Literatura académica sobre el tema "Chemical Process Modeling"
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Artículos de revistas sobre el tema "Chemical Process Modeling"
Byun, Ki Ryang, Jeong Won Kang, Ki Oh Song y Ho Jung Hwang. "Atomic Scale Modeling of Chemical Mechanical Polishing Process". Journal of the Korean Institute of Electrical and Electronic Material Engineers 18, n.º 5 (1 de mayo de 2005): 414–22. http://dx.doi.org/10.4313/jkem.2005.18.5.414.
Texto completoTiong, Low Soon y Arshad Ahmad. "A Hybrid Model for Chemical Process Modeling". IFAC Proceedings Volumes 30, n.º 25 (septiembre de 1997): 163–68. http://dx.doi.org/10.1016/s1474-6670(17)41318-8.
Texto completoBhat, N. V., P. A. Minderman, T. McAvoy y N. S. Wang. "Modeling chemical process systems via neural computation". IEEE Control Systems Magazine 10, n.º 3 (abril de 1990): 24–30. http://dx.doi.org/10.1109/37.55120.
Texto completoBILIAIEV, М. М., V. V. BILIAIEVA, O. V. BERLOV, V. A. KOZACHYNA y Z. M. YAKUBOVSKA. "MATHEMATICAL MODELING OF UNSTATIONARY AIR POLLUTION PROCESS". Ukrainian Journal of Civil Engineering and Architecture, n.º 3 (015) (24 de junio de 2023): 13–19. http://dx.doi.org/10.30838/j.bpsacea.2312.140723.13.949.
Texto completoDong, Gao, Xu Xin, Zhang Beike, Ma Xin y Wu Chongguang. "A Framework for Agent-based Chemical Process Modeling". Journal of Applied Sciences 13, n.º 17 (15 de agosto de 2013): 3490–96. http://dx.doi.org/10.3923/jas.2013.3490.3496.
Texto completoBogomolov, B. B., E. D. Bykov, V. V. Men’shikov y A. M. Zubarev. "Organizational and technological modeling of chemical process systems". Theoretical Foundations of Chemical Engineering 51, n.º 2 (marzo de 2017): 238–46. http://dx.doi.org/10.1134/s0040579517010043.
Texto completoNie, Miaomiao, Jing Tan, Wen-Sheng Deng y Yue-Feng Su. "Modeling Investigation of Concurrent-flow Chemical Extraction Process". Journal of Physics: Conference Series 1284 (agosto de 2019): 012024. http://dx.doi.org/10.1088/1742-6596/1284/1/012024.
Texto completoGao, Li y Norman W. Loney. "Evolutionary polymorphic neural network in chemical process modeling". Computers & Chemical Engineering 25, n.º 11-12 (noviembre de 2001): 1403–10. http://dx.doi.org/10.1016/s0098-1354(01)00708-6.
Texto completoGau, Chao-Yang y Mark A. Stadtherr. "New interval methodologies for reliable chemical process modeling". Computers & Chemical Engineering 26, n.º 6 (junio de 2002): 827–40. http://dx.doi.org/10.1016/s0098-1354(02)00005-4.
Texto completoMcBride, Kevin y Kai Sundmacher. "Overview of Surrogate Modeling in Chemical Process Engineering". Chemie Ingenieur Technik 91, n.º 3 (3 de enero de 2019): 228–39. http://dx.doi.org/10.1002/cite.201800091.
Texto completoTesis sobre el tema "Chemical Process Modeling"
Shi, Ruijie. "Subspace identification methods for process dynamic modeling /". *McMaster only, 2001.
Buscar texto completoNarisaranukul, Narintr. "Modeling and analysis of the chemical milling process". Thesis, Massachusetts Institute of Technology, 1997. http://hdl.handle.net/1721.1/43425.
Texto completoSinangil, Mehmet Selcuk. "Modeling and control on an industrial polymerization process". Thesis, Georgia Institute of Technology, 1995. http://hdl.handle.net/1853/10150.
Texto completoJohnston, Lloyd Patrick Murphy. "Probability based approaches to process data modeling and rectifictaion". Thesis, Massachusetts Institute of Technology, 1996. http://hdl.handle.net/1721.1/10913.
Texto completoKoulouris, Alexandros. "Multiresolution learning in nonlinear dynamic process modeling and control". Thesis, Massachusetts Institute of Technology, 1995. http://hdl.handle.net/1721.1/11376.
Texto completoBohn, Douglas (Douglas Gorman) 1970. "Computer modeling of a continuous manufacturing process". Thesis, Massachusetts Institute of Technology, 1998. http://hdl.handle.net/1721.1/47557.
Texto completoIncludes bibliographical references.
by Douglas Bohn.
S.M.
Lai, Jiun-Yu. "Mechanics, mechanisms, and modeling of the chemical mechanical polishing process". Thesis, Massachusetts Institute of Technology, 2001. http://hdl.handle.net/1721.1/8860.
Texto completoIncludes bibliographical references.
The ever-increasing demand for high-performance microelectronic devices has motivated the semiconductor industry to design and manufacture Ultra-Large-Scale Integrated (ULSI) circuits with smaller feature size, higher resolution, denser packing, and multi-layer interconnects. The ULSI technology places stringent demands on global planarity of the Interlevel Dielectric (ILD) layers. Compared with other planarization techniques, the Chemical Mechanical Polishing (CMP) process produces excellent local and global planarization at low cost. It is thus widely adopted for planarizing inter-level dielectric (silicon dioxide) layers. Moreover, CMP is a critical process for fabricating the Cu damascene patterns, low-k dielectrics, and shallow isolated trenches. The wide range of materials to be polished concurrently or sequentially, however, increases the complexity of CMP and necessitates an understanding of the process fundamentals for optimal process design. This thesis establishes a theoretical framework to relate the process parameters to the different wafer/pad contact modes to study the behavior of wafer-scale polishing. Several models of polishing - microcutting, brittle fracture, surface melting and burnishing - are reviewed. Blanket wafers coated with a wide range of materials are polished to verify the models. Plastic deformation is identified as the dominant mechanism of material removal in fine abrasive polishing.
(cont.) Additionally, contact mechanics models, which relate the pressure distribution to the pattern geometry and pad elastic properties, explain the die-scale variation of material removal rate (MRR) on pattern geometry. The pad displacement into low features of submicron lines is less than 0.1 nm. Hence the applied load is only carried by the high features, and the pressure on high features increases with the area fraction of interconnects. Experiments study the effects of pattern geometry on the rates of pattern planarization, oxide overpolishing and Cu dishing. It was observed that Cu dishing of submicron features is less than 20 nm and contributes less to surface non-uniformity than does oxide overpolishing. Finally, a novel in situ detection technique, based on the change of the reflectance of the patterned surface at different polishing stages, is developed to detect the process endpoint and minimize overpolishing. Models that employ light scattering theory and statistical treatment correlate the sampled reflectance with the surface topography and Cu area fraction for detecting the process regime and endpoint. The experimental results agree well with the endpoint detection schemes predicted by the models.
by Jiun-Yu Lai.
Ph.D.
Bakshi, Bhavik Ramesh. "Multi-resolution methods for modeling, analysis and control of chemical process operations". Thesis, Massachusetts Institute of Technology, 1992. http://hdl.handle.net/1721.1/13203.
Texto completoBryden, Michelle D. (Michelle Denise). "Macrotransport process in branching networks : modeling convective-diffusive phenomena in the lung". Thesis, Massachusetts Institute of Technology, 1994. http://hdl.handle.net/1721.1/33514.
Texto completoJi, Qingjun. "Mathematical modeling of carbon black process from coal". Ohio : Ohio University, 2000. http://www.ohiolink.edu/etd/view.cgi?ohiou1172255200.
Texto completoLibros sobre el tema "Chemical Process Modeling"
Denn, Morton M. Process modeling. New York: Longman, 1986.
Buscar texto completoProcess modeling. Harlow: Longman Scientific & Technical, 1987.
Buscar texto completoGeorgiadis, Michael C., Julio R. Banga y Efstratios N. Pistikopoulos. Dynamic process modeling. Weinheim: Wiley-VCH, 2011.
Buscar texto completoProcess dynamics: Modeling, analysis, and simulation. Upper Saddle River, N.J: Prentice Hall PTR, 1998.
Buscar texto completoGeorgiadis, Michael C. Dynamic process modeling. Weinheim: Wiley-VCH, 2011.
Buscar texto completo1940-, Ray W. Harmon, ed. Process dynamics, modeling, and control. New York: Oxford University Press, 1994.
Buscar texto completoProcess modeling, simulation, and control for chemical engineers. 2a ed. New York: McGraw-Hill, 1990.
Buscar texto completoE, Schiesser W., ed. Dynamic modeling of transport process systems. San Diego: Academic Press, 1992.
Buscar texto completoUpreti, Simant Ranjan. Process Modeling and Simulation for Chemical Engineers. Chichester, UK: John Wiley & Sons, Ltd, 2017. http://dx.doi.org/10.1002/9781118914670.
Texto completoGhasem, Nayef. Modeling and Simulation of Chemical Process Systems. Boca Raton, FL : CRC Press/Taylor & Francis Group, 2018.: CRC Press, 2018. http://dx.doi.org/10.1201/b22487.
Texto completoCapítulos de libros sobre el tema "Chemical Process Modeling"
am Ende, Mary T., William Ketterhagen, Andrew Prpich, Pankaj Doshi, Salvador García-Muñoz y Rahul Bharadwajh. "DRUG PRODUCT PROCESS MODELING". En Chemical Engineering in the Pharmaceutical Industry, 489–525. Hoboken, NJ, USA: John Wiley & Sons, Inc., 2019. http://dx.doi.org/10.1002/9781119600800.ch70.
Texto completoSharma, Shivom y G. P. Rangaiah. "Mathematical Modeling, Simulation and Optimization for Process Design". En Chemical Process Retrofitting and Revamping, 97–127. Chichester, UK: John Wiley & Sons, Ltd, 2016. http://dx.doi.org/10.1002/9781119016311.ch4.
Texto completoSimpson, Ricardo y Sudhir K. Sastry. "Fundamentals of Mathematical Modeling, Simulation, and Process Control". En Chemical and Bioprocess Engineering, 245–60. New York, NY: Springer New York, 2013. http://dx.doi.org/10.1007/978-1-4614-9126-2_9.
Texto completoChen, Chau-Chyun. "Molecular Thermodynamics for Pharmaceutical Process Modeling and Simulation". En Chemical Engineering in the Pharmaceutical Industry, 505–19. Hoboken, NJ, USA: John Wiley & Sons, Inc., 2010. http://dx.doi.org/10.1002/9780470882221.ch27.
Texto completoGhasem, Nayef. "Introduction". En Modeling and Simulation of Chemical Process Systems, 1–38. Boca Raton, FL : CRC Press/Taylor & Francis Group, 2018.: CRC Press, 2018. http://dx.doi.org/10.1201/b22487-1.
Texto completoGhasem, Nayef. "Lumped Parameter Systems". En Modeling and Simulation of Chemical Process Systems, 39–105. Boca Raton, FL : CRC Press/Taylor & Francis Group, 2018.: CRC Press, 2018. http://dx.doi.org/10.1201/b22487-2.
Texto completoGhasem, Nayef. "Theory and Applications of Distributed Systems". En Modeling and Simulation of Chemical Process Systems, 107–53. Boca Raton, FL : CRC Press/Taylor & Francis Group, 2018.: CRC Press, 2018. http://dx.doi.org/10.1201/b22487-3.
Texto completoGhasem, Nayef. "Computational Fluid Dynamics". En Modeling and Simulation of Chemical Process Systems, 155–221. Boca Raton, FL : CRC Press/Taylor & Francis Group, 2018.: CRC Press, 2018. http://dx.doi.org/10.1201/b22487-4.
Texto completoGhasem, Nayef. "Mass Transport of Distributed Systems". En Modeling and Simulation of Chemical Process Systems, 223–72. Boca Raton, FL : CRC Press/Taylor & Francis Group, 2018.: CRC Press, 2018. http://dx.doi.org/10.1201/b22487-5.
Texto completoGhasem, Nayef. "Heat Transfer Distributed Parameter Systems". En Modeling and Simulation of Chemical Process Systems, 273–361. Boca Raton, FL : CRC Press/Taylor & Francis Group, 2018.: CRC Press, 2018. http://dx.doi.org/10.1201/b22487-6.
Texto completoActas de conferencias sobre el tema "Chemical Process Modeling"
Baharev, Ali y Arnold Neumaier. "Chemical Process Modeling in Modelica". En 9th International MODELICA Conference, Munich, Germany. Linköping University Electronic Press, 2012. http://dx.doi.org/10.3384/ecp12076955.
Texto completoR. Stoyanov, Stanislav y Andriy Kovalenko. "Multiscale Computational Modeling: From Heavy Petroleum to Biomass Valorization". En Annual International Conference on Chemistry, Chemical Engineering and Chemical Process. Global Science & Technology Forum (GSTF), 2015. http://dx.doi.org/10.5176/2301-3761_ccecp15.48.
Texto completoYu, Wen y Francisco J. Pineda. "Chemical process modeling with multiple neural networks". En 2001 European Control Conference (ECC). IEEE, 2001. http://dx.doi.org/10.23919/ecc.2001.7076515.
Texto completoKamchaddaskorn, Atthadej, Nalinee Mukdasanit y Thongchai Srinophakun. "Process Modeling and Simulation of Cyclohexanone Production". En The 3rd World Congress on Mechanical, Chemical, and Material Engineering. Avestia Publishing, 2017. http://dx.doi.org/10.11159/iccpe17.118.
Texto completoLin, Po Ting, Yogesh Jaluria y Hae Chang Gea. "Parametric Modeling and Optimization of Chemical Vapor Deposition Process". En ASME 2008 International Design Engineering Technical Conferences and Computers and Information in Engineering Conference. ASMEDC, 2008. http://dx.doi.org/10.1115/detc2008-50054.
Texto completoZographos, Nikolas, Christoph Zechner, Pedro Castrillo y Ignacio Martin-Bragado. "Process modeling of chemical and stress effects in SiGe". En ION IMPLANTATION TECHNOLOGY 2012: Proceedings of the 19th International Conference on Ion Implantation Technology. AIP, 2012. http://dx.doi.org/10.1063/1.4766526.
Texto completoChojnowski, Krystian, Piotr Wasilewski y Rafał Grądzki. "Movement modeling of mobile robot in MegaSumo category". En 2ND INTERNATIONAL CONFERENCE ON CHEMISTRY, CHEMICAL PROCESS AND ENGINEERING (IC3PE). Author(s), 2018. http://dx.doi.org/10.1063/1.5066472.
Texto completoShao, Hua, Panpan Lai, Junjie Li, Guobin Bai, Qi Yan, Junfeng Li, Tao Yang, Rui Chen y Yayi Wei. "Modeling of SiNx growth by chemical vapor deposition in nanosheet indentation". En Advanced Etch Technology and Process Integration for Nanopatterning XII, editado por Efrain Altamirano-Sánchez y Nihar Mohanty. SPIE, 2023. http://dx.doi.org/10.1117/12.2658152.
Texto completo"Computational Fluid Dynamics Modeling of Mixing Process for Two-Components Mixture in the Large Scale Reactor". En Chemical technology and engineering. Lviv Polytechnic National University, 2021. http://dx.doi.org/10.23939/cte2021.01.038.
Texto completoRao, S. Rama, C. R. M. Sravan, V. Pandu Ranga y G. Padmanabhan. "Fuzzy logic-based forward modeling of Electro Chemical Machining process". En 2009 World Congress on Nature & Biologically Inspired Computing (NaBIC). IEEE, 2009. http://dx.doi.org/10.1109/nabic.2009.5393708.
Texto completoInformes sobre el tema "Chemical Process Modeling"
Martino, C., D. Herman, J. Pike y T. Peters. ACTINIDE REMOVAL PROCESS SAMPLE ANALYSIS, CHEMICAL MODELING, AND FILTRATION EVALUATION. Office of Scientific and Technical Information (OSTI), junio de 2014. http://dx.doi.org/10.2172/1134065.
Texto completoXu, Dikai, Yu-Yen Chen, Jianhua Pan, Yitao Zhang, Dawei Wang, Yaswanth Pottimurthy, Thomas J. Flynn et al. Heat Integration Optimization and Dynamic Modeling Investigation for Advancing the Coal-Direct Chemical Looping Process. Office of Scientific and Technical Information (OSTI), abril de 2020. http://dx.doi.org/10.2172/1608820.
Texto completoNechypurenko, Pavlo, Tetiana Selivanova y Maryna Chernova. Using the Cloud-Oriented Virtual Chemical Laboratory VLab in Teaching the Solution of Experimental Problems in Chemistry of 9th Grade Students. [б. в.], junio de 2019. http://dx.doi.org/10.31812/123456789/3175.
Texto completoMorkun, Volodymyr, Natalia Morkun, Andrii Pikilnyak, Serhii Semerikov, Oleksandra Serdiuk y Irina Gaponenko. The Cyber-Physical System for Increasing the Efficiency of the Iron Ore Desliming Process. CEUR Workshop Proceedings, abril de 2021. http://dx.doi.org/10.31812/123456789/4373.
Texto completoSeale, Maria, R. Salter, Natàlia Garcia-Reyero, y Alicia Ruvinsky. A fuzzy epigenetic model for representing degradation in engineered systems. Engineer Research and Development Center (U.S.), septiembre de 2022. http://dx.doi.org/10.21079/11681/45582.
Texto completoBanks, H. T. Modeling Validation and Control of Advanced Chemical Vapor Deposition Processes. Fort Belvoir, VA: Defense Technical Information Center, noviembre de 2000. http://dx.doi.org/10.21236/ada384359.
Texto completoMojdeh Delshad, Gary A. Pope y Kamy Sepehrnoori. Modeling Wettability Alteration using Chemical EOR Processes in Naturally Fractured Reservoirs. Office of Scientific and Technical Information (OSTI), septiembre de 2007. http://dx.doi.org/10.2172/927590.
Texto completoZhylenko, Tetyana I., Ivan S. Koziy, Vladyslav S. Bozhenko y Irina A. Shuda. Using a web application to realize the effect of AR in assessing the environmental impact of emissions source. [б. в.], noviembre de 2020. http://dx.doi.org/10.31812/123456789/4408.
Texto completoErsoy, Daniel. 693JK31810003 Non-Destructive Tools for Surface to Bulk Correlations of Yield Strength Toughness and Chemistry. Chantilly, Virginia: Pipeline Research Council International, Inc. (PRCI), febrero de 2022. http://dx.doi.org/10.55274/r0012206.
Texto completoYou, Siming, Ondřej Mašek, Bauyrzhan Biakhmetov, Simon Ascher, Sudeshna Lahiri, PreetiChaturvedi Bhargava, Thallada Bhaskar, Supravat Sarangi y Sunita Varjani. Feasibility and impacts of Bioenergy Trigeneration systems (BioTrig) in disadvantaged rural areas in India. University of Glasgow, agosto de 2023. http://dx.doi.org/10.36399/gla.pubs.305660.
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