Literatura académica sobre el tema "Diblock copolymer (DBC) lithography"
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Artículos de revistas sobre el tema "Diblock copolymer (DBC) lithography"
Chervanyov, A. I. "Conductivity of Insulating Diblock Copolymer System Filled with Conductive Particles Having Different Affinities for Dissimilar Copolymer Blocks". Polymers 12, n.º 8 (25 de julio de 2020): 1659. http://dx.doi.org/10.3390/polym12081659.
Texto completoPermyakova, N. M., T. B. Zheltonozhskaya, V. I. Karpovskyi, R. V. Postoi, V. I. Maksin, S. V. Partsevskaya, L. M. Grishchenko, D. O. Klymchuk y V. V. Klepko. "Composition of α-tocopheryl acetate with micellar nanocarriers and the possibility of its use as a biologically active additive". Polymer journal 42, n.º 4 (10 de diciembre de 2020): 292–306. http://dx.doi.org/10.15407/polymerj.42.04.292.
Texto completoKuech, Thomas F. y Luke J. Mawst. "Nanofabrication of III–V semiconductors employing diblock copolymer lithography". Journal of Physics D: Applied Physics 43, n.º 18 (21 de abril de 2010): 183001. http://dx.doi.org/10.1088/0022-3727/43/18/183001.
Texto completoMuramatsu, Makoto. "Nanopatterning of diblock copolymer directed self-assembly lithography with wet development". Journal of Micro/Nanolithography, MEMS, and MOEMS 11, n.º 3 (9 de julio de 2012): 031305. http://dx.doi.org/10.1117/1.jmm.11.3.031305.
Texto completoKunitskaya, Larisa, Tatyana Zheltonozhskaya, Rostyslav Stoika y Dmytro Klymchuk. "Compositions of Anticancer Drug with Micellar Nanocarriers and Their Cytotoxicity". French-Ukrainian Journal of Chemistry 5, n.º 2 (2017): 103–20. http://dx.doi.org/10.17721/fujcv5i2p103-120.
Texto completoPark, J. H., J. Kirch, L. J. Mawst, C. C. Liu, P. F. Nealey y T. F. Kuech. "Controlled growth of InGaAs/InGaAsP quantum dots on InP substrates employing diblock copolymer lithography". Applied Physics Letters 95, n.º 11 (14 de septiembre de 2009): 113111. http://dx.doi.org/10.1063/1.3224916.
Texto completoYoshida, Shinya, Takahito Ono y Masayoshi Esashi. "Conductive polymer patterned media fabricated by diblock copolymer lithography for scanning multiprobe data storage". Nanotechnology 19, n.º 47 (29 de octubre de 2008): 475302. http://dx.doi.org/10.1088/0957-4484/19/47/475302.
Texto completoTerekhin, V. V., O. V. Dement’eva, A. V. Zaitseva y V. M. Rudoy. "Diblock copolymer micellar lithography: 1. Intermicellar interactions and pathways for control of monomicellar film structure". Colloid Journal 73, n.º 5 (octubre de 2011): 697–706. http://dx.doi.org/10.1134/s1061933x11050152.
Texto completoTerekhin, V. V., O. V. Dement’eva y V. M. Rudoy. "Diblock copolymer micellar lithography: 2. Formation of highly ordered nanoparticle ensembles with controlled geometric characteristics". Colloid Journal 73, n.º 5 (octubre de 2011): 707–16. http://dx.doi.org/10.1134/s1061933x11050164.
Texto completoKim, Honghyuk, Jonathan Choi, Zachary Lingley, Miles Brodie, Yongkun Sin, Thomas F. Kuech, Padma Gopalan y Luke J. Mawst. "Selective growth of strained (In)GaAs quantum dots on GaAs substrates employing diblock copolymer lithography nanopatterning". Journal of Crystal Growth 465 (mayo de 2017): 48–54. http://dx.doi.org/10.1016/j.jcrysgro.2017.02.046.
Texto completoTesis sobre el tema "Diblock copolymer (DBC) lithography"
DIALAMEH, MASOUD. "Fabrication and characterization of reference nano and micro structures for 3D chemical analysis". Doctoral thesis, Politecnico di Torino, 2019. http://hdl.handle.net/11583/2742524.
Texto completoXiao, Qijun. "Hierarchical multiple bit clusters and patterned media enabled by novel nanofabrication techniques – High resolution electron beam lithography and block polymer self assembly". 2010. https://scholarworks.umass.edu/dissertations/AAI3397756.
Texto completoActas de conferencias sobre el tema "Diblock copolymer (DBC) lithography"
Kihara, Naoko, Kazutaka Takizawa y Hiroyuki Hieda. "Fabrication of sub-10-nm pattern using diblock copolymer". En SPIE Advanced Lithography, editado por Frank M. Schellenberg y Bruno M. La Fontaine. SPIE, 2009. http://dx.doi.org/10.1117/12.812210.
Texto completoChang, Li-Wen, Marissa A. Caldwell y H. S. Philip Wong. "Diblock copolymer directed self-assembly for CMOS device fabrication". En SPIE Advanced Lithography, editado por Frank M. Schellenberg. SPIE, 2008. http://dx.doi.org/10.1117/12.772000.
Texto completoHong, Yang, Li-Wen Chang, Albert Lin y H. S. Philip Wong. "SLICE image analysis for diblock copolymer characterization and process optimization". En SPIE Advanced Lithography, editado por Daniel J. C. Herr. SPIE, 2010. http://dx.doi.org/10.1117/12.848378.
Texto completoMuramatsu, Makoto, Mitsuaki Iwashita, Takahiro Kitano, Takayuki Toshima, Yuriko Seino, Daisuke Kawamura, Masahiro Kanno, Katsutoshi Kobayashi y Tsukasa Azuma. "Nanopatterning of diblock copolymer directed self-assembly lithography with wet development". En SPIE Advanced Lithography, editado por Daniel J. C. Herr. SPIE, 2011. http://dx.doi.org/10.1117/12.878931.
Texto completoKihara, Naoko, Hiroyuki Hieda y Katsuyuki Naito. "NIL mold manufacturing using self-organized diblock copolymer as patterning template". En SPIE Advanced Lithography, editado por Frank M. Schellenberg. SPIE, 2008. http://dx.doi.org/10.1117/12.771630.
Texto completoChang, Li-Wen y H. S. Philip Wong. "Diblock copolymer directed self-assembly for CMOS device fabrication". En SPIE 31st International Symposium on Advanced Lithography, editado por Alfred K. K. Wong y Vivek K. Singh. SPIE, 2006. http://dx.doi.org/10.1117/12.661028.
Texto completoChirasatitsin, Somyot, Priyalakshmi Viswanathan, Giuseppe Battaglia y Adam J. Engler. "Directing Stem Cell Fate in 3D Through Cell Inert and Adhesive Diblock Copolymer Domains". En ASME 2013 Summer Bioengineering Conference. American Society of Mechanical Engineers, 2013. http://dx.doi.org/10.1115/sbc2013-14442.
Texto completoIzumi, Kenichi, Bongkeun Kim, Nabil Laachi, Kris T. Delaney, Michael Carilli y Glenn H. Fredrickson. "Barriers to defect melting in chemo-epitaxial directed self-assembly of lamellar-forming diblock copolymer/homopolymer blends". En SPIE Advanced Lithography, editado por Douglas J. Resnick y Christopher Bencher. SPIE, 2015. http://dx.doi.org/10.1117/12.2085685.
Texto completoBlack, C. T. y R. Ruiz. "Self assembly in semiconductor microelectronics: self-aligned sub-lithographic patterning using diblock copolymer thin films". En SPIE 31st International Symposium on Advanced Lithography, editado por Qinghuang Lin. SPIE, 2006. http://dx.doi.org/10.1117/12.659252.
Texto completoPeters, Andrew J., Richard A. Lawson, Peter J. Ludovice y Clifford L. Henderson. "Effects of block copolymer polydispersity and χN on pattern line edge roughness and line width roughness from directed self-assembly of diblock copolymers". En SPIE Advanced Lithography, editado por William M. Tong y Douglas J. Resnick. SPIE, 2013. http://dx.doi.org/10.1117/12.2021443.
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