Artículos de revistas sobre el tema "DC Sputter Deposition"
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Thormählen, Lars, Dennis Seidler, Viktor Schell, Frans Munnik, Jeffrey McCord y Dirk Meyners. "Sputter Deposited Magnetostrictive Layers for SAW Magnetic Field Sensors". Sensors 21, n.º 24 (15 de diciembre de 2021): 8386. http://dx.doi.org/10.3390/s21248386.
Texto completoSomekh, R. E. y Z. H. Barber. "UHV sputter deposition with a research-scale DC magnetron". Journal of Physics E: Scientific Instruments 21, n.º 11 (noviembre de 1988): 1029–33. http://dx.doi.org/10.1088/0022-3735/21/11/005.
Texto completoKent, Karl y Milutin Stoilovic. "Development of latent fingerprints using preferential DC sputter deposition". Forensic Science International 72, n.º 1 (marzo de 1995): 35–42. http://dx.doi.org/10.1016/0379-0738(94)01671-q.
Texto completoSonoda, Tsutomu y Kiyotaka Katou. "Coating of Granular Polymeric Spacers with Copper by Sputter-Deposition for Enhancing Cell Wall Structure of Sintered Highly Porous Aluminum Materials". Materials Science Forum 660-661 (octubre de 2010): 432–36. http://dx.doi.org/10.4028/www.scientific.net/msf.660-661.432.
Texto completoPark, Min Woo, Wang Woo Lee, Jae Gab Lee y Chong Mu Lee. "A Comparison of the Mechanical Properties of RF- and DC- Sputter-Deposited Cr Thin Films". Materials Science Forum 546-549 (mayo de 2007): 1695–98. http://dx.doi.org/10.4028/www.scientific.net/msf.546-549.1695.
Texto completoKharrazi Olsson, M., K. Macák, U. Helmersson y B. Hjörvarsson. "High rate reactive dc magnetron sputter deposition of Al2O3 films". Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 16, n.º 2 (marzo de 1998): 639–43. http://dx.doi.org/10.1116/1.581081.
Texto completoTing, Jyh-Ming y B. S. Tsai. "DC reactive sputter deposition of ZnO:Al thin film on glass". Materials Chemistry and Physics 72, n.º 2 (noviembre de 2001): 273–77. http://dx.doi.org/10.1016/s0254-0584(01)00451-5.
Texto completoSchneider, R., J. Geerk, G. Linker, O. Meyer y R. Smithey. "Effects of DC bias voltage in sputter deposition of YBaCuO films". Physica C: Superconductivity 235-240 (diciembre de 1994): 671–72. http://dx.doi.org/10.1016/0921-4534(94)91559-8.
Texto completoKoren, G. "DC sputter deposition of YBa2Cu3O7 thin films for two sided coating". Physica C: Superconductivity 209, n.º 4 (mayo de 1993): 369–72. http://dx.doi.org/10.1016/0921-4534(93)90547-4.
Texto completoKellett, B. J. y J. H. James. "Ion beam sputter deposition of YBa2Cu3O7−δ thin films". Journal of Materials Research 8, n.º 12 (diciembre de 1993): 3032–42. http://dx.doi.org/10.1557/jmr.1993.3032.
Texto completoDinh, Cam Thi Mong, Thang Bach Phan y Hoang Thanh Nguyen. "Synthesis of ZnO nanowires on Ti/glass substrates by DC magnetron sputter deposition". Science and Technology Development Journal 17, n.º 2 (30 de junio de 2014): 47–55. http://dx.doi.org/10.32508/stdj.v17i2.1314.
Texto completoWu, Wan-Yu y Jyh-Ming Ting. "Effects of Process Conditions on the Synthesis and Microstructure of Nano-Scale Metal-Containing Amorphous Carbon Thin Films". Journal of Nanoscience and Nanotechnology 8, n.º 5 (1 de mayo de 2008): 2623–26. http://dx.doi.org/10.1166/jnn.2008.18294.
Texto completoSonoda, Tsutomu, Kiyotaka Katou y Tadashi Asahina. "Porous Structure and Mechanical Properties of the Cellular Metallic Materials Fabricated by Sintering Al Powder Coated with Sn". Materials Science Forum 591-593 (agosto de 2008): 277–81. http://dx.doi.org/10.4028/www.scientific.net/msf.591-593.277.
Texto completoSangwaranatee, N. W., N. Sangwaranatee, M. Horprathum, C. Chananonnawathorn y M. Muntini. "DC reactive sputter deposition of CuO thin films at different operating pressures". Materials Today: Proceedings 5, n.º 7 (2018): 15166–69. http://dx.doi.org/10.1016/j.matpr.2018.04.076.
Texto completoKlein, P., B. Gottwald, T. Frauenheim, C. Köhler y A. Gemmler. "Residual stresses modelled by MD simulation applied to PVD DC sputter deposition". Surface and Coatings Technology 200, n.º 5-6 (noviembre de 2005): 1600–1603. http://dx.doi.org/10.1016/j.surfcoat.2005.08.120.
Texto completoR. Agool, Ibrahim, Mohammed K. Khalaf, Shaimaa H. Abd Muslim y Riyadh N. Talaq. "Reactive DC magnetron sputter deposition and structural properties of NiO thin films". Engineering and Technology Journal 33, n.º 6B (1 de julio de 2015): 1082–92. http://dx.doi.org/10.30684/etj.2015.116476.
Texto completoShen, Yi y Ruo He Yao. "Properties of Al Films Depend on Substrate Temperature by DC Magnetron Sputter Deposition". Advanced Materials Research 662 (febrero de 2013): 413–16. http://dx.doi.org/10.4028/www.scientific.net/amr.662.413.
Texto completoAkhtar, Pervez, T. J. Ali y R. Mahmud. "An Investigation into the Effects of Substrate Temperature on Magnetic Properties of RF Sputtered NiFe Films". Key Engineering Materials 442 (junio de 2010): 109–15. http://dx.doi.org/10.4028/www.scientific.net/kem.442.109.
Texto completoMadsen, N. D., B. H. Christensen, S. Louring, A. N. Berthelsen, K. P. Almtoft, L. P. Nielsen y J. Bøttiger. "Controlling the deposition rate during target erosion in reactive pulsed DC magnetron sputter deposition of alumina". Surface and Coatings Technology 206, n.º 23 (julio de 2012): 4850–54. http://dx.doi.org/10.1016/j.surfcoat.2012.05.070.
Texto completoPrabaswara, Aditya, Jens Birch, Muhammad Junaid, Elena Alexandra Serban, Lars Hultman y Ching-Lien Hsiao. "Review of GaN Thin Film and Nanorod Growth Using Magnetron Sputter Epitaxy". Applied Sciences 10, n.º 9 (27 de abril de 2020): 3050. http://dx.doi.org/10.3390/app10093050.
Texto completoDeshmukh, Pratap, Sergey Yarmolenko, Sudheer Neralla y Jagannathan Sankar. "Corrosion Analysis of Mg/Al2O3 Bio-Degradable Nanolaminate Thin-Films Fabricated Using DC/Pulsed DC Magnetron-Sputtering Technique". ECS Meeting Abstracts MA2022-02, n.º 14 (9 de octubre de 2022): 2596. http://dx.doi.org/10.1149/ma2022-02142596mtgabs.
Texto completoHoon, Jian Wei, Kah Yoong Chan y Cheng Yang Low. "XRD Investigations on Film Thickness and Substrate Temperature Effects of DC Magnetron Sputtered ZnO Films". Advanced Materials Research 845 (diciembre de 2013): 241–45. http://dx.doi.org/10.4028/www.scientific.net/amr.845.241.
Texto completoDENG, JINXIANG, GUANGHUA CHEN y XUEMEI SONG. "CHARACTERIZATION OF CUBIC BORON NITRIDE THIN FILMS DEPOSITED BY RF SPUTTER". International Journal of Modern Physics B 16, n.º 28n29 (20 de noviembre de 2002): 4339–42. http://dx.doi.org/10.1142/s021797920201539x.
Texto completoChen, Le, Michael E. Graham, Gonghu Li y Kimberly A. Gray. "Fabricating highly active mixed phase TiO2 photocatalysts by reactive DC magnetron sputter deposition". Thin Solid Films 515, n.º 3 (noviembre de 2006): 1176–81. http://dx.doi.org/10.1016/j.tsf.2006.07.094.
Texto completoFischer, Maria, Mathis Trant, Kerstin Thorwarth, Jörg Patscheider y Hans Josef Hug. "A setup for arc-free reactive DC sputter deposition of Al-O-N". Surface and Coatings Technology 362 (marzo de 2019): 220–24. http://dx.doi.org/10.1016/j.surfcoat.2019.01.082.
Texto completode Jong, Michiel, Victor E. van Enter y Erik van der Kolk. "DC/RF magnetron sputter deposition and characterisation of Ca3Si2N2O4:Eu2+ luminescent thin films". Journal of Luminescence 164 (agosto de 2015): 52–56. http://dx.doi.org/10.1016/j.jlumin.2015.03.008.
Texto completoHashimoto, Mituru, Hong Qiu, Tatsuya Ohbuchi, Miklos Adamik, Hisashi Nakai, Arpad Barna y Peter B. Barna. "Characterization of cobalt films grown on MgO(001) by dc-biased-sputter deposition". Journal of Crystal Growth 166, n.º 1-4 (septiembre de 1996): 792–97. http://dx.doi.org/10.1016/0022-0248(95)00495-5.
Texto completoLee, Hanbin, Minjeong Park, Minhyon Jeon y Byeongcheol Kim. "Multi-Layer Anti-Reflection Film Based on SiOx and NbOx by DC Pulse Sputter System with Inductively Coupled Plasma Source". Crystals 10, n.º 6 (26 de mayo de 2020): 424. http://dx.doi.org/10.3390/cryst10060424.
Texto completoKrumme, J.-P., V. Doormann, F. Welz, O. Dösssel y H. van Hal. "Ion-beam sputter deposition process for Y1Ba2Cu3O7-δ thin-film structures". Journal of Materials Research 9, n.º 11 (noviembre de 1994): 2747–60. http://dx.doi.org/10.1557/jmr.1994.2747.
Texto completoKaufholz, Marthe, Bärbel Krause, Sunil Kotapati, Martin Köhl, Miguel F. Mantilla, Michael Stüber, Sven Ulrich, Reinhard Schneider, Dagmar Gerthsen y Tilo Baumbach. "Monitoring the thin film formation during sputter deposition of vanadium carbide". Journal of Synchrotron Radiation 22, n.º 1 (1 de enero de 2015): 76–85. http://dx.doi.org/10.1107/s1600577514024412.
Texto completoChang, Chi-Lung, Tz-Heng Chiou, Pin-Hung Chen, Wei-Chih Chen, Chun-Ta Ho y Wan-Yu Wu. "Characteristics of TiN/W 2 N multilayers prepared using magnetron sputter deposition with dc and pulsed dc powers". Surface and Coatings Technology 303 (octubre de 2016): 25–31. http://dx.doi.org/10.1016/j.surfcoat.2016.03.086.
Texto completoWu, Wan Yu, Chia Wei Hsu y Jyh Ming Ting. "Nanoscaled C, Ni, Pt Thin Films". Journal of Nano Research 6 (junio de 2009): 29–34. http://dx.doi.org/10.4028/www.scientific.net/jnanor.6.29.
Texto completoAleman, Angel, Chao Li, Hicham Zaid, Hanna Kindlund, Joshua Fankhauser, Sergey V. Prikhodko, Mark S. Goorsky y Suneel Kodambaka. "Ultrahigh vacuum dc magnetron sputter-deposition of epitaxial Pd(111)/Al2O3(0001) thin films". Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 36, n.º 3 (mayo de 2018): 030602. http://dx.doi.org/10.1116/1.5021609.
Texto completoKharrazi, M., L. Kullman y C. G. Granqvist. "High-rate dual-target DC magnetron sputter deposition of “blue” electrochromic Mo oxide films". Solar Energy Materials and Solar Cells 53, n.º 3-4 (junio de 1998): 349–56. http://dx.doi.org/10.1016/s0927-0248(98)00033-6.
Texto completoLöbl, H. P. y M. Huppertz. "Thermal stability of nonstoichiometric silicon nitride films made by reactive dc magnetron sputter deposition". Thin Solid Films 317, n.º 1-2 (abril de 1998): 153–56. http://dx.doi.org/10.1016/s0040-6090(97)00512-9.
Texto completoMilitello, Maria C., Stephen W. Gaarenstroom y Steven J. Simko. "Epitaxial Aluminum Nitride Film on Silicon(111) Grown by Reactive DC Magnetron Sputter Deposition". Surface Science Spectra 1, n.º 1 (marzo de 1992): 3–7. http://dx.doi.org/10.1116/1.1247668.
Texto completoSivakumar, Kousik y S. M. Rossnagel. "Deposition of aluminum-doped zinc oxide thin films for optical applications using rf and dc magnetron sputter deposition". Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 28, n.º 4 (julio de 2010): 515–22. http://dx.doi.org/10.1116/1.3425640.
Texto completoBosworth, David, Nadia Stelmashenko y Zoe H. Barber. "Structural Control of Carbon Nickel Thin Films Without Substrate Heating". MRS Proceedings 1451 (2012): 145–50. http://dx.doi.org/10.1557/opl.2012.1251.
Texto completoSakkas, Charalampos, Jean-Marc Cote, Joseph Gavoille, Jean-Yves Rauch, Pierre-Henri Cornuault, Anna Krystianiak, Olivier Heintz y Nicolas Martin. "Tunable Electrical Properties of Ti-B-N Thin Films Sputter-Deposited by the Reactive Gas Pulsing Process". Coatings 12, n.º 11 (9 de noviembre de 2022): 1711. http://dx.doi.org/10.3390/coatings12111711.
Texto completoJärrendahl, K., I. Ivanov, J.-E. Sundgren, G. Radnóczi, Zs Czigany y J. E. Greene. "Microstructure evolution in amorphous Ge/Si multilayers grown by magnetron sputter deposition". Journal of Materials Research 12, n.º 7 (julio de 1997): 1806–15. http://dx.doi.org/10.1557/jmr.1997.0249.
Texto completoMurray, Jack, Wayne Huebner, Matthew J. O’Keefe, Kristina Wilder, Ryan Eatinger, William Kuhn, Daniel S. Krueger y J. Ambrose Wolf. "Sputter deposition of thin film MIM capacitors on LTCC substrates for RF bypass and filtering applications". International Symposium on Microelectronics 2011, n.º 1 (1 de enero de 2011): 000747–52. http://dx.doi.org/10.4071/isom-2011-wp3-paper3.
Texto completoAuret, F. D. "Characterization of defects introduced during dc magnetron sputter deposition of Ti–W on n-Si". Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 4, n.º 5 (septiembre de 1986): 1168. http://dx.doi.org/10.1116/1.583477.
Texto completoAoi, Takafumi, Nobuto Oka, Yasushi Sato, Ryo Hayashi, Hideya Kumomi y Yuzo Shigesato. "DC sputter deposition of amorphous indium–gallium–zinc–oxide (a-IGZO) films with H2O introduction". Thin Solid Films 518, n.º 11 (marzo de 2010): 3004–7. http://dx.doi.org/10.1016/j.tsf.2009.09.176.
Texto completoPachlhofer, Julia M., Aitana Tarazaga Martín-Luengo, Robert Franz, Enrico Franzke, Harald Köstenbauer, Jörg Winkler, Alberta Bonanni y Christian Mitterer. "Non-reactive dc magnetron sputter deposition of Mo-O thin films from ceramic MoOx targets". Surface and Coatings Technology 332 (diciembre de 2017): 80–85. http://dx.doi.org/10.1016/j.surfcoat.2017.07.083.
Texto completoSelinder, T. I., G. Larsson, U. Helmersson, S. Rudner y I. Petrov. "The dc magnetron sputter deposition process of YBa 2 Cu 3 O x thin films". Physica C: Superconductivity and its Applications 162-164 (diciembre de 1989): 599–600. http://dx.doi.org/10.1016/0921-4534(89)91166-0.
Texto completoMeng, Lingling, Qufu Wei, Yueli Li y Wenzheng Xu. "Effects of plasma pre-treatment on surface properties of fabric sputtered with copper". International Journal of Clothing Science and Technology 26, n.º 1 (25 de febrero de 2014): 96–104. http://dx.doi.org/10.1108/ijcst-06-2012-0028.
Texto completoSonoda, Tsutomu, Akira Watazu, Kazumi Kato y Tadashi Asahina. "Deposition of Sn-Al Onto Aluminum Powder in Its Self-Convective Motion by DC Sputtering". Materials Science Forum 498-499 (noviembre de 2005): 23–27. http://dx.doi.org/10.4028/www.scientific.net/msf.498-499.23.
Texto completoBecerril-Gonzalez, J. J., A. M. Castro-Chong, G. Oskam y O. Arés-Muzio. "Sputter deposition of Mo-alumina cermet solar selective coatings: Interrelation between residual oxygen incorporation, structure and optical properties". Materials Research Express 8, n.º 10 (1 de octubre de 2021): 105506. http://dx.doi.org/10.1088/2053-1591/ac3042.
Texto completoSonoda, Tsutomu, Akira Watazu, Kiyotaka Katou y Tadashi Asahina. "AES Studies on the Ti/N Compositionally Gradient Film Deposited onto Ti-6Al-4V Alloy by Reactive DC Sputtering". Microscopy and Microanalysis 12, n.º 4 (14 de julio de 2006): 356–61. http://dx.doi.org/10.1017/s1431927606060478.
Texto completoBelkind, A., W. Zhu, J. Lopez y K. Becker. "Time-resolved optical emission spectroscopy during pulsed dc magnetron sputter deposition of Ti and TiO2thin films". Plasma Sources Science and Technology 15, n.º 2 (24 de abril de 2006): S17—S25. http://dx.doi.org/10.1088/0963-0252/15/2/s03.
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