Artículos de revistas sobre el tema "Pe(ald)"
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Onaya, Takashi y Koji Kita. "(Invited) Role of Oxidant Gas for Atomic Layer Deposition of HfxZr1−XO2 Thin Films on Ferroelectricity of Metal-Ferroelectric-Metal Capacitors". ECS Transactions 113, n.º 2 (17 de mayo de 2024): 51–59. http://dx.doi.org/10.1149/11302.0051ecst.
Texto completoHaeberle, Jörg, Karsten Henkel, Hassan Gargouri, Franziska Naumann, Bernd Gruska, Michael Arens, Massimo Tallarida y Dieter Schmeißer. "Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films". Beilstein Journal of Nanotechnology 4 (8 de noviembre de 2013): 732–42. http://dx.doi.org/10.3762/bjnano.4.83.
Texto completoVan Daele, Michiel, Christophe Detavernier y Jolien Dendooven. "Surface species during ALD of platinum observed with in situ reflection IR spectroscopy". Physical Chemistry Chemical Physics 20, n.º 39 (2018): 25343–56. http://dx.doi.org/10.1039/c8cp03585g.
Texto completoMione, M. A., V. Vandalon, W. M. M. Kessels y F. Roozeboom. "Temperature study of atmospheric-pressure plasma-enhanced spatial ALD of Al2O3 using infrared and optical emission spectroscopy". Journal of Vacuum Science & Technology A 40, n.º 6 (diciembre de 2022): 062407. http://dx.doi.org/10.1116/6.0002158.
Texto completoDo Nascimento, Cleonilde Maria, Alex José de Melo Silva, Jéssica Paula Lucena, Juliana Ellen de Melo Gama, Cícero Jádson Da Costa, Elane Beatriz de Jesus Oliveira, Danielle Maria Nascimento Moura, Helotonio Carvalho y Sheilla Andrade De Oliveira. "Epidemiological profile of the main prevalent liver diseases in Brazil Northeast and possible impacts associated with the COVID-19 pandemic". Cuadernos de Educación y Desarrollo 15, n.º 12 (21 de diciembre de 2023): 16916–41. http://dx.doi.org/10.55905/cuadv15n12-096.
Texto completoRoy, Amit K., Jolien Dendooven, Davy Deduytsche, Kilian Devloo-Casier, Kim Ragaert, Ludwig Cardon y Christophe Detavernier. "Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene". Chemical Communications 51, n.º 17 (2015): 3556–58. http://dx.doi.org/10.1039/c4cc09474c.
Texto completoGebhard, M., F. Mitschker, M. Wiesing, I. Giner, B. Torun, T. de los Arcos, P. Awakowicz, G. Grundmeier y A. Devi. "An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor". Journal of Materials Chemistry C 4, n.º 5 (2016): 1057–65. http://dx.doi.org/10.1039/c5tc03385c.
Texto completoKarbalaei Akbari, Mohammad, Nasrin Siraj Lopa y Serge Zhuiykov. "Atomic Layer Deposition of Ultra-Thin Crystalline Electron Channels for Heterointerface Polarization at Two-Dimensional Metal-Semiconductor Heterojunctions". Coatings 13, n.º 6 (3 de junio de 2023): 1041. http://dx.doi.org/10.3390/coatings13061041.
Texto completoDobbelaere, Thomas, Felix Mattelaer, Amit Kumar Roy, Philippe Vereecken y Christophe Detavernier. "Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries". Journal of Materials Chemistry A 5, n.º 1 (2017): 330–38. http://dx.doi.org/10.1039/c6ta04179e.
Texto completoPark, Yongju, Woonyoung Lee, Yongkook Choi, Hyunkyu Lee y Jinseong Park. "Characteristics of Tin Oxide Thin Films Deposited by PE-ALD". Korean Journal of Materials Research 14, n.º 12 (1 de diciembre de 2004): 840–45. http://dx.doi.org/10.3740/mrsk.2004.14.12.840.
Texto completoLee, W., K. Hong, Y. Park, N. H. Kim, Y. Choi y J. Park. "Surface and sensing properties of PE-ALD SnO2 thin film". Electronics Letters 41, n.º 8 (2005): 475. http://dx.doi.org/10.1049/el:20058174.
Texto completoGudovskikh, Alexander S., Alexander V. Uvarov, Ivan A. Morozov, Artem I. Baranov, Dmitry A. Kudryashov, Kirill S. Zelentsov, Alexandre Jaffré et al. "Interface Properties of GaP/Si Heterojunction Fabricated by PE‐ALD". physica status solidi (a) 216, n.º 10 (18 de diciembre de 2018): 1800617. http://dx.doi.org/10.1002/pssa.201800617.
Texto completoXiao, Zhigang, Kim Kisslinger y Rebhadevi Monikandan. "Atomic Layer Deposition of Nanolayered Carbon Films". C 7, n.º 4 (27 de septiembre de 2021): 67. http://dx.doi.org/10.3390/c7040067.
Texto completoFang, Guo-Yong, Li-Na Xu, Yan-Qiang Cao, Lai-Guo Wang, Di Wu y Ai-Dong Li. "Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2". Chemical Communications 51, n.º 7 (2015): 1341–44. http://dx.doi.org/10.1039/c4cc08004a.
Texto completoKim, Myoungsub, Youngjun Kim, Minkyu Lee, Seok Man Hong, Hyung Keun Kim, Sijung Yoo, Taehoon Kim, Seung-min Chung, Taeyoon Lee y Hyungjun Kim. "PE-ALD of Ge1−xSx amorphous chalcogenide alloys for OTS applications". Journal of Materials Chemistry C 9, n.º 18 (2021): 6006–13. http://dx.doi.org/10.1039/d1tc00650a.
Texto completoBaranov, A. I., A. S. Gudovskikh, A. Darga, S. Le Gall y J.-P. Kleider. "Capacitance characterization of GaP/n-Si structures grown by PE-ALD". Journal of Physics: Conference Series 917 (noviembre de 2017): 052027. http://dx.doi.org/10.1088/1742-6596/917/5/052027.
Texto completoBaranov, Artem I., Alexander S. Gudovskikh, Dmitriy A. Kudryashov, Ivan A. Morozov, Alexey M. Mozharov, Ekaterina V. Nikitina, Kirill S. Zelentsov, Arouna Darga, Sylvain Le Gall y Jean-Paul Kleider. "Influence of PE-ALD of GaP on the Silicon Wafers Quality". physica status solidi (a) 214, n.º 12 (9 de octubre de 2017): 1700685. http://dx.doi.org/10.1002/pssa.201700685.
Texto completoSchilirò, Emanuela, Salvatore di Franco, Patrick Fiorenza, Corrado Bongiorno, Hassan Gargouri, Mario Saggio, Raffaella Lo Nigro y Fabrizio Roccaforte. "Atomic Layer Deposition of Al2O3 Thin Films for Metal Insulator Semiconductor Applications on 4H-SiC". Materials Science Forum 858 (mayo de 2016): 685–88. http://dx.doi.org/10.4028/www.scientific.net/msf.858.685.
Texto completoWei, Wenlu, Baojun Yan, Yuekun Heng, Shulin Liu, Binting Zhang, Huaxing Peng, Yuman Wang y Kaile Wen. "Secondary electron emission characteristics of alumina coating on metallic substrate prepared by atomic layer deposition". Journal of Instrumentation 18, n.º 02 (1 de febrero de 2023): P02002. http://dx.doi.org/10.1088/1748-0221/18/02/p02002.
Texto completoLee, Si Young, Julia D. Lenef, Kalyn M. Fuelling, Kevin Enrique Rivera Cruz, Aditya Prajapati, Daniel O. Delgado Cornejo, Tae H. Cho et al. "Atomic Layer Deposition of Cu Catalysts on Gas Diffusion Electrodes for Electrochemical CO2 Reduction". ECS Meeting Abstracts MA2024-01, n.º 37 (9 de agosto de 2024): 2198. http://dx.doi.org/10.1149/ma2024-01372198mtgabs.
Texto completoPerrotta, Alberto, Julian Pilz, Stefan Pachmajer, Antonella Milella y Anna Maria Coclite. "On the transformation of “zincone”-like into porous ZnO thin films from sub-saturated plasma enhanced atomic layer deposition". Beilstein Journal of Nanotechnology 10 (21 de marzo de 2019): 746–59. http://dx.doi.org/10.3762/bjnano.10.74.
Texto completoPerrotta, Alberto, Julian Pilz, Roland Resel, Oliver Werzer y Anna Maria Coclite. "Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO". Crystals 10, n.º 4 (10 de abril de 2020): 291. http://dx.doi.org/10.3390/cryst10040291.
Texto completoDallaev, Rashid. "Investigation of hydrogen impurities in PE-ALD AlN thin films by IBA methods". Vacuum 193 (noviembre de 2021): 110533. http://dx.doi.org/10.1016/j.vacuum.2021.110533.
Texto completoGudovskikh, A. S., A. V. Uvarov, I. A. Morozov, A. I. Baranov, D. A. Kudryashov, E. V. Nikitina, A. A. Bukatin et al. "Si doped GaP layers grown on Si wafers by low temperature PE-ALD". Journal of Renewable and Sustainable Energy 10, n.º 2 (marzo de 2018): 021001. http://dx.doi.org/10.1063/1.5000256.
Texto completoPrapaipong, Chanitda, Dheerawan Boonyawan, Chanchai Umongno, Supab Choopun y Pipat Ruankham. "A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer". Materials Today: Proceedings 17 (2019): 1521–30. http://dx.doi.org/10.1016/j.matpr.2019.06.177.
Texto completoSimon, Nicolai, Maria Asplund, Thomas Stieglitz y Volker Bucher. "Plasma Enhanced Atomic Layer Deposition of Iridium Oxide for Application in Miniaturized Neural Implants". Current Directions in Biomedical Engineering 7, n.º 2 (1 de octubre de 2021): 539–42. http://dx.doi.org/10.1515/cdbme-2021-2137.
Texto completoD'Acunto, Giulio, Sanzeeda Baig Shuchi, Xueli Zheng, Yi Cui y Stacey F. Bent. "ALD with Enhanced Nucleation on Polymeric Separator for Improved Li-S Batteries". ECS Meeting Abstracts MA2024-01, n.º 1 (9 de agosto de 2024): 110. http://dx.doi.org/10.1149/ma2024-011110mtgabs.
Texto completoJin, Jidong, Jiawei Zhang, Andrew Shaw, Valeriya N. Kudina, Ivona Z. Mitrovic, Jacqueline S. Wrench, Paul R. Chalker, Claudio Balocco, Aimin Song y Steve Hall. "A high speed PE-ALD ZnO Schottky diode rectifier with low interface-state density". Journal of Physics D: Applied Physics 51, n.º 6 (19 de enero de 2018): 065102. http://dx.doi.org/10.1088/1361-6463/aaa4a2.
Texto completoKim, Myoungsub, Youngjun Kim, Inkyu Sohn y Hyungjun Kim. "Growth and Electrical Characteristics of PE-ALD Germanium Sulfide for 3D Cross-Point Memory". ECS Meeting Abstracts MA2020-02, n.º 23 (23 de noviembre de 2020): 1686. http://dx.doi.org/10.1149/ma2020-02231686mtgabs.
Texto completoXiao, Zhigang, Kim Kisslinger, Sam Chance y Samuel Banks. "Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials". Crystals 10, n.º 2 (23 de febrero de 2020): 136. http://dx.doi.org/10.3390/cryst10020136.
Texto completoYalcin, Emine B., Ming Tong, Camilla Homans y Suzanne M. de la Monte. "Myriocin Treatment Reverses Alcohol-Induced Alterations in Polyunsaturated Fatty Acid-Containing Phospholipid Expression in the Liver". Nutrition and Metabolic Insights 15 (enero de 2022): 117863882210820. http://dx.doi.org/10.1177/11786388221082012.
Texto completoMitschker, F., S. Steves, M. Gebhard, M. Rudolph, L. Schücke, D. Kirchheim, M. Jaritz et al. "Influence of PE-CVD and PE-ALD on defect formation in permeation barrier films on PET and correlation to atomic oxygen fluence". Journal of Physics D: Applied Physics 50, n.º 23 (18 de mayo de 2017): 235201. http://dx.doi.org/10.1088/1361-6463/aa6e28.
Texto completoHur, Jae Seok, Min Jae Kim, Seong Hun Yoon y Jae Kyeong Jeong. "P‐154: Late‐News Poster: High‐Performance Indium‐Gallium Oxide Thin‐Film‐Transistors via Plasma‐Enhanced Atomic‐Layer‐Deposition". SID Symposium Digest of Technical Papers 54, n.º 1 (junio de 2023): 1826–28. http://dx.doi.org/10.1002/sdtp.16962.
Texto completoHoppe, Christian, Felix Mitschker, Lukas Mai, Maciej Oskar Liedke, Teresa Arcos, Peter Awakowicz, Anjana Devi et al. "Influence of surface activation on the microporosity of PE‐CVD and PE‐ALD SiO x thin films on PDMS". Plasma Processes and Polymers 19, n.º 4 (22 de enero de 2022): 2100174. http://dx.doi.org/10.1002/ppap.202100174.
Texto completoLiu, Ji y Michael Nolan. "Modeling the Atomic Layer Deposition of Metal Thin Films: Studying the Surface Reaction Mechanism By Density Functional Theory Simulations". ECS Meeting Abstracts MA2023-02, n.º 29 (22 de diciembre de 2023): 1499. http://dx.doi.org/10.1149/ma2023-02291499mtgabs.
Texto completoDjara, Vladimir, Lukas Czornomaz, Veeresh Deshpande, Nicolas Daix, Emanuele Uccelli, Daniele Caimi, Marilyne Sousa y Jean Fompeyrine. "Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal". Solid-State Electronics 115 (enero de 2016): 103–8. http://dx.doi.org/10.1016/j.sse.2015.08.018.
Texto completoBarreca, Davide, Giorgio Carraro, Michael E. A. Warwick, Kimmo Kaunisto, Alberto Gasparotto, Valentina Gombac, Cinzia Sada et al. "Fe2O3–TiO2nanosystems by a hybrid PE-CVD/ALD approach: controllable synthesis, growth mechanism, and photocatalytic properties". CrystEngComm 17, n.º 32 (2015): 6219–26. http://dx.doi.org/10.1039/c5ce00883b.
Texto completoGudovskikh, A. S., A. I. Baranov, A. V. Uvarov, D. A. Kudryashov y J.-P. Kleider. "Space charge capacitance study of GaP/Si multilayer structures grown by plasma deposition". Journal of Physics D: Applied Physics 55, n.º 13 (30 de diciembre de 2021): 135103. http://dx.doi.org/10.1088/1361-6463/ac41fa.
Texto completoJeong, Heon Jun, Hyun Soo Park, Keun Hee Kim, Wanhyuk Chang, Yoon Seong Kim, Yun Sung Choi y Joon Hyung Shim. "Performance Improvement of Proton Ceramic Fuel Cells through Surface Treatment of Cobalt Oxide Nanoparticles on Perovskite Oxide". ECS Transactions 111, n.º 6 (19 de mayo de 2023): 2155–60. http://dx.doi.org/10.1149/11106.2155ecst.
Texto completoBaranov, A. I., A. V. Uvarov, D. A. Kudryashov, I. A. Morozov y A. S. Gudovskikh. "Influence of plasma on electrophysical properties of the GaP/n-Si isotype heterojunction grown by PE-ALD". Journal of Physics: Conference Series 1482 (marzo de 2020): 012017. http://dx.doi.org/10.1088/1742-6596/1482/1/012017.
Texto completoCastillo-Saenz, Jhonathan, Nicola Nedev, Benjamín Valdez-Salas, Mario Curiel-Alvarez, María Isabel Mendivil-Palma, Norberto Hernandez-Como, Marcelo Martinez-Puente, David Mateos, Oscar Perez-Landeros y Eduardo Martinez-Guerra. "Properties of Al2O3 Thin Films Grown by PE-ALD at Low Temperature Using H2O and O2 Plasma Oxidants". Coatings 11, n.º 10 (19 de octubre de 2021): 1266. http://dx.doi.org/10.3390/coatings11101266.
Texto completoChoi, Gwangpyo, L. Satyanarayana y Jinseong Park. "Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing". Applied Surface Science 252, n.º 22 (septiembre de 2006): 7878–83. http://dx.doi.org/10.1016/j.apsusc.2005.09.069.
Texto completoShen, Jie, Fred Roozeboom y Alfredo Mameli. "Atmospheric-pressure plasma-enhanced spatial atomic layer deposition of silicon nitride at low temperature". Atomic Layer Deposition 1 (27 de marzo de 2023): 1–11. http://dx.doi.org/10.3897/aldj.1.101651.
Texto completoSong, Hohyun, Sanghun Seo y Hongyoung Chang. "Study on SiN and SiCN film production using PE-ALD process with high-density multi-ICP source at low temperature". Current Applied Physics 18, n.º 11 (noviembre de 2018): 1436–40. http://dx.doi.org/10.1016/j.cap.2018.08.012.
Texto completoStarostin, Sergey A., Wytze Keuning, Jean-Paul Schalken, Mariadriana Creatore, Wilhelmus M. M. Erwin Kessels, Jan B. Bouwstra, Mauritius C. M. Richard van de Sanden y Hindrik W. de Vries. "Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers". Plasma Processes and Polymers 13, n.º 3 (31 de agosto de 2015): 311–15. http://dx.doi.org/10.1002/ppap.201500096.
Texto completoHansen, Katherine, Melissa Cardona, Amartya Dutta y Chen Yang. "Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3". Materials 13, n.º 5 (27 de febrero de 2020): 1058. http://dx.doi.org/10.3390/ma13051058.
Texto completoWu, Chien-Hung, Kow-Ming Chang, Sung-Hung Huang, I.-Chung Deng, Chin-Jyi Wu, Wei-Han Chiang y Chia-Chiang Chang. "Characteristics of IGZO TFT Prepared by Atmospheric Pressure Plasma Jet Using PE-ALD $\hbox{Al}_{2}\hbox{O}_{3}$ Gate Dielectric". IEEE Electron Device Letters 33, n.º 4 (abril de 2012): 552–54. http://dx.doi.org/10.1109/led.2012.2185774.
Texto completoLee, Baek-Ju, Dong-Won Seo y Jae-Wook Choi. "A Study on the Gap-Fill Process Deposited by the Deposition/Etch/Deposition Method in the Space-Divided PE-ALD System". Coatings 13, n.º 1 (27 de diciembre de 2022): 48. http://dx.doi.org/10.3390/coatings13010048.
Texto completoKull, Mikk, Helle-Mai Piirsoo, Aivar Tarre, Hugo Mändar, Aile Tamm y Taivo Jõgiaas. "Hardness, Modulus, and Refractive Index of Plasma-Assisted Atomic-Layer-Deposited Hafnium Oxide Thin Films Doped with Aluminum Oxide". Nanomaterials 13, n.º 10 (10 de mayo de 2023): 1607. http://dx.doi.org/10.3390/nano13101607.
Texto completoPapalia, John, Nathan Marchack, Robert Bruce, Hiroyuki Miyazoe, Sebastian Engelmann y Eric A. Joseph. "Applications for Surface Engineering Using Atomic Layer Etching - Invited Paper". Solid State Phenomena 255 (septiembre de 2016): 41–48. http://dx.doi.org/10.4028/www.scientific.net/ssp.255.41.
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