Artículos de revistas sobre el tema "Microwave-Assisted Deposition"
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Kang, In-Je, Chang-Hyun Cho, Hyonu Chang, Soo-Ouk Jang, Hyun-Jae Park, Dae-Gun Kim, Kyung-Min Lee y Ji-Hun Kim. "Characteristics of Plasma Flow for Microwave Plasma Assisted Aerosol Deposition". Nanomaterials 11, n.º 7 (29 de junio de 2021): 1705. http://dx.doi.org/10.3390/nano11071705.
Texto completoVANDENBULCKE, L., P. BOU, R. HERBIN, V. CHOLET y C. BENY. "MICROWAVE PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION OF DIAMOND". Le Journal de Physique Colloques 50, n.º C5 (mayo de 1989): C5–177—C5–188. http://dx.doi.org/10.1051/jphyscol:1989525.
Texto completoZhou, Huan, Maryam Nabiyouni y Sarit B. Bhaduri. "Microwave assisted apatite coating deposition on Ti6Al4V implants". Materials Science and Engineering: C 33, n.º 7 (octubre de 2013): 4435–43. http://dx.doi.org/10.1016/j.msec.2013.06.043.
Texto completoWu, Yong Qiang y Si Kai Sun. "Microwave Assisted Eletroless Copper Plating on Carbon Nanotubes". Advanced Materials Research 399-401 (noviembre de 2011): 741–46. http://dx.doi.org/10.4028/www.scientific.net/amr.399-401.741.
Texto completoKumar, Rajesh, Rajesh Kumar Singh, Alfredo R. Vaz y Stanislav A. Moshkalev. "Microwave-assisted synthesis and deposition of a thin ZnO layer on microwave-exfoliated graphene: optical and electrochemical evaluations". RSC Advances 5, n.º 83 (2015): 67988–95. http://dx.doi.org/10.1039/c5ra09936f.
Texto completoSATO, Yoichiro. "Diamond film grown by microwave plasma-assisted vapor deposition." Journal of the Japan Society for Precision Engineering 53, n.º 10 (1987): 1511–14. http://dx.doi.org/10.2493/jjspe.53.1511.
Texto completoIbiyemi, Abideen A., Ayodeji O. Awodugba, Olusola Akinrinola y Abass A. Faremi. "Zinc-doped CdS nanoparticles synthesized by microwave-assisted deposition". Journal of Semiconductors 38, n.º 9 (septiembre de 2017): 093002. http://dx.doi.org/10.1088/1674-4926/38/9/093002.
Texto completoChaudhuri, TapasK y Anjana Kothari. "Microwave-Assisted Chemical Bath Deposition of Nanostructured ZnO Particles". Journal of Nanoscience and Nanotechnology 9, n.º 9 (1 de septiembre de 2009): 5578–85. http://dx.doi.org/10.1166/jnn.2009.1119.
Texto completoLaimer, J. y S. Matsumoto. "Pulsed microwave plasma-assisted chemical vapour deposition of diamond". International Journal of Refractory Metals and Hard Materials 14, n.º 1-3 (enero de 1996): 179–84. http://dx.doi.org/10.1016/0263-4368(96)83432-9.
Texto completoNdiege, Nicholas, Mark Shannon y Richard I. Masel. "Silicon Nanowires Synthesized via Microwave-Assisted Chemical Vapor Deposition". Electrochemical and Solid-State Letters 10, n.º 11 (2007): K55. http://dx.doi.org/10.1149/1.2774970.
Texto completoMa, Jeng-Shin, Subrata Das y Chung-Hsin Lu. "Microwave-assisted chemical bath deposition process to fabricate CdS buffer layers used in Cu(In,Ga)Se2 solar cells". RSC Advances 6, n.º 109 (2016): 107886–93. http://dx.doi.org/10.1039/c6ra19227k.
Texto completoLi, Wei-Jin, Ji-Fei Feng, Zu-Jin Lin, Ying-Long Yang, Yan Yang, Xu-Sheng Wang, Shui-Ying Gao y Rong Cao. "Patterned growth of luminescent metal–organic framework films: a versatile electrochemically-assisted microwave deposition method". Chemical Communications 52, n.º 20 (2016): 3951–54. http://dx.doi.org/10.1039/c6cc00519e.
Texto completoBisht, Atul, S. Chockalingam, O. S. Panwar, A. K. Kesarwani, B. P. Singh y V. N. Singh. "Growth of dense CNT on the multilayer graphene film by the microwave plasma enhanced chemical vapor deposition technique and their field emission properties". RSC Advances 5, n.º 109 (2015): 90111–20. http://dx.doi.org/10.1039/c5ra16917h.
Texto completoOgawa, Shumpei, Tatsuya Kuroda, Ryuga Koike y Hiroki Ishizaki. "Fabrication of Nitride Thin Films on Si Substrates by Atomic Layer Deposition Technique". MRS Advances 3, n.º 3 (2018): 165–70. http://dx.doi.org/10.1557/adv.2018.224.
Texto completoSalvadori, M. C., V. P. Mammana, O. G. Martins y F. T. Degasperi. "Plasma-assisted chemical vapour deposition in a tunable microwave cavity". Plasma Sources Science and Technology 4, n.º 3 (1 de agosto de 1995): 489–94. http://dx.doi.org/10.1088/0963-0252/4/3/019.
Texto completoSilva, F., K. Hassouni, X. Bonnin y A. Gicquel. "Microwave engineering of plasma-assisted CVD reactors for diamond deposition". Journal of Physics: Condensed Matter 21, n.º 36 (19 de agosto de 2009): 364202. http://dx.doi.org/10.1088/0953-8984/21/36/364202.
Texto completoKuo, Teng-Fan, Zhen-Yu Juang, Chuen-Horng Tsai, You-Ming Tsau, Hsiu-Fung Cheng y I.-Nan Lin. "Microwave-assisted chemical vapor deposition process for synthesizing carbon nanotubes". Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 19, n.º 3 (2001): 1030. http://dx.doi.org/10.1116/1.1352722.
Texto completoZhang, Liu-Xue, Peng Liu y Zhi-Xing Su. "Facile Microwave Assisted Liquid Phase Deposition Process to TiO2 Nanocrystallines". Chinese Journal of Chemistry 24, n.º 1 (enero de 2006): 19–21. http://dx.doi.org/10.1002/cjoc.200690016.
Texto completoShi, Yulong, Minhui Tan y X. Jiang. "Deposition of diamond/β–SiC Gradient Composite Films by Microwave Plasma-assisted Chemical Vapor Deposition". Journal of Materials Research 17, n.º 6 (junio de 2002): 1241–43. http://dx.doi.org/10.1557/jmr.2002.0184.
Texto completoJang, Soo Ouk, Changhyun Cho, Ji Hun Kim, In Je Kang, Hyonu Chang, Hyunjae Park, Kyungmin Lee, Dae Gun Kim y Hye Won Seok. "Microwave Plasma Assisted Aerosol Deposition (μ-PAD) for Ceramic Coating Applications". Ceramics 5, n.º 4 (2 de diciembre de 2022): 1174–84. http://dx.doi.org/10.3390/ceramics5040083.
Texto completoEddy, C. R., D. L. Youchison, B. D. Sartwell y K. S. Grabowski. "Deposition of diamond onto aluminum by electron cyclotron resonance microwave plasma-assisted CVD". Journal of Materials Research 7, n.º 12 (diciembre de 1992): 3255–59. http://dx.doi.org/10.1557/jmr.1992.3255.
Texto completoZhao, Guozheng, Qingwei Tan, Changbo Li, Liyan Shang, Daihang Zhang, Xuanxuan Lu y Feng Qiu. "Silver/silver halide supported on mesoporous ceria particles and photo-CWPO degradation under visible light for organic compounds in acrylonitrile wastewater". RSC Advances 11, n.º 43 (2021): 26791–99. http://dx.doi.org/10.1039/d1ra04465f.
Texto completoMalwal, Deepika y P. Gopinath. "Enhanced photocatalytic activity of hierarchical three dimensional metal oxide@CuO nanostructures towards the degradation of Congo red dye under solar radiation". Catalysis Science & Technology 6, n.º 12 (2016): 4458–72. http://dx.doi.org/10.1039/c6cy00128a.
Texto completoNdiege, Nicholas, Vaidyanathan Subramanian, Mark A. Shannon y Richard I. Masel. "Rapid synthesis of tantalum oxide dielectric films by microwave microwave-assisted atmospheric chemical vapor deposition". Thin Solid Films 516, n.º 23 (octubre de 2008): 8307–14. http://dx.doi.org/10.1016/j.tsf.2008.03.049.
Texto completoSONG RU-AN, CHENG XIAN-AN y ZHOU ZHONG-YI. "MAGNETIC FIELD ASSISTED MICROWAVE PLASMA AND LARGE AREA DIAMOND FILM DEPOSITION". Acta Physica Sinica 39, n.º 10 (1990): 1635. http://dx.doi.org/10.7498/aps.39.1635.
Texto completoCampargue, A., M. Chenevier, L. Fayette, B. Marcus, M. Mermoux y A. J. Ross. "Fourier transform diagnostics of gaseous species during microwave assisted diamond deposition". Applied Physics Letters 62, n.º 2 (11 de enero de 1993): 134–36. http://dx.doi.org/10.1063/1.109349.
Texto completoFu, Y., B. Yan, N. L. Loh, C. Q. Sun y P. Hing. "Hydrogen embrittlement of titanium during microwave plasma assisted CVD diamond deposition". Surface Engineering 16, n.º 4 (agosto de 2000): 355–60. http://dx.doi.org/10.1179/026708400101517251.
Texto completoZhang, Qing, S. F. Yoon, J. Ahn, Bo Gan, Rusli y Ming-Bin Yu. "Synthesis of Carbon Tubes Using Microwave Plasma-assisted Chemical Vapor Deposition". Journal of Materials Research 15, n.º 8 (agosto de 2000): 1749–53. http://dx.doi.org/10.1557/jmr.2000.0252.
Texto completoHuang, Haowen, Shufeng Zhang, Li Qi, Xiao Yu y Yi Chen. "Microwave-assisted deposition of uniform thin gold film on glass surface". Surface and Coatings Technology 200, n.º 14-15 (abril de 2006): 4389–96. http://dx.doi.org/10.1016/j.surfcoat.2005.02.203.
Texto completoXin, Mudi, KunWei Li y Hao Wang. "Synthesis of CuS thin films by microwave assisted chemical bath deposition". Applied Surface Science 256, n.º 5 (diciembre de 2009): 1436–42. http://dx.doi.org/10.1016/j.apsusc.2009.08.104.
Texto completoCholet, V., R. Herbin y L. Vandenbulcke. "Low temperature boron coatings by microwave plasma assisted chemical vapour deposition". Thin Solid Films 192, n.º 2 (noviembre de 1990): 235–51. http://dx.doi.org/10.1016/0040-6090(90)90069-p.
Texto completoObaid, A. S., M. A. Mahdi, Z. Hassan y M. Bououdina. "PbS nanocrystal solar cells fabricated using microwave-assisted chemical bath deposition". International Journal of Hydrogen Energy 38, n.º 2 (enero de 2013): 807–15. http://dx.doi.org/10.1016/j.ijhydene.2012.10.046.
Texto completoYoshida, Suguru y Masahito Sano. "Microwave-assisted chemical modification of carbon nanohorns: Oxidation and Pt deposition". Chemical Physics Letters 433, n.º 1-3 (diciembre de 2006): 97–100. http://dx.doi.org/10.1016/j.cplett.2006.09.074.
Texto completoBrewer, M. A., I. G. Brown, M. R. Dickinson, J. E. Galvin, R. A. MacGill y M. C. Salvadori. "Simple, safe, and economical microwave plasma‐assisted chemical vapor deposition facility". Review of Scientific Instruments 63, n.º 6 (junio de 1992): 3389–93. http://dx.doi.org/10.1063/1.1142557.
Texto completoSheldon, Brian W., Roseann Csencsits, Janet Rankin, Rachel E. Boekenhauer y Yuzo Shigesato. "Bias‐enhanced nucleation of diamond during microwave‐assisted chemical vapor deposition". Journal of Applied Physics 75, n.º 10 (15 de mayo de 1994): 5001–8. http://dx.doi.org/10.1063/1.355792.
Texto completoWu, Chung-Shu, Chung-Yang Lee, Jem-Kun Chen, Shiao-Wei Kuo, Shih-Kang Fan, Chih-Chia Cheng, Feng-Chih Chang y Fu-Hsiang Ko. "Microwave-assisted Electroless Deposition of Silver Nanoparticles onto Multiwalled Carbon Nanotubes". International Journal of Electrochemical Science 7, n.º 5 (2012): 4133–42. http://dx.doi.org/10.1016/s1452-3981(23)19526-5.
Texto completoNishitani-Gamo, Mikka, Isao Sakaguchi, Tomohide Takami, Katsunori Suzuki, Isao Kusunoki y Toshihiro Ando. "Homoepitaxial (111) diamond grown by temperature-controlled chemical vapor deposition". Journal of Materials Research 14, n.º 9 (septiembre de 1999): 3518–24. http://dx.doi.org/10.1557/jmr.1999.0476.
Texto completoImam, M. Ashraf, Arne W. Fliflet, Ralph W. Bruce, C. R. Feng, Chad Stephenson, A. K. Kinkead y Steven H. Gold. "Recent Advances in Microwave, Millimeter-Wave and Plasma-Assisted Processing of Materials". Materials Science Forum 638-642 (enero de 2010): 2052–57. http://dx.doi.org/10.4028/www.scientific.net/msf.638-642.2052.
Texto completoJung, S. C. "The microwave-assisted photo-catalytic degradation of organic dyes". Water Science and Technology 63, n.º 7 (1 de abril de 2011): 1491–98. http://dx.doi.org/10.2166/wst.2011.393.
Texto completoZhu, Guangyan, Qian Peng, Ting Luo, Hao Pan, Yuehong Wang y Zhiwei Peng. "Synthesis of Ti6Al4V/SrFHA Composites by Microwave-Assisted Liquid Phase Deposition and Calcination". Materials 15, n.º 18 (7 de septiembre de 2022): 6206. http://dx.doi.org/10.3390/ma15186206.
Texto completoPaosawatyanyong, Boonchoat, K. Honglertsakul y D. K. Reinhard. "DLC-Film Schottky Barrier Diodes". Solid State Phenomena 107 (octubre de 2005): 75–80. http://dx.doi.org/10.4028/www.scientific.net/ssp.107.75.
Texto completoSantos, J. A., V. F. Neto, D. Ruch y J. Grácio. "The Deposition of Nanocrystalline Diamond by HFCVD in Different Materials". Journal of Nano Research 18-19 (julio de 2012): 227–34. http://dx.doi.org/10.4028/www.scientific.net/jnanor.18-19.227.
Texto completoWeimer, W. A., F. M. Cerio y C. E. Johnson. "Examination of the chemistry involved in microwave plasma assisted chemical vapor deposition of diamond". Journal of Materials Research 6, n.º 10 (octubre de 1991): 2134–44. http://dx.doi.org/10.1557/jmr.1991.2134.
Texto completoPurniawan, Agung, E. Hamzah y M. R. M. Toff. "Surface Roughness and Morphology Analysis Using an Atomic Force Microscopy of Polycrystalline Diamond Coated Si3N4 Deposited by Microwave Plasma Assisted Chemical Vapor Deposition". Solid State Phenomena 136 (febrero de 2008): 153–60. http://dx.doi.org/10.4028/www.scientific.net/ssp.136.153.
Texto completoHuang, Su Yong y Kai Fu Li. "Antibacterial Property of Chinese fir/TiO2 Composite". Advanced Materials Research 194-196 (febrero de 2011): 1663–66. http://dx.doi.org/10.4028/www.scientific.net/amr.194-196.1663.
Texto completoXu, HaiYan, Hao Wang, TouNan Jin y Hui Yan. "Rapid fabrication of luminescent Eu:YVO4 films by microwave-assisted chemical solution deposition". Nanotechnology 16, n.º 1 (3 de diciembre de 2004): 65–69. http://dx.doi.org/10.1088/0957-4484/16/1/014.
Texto completoHsieh, Chien-Te, Dong-Ying Tzou, Ching Pan y Wei-Yu Chen. "Microwave-assisted deposition, scalable coating, and wetting behavior of silver nanowire layers". Surface and Coatings Technology 207 (agosto de 2012): 11–18. http://dx.doi.org/10.1016/j.surfcoat.2012.02.026.
Texto completoAsmussen, J., T. A. Grotjohn, T. Schuelke, M. F. Becker, M. K. Yaran, D. J. King, S. Wicklein y D. K. Reinhard. "Multiple substrate microwave plasma-assisted chemical vapor deposition single crystal diamond synthesis". Applied Physics Letters 93, n.º 3 (21 de julio de 2008): 031502. http://dx.doi.org/10.1063/1.2961016.
Texto completoCerio, F. M. y W. A. Weimer. "Electrostatic probe measurements for microwave plasma‐assisted chemical vapor deposition of diamond". Applied Physics Letters 59, n.º 26 (23 de diciembre de 1991): 3387–89. http://dx.doi.org/10.1063/1.105683.
Texto completoKothari, Anjana y Tapas K. Chaudhuri. "One-minute microwave-assisted chemical bath deposition of nanostructured ZnO rod-arrays". Materials Letters 65, n.º 5 (marzo de 2011): 847–49. http://dx.doi.org/10.1016/j.matlet.2010.12.017.
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