Artículos de revistas sobre el tema "Lithography"
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Vandаlovskyi, V. "Artistic and technical features of the lithographic manner mixed technique". Research and methodological works of the National Academy of Visual Arts and Architecture, n.º 27 (27 de febrero de 2019): 92–98. http://dx.doi.org/10.33838/naoma.27.2018.92-98.
Texto completoKwon, B. y Jong H. Kim. "Importance of Molds for Nanoimprint Lithography: Hard, Soft, and Hybrid Molds". Journal of Nanoscience 2016 (22 de junio de 2016): 1–12. http://dx.doi.org/10.1155/2016/6571297.
Texto completoWen, Zaoxia, Xingyu Liu, Wenxiu Chen, Ruolin Zhou, Hao Wu, Yongmei Xia y Lianbin Wu. "Progress in Polyhedral Oligomeric Silsesquioxane (POSS) Photoresists: A Comprehensive Review across Lithographic Systems". Polymers 16, n.º 6 (19 de marzo de 2024): 846. http://dx.doi.org/10.3390/polym16060846.
Texto completoLund, Sarah E. "Fossils: Lithography’s Porous Time and Eugène Delacroix’s Faust Marginalia". Nineteenth Century Studies 35 (noviembre de 2023): 1–32. http://dx.doi.org/10.5325/ninecentstud.35.0001.
Texto completoPrakoso, Emmanuel Putro, Inovensius Hugo Bima Wicaksana, Nick Soedarso y Rina Carina. "TEKNIK CETAK DATAR KITCHEN LITHOGRAPY SEBAGAI MEDIA EKSPRESI DESAIN PADA METODE REPRODUKSI GRAFIKA". Jurnal Dimensi DKV Seni Rupa dan Desain 4, n.º 2 (1 de octubre de 2019): 155. http://dx.doi.org/10.25105/jdd.v4i2.5888.
Texto completoWu, Yu y Zihao Xiao. "The Recent Progress of Lithography Machine and the State-of-art Facilities". Highlights in Science, Engineering and Technology 5 (7 de julio de 2022): 155–65. http://dx.doi.org/10.54097/hset.v5i.737.
Texto completoVoznyuk G. V., Grigorenko I. N., Mitrofanov M. I., Nikolaev V. V. y Evtikhiev V. P. "Subwave textured surfaces for the radiation coupling from the waveguide". Technical Physics Letters 48, n.º 3 (2022): 76. http://dx.doi.org/10.21883/tpl.2022.03.52896.19103.
Texto completoSharma, Ekta, Reena Rathi, Jaya Misharwal, Bhavya Sinhmar, Suman Kumari, Jasvir Dalal y Anand Kumar. "Evolution in Lithography Techniques: Microlithography to Nanolithography". Nanomaterials 12, n.º 16 (11 de agosto de 2022): 2754. http://dx.doi.org/10.3390/nano12162754.
Texto completoZhang, Zhen. "Optimization of Triple Periodic Bilayer Stacks and Aerial Image Performance Analysis". International Journal of Electronics and Electrical Engineering 8, n.º 3 (septiembre de 2020): 53–57. http://dx.doi.org/10.18178/ijeee.8.3.53-57.
Texto completoSeo, Manseung, Haeryung Kim y Masahiko Onosato. "Lithography Using a Microelectronic Mask". Journal of Robotics and Mechatronics 18, n.º 6 (20 de diciembre de 2006): 816–23. http://dx.doi.org/10.20965/jrm.2006.p0816.
Texto completoPanzarasa, Guido y Guido Soliveri. "Photocatalytic Lithography". Applied Sciences 9, n.º 7 (27 de marzo de 2019): 1266. http://dx.doi.org/10.3390/app9071266.
Texto completoChoi, Young Joo, Ran Namgung, Jun Soo Kim, Dae Seok Song, Hyeon Park, Shin-hyo Bae, Min-Ki Chon et al. "Stochastic defect removal coating for high-performance extreme ultraviolet lithography". Journal of Vacuum Science & Technology B 40, n.º 4 (julio de 2022): 042602. http://dx.doi.org/10.1116/6.0001723.
Texto completoMeijer, Rob, Peter Thomson y Lysbeth Croiset van Uchelen-Brouwer. "The History of the Lithographie Royale, 1818-25". Quaerendo 31, n.º 4 (2001): 281–306. http://dx.doi.org/10.1163/157006901x00173.
Texto completoPugachev, Mikhail V., Aliaksandr I. Duleba, Arslan A. Galiullin y Aleksandr Y. Kuntsevich. "Micromask Lithography for Cheap and Fast 2D Materials Microstructures Fabrication". Micromachines 12, n.º 8 (21 de julio de 2021): 850. http://dx.doi.org/10.3390/mi12080850.
Texto completoTsarik, K. A. "Focused Ion Beam Exposure of Ultrathin Electron-Beam Resist for Nanoscale Field-Effect Transistor Contacts Formation". Proceedings of Universities. Electronics 26, n.º 5 (2021): 353–62. http://dx.doi.org/10.24151/1561-5405-2021-26-5-353-362.
Texto completoYonghui Zhang, Yonghui Zhang, Zihui Zhang Zihui Zhang, Chong Geng Chong Geng, Shu Xu Shu Xu, Tongbo Wei Tongbo Wei y and Wen'gang Bi and Wen'gang Bi. "Versatile nanosphere lithography technique combining multiple-exposure nanosphere lens lithography and nanosphere template lithography". Chinese Optics Letters 15, n.º 6 (2017): 062201–62205. http://dx.doi.org/10.3788/col201715.062201.
Texto completoLi, Mu Jun, Hui Chun Ye y Lian Guan Shen. "A Fast Method for Analyzing the Effect of Mask Error on Photolithography Pattern Quality". Advanced Materials Research 291-294 (julio de 2011): 3097–102. http://dx.doi.org/10.4028/www.scientific.net/amr.291-294.3097.
Texto completoDiaconu-Catan, Oxana. "The value of lithography in artistic creation". Studiul artelor şi culturologie: istorie, teorie, practică, n.º 1(44) (febrero de 2024): 66–73. http://dx.doi.org/10.55383/amtap.2023.1.12.
Texto completoMullen, Eleanor y Michael A. Morris. "Green Nanofabrication Opportunities in the Semiconductor Industry: A Life Cycle Perspective". Nanomaterials 11, n.º 5 (22 de abril de 2021): 1085. http://dx.doi.org/10.3390/nano11051085.
Texto completoPark, Sang Wook, Hyun Jin Yoon, Hee Young Oh, Yong Il Kim, Gi Jin Kwun y Hai Won Lee. "Synthesis of Resists Containing a Photoacid Generator Group for Atomic Force Microscope Lithography". Solid State Phenomena 121-123 (marzo de 2007): 697–700. http://dx.doi.org/10.4028/www.scientific.net/ssp.121-123.697.
Texto completoLiu, Fan, Guo Dong Gu, Chun Hong Zeng, Hai Jun Li, Wei Wang, Bao Shun Zhang y Jin She Yuan. "Fabrication of 50nm T-Gate on GaN Substrate". Advanced Materials Research 482-484 (febrero de 2012): 2341–44. http://dx.doi.org/10.4028/www.scientific.net/amr.482-484.2341.
Texto completoFallica, Roberto. "Beyond grayscale lithography: inherently three-dimensional patterning by Talbot effect". Advanced Optical Technologies 8, n.º 3-4 (26 de junio de 2019): 233–40. http://dx.doi.org/10.1515/aot-2019-0005.
Texto completoAtthi, Nithi, Areerat Sriklad, Wutthinan Jeamsaksiri, Charndet Hruanun, Amporn Poyai y Rardchawadee Silapunt. "Trimming Lithography: An Alternative Technology for Sub-Resolution and Sub-Wavelength Patterning". ECTI Transactions on Electrical Engineering, Electronics, and Communications 10, n.º 2 (10 de abril de 2012): 198–207. http://dx.doi.org/10.37936/ecti-eec.2012102.170419.
Texto completoStewart, Michael D. y C. Grant Willson. "Imprint Materials for Nanoscale Devices". MRS Bulletin 30, n.º 12 (diciembre de 2005): 947–51. http://dx.doi.org/10.1557/mrs2005.248.
Texto completoSHEN, T. C. "ROLE OF SCANNING PROBES IN NANOELECTRONICS: A CRITICAL REVIEW". Surface Review and Letters 07, n.º 05n06 (octubre de 2000): 683–88. http://dx.doi.org/10.1142/s0218625x00000695.
Texto completoVoznesenskiy, Sergey y Aleksandr Nepomnyaschiy. "Dose Characteristics of Multilayer Chitosan-Metal-Dielectric Nanostructures for Electronic Nanolithography". Solid State Phenomena 245 (octubre de 2015): 195–99. http://dx.doi.org/10.4028/www.scientific.net/ssp.245.195.
Texto completoSievers, Gianni. "Learning How to Print in Colonial North India: The Nizami Press in Budaun and the First Urdu Manual on the Art of Lithography". Philological Encounters 8, n.º 1 (16 de marzo de 2023): 73–109. http://dx.doi.org/10.1163/24519197-bja10038.
Texto completoBorodin, B. R., F. A. Benimetskiy y P. A. Alekseev. "Mechanical frictional scanning probe lithography of TMDCs". Journal of Physics: Conference Series 2103, n.º 1 (1 de noviembre de 2021): 012090. http://dx.doi.org/10.1088/1742-6596/2103/1/012090.
Texto completoDING, Yucheng. "Next generation lithography——imprint lithography". Chinese Journal of Mechanical Engineering 43, n.º 03 (2007): 1. http://dx.doi.org/10.3901/jme.2007.03.001.
Texto completoNalivaiko, V. I. y M. A. Ponomareva. "Promising developments of chalcogenide nanoresists for optical, x-ray and electron beam lithography". Interexpo GEO-Siberia 8, n.º 1 (18 de mayo de 2022): 33–36. http://dx.doi.org/10.33764/2618-981x-2022-8-1-33-36.
Texto completoZhang, Yuhang, Guanghui He, Feng Zhang, Yongfu Li y Guoxing Wang. "The study of lithographic variation in resistive random access memory". Journal of Semiconductors 45, n.º 5 (1 de mayo de 2024): 052303. http://dx.doi.org/10.1088/1674-4926/45/5/052303.
Texto completoWATT, F., A. A. BETTIOL, J. A. VAN KAN, E. J. TEO y M. B. H. BREESE. "ION BEAM LITHOGRAPHY AND NANOFABRICATION: A REVIEW". International Journal of Nanoscience 04, n.º 03 (junio de 2005): 269–86. http://dx.doi.org/10.1142/s0219581x05003139.
Texto completode Kerkhof, Mark van, Edgar Osorio, Vladimir Krivtsun, Maxim Spiridonov, Dmitry Astakhov y Viacheslav Medvedev. "Miniature plasma source for in situ extreme ultraviolet lithographic scanner cleaning". Journal of Vacuum Science & Technology B 40, n.º 2 (marzo de 2022): 022601. http://dx.doi.org/10.1116/6.0001636.
Texto completoKim, Kibeom, Sangkwon Han, Jinsik Yoon, Sunghoon Kwon, Hun-Kuk Park y Wook Park. "Lithographic resolution enhancement of a maskless lithography system based on a wobulation technique for flow lithography". Applied Physics Letters 109, n.º 23 (5 de diciembre de 2016): 234101. http://dx.doi.org/10.1063/1.4967373.
Texto completoHeilandová, Lucie. "The First Lithographic Workshops in Brno and Early Lithography in Moravia". Acta Musei Nationalis Pragae – Historia litterarum 63, n.º 3-4 (2019): 57–65. http://dx.doi.org/10.2478/amnpsc-2018-0008.
Texto completoBerggren, Karl K. "Lithography". Nanoscale 3, n.º 7 (2011): 2662. http://dx.doi.org/10.1039/c1nr90018h.
Texto completoTejeda, R. O., E. G. Lovell y R. L. Engelstad. "In-Plane Gravity Loading of a Circular Membrane". Journal of Applied Mechanics 67, n.º 4 (5 de mayo de 2000): 837–39. http://dx.doi.org/10.1115/1.1308581.
Texto completoFang, Bin, Jiafeng Feng, Hongxiang Wei, Xiufeng Han, Baoshun Zhang y Zhongming Zeng. "Fabrication of Spin-Transfer Nano-Oscillator by Colloidal Lithography". Journal of Nanomaterials 2015 (2015): 1–6. http://dx.doi.org/10.1155/2015/973957.
Texto completoTian, Weicheng. "Research progress of laser lithography". Journal of Physics: Conference Series 2608, n.º 1 (1 de octubre de 2023): 012016. http://dx.doi.org/10.1088/1742-6596/2608/1/012016.
Texto completoLiu, Junjun, Dong Wang, Yitan Li, Haihua Wang, Huan Chen, Qianqian Wang y Wenbing Kang. "Exceptional Lithography Sensitivity Boosted by Hexafluoroisopropanols in Photoresists". Polymers 16, n.º 6 (15 de marzo de 2024): 825. http://dx.doi.org/10.3390/polym16060825.
Texto completoErdmann, Andreas, David Reibold, Tim Fühner y Peter Evanschitzky. "Photomasks for Semiconductor Lithography: From Simple Shadow Casters to Complex 3D Scattering Objects". Advances in Science and Technology 55 (septiembre de 2008): 173–80. http://dx.doi.org/10.4028/www.scientific.net/ast.55.173.
Texto completoAhmad Kamal, Ahmad Syazwan, Cheng-Chieh Lin, Zhiyu Wang, Di Xing, Yang-Chun Lee, Mu-Hsin Chen, Ya-Lun Ho, Chun-Wei Chen y Jean-Jacques Delaunay. "CsPbBr3 nanocrystals plasmonic distributed Bragg reflector waveguide laser". Applied Physics Letters 122, n.º 7 (13 de febrero de 2023): 071104. http://dx.doi.org/10.1063/5.0128232.
Texto completoDomonkos, Mária, Pavel Demo y Alexander Kromka. "Nanosphere Lithography for Structuring Polycrystalline Diamond Films". Crystals 10, n.º 2 (14 de febrero de 2020): 118. http://dx.doi.org/10.3390/cryst10020118.
Texto completoВознюк, Г. В., И. Н. Григоренко, М. И. Митрофанов, В. В. Николаев y В. П. Евтихиев. "Субволновые текстурированные поверхности для вывода излучения из волновода". Письма в журнал технической физики 48, n.º 6 (2022): 51. http://dx.doi.org/10.21883/pjtf.2022.06.52214.19103.
Texto completoTEO, SELIN H. G., A. Q. LIU, G. L. SIA, C. LU, J. SINGH, M. B. YU y H. Q. SUN. "DEEP UV LITHOGRAPHY FOR PILLAR TYPE NANOPHOTONIC CRYSTAL". International Journal of Nanoscience 04, n.º 04 (agosto de 2005): 559–66. http://dx.doi.org/10.1142/s0219581x05003577.
Texto completoBin Yu, Bin Yu, Wei Jia Wei Jia, Changhe Zhou Changhe Zhou, Hongchao Cao Hongchao Cao y Wenting Sun Wenting Sun. "Grating imaging scanning lithography". Chinese Optics Letters 11, n.º 8 (2013): 080501–80503. http://dx.doi.org/10.3788/col201311.080501.
Texto completoLin, Jian-Shian, Chieh-Lung Lai, Ya-Chun Tu, Cheng-Hua Wu y Yoshimi Takeuchi. "A Uniform Pressure Apparatus for Micro/Nanoimprint Lithography Equipment". International Journal of Automation Technology 3, n.º 1 (5 de enero de 2009): 84–88. http://dx.doi.org/10.20965/ijat.2009.p0084.
Texto completoLee, Su Yong, Do Young Noh, Hae Cheol Lee, Chung-Jong Yu, Yeukuang Hwu y Hyon Chol Kang. "Direct-write X-ray lithography using a hard X-ray Fresnel zone plate". Journal of Synchrotron Radiation 22, n.º 3 (2 de abril de 2015): 781–85. http://dx.doi.org/10.1107/s1600577515003306.
Texto completoHruby, Jill. "LIGA Technologies and Applications". MRS Bulletin 26, n.º 4 (abril de 2001): 337–40. http://dx.doi.org/10.1557/mrs2001.76.
Texto completoOKAZAKI, SHINJI. "CURRENT ISSUES AND FUTURE PROSPECTS OF LITHOGRAPHY". International Journal of High Speed Electronics and Systems 16, n.º 01 (marzo de 2006): 375–87. http://dx.doi.org/10.1142/s0129156406003709.
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