Artículos de revistas sobre el tema "He thin film"
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Cieslikowski, D., P. Leiderer y A. J. Dahm. "Mobility oscillations of electrons on thin He films". Canadian Journal of Physics 65, n.º 11 (1 de noviembre de 1987): 1525–31. http://dx.doi.org/10.1139/p87-243.
Texto completoMILLER, M. D. y E. KROTSCHECK. "THEORY OF THIRD SOUND AND STABILITY OF THIN 3He–4He SUPERFLUID FILMS". International Journal of Modern Physics B 21, n.º 13n14 (30 de mayo de 2007): 2091–102. http://dx.doi.org/10.1142/s021797920704349x.
Texto completoKROTSCHECK, E. y M. D. MILLER. "GENERIC ELECTRON MOBILITY IN SURFACE STATES ON HELIUM FILMS". International Journal of Modern Physics B 21, n.º 13n14 (30 de mayo de 2007): 2103–14. http://dx.doi.org/10.1142/s0217979207043506.
Texto completoStanford, Michael G., Joo Hyon Noh, Kyle Mahady, Anton V. Ievlev, Peter Maksymovych, Olga S. Ovchinnikova y Philip D. Rack. "Room-Temperature Activation of InGaZnO Thin-Film Transistors via He+ Irradiation". ACS Applied Materials & Interfaces 9, n.º 40 (28 de septiembre de 2017): 35125–32. http://dx.doi.org/10.1021/acsami.7b10449.
Texto completoKurokawa, Mao, Takao Shimizu, Mutsuo Uehara, Atsuo Katagiri, Kensuke Akiyama, Masaaki Matsushima, Hiroshi Uchida, Yoshisato Kimura y Hiroshi Funakubo. "Control ofp- andn-type Conduction in Thermoelectric Non-doped Mg2Si Thin Films Prepared by Sputtering Method". MRS Advances 3, n.º 24 (2018): 1355–59. http://dx.doi.org/10.1557/adv.2018.150.
Texto completoUEMURA, Y. J. "WHAT CAN WE LEARN FROM COMPARISON BETWEEN CUPRATES AND HE FILMS?: PHASE SEPARATION AND FLUCTUATING SUPERFLUIDITY". International Journal of Modern Physics B 14, n.º 29n31 (20 de diciembre de 2000): 3703–10. http://dx.doi.org/10.1142/s0217979200004258.
Texto completoMiyaguchi, Kazuya, Shin Kajita, Hirohiko Tanaka y Noriyasu Ohno. "Fabrication of nanostructured Ti thin film with Ti deposition in He plasmas". Japanese Journal of Applied Physics 60, n.º 3 (19 de febrero de 2021): 038004. http://dx.doi.org/10.35848/1347-4065/abe3a5.
Texto completoEl Hog, Sahbi y H. T. Diep. "Tricriticality of the Blume–Emery–Griffiths model in thin films of stacked triangular lattices". Modern Physics Letters B 30, n.º 07 (20 de marzo de 2016): 1650071. http://dx.doi.org/10.1142/s0217984916500718.
Texto completoLee, Baek-Ju, Yoo-Seong Kim, Dong-Won Seo y Jae-Wook Choi. "The Effect of Deposition Temperature of TiN Thin Film Deposition Using Thermal Atomic Layer Deposition". Coatings 13, n.º 1 (5 de enero de 2023): 104. http://dx.doi.org/10.3390/coatings13010104.
Texto completoXiang, Xuepeng, Jingjing Rao, Zuyun He, Mengzhen Zhou, Qicheng Huang, Yuan Gao, Zhen Fan, Xinwei Wang y Yan Chen. "Tailoring resistive switching in epitaxial SrCoO2.5 films by irradiation induced uniaxial strain". Journal of Applied Physics 132, n.º 3 (21 de julio de 2022): 035304. http://dx.doi.org/10.1063/5.0099200.
Texto completoChiriaev, Serguei, Luciana Tavares, Vadzim Adashkevich, Arkadiusz J. Goszczak y Horst-Günter Rubahn. "Out-of-plane surface patterning by subsurface processing of polymer substrates with focused ion beams". Beilstein Journal of Nanotechnology 11 (6 de noviembre de 2020): 1693–703. http://dx.doi.org/10.3762/bjnano.11.151.
Texto completoWoo, Jong-Chang, Young-Hee Joo, Jung-Soo Park y Chang-Il Kim. "A Study of the Dry Etching Properties of TiN Thin Film in He/BCl3/Cl2Inductively Coupled Plasma". Journal of the Korean Institute of Electrical and Electronic Material Engineers 24, n.º 9 (1 de septiembre de 2011): 718–22. http://dx.doi.org/10.4313/jkem.2011.24.9.718.
Texto completoMio, Norikatsu, Mei-Fei Ko, Wei-Tou Ni, Sheau-shi Pan, Akito Araya, Shigenori Moriwaki y Kimio Tsubono. "Design of a stabilized He–Ne laser by using a thin-film heater". Applied Optics 32, n.º 30 (20 de octubre de 1993): 5944. http://dx.doi.org/10.1364/ao.32.005944.
Texto completoSaitoh, Motohiko. "Melting temperature of two-dimensional electron crystals trapped on thin-film liquid He". Physical Review B 40, n.º 1 (1 de julio de 1989): 810–12. http://dx.doi.org/10.1103/physrevb.40.810.
Texto completoYotoriyama, Tasuku, Yoshiaki Suzuki, Takaya Mise, Takeyo Tsukamoto y Masaya Iwaki. "Surface characterization of thin film induced by He+ ion-beam irradiation into PLLA". Surface and Coatings Technology 196, n.º 1-3 (junio de 2005): 383–88. http://dx.doi.org/10.1016/j.surfcoat.2004.08.157.
Texto completoEggenkamp, M. E. W., H. Khalil, J. P. Laheurte, J. C. Noiray y J. P. Romagnan. "Heat Diffusion through a Glass Substrate Coated by a Thin 4 He Film". Europhysics Letters (EPL) 21, n.º 5 (10 de febrero de 1993): 587–92. http://dx.doi.org/10.1209/0295-5075/21/5/014.
Texto completoTakechi, Kazushige, Yuya Kuwahara, Jun Tanaka y Hiroshi Tanabe. "Depth-profiling XPS analysis of He-plasma treated amorphous InGaZnO thin films for use in top-gate coplanar thin-film transistors". Japanese Journal of Applied Physics 58, n.º 3 (11 de febrero de 2019): 038005. http://dx.doi.org/10.7567/1347-4065/aafed3.
Texto completoGrigorian, Galina, Izabela Konkol y Adam Cenian. "In Situ Analyses of Surface-Layer Composition of CxNy Thin Films Using Methods Based on Penning Ionization Processes—Introductory Investigations". Materials 14, n.º 24 (17 de diciembre de 2021): 7812. http://dx.doi.org/10.3390/ma14247812.
Texto completoHuang, T. C. "Correlations Between X-Ray Microstructures and Magnetic Properties of CoCrTa Alloy thin Films". Advances in X-ray Analysis 31 (1987): 107–12. http://dx.doi.org/10.1154/s037603080002190x.
Texto completoJoyce, Bruce A. y Michael J. Stowell. "Donald William Pashley. 21 April 1927 — 16 May 2009". Biographical Memoirs of Fellows of the Royal Society 56 (enero de 2010): 317–40. http://dx.doi.org/10.1098/rsbm.2010.0009.
Texto completoIslam, Ahatashamul, Fariha Tasneem, Zulfiqar Hasan Khan, Asif Rakib, Syed Farid Uddin Farhad, Aminul I. Talukder, AFM Yusuf Haider y Md Wahadoszamen. "Economically reproducible surface-enhanced Raman spectroscopy of different compounds in thin film". Journal of Bangladesh Academy of Sciences 45, n.º 1 (15 de julio de 2021): 1–11. http://dx.doi.org/10.3329/jbas.v45i1.54255.
Texto completoKuo, Yue. "(Invited) Plasma-Based Thin Film Technology in Fabrication of Nano- to Giga-Sized Electronics". ECS Meeting Abstracts MA2022-02, n.º 30 (9 de octubre de 2022): 1106. http://dx.doi.org/10.1149/ma2022-02301106mtgabs.
Texto completoSREEKUMAR, J. y V. M. NANDAKUMARAN. "TWO DIMENSIONAL LARGE AMPLITUDE QUASI SOLITONS IN THIN HELIUM FILMS". Modern Physics Letters B 04, n.º 01 (10 de enero de 1990): 47–51. http://dx.doi.org/10.1142/s0217984990000088.
Texto completoKim, In kyo, Jong Hyeuk Lim y Geun Young Yeom. "Characteristics of hydrogenated silicon thin film deposited by RF-PECVD using He–SiH4 mixture". Vacuum 86, n.º 1 (julio de 2011): 82–86. http://dx.doi.org/10.1016/j.vacuum.2011.04.018.
Texto completoKakiuchi, Hiroaki, Hiromasa Ohmi, Seiya Takeda y Kiyoshi Yasutake. "Improvement of deposition characteristics of silicon oxide layers using argon-based atmospheric-pressure very high-frequency plasma". Journal of Applied Physics 132, n.º 10 (14 de septiembre de 2022): 103302. http://dx.doi.org/10.1063/5.0101596.
Texto completoBeyer, W., W. Hilgers, D. Lennartz, F. C. Maier, N. H. Nickel, F. Pennartz y P. Prunici. "Microstructure Characterization of Amorphous Silicon Films by Effusion Measurements of Implanted Helium". MRS Proceedings 1536 (2013): 175–80. http://dx.doi.org/10.1557/opl.2013.746.
Texto completoWu, Xuelian, Cui Ying Toe, Chenliang Su, Yun Hau Ng, Rose Amal y Jason Scott. "Preparation of Bi-based photocatalysts in the form of powdered particles and thin films: a review". Journal of Materials Chemistry A 8, n.º 31 (2020): 15302–18. http://dx.doi.org/10.1039/d0ta01180k.
Texto completoKelman, Maxim B., Paul C. McIntyre, Bryan C. Hendrix, Steven M. Bilodeau, Jeffrey F. Roeder y Sean Brennan. "Structural analysis of coexisting tetragonal and rhombohedral phases in polycrystalline Pb(Zr0.35Ti0.65)O3 thin films". Journal of Materials Research 18, n.º 1 (enero de 2003): 173–79. http://dx.doi.org/10.1557/jmr.2003.0024.
Texto completoIonescu, Mihail, Bryce Richards, Keith McIntosh, R. Siegele, E. Stelcer, D. D. Cohen y Tara Chandra. "Hydrogen Measurements in SiNx: H/Si Thin Films by ERDA". Materials Science Forum 539-543 (marzo de 2007): 3551–56. http://dx.doi.org/10.4028/www.scientific.net/msf.539-543.3551.
Texto completoChecchetto, Riccardo. "Experimental Study on the Transport of Light Gas Molecules through Low-Density Polyethylene Films". International Journal of Polymer Science 2018 (25 de octubre de 2018): 1–9. http://dx.doi.org/10.1155/2018/4903904.
Texto completoTAKAHASHI, Masao, Hideyuki SUGIYAMA, Shinichi KIKKAWA, Fumikazu KANAMARU, Makoto HARADA y Iwao WATANABE. "Local Structure Analysis of Sputter-Deposited Metal Nitride Thin Film Using He Ion Yield XAFS." Journal of the Society of Materials Science, Japan 47, n.º 6 (1998): 580–85. http://dx.doi.org/10.2472/jsms.47.580.
Texto completoBackmeister, Lucas, Bernd Aichner, Max Karrer, Katja Wurster, Reinhold Kleiner, Edward Goldobin, Dieter Koelle y Wolfgang Lang. "Ordered Bose Glass of Vortices in Superconducting YBa2Cu3O7−δ Thin Films with a Periodic Pin Lattice Created by Focused Helium Ion Irradiation". Nanomaterials 12, n.º 19 (6 de octubre de 2022): 3491. http://dx.doi.org/10.3390/nano12193491.
Texto completoKraszewski, Maciej y Robert Bogdanowicz. "Laser Reflectance Interferometry System with a 405 Nm Laser Diode for in Situ Measurements of CVD Diamond Thickness". Metrology and Measurement Systems 20, n.º 4 (1 de diciembre de 2013): 543–54. http://dx.doi.org/10.2478/mms-2013-0046.
Texto completoJeong, Ho-young, Bok-young Lee, Young-jang Lee, Jung-il Lee, Myoung-su Yang, In-byeong Kang, Mallory Mativenga y Jin Jang. "Coplanar amorphous-indium-gallium-zinc-oxide thin film transistor with He plasma treated heavily doped layer". Applied Physics Letters 104, n.º 2 (13 de enero de 2014): 022115. http://dx.doi.org/10.1063/1.4862320.
Texto completoKim, Y. S., J. H. Lee, J. T. Lim, J. B. Park y G. Y. Yeom. "Atmospheric pressure PECVD of SiO2 thin film at a low temperature using HMDS/O2/He/Ar". Thin Solid Films 517, n.º 14 (mayo de 2009): 4065–69. http://dx.doi.org/10.1016/j.tsf.2009.01.137.
Texto completoBryk, V. V., R. L. Vasilenko, A. V. Goncharov, T. K. Grogorova, A. G. Guglya, V. G. Kolobrodov, M. L. Litvinenko et al. "Formation mechanism, structure and adsorption characteristics of microporous nanocrystalline thin-film (V, Ti)-N-He composites". Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques 5, n.º 3 (junio de 2011): 566–74. http://dx.doi.org/10.1134/s1027451011060061.
Texto completoMa, Yujie, Senhua Lin, Yizhi Qiu, Xinzhi Zheng, Mingyoung Yu, Bingxi Xiang, Fang Xu, Fei Lu, Cangtao Zhou y Shuangchen Ruan. "Radiation effects on He+- and H+-implantation for ion slicing of rutile titanium dioxide thin film". Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 533 (diciembre de 2022): 1–8. http://dx.doi.org/10.1016/j.nimb.2022.10.013.
Texto completoKang, Seunghun, Woo-Sung Jang, Anna N. Morozovska, Owoong Kwon, Yeongrok Jin, Young-Hoon Kim, Hagyoul Bae et al. "Highly enhanced ferroelectricity in HfO 2 -based ferroelectric thin film by light ion bombardment". Science 376, n.º 6594 (13 de mayo de 2022): 731–38. http://dx.doi.org/10.1126/science.abk3195.
Texto completoChuang, Wei Ching, Ching Kong Chao, Wen Chung Chang y Chi Ting Ho. "Fabrication of High Aspect Ratio Periodical Structure on Metal Using an Electroforming Process". Key Engineering Materials 364-366 (diciembre de 2007): 280–83. http://dx.doi.org/10.4028/www.scientific.net/kem.364-366.280.
Texto completoKim, Nam-Hoon, Ju-Sun Park y Woo-Sun Lee. "Effective Ag Doping by He-Ne Laser Exposure to Improve the Electrical and the Optical Properties of CdTe Thin Films for Heterostructured Thin Film Solar Cells". Journal of the Korean Physical Society 59, n.º 3 (15 de septiembre de 2011): 2286–90. http://dx.doi.org/10.3938/jkps.59.2286.
Texto completoKhan, Saleem. "Investigation and Comparison of Optical Properties of Nickel Nanowires and Nickel Thin Film Using He-Ne Laser". International Journal on Organic Electronics 1, n.º 2 (31 de octubre de 2012): 15–22. http://dx.doi.org/10.5121/ijoe.2012.1203.
Texto completoHäberlen, Maik, Brian Murphy, Bernd Stritzker y Jörg K. N. Lindner. "Decoupling of a strained 3C-SiC(111) thin film on silicon by He+ and O+ ion implantation". physica status solidi (c) 8, n.º 3 (20 de enero de 2011): 944–47. http://dx.doi.org/10.1002/pssc.201000342.
Texto completoSaidani, Fatma, Dominic Rochefort y Mohamed Mohamedi. "Carbon Monoxide Oxidation on Nanostructured Pt Thin Films Synthesized by Pulsed Laser Deposition: Insights into the Morphology Effects". Laser Chemistry 2010 (4 de noviembre de 2010): 1–7. http://dx.doi.org/10.1155/2010/143684.
Texto completoCastillo, Virgil Christian G., Ted Limpoco y Erwin P. Enriquez. "Detection of Nitrogen in Layer-by-Layer Polymeric Films by Energy Dispersive X-Ray Spectroscopy". Key Engineering Materials 913 (18 de marzo de 2022): 87–97. http://dx.doi.org/10.4028/p-9yin9g.
Texto completoEt al., Jassim. "Synthesis, Characteristics and Study the Photoluminscience of the CdSxSe1-x Nanocrystaline Thin Film". Baghdad Science Journal 17, n.º 1 (1 de marzo de 2020): 0116. http://dx.doi.org/10.21123/bsj.2020.17.1.0116.
Texto completoCamacho, C. S., P. F. P. Fichtner, F. C. Zawislak y G. Feldmann. "Microstructure and He Bubble Effects on Al-Cu Thin Films". MRS Proceedings 792 (2003). http://dx.doi.org/10.1557/proc-792-r7.10.
Texto completoHan, Sang-Myeon, Joong-Hyun Park, Hye-Jin Lee, Kwang-Sub Shin y Min-Koo Han. "Nanocrystalline-Si Thin Film Deposited by Inductively Coupled Plasma Chemical Vapor Deposition (ICP-CVD) at 150°C". MRS Proceedings 862 (2005). http://dx.doi.org/10.1557/proc-862-a19.9.
Texto completoSimion, B. M., R. Ramesh, V. G. Keramidas, R. L. Pfeffer, G. Thomas y E. Marinero. "Epitaxial Magnetic Garnet Thin Films and Heterostructures by Pulsed Laser Deposition". MRS Proceedings 341 (1994). http://dx.doi.org/10.1557/proc-341-65.
Texto completoCatalan, Gustau, J. Marty Gregg y Pavlo Zubko. "James Floyd Scott. 4 May 1942—6 April 2020". Biographical Memoirs of Fellows of the Royal Society, 3 de agosto de 2022. http://dx.doi.org/10.1098/rsbm.2021.0048.
Texto completoMassimo, Maurice, Walter Varhue, Edward Adams y Stephen Titcomb. "Chemical Beam Deposition of Y2O3 Thin Films with An Ecr". MRS Proceedings 249 (1991). http://dx.doi.org/10.1557/proc-249-233.
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