.org/10.1016/j.surfcoat.2013.08.015.
Texto completoCarabias, I., A. Martinez, M. A. Garcia, E. Pina, J. M. Gonzalez, A. Hernando y P. Crespo. "Magnetostrictive thin films prepared by RF sputtering". Journal of Magnetism and Magnetic Materials 290-291 (abril de 2005): 823–25. http://dx.doi.org/10.1016/j.jmmm.2004.11.373.
Texto completoSilva Filho, José Maria Clemente da, Nelson Fabián Villegas Borrero, Gustavo Alexandre Viana, Rafael Borges Merlo y Francisco Chagas Marques. "Lead Iodide Thin Films via rf Sputtering". Crystal Growth & Design 20, n.º 3 (24 de enero de 2020): 1531–37. http://dx.doi.org/10.1021/acs.cgd.9b01250.
Texto completoSpencer, AG y RP Howson. "Rf oscillations in dc planar sputtering magnetrons". Vacuum 38, n.º 6 (enero de 1988): 497–98. http://dx.doi.org/10.1016/0042-207x(88)90595-7.
Texto completoHomma, Yoshio, Sukeyoshi Tunekawa, Akira Satou y Tomoguki Terada. "Planarization Mechanism of RF‐Biased Al Sputtering". Journal of The Electrochemical Society 140, n.º 3 (1 de marzo de 1993): 855–60. http://dx.doi.org/10.1149/1.2056173.
Texto completoTamai, Fujio y Yuji Kawakami. "Reflecting Multi-Layer Coatings by RF Sputtering". Materials Science Forum 502 (diciembre de 2005): 309–14. http://dx.doi.org/10.4028/www.scientific.net/msf.502.309.
Texto completoMalavasi, L., M. C. Mozzati, G. Chiodelli, C. B. Azzoni y G. Flor. "RF sputtering deposition of MgMn2O4spinel thin films". Journal of Materials Science 39, n.º 5 (marzo de 2004): 1671–75. http://dx.doi.org/10.1023/b:jmsc.0000016168.47812.88.
Texto completoMiyazaki, Takayuki y Sadao Adachi. "Low‐temperature silicon homoepitaxy by rf sputtering". Journal of Applied Physics 72, n.º 11 (diciembre de 1992): 5471–73. http://dx.doi.org/10.1063/1.351991.
Texto completoYasuda, K., A. Yoshida, M. Takeda, H. Masuda y I. Akasaki. "Boron nitride films prepared by RF sputtering". physica status solidi (a) 90, n.º 1 (16 de julio de 1985): K7—K9. http://dx.doi.org/10.1002/pssa.2210900146.
Texto completoCHAHBOUN, N., K. ELASSALI, A. KHIARA, E. AMEZIANE y T. BEKKAY. "Growth of CuAlTe2 films by RF sputtering". Solar Energy Materials and Solar Cells 32, n.º 2 (febrero de 1994): 213–18. http://dx.doi.org/10.1016/0927-0248(94)90305-0.
Texto completoChoopun, Supab, Niyom Hongsith, Sornchai Tanunchai, Torranin Chairuangsri, Chatchai Krua-in, Somsorn Singkarat, Thirapat Vilaithong, Pongsri Mangkorntong y Nikorn Mangkorntong. "Single-crystalline ZnO nanobelts by RF sputtering". Journal of Crystal Growth 282, n.º 3-4 (septiembre de 2005): 365–69. http://dx.doi.org/10.1016/j.jcrysgro.2005.05.020.
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