Relevant bibliographies by topics / Vapour deposition

Academic literature on the topic 'Vapour deposition'

Author: Grafiati
Published: 4 June 2021
Last updated: 6 September 2023

Create a spot-on reference in APA, MLA, Chicago, Harvard, and other styles

Select a source type:

Contents

Consult the lists of relevant articles, books, theses, conference reports, and other scholarly sources on the topic 'Vapour deposition.'

Next to every source in the list of references, there is an 'Add to bibliography' button. Press on it, and we will generate automatically the bibliographic reference to the chosen work in the citation style you need: APA, MLA, Harvard, Chicago, Vancouver, etc.

You can also download the full text of the academic publication as pdf and read online its abstract whenever available in the metadata.

Journal articles on the topic "Vapour deposition"

1

Chaudhari, Mandakini N. "Thin film Deposition Methods: A Critical Review." International Journal for Research in Applied Science and Engineering Technology 9, no. VI (June 30, 2021): 5215–32. http://dx.doi.org/10.22214/ijraset.2021.36154.

Full text
Abstract:
The aim of this review paper is to present a critical analysis of existing methods of thin film deposition. Paper discusses some thin film techniques which are advanced and popular. The advantages and disadvantages of each method are mentioned. The two major areas of interest discussed are physical and chemical vapor deposition techniques. In general, thin film is a small thickness that produces by physical vapour deposition (PVD) and chemical vapour deposition (CVD). Despite the PVD technique has a few drawbacks, it remains an important method and more beneficial than CVD technique for depositing thin films materials. It is examined that some remarkable similarities and difference between the specific methods. The sub methods which are having common principle are classified. The number of researchers attempted to explain the how the specific method is important and applicable for the deposition of thin films. In conclusion the most important method of depositing thin films is CVD. For our research work the Spray Pyrolysis technique, which is versatile and found suitable to use.
APA, Harvard, Vancouver, ISO, and other styles
2

BACHMANN, P. K., D. LEERS, and D. U. WIECHERT. "DIAMOND CHEMICAL VAPOUR DEPOSITION." Le Journal de Physique IV 02, no. C2 (September 1991): C2–907—C2–913. http://dx.doi.org/10.1051/jp4:19912109.

Full text
APA, Harvard, Vancouver, ISO, and other styles
3

Boone, D. H. "Physical vapour deposition processes." Materials Science and Technology 2, no. 3 (March 1986): 220–24. http://dx.doi.org/10.1179/mst.1986.2.3.220.

Full text
APA, Harvard, Vancouver, ISO, and other styles
4

Roy, S. K. "Laser chemical vapour deposition." Bulletin of Materials Science 11, no. 2-3 (November 1988): 129–35. http://dx.doi.org/10.1007/bf02744550.

Full text
APA, Harvard, Vancouver, ISO, and other styles
5

Mundra, S. S., S. S. Pardeshi, S. S. Bhavikatti, and Atul Nagras. "Development of an integrated physical vapour deposition and chemical vapour deposition system." Materials Today: Proceedings 46 (2021): 1229–34. http://dx.doi.org/10.1016/j.matpr.2021.02.069.

Full text
APA, Harvard, Vancouver, ISO, and other styles
6

Camejo, M. D., and L. L. Bonilla. "Theory of homogeneous vapour condensation and surface deposition from boundary layers." Journal of Fluid Mechanics 706 (July 6, 2012): 534–59. http://dx.doi.org/10.1017/jfm.2012.278.

Full text
Abstract:
AbstractHomogeneous condensation of vapours mixed with a carrier gas in the stagnation point boundary layer flow near a cold wall is considered. There is a condensation region near the wall with supersaturated vapour. Assuming that the surface tension times the molecular area is much larger than the thermal energy far from the wall, droplets are nucleated exclusively in a narrow nucleation layer where the Zeldovich flux of clusters surpassing the critical nucleus size is at a maximum. The vapour condenses in the free molecular regime on the droplets, which are thermophoretically attracted to the wall. Unlike the narrow condensation region for heterogeneous condensation on solid particles, in the case of homogeneous condensation the condensation region is wide even when the rate of vapour scavenging by droplets is large. A singular perturbation theory of homogeneous vapour condensation in boundary layer flow approximates very well the vapour and droplet density profiles, the nucleation layer and the deposition rates at the wall for wide ranges of the wall temperature and the scavenging parameter $B$. A key point in the theory is to select a trial vapour number density profile among a one parameter family of profiles between an upper and a lower bound. The maximum of the Zeldovich flux for supercritical nuclei provides the approximate location of the nucleation layer and an approximate droplet density profile. Then the condensate number of molecules and the vapour density profile are calculated by matched asymptotic expansions that also yield the deposition rates. For sufficiently large wall temperatures, a more precise corrected asymptotic theory is given.
APA, Harvard, Vancouver, ISO, and other styles
7

Marinkovic, S. N. "Chemical Vapour Deposition of Diamond." Materials Science Forum 214 (May 1996): 171–78. http://dx.doi.org/10.4028/www.scientific.net/msf.214.171.

Full text
APA, Harvard, Vancouver, ISO, and other styles
8

DESAI, P. B., and V. G. DATE. "Physical Vapour Deposition of Beryllium." Mineral Processing and Extractive Metallurgy Review 13, no. 1 (October 1994): 145–55. http://dx.doi.org/10.1080/08827509408914107.

Full text
APA, Harvard, Vancouver, ISO, and other styles
9

Swinbanks, David. "Chemical vapour deposition advances superconducters." Nature 332, no. 6162 (March 1988): 295. http://dx.doi.org/10.1038/332295a0.

Full text
APA, Harvard, Vancouver, ISO, and other styles
10

Choy, K. "Chemical vapour deposition of coatings." Progress in Materials Science 48, no. 2 (2003): 57–170. http://dx.doi.org/10.1016/s0079-6425(01)00009-3.

Full text
APA, Harvard, Vancouver, ISO, and other styles
More sources

Dissertations / Theses on the topic "Vapour deposition"

1

Khanyile, Sfiso Zwelisha. "Deposition of silicon nanostructures by thermal chemical vapour deposition." University of the Western Cape, 2015. http://hdl.handle.net/11394/4445.

Full text
Abstract:
>Magister Scientiae - MSc
In this thesis we report on the deposition of silicon nanostructures using a 3-zone thermal chemical vapour deposition process at atmospheric pressure. Nickel and gold thin films, deposited by DC sputtering on crystalline silicon substrates, were used as the catalyst material required for vapour-solid-liquid growth mechanism of the Si nanostructures. The core of this work is centred around the effect of catalyst type, substrate temperature and the source-to-substrate distance on the structural and optical properties of the resultant Si nanostructures, using argon as the carrier gas and Si powder as the source. The morphology and internal structure of the Si nanostructures was probed by using high resolution scanning and transmission electron microscopy, respectively. The crystallinity was measured by x-ray diffraction and the high resolution transmission electron microscopy. For composition and elemental analysis, Fourier transform infrared spectroscopy was used to quantify the bonding configuration, while electron energy-loss spectroscopy in conjunction with electron dispersion spectroscopy reveals the composition. Photoluminescence and UV-visible spectroscopy was used to extract the emission and reflection properties of the synthesized nanostructures.
APA, Harvard, Vancouver, ISO, and other styles
2

Wood, Thomas James. "Vapour-phase deposition of functional nanolayers." Thesis, Durham University, 2013. http://etheses.dur.ac.uk/6929/.

Full text
Abstract:
Vapour-phase deposition techniques have many advantages including being solventless and providing fine control (down to the nanometre level) of coating thickness. This thesis is about the use of both plasmachemical deposition and oxidative vapour-phase deposition to form functional coatings. Chapter 1 provides brief reviews of proton exchange membrane fuel cells and vapour-phase deposition techniques as well as an overall introduction to the thesis. Chapter 2 is a synopsis of the most commonly used experimental techniques used throughout this thesis (especial attention is focused on XPS and FTIR as they are used in every chapter). Chapters 3–4 record the use of plasmachemical deposition to form proton-conducting coatings for potential use in fuel cells. The strategy described is the use of anhydride precursors in order to produce layers with a high density of carboxylic acids. In chapter 4 these layers themselves are used as initiators to graft sulfonic-acid containing polymer brushes for the enhancement of proton conductivity. Chapter 5 describes the fabrication of poly(ionic liquid) layers by depositing an imidazole-containing precursor via pulsed plasmachemical deposition, which is subsequently quaternized via a vapour-phase reaction with 1-bromobutane. The resultant coatings show high values of ionic conductivity above 90 ◦C. In chapter 6 plasma enhanced chemical vapour deposition of metal(II) hexafluoroacetylacetonate precursors is used in order to produce metal-containing nanocomposite layers. The retention of an organic matrix and its chemical rearrangement under plasma conditions leads to high ionic conductivities. Chapters 7–8 utilize an atomized spray delivery system and plasma in conjunction with liquid precursor mixtures in order to form bioactive coatings (chapter 7) and nanocomposite layers (chapter 8) which show good adhesion and lithium-ion conductivity values. Finally chapter 9 utilizes the atomized spray system to deliver high vapour pressures of 3,4-ethylenedioxythiophene in the presence of triflic anhydride which acts as an oxidant. The ensuing vapour-phase reaction yields a conducting polymer coating.
APA, Harvard, Vancouver, ISO, and other styles
3

Cross, David Henry. "Laser induced chemical vapour deposition of aluminium." Thesis, Heriot-Watt University, 1992. http://hdl.handle.net/10399/815.

Full text
APA, Harvard, Vancouver, ISO, and other styles
4

Sime, Nathan. "Numerical modelling of chemical vapour deposition reactors." Thesis, University of Nottingham, 2016. http://eprints.nottingham.ac.uk/36227/.

Full text
Abstract:
In this thesis we study the chemical reactions and transport phenomena which occur in a microwave power assisted chemical vapour deposition (MPA-CVD) reactor which facilitates diamond growth. First we introduce a model of an underlying binary gas flow and its chemistry for a hydrogen gas mixture. This system is heated by incorporating a microwave frequency electric field, operating in a resonant mode in the CVD chamber. This heating facilitates the dissociation of hydrogen and the generation of a gas discharge plasma, a key component of carbon deposition in industrial diamond manufacture. We then proceed to summarise the discontinuous Galerkin (DG) finite element discretisation of the standard hyperbolic and elliptic partial differential operators which typically occur in conservation laws of continuum models. Additionally, we summarise the non-stabilised discontinuous Galerkin formulation of the time harmonic Maxwell operator. These schemes are then used as the basis for the discretisation method employed for the numerical approximation of the MPA-CVD model equations. The practical implementation of the resulting DG MPA-CVD model is an extremely challenging task, which is prone to human error. Thereby, we introduce a mathematical approach for the symbolic formulation and computation of the underlying finite element method, based on automatic code generation. We extend this idea further such that the DG finite element formulation is automatically computed following the user's specification of the convective and viscous flux terms of the underlying PDE system in this symbolic framework. We then devise a method for writing a library of automatically generated DG finite element formulations for a hierarchy of partial differential equations with automatic treatment of prescribed boundary conditions. This toolbox for automatically computing DG finite element solutions is then applied to the DG MPA-CVD model. In particular, we consider reactor designs inspired by the AIXTRON and LIMHP reactors which are analysed extensively in the literature.
APA, Harvard, Vancouver, ISO, and other styles
5

Smith, James Anthony. "Laser diagnostics of a diamond depositing chemical vapour deposition gas-phase environment." Thesis, University of Bristol, 2002. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.247541.

Full text
APA, Harvard, Vancouver, ISO, and other styles
6

Cummings, Franscious Riccardo. "Hot-wire chemical vapour deposition of carbon Nanotubes." Thesis, University of the Western Cape, 2006. http://etd.uwc.ac.za/index.php?module=etd&action=viewtitle&id=gen8Srv25Nme4_3108_1205242611.

Full text
Abstract:

In this study we report on the effect of the deposition parameters on the morphology and structural properties of CNTs, synthesized by means of the hot-wire chemical vapour deposition technique. SEM, Raman and XRD results show that the optimum deposition conditions for the HWCVD synthesis of aligned MWCNTs, with diameters between 50 and 150 nm and lengths in the micrometer range are: Furnace temperature of 500 º
C, deposition pressure between 150 and 200 Torr, methane/hydrogen dilution of 0.67 and a substrateto- filament distance of 10 cm.

APA, Harvard, Vancouver, ISO, and other styles
7

Cheng, Timothy Qiang. "Surface science studies of organometallic chemical vapour deposition." Thesis, National Library of Canada = Bibliothèque nationale du Canada, 1997. http://www.collectionscanada.ca/obj/s4/f2/dsk2/tape16/PQDD_0016/NQ28479.pdf.

Full text
APA, Harvard, Vancouver, ISO, and other styles
8

Binions, Russell. "Chemical vapour deposition of metal oxides and phosphides." Thesis, University College London (University of London), 2006. http://discovery.ucl.ac.uk/1444547/.

Full text
Abstract:
This thesis investigates the deposition of thin films of main group metal phosphide and main group metal oxide compounds on glass substrates by the use of dual source atmospheric pressure chemical vapour deposition. Binary phosphide systems with tin, germanium, silicon, antimony, copper or boron have been examined. Binary oxide systems of gallium, antimony, tin or niobium have also been investigated. Additionally these systems were deposited on gas sensor substrates and evaluated as metal oxide semiconductor gas sensors. Halides were used as the metal precursor, RXPH3.X (R = Cychex or Phenyl) were used as phosphorous precursors and either methanol or ethyl acetate were used as oxygen precursors. These coatings showed good uniformity and coverage and the films were adherent passing the Scotch tape test. The tin phosphide films were opaque in appearance with some signs of birefringence due to differential thickness effects. Germanium phosphide and the gallium, antimony, niobium and tin oxide systems were all transparent, once again birefringence was observed. The films produced from the antimony phosphide and silicon phosphide systems were opaque, grey and metallic. Additional work was conducted on the deposition on a variety of alkali metal and alkaline earth metal fluorides on glass substrates using aerosol assisted chemical vapour deposition. In all cases the films were very powdery and were easily wiped off of the substrate. A number of depositions were carried out combining the aerosol and atmospheric pressure methodologies. A tin oxide film was produced from the atmospheric pressure chemical vapour deposition reaction of tin tetrachloride and ethyl acetate. The film contained tungsten, which was introduced into the reaction using a polyoxometalate delivered via aerosol assisted chemical vapour deposition. Films were analysed using Raman microscopy, X-ray diffraction, scanning electron microscopy, energy dispersive analysis of X-rays, electron probe microanalysis, X-ray photoelectron spectroscopy and ultra violet and visible spectroscopy.
APA, Harvard, Vancouver, ISO, and other styles
9

Sein, Htet. "Chemical vapour deposition of diamond onto dental burs." Thesis, Manchester Metropolitan University, 2012. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.555137.

Full text
Abstract:
Chemical vapour deposition (CVD) onto flat substrates has been researched extensively; however, little work has been on done on diamond deposition onto 3-D substrates. Diamond has excellent physical and chemical properties and has considerable potential for use in dental tools and biomedical implants. Since the 1950s sintered diamond burs have been used and are made using diamond particles bonded onto the substrate using a binder matrix material. The binder contains potentially poisonous components such as nickel and CVD technology eliminates the use of such binder materials. Hot Filament Chemical Vapour Deposition (HFCVD) uses a horizontal filament mounted above the substrate. For 3-D substrates the system was modified with the filament mounted vertically and the substrate held concentrically within the coil in a system called vertical filament CVD (VFCVD). Process optimisation was conducted on molybdenum wire and then diamond films were deposited onto metals such as titanium, molybdenum and tungsten carbide (WC-Co) burs. A pre-treatment was required on WC-Co burs using Murakami reagent was used for etching followed by acid etching to remove excess Co from the surface and improve adhesion. The growth rate, adhesion, surface roughness, composition and nucleation densities were all investigated. The substrate temperature influenced the compressive stress of the diamond films due to the thermal gradient, which is related to the position of the substrate within the filament. Machining tests showed that the wear rates of the coated diamond tools were considerably lower than the uncoated burs. These were quantified using a Figure of 5 Merit (F) which was then plotted against the number of holes drilled for uncoated, sintered and VFCVD diamond coated burs to assess the tool performances on human tooth material, acrylic and borosilicate glass. All of the tests showed that the diamond coated dental burs using the new VFCVD process demonstrated a superior performance compared to sintered and uncoated burs.
APA, Harvard, Vancouver, ISO, and other styles
10

Chubarov, Mikhail. "Chemical Vapour Deposition of sp2 Hybridised Boron Nitride." Doctoral thesis, Linköpings universitet, Tunnfilmsfysik, 2014. http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-112580.

Full text
Abstract:
The aim of this work was to develop a chemical vapour deposition process and understand the growth of sp2 hybridised Boron Nitride (sp2-BN). Thus, the growth on different substrates together with the variation of growth parameters was investigated in details and is presented in the papers included in this thesis. Deposited films of sp2-BN were characterised with the purpose to determine optimal deposition process parameters for the growth of high crystal quality thin films with further investigations of chemical composition, morphology and other properties important for the implementation of this material towards electronic, optoelectronic devices and devices based on graphene/BN heterostructures. For the growth of sp2-BN triethyl boron and ammonia were employed as B and N precursors, respectively. Pure H2 as carrier gas is found to be necessary for the growth of crystalline sp2-BN. Addition of small amount of silane to the gas mixture improves the crystalline quality of the growing sp2-BN film. It was observed that for the growth of crystalline sp2-BN on c-axis oriented α-Al2O3 a thin and strained AlN buffer layer is needed to support epitaxial growth of sp2-BN, while it was possible to deposit rhombohedral BN (r-BN) on various polytypes of SiC without the need for a buffer layer. The growth temperature suitable for the growth of  crystalline sp2-BN is 1500 °C. Nevertheless, the growth of crystalline sp2-BN was also observed on α-Al2O3 with an AlN buffer layer at a lower temperature of 1200 °C. Growth at this low temperature was found to be hardly controllable due to the low amount of Si that is necessary at this temperature and its accumulation in the reaction cell. When SiC was used as a substrate at the growth temperature of 1200 °C, no crystalline sp2-BN was formed, according to X-ray diffraction. Crystalline structure investigations of the deposited films showed formation of twinned r-BN on both substrates used. Additionally, it was found that the growth on α-Al2O3 with an AlN buffer layer starts with the formation of hexagonal BN (h-BN) for a thickness of around 4 nm. The formation of h-BN was observed at growth temperatures of 1200 °C and 1500 °C on α-Al2O3 with AlN buffer layer while there were no traces of h-BN found in the films deposited on SiC substrates in the temperature range between 1200 °C and 1700 °C. As an explanation for such growth behaviour, reproduction of the substrate crystal stacking is suggested.  Nucleation and growth mechanism are investigated and presented in the papers included in this thesis.
APA, Harvard, Vancouver, ISO, and other styles
More sources

Books on the topic "Vapour deposition"

1

Jones, Anthony C., and Michael L. Hitchman, eds. Chemical Vapour Deposition. Cambridge: Royal Society of Chemistry, 2008. http://dx.doi.org/10.1039/9781847558794.

Full text
APA, Harvard, Vancouver, ISO, and other styles
2

Xu, Yongdong, and Xiu-Tian Yan. Chemical Vapour Deposition. London: Springer London, 2010. http://dx.doi.org/10.1007/978-1-84882-894-0.

Full text
APA, Harvard, Vancouver, ISO, and other styles
3

Carlsson, Jan-Otto. Progress in chemical vapour deposition. Oxford: Pergamon, 1994.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
4

Wilson, M. I. Chemical vapour deposition onto porous materials. Manchester: UMIST, 1993.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
5

Moroșanu, C. E. Thin films by chemical vapour deposition. Amsterdam: Elsevier, 1990.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
6

C, Jones Anthony, and Hitchman Michael L, eds. Chemical vapour deposition: Precursors, processes and applications. Cambridge, UK: Royal Society of Chemistry, 2009.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
7

Ahmed, Waqar, Htet Sein, Mark J. Jackson, Christopher Rego, David A. Phoenix, Abdelbary Elhissi, and St John Crean. Chemical Vapour Deposition of Diamond for Dental Tools and Burs. Cham: Springer International Publishing, 2014. http://dx.doi.org/10.1007/978-3-319-00648-2.

Full text
APA, Harvard, Vancouver, ISO, and other styles
8

Yongdong, Xu. Chemical vapour deposition: An integrated engineering design for advanced materials. London: Springer, 2009.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
9

Ahmed, Waqar. Studies in low pressure chemical vapour deposition of polycrystalline silicon. Salford: University of Salford, 1986.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
10

Moene, Robert. Application of chemical vapour deposition in catalyst design: Development of high surface area silicon carbide as catalyst support. The Netherlands: Delft University Press, 1995.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
More sources

Book chapters on the topic "Vapour deposition"

1

Angus, John C., Alberto Argoitia, Roy Gat, Zhidan Li, Mahendra Sunkara, Long Wang, and Yaxin Wang. "Chemical vapour deposition of diamond." In Thin Film Diamond, 1–14. Dordrecht: Springer Netherlands, 1994. http://dx.doi.org/10.1007/978-94-011-0725-9_1.

Full text
APA, Harvard, Vancouver, ISO, and other styles
2

Fancey, K. S., and A. Matthews. "Plasma-assisted physical vapour deposition." In Advanced Surface Coatings: a Handbook of Surface Engineering, 127–61. Dordrecht: Springer Netherlands, 1991. http://dx.doi.org/10.1007/978-94-011-3040-0_6.

Full text
APA, Harvard, Vancouver, ISO, and other styles
3

Carlsson, J. O. "Thermally activated chemical vapour deposition." In Advanced Surface Coatings: a Handbook of Surface Engineering, 162–93. Dordrecht: Springer Netherlands, 1991. http://dx.doi.org/10.1007/978-94-011-3040-0_7.

Full text
APA, Harvard, Vancouver, ISO, and other styles
4

Rickerby, D. S. "Plasma-assisted chemical vapour deposition." In Advanced Surface Coatings: a Handbook of Surface Engineering, 194–216. Dordrecht: Springer Netherlands, 1991. http://dx.doi.org/10.1007/978-94-011-3040-0_8.

Full text
APA, Harvard, Vancouver, ISO, and other styles
5

Tillmann, Wolfgang, Evelina Vogli, and Jan Nebel. "Deposition of Multi-Functional Coatings by Physical Vapour Deposition." In THERMEC 2006, 1194–99. Stafa: Trans Tech Publications Ltd., 2007. http://dx.doi.org/10.4028/0-87849-428-6.1194.

Full text
APA, Harvard, Vancouver, ISO, and other styles
6

Irvine, S. J. C. "Photochemical Vapour Deposition of Thin Films." In Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies, 199–222. Dordrecht: Springer Netherlands, 2002. http://dx.doi.org/10.1007/978-94-010-0353-7_9.

Full text
APA, Harvard, Vancouver, ISO, and other styles
7

Adesina, Akeem Yusuf, and Nasirudeen Ogunlakin. "Physical and Chemical Vapour Deposition Coatings." In Advances in Corrosion Control of Magnesium and its Alloys, 305–24. Boca Raton: CRC Press, 2023. http://dx.doi.org/10.1201/9781003319856-21.

Full text
APA, Harvard, Vancouver, ISO, and other styles
8

Hwang, Nong Moon. "Thermodynamics of Physical and Chemical Vapour Deposition." In Non-Classical Crystallization of Thin Films and Nanostructures in CVD and PVD Processes, 21–50. Dordrecht: Springer Netherlands, 2016. http://dx.doi.org/10.1007/978-94-017-7616-5_2.

Full text
APA, Harvard, Vancouver, ISO, and other styles
9

Ahmed, Waqar, Htet Sein, Mark J. Jackson, Christopher Rego, David A. Phoenix, Abdelbary Elhissi, and St John Crean. "Diamond Deposition onto Flat Substrates." In Chemical Vapour Deposition of Diamond for Dental Tools and Burs, 73–81. Cham: Springer International Publishing, 2014. http://dx.doi.org/10.1007/978-3-319-00648-2_4.

Full text
APA, Harvard, Vancouver, ISO, and other styles
10

Conde, O., A. J. Silvestre, and M. L. Paramés. "Laser Chemical Vapour Deposition of Titanium-Based Hard Coatings." In Laser Processing: Surface Treatment and Film Deposition, 665–91. Dordrecht: Springer Netherlands, 1996. http://dx.doi.org/10.1007/978-94-009-0197-1_34.

Full text
APA, Harvard, Vancouver, ISO, and other styles

Conference papers on the topic "Vapour deposition"

1

Angenieux, Jacques P. L. "Aspherics By Vapour Deposition : Recent Developments." In Recent Developments in Infrared Components and Subsystems, edited by Charles T. Elliott. SPIE, 1988. http://dx.doi.org/10.1117/12.945542.

Full text
APA, Harvard, Vancouver, ISO, and other styles
2

Bennett, R. H., J. Simpson, and K. L. Lewis. "Radical Activated Chemical Vapour Deposition of Oxides." In Optical Interference Coatings. Washington, D.C.: Optica Publishing Group, 1997. http://dx.doi.org/10.1364/oic.1998.mb.3.

Full text
Abstract:
Traditional chemical vapour deposition processes, as widely used in the semiconductor industry, involve the introduction of a vapour phase organometallic precursor material to the reaction chamber, where decomposition of the vapour to form a solid film is triggered by heating the substrate. CVD methods for fabrication of optical thin film devices are becoming increasingly popular and there is a continuing drive towards plasma based CVD systems which promote deposition at lower substrate temperatures, allowing film growth on less temperature tolerant substrates.
APA, Harvard, Vancouver, ISO, and other styles
3

Barry, S. T., M. B. E. Griffiths, D. J. Mandia, J. P. Coyle, P. G. Gordon, W. Zhou, L. Shao, and J. Albert. "Chemical Vapour Deposition and Atomic Layer Deposition: Metals for Optical Fibres." In Workshop on Specialty Optical Fibers and their Applications. Washington, D.C.: OSA, 2013. http://dx.doi.org/10.1364/wsof.2013.w4.3.

Full text
APA, Harvard, Vancouver, ISO, and other styles
4

Netterfield, R. P., and Ian Llewellyn. "Narrow-Band Notch Filters produced by Plasma Impulse Chemical Vapour Deposition." In Optical Interference Coatings. Washington, D.C.: Optica Publishing Group, 1997. http://dx.doi.org/10.1364/oic.1998.mb.4.

Full text
Abstract:
There have been several publications in recent years on the use of Plasma Impulse Chemical Vapour Deposition (PICVD) as a means of depositing optical multilayer coatings under computer control [1-4]. We report on the use of the technique in the deposition of notch filters consisting of up to 200 alternating layers of SiO2 and SiOxNy.
APA, Harvard, Vancouver, ISO, and other styles
5

Malik, Mohammad, Javeed Akhtar, Jocelyn Bruce, Klaus Koch, Mohammad afzaal, and Paul o'Brien. "Deposition of Phosphorus Free PbSe Thin film by Aerosol Assisted Chemical Vapour Deposition." In 2008 MRS Fall Meetin. Materials Research Society, 2008. http://dx.doi.org/10.1557/proc-1148-pp12-08.

Full text
APA, Harvard, Vancouver, ISO, and other styles
6

Sainty, Wayne G., William D. McFall, and David R. McKenzie. "Aspects of Plasma Assisted Chemical Vapour Deposition for Deposition of Graded Index Multilayers." In Optical Interference Coatings. Washington, D.C.: Optica Publishing Group, 1997. http://dx.doi.org/10.1364/oic.1998.mb.5.

Full text
APA, Harvard, Vancouver, ISO, and other styles
7

Karuppannan, Ramesh, and M. Prashantha. "Nano structured carbon nitrides prepared by chemical vapour deposition." In SPIE NanoScience + Engineering, edited by Didier Pribat, Young-Hee Lee, and Manijeh Razeghi. SPIE, 2010. http://dx.doi.org/10.1117/12.861609.

Full text
APA, Harvard, Vancouver, ISO, and other styles
8

Gailevicius, Darius, Lina Grineviciute, Ceren Babayigit, Emre Bor, Mirbek Turduev, Vytautas Purlys, Tomas Tolenis, Hamza Kurt, and Kestutis Staliunas. "Photonic Crystal Spatial Filters Fabricated by Physical Vapour Deposition." In 2019 Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC). IEEE, 2019. http://dx.doi.org/10.1109/cleoe-eqec.2019.8872820.

Full text
APA, Harvard, Vancouver, ISO, and other styles
9

Schneider, Kerstin, Boris Stamm, Katja Gutohrlein, Monika Fleischer, Claus Burkhardt, Alfred Stett, and Dieter P. Kern. "Carbon nanotubes grown on polyimide by chemical vapour deposition." In 2012 IEEE 12th International Conference on Nanotechnology (IEEE-NANO). IEEE, 2012. http://dx.doi.org/10.1109/nano.2012.6321986.

Full text
APA, Harvard, Vancouver, ISO, and other styles
10

KOUSAL, Jaroslav, Zdeněk KRTOUŠ, Pavel SOLAŘ, Ivo KŘIVKA, and Ivan KRAKOVSKÝ. "Plasma-Assisted Vapour Thermal Deposition with Continuous Material Feed." In NANOCON 2022. TANGER Ltd., 2022. http://dx.doi.org/10.37904/nanocon.2022.4579.

Full text
APA, Harvard, Vancouver, ISO, and other styles

Reports on the topic "Vapour deposition"

1

Saunders, A., and A. Vecht. The preparation of thin films for photovoltaic conversion by novel MOCVD (metallorganic chemical vapour deposition) techniques: Annual subcontract report, 15 February 1985-15 April 1986. Office of Scientific and Technical Information (OSTI), October 1986. http://dx.doi.org/10.2172/6959200.

Full text
APA, Harvard, Vancouver, ISO, and other styles
2

Baron, B. N., R. E. Rocheleau, and S. S. Hegedus. Chemical vapor deposition and photochemical vapor deposition of amorphous silicon photovoltaic devices. Office of Scientific and Technical Information (OSTI), November 1989. http://dx.doi.org/10.2172/5042415.

Full text
APA, Harvard, Vancouver, ISO, and other styles
3

Meier, T. C. ,. LLNL. Rapid tooling by electron-beam vapor deposition. Office of Scientific and Technical Information (OSTI), February 1998. http://dx.doi.org/10.2172/301207.

Full text
APA, Harvard, Vancouver, ISO, and other styles
4

Corderman, R., J. Dobbs, and P. Dupree. Electron beam physical vapor deposition through tungsten. Office of Scientific and Technical Information (OSTI), October 1997. http://dx.doi.org/10.2172/615635.

Full text
APA, Harvard, Vancouver, ISO, and other styles
5

Johnson, Mark, and Paul Cote. Physical Vapor Deposition Simulations of Microstructure Evolution. Fort Belvoir, VA: Defense Technical Information Center, April 2004. http://dx.doi.org/10.21236/ada597929.

Full text
APA, Harvard, Vancouver, ISO, and other styles
6

Mayer, T. M., D. P. Adams, B. S. Swartzentruber, and E. Chason. Dynamics of nucleation in chemical vapor deposition. Office of Scientific and Technical Information (OSTI), November 1995. http://dx.doi.org/10.2172/170570.

Full text
APA, Harvard, Vancouver, ISO, and other styles
7

Rice, Anthony, and Mary Crawford. Chemical Vapor Deposition of Cubic Boron Nitride. Office of Scientific and Technical Information (OSTI), September 2021. http://dx.doi.org/10.2172/1821316.

Full text
APA, Harvard, Vancouver, ISO, and other styles
8

Author, Not Given. Electron Beam Physical Vapor Deposition Coating Parameter Study. Office of Scientific and Technical Information (OSTI), November 2000. http://dx.doi.org/10.2172/790268.

Full text
APA, Harvard, Vancouver, ISO, and other styles
9

Groves, J. F., G. Mattausch, H. Morgner, D. D. Hass, and H. N. Wadley. Directed Vapor Deposition: Low Vacuum Materials Processing Technology. Fort Belvoir, VA: Defense Technical Information Center, January 2000. http://dx.doi.org/10.21236/ada454379.

Full text
APA, Harvard, Vancouver, ISO, and other styles
10

Roman, Audrey Rae, Xinxin Zhao, Evelyn M. Bond, Matthew Edgell Gooden, Robert S. Rundberg, and Todd Allen Bredeweg. 2017 Report for New LANL Physical Vapor Deposition Capability. Office of Scientific and Technical Information (OSTI), October 2017. http://dx.doi.org/10.2172/1396164.

Full text
APA, Harvard, Vancouver, ISO, and other styles
You might also be interested in the extended bibliographies on the topic 'Vapour deposition' for particular source types:
Journal articles Dissertations / Theses Books
We offer discounts on all premium plans for authors whose works are included in thematic literature selections. Contact us to get a unique promo code!

To the bibliography