Artículos de revistas sobre el tema "NM TECHNOLOGY NODE"
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Itani, Toshiro. "157 nm Lithography for 70 nm Technology Node". Japanese Journal of Applied Physics 41, Part 1, No. 6B (30 de junio de 2002): 4033–36. http://dx.doi.org/10.1143/jjap.41.4033.
Texto completoThompson, K., J. H. Booske, Y. B. Gianchandani y R. F. Cooper. "Electromagnetic annealing for the 100 nm technology node". IEEE Electron Device Letters 23, n.º 3 (marzo de 2002): 127–29. http://dx.doi.org/10.1109/55.988813.
Texto completoOgawa, Yoshihiro. "Cleaning Technology for Advanced Devices beyond 20 nm Node". Solid State Phenomena 195 (diciembre de 2012): 7–12. http://dx.doi.org/10.4028/www.scientific.net/ssp.195.7.
Texto completoSHAHIDI, GHAVAM G. "ARE WE AT THE END OF CMOS SCALING?" International Journal of High Speed Electronics and Systems 16, n.º 01 (marzo de 2006): 3–8. http://dx.doi.org/10.1142/s0129156406003503.
Texto completoFeudel, Thomas. "Advanced Annealing Schemes for High-Performance SOI Logic Technologies". Materials Science Forum 573-574 (marzo de 2008): 387–400. http://dx.doi.org/10.4028/www.scientific.net/msf.573-574.387.
Texto completoLi, Zongru, Christopher Jarrett Elash, Chen Jin, Li Chen, Jiesi Xing, Zhiwu Yang y Shuting Shi. "Comparison of Total Ionizing Dose Effects in 22-nm and 28-nm FD SOI Technologies". Electronics 11, n.º 11 (1 de junio de 2022): 1757. http://dx.doi.org/10.3390/electronics11111757.
Texto completoSuganaga, Toshifumi. "157 nm lithography with high numerical aperture lens for the 70 nm technology node". Journal of Micro/Nanolithography, MEMS, and MOEMS 1, n.º 3 (1 de octubre de 2002): 206. http://dx.doi.org/10.1117/1.1501565.
Texto completoAllgair, John, Benjamin Bunday, Aaron Cordes, Pete Lipscomb, Milt Godwin, Victor Vartanian, Michael Bishop, Doron Arazi y Kye-Weon Kim. "Metrology Requirements for the 32 nm Technology Node and Beyond". ECS Transactions 18, n.º 1 (18 de diciembre de 2019): 151–60. http://dx.doi.org/10.1149/1.3096443.
Texto completoWakabayashi, H., G. S. Samudra, I. J. Djomehri, H. Nayfeh y D. A. Antoniadis. "Supply-voltage optimization for below-70-nm technology-node MOSFETs". IEEE Transactions on Semiconductor Manufacturing 15, n.º 2 (mayo de 2002): 151–56. http://dx.doi.org/10.1109/66.999586.
Texto completoTakeda, Eiji, Eiichi Murakami, Kazuyoshi Torii, Yutaka Okuyama, Eishi Ebe, Kenji Hinode y Shin'ichiro Kimura. "Reliability issues of silicon LSIs facing 100-nm technology node". Microelectronics Reliability 42, n.º 4-5 (abril de 2002): 493–506. http://dx.doi.org/10.1016/s0026-2714(02)00029-x.
Texto completoSaxena, Shubhangi y Kamsali Manjunathachari. "Novel Nanoelectronic Materials and Devices: For Future Technology Node". ECS Transactions 107, n.º 1 (24 de abril de 2022): 15701–11. http://dx.doi.org/10.1149/10701.15701ecst.
Texto completoTomita, Hiroshi, Yuji Yamada, Hidenobu Nagashima, Norio Ishikawa y Yumiko Taniguchi. "New FEOL Cleaning Technology for Advanced Devices beyond 45 nm Node". Solid State Phenomena 134 (noviembre de 2007): 185–88. http://dx.doi.org/10.4028/www.scientific.net/ssp.134.185.
Texto completoKim, Juhyun, Myunggon Kang, Jongwook Jeon y Hyungcheol Shin. "Device Optimization of Nano-Plate Transistors for 3.5 nm Technology Node". Journal of Nanoscience and Nanotechnology 19, n.º 10 (1 de octubre de 2019): 6771–75. http://dx.doi.org/10.1166/jnn.2019.17108.
Texto completoBerry, C., J. Warnock, J. Badar, D. G. Bair, E. Behnen, B. Bell, A. Buyuktosunoglu et al. "IBM z14 design methodology enhancements in the 14-nm technology node". IBM Journal of Research and Development 62, n.º 2/3 (1 de marzo de 2018): 9:1–9:12. http://dx.doi.org/10.1147/jrd.2018.2800218.
Texto completoJang, Doyoung, Dmitry Yakimets, Geert Eneman, Pieter Schuddinck, Marie Garcia Bardon, Praveen Raghavan, Alessio Spessot, Diederik Verkest y Anda Mocuta. "Device Exploration of NanoSheet Transistors for Sub-7-nm Technology Node". IEEE Transactions on Electron Devices 64, n.º 6 (junio de 2017): 2707–13. http://dx.doi.org/10.1109/ted.2017.2695455.
Texto completoXu, Peng, Yinghua Piao, Liang Ge, Cheng Hu, Lun Zhu, Zhiwei Zhu, David Wei Zhang y Dongping Wu. "Investigation of Novel Junctionless MOSFETs for Technology Node Beyond 22 nm". ECS Transactions 44, n.º 1 (15 de diciembre de 2019): 33–39. http://dx.doi.org/10.1149/1.3694293.
Texto completoHolmes, Steven. "22-nm-node technology active-layer patterning for planar transistor devices". Journal of Micro/Nanolithography, MEMS, and MOEMS 9, n.º 1 (1 de enero de 2010): 013001. http://dx.doi.org/10.1117/1.3302125.
Texto completoVandervorst, Wilfried, Trudo Clarysse y Pierre Eyben. "Spreading resistance roadmap towards and beyond the 70 nm technology node". Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 20, n.º 1 (2002): 451. http://dx.doi.org/10.1116/1.1446455.
Texto completoNagase, Masatoshi, Takuya Maruyama y Makoto Sekine. "Advanced CD Control Technology for 65-nm Node Dual Damascene Process". IEEE Transactions on Semiconductor Manufacturing 20, n.º 3 (agosto de 2007): 245–51. http://dx.doi.org/10.1109/tsm.2007.901842.
Texto completoLazzaz, Abdelaziz, Khaled Bousbahi y Mustapha Ghamnia. "Performance analysis of FinFET based inverter, NAND and NOR circuits at 10 NM,7 NM and 5 NM node technologies". Facta universitatis - series: Electronics and Energetics 36, n.º 1 (2023): 1–16. http://dx.doi.org/10.2298/fuee2301001l.
Texto completoHussain, Inamul y Saurabh Chaudhury. "CNFET Based Low Power Full Adder Circuit for VLSI Applications". Nanoscience & Nanotechnology-Asia 10, n.º 3 (17 de junio de 2020): 286–91. http://dx.doi.org/10.2174/2210681209666190220122553.
Texto completoŠedivý, Josef, Petr Průša, Jiří Čejka y Ladislav Bartuška. "Utilization of the Capacitated Vehicle Routing Problem with the Capacity Limitation of Nodes in Water Transportation". Naše more 69, n.º 3 (noviembre de 2022): 149–58. http://dx.doi.org/10.17818/nm/2022/3.5.
Texto completoBonifacio, Cecile, Michael Campin, Kevin McIlwrath y Paul Fischione. "Post-FIB Cleaning of TEM Specimens from 14 nm and Other FinFETs by Concentrated Argon Ion Milling". EDFA Technical Articles 21, n.º 4 (1 de noviembre de 2019): 4–12. http://dx.doi.org/10.31399/asm.edfa.2019-4.p004.
Texto completoDash, T. P., S. Dey, S. Das, J. Jena, E. Mahapatra y C. K. Maiti. "Source/Drain Stressor Design for Advanced Devices at 7 nm Technology Node". Nanoscience & Nanotechnology-Asia 10, n.º 4 (26 de agosto de 2020): 447–56. http://dx.doi.org/10.2174/2210681209666190809101307.
Texto completoHuang, Zhengfeng, Di Cao, Jianguo Cui, Yingchun Lu, Yiming Ouyang, Haochen Qi, Qi Xu, Huaguo Liang y Tianming Ni. "Design of Multiple Node Upset Tolerant Latch in 32 nm CMOS Technology". Journal of Computer-Aided Design & Computer Graphics 33, n.º 3 (1 de marzo de 2021): 346–55. http://dx.doi.org/10.3724/sp.j.1089.2021.18385.
Texto completoZhu, Jinlong, Jiamin Liu, Tianlai Xu, Shuai Yuan, Zexu Zhang, Hao Jiang, Honggang Gu, Renjie Zhou y Shiyuan Liu. "Optical wafer defect inspection at the 10 nm technology node and beyond". International Journal of Extreme Manufacturing 4, n.º 3 (21 de abril de 2022): 032001. http://dx.doi.org/10.1088/2631-7990/ac64d7.
Texto completoHuang, Zhengfeng, Yang Guo, Shangjie Pan, Yingchun Lu, Huaguo Liang, Haochen Qi, Yiming Ouyang, Tianming Ni y Qi Xu. "Tri-Node Upsets Self-Recovery Latch Design in 32 nm CMOS Technology". Journal of Computer-Aided Design & Computer Graphics 32, n.º 12 (1 de diciembre de 2020): 2013–20. http://dx.doi.org/10.3724/sp.j.1089.2020.18160.
Texto completoKANG, Yesung y Youngmin KIM. "Intra-Gate Length Biasing for Leakage Optimization in 45 nm Technology Node". IEICE Transactions on Fundamentals of Electronics, Communications and Computer Sciences E96.A, n.º 5 (2013): 947–52. http://dx.doi.org/10.1587/transfun.e96.a.947.
Texto completoSANDHYA, KESHARWANI y DEDHE VAIBHAV. "DOUBLE NODE UPSET RADIATION IMMUNE LATCH DESIGN IN 65 NM CMOS TECHNOLOGY". i-manager's Journal on Circuits and Systems 6, n.º 3 (2018): 21. http://dx.doi.org/10.26634/jcir.6.3.14624.
Texto completoBaklanov, Mikhail R., Evgeny A. Smirnov y Larry Zhao. "Ultra Low Dielectric Constant Materials for 22 nm Technology Node and Beyond". ECS Transactions 35, n.º 4 (16 de diciembre de 2019): 717–28. http://dx.doi.org/10.1149/1.3572315.
Texto completoHook, Terence B. "Power and Technology Scaling into the 5 nm Node with Stacked Nanosheets". Joule 2, n.º 1 (enero de 2018): 1–4. http://dx.doi.org/10.1016/j.joule.2017.10.014.
Texto completoDash, Tara Prasanna, Suprava Dey, Sanghamitra Das, Eleena Mohapatra, Jhansirani Jena y Chinmay Kumar Maiti. "Strain-engineering in nanowire field-effect transistors at 3 nm technology node". Physica E: Low-dimensional Systems and Nanostructures 118 (abril de 2020): 113964. http://dx.doi.org/10.1016/j.physe.2020.113964.
Texto completoOboňa, Jozef Vincenc, Tomáš Hrnčíř, Sharang, Marek Šikula y Andrey Denisyuk. "Xe plasma FIB Delayering of IC based on 14 nm node technology". Microscopy and Microanalysis 22, S3 (julio de 2016): 56–57. http://dx.doi.org/10.1017/s1431927616001136.
Texto completoOno, Kazuo, Kenzo Kurotsuchi, Yoshihisa Fujisaki, Riichiro Takemura, Motoyasu Terao y Norikatsu Takaura. "Resistive Switching Ion-Plug Memory for 32-nm Technology Node and Beyond". Japanese Journal of Applied Physics 48, n.º 4 (20 de abril de 2009): 04C160. http://dx.doi.org/10.1143/jjap.48.04c160.
Texto completoLin, Jen-Chieh, Teng-Chun Tsai, Chia-Lin Hsu, Welch Lin, Chien-Chung Huang, Chih-Hsien Chen y J. Y. Wu. "Advanced Rework Process Development for Cu-CMP at 28 nm Technology Node". ECS Transactions 33, n.º 10 (17 de diciembre de 2019): 175–80. http://dx.doi.org/10.1149/1.3489058.
Texto completoBroussous, Lucile, D. Krejcirova, K. Courouble, S. Zoll, A. Iwasaki, H. Ishikawa, F. Buisine, A. Lamaury y D. Fuard. "TiN Hard Mask Cleans with SC1 Solutions, for 64nm Pitch BEOL Patterning". Solid State Phenomena 219 (septiembre de 2014): 209–12. http://dx.doi.org/10.4028/www.scientific.net/ssp.219.209.
Texto completoJain, Amitabh. "Ultra-Shallow Junction Formation Using Rapid Thermal Processing". Materials Science Forum 573-574 (marzo de 2008): 305–18. http://dx.doi.org/10.4028/www.scientific.net/msf.573-574.305.
Texto completoLamy, Magali, Marc de la Bardonnie, Frederic Lorut, Ryan Ross, Christophe Wyon y Laurens F. Tz Kwakman. "How Effective Are Failure Analysis Methods for the 65 nm CMOS Technology Node?" EDFA Technical Articles 8, n.º 2 (1 de mayo de 2006): 14–20. http://dx.doi.org/10.31399/asm.edfa.2006-2.p014.
Texto completoDe, Indranil, Deepak Johri, Anadi Srivastava y C. M. Osburn. "Impact of gate workfunction on device performance at the 50 nm technology node". Solid-State Electronics 44, n.º 6 (junio de 2000): 1077–80. http://dx.doi.org/10.1016/s0038-1101(99)00323-8.
Texto completoGao, Weimin, Ivan Ciofi, Yves Saad, Philippe Matagne, Michael Bachmann, Werner Gillijns, Kevin Lucas, Wolfgang Demmerle y Thomas Schmoeller. "Rigorous assessment of patterning solution of metal layer in 7 nm technology node". Journal of Micro/Nanolithography, MEMS, and MOEMS 15, n.º 1 (19 de febrero de 2016): 013505. http://dx.doi.org/10.1117/1.jmm.15.1.013505.
Texto completoOrlowski, Marius y Andreas Wild. "Can 3-D Devices Extend Moore's Law Beyond the 32 nm Technology Node?" ECS Transactions 3, n.º 6 (21 de diciembre de 2019): 3–17. http://dx.doi.org/10.1149/1.2357050.
Texto completoPark, Dae-Gyu, Mike Chudzik y Haizhou Yin. "Challenges in FEOL Logic Device Integration for 32 nm Technology Node and Beyond". ECS Transactions 11, n.º 6 (19 de diciembre de 2019): 371–77. http://dx.doi.org/10.1149/1.2778394.
Texto completoYan, Jhih-Yang, Sun-Rong Jan, Yi-Chung Huang, Huang-Siang Lan, Y. H. Huang, Bigchoug Hung, K. T. Chan, Michael Huang, M. T. Yang y C. W. Liu. "Asymmetric Keep-Out Zone of Through-Silicon Via Using 28-nm Technology Node". IEEE Electron Device Letters 36, n.º 9 (septiembre de 2015): 938–40. http://dx.doi.org/10.1109/led.2015.2456179.
Texto completoRezgui, Houssem, Faouzi Nasri, Giovanni Nastasi, Mohamed Fadhel Ben Aissa, Salah Rahmouni, Vittorio Romano, Hafedh Belmabrouk y Amen Allah Guizani. "Design optimization of nanoscale electrothermal transport in 10 nm SOI FinFET technology node". Journal of Physics D: Applied Physics 53, n.º 49 (25 de septiembre de 2020): 495103. http://dx.doi.org/10.1088/1361-6463/abaf7c.
Texto completoNoguchi, J., K. Sato, N. Konishi, S. Uno, T. Oshima, K. Ishikawa, H. Ashihara et al. "Process and Reliability of Air-Gap Cu Interconnect Using 90-nm Node Technology". IEEE Transactions on Electron Devices 52, n.º 3 (marzo de 2005): 352–59. http://dx.doi.org/10.1109/ted.2005.843886.
Texto completoHuang, Zhengfeng, Yan Zhang, Wenhui Wu, Lanxi Duan, Huaguo Liang, Yiming Ouyang, Aibin Yan y Tai Song. "A high-speed quadruple-node-upset-tolerant latch in 22 nm CMOS technology". Microelectronics Reliability 147 (agosto de 2023): 115032. http://dx.doi.org/10.1016/j.microrel.2023.115032.
Texto completoLu, Peng, Can Yang, Yifei Li, Bo Li y Zhengsheng Han. "Three-Dimensional TID Hardening Design for 14 nm Node SOI FinFETs". Eng 2, n.º 4 (3 de diciembre de 2021): 620–31. http://dx.doi.org/10.3390/eng2040039.
Texto completoMo, Fabrizio, Chiara Elfi Spano, Yuri Ardesi, Massimo Ruo Roch, Gianluca Piccinini y Marco Vacca. "NS-GAAFET Compact Modeling: Technological Challenges in Sub-3-nm Circuit Performance". Electronics 12, n.º 6 (21 de marzo de 2023): 1487. http://dx.doi.org/10.3390/electronics12061487.
Texto completoIwasaki, Akihisa, Kristell Courouble, Steven Lippy, Fabrice Buisine, Hidekazu Ishikawa, Emanuel Cooper, Evelyn Kennedy, Stephane Zoll y Lucile Broussous. "Industrial Challenges of TiN Hard Mask Wet Removal Process for 14nm Technology Node". Solid State Phenomena 219 (septiembre de 2014): 213–16. http://dx.doi.org/10.4028/www.scientific.net/ssp.219.213.
Texto completoChenyun Pan, Praveen Raghavan, Ahmet Ceyhan, Francky Catthoor, Zsolt Tokei y Azad Naeemi. "Technology/Circuit/System Co-Optimization and Benchmarking for Multilayer Graphene Interconnects at Sub-10-nm Technology Node". IEEE Transactions on Electron Devices 62, n.º 5 (mayo de 2015): 1530–36. http://dx.doi.org/10.1109/ted.2015.2409875.
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