Log in

Relevant bibliographies by topics / Thin films / Journal articles

Journal articles on the topic 'Thin films'

To see the other types of publications on this topic, follow the link: Thin films.

Author: Grafiati

Published: 4 June 2021

Last updated: 31 July 2024

Create a spot-on reference in APA, MLA, Chicago, Harvard, and other styles

Select a source type:

Consult the top 50 journal articles for your research on the topic 'Thin films.'

Next to every source in the list of references, there is an 'Add to bibliography' button. Press on it, and we will generate automatically the bibliographic reference to the chosen work in the citation style you need: APA, MLA, Harvard, Chicago, Vancouver, etc.

You can also download the full text of the academic publication as pdf and read online its abstract whenever available in the metadata.

Browse journal articles on a wide variety of disciplines and organise your bibliography correctly.

1

Dixit, Chandra Kumar, and Mohd Tauqeer Mohd. Tauqeer. "Conductivity Studies of Multilayer Thin Films." International Journal of Scientific Research 2, no. 5 (June 1, 2012): 145–46. http://dx.doi.org/10.15373/22778179/may2013/51.

Full text

APA, Harvard, Vancouver, ISO, and other styles

2

Manickam, RM, H. Patthi, and V. Saaminathan. "B-8 EFFECT OF ULTRASONIC FIELD ON THE PROPERTIES OF ELECTRODEPOSITED NI-FE THIN FILMS(Session: Thin films)." Proceedings of the Asian Symposium on Materials and Processing 2006 (2006): 31. http://dx.doi.org/10.1299/jsmeasmp.2006.31.

Full text

APA, Harvard, Vancouver, ISO, and other styles

3

Verde, M. "EPD-deposited ZnO thin films: a review." Boletín de la Sociedad Española de Cerámica y Vidrio 53, no. 4 (August 30, 2014): 149–61. http://dx.doi.org/10.3989/cyv.192014.

Full text

APA, Harvard, Vancouver, ISO, and other styles

4

E. Camacho-espinosa, E. Camacho-espinosa, E. Rosendo E. Rosendo, A. I. Oliva A.I. Oliva, T. díaz T. díaz, N. Carlos-Ramírez N. Carlos-Ramírez, H. Juárez H. Juárez, G. García G. García, and M. Pacio M. Pacio. "Physical Properties of Sputtered Cdte thin Films." Indian Journal of Applied Research 4, no. 5 (October 1, 2011): 588–93. http://dx.doi.org/10.15373/2249555x/may2014/186.

Full text

APA, Harvard, Vancouver, ISO, and other styles

5

Zeynalova, A. O., S. P. Javadova, V. A. Majidzade, and A. Sh Aliyev. "ELECTROCHEMICAL SYNTHESIS OF IRON MONOSELENIDE THIN FILMS." Chemical Problems 19, no. 4 (2021): 262–71. http://dx.doi.org/10.32737/2221-8688-2021-4-262-271.

Full text

Abstract:

In the presented research work, the kinetics and mechanism of the deposition process of thin iron, selenium and Fe-Se films have been studied by recording a cyclic and linear polarization curves by potentiodynamic method using Pt and Ni electrodes. Individual and co-deposition potential areas of the components of the electrolyte on the Pt electrode were determined. In order to determine the optimal electrolysis mode and electrolyte composition, the effect of various factors (concentration of initial components, temperature, etc.) on the co-electrodeposition process of Fe-Se was studied. In addition, Fe-Se samples deposited on the surface of Ni electrodes were thermally treated at 4500C and studied by SEM and X-ray phase analysis methods. Elemental analysis of the films shows that they contain 42.2% Fe and 57.8% Se.

APA, Harvard, Vancouver, ISO, and other styles

6

Jafarova, S. F. "CO-ELECTRODEPOSITION OF THIN Mo-S FILMS." Azerbaijan Chemical Journal, no. 1 (March 12, 2020): 16–19. http://dx.doi.org/10.32737/0005-2531-2020-1-16-19.

Full text

APA, Harvard, Vancouver, ISO, and other styles

7

Men'shikova, S. I. "Size effects in thin n-PbTe films." Functional materials 22, no. 1 (April 20, 2015): 14–19. http://dx.doi.org/10.15407/fm22.01.014.

Full text

APA, Harvard, Vancouver, ISO, and other styles

8

Yunakova, O. N. "Exciton absorption spectrum of Cs4PbCl6 thin films." Functional materials 22, no. 2 (June 30, 2015): 175–80. http://dx.doi.org/10.15407/fm22.02.175.

Full text

APA, Harvard, Vancouver, ISO, and other styles

9

Osaka, Tetsuya, and Takayuki Homma. "Thin Films." Electrochemical Society Interface 4, no. 2 (June 1, 1995): 42–46. http://dx.doi.org/10.1149/2.f07952if.

Full text

APA, Harvard, Vancouver, ISO, and other styles

10

Brauman, J. I., and P. Szuromi. "Thin Films." Science 273, no. 5277 (August 16, 1996): 855–0. http://dx.doi.org/10.1126/science.273.5277.855.

Full text

APA, Harvard, Vancouver, ISO, and other styles

11

Česnek, J., J. Dobiáš, J. Houšová, and J. Sedláček. "Properties of thin metallic films for microwave susceptors." Czech Journal of Food Sciences 21, No. 1 (November 18, 2011): 34–40. http://dx.doi.org/10.17221/3475-cjfs.

Full text

Abstract:

Thin Al films of varying thickness, i.e. 3 to 30 nm, were deposited onto polyethylene-terephthalate film by evaporation in the vacuum of 3 × 10<sup>–3</sup> Pa. The dependence of DC (direct current) surface resistance on thickness was measured using a four-point method. The surface resistance exhibits the size effect in accordance with the Fuchs-Sondheimer theory. The microwave absorption properties of the prepared films of various metallization thickness were measured in a microwave field at the microwave power of 1.8 mW. The maximum microwave absorption at 2.45 GHz was found to occur in a layer of optical density of about 0.22.  

APA, Harvard, Vancouver, ISO, and other styles

12

Majidzade, V. A., S. F. Cafarova, A. Sh Aliyev, N. B. Farhatova, and D. B. Tagiyev. "ELECTROCHEMICAL DEPOSITION OF THIN SEMICONDUCTIVE Mo–S FILMS." Azerbaijan Chemical Journal, no. 1 (March 19, 2019): 6–13. http://dx.doi.org/10.32737/0005-2531-2019-1-6-13.

Full text

APA, Harvard, Vancouver, ISO, and other styles

13

MAHENDRA KUMAR, MAHENDRA KUMAR. "Cds/ Sno2 Thin Films for Solar Cell Applications." International Journal of Scientific Research 3, no. 3 (June 1, 2012): 322–23. http://dx.doi.org/10.15373/22778179/march2014/109.

Full text

APA, Harvard, Vancouver, ISO, and other styles

14

Guoying Yan, Guoying Yan, Guangsheng Fu Guangsheng Fu, Zilong Bai Zilong Bai, and Shufang Wang Shufang Wang. "Lateral photovoltaic ef fects in Bi2Sr2Co2Oy thin films." Chinese Optics Letters 11, no. 12 (2013): 123101–3. http://dx.doi.org/10.3788/col201311.123101.

Full text

APA, Harvard, Vancouver, ISO, and other styles

15

Rogacheva, E. I. "Structure of thermally evaporated bismuth selenide thin films." Functional materials 25, no. 3 (September 27, 2018): 516–24. http://dx.doi.org/10.15407/fm25.03.516.

Full text

APA, Harvard, Vancouver, ISO, and other styles

16

Elmeleegi, H. A., Z. S. Elmandouh, and F. Taher. "Carrier Type Reversal of Graphene Multilayered Thin Films." Ukrainian Journal of Physics 59, no. 4 (April 2014): 426–32. http://dx.doi.org/10.15407/ujpe59.04.0426.

Full text

APA, Harvard, Vancouver, ISO, and other styles

17

Boonyopakorn, Narong, Nitat Sripongpun, Chanchana Thanachayanont, Tanakorn Osotchan, and Somsak Dangtip. "B-7 EFFECTS OF NATURE OF SUBSTRATE ON MICROSTRUCTURE OF ITO AND TIO_2 THIN FILMS GROWN BY RF SPUTTERING(Session: Thin films)." Proceedings of the Asian Symposium on Materials and Processing 2006 (2006): 30. http://dx.doi.org/10.1299/jsmeasmp.2006.30.

Full text

APA, Harvard, Vancouver, ISO, and other styles

18

Prestipino, R. M., and B. K. Furman. "SIMS/TEM characterization of titanium thin films." Proceedings, annual meeting, Electron Microscopy Society of America 44 (August 1986): 590–91. http://dx.doi.org/10.1017/s0424820100144425.

Full text

Abstract:

Thin metal films are important constituents of semiconductor devices and packages. One metal of primary interest is titanium. It is known that titanium is susceptible to absorption of hydrogen at elevated temperatures and forms hydrides that can cause embrittlement and cracking. In this study secondary ion mass spectroscopy (SIMS) was used to study the absorption of hydrogen into titanium thin films as a function of processing conditions. SIMS/ion imaging provided information on hydrogen segregation and hydride formation. Transmission electron microscopy (TEM) was used to study the microstructure of the fi1ms.

APA, Harvard, Vancouver, ISO, and other styles

19

M. C. Rao, M. C. Rao. "Vacuum Evaporated MoO3 Thin Films for Gas Sensing Application." Indian Journal of Applied Research 3, no. 4 (October 1, 2011): 417–18. http://dx.doi.org/10.15373/2249555x/apr2013/137.

Full text

APA, Harvard, Vancouver, ISO, and other styles

20

M. C. Rao, M. C. Rao. "Vacuum Evaporated WO3 Thin Films For Gas Sensing Application." Indian Journal of Applied Research 3, no. 4 (October 1, 2011): 419–21. http://dx.doi.org/10.15373/2249555x/apr2013/138.

Full text

APA, Harvard, Vancouver, ISO, and other styles

21

Kawar, Shashank S. "Synthesis and Characterization of Nanocrystalline Chalcogenide Cus Thin Films." Indian Journal of Applied Research 4, no. 5 (October 1, 2011): 580–82. http://dx.doi.org/10.15373/2249555x/may2014/184.

Full text

APA, Harvard, Vancouver, ISO, and other styles

22

Sozanskyi, Martyn, Vitalii Stadnik, Pavlo Shapoval, Iosyp Yatchyshyn, Ruslana Guminilovych, and Stepan Shapoval. "Optimization of Synthesis Conditions of Mercury Selenide Thin Films." Chemistry & Chemical Technology 14, no. 3 (September 22, 2020): 290–96. http://dx.doi.org/10.23939/chcht14.03.290.

Full text

APA, Harvard, Vancouver, ISO, and other styles

23

Hongji Qi, Hongji Qi, Meiping Zhu Meiping Zhu, Weili Zhang Weili Zhang, Kui Yi Kui Yi, Hongbo He Hongbo He, and Jianda Shao Jianda Shao. "Dependence of wavefront errors on nonuniformity of thin films." Chinese Optics Letters 10, no. 1 (2012): 013104–13107. http://dx.doi.org/10.3788/col201210.013104.

Full text

APA, Harvard, Vancouver, ISO, and other styles

24

Kryuchyn, A. A. "High-speed optical recording in vitreous chalcogenide thin films." Semiconductor Physics Quantum Electronics and Optoelectronics 17, no. 4 (November 10, 2014): 389–93. http://dx.doi.org/10.15407/spqeo17.04.389.

Full text

APA, Harvard, Vancouver, ISO, and other styles

25

B. A. Ezekoye, B. A. Ezekoye, P. O. Offor P.O. Offor, V. A. Ezekoye V. A. Ezekoye, and F. I. Ezema F. I. Ezema. "Chemical Bath Deposition Technique of Thin Films: A Review." International Journal of Scientific Research 2, no. 8 (June 1, 2012): 452–56. http://dx.doi.org/10.15373/22778179/aug2013/149.

Full text

APA, Harvard, Vancouver, ISO, and other styles

26

Ugwu, Emmanuel Ifeanyi. "Perovskite Oxide Material Based Thin Films Prospect and Applicability." Nanomedicine & Nanotechnology Open Access 8, no. 3 (2023): 1. http://dx.doi.org/10.23880/nnoa-16000240.

Full text

Abstract:

In this current dispensation and quest for material thin film that exhibits ranges of applications in various areas due to its wide spectrum of attractive properties such ferroelectricity, piezoelectricity, ferromagnetism dielectric, magnotoresistance, multiferroic with high efficiency in solar energy conversion couple with the fact that some are good for passivation of layer of metals and then invariably minimizes metal corrosion

APA, Harvard, Vancouver, ISO, and other styles

27

Sugi, Michio. "Organic Thin Films." IEEJ Transactions on Fundamentals and Materials 113, no. 11 (1993): 728–35. http://dx.doi.org/10.1541/ieejfms1990.113.11_728.

Full text

APA, Harvard, Vancouver, ISO, and other styles

28

SHIOSAKI, Tadashi. "Piezoelectric Thin Films." Journal of the Ceramic Society of Japan 99, no. 1154 (1991): 836–41. http://dx.doi.org/10.2109/jcersj.99.836.

Full text

APA, Harvard, Vancouver, ISO, and other styles

29

Agulló-López, F., María Aguilar, and M. Carrascosa. "Photorefractive thin films." Pure and Applied Optics: Journal of the European Optical Society Part A 5, no. 5 (September 1996): 495–503. http://dx.doi.org/10.1088/0963-9659/5/5/004.

Full text

APA, Harvard, Vancouver, ISO, and other styles

30

Rowell, John. "Superior thin films." Nature Materials 1, no. 1 (September 2002): 5–6. http://dx.doi.org/10.1038/nmat713.

Full text

APA, Harvard, Vancouver, ISO, and other styles

31

Dietrich, S. "Thin liquid films." Physica Scripta T49B (January 1, 1993): 519–24. http://dx.doi.org/10.1088/0031-8949/1993/t49b/025.

Full text

APA, Harvard, Vancouver, ISO, and other styles

32

SUGI, Michio. "Organic thin films." Hyomen Kagaku 10, no. 10 (1989): 804–10. http://dx.doi.org/10.1380/jsssj.10.804.

Full text

APA, Harvard, Vancouver, ISO, and other styles

33

Lakhtakia, Akhlesh, and Russell Messier. "Sculptured Thin Films." Optics and Photonics News 12, no. 9 (September 1, 2001): 26. http://dx.doi.org/10.1364/opn.12.9.000026.

Full text

APA, Harvard, Vancouver, ISO, and other styles

34

Murata, Hideyuki, Tetsuo Tsutsui, and Shogo Saito. "Polyarylenevinylene thin films." Kobunshi 40, no. 3 (1991): 186–89. http://dx.doi.org/10.1295/kobunshi.40.186.

Full text

APA, Harvard, Vancouver, ISO, and other styles

35

Pagnia, H. "Carbonaceous thin films." Vacuum 39, no. 1 (January 1989): 3–5. http://dx.doi.org/10.1016/0042-207x(89)90083-3.

Full text

APA, Harvard, Vancouver, ISO, and other styles

36

Braides, A., and I. Fonseca. "Brittle Thin Films." Applied Mathematics and Optimization 44, no. 3 (January 1, 2001): 299–323. http://dx.doi.org/10.1007/s00245-001-0022-x.

Full text

APA, Harvard, Vancouver, ISO, and other styles

37

Moustakis, T. "Thin diamond films." Solid State Ionics 26, no. 2 (March 1988): 144. http://dx.doi.org/10.1016/0167-2738(88)90035-5.

Full text

APA, Harvard, Vancouver, ISO, and other styles

38

Cazabat, A. M., N. Fraysse, and F. Heslot. "Thin wetting films." Colloids and Surfaces 52 (January 1991): 1–8. http://dx.doi.org/10.1016/0166-6622(91)80002-6.

Full text

APA, Harvard, Vancouver, ISO, and other styles

39

Pleasants, Simon. "Measuring thin films." Nature Photonics 7, no. 7 (June 27, 2013): 505. http://dx.doi.org/10.1038/nphoton.2013.164.

Full text

APA, Harvard, Vancouver, ISO, and other styles

40

Cook, M. J. "Phthalocyanine thin films." Pure and Applied Chemistry 71, no. 11 (November 30, 1999): 2145–51. http://dx.doi.org/10.1351/pac199971112145.

Full text

APA, Harvard, Vancouver, ISO, and other styles

41

Tossell, David A., and Anil Patel. "Ferroelectric thin films." Advanced Materials 4, no. 12 (December 1992): 816–18. http://dx.doi.org/10.1002/adma.19920041212.

Full text

APA, Harvard, Vancouver, ISO, and other styles

42

Sattler, René. "Thin films polarize." PhotonicsViews 20, no. 1 (January 3, 2023): 61–63. http://dx.doi.org/10.1002/phvs.202300009.

Full text

APA, Harvard, Vancouver, ISO, and other styles

43

Helmich, Lars, Marianne Bartke, Niclas Teichert, Benjamin Schleicher, Sebastian Fähler, and Andreas Hütten. "Gadolinium thin films as benchmark for magneto-caloric thin films." AIP Advances 7, no. 5 (May 2017): 056429. http://dx.doi.org/10.1063/1.4977880.

Full text

APA, Harvard, Vancouver, ISO, and other styles

44

Szuromi, P. D. "CHEMISTRY: Thin Films from Thin Solutions." Science 298, no. 5592 (October 11, 2002): 325d—325. http://dx.doi.org/10.1126/science.298.5592.325d.

Full text

APA, Harvard, Vancouver, ISO, and other styles

45

Srikanth, Vadali V. S. S., P. Sampath Kumar, and Vijay Bhooshan Kumar. "A Brief Review on theIn SituSynthesis of Boron-Doped Diamond Thin Films." International Journal of Electrochemistry 2012 (2012): 1–7. http://dx.doi.org/10.1155/2012/218393.

Full text

Abstract:

Diamond thin films are well known for their unsurpassed physical and chemical properties. In the recent past, research interests in the synthesis of conductive diamond thin films, especially the boron-doped diamond (BDD) thin films, have risen up to cater to the requirements of electronic, biosensoric, and electrochemical applications. BDD thin films are obtained by substituting some of thesp3hybridized carbon atoms in the diamond lattice with boron atoms. Depending on diamond thin film synthesis conditions, boron doping routes, and further processing steps (if any), different types of BDD diamond thin films with application-specific properties can be obtained. This paper will review several important advances in the synthesis of boron-doped diamond thin films, especially those synthesized via gas phase manipulation.

APA, Harvard, Vancouver, ISO, and other styles

46

RODRÍGUEZ-LAZCANO, Y., M. T. S. NAIR, and P. K. NAIR. "CuxSbySz THIN FILMS PRODUCED BY ANNEALING CHEMICALLY DEPOSITED Sb2S3-CuS THIN FILMS." Modern Physics Letters B 15, no. 17n19 (August 20, 2001): 667–70. http://dx.doi.org/10.1142/s0217984901002257.

Full text

Abstract:

The possibility of generating ternary compounds through annealing thin film stacks of binary composition has been demonstrated before. In this work we report a method to produce large area coating of ternary compounds through a reaction in solid state between thin films of Sb2S3 and CuS. Thin films of Sb2S3 -CuS were deposited on glass substrates in the sequence of Sb2S3 followed by CuS (on Sb2S3 ) using chemical bath deposition method. The multilayer stack, thus produced, of approximately 0.5 μm in thickness, where annealed under nitrogen and argon atmospheres at different temperatures to produce films of ternary composition, CuxSbySz . An optical band gap of ~1.5 eV was observed in these films, suggesting that the thin films of ternary composition formed in this way are suitable for use as absorber materials in photovoltaic devices. The results on the analyses of structural, electrical and optical properties of films formed with different combinations of thickness in the multilayers will be discussed in the paper.

APA, Harvard, Vancouver, ISO, and other styles

47

Ghonge, S. G., E. Goo, R. Ramesh, R. Haakenaasen, and D. K. Fork. "Epitaxial ferroelectric thin films." Proceedings, annual meeting, Electron Microscopy Society of America 52 (1994): 572–73. http://dx.doi.org/10.1017/s0424820100170591.

Full text

Abstract:

Microstructure of epitaxial ferroelectric/conductive oxide heterostructures on LaAIO3(LAO) and Si substrates have been studied by conventional and high resolution transmission electron microscopy. The epitaxial films have a wide range of potential applications in areas such as non-volatile memory devices, electro-optic devices and pyroelectric detectors. For applications such as electro-optic devices the films must be single crystal and for applications such as nonvolatile memory devices and pyroelectric devices single crystal films will enhance the performance of the devices. The ferroelectric films studied are Pb(Zr0.2Ti0.8)O3(PLZT), PbTiO3(PT), BiTiO3(BT) and Pb0.9La0.1(Zr0.2Ti0.8)0.975O3(PLZT).Electrical contact to ferroelectric films is commonly made with metals such as Pt. Metals generally have a large difference in work function compared to the work function of the ferroelectric oxides. This results in a Schottky barrier at the interface and the interfacial space charge is believed to responsible for domain pinning and degradation in the ferroelectric properties resulting in phenomenon such as fatigue.

APA, Harvard, Vancouver, ISO, and other styles

48

Elizondo-Villarreal, Nora, Rubén O. Torres-Barrera, Rodrigo Arriaga-Garza, Luz-Hypatia Verástegui-Domínguez, Rodolfo Corté, and Víctor M. Castaño. "Ag Thin Films from Pelargonium Zonale Leaves via Green Chemistry." Chemistry & Chemical Technology 17, no. 1 (March 26, 2023): 133–40. http://dx.doi.org/10.23939/chcht17.01.133.

Full text

Abstract:

Ag thin films were successfully produced via a green chemistry method from silver nanoparticles (AgNPs) obtained from reacting an extract of Pelargonium Zonale leaves with silver nitrate. The ions of silver nitrate were reduced to silver atoms by reducing stabilizer-capping compounds contained in the extract of Pelargonium Zonale leaves. The obtained atoms nucleate in small clusters that grew into nanoparticles and finally, they formed a homogeneous silver thin film on a glass substrate. The nanostructured thin films obtained were characterized by profilometry, X Ray Diffraction, Atomic Force Electronic Microscopy, UV-Vis, and Transmission Electron Microscopy.

APA, Harvard, Vancouver, ISO, and other styles

49

Jouan, Pierre Yves, Arnaud Tricoteaux, and Nicolas Horny. "Elaboration of nitride thin films by reactive sputtering." Rem: Revista Escola de Minas 59, no. 2 (June 2006): 225–32. http://dx.doi.org/10.1590/s0370-44672006000200013.

Full text

Abstract:

The aim of this paper is first a better understanding of DC reactive magnetron sputtering and its implications, such as the hysteresis effect and the process instability. In a second part, this article is devoted to an example of specific application: Aluminium Nitride. AlN thin films have been deposited by reactive triode sputtering. We have studied the effect of the nitrogen contents in the discharge and the RF bias voltage on the growth of AlN films on Si(100) deposited by triode sputtering. Stoichiometry and crystal orientation of AlN films have been characterized by means of Fourier-transform infrared spectroscopy, X-ray diffraction and secondary electron microscopy. Dense and transparent AlN layers were obtained at high deposition rates. These films have a (002) orientation whatever the nitrogen content in the discharge, but the best crystallised ones are obtained at low value (10%). A linear relationship was observed between the AlN lattice parameter "c" (perpendicular to the substrate surface) and the in-plane compressive stress. Applying an RF bias to the substrate leads to a (100) texture, and films become amorphous. Moreover, the film's compressive stress increases up to a value of 8GPa before decreasing slowly as the bias voltage increases.

APA, Harvard, Vancouver, ISO, and other styles

50

Rathee, Kanta, and B. P. Malik B P Malik. "Synthesis and Characterisation of Ta2o5 Thin Films For Microelectronics Application." Indian Journal of Applied Research 3, no. 6 (October 1, 2011): 486–88. http://dx.doi.org/10.15373/2249555x/june2013/161.

Full text

APA, Harvard, Vancouver, ISO, and other styles

We offer discounts on all premium plans for authors whose works are included in thematic literature selections. Contact us to get a unique promo code!