Literatura académica sobre el tema "Lithography"
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Artículos de revistas sobre el tema "Lithography"
Vandаlovskyi, V. "Artistic and technical features of the lithographic manner mixed technique". Research and methodological works of the National Academy of Visual Arts and Architecture, n.º 27 (27 de febrero de 2019): 92–98. http://dx.doi.org/10.33838/naoma.27.2018.92-98.
Texto completoKwon, B. y Jong H. Kim. "Importance of Molds for Nanoimprint Lithography: Hard, Soft, and Hybrid Molds". Journal of Nanoscience 2016 (22 de junio de 2016): 1–12. http://dx.doi.org/10.1155/2016/6571297.
Texto completoWen, Zaoxia, Xingyu Liu, Wenxiu Chen, Ruolin Zhou, Hao Wu, Yongmei Xia y Lianbin Wu. "Progress in Polyhedral Oligomeric Silsesquioxane (POSS) Photoresists: A Comprehensive Review across Lithographic Systems". Polymers 16, n.º 6 (19 de marzo de 2024): 846. http://dx.doi.org/10.3390/polym16060846.
Texto completoLund, Sarah E. "Fossils: Lithography’s Porous Time and Eugène Delacroix’s Faust Marginalia". Nineteenth Century Studies 35 (noviembre de 2023): 1–32. http://dx.doi.org/10.5325/ninecentstud.35.0001.
Texto completoPrakoso, Emmanuel Putro, Inovensius Hugo Bima Wicaksana, Nick Soedarso y Rina Carina. "TEKNIK CETAK DATAR KITCHEN LITHOGRAPY SEBAGAI MEDIA EKSPRESI DESAIN PADA METODE REPRODUKSI GRAFIKA". Jurnal Dimensi DKV Seni Rupa dan Desain 4, n.º 2 (1 de octubre de 2019): 155. http://dx.doi.org/10.25105/jdd.v4i2.5888.
Texto completoWu, Yu y Zihao Xiao. "The Recent Progress of Lithography Machine and the State-of-art Facilities". Highlights in Science, Engineering and Technology 5 (7 de julio de 2022): 155–65. http://dx.doi.org/10.54097/hset.v5i.737.
Texto completoVoznyuk G. V., Grigorenko I. N., Mitrofanov M. I., Nikolaev V. V. y Evtikhiev V. P. "Subwave textured surfaces for the radiation coupling from the waveguide". Technical Physics Letters 48, n.º 3 (2022): 76. http://dx.doi.org/10.21883/tpl.2022.03.52896.19103.
Texto completoSharma, Ekta, Reena Rathi, Jaya Misharwal, Bhavya Sinhmar, Suman Kumari, Jasvir Dalal y Anand Kumar. "Evolution in Lithography Techniques: Microlithography to Nanolithography". Nanomaterials 12, n.º 16 (11 de agosto de 2022): 2754. http://dx.doi.org/10.3390/nano12162754.
Texto completoZhang, Zhen. "Optimization of Triple Periodic Bilayer Stacks and Aerial Image Performance Analysis". International Journal of Electronics and Electrical Engineering 8, n.º 3 (septiembre de 2020): 53–57. http://dx.doi.org/10.18178/ijeee.8.3.53-57.
Texto completoSeo, Manseung, Haeryung Kim y Masahiko Onosato. "Lithography Using a Microelectronic Mask". Journal of Robotics and Mechatronics 18, n.º 6 (20 de diciembre de 2006): 816–23. http://dx.doi.org/10.20965/jrm.2006.p0816.
Texto completoTesis sobre el tema "Lithography"
Benoit-Renault, Viviane. "La lithographie en Bretagne (1819-1914)". Thesis, Paris 4, 2014. http://www.theses.fr/2014PA040217.
Texto completoIn the history of print, the study of lithography in province has long been neglected. The first founding worksonly date back to the last forty years. The purpose of this thesis on the history of art is to address this shortcomingby analysing lithography in historical Brittany between 1819 and 1914 bearing an interdisciplinarity mind open toeconomic and social history.Initially this research will be based on the study of lithographic printing. Following a general overviewon the evolution of the number of workshops and their geographical breakdown, leading and secondarylithographic centres are being considered. On the other hand, autographic printing which established itself andcame into competition with the lithographic workshops is being analysed with an emphasis on tin-plate printingworkshops being a characteristic feature of Brittany. Beyond this historical study, the following chapter paints aportrait of the printers and that of the lithographic production scene which being a social environment. It is aworld whereby the painter mingles with the professional lithographer, the drawing lover, the printer and thecraftsman. The reality of the printing world is being addressed in the third chapter with a particular focus on theworkshop and the history of the equipment specific to printing (plates and moulds). Subsequently the workshop isseen as a world in its own right with its celebrations and codes responsible for the working cohesion. This unitywill be accentuated in the second half of the XIX century with the constitution of lithographers unions. Thanksto the creation of a lithographs inventory drawn upon the austerity regarding registration of copyright and printpublic funds, the analysis of the print production in Brittany reveals an unexpected thematic diversity. The artisticprint on sheet, collections or illustrated albums is analysed from a stylistic and iconographic point of view.Finally, the study of useful lithography and the tin-box will bring this chapter to a close.Print trade which formsthe last link in the production chain is recounted through its merchants, a trade being transformed throughout XIXcentury, door-to-door and casual sellers. Lastly, the topic of the diffusion of print in Brittany is put forward asbeing the market place of Breton lithography within a national and international network
Hauser, Hubert [Verfasser] y Holger [Akademischer Betreuer] Reinecke. "Nanoimprint lithography for solar cell texturisation = Nanoimprint Lithographie fuer die Solarzellentexturierung". Freiburg : Universität, 2013. http://d-nb.info/1123476160/34.
Texto completoZheng, Zijian. "Soft lithography and nanoimprint lithography for applications in polymer electronics". Thesis, University of Cambridge, 2007. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.613415.
Texto completoKandulski, Witold. "Shadow nanosphere lithography". [S.l.] : [s.n.], 2007. http://deposit.ddb.de/cgi-bin/dokserv?idn=985533013.
Texto completoMusgraves, J. David. "Maskless Projection Lithography". Scholarship @ Claremont, 2003. http://scholarship.claremont.edu/pomona_theses/17.
Texto completoSchmidt, Aaron Jerome 1979. "Contact thermal lithography". Thesis, Massachusetts Institute of Technology, 2004. http://hdl.handle.net/1721.1/27116.
Texto completoIncludes bibliographical references (p. 65-67).
Contact thermal lithography is a method for fabricating microscale patterns using heat transfer. In contrast to photolithography, where the minimum achievable feature size is proportional to the wavelength of light used in the exposure process, thermal lithography is limited by a thermal diffusion length scale and the geometry of the situation. In this thesis the basic principles of thermal lithography are presented. A traditional chrome-glass photomask is brought into contact with a wafer coated with a thermally sensitive polymer. The mask-wafer combination is flashed briefly with high intensity light, causing the chrome features heat up and conduct heat locally to the polymer, transferring a pattern. Analytic and finite element models are presented to analyze the heating process and select appropriate geometries and heating times. In addition, an experimental version of a contact thermal lithography system has been constructed and tested. Early results from this system are presented, along with plans for future development.
by Aaron Jerome Schmidt.
S.M.
Brodsky, Colin John. "Graft polymerization lithography". Access restricted to users with UT Austin EID Full text (PDF) from UMI/Dissertation Abstracts International, 2001. http://wwwlib.umi.com/cr/utexas/fullcit?p3024998.
Texto completoBaker, Mark. "Metastable Atom Lithography". Thesis, Griffith University, 2008. http://hdl.handle.net/10072/365477.
Texto completoThesis (PhD Doctorate)
Doctor of Philosophy (PhD)
School of Biomolecular and Physical Sciences
Faculty of Science
Full Text
Park, Jea Woo. "Lithography Hotspot Detection". PDXScholar, 2017. https://pdxscholar.library.pdx.edu/open_access_etds/3781.
Texto completoMeyers, Bernard C. "Nagual interpretations /". Online version of thesis, 1990. http://hdl.handle.net/1850/10953.
Texto completoLibros sobre el tema "Lithography"
Landis, Stefan, ed. Lithography. Hoboken, NJ USA: John Wiley & Sons, Inc., 2013. http://dx.doi.org/10.1002/9781118557662.
Texto completoShappo, Aleksandr. Lithography. Minsk]: Shappo.org, 2016.
Buscar texto completoBrighton, University Of. Lithography. Brighton: University of Brighton, 1993.
Buscar texto completoSotomayor Torres, Clivia M., ed. Alternative Lithography. Boston, MA: Springer US, 2003. http://dx.doi.org/10.1007/978-1-4419-9204-8.
Texto completoStampfl, Jürgen, Robert Liska y Aleksandr Ovsianikov, eds. Multiphoton Lithography. Weinheim, Germany: Wiley-VCH Verlag GmbH & Co. KGaA, 2016. http://dx.doi.org/10.1002/9783527682676.
Texto completoMa, Xu y Gonzalo R. Arce. Computational Lithography. Hoboken, NJ, USA: John Wiley & Sons, Inc., 2010. http://dx.doi.org/10.1002/9780470618943.
Texto completoMoreau, Wayne M. Semiconductor Lithography. Boston, MA: Springer US, 1988. http://dx.doi.org/10.1007/978-1-4613-0885-0.
Texto completoOzel, Tuncay. Coaxial Lithography. Cham: Springer International Publishing, 2016. http://dx.doi.org/10.1007/978-3-319-45414-6.
Texto completoLandis, Stefan, ed. Nano-Lithography. Hoboken, NJ USA: John Wiley & Sons, Inc., 2013. http://dx.doi.org/10.1002/9781118622582.
Texto completoR, Arce Gonzalo, ed. Computational lithography. Hoboken, N.J: Wiley, 2010.
Buscar texto completoCapítulos de libros sobre el tema "Lithography"
Anner, George E. "Lithography". En Planar Processing Primer, 439–91. Dordrecht: Springer Netherlands, 1990. http://dx.doi.org/10.1007/978-94-009-0441-5_11.
Texto completoVeendrick, Harry. "Lithography". En Bits on Chips, 151–66. Cham: Springer International Publishing, 2018. http://dx.doi.org/10.1007/978-3-319-76096-4_9.
Texto completoKim, Dae-Eun y In-Ha Sung. "Lithography". En Encyclopedia of Tribology, 1994–2007. Boston, MA: Springer US, 2013. http://dx.doi.org/10.1007/978-0-387-92897-5_1051.
Texto completoEl-Kareh, Badih. "Lithography". En Fundamentals of Semiconductor Processing Technology, 169–260. Boston, MA: Springer US, 1995. http://dx.doi.org/10.1007/978-1-4615-2209-6_4.
Texto completoMorita, Hiroshi. "Lithography". En Computer Simulation of Polymeric Materials, 389–96. Singapore: Springer Singapore, 2016. http://dx.doi.org/10.1007/978-981-10-0815-3_29.
Texto completoWidmann, Dietrich, Hermann Mader, Hans Friedrich, Walter Heywang y Rudolf Müller. "Lithography". En Technology of Integrated Circuits, 95–167. Berlin, Heidelberg: Springer Berlin Heidelberg, 2000. http://dx.doi.org/10.1007/978-3-662-04160-4_4.
Texto completoGooch, Jan W. "Lithography". En Encyclopedic Dictionary of Polymers, 431. New York, NY: Springer New York, 2011. http://dx.doi.org/10.1007/978-1-4419-6247-8_6976.
Texto completoSarangan, Andrew. "Lithography". En Nanofabrication, 139–207. Boca Raton : CRC Press, Taylor & Francis Group, 2017. | Series: Optical sciences and applications of light: CRC Press, 2016. http://dx.doi.org/10.1201/9781315370514-6.
Texto completoGatzen, Hans H., Volker Saile y Jürg Leuthold. "Lithography". En Micro and Nano Fabrication, 313–95. Berlin, Heidelberg: Springer Berlin Heidelberg, 2015. http://dx.doi.org/10.1007/978-3-662-44395-8_6.
Texto completoMizuno, Fumio. "Lithography". En Ultraclean Surface Processing of Silicon Wafers, 398–413. Berlin, Heidelberg: Springer Berlin Heidelberg, 1998. http://dx.doi.org/10.1007/978-3-662-03535-1_29.
Texto completoActas de conferencias sobre el tema "Lithography"
Lum, Bernice M., Andrew R. Neureuther y Glenn D. Kubiak. "Modeling Soft X-Ray Projection Lithography". En Soft X-Ray Projection Lithography. Washington, D.C.: Optica Publishing Group, 1993. http://dx.doi.org/10.1364/sxray.1993.tud.10.
Texto completoVoelkel, Reinhard, Uwe Vogler, Arianna Bramati, Andreas Erdmann, Nezih Ünal, Ulrich Hofmann, Marc Hennemeyer, Ralph Zoberbier, David Nguyen y Juergen Brugger. "Lithographic process window optimization for mask aligner proximity lithography". En SPIE Advanced Lithography, editado por Kafai Lai y Andreas Erdmann. SPIE, 2014. http://dx.doi.org/10.1117/12.2046332.
Texto completoMcCallum, Martin. "Some lithographic limits of back end lithography". En Microelectronic and MEMS Technologies, editado por Chris A. Mack y Tom Stevenson. SPIE, 2001. http://dx.doi.org/10.1117/12.425217.
Texto completoHawryluk, A. M., D. R. Kania, P. Celliers, L. DaSilva, A. Stith, D. Stewart y S. Mrowka. "EUV Reticle Pattern Repair Experiments using 10 KeV Neon Ions". En Extreme Ultraviolet Lithography. Washington, D.C.: Optica Publishing Group, 1994. http://dx.doi.org/10.1364/eul.1994.rmm.204.
Texto completoSasian, Jose M. "New developments in the design of ring field projection cameras for EUV lithography". En International Optical Design Conference. Washington, D.C.: Optica Publishing Group, 1998. http://dx.doi.org/10.1364/iodc.1998.lthd.1.
Texto completoTrucano, Timothy G., Dennis E. Grady, Richard E. Olson y Archie Farnsworth. "Computational Analysis of Debris Formation in SXPL Laser-Plasma Sources". En Soft X-Ray Projection Lithography. Washington, D.C.: Optica Publishing Group, 1993. http://dx.doi.org/10.1364/sxray.1993.tud.12.
Texto completoSweatt, William C. "High Efficiency Condenser Design for Illuminating a Ring Field". En Soft X-Ray Projection Lithography. Washington, D.C.: Optica Publishing Group, 1993. http://dx.doi.org/10.1364/sxray.1993.mb.5.
Texto completoMarrian, Christie R., Elizabeth A. Dobisz y John A. Dagata. "Scanning tunneling microscope lithography: a viable lithographic technology?" En Micro - DL Tentative, editado por Martin C. Peckerar. SPIE, 1992. http://dx.doi.org/10.1117/12.136012.
Texto completoNeisser, Mark, Harry J. Levinson, Stefan Wurm, David Kyser, Takeo Watanabe, Ken Macwilliams, Hidemi Ishiuchi et al. "Lithography". En 2021 IEEE International Roadmap for Devices and Systems Outbriefs. IEEE, 2021. http://dx.doi.org/10.1109/irds54852.2021.00017.
Texto completoHawryluk, Andrew M. "Reflection Masks for Soft X-Ray Projection Lithography". En Soft X-Ray Projection Lithography. Washington, D.C.: Optica Publishing Group, 1991. http://dx.doi.org/10.1364/sxray.1991.fc2.
Texto completoInformes sobre el tema "Lithography"
Park, Jea. Lithography Hotspot Detection. Portland State University Library, enero de 2000. http://dx.doi.org/10.15760/etd.5665.
Texto completoLewis, Aaron. Wavelength Independent Optical Lithography. Fort Belvoir, VA: Defense Technical Information Center, junio de 1986. http://dx.doi.org/10.21236/ada171935.
Texto completoJi, Qing. Maskless, resistless ion beam lithography. Office of Scientific and Technical Information (OSTI), enero de 2003. http://dx.doi.org/10.2172/809301.
Texto completoZotter, Beth. Holographic Lithography for Industrial Nanomanufacturing. Office of Scientific and Technical Information (OSTI), marzo de 2020. http://dx.doi.org/10.2172/1614764.
Texto completoBrowning, R. y R. F. Pease. Low Voltage Electron Beam Lithography. Fort Belvoir, VA: Defense Technical Information Center, abril de 1994. http://dx.doi.org/10.21236/ada281046.
Texto completoNAVAL RESEARCH LAB WASHINGTON DC. Low Voltage Electron Beam Lithography. Fort Belvoir, VA: Defense Technical Information Center, marzo de 1995. http://dx.doi.org/10.21236/ada293396.
Texto completoLiu, Weidong. Low Voltage Electron Beam Lithography. Fort Belvoir, VA: Defense Technical Information Center, junio de 1995. http://dx.doi.org/10.21236/ada296625.
Texto completoBrowning, R. y R. F. Pease. Low Voltage Electron Beam Lithography. Fort Belvoir, VA: Defense Technical Information Center, octubre de 1992. http://dx.doi.org/10.21236/ada263360.
Texto completoBrowning, R. y R. F. Pease. Low Voltage Electron Beam Lithography. Fort Belvoir, VA: Defense Technical Information Center, febrero de 1993. http://dx.doi.org/10.21236/ada265358.
Texto completoCramer, Corson, Alicia Raftery y Andrew Nelson. Lithography-based Ceramics Manufacturing Technologies. Office of Scientific and Technical Information (OSTI), septiembre de 2019. http://dx.doi.org/10.2172/1659632.
Texto completo