Literatura académica sobre el tema "HEMT AlN/GaN"
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Artículos de revistas sobre el tema "HEMT AlN/GaN"
Chiu, Hsien-Chin, Chia-Hao Liu, Chong-Rong Huang, Chi-Chuan Chiu, Hsiang-Chun Wang, Hsuan-Ling Kao, Shinn-Yn Lin y Feng-Tso Chien. "Normally-Off p-GaN Gated AlGaN/GaN MIS-HEMTs with ALD-Grown Al2O3/AlN Composite Gate Insulator". Membranes 11, n.º 10 (23 de septiembre de 2021): 727. http://dx.doi.org/10.3390/membranes11100727.
Texto completoTsai, Jung-Hui, Jing-Shiuan Niu, Xin-Yi Huang y Wen-Chau Liu. "Comparative Investigation of AlGaN/AlN/GaN High Electron Mobility Transistors with Pd/GaN and Pd/Al2O3/GaN Gate Structures". Science of Advanced Materials 13, n.º 2 (1 de febrero de 2021): 289–93. http://dx.doi.org/10.1166/sam.2021.3856.
Texto completoShrestha, Niraj Man, Yuen Yee Wang, Yiming Li y E. Y. Chang. "Simulation Study of AlN Spacer Layer Thickness on AlGaN/GaN HEMT". Himalayan Physics 4 (22 de diciembre de 2013): 14–17. http://dx.doi.org/10.3126/hj.v4i0.9419.
Texto completoYamaoka, Yuya, Kazuhiro Ito, Akinori Ubukata, Toshiya Tabuchi, Koh Matsumoto y Takashi Egawa. "Effect of the formation temperature of the AlN/Si interface on the vertical-direction breakdown voltages of AlGaN/GaN HEMTs on Si substrates". MRS Advances 1, n.º 50 (2016): 3415–20. http://dx.doi.org/10.1557/adv.2016.431.
Texto completoÇörekçi, S., D. Usanmaz, Z. Tekeli, M. Çakmak, S. Özçelik y E. Özbay. "Surface Morphology of Al0.3Ga0.7N/Al2O3-High Electron Mobility Transistor Structure". Journal of Nanoscience and Nanotechnology 8, n.º 2 (1 de febrero de 2008): 640–44. http://dx.doi.org/10.1166/jnn.2008.a181.
Texto completoHong, Kuo-Bin, Chun-Yen Peng, Wei-Cheng Lin, Kuan-Lun Chen, Shih-Chen Chen, Hao-Chung Kuo, Edward Yi Chang y Chun-Hsiung Lin. "Thermal Analysis of Flip-Chip Bonding Designs for GaN Power HEMTs with an On-Chip Heat-Spreading Layer". Micromachines 14, n.º 3 (23 de febrero de 2023): 519. http://dx.doi.org/10.3390/mi14030519.
Texto completoGusev, A. S., A. O. Sultanov, A. V. Katkov, S. M. Ryndya, N. V. Siglovaya, A. N. Klochkov, R. V. Ryzhuk, N. I. Kargin y D. P. Borisenko. "Carrier Scattering Analysis in AlN/GaN HEMT Heterostructures with an Ultrathin AlN Barrier". Mikroèlektronika 53, n.º 3 (27 de octubre de 2024): 265–73. http://dx.doi.org/10.31857/s0544126924030086.
Texto completoShen, L., S. Heikman, B. Moran, R. Coffie, N. Q. Zhang, D. Buttari, I. P. Smorchkova, S. Keller, S. P. DenBaars y U. K. Mishra. "AlGaN/AlN/GaN high-power microwave HEMT". IEEE Electron Device Letters 22, n.º 10 (octubre de 2001): 457–59. http://dx.doi.org/10.1109/55.954910.
Texto completoWang, X. H., X. L. Wang, C. Feng, C. B. Yang, B. Z. Wang, J. X. Ran, H. L. Xiao, C. M. Wang y J. X. Wang. "Hydrogen sensors based on AlGaN/AlN/GaN HEMT". Microelectronics Journal 39, n.º 1 (enero de 2008): 20–23. http://dx.doi.org/10.1016/j.mejo.2007.10.022.
Texto completoPopok, V. N., T. S. Aunsborg, R. H. Godiksen, P. K. Kristensen, R. R. Juluri, P. Caban y K. Pedersen. "Structural Characterization of Movpe Grown Algan/Gan for Hemt Formation". REVIEWS ON ADVANCED MATERIALS SCIENCE 57, n.º 1 (1 de junio de 2018): 72–81. http://dx.doi.org/10.1515/rams-2018-0049.
Texto completoTesis sobre el tema "HEMT AlN/GaN"
Lundskog, Anders. "Characterization of AlGaN HEMT structures". Thesis, Linköping University, The Department of Physics, Chemistry and Biology, 2007. http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-9729.
Texto completoDuring the last decade, AlGaN High Electron Mobility Transistors (HEMTs) have been intensively studied because their fundamental electrical properties make them attractive for highpower microwave device applications. Despite much progress, AlGaN HEMTs are far from fully understood and judged by the number of published papers the understanding of advanced structures is even poorer. This work is an exploration of the electrical and structural properties of advanced HEMT structure containing AlN exclusionlayer and double heterojunctions. These small modifications had great impact on the electrical properties.
In this work, AlGaN HEMT structures grown on SiC substrates by a hot-wall MOCVD have been characterized for their properties using optical microscopy, scanning electron microscopy, transmission electron microscopy, capacitance/voltage, eddy-current resistivity, and by homebuilt epi-thickness mapping equipment.
A high electron mobility of 1700 [cm2/Vs] was achieved in an AlN exclusion-layer HEMT. A similar electron mobility of 1650 [cm2/Vs] was achieved in a combination of a double heterojunction and exclusion-layer structure. The samples had approximately the same electron mobility but with a great difference: the exclusion-layer version gave a sheet carrier density of 1.58*1013 [electrons/cm2] while the combination of double heterojunction and exclusion-layer gave 1.07*1013 [electrons/cm2]. A second 2DEG was observed in most structures, but not all, but was not stable with time.
The structures we grew during this work were also simulated using a one-dimensional Poisson-Schrödinger solver and the simulated electron densities were in fairly good agreement with the experimentally obtained. III-nitride materials, the CVD concept, and the onedimensional solver are shortly explained.
Said, Nasri. "Evaluation de la robustesse des technologies HEMTs GaN à barrière AlN ultrafine pour l'amplification de puissance au-delà de la bande Ka". Electronic Thesis or Diss., Bordeaux, 2024. http://www.theses.fr/2024BORD0425.
Texto completoThe GaN industry is strategic for the European Union because it enhances the power and efficiency of radar and telecommunication systems, especially in the S to Ka bands (up to 30 GHz). To meet the needs of future applications such as 5G and military systems, GaN technology development aims to increase frequencies to the millimeter-wave range. This requires optimizing epitaxy and reducing the gate length to less than 150 nm, as well as using ultrathin barriers (<10 nm) to avoid short-channel effects. Replacing the AlGaN barrier with AlN is a solution to maintain good performance while miniaturizing devices. In this thesis, several technological variants with an ultrathin AlN barrier (3 nm) on undoped GaN channels of various thicknesses, developed by the IEMN laboratory, are studied. The evaluation of the performance and robustness of these technologies, crucial for their qualification and use in long-term profil missions, is conducted in both DC and RF modes to define the safe operating areas (SOA) and identify degradation mechanisms.The DC and pulsed characterization campaign revealed low component dispersion after electrical stabilization, reflecting good technological control. This also allows for more relevant statistical studies and generic analyses across all component batches studied. The sensitivity analysis of the devices at temperatures up to 200°C demonstrated strong thermal stability in diode and transistor modes, following parametric indicators representative of the electrical models of the components (saturation currents and leakage currents, threshold voltage, gate and drain lags rates, ...). The addition of a AlGaN back-barrier on a moderately C-doped buffer layer resolved the trade-off between electron confinement and trap densities. Accelerated aging tests in DC mode at various biasing conditions and in RF mode by input power steps showed that the AlGaN back-barrier provides better stability in leakage currents and static I(V) curves, reduces trapping and self-heating effects, and extends the operational DC-SOA.Dynamic accelerated aging tests at 10 GHz on HEMTs with different gate-drain spacings showed that the RF-SOA does not depend on this spacing but rather on the gate's ability to withstand high RF signals before abrupt degradation occurs. Using an original nonlinear modeling method that considers the self-biasing phenomenon, devices with the AlGaN back-barrier proved to be more robust in RF as well. This is reflected in their later gain compression, up to +10 dB, without apparent electrical or structural degradation (as observed by photoluminescence). Regardless of the AlN/GaN variant, the RF stress degradation mechanism corresponds to the abrupt breakdown of the Schottky gate, leading to its failure. These results indicate that the components are more sensitive to DC bias conditions than to the level of injected RF signals [...]
Bradley, Shawn Todd. "Investigation of AlGaN films and nickel/AlGaN Schottky diodes using depth-dependent cathodoluminescence spectroscopy and secondary ion mass spectrometry". Columbus, Ohio : Ohio State University, 2004. http://rave.ohiolink.edu/etdc/view?acc%5Fnum=osu1078329692.
Texto completoTitle from first page of PDF file. Document formatted into pages; contains xxii, 182 p.; also includes graphics (some col.). Includes abstract and vita. Advisor: Leonard J. Brillson, Dept. of Electrical Engineering. Includes bibliographical references (p. 173-182).
Taking, Sanna. "AlN/GaN MOS-HEMTs technology". Thesis, University of Glasgow, 2012. http://theses.gla.ac.uk/3356/.
Texto completoJohn, Dylan Boone. "Atomistic Modeling of AlN/GaN HEMTs for Applications in Harsh Environments". OpenSIUC, 2011. https://opensiuc.lib.siu.edu/theses/572.
Texto completoAbou, Daher Mahmoud. "Réalisation et optimisation de transistors HEMT GaN forte puissance et haute fréquence par technologie de transfert de couches sur substrat hôte". Thesis, Toulouse 3, 2020. http://www.theses.fr/2020TOU30046.
Texto completoWireless telecommunication market largely benefits from new nitride technologies, which reach outstanding performance compared with traditional technologies. Current research is opening up many new strategies and alternative solutions to address simultaneously antagonist considerations such as cost, performances and/or reliability. Most AlGaN / GaN HEMTs are fabricated on a low cost, highly resistive silicon substrate or on a much more expensive and supply sensitive SiC substrate. However, the electrical performance constraints required when these technologies are integrating into radar systems, satellites and in telecommunications systems make them dependent to the operating temperature parameter, mainly linked to the high power dissipation during static/dynamic energy transfer. Indeed, these components are capable of generating high power densities in the microwave range. However, the operating frequency increase leads an increase of the power dissipation, generating the self-heating phenomenon which influences the devices performance (ID,max,ft,fmax...). In this context, several solutions were already proposed in the literature (use of composite substrates, passivation of devices, etc.). Furthermore, the layer transfer technology to report HEMTs from growth substrate onto a host substrate with a good thermal conductivity (such as diamond substrate) is a promising solution, still poorly detailed to date. The objective of this thesis work is to improve the heat dissipation and thus the performance and reliability of high-frequency HEMT transistors by using a layer transfer technology. AlGaN / GaN heterostructures are grown on a silicon substrate by MOCVD at CHREA. After the fabrication of HEMTs on a silicon substrate, AlGaN / GaN devices (for which the silicon substrate has been removed) are transferred onto a CVD diamond substrate. This transfer is obtained by thermocompression bonding of sputtered AlN layers on each surface to be assembled (backside of the transistors and diamond substrate). This transfer process has not damaged the functionality of the transistors with short gate length (Lg = 80 nm). The AlGaN/GaN HEMTs with a 2x35 µm development transferred onto diamond of feature a current ID,max = 710 mA.mm-1, a cutoff frequency ft of 85GHz and an oscillation frequency fmax of 144GHz. However, this transfer technique requires optimization phases (especially to reduce thickness and improve the crystalline quality and thermal conductivity of AlN layers) in order to reduce the thermal resistance of this adhesion layer and to limit the self-heating phenomenon noted at the end of this thesis work
Hung, Ting-Hsiang. "Novel High-k Dielectric Enhanced III-Nitride Devices". The Ohio State University, 2015. http://rave.ohiolink.edu/etdc/view?acc_num=osu1437684419.
Texto completoKim, Samuel H. "Addressing thermal and environmental reliability in GaN based high electron mobility transistors". Thesis, Georgia Institute of Technology, 2014. http://hdl.handle.net/1853/52244.
Texto completoLe, roux Frédéric. "Développement de procédés de gravure plasma sans dommage pour l'électronique de puissance à base de GaN". Thesis, Université Grenoble Alpes, 2020. http://www.theses.fr/2020GRALT017.
Texto completoIn power electronics, GaN has become a material of choice: it meets the challenges of high energy performance, while promoting compactness and lightness of the components. When manufacturing power devices based on an AlGaN / GaN heterostructure, plasma etching induces degradations in the material and reduces the electronic properties of the components, in particular diodes and HEMT (High Electron Mobility Transistors). These thesis works focused on the study of these degradations and proposes industrializable etching processes which reduce these plasma impacts. We first focused on the degradation mechanisms involved during the etching of SiN with stop on AlGaN, according to different plasma parameters. The electrical and physicochemical characterizations (in particular the XPS) made it possible to highlight various degradation mechanisms and to propose a synthetic model. We have identified two main factors of electrical degradation: the first one is the energy ion bombardment which modifies the surface stoichiometries, favors the implantation of contaminants, disturbs the crystal quality of the lattice and causes the sputtering of AlGaN. An energy threshold, below which degradations remain limited, has however been demonstrated and tested. The second factor identified is the modified thickness. The greater the modified thickness, the more it has an influence on the electronic channel and its properties. This thickness can be increased by high bombardment energy or by the use of light elements which are deeply implanted in AlGaN. These results then served as a framework for the development of innovative processes in order to limit the damage during GaN etching. We studied three cyclic processes of the ALE type: O2-BCl3, Cl2-Ar and Cl2-He. These studies made it possible to highlight their different self-limiting and selectivity characteristics as well as to propose etching mechanisms models. Characterization and comparison with standard processes have highlighted their performance and in particular their ability to reduce the electrical degradation induced during etching
Lee, Yuan-Jyun y 李元鈞. "Optimization of GaN and AlN epilayer for HEMT application". Thesis, 2018. http://ndltd.ncl.edu.tw/handle/m3an56.
Texto completo國立交通大學
電子物理系所
106
GaN, Al1-xGaxN, and AlN epilayers were grown by molecular beam epitaxy system (MBE). The in situ reflection high-energy electron diffraction (RHEED) measurements were used to find the best growth conditions of substrate temperature and element flux ratio. The optical properties and surface morphology were analyzed by photoluminescence (PL), cathodoluminescence (CL), scanning electron microscopy (SEM) and atomic force microscopy (AFM). Moreover, the electrical properties of two dimensional electron gas (2DEG) of AlN/GaN heterostructure were investigated by the Hall measurements. By the control of substrate temperature and Ga/N ratio, the luminescence signal from Ga vacancy could be suppressed and a better surface roughness about 0.4 nm for GaN was achieved. In the case of Al1-xGaxN growth, the substrate temperature was fixed at 740 oC for high Al composition samples. By using the migration enhanced epitaxy (MEE) for the interface expitaxy of AlN/GaN heterostructure, the decomposition of GaN channel layer can be significantly suppressed. The raising substrate temperature to 740 oC enhances migration of the AlN to fill the surface pits. It improves the electron mobility up to 988 (cm2/V•s) in 2DEG.
Libros sobre el tema "HEMT AlN/GaN"
Ponzanesi, Sandra, Kathrin Thiele, Eva Midden, Domitilla Olivieri y Trude Oorschot. Transities in kunst, cultuur en politiek. Nieuwe Prinsengracht 89 1018 VR Amsterdam Nederland: Amsterdam University Press, 2023. http://dx.doi.org/10.5117/9789048560110.
Texto completoVelberg, Joey. Weg met mannelijkheid. Nieuwe Prinsengracht 89 1018 VR Amsterdam Nederland: Amsterdam University Press, 2024. http://dx.doi.org/10.5117/9789464563054.
Texto completoSherwood, Dennis y Paul Dalby. Temperature and heat. Oxford University Press, 2018. http://dx.doi.org/10.1093/oso/9780198782957.003.0003.
Texto completoAlert en ondernemend 2.0 : Opleidingsprofiel Culturele en Maatschappelijke Vorming. 4a ed. Uitgeverij SWP, 2014. http://dx.doi.org/10.36254/978-90-8850-020-6.
Texto completoClarke, Andrew. Energy and heat. Oxford University Press, 2017. http://dx.doi.org/10.1093/oso/9780199551668.003.0002.
Texto completoEscudier, Marcel. Compressible pipe flow. Oxford University Press, 2018. http://dx.doi.org/10.1093/oso/9780198719878.003.0013.
Texto completoKolmičkovs, Antons. Electric Field Effect on Combustion of Pelletized Biomass in Swirling Flow. RTU Press, 2022. http://dx.doi.org/10.7250/9789934227257.
Texto completoPriedniece, Vivita. Experimental Study and Modelling of Small Capacity Boiler Flue Gas Treatment and Heat Recovery. RTU Press, 2022. http://dx.doi.org/10.7250/9789934227608.
Texto completoGarber, Elizabeth y Stephen G. Brush. Maxwell on Heat and Statistical Mechanics: On "Avoiding All Personal Enquiries" of Molecules. Lehigh University Press, 1995.
Buscar texto completoSherwood, Dennis y Paul Dalby. Ideal gas processes – and two ideal gas case studies too. Oxford University Press, 2018. http://dx.doi.org/10.1093/oso/9780198782957.003.0007.
Texto completoCapítulos de libros sobre el tema "HEMT AlN/GaN"
Khan, Abdul Naim, S. N. Mishra, Meenakshi Chauhan, Kanjalochan Jena y G. Chatterjee. "Influence of Al2O3 Oxide Layer Thickness Variation on PZT Ferroelectric Al0.3Ga0.7N/AlN/GaN E-Mode GR-MOSHEMT". En HEMT Technology and Applications, 39–51. Singapore: Springer Nature Singapore, 2022. http://dx.doi.org/10.1007/978-981-19-2165-0_3.
Texto completoPrasad, Santashraya y A. Islam. "Influence of AlN Spacer Layer on SiN-Passivated AlGaN/GaN HEMT". En Lecture Notes in Electrical Engineering, 233–42. Singapore: Springer Nature Singapore, 2023. http://dx.doi.org/10.1007/978-981-99-0412-9_20.
Texto completoDas, Shreyasi, Vandana Kumari, Mridula Gupta y Manoj Saxena. "Gate Leakage Current Assessment of AlGaN/GaN HEMT with AlN Cap Layer". En Computers and Devices for Communication, 459–64. Singapore: Springer Singapore, 2021. http://dx.doi.org/10.1007/978-981-15-8366-7_68.
Texto completoRanjan, Ravi, Nitesh Kashyap y Ashish Raman. "Effect of AlN Spacer Layer on the Proposed MIS-AlGaN/GaN HEMT". En Lecture Notes in Electrical Engineering, 1115–21. Singapore: Springer Singapore, 2020. http://dx.doi.org/10.1007/978-981-15-7031-5_106.
Texto completoAlamgir, Imtiaz y Aminur Rahman. "2D Simulation of Static Interface States in GaN HEMT with AlN/GaN Super-Lattice as Barrier Layer". En Proceedings of International Conference on Soft Computing Techniques and Engineering Application, 457–65. New Delhi: Springer India, 2013. http://dx.doi.org/10.1007/978-81-322-1695-7_53.
Texto completoSufiyan, Nudrat y Anup Kumar Sharma. "Analytical Modeling and Simulation Study of Thickness of AlN Spacer on Electrical Properties of AlGaN/AlN/GaN HEMT Device". En Lecture Notes in Electrical Engineering, 497–506. Singapore: Springer Nature Singapore, 2024. http://dx.doi.org/10.1007/978-981-99-6855-8_38.
Texto completoLavrijssen, Saskia y Blanka Vitéz. "Good Governance and the Regulation of the District Heating Market". En Shaping an Inclusive Energy Transition, 185–227. Cham: Springer International Publishing, 2021. http://dx.doi.org/10.1007/978-3-030-74586-8_9.
Texto completoPeacock, Malcolm, Aikaterini Fragaki y Bogdan J. Matuszewski. "Review of Heat Demand Time Series Generation for Energy System Modelling". En Springer Proceedings in Energy, 53–60. Cham: Springer International Publishing, 2021. http://dx.doi.org/10.1007/978-3-030-63916-7_7.
Texto completoAbdelhakim, Meziani, Abdul-Rahman Allouche, Telia Azzedine y Hilmi Unlu. "Tight Binding and Density Functional Theory of Tailoring Electronic Properties in Al1−xInxN/AlN/GaN High Electron Mobility Transistors (HEMTs)". En Topics in Applied Physics, 669–707. Cham: Springer International Publishing, 2022. http://dx.doi.org/10.1007/978-3-030-93460-6_24.
Texto completoRaczyński, Maciej, Artur Wyrwa, Marcin Pluta y Wojciech Suwała. "Optimal Energy Portfolios in the Heating Sector and Flexibility Potentials of Combined-Heat-Power Plants and District Heating Systems". En The Future European Energy System, 219–34. Cham: Springer International Publishing, 2021. http://dx.doi.org/10.1007/978-3-030-60914-6_12.
Texto completoActas de conferencias sobre el tema "HEMT AlN/GaN"
Jiang, Xiangle, Minhan Mi, Can Gong, Yuwei Zhou, Tianhao Liu y Xiaohua Ma. "Simulation on AlN/GaN/AlN/GaN Planar HEMT and Fin-HEMT for Low-Voltage Applications". En 2024 21st China International Forum on Solid State Lighting & 2024 10th International Forum on Wide Bandgap Semiconductors (SSLCHINA: IFWS), 304–6. IEEE, 2024. https://doi.org/10.1109/sslchinaifws64644.2024.10835385.
Texto completoHuang, Mingzhi, Kai Liu, Chong Wang y Ziheng Yu. "Study of p-GaN Gate HEMT with ALN Cap Layer". En 2024 21st China International Forum on Solid State Lighting & 2024 10th International Forum on Wide Bandgap Semiconductors (SSLCHINA: IFWS), 210–12. IEEE, 2024. https://doi.org/10.1109/sslchinaifws64644.2024.10835364.
Texto completoBashkatov, Dmitriy D., Timur V. Malin, Vladimir G. Mansurov, Dmitry Yu Protasov, Denis S. Milakhin y Konstantin S. Zhuravlev. "Effect of AlN Interlayer Thickness on 2DEG Parameters in AlGaN/AlN/GaN HEMT Structures". En 2024 IEEE 25th International Conference of Young Professionals in Electron Devices and Materials (EDM), 120–25. IEEE, 2024. http://dx.doi.org/10.1109/edm61683.2024.10615105.
Texto completoNamdeo, Eshaan y Sukwinder Singh. "Substrate-Dependent Characteristics of AlGaN/AlN/GaN DH-HEMT: A Comprehensive Study". En 2024 International Conference on Electrical Electronics and Computing Technologies (ICEECT), 1–6. IEEE, 2024. http://dx.doi.org/10.1109/iceect61758.2024.10739025.
Texto completoHaque, Sanaul, Cristina Andrei, Mihaela Wolf, Oliver Hilt y Matthias Rudolph. "Switch Integrated Ka-Band Low Noise Amplifier in GaN/AlN HEMT Technology". En 2024 19th European Microwave Integrated Circuits Conference (EuMIC), 351–54. IEEE, 2024. http://dx.doi.org/10.23919/eumic61603.2024.10732731.
Texto completoHidayat, Wagma, Muhammad Usman, Syeda Wageeha Shakir, Anum ., Iqra Anjum, Shazma Ali y Laraib Mustafa. "Breaking performance barriers: AlN spacer integration boosts GaN HEMTs to higher drive drain current for HEMT-LED". En Fourth iiScience International Conference 2024: Recent Advances in Photonics and Physical Sciences, editado por M. Yasin A. Raja, Syed A. Haider y Zohra N. Kayani, 2. SPIE, 2024. https://doi.org/10.1117/12.3051934.
Texto completoSaid, N., D. Saugnon, K. Harrouche, F. Medjdoub, N. Labat, N. Malbert y J.-G. Tartarin. "RF-Robustness enhancement in AlN/GaN HEMT through AlGaN Back-Barrier: nonlinear model analysis". En 2024 19th European Microwave Integrated Circuits Conference (EuMIC), 2–5. IEEE, 2024. http://dx.doi.org/10.23919/eumic61603.2024.10732162.
Texto completoSong, Zeyu, Hanghai Du, Zhihong Liu, Han Wang, Weichuan Xing, Jincheng Zhang y Yue Hao. "Strong Polarization AlN/GaN/Si Heterojunction MIS-HEMT for Mm-Wave Low-Voltage Terminal Applications". En 2024 IEEE International Conference on IC Design and Technology (ICICDT), 1–3. IEEE, 2024. http://dx.doi.org/10.1109/icicdt63592.2024.10717668.
Texto completoGeng, Xiaomeng, Nick Wieczorek, Mihaela Wolf, Oliver Hilt y Sibylle Dieckerhoff. "Modeling of a Novel GaN-on-AlN/SiC HEMT Including Thermal Effects for Circuit Simulation". En 2024 IEEE Energy Conversion Congress and Exposition (ECCE), 6731–37. IEEE, 2024. https://doi.org/10.1109/ecce55643.2024.10861295.
Texto completoFouzi, Y., E. Morvan, Y. Gobil, F. Morisot, E. Okada, S. Bollaert y N. Defrance. "Nonlinear Modeling of CMOS Compatible SiN/AlN/GaN MIS-HEMT on 200mm Si Operating at mm-Wave Frequencies". En 2024 19th European Microwave Integrated Circuits Conference (EuMIC), 303–6. IEEE, 2024. http://dx.doi.org/10.23919/eumic61603.2024.10732270.
Texto completoInformes sobre el tema "HEMT AlN/GaN"
Xing, Huili y Debdeep Jena. Stacked Quantum Wire AlN/GaN HEMTs. Fort Belvoir, VA: Defense Technical Information Center, abril de 2012. http://dx.doi.org/10.21236/ada580523.
Texto completoXing, Huili G. y Debdeep Jena. Ultrascaled AIN/GaN HEMT Technology for mm-wave RT Applications. Fort Belvoir, VA: Defense Technical Information Center, febrero de 2011. http://dx.doi.org/10.21236/ada538446.
Texto completoGuérin, Laurence, Patrick Sins, Lida Klaver y Juliette Walma van der Molen. Onderzoeksrapport Samen werken aan Bèta Burgerschap. Saxion, 2021. http://dx.doi.org/10.14261/ff0c6282-93e2-41a7-b60ab9bceb2a4328.
Texto completoOlson, Douglas A. Heat transfer in an aluminum heat exchanger using normal hydrogen gas:. Gaithersburg, MD: National Institute of Standards and Technology, 1994. http://dx.doi.org/10.6028/nist.ir.3987.
Texto completoMiller, Jack. Heat networks. Parliamentary Office of Science and Technology, septiembre de 2020. http://dx.doi.org/10.58248/pn632.
Texto completoUnknown, Author. L51602 Criteria for Hot Tap Welding Further Studies. Chantilly, Virginia: Pipeline Research Council International, Inc. (PRCI), mayo de 1989. http://dx.doi.org/10.55274/r0010102.
Texto completoMadrzykowski, Daniel. Firefighter Equipment Operational Environment: Evaluation of Thermal Conditions. UL Firefighter Safety Research Institute, agosto de 2017. http://dx.doi.org/10.54206/102376/igfm4492.
Texto completoLocy, Robert D., Hillel Fromm, Joe H. Cherry y Narendra K. Singh. Regulation of Arabidopsis Glutamate Decarboxylase in Response to Heat Stress: Modulation of Enzyme Activity and Gene Expression. United States Department of Agriculture, enero de 2001. http://dx.doi.org/10.32747/2001.7575288.bard.
Texto completoRidens, Simons y Brun. PR-316-15606-Z01 Equations of State Comparison for Pipeline Compressor Applications. Chantilly, Virginia: Pipeline Research Council International, Inc. (PRCI), julio de 2016. http://dx.doi.org/10.55274/r0010873.
Texto completoDiDomizio, Matthew y Jonathan Butta. Measurement of Heat Transfer and Fire Damage Patterns on Walls for Fire Model Validation. UL Research Institutes, julio de 2024. http://dx.doi.org/10.54206/102376/hnkr9109.
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