Books on the topic 'Vapour deposition'

Jones, Anthony C., and Michael L. Hitchman, eds. Chemical Vapour Deposition. Cambridge: Royal Society of Chemistry, 2008. http://dx.doi.org/10.1039/9781847558794.

Xu, Yongdong, and Xiu-Tian Yan. Chemical Vapour Deposition. London: Springer London, 2010. http://dx.doi.org/10.1007/978-1-84882-894-0.

Carlsson, Jan-Otto. Progress in chemical vapour deposition. Oxford: Pergamon, 1994.

Wilson, M. I. Chemical vapour deposition onto porous materials. Manchester: UMIST, 1993.

Moroșanu, C. E. Thin films by chemical vapour deposition. Amsterdam: Elsevier, 1990.

C, Jones Anthony, and Hitchman Michael L, eds. Chemical vapour deposition: Precursors, processes and applications. Cambridge, UK: Royal Society of Chemistry, 2009.

Ahmed, Waqar, Htet Sein, Mark J. Jackson, Christopher Rego, David A. Phoenix, Abdelbary Elhissi, and St John Crean. Chemical Vapour Deposition of Diamond for Dental Tools and Burs. Cham: Springer International Publishing, 2014. http://dx.doi.org/10.1007/978-3-319-00648-2.

Yongdong, Xu. Chemical vapour deposition: An integrated engineering design for advanced materials. London: Springer, 2009.

Ahmed, Waqar. Studies in low pressure chemical vapour deposition of polycrystalline silicon. Salford: University of Salford, 1986.

Moene, Robert. Application of chemical vapour deposition in catalyst design: Development of high surface area silicon carbide as catalyst support. The Netherlands: Delft University Press, 1995.

Thin-film deposition: Principles and practice. New York: McGraw-Hill, 1995.

Pritchard, Hywyn. The production of thin tungsten films by low pressure chemical vapour deposition. Salford: University of Salford, 1988.

Sutcliffe, P. J. SIMS surface studies of silicon substrates for low temperature chemical vapour deposition. Manchester: UMIST, 1992.

McLean, Steven. Chemical vapour deposition of titanium carbide on low alloy high speed steel. Birmingham: University of Birmingham, 1987.

European Conference on Chemical Vapour Deposition (8th 1991 Glasgow). Proceedings of the Eighth European Conference on Chemical Vapour Deposition, Glasgow, Scotland, 9-13 September 1991. Courtaboeuf: Journal de Physique, 1991.

Spain) European Conference on Chemical Vapour Deposition (12th 1999 Barcelona. Proceedings of the Twelfth European Conference on Chemical Vapour Deposition, Sitges, Barcelona, Spain, September 5-10, 1999. Les Ulis, France: EDP Sciences, 1999.

Jones, Philip Antony. The application of chemical vapour deposition to the growth of CuInSe2 thin films. Salford: University ofSalford, 1993.

Bates, Robin Ian. Physical vapour deposition of magnesium and titanium onto the internal surface of hemispheres. Salford: University of Salford, 1992.

European, Conference on Chemical Vapour Deposition (7th 1989 Perpignan France). Actes de la 7ème Conférence européenne sur les dépôts chimiques en phase gazeuse: Perpignan, France, 19-23 juin 1989 = Proceedings of the Seventh European Conference on Chemical Vapour Deposition. Les Ulis, France: Editions de physique, 1989.

European Conference on Chemical Vapour Deposition (8th 1991 Glasgow, Scotland). Proceedings of the Eighth European Conference on Chemical Vapour Deposition =: Actes de la 8ème Conférence européenne sur les dépôts chimiques en phase gazeuse, Glasgow, Scotland, 9-13 September 1991. Les Ulis, France: Éditions de physique, 1991.

R, Brozel M., and Chemistry, eds. Characterization of algainp light emitting diodes (leds) grown by metal organic chemical vapour deposition (mocvd). Manchester: UMIST, 1998.

Tilsley, Matthew Edward Glyn. An investigation of magnetic thin films grown by organic chemical vapour deposition for possible magnetoresistive applications. Birmingham: University of Birmingham, 1997.

European Conference on Chemical Vapour Deposition (9th 1993 Tampere, Finland). Proceedings of the ninth European Conference on Chemical Vapour Deposition, Tampere, Finland, 22-27 August 1993. Courtaboeuf: Journal de Physique, 1993.

European, Conference on Chemical Vapour Deposition (13th 2001 Glyfada Athens Greece). Late news: Thirteenth European Conference on Chemical Vapour Deposition : proceedings : EUROCVD Thirteen : Glyfada, Athens, Greece, August 26-31, 2001. Les Ulis, France: EDP Sciences, 2002.

European Conference on Chemical Vapour Deposition (6th 1987 Jerusalem). Proceedings of the Sixth European Conference on Chemical Vapour Deposition, Jerusalem, Israel, 29 March-3 April 1987. Nahariya, Israel: Iscar Ltd., Hardmetal Industrial Products., 1987.

Uppsala, Sweden) European Conference on Chemical Vapour Deposition (5th 1985. Euro CVD five: Proceedings of the Fifth European Conference on Chemical Vapour Deposition, June 17-20, 1985, Uppsala, Sweden. Uppsala, Sweden: Uppsala University, Dept. of Chemistry, 1985.

European Conference on Chemical Vapour Deposition (12th 1999 Sitges, Barcelona, Spain). Late news: Proceedings of the Twelfth European Conference on Chemical Vapour Deposition : Euro CVD Twelve : Sitges, Barcelona, Spain, September 5-10, 1999. Les Ulis: EDP Sciences, 2000.

Priestner, Deborah Mary. An investigation of the chemical vapour deposition of titanium carbide onto pre-carburised low carbon, low alloy steel substrates. Birmingham: University of Birmingham, 1989.

O, Pierson Hugh, ed. Handbook of chemical vapor deposition. 2nd ed. Norwich, NY: Noyes Publications, 1999.

Sivaram, Srinivasan. Chemical Vapor Deposition. Boston, MA: Springer US, 1995. http://dx.doi.org/10.1007/978-1-4757-4751-5.

Photochemical vapor deposition. New York: Wiley, 1992.

Lamberton, R. W. A study of the microstructure and growth of ultra-thin film amorphous hydrogenated carbon (a-C:H) prepared by plasma enhanced chemical vapour deposition (PECVD). [s.l: The Author], 1998.

Fortin, Jeffrey B., and Toh-Ming Lu. Chemical Vapor Deposition Polymerization. Boston, MA: Springer US, 2004. http://dx.doi.org/10.1007/978-1-4757-3901-5.

Moran, Robert. Physical vapor deposition (PVD). Norwalk, Conn., U.S.A: Business Communications Co., 1990.

A, Hopwood Jeffrey, ed. Ionized physical vapor deposition. San Diego: Academic Press, 2000.

Sherman, Arthur. Chemical vapor deposition for microelectronics: Principles, technology, and applications. Park Ridge, N.J., U.S.A: Noyes Publications, 1987.

Gesheva, K. A. Chemical vapor deposition (CVD) technology. Hauppauge, N.Y: Nova Science Publishers, 2008.

Dobkin, Daniel M., and Michael K. Zuraw. Principles of Chemical Vapor Deposition. Dordrecht: Springer Netherlands, 2003. http://dx.doi.org/10.1007/978-94-017-0369-7.

Dobkin, Daniel M. Principles of Chemical Vapor Deposition. Dordrecht: Springer Netherlands, 2003.

Magneto luminous chemical vapor deposition. Boca Raton, FL: Taylor & Francis, 2011.

K, Zuraw Michael, ed. Principles of chemical vapor deposition. Dordrecht: Kluwer Academic Publishers, 2003.

Symposium, on Atomic Layer Deposition Applications (3rd 2007 Washington D. C. ). Atomic layer deposition applications 3. Pennington, NJ: Electrochemical Society, 2007.

Symposium, on Atomic Layer Deposition Applications (2nd 2006 Cancun Mexico). Atomic layer deposition applications 2. Pennington, N.J: Electrochemical Society, 2007.

Symposium on Atomic Layer Deposition Applications (2nd 2006 Cancun, Mexico). Atomic layer deposition applications 2. Edited by Electrochemical Society Meeting and Electrochemical Society. Dielectric Science and Technology Division. Pennington, N.J: Electrochemical Society, 2007.

Symposium on Atomic Layer Deposition Applications (3rd 2007 Washington, D.C.). Atomic layer deposition applications 3. Edited by Londergan A, Electrochemical Society Meeting, and Electrochemical Society. Dielectric Science and Technology Division. Pennington, NJ: Electrochemical Society, 2007.

Symposium on Atomic Layer Deposition Applications (2nd 2006 Cancun, Mexico). Atomic layer deposition applications 2. Edited by Londergan A, Electrochemical Society Meeting, and Electrochemical Society. Dielectric Science and Technology Division. Pennington, N.J: Electrochemical Society, 2007.

Symposium on Atomic Layer Deposition Applications (3rd 2007 Washington, D.C.). Atomic layer deposition applications 3. Edited by Londergan A, Electrochemical Society Meeting, and Electrochemical Society. Dielectric Science and Technology Division. Pennington, NJ: Electrochemical Society, 2007.

Symposium on Atomic Layer Deposition Applications (2nd 2006 Cancun, Mexico). Atomic layer deposition applications 2. Edited by Londergan A, Electrochemical Society Meeting, and Electrochemical Society. Dielectric Science and Technology Division. Pennington, N.J: Electrochemical Society, 2007.

Symposium on Atomic Layer Deposition Applications (3rd 2007 Washington, D.C.). Atomic layer deposition applications 3. Edited by Londergan A, Electrochemical Society Meeting, and Electrochemical Society. Dielectric Science and Technology Division. Pennington, NJ: Electrochemical Society, 2007.

LARSSON. Chemical Vapour Deposition. Institute of Physics Publishing, 2023.