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Journal articles on the topic 'Ultra high vacuum'

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Author: Grafiati

Published: 4 June 2021

Last updated: 25 May 2024

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1

KAMOHARA, Hideaki, Yuuichi ISHIKAWA, and Shinjiroo UEDA. "Ultra High Vacuum Technology." Journal of the Society of Mechanical Engineers 88, no. 799 (1985): 609–15. http://dx.doi.org/10.1299/jsmemag.88.799_609.

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2

Armour, D. G. "Ultra-high Vacuum Practice." Physics Bulletin 38, no. 2 (February 1987): 71. http://dx.doi.org/10.1088/0031-9112/38/2/030.

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3

Xiaotian, Yang, Meng Jun, Zhang Junhui, Zhang Xiping, Hu Zhenjun, Hou Shengjun, Zhang Xinjun, Hao Bingan, and Wu Huimin. "CSRm Ultra-High Vacuum System." Plasma Science and Technology 7, no. 5 (October 2005): 3021–24. http://dx.doi.org/10.1088/1009-0630/7/5/010.

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4

Kerger, P., D. Vogel, and M. Rohwerder. "Electrochemistry in ultra-high vacuum: The fully transferrable ultra-high vacuum compatible electrochemical cell." Review of Scientific Instruments 89, no. 11 (November 2018): 113102. http://dx.doi.org/10.1063/1.5046389.

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5

TAKAGI, Shoji. "Vacuum technology lecture. For ultra-high vacuum experiments. 8. Materials (1) 1. Metallic materials for ultra-high vacuum." SHINKU 31, no. 6 (1988): 644–49. http://dx.doi.org/10.3131/jvsj.31.644.

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6

Agåker, Marcus, Carl-Johan Englund, Peter Sjöblom, Nial Wassdahl, Pierre Fredriksson, and Conny Såthe. "An ultra-high-stability four-axis ultra-high-vacuum sample manipulator." Journal of Synchrotron Radiation 28, no. 4 (June 8, 2021): 1059–68. http://dx.doi.org/10.1107/s1600577521004859.

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A report on a four-axis ultra-high-stability manipulator developed for use at the Veritas and Species RIXS beamlines at MAX IV Laboratory, Lund, Sweden, is presented. The manipulator consists of a compact, light-weight X–Y table with a stiffened Z tower carrying a platform with a rotary seal to which a manipulator rod holding the sample can be attached. Its design parameters have been optimized to achieve high eigen-frequencies via a light-weight yet stiff construction, to absorb forces without deformations, provide a low center of gravity, and have a compact footprint without compromising access to the manipulator rod. The manipulator system can house a multitude of different, easily exchangeable, manipulator rods that can be tailor-made for specific experimental requirements without having to rebuild the entire sample positioning system. It is shown that the manipulator has its lowest eigen-frequency at 48.5 Hz and that long-term stability is in the few tens of nanometres. Position accuracy is shown to be better than 100 nm. Angular accuracy is in the 500 nrad range with a long-term stability of a few hundred nanoradians.

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7

OHMAE, Nobuo. "Lubrication System in Ultra-high Vacuum." Tetsu-to-Hagane 73, no. 10 (1987): 1297–302. http://dx.doi.org/10.2355/tetsutohagane1955.73.10_1297.

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8

NAKAGAWA, Jun. "Maintenance of Ultra-High Vacuum Instruments." Vacuum and Surface Science 61, no. 8 (August 10, 2018): 528–32. http://dx.doi.org/10.1380/vss.61.528.

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9

Neubauer, A., J. Bœuf, A. Bauer, B. Russ, H. v. Löhneysen, and C. Pfleiderer. "Ultra-high vacuum compatible image furnace." Review of Scientific Instruments 82, no. 1 (January 2011): 013902. http://dx.doi.org/10.1063/1.3523056.

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10

MIYAZAKI, Eizo. "Ultra-High Vacuum in Chemistry : Chemisorption." Journal of the Society of Mechanical Engineers 92, no. 848 (1989): 609–13. http://dx.doi.org/10.1299/jsmemag.92.848_609.

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11

Abiko, Kenji, and Seiichi Takaki. "Ultra-purification of iron by ultra-high vacuum melting." Vacuum 53, no. 1-2 (May 1999): 93–96. http://dx.doi.org/10.1016/s0042-207x(98)00399-6.

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12

MIZUNO, Hazime. "Lecture on vacuum technology. For ultra high vacuum technology. 18. Practice of vacuum exhaust and flange. 2. Exhaust in ultra high vacuum system." SHINKU 32, no. 8 (1989): 669–72. http://dx.doi.org/10.3131/jvsj.32.669.

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13

Kohn, Rudolph N., Sean P. Krzyzewski, Brian L. Kasch, and Matthew B. Squires. "Compact, ultra-high vacuum compatible, high power density conductive heaters." AIP Advances 13, no. 4 (April 1, 2023): 045112. http://dx.doi.org/10.1063/5.0121233.

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We present a design and evaluation of a simple and easy-to-fabricate conductive heater intended for ultra-high vacuum experiments. We demonstrate a compact and power-dense heater that has minimal outgassing up to nearly 200 °C. We further detail a method for using the heater in air to heat an object in vacuum by partially replacing a glass vacuum chamber wall with silicon, avoiding some possible outgassing issues. This method has successfully loaded a 2D magneto-optical trap feeding a 3D magneto-optical trap in rubidium 87.

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14

Rice, Trisha, and Ralph Knowles. "Ultra High Resolution SEM on Insulators and Contaminating Samples." Microscopy Today 13, no. 3 (May 2005): 40–43. http://dx.doi.org/10.1017/s1551929500051634.

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Historically, SEM developed as a high vacuum technique requiring sample chamber vacuum of 10-5 Torr or better. Energetic electrons scatter from any molecules they encounter, so their creation and transport from source to sample, through the focusing lenses of the electron column, requires high vacuum. This imposes a number of limitations on the kinds of samples that can be examined. Samples must tolerate the vacuum environment and the vacuum system must tolerate the sample. Generally, samples have to be solid, clean, dry, and not contain volatile components. Furthermore, since the vacuum insulates the sample from everything except the stub that supports it, non-conductive samples require a conductive pathway between the scanned region and ground to prevent the accumulation of charge deposited by the beam electrons.

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15

Ponce, F. A., S. Suzuki, H. Kobayashi, Y. Ishibashi, Y. Ishida, and T. Eto. "Ultra-high-vacuum, high-resolution Transmission Electron Microscopy at 400 kV." Proceedings, annual meeting, Electron Microscopy Society of America 44 (August 1986): 606–9. http://dx.doi.org/10.1017/s0424820100144498.

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Electron microscopy in an ultra high vacuum (UHV) environment is a very desirable capability for the study of surfaces and for near-atomic-resolution imaging. The existence of amorphous layers on the surface of the sample generally prevents the direct observation of the free surface structure and limits the degree of resolution in the transmission electron microscope (TEM). In conventional TEM, these amorphous layers are often of organic nature originating from the electron bombardment of hydrocarbons in the vicinity of the sample. They can in part also be contaminants which develop during the specimen preparation and transport stages. In the specimen preparation stage, contamination can occur due to backsputtering during the ion milling process. In addition, oxide layers develop from contact to air during transport to the TEM. In order to avoid these amorphous overlayers it is necessary: i) to improve the vacuum of the instrument, thus the need for ultra high vacuum; and ii) to be able to clean the sample and transfer it to the column of the instrument without breaking the vacuum around the sample.

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16

KUSUNOKI, Isao, Junichi MURAKAMI, Yoshiyuki TERUI, Takashi KOBAYASHI, and Hideo DOMEKI. "A stepping motor for ultra high vacuum." SHINKU 30, no. 7 (1987): 619–23. http://dx.doi.org/10.3131/jvsj.30.619.

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17

Skotheira, T. A., M. I. Florit, A. Melo, and W. E. O'grady. "Ultra High Vacuum Electrochemistry with Conducting Polymers." Molecular Crystals and Liquid Crystals 121, no. 1-4 (March 1985): 291–95. http://dx.doi.org/10.1080/00268948508074877.

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18

KUROKOUCHI, Satoshi. "Vital Concept for Ultra-high vacuum Tubing." Journal of the Society of Mechanical Engineers 110, no. 1066 (2007): 668–69. http://dx.doi.org/10.1299/jsmemag.110.1066_668.

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19

Bazanov, A. M., A. V. Butenko, A. R. Galimov, A. K. Lugovnin, and A. V. Smirnov. "Ultra-high vacuum in superconducting accelerator rings." Physics of Particles and Nuclei Letters 13, no. 7 (December 2016): 937–41. http://dx.doi.org/10.1134/s1547477116070098.

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20

Jain, I. P., Y. K. Vijay, L. K. Malhotra, Ashok Verma, and R. Chandra. "Ultra high vacuum electron spectrometer for ‘DSCEMS’." Hyperfine Interactions 35, no. 1-4 (April 1987): 1045–48. http://dx.doi.org/10.1007/bf02394546.

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21

Sonoda, Yasuyuki, Goro Mizutani, Haruyuki Sano, Sukekatsu Ushioda, Takao Sekiya, and Susumu Kurita. "Ultra-High Vacuum Optical Second Harmonic Microscope." Japanese Journal of Applied Physics 39, Part 2, No. 3A/B (March 15, 2000): L253—L255. http://dx.doi.org/10.1143/jjap.39.l253.

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22

Dalla Bella, Luigi. "Energy Saving in Ultra High Vacuum Systems." Vakuum in Forschung und Praxis 23, no. 5 (October 2011): 14–16. http://dx.doi.org/10.1002/vipr.201100463.

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23

Bagge, L., H. Danared, K. Ehrnstén, CJ Herrlander, J. Hilke, A. Nilsson, and K.-G. Rensfelt. "The ultra high vacuum system of Cryring." Vacuum 44, no. 5-7 (May 1993): 497–99. http://dx.doi.org/10.1016/0042-207x(93)90081-k.

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24

Lee, Woo-Kyung, Minchul Yang, Arnaldo R. Laracuente, William P. King, Lloyd J. Whitman, and Paul E. Sheehan. "Direct-write polymer nanolithography in ultra-high vacuum." Beilstein Journal of Nanotechnology 3 (January 19, 2012): 52–56. http://dx.doi.org/10.3762/bjnano.3.6.

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Polymer nanostructures were directly written onto substrates in ultra-high vacuum. The polymer ink was coated onto atomic force microscope (AFM) probes that could be heated to control the ink viscosity. Then, the ink-coated probes were placed into an ultra-high vacuum (UHV) AFM and used to write polymer nanostructures on surfaces, including surfaces cleaned in UHV. Controlling the writing speed of the tip enabled the control over the number of monolayers of the polymer ink deposited on the surface from a single to tens of monolayers, with higher writing speeds generating thinner polymer nanostructures. Deposition onto silicon oxide-terminated substrates led to polymer chains standing upright on the surface, whereas deposition onto vacuum reconstructed silicon yielded polymer chains aligned along the surface.

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25

Sander, Tim, Yi Liu, Tuan Anh Pham, Maximilian Ammon, Mirunalini Devarajulu, and Sabine Maier. "Ultra-high vacuum cleaver for the preparation of ionic crystal surfaces." Review of Scientific Instruments 93, no. 5 (May 1, 2022): 053703. http://dx.doi.org/10.1063/5.0088802.

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Cleaving single crystals in situ under ultra-high vacuum conditions provides a reliable and straightforward approach to prepare clean and atomically well-defined surfaces. Here, we present a versatile sample cleaver to efficiently prepare ionic crystal surfaces under ultra-high vacuum conditions, which is suitable for preparation of softer materials, such as alkali halides, and harder materials, such as metal oxides. One of the advantages of the presented cleaver design is that the cleaving blade and anvil to support the crystal are incorporated into the device. Therefore, no particularly strong mechanical manipulator is needed, and it is compatible with existing vacuum chambers equipped with an xyz-manipulator. We demonstrate atomically flat terraces and the atomic structure of NaCl(001), KBr(001), NiO(001), and MgO(001) cleavage planes prepared in situ under ultra-high vacuum conditions and imaged by low-temperature non-contact atomic force microscopy.

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26

Betti, Maria Grazia, Elena Blundo, Marta De Luca, Marco Felici, Riccardo Frisenda, Yoshikazu Ito, Samuel Jeong, et al. "Homogeneous Spatial Distribution of Deuterium Chemisorbed on Free-Standing Graphene." Nanomaterials 12, no. 15 (July 29, 2022): 2613. http://dx.doi.org/10.3390/nano12152613.

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Atomic deuterium (D) adsorption on free-standing nanoporous graphene obtained by ultra-high vacuum D2 molecular cracking reveals a homogeneous distribution all over the nanoporous graphene sample, as deduced by ultra-high vacuum Raman spectroscopy combined with core-level photoemission spectroscopy. Raman microscopy unveils the presence of bonding distortion, from the signal associated to the planar sp2 configuration of graphene toward the sp3 tetrahedral structure of graphane. The establishment of D–C sp3 hybrid bonds is also clearly determined by high-resolution X-ray photoelectron spectroscopy and spatially correlated to the Auger spectroscopy signal. This work shows that the low-energy molecular cracking of D2 in an ultra-high vacuum is an efficient strategy for obtaining high-quality semiconducting graphane with homogeneous uptake of deuterium atoms, as confirmed by this combined optical and electronic spectro-microscopy study wholly carried out in ultra-high vacuum conditions.

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27

Seangsri, Soontaree, Thanasak Wanglomklang, Nopparut Khaewnak, Nattawat Yachum, and Jiraphon Srisertpol. "Optimizing Ultra-High Vacuum Control in Electron Storage Rings Using Fuzzy Control and Estimation of Pumping Speed by Neural Networks with Molflow+." Systems 11, no. 3 (February 23, 2023): 116. http://dx.doi.org/10.3390/systems11030116.

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This paper presents the design of a fuzzy-controller-based ultra-high vacuum pressure control system and its performance evaluation for a sputter-ion vacuum pump used in the electron storage ring at the Synchrotron Light Research Institute (Public Organization) in Thailand. The production of synchrotron light requires advanced vacuum technology to maintain stability and prevent interference of electrons in an ultra-high vacuum pressure environment of about 10−9 Torr. The presence of heat and gas rupture from the pipe wall can affect the quality of the light in that area. The institute currently uses a sputter-ion vacuum pump which is costly and requires significant effort to quickly reduce pressure increases in the area. Maintaining stable vacuum pressure throughout electron motion is essential in order to ensure the quality of the light. This research demonstrates a procedure for evaluating the performance of a sputter-ion vacuum pump using a mathematical model generated by a neural network and Molflow+ software. The model is used to estimate the pumping speed of the vacuum pump and to design a fuzzy control system for the ultra-high vacuum system. The study also includes a leakage rate check for the vacuum system.

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28

WANG, Hong, Hai-Ming ZHANG, and Li-Feng CHI. "Surface Assisted Reaction under Ultra High Vacuum Conditions." Acta Physico-Chimica Sinica 32, no. 1 (2016): 154–70. http://dx.doi.org/10.3866/pku.whxb201512041.

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29

OKADA, Norio. "CaF2 window developed for ultra-high vacuum system." Journal of the Spectroscopical Society of Japan 36, no. 5 (1987): 341–42. http://dx.doi.org/10.5111/bunkou.36.341.

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30

Hayashi, Chikara. "Material Science Evolves with Ultra-High Vacuum Technology." Materia Japan 37, no. 7 (1998): 555–58. http://dx.doi.org/10.2320/materia.37.555.

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31

SUGIMOTO, Yoshiaki. "Trends and Prospects for Ultra-High Vacuum AFM." Vacuum and Surface Science 65, no. 2 (February 10, 2022): 59–65. http://dx.doi.org/10.1380/vss.65.59.

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32

HIRATA, Akisuke, Nozomu TAKAGI, and Katsunari TAKENAGA. "Aluminum alloy components for ultra-high vacuum. (I)." SHINKU 28, no. 5 (1985): 337–40. http://dx.doi.org/10.3131/jvsj.28.337.

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33

Davis, David J., Georgios Kyriakou, Robert B. Grant, Mintcho S. Tikhov, and Richard M. Lambert. "Quantitative Hydrocarbon Sensor for Ultra High Vacuum Applications." Journal of Physical Chemistry C 111, no. 3 (December 29, 2006): 1491–95. http://dx.doi.org/10.1021/jp0664364.

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34

Petersen, DR, RE Link, J. Ruiz, and M. Elices. "Ultra-High-Vacuum Chamber for Environmental-Fatigue Testing." Journal of Testing and Evaluation 23, no. 4 (1995): 275. http://dx.doi.org/10.1520/jte10425j.

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35

Pandiyar, M. L., M. Prasad, S. K. Jain, R. Kumar, and P. R. Hannurkar. "Ultra high vacuum test setup for electron gun." Journal of Physics: Conference Series 114 (May 1, 2008): 012061. http://dx.doi.org/10.1088/1742-6596/114/1/012061.

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36

McKay, Kyle, Scott Wolter, and Jungsang Kim. "A ultra-high-vacuum wafer-fusion-bonding system." Review of Scientific Instruments 83, no. 5 (May 2012): 055108. http://dx.doi.org/10.1063/1.4718357.

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37

Murari, A., and A. Barzon. "Ultra high vacuum properties of some engineering polymers." IEEE Transactions on Dielectrics and Electrical Insulation 11, no. 4 (August 2004): 613–19. http://dx.doi.org/10.1109/tdei.2004.1324351.

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38

Hoseinpur, Arman, and Jafar Safarian. "Vacuum refining of silicon at ultra-high temperatures." Vacuum 184 (February 2021): 109924. http://dx.doi.org/10.1016/j.vacuum.2020.109924.

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39

Yang, X. T., J. H. Zhang, X. J. Zhang, H. M. Wu, Z. W. Niu, S. J. Hou, J. Meng, and W. Jacoby. "The ultra-high vacuum system of HIRFL-CSR." Vacuum 61, no. 1 (April 2001): 55–60. http://dx.doi.org/10.1016/s0042-207x(00)00447-4.

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40

Walter, T., J. P. Turneaure, S. Buchman, C. W. F. Everitt, and G. M. Keiser. "An ultra high vacuum low temperature gyroscope clock." Physica B: Condensed Matter 165-166 (August 1990): 155–56. http://dx.doi.org/10.1016/s0921-4526(90)80927-b.

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41

Koprio, JA. "Ultra-high vacuum deposition processes under microprocessor control." Vacuum 39, no. 7-8 (January 1989): 861–62. http://dx.doi.org/10.1016/0042-207x(89)90065-1.

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42

Lutkiewicz, P., B. Skoczeń, and C. Garion. "Micro-damage propagation in ultra-high vacuum seals." International Journal of Pressure Vessels and Piping 87, no. 4 (April 2010): 187–96. http://dx.doi.org/10.1016/j.ijpvp.2009.10.002.

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43

OIWA, Retsu. "Thoughts on Ultra High Vacuum Scanning Probe Microscope." Hyomen Kagaku 38, no. 10 (2017): 493. http://dx.doi.org/10.1380/jsssj.38.493.

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44

Mathewson, A. G. "Ultra high vacuum technology for synchrotron light sources." Synchrotron Radiation News 3, no. 1 (January 1990): 13–17. http://dx.doi.org/10.1080/08940889008602538.

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45

Sitter, H., and W. Faschinger. "Ultra high vacuum atomic layer epitaxy of CdTe." Thin Solid Films 225, no. 1-2 (March 1993): 250–55. http://dx.doi.org/10.1016/0040-6090(93)90164-k.

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46

Gaisch, R., J. K. Gimzewski, B. Reihl, R. R. Schlittler, M. Tschudy, and W. D. Schneider. "Low-temperature ultra-high-vacuum scanning tunneling microscope." Ultramicroscopy 42-44 (July 1992): 1621–26. http://dx.doi.org/10.1016/0304-3991(92)90495-6.

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47

Bleeker, Arno J., and J. Murray Gibson. "Objective-lens design for high resolution ultra high vacuum EM." Proceedings, annual meeting, Electron Microscopy Society of America 50, no. 1 (August 1992): 292–93. http://dx.doi.org/10.1017/s0424820100121867.

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Although the main use for Transmission electron microscopy is to study bulk phenomena it is also possible to do surface sensitive experiments with this type of instrument. In order to do reliable surface physical experiments it is necessary to improve the vacuum within the vicinity of the specimen to the Ultra High Vacuum (UHV) level. A number of authors report on such improvements. In most designs the experiments with the sample such as deposition and oxidation are done outside the main microscope column. This means that it is not possible to observe the sample under high resolution conditions during these experiments. The importance of the electron microscope as a surface sensitive instrument can be greatly enhanced if it would be possible to do surface physical experiments in-situ. In that way it would become possible to observe the specimen with high resolution during all kinds of surface processes. In order to be able to do these experiments there must exist a large free space around the sample. In this free space auxiliary equipment such as ion guns and MBE cells can be placed. To further enhance the capabilities of the instrument, analyzing tools such as an Auger spectrometer and SIMS equipment can be attached to the microscope. At the University of Illinois an electron microscope capable of imaging the sample during surface physical experiments is presently under construction. In this machine the objective lens section has been replaced by a large (800 mm diameter and 400 mm high) UHV chamber. The specimen is outside the magnetic field of the objective lens in order to obtain as much free space around the sample as possible thus sacrificing resolution.

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48

Jitschin, Wolfgang. "Pressure Metrology from Ultra-high Vacuum to Very High Pressures." Vakuum in Forschung und Praxis 11, no. 3 (1999): 195. http://dx.doi.org/10.1002/vipr.19990110322.

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49

Krasnov, A. A., and A. M. Semenov. "The lumped ultra-high vacuum pumps based on non-evaporable getters." Известия Российской академии наук. Серия физическая 87, no. 5 (May 1, 2023): 646–51. http://dx.doi.org/10.31857/s0367676522701186.

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The lumped vacuum pumps based on the non-evaporable getters (NEG) have got wide application in accelerator vacuum systems. These pumps are one of the types using for vacuum obtaining in the synchrotron source of 4th generation SFR “SKIF”. In BINP, the NEG prototypes with pumping speed of 300, 600, 900 and 1300 L/s for hydrogen were created and investigated. The pumps construction and test results are presented here.

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50

Zhang, Sheng Fang, Jing Pei Liu, Guan Hua Zhang, Mei Hua Yang, Ai Ling Han, and Fang Zhun Guo. "Development of High Temperature Electron Bombardment Evaporator for Ultra-High Vacuum." Advanced Materials Research 566 (September 2012): 608–11. http://dx.doi.org/10.4028/www.scientific.net/amr.566.608.

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To improve the techniques of molecular beam epitaxy, the electron bombardment evaporator for high temperature evaporation in ultra-high vacuum is designed, and then its performances, such as power-temperature relationship, stability of beam flux as well as molecular beam distribution, are tested by using Ag source. Through adjusting the electric current of tungsten filament can achieve the remarkable heating power in high-voltage, and the crucible temperature rises with increasing heating power, and it exceeds 1600°C at around 60W. The evaporator can reach thermal equilibrium state in a quite short time and produce a highly stable beam flux of Ag at low deposition rate. A 9mm diameter homogeneous flux platform area is obtained at the position 60mm away from the nozzle, and this area can provide high quality beam flux for molecular beam epitaxy. These results show, the electron bombardment evaporator can meet the demands for ultra-high vacuum molecular beam epitaxy growth completely.

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