Artículos de revistas sobre el tema "Resist film removal"
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Mercadier, Thomas, Philippe Garnier, Virginie Loup, Raluca Tiron, Song Zhang, Ayumi Higuchi y Naser Belmiloud. "Evaluation and Optimization of Particle Removal with a Resist Peeling Method". Solid State Phenomena 346 (14 de agosto de 2023): 268–74. http://dx.doi.org/10.4028/p-art4vs.
Texto completoSobhian, Mani. "The Role of Extreme Agitation in Accelerating the Removal Rate of Advanced Packaging Photoresists". Additional Conferences (Device Packaging, HiTEC, HiTEN, and CICMT) 2013, DPC (1 de enero de 2013): 001389–416. http://dx.doi.org/10.4071/2013dpc-wp15.
Texto completoHollenbeck, J. L. y R. C. Buchanan. "Oxide thin films for nanometer scale electron beam lithography". Journal of Materials Research 5, n.º 5 (mayo de 1990): 1058–72. http://dx.doi.org/10.1557/jmr.1990.1058.
Texto completoLee, Jong Han, Sang Won Shin, Young Suk Kwon, In Hoon Choi, Chung Nam Whang, Tae Gon Kim y Jong Han Song. "Magnetic Patterning of the Ni/Cu Thin Film by 40 keV O Ion Irradiation". Solid State Phenomena 124-126 (junio de 2007): 867–70. http://dx.doi.org/10.4028/www.scientific.net/ssp.124-126.867.
Texto completoJimbo, Sadayuki, Kouji Shimomura, Tokuhisa Ohiwa, Makoto Sekine, Haruki Mori, Keiji Horioka y Haruo Okano. "Resist and Sidewall Film Removal after Al Reactive Ion Etching (RIE) Employing F+H2O Downstream Ashing". Japanese Journal of Applied Physics 32, Part 1, No. 6B (30 de junio de 1993): 3045–50. http://dx.doi.org/10.1143/jjap.32.3045.
Texto completoMikalsen Martinussen, Simen, Raimond N. Frentrop, Meindert Dijkstra y Sonia Maria Garcia-Blanco. "Redeposition-Free Deep Etching in Small KY(WO4)2 Samples". Micromachines 11, n.º 12 (24 de noviembre de 2020): 1033. http://dx.doi.org/10.3390/mi11121033.
Texto completoTomita, Hiroshi, Minako Inukai, Kaori Umezawa y Li Nan Ji. "Direct Observation of Single Bubble Cavitation Damage for MHz Cleaning". Solid State Phenomena 145-146 (enero de 2009): 3–6. http://dx.doi.org/10.4028/www.scientific.net/ssp.145-146.3.
Texto completoMuangtong, Piyanut, Righdan Mohsen Namus y Russell Goodall. "Improved Tribocorrosion Resistance by Addition of Sn to CrFeCoNi High Entropy Alloy". Metals 11, n.º 1 (24 de diciembre de 2020): 13. http://dx.doi.org/10.3390/met11010013.
Texto completoFarahani, Emad, Andre C. Liberati, Amirhossein Mahdavi, Pantcho Stoyanov, Christian Moreau y Ali Dolatabadi. "Ice Adhesion Evaluation of PTFE Solid Lubricant Film Applied on TiO2 Coatings". Coatings 13, n.º 6 (6 de junio de 2023): 1049. http://dx.doi.org/10.3390/coatings13061049.
Texto completoLimcharoen, Alonggot, Pichet Limsuwan, Chupong Pakpum y Krisda Siangchaew. "Characterisation of C–F Polymer Film Formation on the Air-Bearing Surface Etched Sidewall of Fluorine-Based Plasma Interacting with AL2O3–TiC Substrate". Journal of Nanomaterials 2013 (2013): 1–6. http://dx.doi.org/10.1155/2013/851489.
Texto completoPfeiffer, P., X. D. Zhang, D. Stümmler, S. Sanders, M. Weingarten, M. Heuken, A. Vescan y H. Kalisch. "Backside Contacting for Uniform Luminance in Large-Area OLED". MRS Advances 2, n.º 42 (2017): 2275–80. http://dx.doi.org/10.1557/adv.2017.175.
Texto completoSawada, Yasushi, Keiichi Yamazaki, Noriyuki Taguchi y Tetsuji Shibata. "Pretreatment of Blind Via Holes before Ni/Au and Cu Plating Applied with Atmospheric Pressure Plasma Jet". Journal of Microelectronics and Electronic Packaging 2, n.º 3 (1 de julio de 2005): 189–96. http://dx.doi.org/10.4071/1551-4897-2.3.189.
Texto completoAhner, Nicole, Sven Zimmermann, Matthias Schaller y Stefan E. Schulz. "Determination of Surface Energy Characteristics of Plasma Processed Ultra Low-K Dielectrics for Optimized Wetting in Wet Chemical Plasma Etch Residue Removal". Solid State Phenomena 195 (diciembre de 2012): 110–13. http://dx.doi.org/10.4028/www.scientific.net/ssp.195.110.
Texto completoEs-Souni, Mona, Martha Es-Souni, Hamzah Bakhti, Aydin Gülses, Helge Fischer-Brandies, Yahya Açil, Jörg Wiltfang y Christian Flörke. "A Bacteria and Cell Repellent Zwitterionic Polymer Coating on Titanium Base Substrates towards Smart Implant Devices". Polymers 13, n.º 15 (27 de julio de 2021): 2472. http://dx.doi.org/10.3390/polym13152472.
Texto completoMoore, John, Jared Pettit, Alex Brewer y Alman Law. "Temporary Bonding of Wafers, Displays, and Components". Additional Conferences (Device Packaging, HiTEC, HiTEN, and CICMT) 2015, DPC (1 de enero de 2015): 1–68. http://dx.doi.org/10.4071/2015dpc-tp13.
Texto completoHoribe, H., M. Yamamoto, T. Maruoka, Y. Goto, A. Kono, I. Nishiyama y S. Tagawa. "Ion-implanted resist removal using atomic hydrogen". Thin Solid Films 519, n.º 14 (mayo de 2011): 4578–81. http://dx.doi.org/10.1016/j.tsf.2011.01.287.
Texto completoChavez, K. L. y D. W. Hess. "Removal of Resist Materials Using Acetic Acid". Journal of The Electrochemical Society 150, n.º 4 (2003): G284. http://dx.doi.org/10.1149/1.1557085.
Texto completoHoribe, Hideo, Masayuki Fujita y Akira Yoshikado. "Acrylic-Type Resist Removal Using 532 nm Laser Pulses". Journal of The Electrochemical Society 153, n.º 7 (2006): G609. http://dx.doi.org/10.1149/1.2197767.
Texto completoGupta, Atul, Eric Snyder, Christiane Gottschalke, Kevin Wenzel, James Gunn, Hao Lu, Yuya Suzuki, Venky Sundaram y Rao Tummala. "First Demonstration of Fine Line RDL Yield Enhancement using an Innovative Ozone Treatment Process for Panel Fan-out and Interposers". Additional Conferences (Device Packaging, HiTEC, HiTEN, and CICMT) 2017, DPC (1 de enero de 2017): 1–19. http://dx.doi.org/10.4071/2017dpc-tp1_presentation2.
Texto completoHollenbeck, J. L. y R. C. Buchanan. "Nanometer-scale structures produced in oxide films". Proceedings, annual meeting, Electron Microscopy Society of America 45 (agosto de 1987): 396–97. http://dx.doi.org/10.1017/s0424820100126779.
Texto completoHossain, Sylvia D. y Michael F. Pas. "Heated SC1 Solution for Selective Etching and Resist Particulate Removal". Journal of The Electrochemical Society 140, n.º 12 (1 de diciembre de 1993): 3604–6. http://dx.doi.org/10.1149/1.2221133.
Texto completoPavlova, T. V., V. M. Shevlyuga, B. V. Andryushechkin, G. M. Zhidomirov y K. N. Eltsov. "Local removal of silicon layers on Si(1 0 0)-2 × 1 with chlorine-resist STM lithography". Applied Surface Science 509 (abril de 2020): 145235. http://dx.doi.org/10.1016/j.apsusc.2019.145235.
Texto completoNoda, Seiji, Kazumasa Kawase, Hideo Horibe, Masaki Kuzumoto y Tatsuo Kataoka. "Development of a Method for Resist Removal by Ozone with Acetic Acid Vapor". Journal of The Electrochemical Society 152, n.º 1 (2005): G73. http://dx.doi.org/10.1149/1.1833311.
Texto completoFurusawa, Takeshi, Noriyuki Sakuma, Daisuke Ryuzaki, Seiichi Kondo, Ken-ichi Takeda, Shuntaro Machida, Ryo Yoneyama y Kenji Hinode. "Direct Resist Removal Process from Copper-Exposed Vias for Low-Parasitic-Capacitance Interconnects". Journal of The Electrochemical Society 148, n.º 4 (2001): G190. http://dx.doi.org/10.1149/1.1353580.
Texto completoChen, Y., D. S. Macintyre y S. Thoms. "A non-destructive method for the removal of residual resist in imprinted patterns". Microelectronic Engineering 67-68 (junio de 2003): 245–51. http://dx.doi.org/10.1016/s0167-9317(03)00184-9.
Texto completoKono, Akihiko, Yu Arai, Takeshi Maruoka, Masashi Yamamoto, Yousuke Goto, Seiji Takahashi, Takashi Nishiyama y Hideo Horibe. "High removal rate of cross-linked SU-8 resist using hydrogen radicals generated by tungsten hot-wire catalyzer". Thin Solid Films 562 (julio de 2014): 632–37. http://dx.doi.org/10.1016/j.tsf.2014.04.062.
Texto completoLu, Ming y Shaozhang Niu. "A Detection Approach Using LSTM-CNN for Object Removal Caused by Exemplar-Based Image Inpainting". Electronics 9, n.º 5 (22 de mayo de 2020): 858. http://dx.doi.org/10.3390/electronics9050858.
Texto completoLi, X., H. Zhou, J. Abrokwah, P. Zurcher, K. Rajagopalan, W. Liu, R. Gregory, M. Passlack y I. G. Thayne. "Low damage ashing and etching processes for ion implanted resist and Si3N4 removal by ICP and RIE methods". Microelectronic Engineering 85, n.º 5-6 (mayo de 2008): 966–68. http://dx.doi.org/10.1016/j.mee.2007.12.056.
Texto completoKalai, Amina, Fadila Malek y Leila Bousmaha-Marroki. "Effect of Thymus ciliatus oil-based disinfectant solutions against bio-films formed by Bacillus cereus strains isolated from pasteurized-milk processing lines in Algeria". South Asian Journal of Experimental Biology 8, n.º 1 (29 de octubre de 2018): 01–12. http://dx.doi.org/10.38150/sajeb.8(1).p01-12.
Texto completoP. Yu. Glagolev, G. D. Demin, N. A. Djuzhev, M. A. Makhiboroda y N. A. Filippo. "Study of the dynamics of heating anode units in a maskless nanolithograph based on an array of microfocus X-ray tubes". Technical Physics 92, n.º 13 (2022): 2125. http://dx.doi.org/10.21883/tp.2022.13.52233.132-21.
Texto completoSun, Yong y Richard Bailey. "Tribocorrosion Behavior of γ′-Fe4N Nitride Layer Formed on Mild Steel by Plasma Nitriding in Chloride-Containing Solution". Lubricants 11, n.º 7 (29 de junio de 2023): 281. http://dx.doi.org/10.3390/lubricants11070281.
Texto completoChang, Shih-Chia y Jeffrey M. Kempisty. "Lift-off Methods for MEMS Devices". MRS Proceedings 729 (2002). http://dx.doi.org/10.1557/proc-729-u2.3.
Texto completoMatsubara, Y., K. Endo, T. Tatsumi y T. Horiuchi. "Adhesion of a-C:F during oxygen plasma annealing". MRS Proceedings 476 (1997). http://dx.doi.org/10.1557/proc-476-19.
Texto completoPremnath, Vijay Anirudh y Chih-Hao Chang. "Investigation of polymer template removal techniques in three-dimensional thin-shell nanolattices". Journal of Vacuum Science & Technology B 41, n.º 6 (17 de octubre de 2023). http://dx.doi.org/10.1116/6.0003036.
Texto completoBoumerzoug, Mohamed, Han Xu, Richard Bersin, Peter Mascher y Ginutis Balcaitis. "Removal of Titanium Oxide Grown on Titanium Nitride and Reduction of VIA Contact Resistance using a Modern Plasma Asher". MRS Proceedings 495 (1997). http://dx.doi.org/10.1557/proc-495-345.
Texto completoAdelung, Rainer, Mady Elbahri, Shiva Kumar Rudra, Abhijit Biswas, Seid Jebril, Rainer Kunz, Sebastian Wille y Michael Scharnberg. "Employing Thin Film Failure Mechanisms to Form Templates for Nano-electronics". MRS Proceedings 863 (2005). http://dx.doi.org/10.1557/proc-863-b7.3/o11.3.
Texto completoGuo, Hanwen, Xiaoying Chu, Yishun Guo, Jianhua Yang, Yingying Jin, Liyang Zhou, Yaou Peng, Qingying Wang, Fan Lu y Bailiang Wang. "A water transfer printing method for contact lenses surface 2D MXene modification to resist bacterial infection and inflammation". Science Advances 10, n.º 15 (12 de abril de 2024). http://dx.doi.org/10.1126/sciadv.adl3262.
Texto completoSandstrom, Clifford y Tim Olson. "Mask-less Laser Direct Imaging & Adaptive Patterning for Fan-Out Heterogeneous Integration". IMAPSource Proceedings 2022, DPC (14 de noviembre de 2023). http://dx.doi.org/10.4071/001c.90153.
Texto completoBorini, Stefano, Andrea M. Rossi, Luca Boarino y Giampiero Amato. "Etching Silicon Through an Effective Nanomask: An Electrochemical Way to Nanomachining". MRS Proceedings 872 (2005). http://dx.doi.org/10.1557/proc-872-j13.9.
Texto completoHockett, R. S., M. H. Herman, X. C. Mu y Li-Jia Ma. "Investigations of Residual Chlorine on Etched AlCu Metal Lines by Total Reflection X-Ray Fluorescence (TXRF)". MRS Proceedings 225 (1991). http://dx.doi.org/10.1557/proc-225-329.
Texto completoTian, Xiaoli, Fu Li, Zhenyuan Tang, Song Wang, Kangkang Weng, Dan Liu, Shaoyong Lu et al. "Crosslinking-induced patterning of MOFs by direct photo- and electron-beam lithography". Nature Communications 15, n.º 1 (4 de abril de 2024). http://dx.doi.org/10.1038/s41467-024-47293-6.
Texto completoHanevelt, Julia, Jelle F. Huisman, Laura W. Leicher, Miangela M. Lacle, Milan C. Richir, Paul Didden, Joost M. J. Geesing et al. "Limited wedge resection for T1 colon cancer (LIMERIC-II trial) – rationale and study protocol of a prospective multicenter clinical trial". BMC Gastroenterology 23, n.º 1 (19 de junio de 2023). http://dx.doi.org/10.1186/s12876-023-02854-9.
Texto completoMaras, Steven. "Reflections on Adobe Corporation, Bill Viola, and Peter Ramus while Printing Lecture Notes". M/C Journal 8, n.º 2 (1 de junio de 2005). http://dx.doi.org/10.5204/mcj.2338.
Texto completoLevey, Nick. "“Analysis Paralysis”: The Suspicion of Suspicion in the Fiction of David Foster Wallace". M/C Journal 15, n.º 1 (31 de octubre de 2011). http://dx.doi.org/10.5204/mcj.383.
Texto completoHughes, Karen Elizabeth. "Resilience, Agency and Resistance in the Storytelling Practice of Aunty Hilda Wilson (1911-2007), Ngarrindjeri Aboriginal Elder". M/C Journal 16, n.º 5 (28 de agosto de 2013). http://dx.doi.org/10.5204/mcj.714.
Texto completoBallard, Su. "Information, Noise and et al." M/C Journal 10, n.º 5 (1 de octubre de 2007). http://dx.doi.org/10.5204/mcj.2704.
Texto completoLombard, Kara-Jane. "“To Us Writers, the Differences Are Obvious”". M/C Journal 10, n.º 2 (1 de mayo de 2007). http://dx.doi.org/10.5204/mcj.2629.
Texto completoMurphy, Ffion y Richard Nile. "The Many Transformations of Albert Facey". M/C Journal 19, n.º 4 (31 de agosto de 2016). http://dx.doi.org/10.5204/mcj.1132.
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