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Relevant bibliographies by topics / Thin solid film measurement

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Academic literature on the topic 'Thin solid film measurement'

Author: Grafiati

Published: 4 June 2021

Last updated: 8 February 2022

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Journal articles on the topic "Thin solid film measurement"

1

van der Poel, C. J. "Rapid crystallization of thin solid films." Journal of Materials Research 3, no. 1 (February 1988): 126–32. http://dx.doi.org/10.1557/jmr.1988.0126.

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Laser-beam-controlled heating appears to be an excellent technique for driving isothermal transformations in a thin solid film on a thick substrate. The transformation is detected by the change in optical properties of the film as it evolves from the initial to the final state. Results are presented for the amorphous-to-crystalline transition in 100 nm thick films of InSb and of some Te alloys on thick glass substrates. Discrimination between interface growth and homogeneous crystallization can be made from the data. The crystallization of InSb films can be desribed by an Avrami equation with a single activation energy of 154 ± 6 kJ/mol over the full range of measured crystallization times between 100μs and 1000s. For low temperatures the results are consistent with differential scanning calorimetry (DSC) measurements. For Te-alloy films, the large temperature interval covered by the experimental method enables clear observation of the curvature of the temperature-time-transmission (T–t–t) plot.

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Buffeteau, Thierry, François Lagugné-Labarthet, and Claude Sourisseau. "Vibrational Circular Dichroism in General Anisotropic Thin Solid Films: Measurement and Theoretical Approach." Applied Spectroscopy 59, no. 6 (June 2005): 732–45. http://dx.doi.org/10.1366/0003702054280568.

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In this study, the measurement of the true vibrational circular dichroism (VCD) spectrum is considered from an experimental and theoretical approach for any general anisotropic thin solid sample exhibiting linear as well as circular birefringence (LB, CB) and dichroism (LD, CD) properties. For this purpose, we have made use of a simple model α-helix polypeptide, namely, the poly(γ-benzyl-L-glutamate) or PBLG, reference sample possessing a well-known VCD spectrum and giving rise to slightly oriented films by deposition onto a solid substrate. Also, we have used a different Fourier transform infrared modulation of polarization (PM-FTIR) optical setup with two-channel electronic processing in order to record the PM-VLD and PM-VCD spectra for various sample orientations in its film plane. All the corresponding general relations of the expected intensities in these experiments and the related properly designed calibration measurements were established using the Stokes–Mueller formalism; in addition, the residual birefringence of the optical setup and the transmittance anisotropy of the detector were estimated. From a comparative study of the results obtained in solution and in the solid state, we then propose a simple new experimental procedure to extract the true VCD spectrum of an oriented PBLG thin film: its consists of calculating the half-sum of two spectra recorded at θ and at θ ± 90° sample orientations. Moreover, the complete linear and circular birefringence and dichroism properties of the ordered PBLG thin film are estimated in the amide I and amide II vibrational regions. This allows us to establish for any sample orientation various theoretical simulations of the VCD spectra that agree nicely with the observed experimental results; this confirms that the measurement of LD and LB is in this case a prerequisite in simulating the true VCD spectrum of a partly oriented anisotropic sample. This validates our combined experimental and theoretical approach and opens the route to promising future vibrational CD studies on other macroscopic anisotropic thin film samples.

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Suzuki, N. "XPS Measurement of Organic Thin Film on Solid Surface and its Application." Journal of Surface Analysis 16, no. 1 (2009): 12–19. http://dx.doi.org/10.1384/jsa.16.12.

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Moon, Seung Jae. "In Situ Fast Temperature Measurement of Silicon Thin Films during the Excimer Laser Annealing." Key Engineering Materials 326-328 (December 2006): 195–98. http://dx.doi.org/10.4028/www.scientific.net/kem.326-328.195.

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The formation and growth mechanism of polysilicon grains in thin films via laser annealing of amorphous silicon thin films are studied. The complete understanding of the mechanism is crucial to improve the thin film transistors used as switches in the active matrix liquid crystal displays. To understand the recrystallization mechanism, the temperature history and liquidsolid interface motion during the excimer laser annealing of 50-nm thick amorphous and polysilicon films on fused quartz substrates are intensively investigated via in-situ time-resolved thermal emission measurements, optical reflectance and transmittance measurements at near infrared wavelengths. The front transmissivity and reflectivity are measured to obtain the emissivity at the 1.52 μm wavelength of the probe IRHeNe laser to improve the accuracy of the temperature measurement. The melting point of amorphous silicon is higher than that of crystalline silicon of 1685 K by 100-150 K. This is the first direct measurement of the melting temperature of amorphous silicon thin films. It is found that melting of polysilicon occurs close to the melting point of crystalline silicon. Also the optical properties such as reflectance and transmittance are used to determine the melt duration by the detecting the difference of the optical properties of liquid silicon and solid silicon.

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Xu, Zhi Qiang. "Research on Material Thickness and Material Properties with Application of Sensors." Advanced Materials Research 1021 (August 2014): 33–36. http://dx.doi.org/10.4028/www.scientific.net/amr.1021.33.

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With the wide application of thin film technology and optoelectronic devices, optical films have been widely used in the development and production of weapons and special devices for basic research. Faced with constantly updated status quo and development of optical thin film precision measurement of various parameters on a higher requirements, the film thickness is one of the key parameters in film design and manufacturing process. Particularly with the rapid development of nanoscale thin-film technology, the film thickness becomes a hot issue in the research field. For solid film thickness, the main measuring means are screw micrometer, microscopy, interferometry and polarization. Conventional Michelson interferometer can measure thin film thickness which is transparent and known, and the devices with sensors performance better.

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Feng, X., Y. Huang, and A. J. Rosakis. "On the Stoney Formula for a Thin Film/Substrate System With Nonuniform Substrate Thickness." Journal of Applied Mechanics 74, no. 6 (January 14, 2007): 1276–81. http://dx.doi.org/10.1115/1.2745392.

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Current methodologies used for the inference of thin film stress through system curvature measurements are strictly restricted to stress and curvature states which are assumed to remain uniform over the entire film/substrate system. Recently Huang, Rosakis, and co-workers [Acta Mech. Sinica, 21, pp. 362–370 (2005); J. Mech. Phys. Solids, 53, 2483–2500 (2005); Thin Solid Films, 515, pp. 2220–2229 (2006); J. Appl. Mech., in press; J. Mech. Mater. Struct., in press] established methods for the film/substrate system subject to nonuniform misfit strain and temperature changes. The film stresses were found to depend nonlocally on system curvatures (i.e., depend on the full-field curvatures). These methods, however, all assume uniform substrate thickness, which is sometimes violated in the thin film/substrate system. Using the perturbation analysis, we extend the methods to nonuniform substrate thickness for the thin film/substrate system subject to nonuniform misfit strain.

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7

Barylo, G. I., R. L. Holyaka, T. A. Marusenkova, and M. S. Ivakh. "Structure and 3-D Model of a Solid State Thin-Film Magnetic Sensor." Physics and Chemistry of Solid State 22, no. 3 (August 31, 2021): 444–52. http://dx.doi.org/10.15330/pcss.22.3.444-452.

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Vector 3-D magnetic sensors form the basis of measurement devices for magnetic field mapping and magnetic tracking. Typically, such sensors utilize specific constructions based on split Hall structures (SHS). An SHS-based 3-D magnetic sensor is a bulk semiconductor integrated structure with 8 or more contacts. Combining current flow directions through the contacts and measuring the corresponding voltages, one defines projections BX, BY, BZ of the magnetic field vector. This work presents a novel design of 3-D solid state magnetic sensors that requires no insulation by p-n junctions and can be implemented by thin-film technology traditionally used for fabrication of Hall sensors including those based on InSb films. Besides, a SPICE model of the 3-D magnetic sensor is provided, which helps design the proposed sensor and refine techniques of its calibration.

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Zhu, Bei, Cheng Jun Zhu, Shan Chang, Yong Wen Zhang, and Chao Zheng Wang. "Fabrication and Characterization of CIASSe Thin Film Photovoltaic Absorbers Using CIAS Nanocrystals." Advanced Materials Research 512-515 (May 2012): 39–42. http://dx.doi.org/10.4028/www.scientific.net/amr.512-515.39.

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Cu(In0.8Al0.2)(SSe)2 (CIASSe) absorber layers of thin film solar cell were prepared by selenization of Cu(In0.8Al0.2)S2(CIAS) nanocrystals. The CIAS nanocrystals were synthesized by a new solution-based technique and successfully deposited on Mo-coated glass substrates in a one-step process. The phase structure, optical and electrical properties of CIASSe thin films were characterized by power X-ray diffraction (XRD), ultraviolet-visible (UV-Vis) spectrophotometer and the Hall Effect Measurement system. The results showed that single-phase CIASSe solid solution was successfully obtained for a selenization temperature of above 400oC. And the diffraction peaks shifted to the lower angle with an increase in selenization time and selenization temperature. The films selenized at 500oC were found to be p-type and the resistivity was only 0.9484×10-4Ω cm. The optical band gap of the films is 1.508eV and the optical absorption coefficient is over 104cm-1.

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Sato, Morihiro, Takayuki Yamamoto, Munekazu Motoyama, and Yasutoshi Iriyama. "In-situ electronic conductivity measurements of LiNi0.45Mn1.485Cr0.05O4 thin films using all-solid-state thin-film batteries." Electrochemistry Communications 87 (February 2018): 31–34. http://dx.doi.org/10.1016/j.elecom.2017.12.021.

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Aloui, Fethi, Lamia Gaied, Wafik Abassi, Marc Lippert, and Maxence Bigerelle. "Conductimetry technique for the measurement of thin liquid film thickness between two solid surfaces in relative motion: hydrodynamic lubrication." Mechanics & Industry 20, no. 6 (2019): 601. http://dx.doi.org/10.1051/meca/2019035.

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This paper presents an approach for the measurement of a liquid film thickness in contact with a rough surface, based on electrical conductance sensor. This type of sensor consists of two electrodes mounted flush on a wall and using an electrolyte solution representing the liquid film. Assessing of the generated current between a pair of electrode is used as a measure of the film thickness. The liquid film is contained between two parallel surfaces that one of which is coated with a certain roughness, while the other is smooth. The electrical probes are placed on the smooth surface and the facing rough surface is removable allowing a free move of the wall. In this way, a rotational or a sliding motion is imposed on the rough wall allowing a browse of an entire surface relative to the electrode, in order to determine the influence of roughness on the film thickness measurements. In addition, series of signal acquisition were carried out with imposed pressures on the upper plate for the characterization of the effect of the film compression on the measured thicknesses. The principle of this electrochemical technique is briefly explained, as well as how the lateral distance between the electrodes impacts the measuring range limit. The experimental setup is described and used to study the liquid film flow with several configurations of the wall surface. The obtained results demonstrated the feasibility of this type of non-intrusive estimation, as it was possible to estimate the variable film thickness which is depending on the peaks and valleys of the rough surface. This is promising, because measuring this parameter remains difficult. Finally, the results analysis allows to synthesize the advantages and limitations of this method.

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Dissertations / Theses on the topic "Thin solid film measurement"

1

Hughes-Davies, T. T. "An X-ray reflectometer for the study of liquid surfaces." Thesis, University of Oxford, 1988. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.234985.

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Taplin, Stephen. "Measurement of thin oil films using fibre-optic interferometry." Thesis, University of Kent, 1996. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.360976.

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Ellgren, Alex. "Analysis of vortex movement in an YBCO thin film : Models of the vortex solid-to-liquid transition compared to a sensitive resistive measurement of a strongly pinned YBCO thin film." Thesis, KTH, Skolan för informations- och kommunikationsteknik (ICT), 2013. http://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-140589.

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When a high-temperature superconductor transitions in the presence of a magnetic field, the resistance does not immediately go to zero. Instead, the transition is smoothed by the resistive effects of moving vortices so that perfect conductivity isn't reached until several K below Tc, where the vortices have frozen into a glass state. The properties of this glass depend mainly on the amount and correlation between impurities in the superconductor. This report describes a study of the glass transition in an YBCO thin film rich in uncorrelated impurities. The aim was to use sensitive resistive measurements to determine which of two models of this transition, the vortex glass model and the vortex molasses model, is more accurate. After evaluation, both models are found lacking and a third model is put forth. This model, which resembles the normal distribution, excellently describes the YBCO thin film case. When the new model is tested against data from similar measurements, an YBCO single crystal and a TlBaCaCuO thin film, the results are mixed. Further study is suggested to determine the model's range of validity.

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Attrill, K. J. "Ellipsometric and photometric techniques for the measurement of the optical constants of thin films and surfaces." Thesis, University of Bradford, 1986. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.376351.

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Ismail, Bakar Bin. "Electrical conductivity measurements in evaporated cadmium telluride thin films." Thesis, Keele University, 1990. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.293964.

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Bozeat, Robert John. "Thin film optical waveguides on silicon." Thesis, University of Nottingham, 1993. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.320551.

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Gu, Erdan. "Studies in thin film systems and X-ray multilayer film design." Thesis, University of Aberdeen, 1992. http://digitool.abdn.ac.uk/R?func=search-advanced-go&find_code1=WSN&request1=AAIU547604.

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The design and optimization of soft X-ray multilayer film mirrors have been studied using optical theory. Our investigations show that the reflectivity of multilayer films is sensitive to their modulation wavelength and that their reflectivity can be improved by structural optimization. A new design method has been developed which can be used to increase the bandwidth and to change the shape of the reflectivity curves of multilayer film mirrors. Detailed studies of the formation and structure of practical vacuum deposited erbium(Er) thin film systems are presented. It was found that the phase and structure of these deposited films are strongly influenced by deposition conditions and film thickness. On the basis of these studies, very high purity low thicknesss erbium films (&'60 300 AA) with h.c.p. structure have be grown for the first time. The preferred orientation of crystallites and its dependence on deposition conditions in these erbium films are also investigated in detail. We have prepared Er/C multilayer films using the ultra high vacuum electron beam evaporation technique. The compositional periodic structure and intra-layer structure of these multilayer films have been studied using X-ray diffraction. The diffusion and short-range order formation occurring at the interfaces and within layers of C-Er thin-film systems and Er/C multilayer films were investigated by extended X-ray absorption fine structure technique (EXAFS).

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Pottage, John Mark. "Analysis of thin-film photonic crystal microstructures." Thesis, University of Bath, 2003. https://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.269994.

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9

Sugden, Stephen. "Thin film adhesion modification by MeV ions." Thesis, University of Surrey, 1991. http://epubs.surrey.ac.uk/843281/.

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The adhesion of a thin films, and in paiticular the way in which such adhesion may be improved by irradiation, is a rather poorly understood field of thin film technology. The radiation enhanced adhesion effect has been investigated through the use of Ultra High Vacuum sample preparation, analysis and irradiation techniques, in order to gain control over surface and interface composition. In the systems studied, films deposited on atomically clean surfaces show good adhesion, and no evidence of enhancement due to irradiation is observed in the case of such clean interfaces. The results are entirely consistent with the radiation enhanced adhesion phenomenon being due to radiolytic effects on contaminant containing layers at the film/substrate interface. In addition, on silicon substrates the observations highlight the superiority of thermal cleaning over low energy sputtering as a route for producing a clean surface. A model of the radiation enhanced adhesion observations for dirty interface systems is developed, which takes into account the two dimensional nature of the ion energy deposition process. All the observations on such systems are broadly consistent with an activation energy for the process of approximately 5eV. This value is sufficiently large to bring about chemical bonding rearrangement at the critical film/substrate interface.

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Beckel, Daniel. "Thin film cathodes for micro solid oxide fuel cells." kostenfrei, 2007. http://e-collection.ethbib.ethz.ch/view/eth:29741.

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Books on the topic "Thin solid film measurement"

1

Thin film magnetoresistive sensors. Bristol: Institute of Physics Pub., 2001.

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Hopkins, Vern. Development of solid film lubricants for use in space environments. [Washington, DC]: NASA Center for AeroSpace Information, 2000.

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Wasa, Kiyotaka. Thin film materials technology: Sputtering of compound materials. Norwich, N.Y: William Andrew Pub., 2004.

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Symposium on Thin Film Solid Ionic Devices and Materials (1995 Chicago, Ill.). Proceedings of the Symposium on Thin Film Solid Ionic Devices and Materials. Pennington, NJ: Electrochemical Society, 1996.

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5

Gu ti bo mo cai liao yu zhi bei ji shu: Thin solid film materials and preparation technology. Beijing: Ke xue chu ban she, 2008.

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6

Belzer, Barbara J. The results of an interlaboratory study of ellipsometric measurements of thin film silicon dioxide on silicon. Gaithersburg, MD: U.S. Dept. of Commerce, Technology Administration, National Institute of Standards and Technology, 1997.

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7

Zhang, Yafei. Multilayer Integrated Film Bulk Acoustic Resonators. Berlin, Heidelberg: Springer Berlin Heidelberg, 2013.

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8

Brotherton, S. D. Introduction to Thin Film Transistors: Physics and Technology of TFTs. Heidelberg: Springer International Publishing, 2013.

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9

Cook, M. Evaluation of newly formulated Dow Corning 321 dry film lubricant final test report. Brigham City, UT: Thiokol Corporation Space Operations, 1989.

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10

Hornung, H. G. Final report to NASA Ames Research Center, grant no. NAG 2-261 entitled skin friction measurement in complex flows using thin oil film techniques, 1 October 1989 - 31 October 1993. Pasadena, Calif: Graduate Aeronautical Laboratories, California Institute of Technology, 1994.

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Book chapters on the topic "Thin solid film measurement"

1

Fahsold, Gerhard, and Annemarie Pucci. "Non-contact Measurement of Thin-Film Conductivity by IR Spectroscopy." In Advances in Solid State Physics, 833–48. Berlin, Heidelberg: Springer Berlin Heidelberg, 2003. http://dx.doi.org/10.1007/978-3-540-44838-9_59.

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2

Lee, Sang Joo, Seung Woo Han, Jae Hyun Kim, and Hak Joo Lee. "Measurement of Mechanical Properties for Thin Film Using Visual Image Tracing Method." In Solid State Phenomena, 1701–4. Stafa: Trans Tech Publications Ltd., 2007. http://dx.doi.org/10.4028/3-908451-31-0.1701.

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Sharpe, William N. "Optical Measurement of Strain on Thin-film Polysilicon Tensile Specimens." In IUTAM Symposium on Advanced Optical Methods and Applications in Solid Mechanics, 137–44. Dordrecht: Springer Netherlands, 2000. http://dx.doi.org/10.1007/0-306-46948-0_15.

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Tomov, I., and S. Vassilev. "Thickness Measurement of Thin Textured Films by a Novel X-Ray Diffraction Method Accounting for Secondary Extinction." In Solid State Phenomena, 43–46. Stafa: Trans Tech Publications Ltd., 2007. http://dx.doi.org/10.4028/3-908451-40-x.43.

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Matthews, A., and K. Holmberg. "Measurement of Mechanical Properties of Thin Solid Films II: Friction and Wear." In Eurocourses: Mechanical and Materials Science, 295–312. Dordrecht: Springer Netherlands, 1992. http://dx.doi.org/10.1007/978-94-017-0631-5_13.

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Taube, Klaus H. "Measurement of Mechanical Properties of Thin Solid Films I: Hardness, Elasticity and Stress." In Eurocourses: Mechanical and Materials Science, 275–94. Dordrecht: Springer Netherlands, 1992. http://dx.doi.org/10.1007/978-94-017-0631-5_12.

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Müller, G. O. "Thin film electroluminescence." In Solid State Luminescence, 133–57. Dordrecht: Springer Netherlands, 1993. http://dx.doi.org/10.1007/978-94-011-1522-3_5.

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Mach, R. "Thin film electroluminescence devices." In Solid State Luminescence, 229–62. Dordrecht: Springer Netherlands, 1993. http://dx.doi.org/10.1007/978-94-011-1522-3_7.

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Mühlig, Christian. "Absorption and Fluorescence Measurements in Optical Coatings." In Optical Characterization of Thin Solid Films, 407–31. Cham: Springer International Publishing, 2018. http://dx.doi.org/10.1007/978-3-319-75325-6_15.

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Weppner, Werner. "Thin Film Solid State Ionic Gas Sensors." In Solid State Microbatteries, 395–405. Boston, MA: Springer US, 1990. http://dx.doi.org/10.1007/978-1-4899-2263-2_24.

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Conference papers on the topic "Thin solid film measurement"

1

Sreeja, V. G., and E. I. Anila. "Z-scan measurement for nonlinear absorption property of rGO/ZnO:Al thin film." In DAE SOLID STATE PHYSICS SYMPOSIUM 2017. Author(s), 2018. http://dx.doi.org/10.1063/1.5028841.

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Nakanishi, T., T. Kato, Y. Ichikawa, K. Suzuki, and H. Miura. "Measurement of the Strength at Grain Boundaries in Electroplated Copper Thin-Film Interconnections." In 2015 International Conference on Solid State Devices and Materials. The Japan Society of Applied Physics, 2015. http://dx.doi.org/10.7567/ssdm.2015.ps-2-17.

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Jin, X. H., B. H. Ma, T. Qiu, and J. J. Deng. "ITO thin film thermocouple for transient high temperature measurement in scramjet combustor." In 2017 19th International Conference on Solid-State Sensors, Actuators and Microsystems (TRANSDUCERS). IEEE, 2017. http://dx.doi.org/10.1109/transducers.2017.7994256.

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Suzuki, S., T. Suzuki, A. Bhaswara, and Y. Majima. "Displacement Current and Transfer Curve Simultaneous Measurement in Bottom-Contact Organic Thin-film Transistors." In 2009 International Conference on Solid State Devices and Materials. The Japan Society of Applied Physics, 2009. http://dx.doi.org/10.7567/ssdm.2009.f-5-4.

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Fujimura, Toru, Kei Takenaka, and Yasushi Goto. "A Silicon-Based Optical Thin-Film Biosensor Array for Real-time Measurement of Bio-molecular Interaction." In 2004 International Conference on Solid State Devices and Materials. The Japan Society of Applied Physics, 2004. http://dx.doi.org/10.7567/ssdm.2004.i-6-2.

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Chan, Yun-Pei, Ja-Hon Lin, Kuei-Huei Lin, and Wen-Feng Hsieh. "Z-scan Measurement of ZnO Thin Films Using the Ultraviolet femtosecond Pulses." In Advanced Solid-State Photonics. Washington, D.C.: OSA, 2008. http://dx.doi.org/10.1364/assp.2008.mc47.

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Yamaguchi, M., S. Yabukami, H. Yurugi, K. I. Arai, N. Masuda, N. Tamaki, and H. Tohya. "High Spatial Resolution Magnetic Field Measurements Using Thin-Film Shielded Loop Coil." In 1999 International Conference on Solid State Devices and Materials. The Japan Society of Applied Physics, 1999. http://dx.doi.org/10.7567/ssdm.1999.e-16-2.

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Li, C. J., and C. T. Li. "Measurement of Residual Stresses in Thin Films using Spiral Microstructures." In 2007 IEEE Conference on Electron Devices and Solid-State Circuits. IEEE, 2007. http://dx.doi.org/10.1109/edssc.2007.4450248.

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Roest, Aarnoud, Klaus Reimann, and Mareike Klee. "Accelerated lifetime measurements on thin film ferroelectric materials with a high dielectric constant." In ESSDERC 2007 - 37th European Solid State Device Research Conference. IEEE, 2007. http://dx.doi.org/10.1109/essderc.2007.4430963.

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Gunsel, Selda, Richard Wayte, and Hugh A. Spikes. "Measurement of the Viscosity of Thin Films of Lubricants on Solid Surfaces." In International Fuels & Lubricants Meeting & Exposition. 400 Commonwealth Drive, Warrendale, PA, United States: SAE International, 1991. http://dx.doi.org/10.4271/912412.

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Reports on the topic "Thin solid film measurement"

1

Kreider, Kenneth G. Thin film thermocouples for high temperature measurement. Gaithersburg, MD: National Institute of Standards and Technology, 1989. http://dx.doi.org/10.6028/nist.ir.89-4087.

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2

Goldman, D. S. Thin-film device for process measurement. Final report. Office of Scientific and Technical Information (OSTI), February 1996. http://dx.doi.org/10.2172/192445.

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Dr. Harlan U. Anderson. Microporous and Thin Film Membranes for Solid Oxide Fuel. Office of Scientific and Technical Information (OSTI), February 2007. http://dx.doi.org/10.2172/908515.

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Nguyen Minh and Kurt Montgomery. TAPE CALENDERING MANUFACTURING PROCESS FOR MULTILAYER THIN-FILM SOLID OXIDE FUEL CELLS. Office of Scientific and Technical Information (OSTI), October 2004. http://dx.doi.org/10.2172/835848.

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Jie Guan, Atul Verma, and Nguyen Minh. MATERIAL AND PROCESS DEVELOPMENT LEADING TO ECONOMICAL HIGH-PERFORMANCE THIN-FILM SOLID OXIDE FUEL CELLS. Office of Scientific and Technical Information (OSTI), April 2003. http://dx.doi.org/10.2172/822139.

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Jie Guan and Nguyen Minh. MATERIAL AND PROCESS DEVELOPMENT LEADING TO ECONOMICAL HIGH-PERFORMANCE THIN-FILM SOLID OXIDE FUEL CELLS. Office of Scientific and Technical Information (OSTI), October 2003. http://dx.doi.org/10.2172/822898.

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Jie Guan and Nguyen Minh. MATERIAL AND PROCESS DEVELOPMENT LEADING TO ECONOMICAL HIGH-PERFORMANCE THIN-FILM SOLID OXIDE FUEL CELLS. Office of Scientific and Technical Information (OSTI), December 2003. http://dx.doi.org/10.2172/822899.

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Lee, You-Kee, Jung-Yeul Kim, Young-Ki Lee, Insoo Kim, Hee-Soo Moon, Jong-Wan Park, Craig P. Jacobson, and Steven J. Visco. Conditioning effects on La1-xSrxMnO3-Yttria stabilized Zirconia electrodes for thin-film solid oxide fuel cells. Office of Scientific and Technical Information (OSTI), December 2002. http://dx.doi.org/10.2172/810538.

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Chow, R., G. E. Loomis, and P. Biltoft. Determining the refractive index of a {lambda}/4 thin film on a thick substrate from a transmittance measurement. Office of Scientific and Technical Information (OSTI), June 1993. http://dx.doi.org/10.2172/10181163.

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Garofalini, Stephen. Solid Electrolyte/Electrode Interfaces: Atomistic Behavior Analyzed Via UHV-AFM, Surface Spectroscopies, and Computer Simulations Computational and Experimental Studies of the Cathode/Electrolyte Interface in Oxide Thin Film Batteries. Office of Scientific and Technical Information (OSTI), March 2012. http://dx.doi.org/10.2172/1036745.

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