Tesis sobre el tema "Hot carrier solar cell"
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Vezin, Thomas. "Uneven temperatures in hot carrier solar cells : optical characterization and device simulation". Electronic Thesis or Diss., Institut polytechnique de Paris, 2024. http://www.theses.fr/2024IPPAX061.
Texto completoHot-carrier solar cells promise theoretical efficiencies exceeding 66%. However, actual devicesexhibit significantly lower efficiencies, around 10%. To understand this discrepancy, it is necessary to complicate our understanding of hot-carrier solar cells by introducing non-ideal effects. In this thesis, we study two “uneven temperature” effects: (i) the existence of a temperature gradient within the absorber (inhomogeneous temperature) and (ii) the existence of two different temperatures for electrons and holes. In the first case, we propose a theoretical description of transport adapted to this specific situation. We show that the transport is ambipolar and thermoelectric, and we propose a theoretical expression for the transport coefficients. Next, we suggest an experiment based on hyperspectral photoluminescence imaging in steady-state to characterize transport coefficients. In particular, we measure the ambipolar Seebeck coefficient of an (In,Ga,As)P quantum well. In the second case, we begin by proving that electron and hole temperatures s are both accessible through steady-state photoluminescence spectroscopy. Indeed, the absorptivity of a sample depends on the distributions of electrons and holes due to the ”band filling” effect. This technique requires that the sample be subjected to intense excitation, ensuring that the electrons and holes are in a degenerate regime. Finally, we studied the impact of these two uneven temperature effects on the operation of hot-carrier solar cells. We first calculated the voltage of a cell subject to either of these effects and showed that they result in identical cell voltage. We then demonstrated that the temperature difference between electrons and holes (at a fixed effective temperature) leads to an increase in cell efficiency, by about 1 to 2 points maximum. This effect being limited, precise characterization of electron and hole temperatures is unnecessary to design hot-carrier solar cells
Rodière, Jean. "Optoelectronic characterization of hot carriers solar cells absorbers". Thesis, Paris 6, 2014. http://www.theses.fr/2014PA066703/document.
Texto completoThe hot carrier solar cell is an energy conversion device where theoretical conversion efficiencies reach almost 86%. Additionally to a standard photovoltaic cell, the device allows the conversion of kinetic energy excess of photogenerated carriers into electrical energy. To achieve this, the thermalisation process must be limited and electrical energy selective contacts added. In order to determine potential absorber performances and overcome the fabrication challenge of energy selective contacts, a set-up and the related method of mapping absolute photoluminescence spectra were used. This technique allows getting quasi-Fermi levels splitting and temperature of emission, both thermodynamic quantities characteristic of the performance of the absorbers. In this study, absorbers based on InGaAsP multiquantum wells on InP substrate were used. The thermodynamic quantities are determined and allow to access at quantities such as thermalisation rate but also a thermoelectric coefficient, so-called Photo-Seebeck. The quantitative analysis of the hot carriers regime, in relevant conditions for photovoltaic is a first: the analysed device indicates a potential photovoltaic conversion over the Schockley-Queisser limit. At last, as the device is supplied with electrical contacts, electrical characterization are made and compared to optical measurements. A first simulation is proposed to better understand the thermodynamic quantities evolution as a function of the electrical bias
Rodière, Jean. "Optoelectronic characterization of hot carriers solar cells absorbers". Electronic Thesis or Diss., Paris 6, 2014. https://accesdistant.sorbonne-universite.fr/login?url=https://theses-intra.sorbonne-universite.fr/2014PA066703.pdf.
Texto completoThe hot carrier solar cell is an energy conversion device where theoretical conversion efficiencies reach almost 86%. Additionally to a standard photovoltaic cell, the device allows the conversion of kinetic energy excess of photogenerated carriers into electrical energy. To achieve this, the thermalisation process must be limited and electrical energy selective contacts added. In order to determine potential absorber performances and overcome the fabrication challenge of energy selective contacts, a set-up and the related method of mapping absolute photoluminescence spectra were used. This technique allows getting quasi-Fermi levels splitting and temperature of emission, both thermodynamic quantities characteristic of the performance of the absorbers. In this study, absorbers based on InGaAsP multiquantum wells on InP substrate were used. The thermodynamic quantities are determined and allow to access at quantities such as thermalisation rate but also a thermoelectric coefficient, so-called Photo-Seebeck. The quantitative analysis of the hot carriers regime, in relevant conditions for photovoltaic is a first: the analysed device indicates a potential photovoltaic conversion over the Schockley-Queisser limit. At last, as the device is supplied with electrical contacts, electrical characterization are made and compared to optical measurements. A first simulation is proposed to better understand the thermodynamic quantities evolution as a function of the electrical bias
Jiang, Chu-Wei School of Photovoltaic Engineering UNSW. "Theoretical and experimental study of energy selective contacts for hot carrier solar cells and extensions to tandem cells". Awarded by:University of New South Wales. School of Photovoltaic Engineering, 2005. http://handle.unsw.edu.au/1959.4/23065.
Texto completoZhang, Qingrong. "Hot Carriers in Thin-film Absorbers". Thesis, KTH, Skolan för industriell teknik och management (ITM), 2021. http://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-303146.
Texto completoSolenergi är en av de mest lovande källorna för att konfrontera energikrisen. Och heta bärsolceller kan vara framtiden för att öka solcellernas effektivitet till att överskrida den teoretiska effektivitetsgränsen, Shockley-Queisser-gränsen. Efter teoretisk förståelse av några väsentliga aspekter av varmbärarsolceller, för att bättre förstå egenskaperna hos heta bärare och termismeringsmekanismerna bakom den, utförs analys baserad på fotoluminescensspektra för GaAs tunnfilmsabsorberprover med olika tjocklekar. Enligt resultaten av analysen kommer information om egenskaperna hos heta bärare i tunnfilmiga GaA-absorberare att extraheras, liksom en slutsats baserad på dessa resultat.
Behaghel, Benoît. "Fabrication and investigation of III-V quantum structured solar cells with Fabry-Pérot cavity and nanophotonics in order to explore high-efficiency photovoltaic concepts : towards an intermediate band assisted hot carrier solar cell". Thesis, Paris 6, 2017. http://www.theses.fr/2017PA066729/document.
Texto completoIn the past decade, photovoltaics (PV) has become a key player for the future of worldwide energy generation. Innovation in PV is likely to rely on high efficiency PV with flexible and lightweight thin films to enable PV deployement for mobile applications. In the framework of the Japanese-French laboratory “NextPV”, this thesis investigates the development of III-V quantum structured solar cells to explore high-efficiency photovoltaic concepts especially intermediate band solar cells (IBSC). Quantum structured IBSC have proven to be limited by thermal escape at room temperature and by low subbandgap light absorption. Following a consistent approach, we evaluate the topology, thermal escape mechanism, quantum structure and optical absorption of In(Ga)As quantum dots in a wide gap Al0.2GaAs host material. We also characterize quantitatively the device operation and improve the optical design. For a high irradiation, we evidence a hot carrier population in the quantum dots. At the same time, sequential two-photon absorption (S-TPA) is demonstrated both optically and electrically. We also show that S-TPA for both subbandgap transitions can be enhanced by a factor x5-10 with light management techniques, for example by implementation of Fabry-Perot cavities with the different epitaxial transfer methods that we developed. More advanced periodical nanostructures were also fabricated in the case of multi-quantum well solar cells using nanoimprint lithography techniques. Overall we discuss the possibility of realizing intermediate-band-assisted hotcarrier solar cells with light management to open the path for high-efficiency quantum structured IBSC
Behaghel, Benoît. "Fabrication and investigation of III-V quantum structured solar cells with Fabry-Pérot cavity and nanophotonics in order to explore high-efficiency photovoltaic concepts : towards an intermediate band assisted hot carrier solar cell". Electronic Thesis or Diss., Paris 6, 2017. http://www.theses.fr/2017PA066729.
Texto completoIn the past decade, photovoltaics (PV) has become a key player for the future of worldwide energy generation. Innovation in PV is likely to rely on high efficiency PV with flexible and lightweight thin films to enable PV deployement for mobile applications. In the framework of the Japanese-French laboratory “NextPV”, this thesis investigates the development of III-V quantum structured solar cells to explore high-efficiency photovoltaic concepts especially intermediate band solar cells (IBSC). Quantum structured IBSC have proven to be limited by thermal escape at room temperature and by low subbandgap light absorption. Following a consistent approach, we evaluate the topology, thermal escape mechanism, quantum structure and optical absorption of In(Ga)As quantum dots in a wide gap Al0.2GaAs host material. We also characterize quantitatively the device operation and improve the optical design. For a high irradiation, we evidence a hot carrier population in the quantum dots. At the same time, sequential two-photon absorption (S-TPA) is demonstrated both optically and electrically. We also show that S-TPA for both subbandgap transitions can be enhanced by a factor x5-10 with light management techniques, for example by implementation of Fabry-Perot cavities with the different epitaxial transfer methods that we developed. More advanced periodical nanostructures were also fabricated in the case of multi-quantum well solar cells using nanoimprint lithography techniques. Overall we discuss the possibility of realizing intermediate-band-assisted hotcarrier solar cells with light management to open the path for high-efficiency quantum structured IBSC
Hirst, Louise. "A spectroscopic study of strain-balanced InGaAs/GaAsP quantum well structures as absorber materials for hot carrier solar cells". Thesis, Imperial College London, 2012. http://hdl.handle.net/10044/1/10474.
Texto completoLe, bris Arthur. "Etude de faisabilité d'un dispositif photovoltaïque à porteurs chauds". Phd thesis, Ecole Centrale Paris, 2011. http://tel.archives-ouvertes.fr/tel-00646713.
Texto completoHo, Carr Hoi Yi. "Toward better performing organic solar cells: impact of charge carrier transport and electronic interactions in bulk heterojunction blends /Ho Hoi Yi, Carr". HKBU Institutional Repository, 2017. https://repository.hkbu.edu.hk/etd_oa/359.
Texto completoMills, Ted Jonathan. "Direct imaging of minority charge carrier transport in triple junction solar cell layers". Thesis, Monterey, Calif. : Naval Postgraduate School, 2006. http://bosun.nps.edu/uhtbin/hyperion.exe/06Dec%5FMills.pdf.
Texto completoThesis Advisor(s): Nancy M. Haegel, Sherif Michael. "December 2006." Includes bibliographical references (p. 63-64). Also available in print.
Lau, Yin Ping. "Si/CdTe heterojunction fabricated by closed hot wall system". HKBU Institutional Repository, 1995. http://repository.hkbu.edu.hk/etd_ra/44.
Texto completoSingh, Surjeet. "Mathematical Modeling of a P-N Junction Solar Cell using the Transport Equations". Wright State University / OhioLINK, 2017. http://rave.ohiolink.edu/etdc/view?acc_num=wright1496054495555896.
Texto completoHsu, Chih-An. "Absorber and Window Study – CdSexTe1-x/CdTe Thin Film Solar Cells". Scholar Commons, 2019. https://scholarcommons.usf.edu/etd/7813.
Texto completoMori, Daisuke. "Development of Polymer Blend Solar Cells Composed of Conjugated Donor and Acceptor Polymers". 京都大学 (Kyoto University), 2015. http://hdl.handle.net/2433/199331.
Texto completoKotsedi, Lebogang. "Fabrication and characterization of a solar cell using an aluminium p-doped layer in the hot-wire chemical vapour deposition process". Thesis, University of the Western Cape, 2010. http://etd.uwc.ac.za/index.php?module=etd&action=viewtitle&id=gen8Srv25Nme4_1349_1363785866.
Texto completoWhen the amorphous silicon (a-Si) dangling bonds are bonded to hydrogen the concentration of the dangling bond is decreased. The resulting film is called hydrogenated amorphous silicon (a-Si:H). The reduction in the dangling bonds concentration improves the optoelectrical properties of the film. The improved properties of a-Si:H makes it possible to manufacture electronic devices including a solar cell. A solar cell device based on the hydrogenated amorphous silicon (a-Si:H) was fabricated using the Hot-Wire Chemical Vapour Deposition (HWCVD). When an n-i-p solar cell configuration is grown, the norm is that the p-doped layer is deposited from a mixture of silane (SiH4) gas with diborane (B2H6). The boron atoms from diborane bonds to the silicon atoms and because of the number of the valance electrons, the grown film becomes a p-type film. Aluminium is a group 3B element and has the same valence electrons as boron, hence it will also produce a p-type film when it bonds with silicon. In this study the p-doped layer is grown from the co-deposition of a-Si:H from SiH4 with aluminium evaporation resulting in a crystallized, p-doped thin film. When this thin film is used in the n-i-p cell configuration, the device shows photo-voltaic activity. The intrinsic layer and the n-type layers for the solar cell were grown from SiH4 gas and Phosphine (PH3) gas diluted in SiH4 respectively. The individual layers of the solar cell device were characterized for both their optical and electrical properties. This was done using a variety of experimental techniques. The analyzed results from the characterization techniques showed the films to be of device quality standard. The analysed results of the ptype layer grown from aluminium showed the film to be successfully crystallized and doped. A fully functional solar cell was fabricated from these layers and the cell showed photovoltaic activity.
 
Yang, Yiqun. "Integration of photosynthetic pigment-protein complexes in dye sensitized solar cells towards plasmonic-enhanced biophotovoltaics". Diss., Kansas State University, 2016. http://hdl.handle.net/2097/32857.
Texto completoDepartment of Chemistry
Jun Li
Solar energy as a sustainable resource is a promising alternative to fossil fuels to solve the tremendous global energy crisis. Development of three generation of solar cells has promoted the best sunlight to electricity conversion efficiency above 40%. However, the most efficient solar cells rely on expensive nonsustainable raw materials in device fabrication. There is a trend to develop cost-effective biophotovoltaics that combines natural photosynthetic systems into artificial energy conversion devices such as dye sensitized solar cells (DSSCs). In this research, a model system employs natural extract light-harvesting complex II (LHCII) as a light-absorbing sensitizer to interface with semiconductive TiO₂ and plasmonic nanoparticles in DSSCs. The goal of this research is to understand the fundamental photon capture, energy transfer and charge separation processes of photosynthetic pigment-protein complexes along with improving biophotovoltaic performance based on this model system through tailoring engineering of TiO₂ nanostructures, attaching of the complexes, and incorporating plasmonic enhancement. The first study reports a novel approach to linking the spectroscopic properties of nanostructured LHCII with the photovoltaic performance of LHCII-sensitized solar cells (LSSCs). The aggregation allowed reorganization between individual trimers which dramatically increased the photocurrent, correlating well with the formation of charge-transfer (CT) states observed by absorption and fluorescence spectroscopy. The assembled solar cells demonstrated remarkable stability in both aqueous buffer and acetonitrile electrolytes over 30 days after LHCII being electrostatically immobilized on amine-functionalized TiO₂ surface. The motivation of the second study is to get insights into the plasmonic effects on the nature of energy/charge transfer processes at the interface of photosynthetic protein complexes and artificial photovoltaic materials. Three types of core-shell (metal@TiO₂) plasmonic nanoparticles (PNPs) were conjugated with LHCII trimers to form hybrid systems and incorporated into a DSSC platform built on a unique open three-dimensional (3D) photoanode consisting of TiO₂ nanotrees. Enhanced photon harvesting capability, more efficient energy transfer and charge separation at the LHCII/TiO₂ interface were confirmed in the LHCII-PNP hybrids, as revealed by spectroscopic and photovoltaic measurements, demonstrating that interfacing photosynthesis systems with specific artificial materials is a promising approach for high-performance biosolar cells. Furthermore, the final study reveals the mechanism of hot electron injection by employing a mesoporous core-shell (Au@TiO₂) network as a bridge material on a micro-gap electrode to conduct electricity under illumination and comparing the photoconductance to the photovolatic properties of the same material as photoanodes in DSSCs. Based on the correlation of the enhancements in photoconductance and photovoltaics, the contribution of hot electrons was deconvoluted from the plasmonic near-field effects.
森, 大輔. "電子ドナーおよびアクセプター性共役高分子からなる高分子ブレンド薄膜太陽電池の開発". Kyoto University, 2015. http://hdl.handle.net/2433/199528.
Texto completoKhan, Imran Suhrid. "In Situ Extrinsic Doping of CdTe Thin Films for Photovoltaic Applications". Scholar Commons, 2018. http://scholarcommons.usf.edu/etd/7177.
Texto completoBenner, Frank. "Herstellung, Charakterisierung und Modellierung dünner aluminium(III)-oxidbasierter Passivierungsschichten für Anwendungen in der Photovoltaik". Doctoral thesis, Saechsische Landesbibliothek- Staats- und Universitaetsbibliothek Dresden, 2016. http://nbn-resolving.de/urn:nbn:de:bsz:14-qucosa-205353.
Texto completoHigh-efficiency solar cells rely on excellent passivation of the surface to ensure minimal recombination losses. In the last decade, Al2O3 became the material of choice for p-type Si in the photovoltaic industry. A remarkable surface passivation with effective minority carrier lifetimes close to the AUGER–limit was demonstrated with different deposition techniques. The excellent passivation effect of Al2O3 is attributed to two effects: Firstly, recombination centers at the Si−SiO2 interface get chemically passivated when hydrogen, for instance from the Al2O3 layer, saturates dangling bonds. Secondly, Al2O3 presents an outstanding level of field effect passivation due to its high concentration of intrinsic negative charges close to the SiO2 interface. The generated electrical field effectively repels electrons from surface recombination centers. Negative charges in Al2O3 are generally termed fixed charges. However, Al2O3 incorporates a high density of trap sites, too, that can be occupied by electrons. It was shown that the negative charge density in Al2O3 passivation layers depends on the electrical field and on the illumination intensity. The goal of this work is to systematically investigate dielectric passivation layer stacks for application on Si solar cells. The SiO2 interface quality and thickness plays a major role in this context, enabling or inhibiting carrier tunneling. Since the electron transport is a function of the oxide thickness, the balance between charge trapping and retention is achieved with approximately 2 nm of SiO2. Additionally, four relevant Al2O3 deposition techniques are compared: atomic layer deposition, sputtering, spray pyrolysis and spin–on coating, whereas the former is predominant. Using its flexibility, laminates comprising of Al2O3 and TiO2, HfO2 or SiO2 with subnanometer layers are compared. Although the latter do not show decreased surface recombination, nanolaminates with TiO2 and HfO2 contribute to the passivation. Their physical properties are described with a dynamic growth model that considers initial and steady–state growth rates for the involved metal oxides. Thin films with 0.2 % TiO2 or 7 % HfO2 are superior to conventional Al2O3 layers. In both cases, the modification of the field effect prevails the chemical effect, that is, however, virtually unchanged on a very high level with a density of interface traps of 5·1010 eV−1·cm−2 and below. The density of charges in both systems is changed via modifying either the polarity of intrinsic fixed charges or the ability of trapping charges within the layers. The observations of electron tunneling are explained by means of a mathematical model, describing a charging front, which moves through the dielectric layer
GOUTSOU, PERRAKI VASSILIKI. "Contribution a l'etude des cellules solaires epitaxiees sur si metallurgique". Paris 7, 1988. http://www.theses.fr/1988PA077138.
Texto completoHuang, Shih-Han y 黃詩涵. "Carrier Dynamics in Materials for Solar Cell Applications". Thesis, 2012. http://ndltd.ncl.edu.tw/handle/10327427225059706622.
Texto completo國立交通大學
電子物理系所
100
Carrier dynamics in materials for solar cell applications have been investigated by time-resolved photoluminescence. One is InAs self-assembled quantum dots (QDs) covered with a thin AlxGa1-xAs0.8Sb0.2 layer. There is a type I-like transition in type II InAs/GaAsSb QDs due to the recombination of electrons from QDs and holes residing in extended levels composed by the capping layer and the QDs, which is activated by thermal excitation. With the increasing Al content, a blueshift in the QD emission peak and a shortening of the PL decay time are observed, indicating that the band alignment can be controlled by varying the Al content in the AlGaAsSb capping layer. Increasing the valence band offset tend to push the hole wave function into QDs, which in turn improves the overlap between the electron and hole wave functions. According to the experimental results and the theoretical calculations based on eight-band k ⃑∙p ⃑ model, we demonstrate that the AlxGa1-xAs0.8Sb0.2 covered InAs QDs exhibit a type-I band alignment when the Al content exceeds 0.2.Another one is CIGS solar cell. High conversion efficiency in CIGS solar cell is associated with stronger PL intensity and longer carrier lifetime, which is caused by the domination of SRH recombination at room temperature. Besides, radiative recombination in CIGS device is strongly affected by the built-in electric field. Therefore, the intrinsic carrier lifetime can be obtained by injecting higher carrier density.
Chen, Chih-Wei y 陳致瑋. "Improving carrier collection with graded InGaN based solar cell". Thesis, 2016. http://ndltd.ncl.edu.tw/handle/2876fq.
Texto completo國立中央大學
光電科學與工程學系
105
The tunable band gaps of InGaN, spanning from 3.4eV (GaN) to 0.7eV (InN), make the ternary alloy an attractive material system for photovoltaic devices. Although the absorption of nearly full solar spectrum is theoretically possible with the multi-junction containing properly selected indium compositions, the measured conversion efficiencies of InGaN-based solar cells are typically below 3 %.The unsatisfactory performances can be attributed to many material issues such as the trade-off between long-wavelength absorption and high material qualities, insufficient carrier collection etc. In this work, a single InxGa1-xN layer with graded composition was employed as the active region for nitride-based solar cells. The goal is to increase carrier collection efficiencies and the wavelength range of optical absorption. Three types of solar cells were studied: the graded InxGa1-xN junctions with the lengths of 172 nm and 184 nm, and InxGa1-xN junction with fixed indium composition (x = 0.15). All the devices were grown by metal organic chemical vapor deposition (MOCVD). According to the results of J-V curves under solar illumination and quantum-efficiency spectra, it is found that photovoltaic performances measured with the graded junctions are superior to those obtained with fixed indium content, but lengthening the junction leads to lower efficiencies. The results indicate that carrier collection can be enhanced by the graded conduction and valence band edges. In addition, theoretical analyses based on self-consistent 1D Poisson and Schrödinger equations indicate that polarization effect also plays an important role in photo-current generation.
Shao-JungLu y 呂紹榮. "Influences of the Carrier Transport Layer on the Performances of Perovskite Solar Cell". Thesis, 2017. http://ndltd.ncl.edu.tw/handle/h87f87.
Texto completoHu, Hanlin. "Aggregation of Organic Semiconductors and Its Influence on Carrier Transport and Solar Cell Performance". Diss., 2017. http://hdl.handle.net/10754/625509.
Texto completoWu, Bing-Rui y 吳秉叡. "Fabrication of Silicon Thin Films Using Hot-Wire CVD for Solar Cell Applications". Thesis, 2011. http://ndltd.ncl.edu.tw/handle/hq22f9.
Texto completo國立中興大學
材料科學與工程學系所
99
Hot-wire chemical vapor deposition (HWCVD) is a promising technique for depositing device-quality thin amorphous, polycrystalline, and epitaxial silicon films at lower temperatures and higher deposition rates. With this technique, deposition species are generated by decomposition reaction of the source gases on the heated filament. Comparing with conventional plasma-enhanced CVD, main advantages of HWCVD are as follows: (1) low deposition temperature, (2) high deposition rate, (3) low equipment cost, (4) large area deposition, (5) high gas utilization, (6) absence of ion bombardment and easy control of the film crystallinity by varying composition of the gas. The primary aim of this dissertation can be divided into two parts: (1) to develop techniques of device-quality silicon films using HWCVD, and (2) to advance applications using silicon films deposited by HWCVD for silicon-base solar cells. A variety of materials, including intrinsic silicon (amorphous, microcrystalline, and polycrystalline), doped silicon (p-type and n-type), and p-type silicon carbide (SiC), was studied to make the films with device-quality. Role of the deposition parameters, mainly including filament temperature, substrate temperature, deposition pressure and gas dilution ratio, were considered to characterize the deposited films. Although the structural, electrical and optical properties can be individually analyzed by means of different characterization techniques, a clear correlation among them was observed. Finally, we produced device-quality intrinsic amorphous silicon films (energy gap (Eg) = 1.6-1.7 eV, dark-conductivity = 2.3×10-11 Ω-1cm-1, and photoconductivity = 6.1×10-4 Ω-1cm-1), poly-Si films (crystalline fraction > 93 %, grain size > 165 nm, Eg = 1.1 eV, dark-conductivity = 8.2×10-8 Ω-1cm-1 and photoconductivity = 1.1×10-5 Ω-1cm-1), n-type microcrystalline silicon (uc-Si) films (dark-conductivity = 0.292 Ω-1cm-1, activation energy (Ea) = 0.036 eV and Eg = 1.95 eV), p-type uc-Si films (dark-conductivity = 0.15 Ω-1cm-1, Ea = 0.05 eV and Eg = 2.18 eV) and p-type SiC films (carrier concentration = 1.03 × 1020 cm-3, Ea = 0.14 eV and dark-conductivity = 3.44 × 10-2 Ω-1cm-1). As the result shown above, those HWCVD deposited silicon films were confirmed to be using for solar cell applications. In this dissertation, a single-sided silicon heterojunction solar cell was fabricated and characterized with the structure of front contact/doped silicon thin emitter/intrinsic silicon thin buffer/mono-crystalline silicon absorber/rear contact. A doped silicon emitter layer is combined with a thin intrinsic amorphous silicon buffer upon a different type mono-crystalline silicon absorber to form the pn-junction cell. Such heterojunction cells had attracted much attention because of their high efficiency and low-cost fabrication process. The cell structure comprises an n-type uc-Si emitter on p-type wafer, laser-annealed n-type poly-Si emitter on p-type wafer, laser-doping patterned n-type uc-Si selective-emitter on p-type wafer, and finally a p-type uc-SiC emitter on n-type wafer. After optimizing the dopant dilution (PH3) for the n-type emitter deposition, a conversion efficiency of 13.35% was achieved for the silicon heterojunction cells with an n-type uc-Si film on the p-type wafer. To improve the n-type emitter properties, a laser crystallization technique is used to reduce the grain boundary defects of HWCVD deposited micro-crystalline n-type films. It was found that the cell performance can be enhanced under an optimum laser power density, where the 14.2% conversion efficiency has been obtained. Furthermore, a laser doping technique was employed to improve the contact resistance between indium-tin oxide and n-type emitter via the formation of the selective emitter structure. By optimizing the laser power density and doping-pattern design, a cell with a selective-emitter structure can achieve an efficiency of 14.31%. For p-type uc-SiC emitter on n-type wafer, a HWCVD deposited p-type uc-SiC film is used as a window layer in n-type crystalline silicon heterojunction solar cells. The effect of hydrogen dilution during p-type silicon carbide deposition on the material properties and cell performance are investigated. The silicon heterojunction cell with an efficiency of 14.5% can be achieved under a hydrogen flow ratio of 75% in the preparation of p-uc-SiC film for. These are very encouraging results for future fabrication of high efficiency heterojunction solar cells by using HWCVD technique.
Shih-Chen, Wang y 王世辰. "Investigation on a New Embedded Flash Memory Cell Using a SPICE-compatible Hot Carrier Injection Model". Thesis, 2003. http://ndltd.ncl.edu.tw/handle/71112768521637791024.
Texto completo國立清華大學
電子工程研究所
91
A new embedded-flash-memory cell consisting of two transistors fabricated by a standard CMOS process has been proposed by our lab. The cell is verified with good program and erase characteristics, but further investigation are not completed yet. Owing to the full compatibility with the standard CMOS process, such investigations can be fulfilled by SPICE simulations. Though accurate device characteristics is already obtained by the BSIM device model, but the lack of a sub-circuit model of the gate current injection mechanisms prohibits further studies of the cell behavior. Hence, a simulation tool compatible with SPICE is built up for cell structure optimization. There are two major aims in this study. One is the built-up of the circuit element of hot-carrier injection and a sub-circuit model to simulate the proposed cell. Fairly good agreements between simulation results and the measurement data are obtained with our sub-circuit model. The second aim of this study is to investigate the effect of various cell parameters on the cell behavior. Three kinds of design parameters — cell dimensions, operating voltages, and process variations — are discussed in this work. The influences of design parameters are verified with physical intuitions, hand calculation and simulation results. Through such discussions, the design direction of the novel cell is revealed. Those conclusions therefore can help further improvement of the array structure and new program / erase schemes to obtain better cell performance.
Hsieh, Pingchen y 謝秉宸. "Preparation and characterization of silicon-based thin film solar cell by hot-wire CVD". Thesis, 2012. http://ndltd.ncl.edu.tw/handle/65708051191071739257.
Texto completo明道大學
材料科學與工程學系碩士班
100
In this study, a self-developed in-line hotwire chemical vapor deposition (HWCVD) system was used for preparing amorphous silicon films for thin-film solar cell applications. The gas flow rate, filament temperature and substrate temperature were varied during the deposition process. The optical, electrical and structural properties of the films were measured using UV-vis spectrometer, scanning electron microscope, Raman spectrometer and surface profiler. The experiment results showed that a film with the best properties of band gap of 1.69 eV, photosensitivity of 3.64×104 and crystallinity of 34% could be deposited with a growth rate of 5.82 Å/s under following conditions: hydrogen gas flow rate of 0 sccm, silane gas flow rate of 20 sccm, filament temperature of 1500°C and substrate temperature of 400°C. Finally, as the film was applied to solar cell fabrication, the solar cell exhibited an open-circuit voltage of 0.65 V, a short-circuit current density of 8.02 mA/cm2, a fill factor of 0.5 and a conversion efficiency of 2.61 %.
Lin, Hong-Lin y 林宏霖. "Study of Perovskite Solar Cell Carrier Transporting Layers and Photovoltaics with Lead-free Active Layers". Thesis, 2017. http://ndltd.ncl.edu.tw/handle/srj9et.
Texto completoLee, Dong-Lung y 李東隆. "The Improvement of Hot Carrier Reliability Issues on Embeddable Low Power DINOR Flash Cell With STI Structure". Thesis, 2001. http://ndltd.ncl.edu.tw/handle/81458271778992513299.
Texto completo國立臺北科技大學
機電整合研究所
89
Recently, due to the semiconductor element fabrication technology has developed very rapid in flash memory technology. It has been widely employed in non-volatile semiconductor memories such as: IC card、hand-held Computer、Cameras and so on. The flash memory to act for hard disk drives for data storage must meet the requirement of small size, and low power consumption. For an advanced flash memory, the professor will focus on studying the threshold voltage shift, data retention time, P/E endurance, programming efficiency, erase speed, and so on. The flash memory can obtain higher device reliability, high performance, and integrity. The ULSI application goes on processing faster and voltage supply is trending lower, the more strictly to the technology of flash memory process. Since flash memory technology base on the localized oxidation isolation method (LOCOS) process technology can meet today's high-density requirement. Because of the conventional LOCOS isolation process has a problem known as “bird's beak encroachment”. Therefore, the scalability of the LOCOS is limited to about the um range. To increase the device integration level, different isolation techniques are required. Therefore, when considering the embedded requirement of future SOC (System On Chip) applications a low power flash cell with STI process module become must be. In recent years, it has been expected that STI process will improve both density and integration when compare to LOCOS process; but the local high stress electric field on STI edge will result in SILC (Stress Induced Leakage Current), which degrade the characteristics of data retention. In this thesis, we will investigate flash memory characteristics, which include hot carrier related issues, such as oxide damage, write/erase cycles endurance, read disturbance, data retention and so on in self-aligned flash memory cells and improvement.
Sio, Hang Cheong. "Carrier Recombination in Multicrystalline Silicon: A Study using Photoluminescence Imaging". Phd thesis, 2015. http://hdl.handle.net/1885/101930.
Texto completoLien, Shui-Yang y 連水養. "Fabrication and Characterization of Silicon Thin Films Using Hot-Wire CVD for Solar Cell Applications". Thesis, 2007. http://ndltd.ncl.edu.tw/handle/71634228508292105093.
Texto completo國立中興大學
材料工程學系所
95
Hot-Wire Chemical Vapor Deposition (Hot-Wire CVD) is a promising technique for deposition of amorphous, microcrystalline and polycrystalline silicon thin films for photovoltaic applications. The main advantages of Hot-Wire CVD over PE-CVD, which is currently the most widespread applied technique to deposit thin silicon films in industry, are (1) absence of ion bombardment, (2) high deposition rate, (3) low equipment cost and (4) high gas utilization. Possible issues in Hot-Wire CVD are the control of the substrate temperature and aging of the filaments. This thesis deals with the full spectrum of deposition, characterization and application of amorphous, microcrystalline and polycrystalline silicon thin films. We studied the role of the hydrogen dilution ratio (DH), the substrate temperature (Ts) and the filament temperature (Tf) on the film parameters. Microstructures of the Si films with different deposition parameters have been investigated. It was found that an enhancement of crystallization with the increase of hydrogen dilution ratio, substrate temperature and filament temperature. The hydrogen content (CH) in the film decreases with increase in hydrogen dilution ratio and substrate temperature, but CH increases with increase in filament temperature. A growth mechanism diagnosis for polycrystalline silicon deposition using Hot-Wire CVD is explored in this study. The role of the different parameters involved in the growth mechanism (filament temperature, substrate temperature and hydrogen dilution) was analyzed to optimize the properties of the deposited material. A wide range of microstructure features ranging from purely amorphous to highly crystalline (Xc > 0.93) was achieved after suitably tuning the deposition parameters. High Tf, Ts and/or DH allowed the deposition of highly crystalline material. Furthermore, an abrupt transition from a-Si to poly-Si was observed, especially when the influence of either DH or Ts were analyzed. The ability to deposit both p- and n-type uc-Si doped layers by means of Hot-Wire CVD after the addition of B2H6 and PH3 respectively was evaluated. Both n-type and p-type materials were obtained in a relatively straightforward manner, as similar conditions to those leading to our state-of-the-art intrinsic silicon films could be employed. For n-type uc-Si films, the doping ratio (Sd) of 1 % was used leading to acceptable electrical properties (σd = 0.292 Ω-1cm-1 and EA = 0.036 eV), which allowed the incorporation of this material in photovoltaic devices. In addition, the deposition of p-type uc-Si material proved low σd (~ 0.15 Ω-1cm-1) was obtained when typical doping ratios at 1 % were employed. Finally, we achieved a high efficiency of heterojunction solar cell due to the high optical band gap and low activation energy of n-type and p-type uc-Si prepared by Hot-Wire CVD. The above-mentioned results concerning material properties were applied in the deposition of our first p-type c-Si based heterojunction silicon solar cells grown by Hot-Wire CVD. These preliminary results concerned the analysis of several structures involving different device designs. The proper hydrogen pretreatment and buffer layer used in this work improves of n-layer/c-Si interface. The influences of hydrogen pre-treatment time and n-layer thickness on solar cell performance are studied. We investigated the light trapping effect of a silicon wafer with various pyramidal texture structures by simulation and experimental in this study. Ray-trace simulation in HJ silicon solar cells with various pyramidal texture structures was performed. After optimizing the deposition parameters of n-layer and the H2 pretreatment of solar cell, the single-side HJ solar cell with Jsc = 34.6 mA/cm2, Voc = 0.615 V, FF = 0.71, and efficiency of 15.1 % have been achieved. The double-side HJ solar cell with Jsc = 34.8 mA/cm2, Voc = 0.645 V, FF = 0.73, and efficiency of 16.4 % have been fabricated with optimum textured silicon substrate. The behavior of our HJ solar cells was simulated using a Pc1D simulation program. We present a selection of currently available numerical simulation tools for heterojunction silicon solar cells, and discuss their possibilities and limitations. Afterwards, some results obtained with numerical simulation will be presented. By means of modeling and numerical computer simulation, the influence of series resistance of device, substrate thickness, n-layer emitter thickness, n-layer crystallinity, i-layer thickness and i-layer crystallinity on the solar cell performance (efficiency, open-circuit voltage, short-circuit current, fill factor and internal quantum efficiency) is investigated and compared with experimental results for p-type wafer material. It is the aim of this work to improve the understanding of this device and to derive arguments for design optimization. To evaluate device properties a numerical analysis of the experimental results have been proposed and discussed. After optimizing all the simulated parameters of solar cell, the best results with Jsc = 39.4 mA/cm2, Voc = 0.64 V, FF = 83 % and efficiency = 21 % has been achieved. These are very encouraging results for future fabrication of high efficiency heterojunction solar cells at low temperature by Hot-Wire CVD.
Mao, Hsin-Yuan y 毛信元. "Hot-Wire Chemical Vapor Deposition of Si-Based Thin Films for Heterojunction Solar Cell Applications". Thesis, 2012. http://ndltd.ncl.edu.tw/handle/48192803861965128807.
Texto completo國立中興大學
材料科學與工程學系所
100
Hot-wire chemical vapor deposition (HWCVD) is one of the semiconductor fabrication processes to grow thin film materials. The HWCVD system is composed of vacuum system, gas flow controls, and catalytic wires where Tungsten, Tantalum or Iridium are often used. In a typical HWCVD process, the temperature of wire can increase to 1500~2000 by increasing the DC current. The source gases are entered into the vacuum chamber and decomposed (or catalyzed) by the high temperature wires. The substrate is exposed to one or more volatile precursors which react or decompose on the substrate surface to produce the desired deposit. The dissertation introduces the solar cell research evolution and the lately study of Si film. It also overviews the mechanisms of hot-wire chemical vapor deposition (HWCVD) and plasma enhanced chemical vapor deposition (PECVD). The advantages and the disadvantages of these two CVD are presented and compared. The study in the dissertation is using the HWCVD system and depositing Si based films for photovoltaic applications. The results includes four subjects of “Growth and characterization of intrinsic Si film”, “Deposition and characterization of poly-Si thin films using a two-step growth method”, “Deposition and characterization of p-type nanocrystalline Si (p-nc-Si) films for photovoltaic applications” and “Deposition and characterization of p-type nanocrystalline Si (p-nc-SiC)films for photovoltaic applications”. The intrinsic Si film such as amorphous, microcrystalline and polycrystalline have grown by HWCVD. The influence of deposition parameters such as substrate temperature and hydrogen dilution ratio has been presentation. Based on the identification of hydrogen dilution, a two-step growth method with high/low hydrogen dilution ratios was studied. In the two-step growth process, a thin seed layer was first grown on the glass substrate under high hydrogen dilution ratio and then a thick over layer was subsequently deposited upon the seed layer at a lower hydrogen dilution ratio. The amorphous Si incubation layer could be suppressed greatly in the initial growth of poly-Si film with the two-step growth method. In the subsequent poly-Si film thickening, a lower hydrogen dilution ratio value of the reactant gases can be applied to enhance the deposition rate. The electrical properties were also enhanced. The effects of H2 on the characteristics of p-nc-Si and p-nc-SiC films were analyzed. The optimized parameters of p-nc-Si and p-nc-SiC films were applied as emitter layer in the Si HJ solar cells. The 12.5 % and 14.09 % of photovoltaic conversion efficiencies could be obtained, respectively. These are very encouraging results for the industrial fabrication of high efficiency heterojunction solar cells by using HWCVD technique.
Chiu, Shih-Hsuan y 邱世璿. "Fabrication of Silicon Carbide Thin Films Using Hot-Wire CVD for Solar-Cell Intrinsic Layer Applications". Thesis, 2010. http://ndltd.ncl.edu.tw/handle/31541904960815976314.
Texto completo國立中興大學
材料科學與工程學系所
98
In this thesis, silicon carbide (SiC) thin films prepared by hot-wire chemical vapor deposition (HWCVD) system was investigated for absorption layer of thin-film solar cells applications. During the deposition, the gas flow rate ratios of SiH4 and CH4 and H2 dilution were varied to study the effects of process conditions on the optoelectronic characteristics and microstructures of SiC thin films. The optimized process conditions of SiC thin film deposition were used to fabricate thin film solar cells. Details of material characteristics of SiC thin films were investigated in terms of x-ray photoelectron spectroscopy (XPS), Fourier transform infrared (FTIR) spectrometer, x-ray diffraction (XRD), Raman spectroscopy, and field-emission scanning electron microscopy (FESEM). Electrical properties of SiC thin films were determined by I-V measurement under AM1.5. The optimum deposition conditions of SiC thin film were SiH4/CH4 ratio of 1 and without H2 dilution. The optical bandgap and ratio of photo- and dark-conductivity of SiC thin film were 1.98 eV and 1000, respectively. In thin film solar cell fabrication, p-type SiC, intrinsic SiC, and n-type microcrystalline Si thin films were prepared on ITO glass substrates by HWCVD system. Al back-electrode was used and prepared by electron-beam evaporation. The efficiency of SiC thin film solar cells was 2.44 %. The further improvement of process conditions on SiC thin film could be performed for tandem solar cells.
Liao, Cheng-Yuan y 廖正淵. "Numerical Simulation on Carrier Transport in a Thin-Film Amorphous Silicon Solar Cell with a Metal Grating". Thesis, 2012. http://ndltd.ncl.edu.tw/handle/82379087890152825752.
Texto completo國立臺灣大學
光電工程學研究所
100
The carrier transport of a thin-film amorphous silicon (a-Si) solar cell with a metal grating is numerically simulated, for a given generation rate in the solar cell. The solar cell structure consists of three parts: an ITO layer as the top contact, an a-Si layer and a metal Ag grating layer as the back contact. It is a two-dimensional problem to simulate the carrier transport in the a-Si region. Using the Gummel iteration method, we get the self-consistent solutions of the electron and hole continuity equations and the Poisson equation for the entire region of a-Si. At each iteration step, we solve the two-dimensional problem by repeatedly using the related one-dimensional model. In other words, the equations are not solved simultaneously in the two-dimensional region to save the memory and computer time. The simulated results reveal that the maximum efficiency of such a solar cell is enhanced, as compared with the reference flat solar cell of the same volume of a-Si. For the maximum efficiency, it can be increased from 5.93% to 8.24%, with a relative enhancement of about 39%.
Hsieh, Hsin-Yu y 謝昕佑. "Fabrication and characterization of p-type silicon films using hot-wire chemical vapor deposition for heterojunction solar cell applications". Thesis, 2011. http://ndltd.ncl.edu.tw/handle/qg335a.
Texto completo國立中興大學
材料科學與工程學系所
99
The silicon heterojunction solar cell (SHJPV) has received much attention because of its high conversion efficiency that could be achieved using a simple structure and a low process temperature. In this thesis, the device-quality p-type microcrystalline silicon thin film (p-uc-Si) was fabricated by hot-wire chemical vapor deposition (HWCVD) technique and the effects of wafer specification on the SHJPV cell performance were also investigated. In order to optimize the film quality, the HWCVD p-uc-Si films were fabricated under various hydrogen flow ratios. The film properties were identified by X-ray diffractormeter, field emission scanning electron microscopy, transmission electron microscopy, Raman spectrometer, Fourier-transform infrared spectrometer, Hall measurement and n&k analyzer. The results indicated that the crystallinity of p-uc-Si films was improved with increasing the H2 flow ratio. The optical energy gap, however, decreased as the H2 flow ratio increased. Under an optimum hydrogen flow rate of 50 sccm, a device-quality p-uc-Si film with carrier mobility of 1.38 cm2/V-s and concentration of 1.8x1019 cm-3 was obtained. The SHJPV (Al/ITO/p-uc-Si/intrinsic a-Si/n-wafer/ITO/Ag/Al) with an efficiency of 12.55% can be obtained using the p-uc-Si film as a window layer. For the wafer verification, it was found that the thicker wafer (100 to 675 um) leads to a higher efficiency (11.64 to 12.29 %). The smaller bulk resistivity (140 to 2 ohm-cm) results in a higher efficiency (10.9 to 12.24 %). The longer bulk lifetime (37.5 to 169.5 us) promotes a higher cell efficiency (12.04 to 12.71 %). These indicate that the wafer properties play important roles in determining the cell performance. Finally, the SHJPV with an efficiency of 12.71 % was achieved. This is a very promising result for future high-efficiency and low-cost SHJPVs.
Chen, Chang-Shian y 陳昶憲. "The Effects of the Photo-Generation Carrier Distribution on the Properties of Amorphous Si p-i-n thin film Solar Cell". Thesis, 2012. http://ndltd.ncl.edu.tw/handle/52379296585742891173.
Texto completo銘傳大學
電子工程學系碩士班
100
In this paper, theoretical efficiencies for amorphous Si ITO/p/i/n and ITO/p/i/n/Al solar cell are presented by solving the carrier transport equations including optical properties of the cell. Using the optical admittance method including the interference effect, the distribution of the photo-generation carriers in the solar cell under air mass 1.5 global irradiance spectra were obtained numerically. And the carrier distribution in i-layer of solar cell could be treated approximately as a function of exponential decay with a constant bias. First, the surface reflectance and absorption of the solar cell were calculated and the optical limited currents were also estimated according to the absorption in the solar cell. The optimal thickness of the ITO film could be determined to obtain the highest optically limited current. In order to study the effects of the carrier generation distribution, three different kinds of distributions were used in the calculation. For ITO/p/i/n structure, the maximum efficiency under constant carrier generation is 7.07% and the optimum i-layer thickness is 0.4μm. For carrier generation distribution of the G0+Ae^(-αx) and Ae^(-αx), the efficiency and optimum thickness are 7.07%, 0.6 μm and 6.12%, 0.4μm, respectively. Meanwhile, for ITO/p/i/n/Al structure, the maximum efficiency for constant carrier generation is 8.03% and the optimum i-layer thickness is 0.4μm. For carrier generation distribution of the G0+Ae^(-αx) and Ae^(-αx), the efficiency and optimum thickness are 8.23%, 0.5 μm and 7.43%, 0.3μm, respectively. These results show that the distribution of the photo-generation carrier play an important role on the properties of the p-i-n solar cell and is a key factor for designing the optimum performance structure.
Lebogang, Kotsedi. "Fabrication and characterization of a solar cell using an aluminium p-doped layer in the hot-wire chemical vapour deposition process". Thesis, 2010. http://hdl.handle.net/11394/3441.
Texto completoWhen the amorphous silicon (a-Si) dangling bonds are bonded to hydrogen the concentration of the dangling bond is decreased. The resulting film is called hydrogenated amorphous silicon (a-Si:H). The reduction in the dangling bonds concentration improves the optoelectrical properties of the film. The improved properties of a-Si:H makes it possible to manufacture electronic devices including a solar cell.A solar cell device based on the hydrogenated amorphous silicon (a-Si:H) was fabricated using the Hot-Wire Chemical Vapour Deposition (HWCVD). When an n-i-p solar cell configuration is grown, the norm is that the p-doped layer is deposited from a mixture of silane (SiH4) gas with diborane (B2H6). The boron atoms from diborane bonds to the silicon atoms and because of the number of the valance electrons, the grown film becomes a p-type film. Aluminium is a group 3B element and has the same valence electrons as boron, hence it will also produce a p-type film when it bonds with silicon.In this study the p-doped layer is grown from the co-deposition of a-Si:H from SiH4 with aluminium evaporation resulting in a crystallized, p-doped thin film. When this thin film is used in the n-i-p cell configuration, the device shows photo-voltaic activity.The intrinsic layer and the n-type layers for the solar cell were grown from SiH4 gas and Phosphine (PH3) gas diluted in SiH4 respectively. The individual layers of the solar cell device were characterized for both their optical and electrical properties. This was done using a variety of experimental techniques. The analyzed results from the characterization techniques showed the films to be of device quality standard. The analysed results of the ptype layer grown from aluminium showed the film to be successfully crystallized and doped.A fully functional solar cell was fabricated from these layers and the cell showed photovoltaic activity.
"A Unified 2D Solver for Modeling Carrier and Defect Dynamics in Electronic and Photovoltaic Devices". Doctoral diss., 2019. http://hdl.handle.net/2286/R.I.55540.
Texto completoDissertation/Thesis
Doctoral Dissertation Electrical Engineering 2019
Williams, Kenrick John. "Electron transfer in sensitized TiO₂ systems studied by time resolved surface second hermonic generation". Thesis, 2012. http://hdl.handle.net/2152/ETD-UT-2012-05-5790.
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Lin, Yang-You y 林沇佑. "The Impact on Photovoltaic Efficiency with Regards to Defect Densities of Amorphous Silicon Layers and Carrier Recombination Velocity at Interfaces in a Heterojunction Solar Cell Using Silvaco ATLAS". Thesis, 2010. http://ndltd.ncl.edu.tw/handle/15593378593498140236.
Texto completo大葉大學
電機工程學系
98
This study involves the novel heterojunction with intrinsic thin layer (HIT) solar cell structure. Combining the advantages of both crystalline silicon and amorphous silicon, a new structure of silicon-based solar cell was proposed - the heterojunction with an intrinsic thin layer (HIT) solar cell. It has high stability and large light absorption coefficient. It is manufactured under low temperature deposit process, which results in a low cost thin film HIT solar cell with high conversion efficiency. The influence of various layer materials and interfaces on the performance of n-type c-Si based bifacial HIT solar cell has been investigated by using the Silvaco TCAD simulation software. Accordingly, the design optimization of HIT solar cell was proven.
Benner, Frank. "Herstellung, Charakterisierung und Modellierung dünner aluminium(III)-oxidbasierter Passivierungsschichten für Anwendungen in der Photovoltaik". Doctoral thesis, 2014. https://tud.qucosa.de/id/qucosa%3A29635.
Texto completoHigh-efficiency solar cells rely on excellent passivation of the surface to ensure minimal recombination losses. In the last decade, Al2O3 became the material of choice for p-type Si in the photovoltaic industry. A remarkable surface passivation with effective minority carrier lifetimes close to the AUGER–limit was demonstrated with different deposition techniques. The excellent passivation effect of Al2O3 is attributed to two effects: Firstly, recombination centers at the Si−SiO2 interface get chemically passivated when hydrogen, for instance from the Al2O3 layer, saturates dangling bonds. Secondly, Al2O3 presents an outstanding level of field effect passivation due to its high concentration of intrinsic negative charges close to the SiO2 interface. The generated electrical field effectively repels electrons from surface recombination centers. Negative charges in Al2O3 are generally termed fixed charges. However, Al2O3 incorporates a high density of trap sites, too, that can be occupied by electrons. It was shown that the negative charge density in Al2O3 passivation layers depends on the electrical field and on the illumination intensity. The goal of this work is to systematically investigate dielectric passivation layer stacks for application on Si solar cells. The SiO2 interface quality and thickness plays a major role in this context, enabling or inhibiting carrier tunneling. Since the electron transport is a function of the oxide thickness, the balance between charge trapping and retention is achieved with approximately 2 nm of SiO2. Additionally, four relevant Al2O3 deposition techniques are compared: atomic layer deposition, sputtering, spray pyrolysis and spin–on coating, whereas the former is predominant. Using its flexibility, laminates comprising of Al2O3 and TiO2, HfO2 or SiO2 with subnanometer layers are compared. Although the latter do not show decreased surface recombination, nanolaminates with TiO2 and HfO2 contribute to the passivation. Their physical properties are described with a dynamic growth model that considers initial and steady–state growth rates for the involved metal oxides. Thin films with 0.2 % TiO2 or 7 % HfO2 are superior to conventional Al2O3 layers. In both cases, the modification of the field effect prevails the chemical effect, that is, however, virtually unchanged on a very high level with a density of interface traps of 5·1010 eV−1·cm−2 and below. The density of charges in both systems is changed via modifying either the polarity of intrinsic fixed charges or the ability of trapping charges within the layers. The observations of electron tunneling are explained by means of a mathematical model, describing a charging front, which moves through the dielectric layer.