Artículos de revistas sobre el tema "Diblock copolymer (DBC) lithography"
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Chervanyov, A. I. "Conductivity of Insulating Diblock Copolymer System Filled with Conductive Particles Having Different Affinities for Dissimilar Copolymer Blocks". Polymers 12, n.º 8 (25 de julio de 2020): 1659. http://dx.doi.org/10.3390/polym12081659.
Texto completoPermyakova, N. M., T. B. Zheltonozhskaya, V. I. Karpovskyi, R. V. Postoi, V. I. Maksin, S. V. Partsevskaya, L. M. Grishchenko, D. O. Klymchuk y V. V. Klepko. "Composition of α-tocopheryl acetate with micellar nanocarriers and the possibility of its use as a biologically active additive". Polymer journal 42, n.º 4 (10 de diciembre de 2020): 292–306. http://dx.doi.org/10.15407/polymerj.42.04.292.
Texto completoKuech, Thomas F. y Luke J. Mawst. "Nanofabrication of III–V semiconductors employing diblock copolymer lithography". Journal of Physics D: Applied Physics 43, n.º 18 (21 de abril de 2010): 183001. http://dx.doi.org/10.1088/0022-3727/43/18/183001.
Texto completoMuramatsu, Makoto. "Nanopatterning of diblock copolymer directed self-assembly lithography with wet development". Journal of Micro/Nanolithography, MEMS, and MOEMS 11, n.º 3 (9 de julio de 2012): 031305. http://dx.doi.org/10.1117/1.jmm.11.3.031305.
Texto completoKunitskaya, Larisa, Tatyana Zheltonozhskaya, Rostyslav Stoika y Dmytro Klymchuk. "Compositions of Anticancer Drug with Micellar Nanocarriers and Their Cytotoxicity". French-Ukrainian Journal of Chemistry 5, n.º 2 (2017): 103–20. http://dx.doi.org/10.17721/fujcv5i2p103-120.
Texto completoPark, J. H., J. Kirch, L. J. Mawst, C. C. Liu, P. F. Nealey y T. F. Kuech. "Controlled growth of InGaAs/InGaAsP quantum dots on InP substrates employing diblock copolymer lithography". Applied Physics Letters 95, n.º 11 (14 de septiembre de 2009): 113111. http://dx.doi.org/10.1063/1.3224916.
Texto completoYoshida, Shinya, Takahito Ono y Masayoshi Esashi. "Conductive polymer patterned media fabricated by diblock copolymer lithography for scanning multiprobe data storage". Nanotechnology 19, n.º 47 (29 de octubre de 2008): 475302. http://dx.doi.org/10.1088/0957-4484/19/47/475302.
Texto completoTerekhin, V. V., O. V. Dement’eva, A. V. Zaitseva y V. M. Rudoy. "Diblock copolymer micellar lithography: 1. Intermicellar interactions and pathways for control of monomicellar film structure". Colloid Journal 73, n.º 5 (octubre de 2011): 697–706. http://dx.doi.org/10.1134/s1061933x11050152.
Texto completoTerekhin, V. V., O. V. Dement’eva y V. M. Rudoy. "Diblock copolymer micellar lithography: 2. Formation of highly ordered nanoparticle ensembles with controlled geometric characteristics". Colloid Journal 73, n.º 5 (octubre de 2011): 707–16. http://dx.doi.org/10.1134/s1061933x11050164.
Texto completoKim, Honghyuk, Jonathan Choi, Zachary Lingley, Miles Brodie, Yongkun Sin, Thomas F. Kuech, Padma Gopalan y Luke J. Mawst. "Selective growth of strained (In)GaAs quantum dots on GaAs substrates employing diblock copolymer lithography nanopatterning". Journal of Crystal Growth 465 (mayo de 2017): 48–54. http://dx.doi.org/10.1016/j.jcrysgro.2017.02.046.
Texto completoChang, Chun-Chieh, Dan Botez, Lei Wan, Paul F. Nealey, Steven Ruder y Thomas F. Kuech. "Fabrication of large-area, high-density Ni nanopillar arrays on GaAs substrates using diblock copolymer lithography and electrodeposition". Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena 31, n.º 3 (mayo de 2013): 031801. http://dx.doi.org/10.1116/1.4798464.
Texto completoDirani, Ali, Fabrice Stehlin, Ihab Dika, Arnaud Spangenberg, Nathan Grumbach, Jean-Louis Gallani, Bertrand Donnio et al. "Orienting the Demixion of a Diblock-copolymer Using 193 nm Interferometric Lithography for the Controlled Deposition of Nanoparticles". Macromolecular Rapid Communications 32, n.º 20 (16 de agosto de 2011): 1627–33. http://dx.doi.org/10.1002/marc.201100399.
Texto completoMastari, Marouane, Matthew Charles, Patricia Pimenta-Barros, Maxime Argoud, Raluca Tiron, Anne-Marie Papon, Nicolas Chevalier et al. "Ge Nano-Heteroepitaxy: From Nano-Pillars to Thick Coalesced Layers". ECS Transactions 109, n.º 4 (30 de septiembre de 2022): 317–28. http://dx.doi.org/10.1149/10904.0317ecst.
Texto completoBorah, Dipu, Cian Cummins, Sozaraj Rasappa, Ramsankar Senthamaraikannan, Mathieu Salaun, Marc Zelsmann, George Liontos, Konstantinos Ntetsikas, Apostolos Avgeropoulos y Michael Morris. "Nanopatterning via Self-Assembly of a Lamellar-Forming Polystyrene-block-Poly(dimethylsiloxane) Diblock Copolymer on Topographical Substrates Fabricated by Nanoimprint Lithography". Nanomaterials 8, n.º 1 (9 de enero de 2018): 32. http://dx.doi.org/10.3390/nano8010032.
Texto completoKim, Honghyuk, Wei Wei, Thomas F. Kuech, Padma Gopalan y Luke J. Mawst. "Impact of InGaAs carrier collection quantum well on the performance of InAs QD active region lasers fabricated by diblock copolymer lithography and selective area epitaxy". Semiconductor Science and Technology 34, n.º 2 (14 de enero de 2019): 025012. http://dx.doi.org/10.1088/1361-6641/aaf8e8.
Texto completoPrausnitz, John M. "Thermodynamics of structured fluids. Hard science for soft materials". Pure and Applied Chemistry 72, n.º 10 (1 de enero de 2000): 1819–34. http://dx.doi.org/10.1351/pac200072101819.
Texto completoCao, Wei, Senlin Xia, Michael Appold, Nitin Saxena, Lorenz Bießmann, Sebastian Grott, Nian Li, Markus Gallei, Sigrid Bernstorff y Peter Müller-Buschbaum. "Self-Assembly in ultrahigh molecular weight sphere-forming diblock copolymer thin films under strong confinement". Scientific Reports 9, n.º 1 (diciembre de 2019). http://dx.doi.org/10.1038/s41598-019-54648-3.
Texto completoAlabi, Taiwo R., Dajun Yuan y Suman Das. "Photopatterneable Block Co-Polymers for Laser Interference Lithography". MRS Proceedings 1412 (2012). http://dx.doi.org/10.1557/opl.2012.1258.
Texto completoLiu, Guangyu, Hongping Zhao, Jing Zhang, Joo Hyung Park, Luke J. Mawst y Nelson Tansu. "Selective area epitaxy of ultra-high density InGaN quantum dots by diblock copolymer lithography". Nanoscale Research Letters 6, n.º 1 (15 de abril de 2011). http://dx.doi.org/10.1186/1556-276x-6-342.
Texto completo"InGaAs/InP Quantum Dot Formation Employing Diblock Copolymer Lithography and Selective Growth - Invited Talk". ECS Meeting Abstracts, 2009. http://dx.doi.org/10.1149/ma2009-02/29/2280.
Texto completoChevalier, Xavier, Gwenaelle Pound-Lana, Cindy Gomes Correia, Sébastien Cavalaglio, Benjamin Cabannes-Boué, Frederic Restagno, Guillaume Miquelard-Garnier et al. "Self-organization and dewetting kinetics in sub-10 nm diblock copolymer line/space lithography". Nanotechnology, 19 de enero de 2023. http://dx.doi.org/10.1088/1361-6528/acb49f.
Texto completoYoshida, Hiroshi, Hirofumi Kitano, Satoshi Akasaka, Tomohiro Inoue, Mikihito Taknaka, Hirokazu Hasegawa y Hideki Nagano. "Tailoring Microdomain Orientation in Block Copolymer Thin Films for Lithographic Application". MRS Proceedings 961 (2006). http://dx.doi.org/10.1557/proc-0961-o17-01.
Texto completoZhang, Yuan, Simone Raoux, Daniel Krebs, Leslie E. Krupp, Teya Topuria, Jean Jordan-Sweet, Marissa Caldwell, Philip Rice, Delia J. Milliron y H. S. Philip Wong. "Crystallization Characteristics Of Phase Change Nanoparticle Arrays Fabricated By Self-Assembly Based Lithography". MRS Proceedings 1072 (2008). http://dx.doi.org/10.1557/proc-1072-g08-05.
Texto completoBorah, Dipu, Sozaraj Rasappa, Barbara Kosmala, Justin D. Holmes y Michael A. Morris. "Block Copolymer Self-assembly on Ethylene Glycol (EG) Self-assembled Monolayer (SAM) for Nanofabrication". MRS Proceedings 1450 (2012). http://dx.doi.org/10.1557/opl.2012.1224.
Texto completoRamanathan, Muruganathan, Seth B. Darling, Anirudha V. Sumant y Orlando Auciello. "Self-Assembly of Cylinder-Forming Block Copolymers on Ultrananocrystalline Diamond (UNCD) Thin Films for Lithographic Applications". MRS Proceedings 1203 (2009). http://dx.doi.org/10.1557/proc-1203-j17-15.
Texto completoPark, Joo Hyung, Anish Khandekar, Sang-Min Park, Luke Mawst, Thomas Kuech y Paul Nealey. "Selective GaAs Quantum Dot Array Growth using Dielectric and AlGaAs Masks Pattern-Transferred from Diblock Copolymer". MRS Proceedings 1014 (2007). http://dx.doi.org/10.1557/proc-1014-aa07-15.
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