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Journal articles on the topic 'Thin TiO2 film'

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Published: 9 March 2023
Last updated: 10 March 2023

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1

Kim, Byunguk, Taeseong Kang, Gucheol Lee, and Hyeongtag Jeon. "The effect of an annealing process on atomic layer deposited TiO2 thin films." Nanotechnology 33, no. 4 (November 5, 2021): 045705. http://dx.doi.org/10.1088/1361-6528/ac2f28.

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Abstract In this paper, we study the property changes in TiO2 thin films related to annealing under various conditions. XPS analysis showed that the concentration of oxygen vacancies in TiO2 thin films was reduced by annealing. In the case of annealing in an O2 and air atmosphere, the oxygen vacancy concentration was reduced to the greatest extent as oxygen diffused into the TiO2 thin film and rearrangement of atoms occurred. XRD analysis showed that the anatase structure of annealed TiO2 thin films was clearly present compared to the as-deposited TiO2 thin film. I–V analysis showed that the lower the concentration of oxygen vacancy, the lower the leakage current (O2 annealed TiO2: 10−4 A cm−2) than as dep TiO2 thin film (∼10−1 A cm−2). The dielectric constant of annealed TiO2 thin films was 26–30 which was higher than the as-deposited TiO2 thin film (k ∼ 18) because the anatase structure became more apparent.
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2

Bathe, Suvarna R., and P. S. Patil. "Electrochemical Behavior of TiO2 Nanoparticle Doped WO3 Thin Films." Journal of Materials 2014 (May 6, 2014): 1–5. http://dx.doi.org/10.1155/2014/642069.

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Nanoparticle TiO2 doped WO3 thin films by pulsed spray pyrolysis technique have been studied on fluorine tin doped (FTO) and glass substrate. XRD shows amorphous nature for undoped and anatase phase of TiO2 having (101) plane for nanoparticle TiO2 doped WO3 thin film. SEM shows microfibrous reticulated porous network for WO3 with 600 nm fiber diameter and nanocrystalline having size 40 nm for TiO2 nanoparticle doped WO3 thin film. TiO2 nanoparticle doped WO3 thin film shows ~95% reversibility due to may be attributed to nanocrystalline nature of the film, which helpful for charge insertion and deinsertion process. The diffusion coefficient for TiO2 nanoparticle doped WO3 film is less than undoped WO3.
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3

Zulkiflee, Nur Syahraain, Rosniza Hussin, and Hasrul Yahya. "Structural and Optical Characterization of TiO2/ZnO Thin Films Prepared by Sol-Gel Method." Materials Science Forum 888 (March 2017): 290–96. http://dx.doi.org/10.4028/www.scientific.net/msf.888.290.

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Thin film has been extensively study due to better structural, surface morphology, and optical properties. The combination of two materials will enhance the properties of thin film. In this study, TiO2/ZnO thin films were deposited on glass substrates via sol-gel method. TiO2 acts as pre-deposited thin film with calcination temperatures at 400 °C, 500 °C, and 600 °C. The post-deposition of TiO2/ZnO thin films were calcined at 500 °C and 600 °C. TiO2 sol-gel was synthesis from titanium (IV) butoxide and butanol as the precursor, while ZnO sol-gel was synthesis from zinc acetate dehydrate and isopropanol as the precursor. The TiO2/ZnO thin films were characterized by X-ray diffraction (XRD), atomic force microscope (AFM), and ultraviolet visible spectroscopy (UV-Vis). The effect of calcination temperature and pre-deposited TiO2 thin films show difference results of bilayer thin films. The XRD analysis shows all TiO2/ZnO thin films growth with TiO2 anatase crystalline phase at orientation (1 0 1) and ZnO zincite phase at orientation (1 0 1). The structural properties of TiO2/ZnO thin films were improved by controlling the calcination temperature. Based on AFM analysis, the RMS value for TiO2/ZnO decreases as the calcination temperature increased. The compacted and dense surface roughness were controlled by the temperature. Meanwhile, the percentage of thin film ultraviolet transmittance can be enhanced with combination of two materials, TiO2 and ZnO. Therefore, the pre-deposited layer of thin film with influenced by calcination temperature will improve the crystallinity, surface morphology, and optical properties of TiO2/ZnO thin films.
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4

Han, Chun, Lei Zhao, Manying Zhang, Lin Pan, and Zhifeng Liu. "Synthesis and Self-Cleaning Property of TiO2 Thin Film Doping with Fe3+, Al3+, Ce3+ Ions." Journal of Nanoscience and Nanotechnology 20, no. 7 (July 1, 2020): 4084–91. http://dx.doi.org/10.1166/jnn.2020.17691.

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Enhancing the response to visible light and inhibiting recombination of photogenerated electrons and holes is a key point for strongly improved self-cleaning performances of TiO2 self-cleaning films. In this work, TiO2 thin film doping with three different ions (Fe3+, Al3+, Ce3+) on glass substrate respectively by sol–gel method to explore the effect of ions on self-cleaning performance of TiO2 thin films. All the prepared samples are characterized by XRD, SEM, UV-Vis and water contact angle tester. Moreover, the self-cleaning mechanism of doping TiO2 thin film is discussed. The water contact angle of TiO2 thin film doping with 9% Fe (molar ratio), 5% Ce and 5% Al are reach at 0°, respectively. In comparison with the water contact angle of pure TiO2 thin film (2.5°), TiO2 thin film doping with metal ions exhibit better self-cleaning property.
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5

Zhou, Yi, Ke Long Huang, Ming Ming Dang, Hong Li, Cai Xia Lv, and De Hui Shi. "Preparation and Photoelectric Performance of Eu3+-Doped Porous TiO2 Thin Film Electrode." Advanced Materials Research 97-101 (March 2010): 2209–12. http://dx.doi.org/10.4028/www.scientific.net/amr.97-101.2209.

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The nanoporous TiO2 film doped Eu3+ were prepared by combining the sol-gel and hydrothermal method, which could be applied to dye-sensitized solar cells(DSSC). The films were characterized by XRD, SEM and UV-vis DRS. DSSC photoelectric properties were evaluated by recording current-voltage characteristics under simulated sunlight illumination. The results indicated that Eu3+-doped TiO2 film electrodes increased short-circuit current and the fill facter availably; when TiO2 doping concentration for Eu3+ was 2.0mol%, a short circuit current of 0.389mA, an open circuit voltage of 0.6006V and a fill factor of 0.60 were obtained, which was remarkably better than of undoped TiO2 film electrode; and the optimal thickness attained in this work was 17.2um.
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6

Mathi Vathani, A., S. Dhanalakshmi, N. Jeyakumaran, and N. Prithivikumaran. "Fabrication of Al–TiO2 Thin Film Electrode by Spray Pyrolysis Technique for Urea Sensing." Journal of Nanoscience and Nanotechnology 20, no. 5 (May 1, 2020): 2887–92. http://dx.doi.org/10.1166/jnn.2020.17447.

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A simple cost effective Al–TiO2 thin film electrode was fabricated for urea sensing. Urea is the key end product of nitrogen metabolism in humans. Increased level of urea leads to loss of kidney function. Thus determination of urea is important in analysis of kidney diseases. Al–TiO2 thin films were deposited with different concentration of Al by Spray pyrolysis technique. The X-ray diffraction (XRD) pattern reveals the anatase phase of the Al–TiO2 thin films with tetragonal structure. A shift is observed in the XRD peak position compared to as prepared TiO2 thin film indicates the incorporation of Al ions into Ti ions. The UV-Vis spectroscopy study shows that the absorption increases and the absorption peak shifts towards the visible region for Al–TiO2 thin films compared with that of the as prepared TiO2 thin film. The optical band gap values changes with the change in the Al concentration in TiO2 thin films. The electrochemical analysis for optimized Al–TiO2 thin film electrode was carried out by cyclic voltammetry (CV) method. CV studies of Al–TiO2 thin film electrode show the good stability and linearity which is essential to fabricate biosensor. The sensor response to urea is linear with correlation coefficient of 0.944 and the sensitivity is 3.17 μA mM−1 cm−2.
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7

Khamkhash, Laura, Svetlana Em, Anara Molkenova, Yoon-Hwae Hwang, and Timur Sh Atabaev. "Crack-Free and Thickness-Controllable Deposition of TiO2–rGO Thin Films for Solar Harnessing Devices." Coatings 12, no. 2 (February 8, 2022): 218. http://dx.doi.org/10.3390/coatings12020218.

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The use of thin films consisting of TiO2 and reduced graphene oxide (TiO2–rGO) in solar harnessing devices is gaining momentum thanks to improved charge-transporting characteristics. In this report, we propose a facile spin-coating methodology for the deposition of crack-free and thickness-controllable TiO2–rGO thin films. A range of characterization techniques were utilized to confirm the formation of the TiO2–rGO thin film. Improved charge-transporting properties of TiO2–rGO composite thin films were confirmed by measuring their photoelectrochemical (PEC) activity under simulated solar light illumination. In particular, it was found that the TiO2–rGO composite thin film yielded a better photocurrent response (~151.3 µA/cm2) than the bare TiO2 thin film (~71.6 µA/cm2) at 1.23 eV vs. the reversible hydrogen electrode (RHE). The obtained results suggested that rGO addition remarkably improves the charge-transporting properties in TiO2 films.
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8

Hsieh, Ling Ling, Chen Yu Chang, Huey Lih Shyu, Chi An Tsou, and Hsueh Hsia Lo. "The Inhibition Effect of TiO2/Ag Thin Film on Acinetobacter baumannii." Advanced Materials Research 123-125 (August 2010): 272–75. http://dx.doi.org/10.4028/www.scientific.net/amr.123-125.272.

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The nosocomial infections caused by opportunistic pathogen Acinetobacter baumannii was increasing in recent years. It was known that the attachment of A. baumannii on solid surface was a key factor for infection. This study was conducted to evaluate the inhibitory effect of titanium dioxide (TiO2)/Ag thin film on A. baumannii. In this study, TiO2 thin films were firstly prepared by using the modified impregnation method, then TiO2/Ag thin films were prepared by using the spin-coating with 5000 ppm Ag+. The TiO2/Ag thin film was analyzed by field-emission scanning electron micrographs and X-ray diffractometer. The nano-size and Anatase crystal structure were confirmed. Twenty clinical A. baumannii isolates were examined for the bactericidal effect of TiO2/Ag thin film either in the dark or under visible light activation for 20 min. The inhibition efficiencies of TiO2/Ag thin film under visible light on these 20 isolates ranged from 41% to 90%. The effects of TiO2/Ag thin film in the dark were slightly lower than visible light-activated group. Our results suggested that coating of TiO2/Ag on solid surface in hospital environment might be helpful for the prevention of nosocomial A. baumannii infection.
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9

Amananti, Wilda. "ANALISIS MIKROSTRUKTUR LAPISAN TIPIS TiO2:ZnO YANG DIDEPOSISIKAN DIATAS SUBTRAT KACA DENGAN METODE SPRAY COATING UNTUK DEGRADASI LIMBAH ZAT WARNA." EKSAKTA: Berkala Ilmiah Bidang MIPA 18, no. 02 (November 30, 2017): 210–15. http://dx.doi.org/10.24036/eksakta/vol18-iss02/81.

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TiO2 is known as a good material candidate for environmental pollutant degradation. A combination of ZnO and TiO2 in the hope of enhancing the ability of ZnO in degrading the dye liquids. Precursor solutions TiO2, ZnO and TiO2: ZnO are deposited using sol-gel method of Spray Coating Technique. Microstructures of TiO2 and TiO2: ZnO thin films with and without the ZnO buffer layer were observed using X-Ray Diffraction (XRD). The photocatalyst activity was tested on Direct Blue degradation. The results conclude that TiO2: ZnO and ZnO thin films can form well above the glass substrate shown by the appearance of peaks of either ZnO or TiO2. But for TiO2 thin layers do not munujukan good results. The incorporation of TiO2: ZnO causes a lattice strain on the thin TiO2: ZnO film resulting in the narrowing of the energy band gap, resulting in increased photocatalytic capability of the thin film. TiO2: ZnO thin film has better photocatalytic capability than TiO2 or ZnO thin films.
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10

Chien, Dang Tran, Pham Duy Long, Pham Van Hoi, and Le Ha Chi. "Nanocomposite Thin Film TiO2/CdS Electrodes Prepared by Thermal Evaporation Process for Photovoltaic Applications." Communications in Physics 21, no. 1 (June 24, 2011): 57. http://dx.doi.org/10.15625/0868-3166/21/1/95.

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The incorporation of cadmium sulfide (CdS) into TiO2 nanoparticle thin films was investigated. The nanoparticle TiO2 thin film onto an indium doped–tin oxide (ITO) substrate was deposited by Electron Beam Deposition (EBD) combined with thermal process. Then a CdS thin film was vacuum-deposited onto the pre-deposited TiO2 film by a thermal evaporation technique. The obtained TiO2/CdS was characterized by X-ray diffraction (XRD), field emission scanning electron microscope (FE-SEM). The TiO2/CdS nanocomposite film was used in a photo-electrochemical (PEC) cell as a working electrode and a platinum electrode as a counter electrode. The electrolyte solution contains 1 M KCl and 0.1M Na2S. The results show that the cell with TiO2/CdS composite film electrode has significantly improved photoelectric capability in comparison with that of the pure TiO2 thin films.
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11

Wang, Li Li, Yi Wei Zhang, Chun Mei Zhang, Zheng Duo Wang, and Tao Meng. "Characterization of TiO2 Thin Films Prepared by Vacuum Evaporation." Advanced Materials Research 887-888 (February 2014): 783–86. http://dx.doi.org/10.4028/www.scientific.net/amr.887-888.783.

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The TiO2 thin films were prepared by vacuum evaporation on glass using TiO2 powder 99.99% as coating material and with varying deposition speed. The TiO2 thin films were characterized by a-step device, X-ray diffraction (XRD), atomic force microscope (AFM). The influence of deposition rate were discussed. The results indicated that thickness of the TiO2 thin film was prepared under the deposition rate of 4Å/sec was 200 nm at room temperature, with amorphous structure. The film changed to anatase crystal structure when was annealed at 450 °C for one hour and the TiO2 thin film was uniform and well combined with the glass substrate.
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12

Yamamoto, Kunio, Kenji Sakai, and Shinzo Yoshikado. "Preparation of TiO2 Thin Films by Electrophoresis Deposition Method for Dye-Sensitized Solar Cells." Key Engineering Materials 350 (October 2007): 151–54. http://dx.doi.org/10.4028/www.scientific.net/kem.350.151.

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The purpose of this study is to prepare high-quality TiO2 thin films for dye-sensitized solar cells using the electrophoresis method. A high-quality TiO2 thin film has a thickness of approximately 10 μm and no crack on the surface. In this study, TiO2 thin films were deposited by changing the configuration of electrophoresis electrodes. When electrodes were set parallel to horizontal and ITO glass substrate was set in the upper electrode, an excellent TiO2 thin film of approximately 10 μm thickness was obtained by depositing very thin TiO2 films as a buffer layer. The new film has the highest open-circuit voltage and short-circuit current density.
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13

Gao, Fei, Xiao Yan Liu, Li Yun Zheng, Mei Xia Li, and Rui Jiao Jiang. "Studies on the Microstructure and Properties of TiO2/(Ag) Thin Films." Advanced Materials Research 503-504 (April 2012): 378–81. http://dx.doi.org/10.4028/www.scientific.net/amr.503-504.378.

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TiO2/(Ag) thin films were prepared by DC magnetron sputtering. The effects of Ag-doping on the microstructure and properties were compared studied by atomic force microscopy (AFM), X-ray diffraction (XRD), UV-Vis spectra and photocatalysis tesing, respectively. The results show that when doped with Ag, the surface of TiO2 thin film was improved and the growth of anatase phase was promoted. The absoption properties of Ag-doped TiO2 thin film was enhanced dramatically compared with that of TiO2 thin film. And the photocatalysis properties of Ag-doped TiO2 thin film was increased twice as well.
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14

Dundar, Ibrahim, Marina Krichevskaya, Atanas Katerski, Malle Krunks, and Ilona Oja Acik. "Photocatalytic Degradation of Different VOCs in the Gas-Phase over TiO2 Thin Films Prepared by Ultrasonic Spray Pyrolysis." Catalysts 9, no. 11 (November 2, 2019): 915. http://dx.doi.org/10.3390/catal9110915.

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In this study, we deposited TiO2 thin films onto borosilicate glass by ultrasonic spray pyrolysis at 350 and 450 °C. The aim of study is to determine the effect of deposition temperature on photocatalytic activity of TiO2 thin films and to investigate the performance of TiO2 thin films on photocatalytic degradation of methyl tert-butyl ether (MTBE), acetone, acetaldehyde, and heptane as functions of different operating parameters. TiO2 thin films deposited at 350 and 450 °C have a thickness value of 190 and 330 nm, respectively. All as-prepared TiO2 films possess an anatase crystalline structure. According to the X-ray photon spectroscopy (XPS) study, the TiO2 thin film deposited at 350 °C showed a higher amount of oxygen vacancies and hydroxyl groups on the film surface after UV treatment. The aged-TiO2 thin film deposited at 350 °C showed a water contact angle (WCA) value of 0° after 10 min UV irradiation, showing superhydrophilic surface behavior. The TiO2 film deposited at 350 °C exhibited the highest amount of conversion of MTBE (100%). The results also showed that TiO2 films are capable of photocatalytic degradation of MTBE (100%) and acetaldehyde (approx. 80%) in humid air conditions and high airflow rate. The visible-light-activity of TiO2 thin films was tested with 5 ppm MTBE and acetone. TiO2 thin films deposited at 350 °C with a surface area of 600 cm2 showed 60% of MTBE and 33% of acetone degradation under VIS light.
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15

Lu, Chung Hsin, Jen Hsien Huang, Hsieh Hsin Chen, and Po Hsiung Huang. "Preparation and Characterization of Titania Thin Films." Key Engineering Materials 317-318 (August 2006): 569–72. http://dx.doi.org/10.4028/www.scientific.net/kem.317-318.569.

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TiO2 sol with steady suspension and high photocatalytic activity was prepared via a precipitation-peptization method. The XRD results indicate that the TiO2 sol exhibited an anatase structure. TiO2 films on woven fabrics (carbon, PET and Nylon), prepared via dip-coating with TiO2 sol, were characterized by XRD and SEM analysis. The dependence of the woven fabrics properties on the amount of TiO2 coated and photocatalytic activity were also studied. When the diameter of fibers is smalle, large quantity of TiO2 is coated on woven fabrics leading to an improvement in the photocatalytic activity. It is observed that the photocatalytic activity of TiO2 film coated on woven fabrics exceeds that of TiO2 film coated on common glass substrate with the same surface area.
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16

Zhang, Wen Jie, Jia Wei Bai, and Jia Fu. "Photoelectrocatalytic Degradation of Methyl Orange on Porous TiO2 Film Electrode in NaCl Solution." Advanced Materials Research 213 (February 2011): 15–19. http://dx.doi.org/10.4028/www.scientific.net/amr.213.15.

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Porous TiO2 films and smooth TiO2 films were fabricated by sol-gel dip-coating technique using titanium plate as support substrate. Photoelectrocatalytic (PEC) degradation of methyl orange was investigated in aqueous NaCl solution using the TiO2 films. PEC degradation efficiencies showed strong dependence on the concentrations of aqueous NaCl solutions and applied potentials. Photoelectrocatalytic activity of the porous TiO2 film was higher than that of the smooth TiO2 film at lower applied potential. 95.2% decolorization of the dye could be achieved in 50 minutes at applied potential of 0.6 V in 0.05 M NaCl solution on porous TiO2 films, while the efficiency was only 79.9% on smooth TiO2 films. Electrodegradation (ED) of these two film electrodes almost had no effect on methyl orange. Photocatalytic oxidation (PCO) degradation was 36.4% for the porous TiO2 thin film after 80 min, and 32.6% for the smooth TiO2 thin film during the same condition.
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17

Ma, Jian Wei, Gang Xu, and Lei Miao. "Vanadium Dioxide Thin Films Deposited on TiO2 Buffer Layer for Smart Thermochromic Glazing of Windows." Advanced Materials Research 374-377 (October 2011): 1365–68. http://dx.doi.org/10.4028/www.scientific.net/amr.374-377.1365.

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Vanadium dioxide (VO2) films were prepared on quartz glass and TiO2-coated quartz glass substrates by reactive RF-magnetron sputtering. The VO2 thin film with film thickness of 50 nm deposited on quartz glass substrates showed two kinds of regions with different color visible to the naked eye, i.e., the earth yellow region and the cyan region. Both XRD and Raman spectroscopy showed that the different color regions of the films had the different crystallinity quality and phase composition. Whereas, the VO2 thin films with film thickness of 50 nm fabricated on TiO2-coated quartz glass (with TiO2 film thickness of 50 nm) had uniform color and exhibited a larger change in transmittance at near infrared region than the VO2 thin films deposited on quartz glass did. A TiO2 buffer layer improved the crystallinity and uniformity of the VO2 film. Such very thin VO2 films with a TiO2 buffer layer have high potential for practical application in smart thermal glazing of windows.
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18

Wellia, Diana Vanda. "SINTESIS LAPISAN TIPIS TiO2 BERPORI YANG DIMODIFIKASI OLEH NITROGEN DENGAN METODE PEROKSO SOL-GEL, KARAKTERISASI DAN APLIKASINYA SEBAGAI MATERIAL PEMBERSIH DIRI (SELF CLEANING MATERIAL)." Jurnal Riset Kimia 9, no. 2 (October 21, 2017): 6. http://dx.doi.org/10.25077/jrk.v9i2.286.

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The photocatalytic properties of TiO2 compound in anatase phase can be activated under visible light by nitrogen modification and its ability can be increased by generated porous structure using polietilen glikol (PEG) on TiO2 thin film surface. The porous N/TiO2 thin films were prepared by heating aqueous peroxotitanate thin films by addition of polietilen glikol (PEG) deposited uniformly on superhydrophilic uncoated glass at 500 oC for 1 h. The result of X-ray diffraction (XRD) confirmed the resence of only anatase phase for all samples. The UV-Vis spectroscopy showed the synthesized porous N/TiO2 thin films exhibit the absorption in the visible range (400-500 nm). Photocatalytic activity of porous N/ TiO2 thin films were evaluated by using fourier transform-infrared spectroscopy (FTIR) to determine the ability of this photocatalyst for stearic acid degradation under visible light irradiation. The result showed that N/TiO2/PEG-2.1 thin film degraded the stearic acid was about 87,86%, which was 1,12 times higher than that of N-doped TiO2 and 9,9 times higher than that of undoped TiO2 thin film.
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19

Gao, Zhan Jun, Qing Yang, Qing Li, Jin Cui, and Zi Sheng Zhang. "Effects of Sn Ion on Photocatalytic Performances of Titanium Dioxide Thin Film." Applied Mechanics and Materials 707 (December 2014): 77–80. http://dx.doi.org/10.4028/www.scientific.net/amm.707.77.

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In order to improve the photocatalytic efficiency of TiO2, through adding different concentration of Sn ion, the photocatalytic performances of TiO2 thin films are changed. X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS) spectrum of TiO2 thin films before and after doping Sn ion are compared, and the transmission spectrum and optical absorption spectrum of TiO2 thin film are analyzed. The results show that: after the implantation of Sn ion, there is a new compound Ti1-xSnxO2 on the TiO2 film’s surface, which has a higher photocatalytic activity than pure TiO2. In addition, Sn/TiO2 film has broaden the scope of its light response after ion implantation, so that it can be more effectively in using light source to send out the photons of longer waveband, and makes the photocatalytic activity of Sn/TiO2 thin films increase.
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20

Phung, Hang Nguyen Thai, Van Nguyen Khanh Tran, Lam Thanh Nguyen, Loan Kieu Thi Phan, Phuong Ai Duong, and Hung Vu Tuan Le. "Investigating Visible-Photocatalytic Activity of MoS2/TiO2 Heterostructure Thin Films at Various MoS2 Deposition Times." Journal of Nanomaterials 2017 (2017): 1–6. http://dx.doi.org/10.1155/2017/3197540.

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MoS2/TiO2 heterostructure thin films were fabricated by sol-gel and chemical bath deposition methods. Crystal structure, surface morphology, chemical states of all elements, and optical property of the obtained thin films were characterized by using X-ray diffraction, scanning electron microscopy, X-ray photoelectron spectroscopy, and UV-Vis spectroscopy techniques, respectively. Photocatalytic activity of all thin films was evaluated by measuring decomposition rate of methylene blue solution under visible light irradiation. The results indicate that ultrathin MoS2 film on TiO2-glass substrate improves photocatalytic activity of TiO2 in the visible light due to the efficient absorption of visible photon of MoS2 few layers and the transfer of electrons from MoS2 to TiO2. All MoS2/TiO2 heterostructure thin films exhibit higher visible light photocatalytic activity than that of pure MoS2 and TiO2 counterparts. The best MoS2/TiO2 heterostructure thin film at MoS2 layer deposition time of 45 minutes can decompose about 60% MB solution after 150 minutes under visible light irradiation. The mechanism of the enhancement for visible-photocatalytic activity of MoS2/TiO2 heterostructure thin film was also discussed.
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21

Li, Li Na, Jing Hua Gu, and Yue Zhang. "Visible-Light Photodegradation of Rhodamine B on Carbon Doped Titanium Oxide Thin Film Prepared by Atmospheric MOCVD." Advanced Materials Research 26-28 (October 2007): 633–36. http://dx.doi.org/10.4028/www.scientific.net/amr.26-28.633.

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Carbon doped TiO2 and pure TiO2 thin films were prepared by atmospheric metal organic chemical vapor deposition (MOCVD) method. Both pure TiO2 and carbon doped TiO2 films are in anatase structure. X-ray photoelectron spectra (XPS) of the carbon doped TiO2 film indicate carbon atoms occupy oxygen sites and form Ti-C bonds in TiO2 lattice. In UV-VIS absorption spectra, it can be found that the carbon doped TiO2 film has a red-shifted absorption edge compared with the pure TiO2 film. In the photocatalytic decomposition experiment of Rh.B, carbon doped TiO2 exhibited remarkably visible light activity.
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22

Ibrahim, Suhaina M., Nobuaki Negishi, Abdul Kadir Masrom, Babak Mazinani, Anita Ramli, Aishah Isnin, and Mohamad Zahid Abdul Malek. "TiO2 Transparent Thin Film for Eliminating Toluene." ISRN Nanotechnology 2012 (July 5, 2012): 1–9. http://dx.doi.org/10.5402/2012/262703.

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TiO2 nanoparticles undergo a single-phase transition: from amorphous to anatase when calcined at 450°C. It can be noticed from the XRD and AFM results that the particle size of TiO2 is below 30 nm. Results from viscometer and UV-Vis analysis showed that the film thickness is closely related to the viscosity of dip-coating solutions. It was found that the contact angle for water decreased after being illuminated with UV light at certain periods of time. This indicates that these films exhibit hydrophilic properties that can be used on self-cleaning surfaces and antifogging mirrors. Heterogeneous photocatalytic oxidation allows the oxidation of airborne volatile organic compounds (VOCs) into carbon dioxide and water in the presence of a semiconductor catalyst and UV light source. Titanium dioxide, due to its chemical stability, nontoxicity, and low cost, represents one of the most efficient photocatalysts. Photocatalytic activity of the TiO2 thin films was evaluated by using toluene and results showed that this film is successful in decomposing toluene.
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23

Kaczmarek, Danuta, Jaroslaw Domaradzki, Damian Wojcieszak, Eugeniusz Prociow, Michal Mazur, Frank Placido, and Steffen Lapp. "Hardness of Nanocrystalline TiO2 Thin Films." Journal of Nano Research 18-19 (July 2012): 195–200. http://dx.doi.org/10.4028/www.scientific.net/jnanor.18-19.195.

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In this work results of hardness investigations of nanocrystalline TiO2 thin films are presented. Thin films were prepared by low pressure hot target reactive sputtering (LPHTRS) and high energy reactive magnetron sputtering (HERMS). In both processes a metallic Ti target was sputtered under low pressure of oxygen working gas. After deposition by LPHTRS TiO2 thin films with anatase structure were obtained and after additional post-process annealing at 1070 K, these films recrystallized into the rutile structure. Annealing also resulted in an increase of average crystallite size from 33 nm (for anatase) to 74 nm (for rutile). The HERMS process is a modification of the LPHTRS process with the addition of an increased amplitude of unipolar voltage pulses, powering the magnetron. This effectively increases the total energy of the depositing particles at the substrate and allows dense, nanocrystalline (8.7 nm crystallites in size) TiO2 thin film with the rutile structure to be formed directly. The hardness of the films was determined by nanoindentation. The results showed that the nanocrystalline TiO2-rutile thin film as-deposited using HERMS had high hardness (14.3 GPa), while the TiO2-anatase films as-deposited by LPHTRS, were 4-times lower (3.5 GPa). For LPHTRS films recrystallized by additional annealing, the change in thin film structure from anatase to rutile resulted in an increase of film hardness from 3.5 GPa to only 7.9 GPa. The HERMS process can therefore produce the TiO2 rutile structure directly, with hardness that is 2 times greater than rutile films produced by LPHTRS with additional annealing step.
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Lai, Min, and Haibo Yong. "Synthesis and photocatalytic properties of ultra-smooth TiO2 thin films with superhydrophilicity." International Journal for Innovation Education and Research 6, no. 3 (March 31, 2018): 7–16. http://dx.doi.org/10.31686/ijier.vol6.iss3.976.

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Functional TiO2 films were fabricated on glass substrates by using modified dip coating method. The properties of the films including crystal structures, thickness, surface morphology and optical properties were studied. The film coated once possessed an ultra-smooth surface with a root mean square (RMS) roughness of 2.6 ± 0.7 nm, which was attributed to the effect of N2 flow during the formation of film. The TiO2 films exhibited superhydrophilicity without UV illumination and the superhydrophilic performance was enhanced with the increase of film thickness. Tests on degradation of dyes under UV illumination indicated that the annealing temperature and thickness of the TiO2 films accounted for their photocatalytic performance. An increase of annealing temperature led to a decrease of the amount of defects and the recombination rate of electron-hole pairs. Because of change of film thickness, light absorption and amount of defects of the TiO2 films influenced photocatalytic performance simultaneously.
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25

Endarko, E., and Siti Rabi’atul Adawiyah. "Experimental Study of TiO2 Nanoparticles Fabrication by Sol-gel and Co-precipitation Methods for TiO2/SnO2 Composite Thin Film as Photoanode." Jurnal ILMU DASAR 20, no. 1 (January 22, 2019): 61. http://dx.doi.org/10.19184/jid.v20i1.9154.

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Sol-gel and coprecipitation methods successfully prepared titanium dioxide (TiO2) powders with anatase structure. The TiO2 powders are then used to fabricate pure TiO2 thin-film or mixed with SnO2 powders for the TiO2/SnO2 composite thin film. Furthermore, the structural, morphological, as well as the optical properties of films were also investigated. The results showed that the synthesized thin-film of TiO2 powders by sol-gel method obtained better crystallinity and microstructure compared to the synthesized thin film by co-precipitation method. In the DSSC system, these features are needed to increase the electron mobility that responsibility for transport and recombination of photoexcited electrons. SEM images exhibited the smooth surface and uniform in particle size obtained by the addition of SnO2 powders in composite films. The composite thin film also indicated a higher transmittance value. Keywords: sol-gel,co-precipitation,anatase, composite.
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26

Kim, Sang-Cheol, Sung-Hong Hahn, Eui-Jung Kim, Chung-Woo Lee, Jong-Hyun Joo, and Goo-Cheol Kim. "Characteristics of TiO2 and Ag/TiO2 optical thin film by Co-sputtering method." Korean Journal of Optics and Photonics 16, no. 2 (February 1, 2005): 168–73. http://dx.doi.org/10.3807/kjop.2005.16.2.168.

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Hanini, Faouzi, Abderrahmane Bouabellou, Yassine Bouachiba, Adel Taabouche, Fouad Kermiche, Mohamed Mahtali, and Zahia Daas. "Elaboration and Characterization of in Doped TiO2 Thin Films." Defect and Diffusion Forum 397 (September 2019): 59–68. http://dx.doi.org/10.4028/www.scientific.net/ddf.397.59.

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Undoped and indium (In) doped TiO2 thin films were deposited by sol-gel method onto glass substrates. Structural, optical and electrical properties of films were studied. X-rays diffraction patterns showed that the TiO2 films consist of anatase phase. AFM images revealed that the surface roughness of In:TiO2 films is smoother than that of undoped TiO2 films. UV–Vis transmittance results showed TiO2 films have significant optical absorption in the region of 300–350 nm and are fully transparent in the visible. Both film thickness and refraction index in dependence on the fraction of In doping are derived from TE and TM optical guided modes excited in a prism coupler. The optical gap Eg decreases from 3.50 eV for undoped TiO2 film to 3.43 eV at 2 at.% In doping and then increases for doping with indium at 10 at.%. The electrical characterization shows a maximum electrical conductivity of 2.7 (S/cm) obtained for the film doped with 10 at.% In.
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Rahman, Rohanieza Abdul, Muhammad Al Hadi Zulkefle, Wan Fazlida Hanim Abdullah, and Sukreen Hana Herman. "Effect of Post Deposition Annealing Process on the pH Sensitivity of Spin-Coated Titanium Dioxide Thin Film." Applied Mechanics and Materials 749 (April 2015): 197–201. http://dx.doi.org/10.4028/www.scientific.net/amm.749.197.

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This paper presents an investigation on titanium dioxide (TiO2) thin film, which is used as sensing membrane for Extended-Gate Field Effect Transistor (EGFET) for pH sensing application. TiO2 thin films were deposited using sol-gel spin coating method on indium tin oxide (ITO) substrates. After the deposition, the thin films were annealed at 300 °C for 10 and 15 min, while another sample was annealed at 400 °C for 15 min. The sensitivity measurement was taken using the EGFET setup equipment with constant-current (100 μA) and constant-voltage (0.5 V) biasing interfacing circuit. TiO2 thin film as the pH-sensitive membrane and the working electrode was connected to a commercial metal-oxide semiconductor FET (MOSFET). The MOSFET then was connected to the interfacing circuit. The sensitivity of the TiO2 thin film towards pH buffer solution was measured by dipping the sensing membrane in pH4, pH7 and pH10 buffer solution. For comparison, a sample of bare-ITO was also tested to see its sensitivity. We found that the TiO2 thin film annealed at 400 °C for 15 min gave the highest sensitivity compared to other annealing conditions and also compared to the bare ITO substrate with the value of 44.30 mV/pH. This showed that TiO2 thin film can be used for pH sensing and the post-deposition treatment of the thin film can influence the sensing ability. We also measured the TiO2 thin films’ current – voltage (I-V) characteristics. Relating the I-V characteristic of the thin films and sensitivity, the sensing membrane with higher conductivity gave better sensitivity.
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29

Luo, Ji Hui, Qiu Yue Wen, Shu Liu, Ting Liu, Su Ting Wei, and Ru Yi Yang. "Preparation of TiO2 Thin Films by Sol-Gel Method and Analysis of its Transmittance Based on Computer Image Processing." Key Engineering Materials 842 (May 2020): 121–26. http://dx.doi.org/10.4028/www.scientific.net/kem.842.121.

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TiO2 films were prepared by sol-gel method with butyl titanate, anhydrous ethanol, acetyl acetone and hydrochloric acid as raw materials, which were sintered at 380 °C and 530 °C respectively to obtain TiO2 films. XRD was used for analyzing the crystal structure of TiO2 film, and ImageJ software was used to detect the light transmittance of TiO2 film samples. The results show that the film sintered at 530 °C is brookite structure and the film sintered at 380 °C is anatase structure. The increase of sintering temperature is not conducive to the growth of TiO2 film grains. TiO2 films sintered at 380 °C have good light transmittance.
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30

Zhao, Ming, Da Ming Zhuang, Gong Zhang, Ling Fang, and Min Sheng Wu. "A Study on the Preparation of TiO2-xNx Films by Reactive Deposition and Their Absorption Properties in Visible Region." Materials Science Forum 475-479 (January 2005): 1223–26. http://dx.doi.org/10.4028/www.scientific.net/msf.475-479.1223.

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The nitrogen-doped TiO2 thin films were prepared by mid-frequency alternative reactive magnetron sputtering technique. The N concentration of the nitrogen-doped TiO2 thin films was analyzed by XPS. And the absorption spectra of the films in ultraviolet and visible region were also investigated. The results show that the mid-frequency alternative reactive magnetron sputtering technique is a convenient method for growing TiO2-xNx. Annealing the nitrogen-doped TiO2 thin film in nitrogen atmosphere under 380°C is helpful for increase the concentration of nitrogen in the film, but the ratio of N2 in reactive gas is mainly influence the concentration of nitrogen in the Ti-N bond in the TiO2 film. The increase of the thickness of nitrogen-doped TiO2 films will enhance the absorbability of the film in the ultraviolet and visible region. The wavelength of the absorption edge of TiO2-xNx film with 1.5% nitrogen shift to 441nm from 387nm, which is the absorption edge for undoped TiO2 films.
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31

Mohamat Kasim, Shafaq Mardhiyana, Nor Azira Akma Shaari, Raudah Abu Bakar, and Sukreen Hana Herman. "Switching Behavior of Titania-Zinc Oxide Composites Thin Films." Applied Mechanics and Materials 749 (April 2015): 308–12. http://dx.doi.org/10.4028/www.scientific.net/amm.749.308.

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Single layer of titanium dioxide (TiO2) is common metal oxide in fabricating memristor device. In this study, two types of memristor with composite metal oxide thin films will be demonstrated. The two types of memristor are titanium dioxide (TiO2) thin film coated on zinc oxide (ZnO) thin film and ZnO coated on TiO2 thin film. Sol-gel spin coating method was to coat metal oxide thin film and sputtering method for depositing the metal contact. Platinum (Pt) was selected as the top electrode and indium tin oxide (ITO) as the bottom electrode. The electrical characteristics were defined by performing I-V measurement using two point probe equipment. I-V characteristics showed shape of pinched hysteresis loop for both samples. Sample with TiO2 coated on ZnO has slightly higher Roff/Ron ratio than sample ZnO coated on TiO2 which means it more memristive than another one. The cross-section of sample with TiO2 coated on ZnO had been performed as well by using Field-Emission Scanning Electron Microscopy (FESEM).
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32

Al-Jufairi, N. "Structure and Surface Properties of Anatase TiO2 Thin Film by Sol-Gel Technique." Materials Science Forum 517 (June 2006): 165–72. http://dx.doi.org/10.4028/www.scientific.net/msf.517.165.

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TiO2 coating films of 50-200nm thickness were prepared by the sol-gel technique using hydrolysis of titanium isopropoxide (TIP) in an attempt to study structure and surface properties of anatase at ambient temperature. The anatase phase is exhibited by the XRD peak at 2θ'=25o with orientation in (101), the crystal parameters of XRD for TiO2 thin films (50-200 nm), were varied depending on the thickness of film and substrate type. An annealing temperature and annealing time had an effect on the film surface quality and exhibit porosity and aggregates in the films. The surface of TiO2 thin film showed cluster particles through SEM and the shrinkage rate on the film increased as a result of heat treatment during annealing process. The film was uniform and homogeneous under AFM investigate. EDS have determined the stochiometric ratio of TiO2 film.
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33

Yang, Shumin, Ao Wang, Xin Li, Guochao Shi, Yunkai Qi, and Jianjun Gu. "Tuning Structural Colors of TiO2 Thin Films Using an Electrochemical Process." Molecules 27, no. 15 (August 3, 2022): 4932. http://dx.doi.org/10.3390/molecules27154932.

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TiO2 films exhibiting structural colors were successfully prepared using one-step electrochemical oxidation. Results of theoretical analyses and digital simulations revealed that the structural color of a TiO2 thin film could be regulated by adjusting oxidation voltage and oxidation time with different oxidation voltages leading to changes in structural color annulus number. At a low oxidation voltage, each thin film exhibited a single structural color, while thin films with different structural colors were obtained by varying the oxidation time. By contrast, at a higher oxidation voltage, each film exhibited iridescent and circular structural color patterns associated with symmetrical decreases in surface oxidation current density along radial lines emanating from the film center to its outer edges. TiO2 films exhibiting iridescent structural colorations have broad application prospects in industrial fields related to photocatalysis and photovoltaic cells.
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34

Lin, Ching Hsing, Chen Yu Chang, Yu Jie Chang, Yao Chuan Lee, Mei Yin Hwa, and Yu Sen Chang. "Photosensitization of Dye/TiO2 Thin Films by Using Natural Dye of TCPP." Advanced Materials Research 123-125 (August 2010): 923–26. http://dx.doi.org/10.4028/www.scientific.net/amr.123-125.923.

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The Dye-Sensitized TiO2 thin film fabricated by TiO2 nanoparticles is a novel technology with advantage in low cost, little pollution and simple in manufacturing process. The fiber-shaped reacting sites provide enlarged photo-sensing area of the TiO2 thin films. Natural dye of TCPP was applied to improve the photo absorbability in this study. Besides, a novel plasma surface activation technique employed on the thin film showed well performance compared with previous reports by heating methods. The SEM images demonstrate that the nano-TiO2 composites deposited on the fiber substrate. Degradation of acetone under 365 and 420 nm light irradiation were conducted to evaluate the photocatalytic ability of the TiO2 and TCPP/TiO2 thin films. While TiO2 thin films gel catalyst showed good photocatalytic performance with a high degradation efficiency of 99.9%, only about 80% conversion efficiency was achieved by the TCPP/TiO2 thin films reactor under 365 nm light irradiation. Although the TCPP dye on TiO2 nanoparticle shows beneficial reflection intensity in 420 nm, the acetone degradation capability of TiO2 and TCPP/ TiO2 thin films reactor decreased about 30% and 25% respectively compared with the degradation efficiency under 365 nm.
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35

Nishimoto, Naoki, Katsumi Yoshino, and Junko Fujihara. "Growth of TiO2–Nb2O5 mixed thin films by metal–organic decomposition." International Journal of Modern Physics B 29, no. 30 (November 18, 2015): 1550215. http://dx.doi.org/10.1142/s021797921550215x.

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The influence of mixed metal–organic decomposition (MOD) coating materials has been studied based on the crystal growth of TiO2 and TiO2–Nb2O5 mixed thin films. These thin films were grown on quartz substrates using a dip-coating method. The crystal structures of TiO2 films are well known to depend on sintering temperature, whereas the surface morphologies are not significantly affected by sintering temperature. Nb2O5 was mixed with the TiO2 source material as a possible electron donor. The Nb content of the TiO2–Nb2O5 mixed thin film depended on the Nb mole ratio in the TiO2–Nb2O5 mixed MOD coating material. Large crystal grains were observed with increasing Nb content in the TiO2–Nb2O5 mixed thin film, although Nb was inactive as a donor. It can be concluded that Nb enhances the growth of TiO2 by MOD. This enhancement of crystal growth by the intentional addition of an impurity can be expected to improve the characteristics of other semiconductor materials grown by wet processes.
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36

Wang, Jun, and Ling Yun Bai. "Properties of TiO2 Thin Film Prepared by Sol-Gel Dip Coating." Applied Mechanics and Materials 723 (January 2015): 528–31. http://dx.doi.org/10.4028/www.scientific.net/amm.723.528.

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TiO2 thin films were prepared on glass substrates by sol-gel method. The effect of withdraw speed on the thickness and optical properties of TiO2 thin films was investigated. The films were transparent in the visible wavelength. The thickness of the TiO2 films was increased from 90 nm for the withdraw speed of 1000 μm/s to 160 nm for the withdraw speed of 2000 μm/s. While, The refractive index of the TiO2 thin film decreased from 2.38 to 2.07. It may be due to the porosity of the film was increased. The optical band-gap of the films was around 3.45 eV.
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37

Halin, Dewi Suriyani Che, Kamrosni Abdul Razak, Mohd Arif Anuar Mohd Salleh, Mohd Izrul Izwan Ramli, Mohd Mustafa Al Bakri Abdullah, Ayu Wazira Azhari, Kazuhiro Nogita, Hideyuki Yasuda, Marcin Nabiałek, and Jerzy J. Wysłocki. "Microstructure Evolution of Ag/TiO2 Thin Film." Magnetochemistry 7, no. 1 (January 16, 2021): 14. http://dx.doi.org/10.3390/magnetochemistry7010014.

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Ag/TiO2 thin films were prepared using the sol-gel spin coating method. The microstructural growth behaviors of the prepared Ag/TiO2 thin films were elucidated using real-time synchrotron radiation imaging, its structure was determined using grazing incidence X-ray diffraction (GIXRD), its morphology was imaged using the field emission scanning electron microscopy (FESEM), and its surface topography was examined using the atomic force microscope (AFM) in contact mode. The cubical shape was detected and identified as Ag, while the anatase, TiO2 thin film resembled a porous ring-like structure. It was found that each ring that coalesced and formed channels occurred at a low annealing temperature of 280 °C. The energy dispersive X-ray (EDX) result revealed a small amount of Ag presence in the Ag/TiO2 thin films. From the in-situ synchrotron radiation imaging, it was observed that as the annealing time increased, the growth of Ag/TiO2 also increased in terms of area and the number of junctions. The growth rate of Ag/TiO2 at 600 s was 47.26 µm2/s, and after 1200 s it decreased to 11.50 µm2/s and 11.55 µm2/s at 1800 s. Prolonged annealing will further decrease the growth rate to 5.94 µm2/s, 4.12 µm2/s and 4.86 µm2/s at 2400 s, 3000 s and 3600 s, respectively.
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Hussin, Rosniza, Nur Syahraain Zulkiflee, Zakiah Kamdi, Ainun Rahmahwati Ainuddin, Zawati Harun, and Mohamed Nasrul Mohamed Hatta. "Photocatalytic Activity of Bilayer TiO2/ZnO and ZnO TiO2 Thin Films." Materials Science Forum 1010 (September 2020): 411–17. http://dx.doi.org/10.4028/www.scientific.net/msf.1010.411.

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Thin film is a thin material that is resulting from the condensation of species through the deposition of atoms on the substrate. Thin films are usually used in the production of electronic devices, optical coatings, solar cells, and for decorative items. The bilayer of TiO2/ZnO and ZnO TiO2 thin films have some advantages such as can enhance the surface state and surface atomic mobility, which are useful for improving the photocatalytic activity. The motivation to a used double layer of ZnO and TiO2 is to enhance the properties and photocatalytic activity using the different deposition temperature between the layers. The structural of ZnO/TiO2 thin films were studied using X-Ray diffraction (XRD). Field Emission Scanning Electron Microscope (FESEM) was used to determine the surface morphology of ZnO/TiO2 thin films. The photocatalytic activity of ZnO/TiO2 thin films was analysed using the photodegradation of methylene blue (MB) solution. The XRD analysis revealed that highest anatase crystalline phase for TiO2 growth with orientation (1 0 1), while the ZnO crystal phase, zincite occurred at the highest intensity with (1 0 1) orientation.. The bilayer TiO2/ZnO thin film had the highest reaction rate, K, which is 0.0972 h-1 for photocatalytic activity. The characteristics of bilayer TiO2/ZnO and ZnO/TiO2 thin-film is strongly influenced by the calcination temperature and the presence and combination between the two types of materials.
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39

QADER, O. B., Y. RUISHENG, K. CHAUDHARY, F. F. MUHAMMAD, M. Y. YAHYA, M. R. AHMAD, F. D. ISMAIL, and J. ALI. "TiO2 DOPED PDPP3T NANOCOMPOSITE THIN FILM FOR PHOTOVOLTAIC APPLICATION." Digest Journal of Nanomaterials and Biostructures 15, no. 1 (January 2020): 25–32. http://dx.doi.org/10.15251/djnb.2020.151.25.

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In present work, an inorganic dopant TiO2 nanoparticles are introduced into the PDPP3T polymer host material and deposited as thin films via spin coating. Different solvent are investigated to get efficient dispersion of TiO2 nanoparticles as well as effective dissolution of PDPP3T material. The role of TiO2 particles towards optical absorption of PDPP3T material is studied by preparing different PDPP3T/TiO2 blend ratios and annealed at different temperatures. Toluene is found an efficient solvent for the dispersion of TiO2 nanoparticles as well as dissolution of PDPP3T material. Significant increase in optical absorption in UV region 300-400nm is observed for the PDPP3T/TiO2 blend ratio 1:0.2 and the annealing temperature 310oC. The deposited thin film with four layers have demonstrated significant blue shift in peak wavelength and increase in the absorption in UV region (300-400nm). XRD analysis reveals amorphous nature of all deposited thin film. No significant variations in chemical structure are observed with increase in thickness of deposited layer. The addition of TiO2 particle in PDPP3T material significantly enhanced the optical absorption in UV region.
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40

Godoy Junior, Armstrong, André Pereira, Marcilene Gomes, Mariana Fraga, Rodrigo Pessoa, Douglas Leite, Gilberto Petraconi, et al. "Black TiO2 Thin Films Production Using Hollow Cathode Hydrogen Plasma Treatment: Synthesis, Material Characteristics and Photocatalytic Activity." Catalysts 10, no. 3 (March 2, 2020): 282. http://dx.doi.org/10.3390/catal10030282.

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Black TiO2 materials have been quite widely explored due to their large solar absorption and superior photocatalytic activity. In this paper, the blackening process of titanium dioxide (TiO2) thin film using the hollow cathode hydrogen plasma (HCHP) technique is reported. First, pristine anatase TiO2 films were grown by magnetron sputtering onto silicon and cover glass substrates and then annealed at 450 °C for 2 h. Then, the as-grown TiO2 films were treated with HCHP for 15 min. The physical, chemical and morphological properties of the films were analyzed by profilometry, X-ray diffraction (XRD), UV-Vis spectrophotometry, Raman spectroscopy, X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM) techniques. Electrical and photocatalytic measurements were performed by four-point probe and methylene blue UV degradation assays, respectively. The results showed that the black TiO2 film is highly absorbent in the UV-visible region, has low electrical resistance and greater surface area compared to the non-treated TiO2 film. These properties of black TiO2 film, as well as its performance as a photocatalytic agent, were investigated, indicating the superior quality of this material in thin film form and the promising potential of the HCHP treatment to produce hydrogenated TiO2 in short process time.
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41

Kim, Byunguk, Yeonsik Choi, Dahyun Lee, Seonghak Cheon, Younghun Byun, and Hyeongtag Jeon. "Atomic layer deposition for rutile structure TiO2 thin films using a SnO2 seed layer and low temperature heat treatment." Nanotechnology 33, no. 11 (December 22, 2021): 115701. http://dx.doi.org/10.1088/1361-6528/ac40c2.

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Abstract We study the rutile-TiO2 film deposition with a high-k value using a SnO2 seed layer and a low temperature heat treatment. Generally, heat treatment over 600 °C is required to obtain the rutile-TiO2 film. However, By using a SnO2 seed layer, we obtained rutile-TiO2 films with heat treatments as low as 400 °C. The XPS analysis confirms that the SnO2 and TiO2 film were deposited. The XRD analysis showed that a heat treatment at 400 °C after depositing the SnO2 and TiO2 films was effective in obtaining the rutile-TiO2 film when the SnO2 film was thicker than 10 nm. The TEM/EDX analysis show that no diffusion in the thin film between TiO2 and SnO2. The dielectric constant of the TiO2 film deposited on the SnO2 film (20 nm) was 67, which was more than twice as high as anatase TiO2 dielectric constant (Anatase TiO2 dielectric constant : 15–40). The current density was 10−4 A cm−2 at 0.7 V and this value confirmed that the leakage current was not affected by the SnO2 seed layer.
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42

Niizuma, Kiyozumi, Takahiro Hayakawa, and Yoshio Utsushikawa. "Electrical Property of TiO2 Thin Film Deposited by RF Sputtering." Solid State Phenomena 127 (September 2007): 221–26. http://dx.doi.org/10.4028/www.scientific.net/ssp.127.221.

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The authors investigated on the electrical property and the photo-catalytic activity of TiO2 thin films deposited in Ar+O2 atmosphere by RF magnetron sputtering. From the result of x-ray diffraction, the anatase phase was formed in TiO2 thin films. In TiO2 thin film deposited under a gas pressure of 3.0Pa, the contact angle of water showed 9 ﾟ, and the decomposition rate of Methylene Blue (measuring the absorbance of the reference light) showed -0.067 with UV light irradiation. Moreover, it revealed that the electric resistivity of TiO2 thin film deposited under the same conditions decreased from 8.0×103Ω･m to 1.4×10-2Ω･m with UV light irradiation.
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43

Vilhunen, S. H., and M. E. T. Sillanpää. "Atomic layer deposited (ALD) TiO2 and TiO2−x-Nx thin film photocatalysts in salicylic acid decomposition." Water Science and Technology 60, no. 10 (November 1, 2009): 2471–75. http://dx.doi.org/10.2166/wst.2009.660.

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Degradation of salicylic acid (SA) with thin film photocatalyst, titanium dioxide (TiO2) and nitrogen-doped TiO2 (TiO2−x-Nx) combined with ultraviolet (UV) radiation was studied. TiO2 film with thickness of 15 and 65 nm was tested. The TiO2−x-Nx film had thickness of 15 nm on top of TiO2 (50 nm). Photocatalysts were prepared on glass substrate by atomic layer deposition (ALD) technique. The effect of initial pH (3–10) was studied with SA concentration of 10 mg/l. Decomposition of SA was fastest at pH 6 with both films and the rate was equal at initial pH values 3 and 4.3. However, at higher pH values the non-doped film was more efficient.
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44

Phung, Hang Nguyen Thai, Nguyen Duc Truong, Lam Thanh Nguyen, Kieu Loan Phan Thi, Phuong Ai Duong, and Vu Tuan Hung Le. "Enhancement of the visible light photocatalytic activity of vanadium and nitrogen co-doped TiO2 thin film." Journal of Nonlinear Optical Physics & Materials 24, no. 04 (December 2015): 1550052. http://dx.doi.org/10.1142/s0218863515500526.

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Vanadium and nitrogen co-doped TiO2(TiO2:(V, N)) thin films were fabricated by sol–gel method. Crystal structure, surface morphology, chemical composition and absorption edge of the thin films were characterized by using X-ray diffraction (XRD), scanning electron microscopy (SEM), energy-dispersive X-ray spectroscopy (EDS) and UV-Vis spectroscopy techniques, respectively. Photocatalytic activity of all thin films were evaluated by measuring decomposition rate of methylene blue solution under visible light irradiation. The water contact angle analyzer was used to measure water contact angle on the film. The results indicate that absorption edge of TiO2:(V, N) thin films shifts to visible region. All co-doped TiO2 samples show higher visible light photocatalytic activity than undoped TiO2 and single-element-doped TiO2 counterparts. The best TiO2:(V, N) thin film can decompose about 90% MB solution and gets super wet state after 150[Formula: see text]min under compact light irradiation.
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45

Kurokawa, Yoshiki, Dang Trang Nguyen, and Kozo Taguchi. "Nickel-Doped TiO2 Multilayer Thin Film for Enhancement of Photocatalytic Activity." International Journal of Materials Science and Engineering 7, no. 1 (March 2019): 10–19. http://dx.doi.org/10.17706/ijmse.2019.7.1.10-19.

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46

Kavan, L., J. Rathouský, M. Grätzel, V. Shklover, and A. Zukal. "Mesoporous thin film TiO2 electrodes." Microporous and Mesoporous Materials 44-45 (April 2001): 653–59. http://dx.doi.org/10.1016/s1387-1811(01)00246-3.

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47

Almaev, Aleksei V., Nikita N. Yakovlev, Bogdan O. Kushnarev, Viktor V. Kopyev, Vadim A. Novikov, Mikhail M. Zinoviev, Nikolay N. Yudin, et al. "Gas Sensitivity of IBSD Deposited TiO2 Thin Films." Coatings 12, no. 10 (October 17, 2022): 1565. http://dx.doi.org/10.3390/coatings12101565.

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TiO2 films of 130 nm and 463 nm in thickness were deposited by ion beam sputter deposition (IBSD), followed by annealing at temperatures of 800 °C and 1000 °C. The effect of H2, CO, CO2, NO2, NO, CH4 and O2 on the electrically conductive properties of annealed TiO2 thin films in the operating temperature range of 200–750 °C were studied. The prospects of IBSD deposited TiO2 thin films in the development of high operating temperature and high stability O2 sensors were investigated. TiO2 films with a thickness of 130 nm and annealed at 800 °C demonstrated the highest response to O2, of 7.5 arb.un. when exposed to 40 vol. %. An increase in the annealing temperature of up to 1000 °C at the same film thickness made it possible to reduce the response and recovery by 2 times, due to changes in the microstructure of the film surface. The films demonstrated high sensitivity to H2 and nitrogen oxides at an operating temperature of 600 °C. The possibility of controlling the responses to different gases by varying the conditions of their annealing and thicknesses was shown. A feasible mechanism for the sensory effect in the IBSD TiO2 thin films was proposed and discussed.
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48

Al-Shareef, H. N., D. Dimos, B. A. Tuttle, and M. V. Raymond. "Metallization schemes for dielectric thin film capacitors." Journal of Materials Research 12, no. 2 (February 1997): 347–54. http://dx.doi.org/10.1557/jmr.1997.0050.

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A detailed analysis of Pt/Ti, Pt/TiO2, and Pt/ZrO2 electrodes was carried out to develop a bottom electrode stack for sol-gel derived thin film capacitors. For the Pt/Ti stack, the choice of layer thickness and deposition temperature is found to affect adhesion to the SiO2/Si substrate as well as the extent of hillock formation and Pt–Ti interaction. By using elevated temperature deposition, Pt films close to 1 μm in thickness can be produced with relatively good adhesion and morphological stability using Ti adhesion layers. In addition, Pt films grown on ZrO2 and TiO2 adhesion layers exhibit little morphological change and no degradation in sheet resistance after annealing at 650 °C. However, neither ZrO2 nor TiO2 are as effective as Ti metal in promoting Pt adhesion. Experiments aimed at establishing a correlation between hillock formation and capacitor yield revealed two important results. First, the behavior of Pt/Ti stacks during annealing in air is markedly different from their behavior during PZT film crystallization. Second, preannealing of the Pt/Ti in air prior to PZT film growth actually improves capacitor yield, even though hillock formation occurs during the preannealing treatment. Implications of these results regarding the role of hillocks in controlling capacitor yield are discussed.
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49

Lo, Tzu-Hsuan, Pen-Yuan Shih, and Chiu-Hsien Wu. "The Response of UV/Blue Light and Ozone Sensing Using Ag-TiO2 Planar Nanocomposite Thin Film." Sensors 19, no. 23 (November 20, 2019): 5061. http://dx.doi.org/10.3390/s19235061.

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Abstract:
We successfully fabricated a planar nanocomposite film that uses a composite of silver nanoparticles and titanium dioxide film (Ag-TiO2) for ultraviolet (UV) and blue light detection and application in ozone gas sensor. Ultraviolet-visible spectra revealed that silver nanoparticles have a strong surface plasmon resonance (SPR) effect. A strong redshift of the plasmonic peak when the silver nanoparticles covered the TiO2 thin film was observed. The value of conductivity change for the Ag-TiO2 composite is 4–8 times greater than that of TiO2 film under UV and blue light irradiation. The Ag-TiO2 nanocomposite film successfully sensed 100 ppb ozone. The gas response of the composite film increased by roughly six and four times under UV and blue light irradiation, respectively. We demonstrated that a Ag-TiO2 composite gas sensor can be used with visible light (blue). The planar composite significantly enhances photo catalysis. The composite films have practical application potential for wearable devices.
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50

Wang, Jiao Jiao, Kai Zheng, Christian Rüssel, and Wen Liang. "Preparation and Characterization of TiO2 Photocatalytic Thin Film Prepared by Sol-Gel Dip Coating." Advanced Materials Research 476-478 (February 2012): 2398–402. http://dx.doi.org/10.4028/www.scientific.net/amr.476-478.2398.

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Titanium dioxide thin films have been prepared from tetrabutyl-orthotitanate solution and methanol as a solvent by sol-gel dip coating technique. The thermal properties of TiO2 gel were analyzed by thermogravimetry and differential thermal analysis (TG-DTA). Structural properties of TiO2 thin films at different heat treatment temperatures were analyzed by X-ray diffraction (XRD), Infrared Raman spectroscopy and scanning electron microscopy (SEM). The results show that the TiO2 thin films crystallize in anatase phase at 400 °C and the crystallinity of anatase phase was improved with increasing temperature. The TiO2 thin films crystallize into the anatase-rutile phase at 600 °C and further into the rutile phase at 800 °C. The photocatalytic performance of TiO2 film was tested for the degradation of 2×10-5 mol/L Rhodamine B. The degradation of Rhodamine B solutions reached 0.9×10-5 mol/L after irradiated for 8 h under UV light. The TiO2 thin film exhibited relatively high photocatalytic activity towards degrading Rhodamine B.
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