Artículos de revistas sobre el tema "RF Plasma CVD"
Crea una cita precisa en los estilos APA, MLA, Chicago, Harvard y otros
Consulte los 50 mejores artículos de revistas para su investigación sobre el tema "RF Plasma CVD".
Junto a cada fuente en la lista de referencias hay un botón "Agregar a la bibliografía". Pulsa este botón, y generaremos automáticamente la referencia bibliográfica para la obra elegida en el estilo de cita que necesites: APA, MLA, Harvard, Vancouver, Chicago, etc.
También puede descargar el texto completo de la publicación académica en formato pdf y leer en línea su resumen siempre que esté disponible en los metadatos.
Explore artículos de revistas sobre una amplia variedad de disciplinas y organice su bibliografía correctamente.
Hay, Stephen O., Ward C. Roman y Meredith B. Colket. "CVD diamond deposition processes investigation: CARS diagnostics/modeling". Journal of Materials Research 5, n.º 11 (noviembre de 1990): 2387–97. http://dx.doi.org/10.1557/jmr.1990.2387.
Texto completoYAMAMOTO, Masaoki, Masayuki FUKUI y Takayuki SHIBATA. "Properties of carbonous films synthesized by RF plasma CVD." Journal of the Japan Society for Precision Engineering 55, n.º 12 (1989): 2222–27. http://dx.doi.org/10.2493/jjspe.55.2222.
Texto completoMannan, Md Abdul, Masamitsu Nagano, Norie Hirao y Yuji Baba. "Hexagonal BCN Films Prepared by RF Plasma-enhanced CVD". Chemistry Letters 37, n.º 1 (5 de enero de 2008): 96–97. http://dx.doi.org/10.1246/cl.2008.96.
Texto completoTSAKADZE, E., K. OSTRIKOV, Z. TSAKADZE, N. JIANG, R. AHMAD y S. XU. "CONTROL AND DIAGNOSTICS OF INDUCTIVELY COUPLED PLASMAS FOR CHEMICAL VAPOUR DEPOSITION ON NANOCOMPOSITE CARBON NITRIDE-BASED FILMS". International Journal of Modern Physics B 16, n.º 06n07 (20 de marzo de 2002): 1143–47. http://dx.doi.org/10.1142/s0217979202011019.
Texto completoInao, Takuro, Masahiko Kumadaki, Kohki Satoh, Masaki Yoshino y Hidenori Itoh. "Deposition of Boron Nitride Films using RF Plasma CVD Method". IEEJ Transactions on Fundamentals and Materials 134, n.º 6 (2014): 397–401. http://dx.doi.org/10.1541/ieejfms.134.397.
Texto completoKashem, Abul, Masaki Matsushita y Shinzo Morita. "RF Plasma CVD of C-S Compound under Hydrogen Dilution". Journal of Photopolymer Science and Technology 13, n.º 1 (2000): 47–49. http://dx.doi.org/10.2494/photopolymer.13.47.
Texto completoJie, Jiang y Liu Chenzan. "Diamond-like carbon thin films prepared by rf-plasma CVD". Vacuum 42, n.º 16 (1991): 1058. http://dx.doi.org/10.1016/0042-207x(91)91327-k.
Texto completoMITSUI, Akira y Akio KATO. "Preparation of SiC Powders by CVD Method Using RF-Plasma". Journal of the Ceramic Association, Japan 94, n.º 1089 (1986): 517–20. http://dx.doi.org/10.2109/jcersj1950.94.1089_517.
Texto completoMitomo, Tohru, Tomohiro Ohta, Hiroaki Sasaki, Kenichi Ohtsuka y Yasuhiro Habu. "Deposition of amorphous-carbon films by RF plasma CVD method." KAGAKU KOGAKU RONBUNSHU 17, n.º 2 (1991): 305–12. http://dx.doi.org/10.1252/kakoronbunshu.17.305.
Texto completoMitsui, Akira y Akio Kato. "Preparation of SiC powders by CVD method using RF-plasma". International Journal of High Technology Ceramics 3, n.º 1 (enero de 1987): 85. http://dx.doi.org/10.1016/0267-3762(87)90071-3.
Texto completoKim, Y. T., B. Hong, G. E. Jang, S. J. Suh y D. H. Yoon. "Characterization of a-SiC:H Films Deposited by RF Plasma CVD". Crystal Research and Technology 37, n.º 2-3 (febrero de 2002): 219–24. http://dx.doi.org/10.1002/1521-4079(200202)37:2/3<219::aid-crat219>3.0.co;2-9.
Texto completoSuzuki, Keigo y Kazunori Kijima. "Phase transformation of BaTiO3 nanoparticles synthesized by RF-plasma CVD". Journal of Alloys and Compounds 419, n.º 1-2 (agosto de 2006): 234–42. http://dx.doi.org/10.1016/j.jallcom.2005.08.075.
Texto completoJonas, Stanisława, Karol Kyzioł, Jerzy Lis y Katarzyna Tkacz-Śmiech. "Stability of a-C:N:H Layers Deposited by RF Plasma Enhanced CVD". Solid State Phenomena 147-149 (enero de 2009): 738–43. http://dx.doi.org/10.4028/www.scientific.net/ssp.147-149.738.
Texto completoOng, Si Ci, Usman Ilyas y Rajdeep Singh Rawat. "Nanofabrication using home-made RF plasma coupled chemical vapour deposition system". International Journal of Modern Physics: Conference Series 32 (enero de 2014): 1460342. http://dx.doi.org/10.1142/s2010194514603421.
Texto completoTsai, C., J. Nelson, W. W. Gerberich, J. Heberlein y E. Pfender. "Metal reinforced thermal plasma diamond coatings". Journal of Materials Research 7, n.º 8 (agosto de 1992): 1967–69. http://dx.doi.org/10.1557/jmr.1992.1967.
Texto completoKURAMASU, Keizaburo, Tetsuhiro KORECHIKA, Masatoshi KITAGAWA y Takashi HIRAO. "Mechanical Properties of SiOxNy Films Deposited by RF Plasma-Enhanced CVD". Journal of the Ceramic Society of Japan 105, n.º 1218 (1997): 161–65. http://dx.doi.org/10.2109/jcersj.105.161.
Texto completoBerghaus, J. O., J. L. Meunier y F. Gitzhofer. "Direct current bias effects in RF induction thermal plasma diamond CVD". IEEE Transactions on Plasma Science 30, n.º 1 (febrero de 2002): 442–49. http://dx.doi.org/10.1109/tps.2002.1003894.
Texto completoKim, Dong-Sun y Tae-Won Kang. "Deposition of Amorphous Carbon Thin Films by Pulsed RF Plasma CVD". JOURNAL OF CHEMICAL ENGINEERING OF JAPAN 38, n.º 8 (2005): 593–99. http://dx.doi.org/10.1252/jcej.38.593.
Texto completoKejun, Liao y Wang Wanlu. "Cubic Boron Nitride Films Formed by Thermally Assisted rf Plasma CVD". Chinese Physics Letters 12, n.º 1 (enero de 1995): 58–60. http://dx.doi.org/10.1088/0256-307x/12/1/016.
Texto completoSachdev, H. y P. Scheid. "Formation of silicon carbide and silicon carbonitride by RF-plasma CVD". Diamond and Related Materials 10, n.º 3-7 (marzo de 2001): 1160–64. http://dx.doi.org/10.1016/s0925-9635(00)00575-6.
Texto completoBaldwin, S. K., T. G. Owano y C. H. Kruger. "Growth rate studies of CVD diamond in an RF plasma torch". Plasma Chemistry and Plasma Processing 14, n.º 4 (diciembre de 1994): 383–406. http://dx.doi.org/10.1007/bf01570203.
Texto completoItoh, Naomi, Kiyotaka Kato y Isamu Kato. "Fabrication of sin thin films by rf biased microwave plasma CVD". Electronics and Communications in Japan (Part II: Electronics) 74, n.º 7 (1991): 101–6. http://dx.doi.org/10.1002/ecjb.4420740711.
Texto completoShimizu, Hideki, Setsuo Nakao, Hiroshi Kusakabe y Mikio Noda. "Microstructures of hydrogenated amorphous carbon films prepared by rf plasma CVD". Journal of Non-Crystalline Solids 114 (diciembre de 1989): 196–98. http://dx.doi.org/10.1016/0022-3093(89)90111-7.
Texto completoTakenaka, Kosuke, Yusuke Okumura y Yuichi Setsuhara. "Characterization of inductively coupled RF plasmas for plasma-assisted mist CVD of ZnO films". Journal of Physics: Conference Series 379 (7 de agosto de 2012): 012031. http://dx.doi.org/10.1088/1742-6596/379/1/012031.
Texto completoSaha, Sucharita y Debajyoti Das. "Diamond-Like Carbon Thin Films from Low-Pressure and High-Density CH4 Plasma". IOP Conference Series: Materials Science and Engineering 1221, n.º 1 (1 de marzo de 2022): 012037. http://dx.doi.org/10.1088/1757-899x/1221/1/012037.
Texto completoFantoni, R., M. Giorgi, A. G. G. Moliterni, W. C. M. Berden, V. Lazic, O. Martini y F. Polla Mattiot. "On-line gas-phase optical diagnostics in plasma CVD deposition of carbon films". Journal of Materials Research 7, n.º 5 (mayo de 1992): 1204–14. http://dx.doi.org/10.1557/jmr.1992.1204.
Texto completoCho, Chung-Woo, Byungyou Hong y Young-Ze Lee. "Wear life evaluation of diamond-like carbon films deposited by microwave plasma-enhanced CVD and RF plasma-enhanced CVD method". Wear 259, n.º 1-6 (julio de 2005): 789–94. http://dx.doi.org/10.1016/j.wear.2005.02.007.
Texto completoJeong, Chaehwan, Seongjae Boo, Minsung Jeon y Koichi Kamisako. "Characterization of Intrinsic a-Si:H Films Prepared by Inductively Coupled Plasma Chemical Vapor Deposition for Solar Cell Applications". Journal of Nanoscience and Nanotechnology 7, n.º 11 (1 de noviembre de 2007): 4169–73. http://dx.doi.org/10.1166/jnn.2007.064.
Texto completoFouad, Osama A., Nizam Uddin, Masaaki Yamazato y Masamitsu Nagano. "RF-plasma enhanced CVD of TiSi2 thin films: effects of TiCl4 flow rate and RF power". Journal of Crystal Growth 257, n.º 1-2 (septiembre de 2003): 153–60. http://dx.doi.org/10.1016/s0022-0248(03)01419-2.
Texto completoPrzetakiewicz, Karol, Katarzyna Tkacz-Śmiech, Piotr Boszkowicz y Stanisława Jonas. "Polymer-Surface Modification with a-C:N:H Layers Plasma Chemically Deposited in RF CVD and MW CVD Systems". Solid State Phenomena 165 (junio de 2010): 159–64. http://dx.doi.org/10.4028/www.scientific.net/ssp.165.159.
Texto completoPark, Yonggyun, Pengzhan Liu, Seunghwan Lee, Jinill Cho, Eric Joo, Hyeong-U. Kim y Taesung Kim. "Diagnosing Time-Varying Harmonics in Low-k Oxide Thin Film (SiOF) Deposition by Using HDP CVD". Sensors 23, n.º 12 (14 de junio de 2023): 5563. http://dx.doi.org/10.3390/s23125563.
Texto completoSleptsova, Anastasia A., Sergey V. Chernykh, Dmitry A. Podgorny y Ilya A. Zhilnikov. "Optimization of passivation in AlGaN/GaN heterostructure microwave transistor fabrication by ICP CVD". Modern Electronic Materials 6, n.º 2 (15 de julio de 2020): 71–75. http://dx.doi.org/10.3897/j.moem.6.2.58860.
Texto completoSaitoh, Hidetoshi, Yoshihiko Hirotsu y Yukio Ichinose. "Conditions for Formation of BN Film by Thermally Assisted RF Plasma CVD". Journal of the Japan Institute of Metals 54, n.º 2 (1990): 186–92. http://dx.doi.org/10.2320/jinstmet1952.54.2_186.
Texto completoISHIGURO, Takashi, Hidetoshi SAITOH y Yukio ICHINOSE. "Synthesis of cubic boron nitride film by an RF plasma CVD method." Journal of the Japan Society for Precision Engineering 53, n.º 10 (1987): 1527–31. http://dx.doi.org/10.2493/jjspe.53.1527.
Texto completoKumadaki, Masahiko, Masaki Yoshino, Kohki Sato y Hidenori Itoh. "Low-temperature Deposition of SiCN Thin Films by RF Plasma CVD Method". IEEJ Transactions on Fundamentals and Materials 134, n.º 10 (2014): 538–44. http://dx.doi.org/10.1541/ieejfms.134.538.
Texto completoNAKAYAMA, Masatoshi, Kunihiro UEDA, Masanori SHIBAHARA, Kazunori MARUYAMA y Kiichiro KAMATA. "Bias Effect on the Formation of Carbon Films by RF-Plasma CVD". Journal of the Ceramic Society of Japan 98, n.º 1138 (1990): 597–600. http://dx.doi.org/10.2109/jcersj.98.597.
Texto completoOkuyama, Hideo, Kazuhiro Honnma y Satoru Ohno. "Synthesis of Composite Metal Particles Modified UFP Using the RF-plasma CVD." Journal of the Japan Society of Powder and Powder Metallurgy 47, n.º 9 (2000): 993–98. http://dx.doi.org/10.2497/jjspm.47.993.
Texto completoKim, Je-Deok, Hiroyuki Sugimura y Osamu Takai. "Water-repellency of a-C:H films deposited by rf plasma-enhanced CVD". Vacuum 66, n.º 3-4 (agosto de 2002): 379–83. http://dx.doi.org/10.1016/s0042-207x(02)00158-6.
Texto completoGarci´a, A., V. Bellido, N. Flan˜o y J. I. On˜ate. "Submicron characterization of B-C:H thin films produced by RF plasma CVD". Diamond and Related Materials 1, n.º 2-4 (marzo de 1992): 350–54. http://dx.doi.org/10.1016/0925-9635(92)90056-t.
Texto completoDehning, C., A. Holländer, A.-M. Leventi-Peetz y K. Silmy. "Simulation of a Plasma Enhanced µ-jet-CVD Process". NAFEMS International Journal of CFD Case Studies 5 (abril de 2006): 51–56. http://dx.doi.org/10.59972/8ptzprew.
Texto completoGaisin, I. R., R. M. Valeeva y N. I. Maksimov. "Cardiorenal continuum in hypertensive pregnancy". "Arterial’naya Gipertenziya" ("Arterial Hypertension") 15, n.º 5 (28 de octubre de 2009): 590–97. http://dx.doi.org/10.18705/1607-419x-2009-15-5-590-597.
Texto completoZarchi, Meysam y Shahrokh Ahangarani. "A Comparison between Thin-Film Transistors Deposited by Hot-Wire Chemical Vapor Deposition and PECVD". Metallurgical and Materials Engineering 21, n.º 1 (31 de marzo de 2015): 7–14. http://dx.doi.org/10.30544/128.
Texto completoYasuoka, Yuki, Toru Harigai, Jun-Seok Oh, Hiroshi Furuta, Akimitsu Hatta, Tsuneo Suzuki y Hidetoshi Saitoh. "Diamond-like carbon films from CO source gas by RF plasma CVD method". Japanese Journal of Applied Physics 54, n.º 1S (10 de noviembre de 2014): 01AD04. http://dx.doi.org/10.7567/jjap.54.01ad04.
Texto completoShimada, Y., K. Kobayashi, N. Mutsukura y Y. Machi. "Synthesis of diamond on substrate with mechanical treatment by RF plasma CVD method". Plasma Sources Science and Technology 2, n.º 1 (1 de febrero de 1993): 18–22. http://dx.doi.org/10.1088/0963-0252/2/1/005.
Texto completoMaemura, Yoko, Hiroshi Fujiyama, Tomoko Takagi, Ryo Hayashi, Wataru Futako, Michio Kondo y Akihisa Matsuda. "Particle formation and a-Si:H film deposition in narrow-gap RF plasma CVD". Thin Solid Films 345, n.º 1 (mayo de 1999): 80–84. http://dx.doi.org/10.1016/s0040-6090(99)00100-5.
Texto completoDeb, B., B. Bhattacharjee, A. Ganguli, S. Chaudhuri y A. K. Pal. "Boron nitride films synthesized by RF plasma CVD of borane–ammonia and nitrogen". Materials Chemistry and Physics 76, n.º 2 (agosto de 2002): 130–36. http://dx.doi.org/10.1016/s0254-0584(01)00524-7.
Texto completoNanbu, Toshikazu, Mikio Takemoto y Toshitsugu Fukai. "Corrosion Resistance of TiN Coating Deposited on Quartz by RF Plasma-Assisted CVD". Zairyo-to-Kankyo 41, n.º 11 (1992): 734–40. http://dx.doi.org/10.3323/jcorr1991.41.734.
Texto completoMATSUI, ISAO. "CVD Material Processing. Effect of O2 on Formation of Ar-O2 RF Plasma." KAGAKU KOGAKU RONBUNSHU 26, n.º 6 (2000): 792–97. http://dx.doi.org/10.1252/kakoronbunshu.26.792.
Texto completoHozumi, Atsushi, Hiroki Sekoguchi, Nobuhisa Sugimoto y Osamu Takai. "Transparent Water-repellent Films Containing Fluoro-alkyl Functions by RF Plasma-enhanced CVD". Transactions of the IMF 76, n.º 2 (enero de 1998): 51–53. http://dx.doi.org/10.1080/00202967.1998.11871194.
Texto completoTóth, A., M. Mohai, T. Ujvári y I. Bertóti. "Surface and nanomechanical properties of Si:C:H films prepared by RF plasma beam CVD". Diamond and Related Materials 14, n.º 3-7 (marzo de 2005): 954–58. http://dx.doi.org/10.1016/j.diamond.2005.01.017.
Texto completo