Dissertations / Theses on the topic 'Titanium nitride'
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Li, Wenyu. "The fabrication of silicon nitride-titanium nitride composite materials." Thesis, University of Leeds, 1992. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.305875.
Full textTaylor, Matthew Bruce, and matthew taylor@rmit edu au. "A Study of Aluminium Nitride and Titanium Vanadium Nitride Thin Films." RMIT University. Applied Science, 2007. http://adt.lib.rmit.edu.au/adt/public/adt-VIT20080529.151820.
Full textBin, Shafiee Saiful Arifin. "Fabrication and characterisation of solid titanium nitride and molybdenum nitride microelectrodes." Thesis, University of Southampton, 2017. https://eprints.soton.ac.uk/419530/.
Full textLemus-Ruiz, Jose. "Diffusion bonding of silicon nitride to titanium." Thesis, McGill University, 2000. http://digitool.Library.McGill.CA:80/R/?func=dbin-jump-full&object_id=37760.
Full textDiffusion bonding was carried out at temperatures ranging from 1200 to 1500ºC using different holding times, pressures, and surface roughness of the joining materials. The results showed that Si3N4 could not be bonded to Ti at temperatures lower than 1400ºC, however successful joining at higher temperatures. Joining occurred by the formation of a reactive interface on the Ti side of the joint. At temperatures greater than 1330ºC, liquid formation occurred by the interaction of Ti with Si promoting bonding, as well as the high affinity of Ti for Si resulted in rapid interface formation of silicides, initially Ti5Si3. EPMA and X-ray diffraction confirmed the presence of Ti5Si3, TiSi, and TiN at the interface. The surface roughness of the joining materials plays an important role since thicker interfaces were obtained for polished samples compared to as-ground samples. The interfaces grew in a parabolic fashion with the formation of various Ti-silicides (Ti5Si3 and TiSi) as well as Ti-nitride (TiN) at the interface.
Evaluation of joint strengths as a function of the experimental parameters such as, joining temperature and time was obtained by four-point bending test performed on Si3N4/Ti/Si3N4 joints. Strong joints were produced at joining temperatures greater than 1450ºC with average bend strength of more than 100 MPa. The maximum joint strength was obtained in samples hot-pressed at 1500ºC and 120 minutes reaching a value of 147 MPa.
Mahmoud, El-Amin A. "Machining with titanium nitride-coated metal tools." Thesis, Aston University, 1988. http://publications.aston.ac.uk/11912/.
Full textMunktell, von Fieandt Sara. "Controlled interlayer between titanium carbon-nitride and aluminiumoxide." Thesis, Uppsala universitet, Institutionen för materialkemi, 2011. http://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-161088.
Full text黃大偉 and Tai-wai Wong. "Laser spectroscopy of sulphur monoxide and titanium nitride." Thesis, The University of Hong Kong (Pokfulam, Hong Kong), 1992. http://hub.hku.hk/bib/B31210612.
Full textWong, Tai-wai. "Laser spectroscopy of sulphur monoxide and titanium nitride /." [Hong Kong] : University of Hong Kong, 1992. http://sunzi.lib.hku.hk/hkuto/record.jsp?B13205043.
Full textJohnson, Saccha Ellen. "Atmospheric pressure chemical vapour deposition of titanium nitride from titanium tetrachloride and ammonia." Thesis, University of Southampton, 1996. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.242208.
Full textZgrabik, Christine Michelle. "Wide Tunability of Magnetron Sputtered Titanium Nitride and Titanium Oxynitride for Plasmonic Applications." Thesis, Harvard University, 2016. http://nrs.harvard.edu/urn-3:HUL.InstRepos:33493259.
Full textEngineering and Applied Sciences - Applied Physics
Vaněček, Stanislav. "Cermety a jejich efektivní využití." Master's thesis, Vysoké učení technické v Brně. Fakulta strojního inženýrství, 2009. http://www.nusl.cz/ntk/nusl-228623.
Full textWang, Xihong. "Wear behavior of PVD titanium nitride-coated tool steels /." Full text open access at:, 1989. http://content.ohsu.edu/u?/etd,237.
Full textRebholz, Claus. "Synthesis and properties of titanium aluminium boron nitride coatings." Thesis, University of Hull, 1999. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.310329.
Full textTakahashi, Satoshi Ph D. Massachusetts Institute of Technology. "Integrated optical switching using titanium nitride micro electromechanical systems." Thesis, Massachusetts Institute of Technology, 2006. http://hdl.handle.net/1721.1/35645.
Full textIncludes bibliographical references (p. [116]-[127]).
This thesis reports an integrated optical wavelength specific switching device for applications in optical integrated circuits (OICs) based on micro electromechanical systems (MEMS). The device consists of a ring resonator add-drop filter and a conductive MEMS bridge which is actuated by electrostatic force. Introducing conductive material into the electromagnetic evanescent field of the ring waveguide results in loss in the propagating light within, disabling the resonance and the filtering capabilities of the ring resonator. Therefore, by actuating the MEMS bridge in and out of the waveguide's evanescent field, the filter can be toggled between the on and off states. One large problem that must be faced when fabricating and actuating a MEMS cantilever or bridge structure for this type of device is the residual stress that may deflect the structure in an undesired way. This is because the vertical displacement of the structure is crucial. In order to solve this problem, this thesis is based on the use of titanium nitride (TiN) as structural material for the bridge. Titanium nitride has very attractive mechanical properties as well as good conductivity, which makes it an ideal structural material for electrostatically actuated devices.
(cont.) Moreover, the residual stress within the material can be relieved by proper control of deposition conditions and/or post processing. This thesis focuses on the post process annealing of titanium nitride in order to eliminate the residual stress in the structure and obtain a fiat bridge profile. Titanium nitride MEMS bridge structures were fabricated and tested. Their deflection from a flat state and stress was measured and characterized, and a structure with minimal residual stress was successfully fabricated. The actuation of the MEMS bridge is also demonstrated, and its characteristics are analyzed. Also discussed is the possibility of extending the design of the MEMS switch to implement the three-electrode ultra-fast strain-induced switching and MEMS wavelength tuning of an integrated optical filter. A realistic design of these devices is proposed in context with the requirements imposed by the optical telecommunication industry, and fabrication methods are considered. Simulations have been conducted using finite element analysis and mode solving to establish the feasibility of these designs.
y Satoshi Takahashi.
S.M.
LeClair, Patrick R. (Patrick Royce) 1976. "Titanium nitride thin films by the electron shower process." Thesis, Massachusetts Institute of Technology, 1998. http://hdl.handle.net/1721.1/50025.
Full textAbramowitz, Peter Prep. "Forming nitrides with low-energy ions on low-K dielectrics /." Digital version accessible at:, 2000. http://wwwlib.umi.com/cr/utexas/main.
Full textLiu, Zhibin. "Novel low friction titanium nitride coatings by pulsed magnetron sputtering." Thesis, University of Salford, 2007. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.490222.
Full textPugh, John A. "The development of titanium nitride strengthened creep resistant ferritic steels." Thesis, University of Strathclyde, 2000. http://oleg.lib.strath.ac.uk:80/R/?func=dbin-jump-full&object_id=21177.
Full textJordan, Jennifer Lynn. "Shock-activated reaction synthesis and high pressure response of Ti-based ternary carbide and nitride ceramics." Diss., Georgia Institute of Technology, 2003. http://hdl.handle.net/1853/19674.
Full textBastien, Samuel. "Selective chemical stripping of titanium aluminum nitride coating from titanium substrate using hydrogen peroxide and potassium oxalate." Thesis, McGill University, 2012. http://digitool.Library.McGill.CA:80/R/?func=dbin-jump-full&object_id=110474.
Full textTitanium Aluminum Nitride (TiAlN) est un revêtement industriel important puisqu'il améliore la dureté et la résistance à la corrosion. L'objectif de ce travail est de développer des techniques chimiques qui enlèvent de façon sé¬lective des revêtements de TiAlN déposés sur des substrats de Titane. La solution chimique sélection¬née consiste de peroxyde d'hydrogène (H2O2) et d'oxalate de potassium (K2C2O4). Des échantillons de Ti-6-4 couverts d'une couche de TiAlN d'une épaisseur notionnelle de 10 micromètres ont été exposés à plusieurs solutions chimiques avec des températures et concentrations variées. De façon générale, nous avons trouvé que si on augmentait la température de la réaction ou la concentration des réactants, cela faisait augmenter les vitesses de dégradation du revêtement et du substrat. La sélectivité augmentait aussi avec une hausse de la température ou de la concentration d'oxalate de potassium, mais diminuait avec une hausse de la concentration de peroxyde d'hydrogène. La plus haute vitesse de dissolution du revêtement qui a été obtenue était de 39 µm/hr à une température de 75oC, une concentration de peroxyde d'hydrogène de 5.9 mol/L et une concentration d'oxalate de potassium de 0.226 mol/L. À des conditions similaires, le substrat se dissolvait à une vitesse de 6.6 µm/hr. La meilleure sélectivité obtenue était de 6.8, à une concentration d'oxalate de potassium de 0.226 mol/L, une concentration de peroxyde d'hydrogène de 4.4 mol/L et une température de 75oC. Nous avons aussi trouvé que le ratio de Ti:Al dans le revêtement a un impact majeur sur sa résistance chimique aux solutions de H2O2 et de K2C2O4.
Rymer, Dawn Lee. "The atmospheric chemical vapor deposition of titanium nitride on polyimide substrates." Ohio : Ohio University, 1995. http://www.ohiolink.edu/etd/view.cgi?ohiou1179952065.
Full textPai, Anil. "DEVELOPMENT OF TITANIUM NITRIDE/MOLYBDENUM DISULPHIDE COMPOSITE TRIBOLOGICAL COATINGS FOR CRYOCOOLERS." Master's thesis, University of Central Florida, 2004. http://digital.library.ucf.edu/cdm/ref/collection/ETD/id/2886.
Full textM.S.
Department of Mechanical, Materials and Aerospace Engineering;
Engineering and Computer Science
Materials Science and Engineering
Andersson, Kent. "Preparation and Characterisation of Sputtered Titanium- and Zirconium Nitride Optical Films." Licentiate thesis, Solid State Physics Group, Department of Technology, Uppsala University, 1993. http://urn.kb.se/resolve?urn=urn:nbn:se:fhs:diva-4530.
Full textPaul, Shylendra Shimrith. "Investigation and development of titanium nitride solid-state potentiometric pH sensor." Thesis, Edith Cowan University, Research Online, Perth, Western Australia, 2023. https://ro.ecu.edu.au/theses/2669.
Full textPerry, Duncan. "Optimisation of a closed-field unbalanced magnetron sputter process : titanium aluminium nitride." Thesis, University of Salford, 1995. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.308219.
Full textRibeiro, A. Tome. "A study of the i-transition in rf-sputtered titanium nitride films." Thesis, Cranfield University, 1990. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.386196.
Full textClatworthy, Edwin Byrne. "Investigations of Cobalt Acetate and Titanium Nitride for Catalytic and Sustainable Chemistry." Thesis, The University of Sydney, 2018. http://hdl.handle.net/2123/19641.
Full textMuthukrishnan, N. Moorthy. "Characterization and modeling of dry etch processes for titanium nitride and titanium films in Cl₂/N₂ and BCl₃ plasmas." Diss., This resource online, 1996. http://scholar.lib.vt.edu/theses/available/etd-06062008-151045/.
Full textNgendahimana, Aimable. "Investigation of Novel Routes in the Synthesis of TiNF and Compounds in the Ti-N-O-F System." Youngstown State University / OhioLINK, 2010. http://rave.ohiolink.edu/etdc/view?acc_num=ysu1278100734.
Full textKim, Jae-Keun. "Synthesis and characterisation of titanium nitride films using a dual ion beam technique." Thesis, University of Salford, 1991. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.292883.
Full textNguyen, Chinh Chien, and Chinh Chien Nguyen. "Novel strategies to develop efficient titanium dioxide and graphitic carbon nitride-based photocatalysts." Doctoral thesis, Université Laval, 2018. http://hdl.handle.net/20.500.11794/30378.
Full textAfin de résoudre les problèmes environnementaux et énergétiques modernes, ces dernières années ont vu le développement de catalyseurs photocataytiques capables d’utiliser la lumière solaire. En effet, les possibles applications des semiconducteurs présentant des propriétés photocatalytiques dans les domaines de la production d’hydrogène ou la dégradation de polluants organiques ont généré un grand intérêt de la part de la communauté scientifique. Actuellement, les photocatalyseurs à base de dioxyde de titane (TiO₂) et de nitrure de carbone graphitique (g-C₃N₄) sont considérés comme les matériaux les plus étudiés pour leurs faibles coûts et leurs propriétés physico-chimiques exceptionnelles. Cependant, la performance photocatalytique de ces matériaux reste encore limitée, à cause de la recombinaison rapide des porteurs de charge et et d'une absorption limitée de la lumière. En générale, malgré des caractéristiques exceptionnelles, ces matériaux ne contribuent pas significativement à la séparation de charge et l’absorption de la lumière lorsqu’ils sont produits par des méthodes conventionnelles. L'objectif de cette thèse est de développer de nouvelles voies pour la production de matériaux efficaces basés sur TiO₂ et g-C₃N₄). Nous avons d'abord préparé de la triazine (CxNy) qui fonctionne comme un co-catalyseur d'oxydation ce qui facilite la séparation des paires «électron-trou» dans le système du photocatalyseur creux de type Pt-TiO₂-CxNy. La présence simultanée de Pt et de CxNy, qui servent comme co-catalyseurs de réduction et d'oxydation, respectivement, a permis une amélioration remarquable des performances photocatalytiques du TiO₂. De plus, nous avons développé une nouvelle approche, en utilisant un procédé de combustion de sphère de carbone assisté par l’air, pour préparer du C/Pt/TiO₂ . Ce matériau possède de nombreuses propriétés uniques qui contribuent de manière significative à augmenter la séparation « électron-trou », et en conséquence, à améliorer la performance photocatalytique. Dans le but de développer un matériau qui soit capable de fonctionner sous les rayons du soleil et dans l'obscurité, nous avons développé un photocatalyseur creux à double enveloppes : le Pt-WO₃/TiO₂-Au. Ce matériau a montré non seulement une forte absorption de la lumière solaire, mais aussi une séparation des charges élevée et une haute capacité de stockage d'électrons. Par conséquent, ce type de photocatalyseurs a montré une dégradation efficace des polluants organiques, à la fois sous la lumière visible (λ ≥ 420 nm) et dans l'obscurité. En ce qui concerne le g-C₃N₄, nous avons exploité la relation entre les lacunes d’azote et les propriétés plasmoniques des nanoparticules d’or (Au). Ce type de photocatalyseur du Au/g-C₃N₄ a été préparé en présence d’alcali suivi par une post calcination. En effet, les lacunes d’azote ainsi produites permettent le renforcement des interactions entre l’or et le g-C₃N₄ et des propriétés plasmoniques de l’or. Ces caractéristiques exceptionnelles renforcent l'utilisation efficace de l’énergie solaire ainsi que la séparation des paires « électron-trou », ce qui contribuent à la performance photocatalytique pour la production d'hydrogène du photocatalyseur. Afin d’améliorer la capacité d’absorption de la lumière visible de g-C₃N₄, une nouvelle voie de synthèse dénommée « poly-alcaline » a été développée. La possibilité d’ajouter du polyéthylèneimine (PEI) et de l’hydroxyde de potassium (KOH) pour générer de nombreux centres lacunaires en azote ainsi que des groupes hydroxyles dans la structure du matériau, a été explorée afin d’optimiser l’efficacité du matériau. De telles modifications ont démontré leurs capacités à réduire la bande interdite et à provoquer plus facilement la séparation de charges améliorant ainsi les propriétés photocatalytiques du photocatalyseur vis-à-vis de la production d’hydrogène. Cette méthode ouvre donc une nouvelle voie d’avenir pour préparer des photocatalyseurs nanocomposites efficaces possédant à la fois, une forte d’absorption de la lumière et une bonne séparation de charges.
The utilization of solar light-driven photocatalysts has emerged as a potential approach to deal with the serious current energy and environmental issues. Over the past decades, semiconductor-based photocatalysis has attracted an increasing attention for diverse applications including hydrogen production and the decomposition of organic pollutants. Currently, titanium dioxide (TiO₂) and graphitic carbon nitride (g-C₃N₄)-based photocatalysts have been considered as the most investigated materials because of their low cost, outstanding physical and chemical properties. However, their photocatalytic performances are still moderate owing to the fast charge carrier recombination and limited light absorption. The main target of the research presented in this thesis is to develop novel routes to prepare efficient materials based on TiO₂ and g-C₃N₄. These materials possess prominent features, which contribute to address the fast charge separation and light absorption problems. We firstly have prepared triazine (CxNy) acting as an oxidation co-catalyst, which efficiently facilitates electron-hole separation in a Pt-TiO₂-CxNy hollow photocatalyst system. The co-existence of Pt and CxNy functioning as the reduction and oxidation co-catalysts, respectively, has remarkably enhanced the photocatalytic performance of TiO₂. Next, we have also developed a new approach employing the air- assisted carbon sphere combustion process in preparing C/Pt/TiO₂. This material possesses many salient properties that significantly boost the electron-hole separation leading to enhanced photocatalytic performance. In an attempt to design a material that can operate under sunlight and in darkness, we have introduced Pt-WO₃/TiO₂-Au double shell hollow photocatalyst. The material has shown not only strong solar light absorption but also efficient charge separation and electron storage capacity. As a result, this type of photocatalyst exhibits a high activity performance for the degradation of organic pollutants both under visible light (λ ≥ 420 nm) and in the dark. Regarding to g-C₃N₄, we have explored the relationship between nitrogen vacancies and the plasmonic properties of Au nanoparticles employing alkali associated with the post-calcination method to prepare Au/g-C₃N₄. In fact, the produced nitrogen vacancies in the structure of g-C₃N₄ essentially enhance the interaction at Au/g-C₃N₄ interface and the plasmonic properties of Au nanoparticles. These outstanding features contribute to enhance the utilization of solar light and electron-hole separation that prompt the photocatalytic performance towards hydrogen production. Finally, we have employed a novel poly-alkali route to prepare a strong visible light absorption photocatalyst-based g-C₃N₄. The co-existence of PEI and KOH, which induces numerous nitrogen vacancies and incorporated hydroxyl groups in the structure of the resulted material, has been explored for the first time. These modifications have been proved to narrow the bandgap and facilitate the charge separation leading to enhance the solar light-driven hydrogen production. This method also opens up a new approach to prepare efficient nanocomposite photocatalysts possessing both strong light absorption and good charge separation.
The utilization of solar light-driven photocatalysts has emerged as a potential approach to deal with the serious current energy and environmental issues. Over the past decades, semiconductor-based photocatalysis has attracted an increasing attention for diverse applications including hydrogen production and the decomposition of organic pollutants. Currently, titanium dioxide (TiO₂) and graphitic carbon nitride (g-C₃N₄)-based photocatalysts have been considered as the most investigated materials because of their low cost, outstanding physical and chemical properties. However, their photocatalytic performances are still moderate owing to the fast charge carrier recombination and limited light absorption. The main target of the research presented in this thesis is to develop novel routes to prepare efficient materials based on TiO₂ and g-C₃N₄. These materials possess prominent features, which contribute to address the fast charge separation and light absorption problems. We firstly have prepared triazine (CxNy) acting as an oxidation co-catalyst, which efficiently facilitates electron-hole separation in a Pt-TiO₂-CxNy hollow photocatalyst system. The co-existence of Pt and CxNy functioning as the reduction and oxidation co-catalysts, respectively, has remarkably enhanced the photocatalytic performance of TiO₂. Next, we have also developed a new approach employing the air- assisted carbon sphere combustion process in preparing C/Pt/TiO₂. This material possesses many salient properties that significantly boost the electron-hole separation leading to enhanced photocatalytic performance. In an attempt to design a material that can operate under sunlight and in darkness, we have introduced Pt-WO₃/TiO₂-Au double shell hollow photocatalyst. The material has shown not only strong solar light absorption but also efficient charge separation and electron storage capacity. As a result, this type of photocatalyst exhibits a high activity performance for the degradation of organic pollutants both under visible light (λ ≥ 420 nm) and in the dark. Regarding to g-C₃N₄, we have explored the relationship between nitrogen vacancies and the plasmonic properties of Au nanoparticles employing alkali associated with the post-calcination method to prepare Au/g-C₃N₄. In fact, the produced nitrogen vacancies in the structure of g-C₃N₄ essentially enhance the interaction at Au/g-C₃N₄ interface and the plasmonic properties of Au nanoparticles. These outstanding features contribute to enhance the utilization of solar light and electron-hole separation that prompt the photocatalytic performance towards hydrogen production. Finally, we have employed a novel poly-alkali route to prepare a strong visible light absorption photocatalyst-based g-C₃N₄. The co-existence of PEI and KOH, which induces numerous nitrogen vacancies and incorporated hydroxyl groups in the structure of the resulted material, has been explored for the first time. These modifications have been proved to narrow the bandgap and facilitate the charge separation leading to enhance the solar light-driven hydrogen production. This method also opens up a new approach to prepare efficient nanocomposite photocatalysts possessing both strong light absorption and good charge separation.
Blumer, Zak H. "Synthesis of Plasmonic Titanium Nitride Structures to Increase Efficiency in Solar Thermal Technologies." Ohio University Honors Tutorial College / OhioLINK, 2018. http://rave.ohiolink.edu/etdc/view?acc_num=ouhonors1524833073448935.
Full textLimarga, Andi M. Wilkinson David S. "Interaction between creep deformation and oxy-nitride scale growth in gamma-titanium aluminide." *McMaster only, 2006.
Find full textYoon, Su-Jong. "Synthesis and characterization of ceramics in the Ti-B-N-C system." Thesis, Brunel University, 1994. http://bura.brunel.ac.uk/handle/2438/5352.
Full textLai, Chung-Chuan. "Growth and Phase Stability of Titanium Aluminum Nitride Deposited by High Power Impulse Magnetron Sputtering." Thesis, Linköpings universitet, Plasma och beläggningsfysik, 2011. http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-68922.
Full textZimmermann, Janina [Verfasser]. "Atomistic modeling of the oxidation of titanium nitride and cobalt-chromium alloy surfaces / Janina Zimmermann." Aachen : Shaker, 2010. http://d-nb.info/1122546599/34.
Full textDowling, Andrew John, and andrewjohn3055@yahoo com. "Novel strategies for surface micromachining TiN thin films deposited by filtered arc." Swinburne University of Technology. Industrial Research Institute Swinburne, 2005. http://adt.lib.swin.edu.au./public/adt-VSWT20051129.085933.
Full textMontoya, Anthony Tristan. "Synthesis of carbon nitrides and composite photocatalyst materials." Diss., University of Iowa, 2018. https://ir.uiowa.edu/etd/6479.
Full textPiippo, Juha. "Electrochemical characterization of inorganic coatings : titanium nitride and aluminium oxide coatings characterized using electrochemical impedance spectroscopy /." [S.l.] : [s.n.], 1993. http://e-collection.ethbib.ethz.ch/show?type=diss&nr=10309.
Full textLee, Ming-Tung, and 李明東. "A study of Titanium Nitride-,Titanium Carbide-,and Titanium Nitride-coated Titanium Carbide-contained Silicon Nitride based composites." Thesis, 1994. http://ndltd.ncl.edu.tw/handle/87669689602329192820.
Full textLiu, Zhi Rong, and 劉芝蓉. "Surface Plasma Resonance of Titanium Nitride and Titanium Nitride/Gold." Thesis, 2011. http://ndltd.ncl.edu.tw/handle/65603330249697116099.
Full text長庚大學
光電工程研究所
99
The experiment of measuring Titanium Nitride (TiN) and TiN/Gold is using attenuated total reflectance (ATR), and analyzing the property of surface plasma resonance. The best thickness of TiN we got is 35 nm. We got the related parameters, by using Drude model. But Composed of titanium nitride nitrogen 2p orbitals and Ti 3d electron orbital electronic bonding of metal - nonmetal compounds, the electric concentration is less than gold, making the resistance is higher, resulting surface plasma resonance(SPR) doesn’t good performance of gold, showing a worse space dots per inch . If we choose TiN as a measuring tool, it make a misunderstanding the cause easily. Therefore, in the outer layer of gold film on the SPR membrane to produce the original interface compounds - and the air from the compound - metal into the air - the air, increasing the concentration of free electrons, the surface of the titanium nitride to improve the electrical properties of the objective.
蘇桓德. "Microstructural Characterization of Interface Reaction between Titanium Nitride and Titanium." Thesis, 2005. http://ndltd.ncl.edu.tw/handle/44203279884862438086.
Full text國立交通大學
材料科學與工程系所
93
In this work, the interfacial reactions in the TiN/Ti diffusion couple were investigated. TiN/Ti diffusion couples were annealed at temperatures ranging from 1000 to 1500℃in argon atmosphere for 36hours. The microstructures of the reaction interface were characterized using x-ray diffraction (XRD), scanning electron microscopy (SEM), and analytical transmission electron microscopy (TEM/EDS). Phases of ε-TiN(tetragonal) was observed from TiN-side to Ti-side of the diffusion couple after reaction at 1000℃ for 36 hours. After reaction at 1300℃ for 36 hours , ε-TiN(tetragonal) and α-TiN0.3(hexagonal)were observed from TiN-side to Ti-side, and ε-TiN were formed by the peritectoid reaction. However, after reaction at 1400℃ for 36 hours, the needle-like Ti2N was precipitated. Finally, α-TiN0.3 did not exist after reaction at 1500℃ for 36 hours, but lath-like α-Ti was precipitated in the two-phase region.
Russell, Jeffrey Otto. "Hollow cathode enhanced sputtering of titanium nitride." 1989. http://catalog.hathitrust.org/api/volumes/oclc/22855318.html.
Full textTypescript. eContent provider-neutral record in process. Description based on print version record. Includes bibliographical references (leaves 67-70).
Yen, Young-Da, and 顏永達. "Aluminization and Oxidation Behavior of Titanium Nitride." Thesis, 2009. http://ndltd.ncl.edu.tw/handle/76534696885558793662.
Full text國立交通大學
材料科學與工程系所
97
In this work, the aluminization and oxidation reactions of Titanium Nitride (TiN) were investigated. TiN samples were annealed by using the pack cementation method at temperatures ranging from 850 to 1150℃in argon atmosphere for 10hours. The microstructures of the reaction interface were characterized using x-ray diffraction (XRD) and scanning electron microscopy (SEM). Phases of AlN(hexagonal) and TiAl3(tetragonal) were observed in the aluminized layer after reaction at 850℃ for 10hrs. However, Phase of TiN(cubic) was addationally formed in the aluminized layer after reaction at 1150℃ for 10hrs. After the optimum pack cementation treatment, the coated specimens were oxidized at 1000℃ up to 250 hrs in air. After oxidation, the TiN which was aluminization- treated at 850℃had batter oxidation resistance than the untreated TiN because of more AlN proportions relative to TiAl3 so as to form a continuous and dense Al2O3 protection layer. On the contrary, the TiN which was aluminized at 1000 or 1150℃had poor oxidation resistance than the untreated TiN. On the one hand, this is because TiAl3 would be oxidized to form TiO2/ Al2O3 mixed layers without offering better oxidation resistance. On the other hand, less amount of AlN would not be able to form a continuous Al2O3 protection layer.
WU, BO-RUEI, and 吳柏叡. "Aluminum Alloy Composite Reinforced by Titanium Nitride." Thesis, 2018. http://ndltd.ncl.edu.tw/handle/5a8s48.
Full text國立虎尾科技大學
機械設計工程系碩士班
106
In this paper, an aluminum matrix containing titanium nitride particles was fabricated by an in situ process in which nitrogen gas reacts with titanium in the liquid melt to form TiN. The tensile and yield strength increased by up to 20% after the formation of TiN particles in the Al alloy matrix, whilst the hardness increased by up to 27%. The abrasive and sliding-wear resistance increased with the in situ process and direct addition of the TiN particles. TiN particles of aluminum alloy composite material with in situ process and the direct addition of TiN aluminum alloy composite material have significantly increased tensile strength and fatigue resistance. Among them, TiN aluminum alloy composite material in situ process has better tensile strength and fatigue resistance than the direct addition of TiN aluminum alloy composite material. The reason is that TiN particles with aluminum alloy composite material in situ process is smaller than the commercial TiN powder, and integrate with aluminum matrix strongly. Moreover, there is no flaw between TiN particles and aluminum matrix. It makes TiN particles of aluminum alloy composite material with in situ process have higher fatigue resistance,and the wearability of TiN particles of aluminum alloy composite material with in situ process is superior to the direct addition of TiN particles aluminum alloy composite material.
Wang, Wei-Chien, and 王維謙. "Absorption Properties of Titanium Nitride Nanorod Arrays." Thesis, 2018. http://ndltd.ncl.edu.tw/handle/8y7zv6.
Full text國立臺北科技大學
光電工程系
106
In this study, titanium nitride nanorod arrays with different thicknesses were deposited with glancing angle deposition technique by DC magnetron sputtering and argon-nitrogen mixed gas. Titanium nitride nanorod arrays with different columnar angles and thicknesses were deposited at a flow ratio of argon and nitrogen with ratio of (Ar (sccm): N2 (sccm) = 30:3.5). X-ray Photoelectron Spectroscopy (XPS) and X-ray Diffractometer (XRD) were used to derive the chemical analysis and lattice orientation of TiN nanorod array, respectively. Both p-polarized and s- polarized transmittance and reflectance spectra of each TiN nanorod array at angles of incident from +700 to -700 were measured. The absorption peaks associated with the Longitudinal Plasmon Mode (LPM) and the Transverse Plasmon Mode (TPM) in the p-polarized and s-polarized absorbance spectra were investigated. The absorptions of two modes were compared with a silver nanorod array with similar rod length. The difference between TiN and Ag nanorods array is discussed by analyzing the lattice orientation and intrinsic electromagnetic property of deposited TiN nanorods. The Finite-Difference Time-Domain (FDTD) is also applied to understand the mechanism of plasmonic modes in the TiN nanorods.
Chang, Tzong Shan, and 張宗生. "The Application of Titanium Nitride and Titanium Silicide Bilayer for Cooper Metallization." Thesis, 1995. http://ndltd.ncl.edu.tw/handle/95556469650182949569.
Full textChang, Ching, and 張敬. "Transformation of Titanium Dioxide to Epitaxial Titanium Nitride by Microwave Plasma Nitriding." Thesis, 2017. http://ndltd.ncl.edu.tw/handle/xzj9hm.
Full text國立交通大學
材料科學與工程學系所
105
This thesis focuses on the study of nitriding process on different TiO2 templates by using microwave plasma. One of the templates is a 50 nm thick amorphous TiO2 film coated by atomic layer deposition on Si (100), and the other is single crystalline TiO2 of rutile structure in (001). The formed TiN is characterized for its microstructure with crystal orientation and chemical bonding. In the first part of this thesis, the evolution of the amorphous TiO2 for nitridation under different microwave plasma process conditions will be presented. Plasma nitriding processes have been performed with three different gases including N2 / H2 mixture, N2 / CH4 mixture, and pure N2. The second part is devoted to plasma nitriding of rutile TiO2 single crystal in (001) under similar conditions for nitriding amorphous TiO2 / Si. Finally, the results on the single crystal TiO2 will be compared with those on the amorphous TiO2 / Si. The morphology, crystallinity and chemical bonding of TiN after nitridation of TiO2 were characterized by using scanning electron microscopy, high-resolution x-ray diffraction, x-ray photoelectron spectroscopy, and transmission electron microscopy and scanning transmission electron microscopy. The results show that the nitrogen plasma with hydrogen can have a higher nitriding rate, while it may have a more significant etching effect. After nitridation of the amorphous TiO2 on Si, polycrystalline TiN in <001> preferred orientation is formed. In contrast, epitaxial TiN can be successfully obtained upon nitridation of the single crystalline TiO2. In the use of nitrogen-hydrogen plasma nitriding, the surface of rutile TiO2 can be nitrided to (011) TiN, and the orientation relationship can be indicated by <110> TiO2 // <100> TiN. In addition, the (001) TiN will be produced when replacing nitrogen-hydrogen plasma to nitrogen-carbon plasma, the epitaxial relationship is <110> TiO2 // <110> TiN and (001) TiO2 // (001) TiN. Finally, for the pure nitrogen plasma, epitaxial (011) TiN is obtained with the same relationship with TiO2 as for the nitrogen-hydrogen plasma.
Chiang, Chung-Sheng, and 姜崇勝. "Inelastic Interactions of Elections Crossing the Surface of Indium Nitride and Titanium Nitride." Thesis, 2008. http://ndltd.ncl.edu.tw/handle/16218304061378494346.
Full text國立交通大學
電子工程系所
96
A dielectric response theory was used to study the inelastic cross sections for electrons crossing the indium nitride and titanium nitride surface. The inelastic cross sections contain information on both the surface and volume excitations. Parameters in the extended Drude dielectric function were determined from the fits of this function to experimental optical data. Theoretical derivations of the differential inverse inelastic mean free path (DIIMFP) and inverse inelastic mean free path (inverse IMFP) for either incident or escaping electrons were made for different electron energies, crossing angles, and electron distances relative to the crossing point at the surface. Dependences of the calculated DIIMFP and inverse IMFP on electron energy, crossing angle, and electron distance were analyzed. Surface excitation parameter (SEP), which describes the total probability of the surface excitations for the electrons moving outside the solid, was also calculated for different electron energies and crossing angles. The energy and angular dependences of the calculated SEPs were also analyzed.
Yu, Jia-Rong, and 余家榮. "Microwave Plasma Assisted LPCVD Deposited Titanium Nitride Film." Thesis, 1998. http://ndltd.ncl.edu.tw/handle/35960623531256395961.
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