Artículos de revistas sobre el tema "Photolithographie UV"
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Ballandras, S. y D. Hauden. "Applications aux microtechniques de la photolithographie profonde par UV et par rayonnement synchrotron". Annales de Physique 19 (octubre de 1994): C1–73—C1–85. http://dx.doi.org/10.1051/anphys/1994022.
Texto completoCasalboni, M., L. Dominici, V. Foglietti, F. Michelotti, E. Orsini, C. Palazzesi, F. Stella y P. Prosposito. "Bragg Grating Optical Filters by UV Nanoimprinting". Journal of Nanomaterials 2012 (2012): 1–5. http://dx.doi.org/10.1155/2012/186429.
Texto completoGuijt, Rosanne M. y Michael C. Breadmore. "Maskless photolithography using UV LEDs". Lab on a Chip 8, n.º 8 (2008): 1402. http://dx.doi.org/10.1039/b800465j.
Texto completoNoniewicz, Konrad, Zbigniew K. Brzozowski y Irmina Zadrozna. "UV-sensitive polyarylates as photolithographic emulsions". Journal of Applied Polymer Science 60, n.º 7 (16 de mayo de 1996): 1071–82. http://dx.doi.org/10.1002/(sici)1097-4628(19960516)60:7<1071::aid-app19>3.0.co;2-3.
Texto completoMagklaras, Aris, Panayiotis Alefragis, Christos Gogos, Christos Valouxis y Alexios Birbas. "A Genetic Algorithm-Enhanced Sensor Marks Selection Algorithm for Wavefront Aberration Modeling in Extreme-UV (EUV) Photolithography". Information 14, n.º 8 (28 de julio de 2023): 428. http://dx.doi.org/10.3390/info14080428.
Texto completoGordillo, H., I. Suárez, R. Abargues, P. Rodríguez-Cantó, S. Albert y J. P. Martínez-Pastor. "Polymer/QDs Nanocomposites for Waveguiding Applications". Journal of Nanomaterials 2012 (2012): 1–9. http://dx.doi.org/10.1155/2012/960201.
Texto completoWu, Chun-Ying, Heng Hsieh y Yung-Chun Lee. "Contact Photolithography at Sub-Micrometer Scale Using a Soft Photomask". Micromachines 10, n.º 8 (18 de agosto de 2019): 547. http://dx.doi.org/10.3390/mi10080547.
Texto completoCritchley, Kevin, Lixin Zhang, Hitoshi Fukushima, Masaya Ishida, Tatsuya Shimoda, Richard J. Bushby y Stephen D. Evans. "Soft-UV Photolithography using Self-Assembled Monolayers". Journal of Physical Chemistry B 110, n.º 34 (agosto de 2006): 17167–74. http://dx.doi.org/10.1021/jp0630370.
Texto completoHoriuchi, S., T. Fujita, T. Hayakawa y Y. Nakao. "Micropatterning of Metal Nanoparticles via UV Photolithography". Advanced Materials 15, n.º 17 (3 de septiembre de 2003): 1449–52. http://dx.doi.org/10.1002/adma.200305270.
Texto completoZaki, M., Uda Hashim, Mohd Khairuddin Md Arshad, M. Nurfaiz, M. F. M. Fathil, A. H. Azman y R. M. Ayub. "Optimization on Conventional Photolithography Process of 0.98 μm Gap Design for Micro Gap Biosensor Application". Applied Mechanics and Materials 754-755 (abril de 2015): 524–29. http://dx.doi.org/10.4028/www.scientific.net/amm.754-755.524.
Texto completoLowe, Jimmy, Carl Bartels y Steven Holdcroft. "Synthesis and properties of a sterically encumbered poly(thienylene vinylene): poly[E-1,2-(4,4prime-dihexyl-2,2prime-dithienyl)ethylene]". Canadian Journal of Chemistry 76, n.º 11 (1 de noviembre de 1998): 1524–29. http://dx.doi.org/10.1139/v98-110.
Texto completoGoodall, F., RA Lawes y PH Sharp. "Excimer lasers as deep UV sources for photolithographic system". Microelectronic Engineering 5, n.º 1-4 (diciembre de 1986): 445–52. http://dx.doi.org/10.1016/0167-9317(86)90075-4.
Texto completoRoth, S., L. Dellmann, G.-A. Racine y N. F. de Rooij. "High aspect ratio UV photolithography for electroplated structures". Journal of Micromechanics and Microengineering 9, n.º 2 (1 de enero de 1999): 105–8. http://dx.doi.org/10.1088/0960-1317/9/2/001.
Texto completoMontague, Martha F. y Craig J. Hawker. "Secondary Patterning of UV Imprint Features by Photolithography". Chemistry of Materials 19, n.º 3 (febrero de 2007): 526–34. http://dx.doi.org/10.1021/cm0622102.
Texto completoLamprecht, B., E. Kraker, G. Weirum, H. Ditlbacher, G. Jakopic, G. Leising y J. R. Krenn. "Organic optoelectronic device fabrication using standard UV photolithography". physica status solidi (RRL) – Rapid Research Letters 2, n.º 1 (enero de 2008): 16–18. http://dx.doi.org/10.1002/pssr.200701250.
Texto completoTam, Joyce y Ozlem Yasar. "Multi Material 3D Scaffold Printing with Maskless Photolithography". MRS Advances 2, n.º 24 (2017): 1303–8. http://dx.doi.org/10.1557/adv.2017.21.
Texto completoAraki, Hitoshi, Akira Shimada, Hisashi Ogasawara, Masaya Jukei, Takenori Fujiwara y Masao Tomikawa. "Low Temperature Curable Low Dk & Df Polyimide for Antenna in Package". International Symposium on Microelectronics 2021, n.º 1 (1 de octubre de 2021): 000130–35. http://dx.doi.org/10.4071/1085-8024-2021.1.000130.
Texto completoTyagi, Pawan, Edward Friebe, Beachrhell Jacques, Tobias Goulet, Stanley Travers y Francisco J. Garcia-Moreno. "Taguchi Design of Experiment Enabling the Reduction of Spikes on the Sides of Patterned Thin Films for Tunnel Junction Fabrication". MRS Advances 2, n.º 52 (2017): 3025–30. http://dx.doi.org/10.1557/adv.2017.456.
Texto completoKaltashov, Alexander, Prabu Karthick Parameshwar, Nicholas Lin y Christopher Moraes. "Accessible, large-area, uniform dose photolithography using a moving light source". Journal of Micromechanics and Microengineering 32, n.º 2 (20 de diciembre de 2021): 027001. http://dx.doi.org/10.1088/1361-6439/ac4005.
Texto completoLin, Hung Yi, Yong Shan Sun, Shih Liang Chen y Mao Kuo Wei. "Microlens Array Fabrication by 3D Diffuser Lithography for Light Enhancement of Organic Light-Emitting Devices". Key Engineering Materials 625 (agosto de 2014): 430–36. http://dx.doi.org/10.4028/www.scientific.net/kem.625.430.
Texto completoReynolds, David Eun, Olivia Lewallen, George Galanis y Jina Ko. "A Customizable and Low-Cost Ultraviolet Exposure System for Photolithography". Micromachines 13, n.º 12 (1 de diciembre de 2022): 2129. http://dx.doi.org/10.3390/mi13122129.
Texto completoLIAO, K. J., W. L. WANG, C. Z. CAI, X. S. WANG y C. Y. KONG. "UV PHOTODETECTORS OF c-BN FILMS". International Journal of Modern Physics B 16, n.º 06n07 (20 de marzo de 2002): 1115–19. http://dx.doi.org/10.1142/s0217979202010968.
Texto completoToyama, Yoshisuke y Hirokazu Ikeda. "13‐2: Invited Paper: Advanced Patterning Method Exceeding a Limitation of Lithography with Resolution Enhancement Technology (RET)". SID Symposium Digest of Technical Papers 54, n.º 1 (junio de 2023): 158–61. http://dx.doi.org/10.1002/sdtp.16513.
Texto completoBeck, Anthony, Franziska Obst, Mathias Busek, Stefan Grünzner, Philipp Mehner, Georgi Paschew, Dietmar Appelhans, Brigitte Voit y Andreas Richter. "Hydrogel Patterns in Microfluidic Devices by Do-It-Yourself UV-Photolithography Suitable for Very Large-Scale Integration". Micromachines 11, n.º 5 (2 de mayo de 2020): 479. http://dx.doi.org/10.3390/mi11050479.
Texto completoPrashad, Ramesh y Ozlem Yasar. "Three-Dimensional Scaffold Fabrication with Inverse Photolithography". MRS Advances 2, n.º 19-20 (15 de diciembre de 2016): 1071–75. http://dx.doi.org/10.1557/adv.2016.620.
Texto completoSuwandi, Dedi, Yudan Whulanza y Jos Istiyanto. "Visible Light Maskless Photolithography for Biomachining Application". Applied Mechanics and Materials 493 (enero de 2014): 552–57. http://dx.doi.org/10.4028/www.scientific.net/amm.493.552.
Texto completoSEKIGUCHI, Ten, Ryo ICHIGE, Hidetaka UENO y Takaaki SUZUKI. "Shape Evaluation of UV-PDMS Microstructures Made by Using Photolithography". Proceedings of the Conference on Information, Intelligence and Precision Equipment : IIP 2022 (2022): IIP1R1—E06. http://dx.doi.org/10.1299/jsmeiip.2022.iip1r1-e06.
Texto completoLiu, Junbo, Shaolin Zhou, Song Hu, Hongtao Gao, Yu He y Yiguang Cheng. "Spectrum-Integral Talbot Effect for UV Photolithography With Extended DOF". IEEE Photonics Technology Letters 27, n.º 20 (15 de octubre de 2015): 2201–4. http://dx.doi.org/10.1109/lpt.2015.2456184.
Texto completoHemanth, Suhith, Thomas A. Anhøj, Claudia Caviglia y Stephan S. Keller. "Suspended microstructures of epoxy based photoresists fabricated with UV photolithography". Microelectronic Engineering 176 (mayo de 2017): 40–44. http://dx.doi.org/10.1016/j.mee.2017.01.026.
Texto completoLu, Yang, Jinbao Guo, Hao Wang y Jie Wei. "Flexible Bistable Smectic-A Liquid Crystal Device Using Photolithography and Photoinduced Phase Separation". Advances in Condensed Matter Physics 2012 (2012): 1–9. http://dx.doi.org/10.1155/2012/843264.
Texto completoFantino, Erika, Alessandra Vitale, Marzia Quaglio, Matteo Cocuzza, Candido F. Pirri y Roberta Bongiovanni. "Blue and UV combined photolithographic polymerization for the patterning of thick structures". Chemical Engineering Journal 267 (mayo de 2015): 65–72. http://dx.doi.org/10.1016/j.cej.2014.12.088.
Texto completoGupta, Ishi, Manika Choudhury, G. Harish Gnanasambanthan y Debashis Maji. "Optimization of Microstructure Patterning for Flexible Bioelectronics Application". International Journal of Electrical and Electronics Research 11, n.º 3 (20 de septiembre de 2023): 738–42. http://dx.doi.org/10.37391/ijeer.110315.
Texto completoKang, Myeongwoo, Jae Hwan Byun, Sangcheol Na y Noo Li Jeon. "Fabrication of functional 3D multi-level microstructures on transparent substrates by one step back-side UV photolithography". RSC Advances 7, n.º 22 (2017): 13353–61. http://dx.doi.org/10.1039/c6ra28812j.
Texto completoSun, Ke, Gai Wu, Kang Liang, Bin Sun y Jian Wang. "Investigation into Photolithography Process of FPCB with 18 µm Line Pitch". Micromachines 14, n.º 5 (10 de mayo de 2023): 1020. http://dx.doi.org/10.3390/mi14051020.
Texto completoNaggay, Benjamin K., Kerstin Frey, Markus Schneider, Kiriaki Athanasopulu, Günter Lorenz y Ralf Kemkemer. "Low-cost photolithography system for cell biology labs". Current Directions in Biomedical Engineering 7, n.º 2 (1 de octubre de 2021): 550–53. http://dx.doi.org/10.1515/cdbme-2021-2140.
Texto completoLi, Bo. "Low-stress ultra-thick SU-8 UV photolithography process for MEMS". Journal of Micro/Nanolithography, MEMS, and MOEMS 4, n.º 4 (1 de octubre de 2005): 043008. http://dx.doi.org/10.1117/1.2117108.
Texto completoKim, Pan Kyeom, Sung-Il Chung, Tae-Gyu Ha y Myung Yung Jeong. "The Fabrication of a Cylindrical Nano Mold Based on UV Photolithography". Science of Advanced Materials 12, n.º 3 (1 de marzo de 2020): 407–11. http://dx.doi.org/10.1166/sam.2020.3652.
Texto completoWhitfield, Michael D., Stuart P. Lansley, Olivier Gaudin, Robert D. McKeag, Nadeem Rizvi y Richard B. Jackman. "Diamond photodetectors for next generation 157-nm deep-UV photolithography tools". Diamond and Related Materials 10, n.º 3-7 (marzo de 2001): 693–97. http://dx.doi.org/10.1016/s0925-9635(00)00518-5.
Texto completoBing, Chu Yih, Ajay Achath Mohanan, Tridib Saha, Ramakrishnan Nagasundara Ramanan, R. Parthiban y N. Ramakrishnan. "Microfabrication of surface acoustic wave device using UV LED photolithography technique". Microelectronic Engineering 122 (junio de 2014): 9–12. http://dx.doi.org/10.1016/j.mee.2014.03.011.
Texto completoShao, Dongbing y Shaochen Chen. "Surface plasmon assisted contact scheme nanoscale photolithography using an UV lamp". Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 26, n.º 1 (2008): 227. http://dx.doi.org/10.1116/1.2834688.
Texto completoSekiguchi, Ten, Hidetaka Ueno, Vivek Anand Menon, Ryo Ichige, Yuya Tanaka, Hiroshi Toshiyoshi y Takaaki Suzuki. "UV-curable Polydimethylsiloxane Photolithography and Its Application to Flexible Mechanical Metamaterials". Sensors and Materials 35, n.º 6 (27 de junio de 2023): 1995. http://dx.doi.org/10.18494/sam4351.
Texto completoHuang, Wenhai, Taige Liu, Zhe Wang, Xiangdong Yuan, Bo Zhang, Chai Hu, Kewei Liu, Jiashuo Shi y Xinyu Zhang. "Flexible refractive and diffractive micro-optical films shaped by fitting aspherical microprofiles with featured aperture and depth and their spatial arrangement for imaging applications". Journal of Vacuum Science & Technology B 40, n.º 2 (marzo de 2022): 022804. http://dx.doi.org/10.1116/6.0001586.
Texto completoNothdurft, Philipp, Jörg Schauberger, Gisbert Riess y Wolfgang Kern. "Preparation of a Water-Based Photoreactive Azosulphonate-Doped Poly(Vinyl Alcohol) and the Investigation of Its UV Response". Polymers 11, n.º 1 (18 de enero de 2019): 169. http://dx.doi.org/10.3390/polym11010169.
Texto completoLiang, Banglong, Zili Wang, Cheng Qian, Yi Ren, Bo Sun, Dezhen Yang, Zhou Jing y Jiajie Fan. "Investigation of Step-Stress Accelerated Degradation Test Strategy for Ultraviolet Light Emitting Diodes". Materials 12, n.º 19 (25 de septiembre de 2019): 3119. http://dx.doi.org/10.3390/ma12193119.
Texto completoHu, Haikun, Zhou Lu, Jiasheng Li y Zongtao Li. "P‐11.3: Manufacturing Quantum Dot Pixel Array via Self‐Assembling on Hydrophobic‐Hydrophilic Transformation Substrate". SID Symposium Digest of Technical Papers 54, S1 (abril de 2023): 836–40. http://dx.doi.org/10.1002/sdtp.16428.
Texto completoKasi, Dhanesh G., Mees N. S. de Graaf, Paul A. Motreuil-Ragot, Jean-Phillipe M. S. Frimat, Michel D. Ferrari, Pasqualina M. Sarro, Massimo Mastrangeli, Arn M. J. M. van den Maagdenberg, Christine L. Mummery y Valeria V. Orlova. "Rapid Prototyping of Organ-on-a-Chip Devices Using Maskless Photolithography". Micromachines 13, n.º 1 (29 de diciembre de 2021): 49. http://dx.doi.org/10.3390/mi13010049.
Texto completoWu, Yu y Zihao Xiao. "The Recent Progress of Lithography Machine and the State-of-art Facilities". Highlights in Science, Engineering and Technology 5 (7 de julio de 2022): 155–65. http://dx.doi.org/10.54097/hset.v5i.737.
Texto completoNiu, Xi-Zhi, Richard D. Pepel, Rodrigo Paniego, Jim A. Field, Jon Chorover, Leif Abrell, A. Eduardo Sáez y Reyes Sierra-Alvarez. "Photochemical fate of sulfonium photoacid generator cations under photolithography relevant UV irradiation". Journal of Photochemistry and Photobiology A: Chemistry 416 (julio de 2021): 113324. http://dx.doi.org/10.1016/j.jphotochem.2021.113324.
Texto completoYasar, Ozlem y Binil Starly. "Fabrication of Lindenmayer System-Based Designed Engineered Scaffolds Using UV-Maskless Photolithography". MRS Advances 1, n.º 11 (2016): 749–54. http://dx.doi.org/10.1557/adv.2016.223.
Texto completoThackeray, James W., George W. Orsula, Dianne Canistro y Amanda K. Berry. "Evaluation of deep UV ANR photoresists for 248.4 nm. excimer laser photolithography." Journal of Photopolymer Science and Technology 2, n.º 3 (1989): 429–43. http://dx.doi.org/10.2494/photopolymer.2.429.
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