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Journal articles on the topic 'Thin films – Analysis'

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Published: 4 June 2021

Last updated: 1 February 2022

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1

Peng, J., V. Ji, W. Seiler, A. Levsque, A. Bouteville, and C. Braham. "OS04W0010 GIXRD residual stress analysis on CVD Tantalum thin films." Abstracts of ATEM : International Conference on Advanced Technology in Experimental Mechanics : Asian Conference on Experimental Mechanics 2003.2 (2003): _OS04W0010. http://dx.doi.org/10.1299/jsmeatem.2003.2._os04w0010.

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2

Serizawa, Kazufumi, Keisuke Tanaka, Yoshiaki Akiniwa, and Hirohisa Kimachi. "OS06W0448 Finite element analysis of elastic properties of textured thin films." Abstracts of ATEM : International Conference on Advanced Technology in Experimental Mechanics : Asian Conference on Experimental Mechanics 2003.2 (2003): _OS06W0448. http://dx.doi.org/10.1299/jsmeatem.2003.2._os06w0448.

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3

Kobayashi, T., S. Takamiya, T. Fukui, and H. Kanematsu. "ICONE19-43421 Nuclear reaction analysis for composition measurement of BN thin films." Proceedings of the International Conference on Nuclear Engineering (ICONE) 2011.19 (2011): _ICONE1943. http://dx.doi.org/10.1299/jsmeicone.2011.19._icone1943_174.

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4

ZORGATI, HAMDI. "MODELING THIN CURVED FERROMAGNETIC FILMS." Analysis and Applications 03, no. 04 (October 2005): 373–96. http://dx.doi.org/10.1142/s0219530505000637.

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The behavior of a thin film made of a ferromagnetic material in the absence of an external magnetic field is described by an energy depending on the magnetization of the film verifying the saturation constraint. The free energy consists of an induced magnetostatic energy and an energy term with density including the exchange energy and the anisotropic energy. We study the behavior of this energy when the thickness of the curved film goes to zero. We show that the minimizers of the free energy converge to the minimizers of a local energy depending on a two-dimensional magnetization by Γ-convergence arguments.

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5

Gaudiello, Antonio, and Rejeb Hadiji. "Junction of ferromagnetic thin films." Calculus of Variations and Partial Differential Equations 39, no. 3-4 (March 30, 2010): 593–619. http://dx.doi.org/10.1007/s00526-010-0327-1.

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6

Rani.S, Rani S., and Shanthi J. Shanthi.J. "XPS,EDAX and FT-IR Analysis of Annealed Electron Beam Evaporated Cdse Thin Films." International Journal of Scientific Research 3, no. 3 (June 1, 2012): 320–21. http://dx.doi.org/10.15373/22778179/march2014/108.

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7

Carbone, Luciano, Khaled Chacouche, and Antonio Gaudiello. "Fin junction of ferroelectric thin films." Advances in Calculus of Variations 11, no. 4 (October 1, 2018): 341–71. http://dx.doi.org/10.1515/acv-2016-0047.

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AbstractIn this paper, starting from a non-convex and nonlocal 3D-variational model for the electric polarization in a ferroelectric material, and using an asymptotic process based on dimensional reduction, we analyze junction phenomena for two orthogonal joined ferroelectric thin films. We obtain three different 2D-variational models for joined thin films, depending on how the reduction happens. Indeed, a memory effect of the reduction process appears, and it depends on the competition of the relative thickness of the two films. The guide parameter is the limit of the ratio between these two small thickness.

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8

Price, C. W., and E. F. Lindsey. "Analysis of electroless nickel thin films." Proceedings, annual meeting, Electron Microscopy Society of America 49 (August 1991): 510–11. http://dx.doi.org/10.1017/s0424820100086854.

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Thickness measurements of thin films are performed by both energy-dispersive x-ray spectroscopy (EDS) and x-ray fluorescence (XRF). XRF can measure thicker films than EDS, and XRF measurements also have somewhat greater precision than EDS measurements. However, small components with curved or irregular shapes that are used for various applications in the the Inertial Confinement Fusion program at LLNL present geometrical problems that are not conducive to XRF analyses but may have only a minimal effect on EDS analyses. This work describes the development of an EDS technique to measure the thickness of electroless nickel deposits on gold substrates. Although elaborate correction techniques have been developed for thin-film measurements by x-ray analysis, the thickness of electroless nickel films can be dependent on the plating bath used. Therefore, standard calibration curves were established by correlating EDS data with thickness measurements that were obtained by contact profilometry.

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9

KUROSAKI, Kazuo. "Surface analysis of organic thin films." Journal of the Metal Finishing Society of Japan 36, no. 12 (1985): 520–27. http://dx.doi.org/10.4139/sfj1950.36.520.

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10

NOMAKI, TATSUO, AKIKO YAMANAKA, and KATSUYUKI NAITO. "THERMAL ANALYSIS OF ORGANIC THIN FILMS." Analytical Sciences 7, Supple (1991): 1287–88. http://dx.doi.org/10.2116/analsci.7.supple_1287.

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11

Barradas, N. P., E. Alves, C. M. Ruiz, E. Diéguez, F. Dimroth, M. A. Chenot, and A. Bett. "RBS analysis of AlGaSb thin films." Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 219-220 (June 2004): 928–32. http://dx.doi.org/10.1016/j.nimb.2004.01.190.

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12

Hornbuckle, BC, K. Torres, R. Morris, and G. Thompson. "Microstructural Analysis of Fe35Pt49Cu16 Thin Films." Microscopy and Microanalysis 15, S2 (July 2009): 1296–97. http://dx.doi.org/10.1017/s1431927609099346.

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13

Tsukada, Ichiro, Masafumi Hanawa, Seiki Komiya, Ataru Ichinose, Takanori Akiike, Yoshinori Imai, and Atsutaka Maeda. "Mobility Analysis of FeTe Thin Films." Journal of the Physical Society of Japan 80, no. 2 (February 15, 2011): 023712. http://dx.doi.org/10.1143/jpsj.80.023712.

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14

Petkov, K., V. Krastev, and Ts Marinova. "XPS analysis of thin chromium films." Surface and Interface Analysis 18, no. 7 (July 1992): 487–90. http://dx.doi.org/10.1002/sia.740180705.

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15

Dudenas, P., A. Kusoglu, A. Hexemer, and A. Z. Weber. "GISAXS Analysis for Ionomer Thin Films." ECS Transactions 75, no. 14 (September 23, 2016): 643–50. http://dx.doi.org/10.1149/07514.0643ecst.

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16

Kamminga, J. D., M. Leoni, L. J. Seijbel, U. Welzel, P. Lamparter, and E. J. Mittemeijer. "Residual Stress Analysis of Thin Films." Acta Crystallographica Section A Foundations of Crystallography 56, s1 (August 25, 2000): s135. http://dx.doi.org/10.1107/s0108767300023291.

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17

Djerdj, I., And M. Tonejc, Ant Tonejc, and N. Radic. "XRD analysis of tungsten thin films." Acta Crystallographica Section A Foundations of Crystallography 60, a1 (August 26, 2004): s242. http://dx.doi.org/10.1107/s0108767304095200.

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18

Ohlídal, I., E. Schmidt, M. Líbezný, V. Tvarožek, and I. Novotný. "Ellipsometric analysis of thin NiCr films." Thin Solid Films 169, no. 2 (February 1989): 213–22. http://dx.doi.org/10.1016/0040-6090(89)90703-7.

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19

Przybylski, M., J. Korecki, and U. Gradmann. "CEMS analysis of Fe thin films." Hyperfine Interactions 57, no. 1-4 (July 1990): 2053–59. http://dx.doi.org/10.1007/bf02405763.

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20

Sofield, CJ, and JA Cookson. "Ion beam analysis of thin films." Vacuum 35, no. 10-11 (October 1985): 513. http://dx.doi.org/10.1016/0042-207x(85)90386-0.

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21

Neelmeijer, C., and G. Sobe. "Hydrogen analysis in CrSiO thin films." Journal of Radioanalytical and Nuclear Chemistry Letters 175, no. 5 (May 1993): 389–92. http://dx.doi.org/10.1007/bf02164041.

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22

Kaufmann, M., M. Mantler, and F. Weber. "Analysis of Thin Films and Multi-Layer Thin Films containing Light Elements by XRF." Advances in X-ray Analysis 39 (1995): 701–6. http://dx.doi.org/10.1154/s0376030800023144.

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Analysis of multi-layer thin films by XRF, using the fundamental parameter method, is a common and accurate method to determine thicknesses and chemical structure, as long as the films contain no hght elements. As an attempt to further extend the method, we present experimental results from single layer films made of carbon and silicon nitride with thicknesses ranging from 100 Å to 1000 Å, from single layer films of cobalt and oxygen matrices with varying oxygen concentration, and from complex multi-layer structures made of a combination of palladium, copper and carbon. The experimental data show a significant deviation from the results computed by the standard fundamental parameter method.

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23

Kurzke, Matthias. "Boundary vortices in thin magnetic films." Calculus of Variations and Partial Differential Equations 26, no. 1 (January 9, 2006): 1–28. http://dx.doi.org/10.1007/s00526-005-0331-z.

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24

MoberlyChan, Warren, R. Kilaas, L.-H. Chan, T. Nolan, P. Dorsey, W. Cao, M. Lu, M. Gopal, and T. Yamashita. "Computer Analysis of Electron Diffraction From thin Films." Microscopy and Microanalysis 4, S2 (July 1998): 344–45. http://dx.doi.org/10.1017/s143192760002184x.

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As engineering properties are miniaturized by mo thinner films, crystallographic analyses become more appropriate by electron diffraction than XRD. Without synchrotron sources, XRD scans of such films often expose one peak at best. However, these thinner films become more suited for TEM, with less artifacts from sample preparation. XRD scans with peaks in the noise are quantitatively accepted, while vast differences in electron diffraction patterns remain unquantified. Digital recording of TEM information removes the uncertain hand waving of the darkroom; and fast, user-friendly computer processing especially removes the nonstatistical art in image analysis. This work inputs 16-bit (>65,000 gray levels) images of ring diffraction patterns into Digital Micrograph and utilizes a Rotation Average subroutine (1) to plot peak intensities.Information storage in a hard drive utilizes sputtered thin films of HCP-Co-alloys with magnetic bits tied to the crystallographic orientation of each grain. Longitudinal-recording density and signal-to-noise can be enhanced for thin films with c-axes of all grains in plane.

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25

Vyas, Ritesh N., and Bin Wang. "Electrochemical Analysis of Conducting Polymer Thin Films." International Journal of Molecular Sciences 11, no. 4 (April 26, 2010): 1956–72. http://dx.doi.org/10.3390/ijms11041956.

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26

Walcarius, Alain, and Alexander Kuhn. "Ordered porous thin films in electrochemical analysis." TrAC Trends in Analytical Chemistry 27, no. 7 (July 2008): 593–603. http://dx.doi.org/10.1016/j.trac.2008.03.011.

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27

Watamori, Michio, Motoshi Isono, Hiroyuki Madono, Yuichi Kawano, Kaoru Sasabe, Takashi Hirao, and Kenjiro Oura. "Ion beam analysis of PZT thin films." Applied Surface Science 142, no. 1-4 (April 1999): 422–27. http://dx.doi.org/10.1016/s0169-4332(98)00681-3.

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28

Simpson, J. C. B., L. G. Earwaker, and M. N. Khan. "Nuclear analysis of zirconium nitride thin films." Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 24-25 (April 1987): 701–4. http://dx.doi.org/10.1016/s0168-583x(87)80229-x.

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29

Zelaya-Angel, O. "Electrocoloration curve analysis in WO3 thin films." Materials Science and Engineering: B 86, no. 2 (September 2001): 123–27. http://dx.doi.org/10.1016/s0921-5107(01)00669-9.

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30

Lin, Ying, Haibo Yang, Miao Liu, and Ge Zhang. "Impedance spectroscopy analysis of Bi0.85Pr0.15Fe0.9Co0.1O3 thin films." Materials Research Bulletin 51 (March 2014): 44–48. http://dx.doi.org/10.1016/j.materresbull.2013.11.054.

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31

Kashin, G. N., V. I. Makhnjuk, S. M. Rumjantseva, and Ju M. Shchekochihin. "AES analysis of barium fluoride thin films." Applied Surface Science 70-71 (June 1993): 85–88. http://dx.doi.org/10.1016/0169-4332(93)90403-x.

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32

Koblischka-Veneva, A., M. R. Koblischka, C. L. Teng, M. P. Ryan, U. Hartmann, and F. Mücklich. "EBSD analysis of electroplated magnetite thin films." Journal of Magnetism and Magnetic Materials 322, no. 9-12 (May 2010): 1235–38. http://dx.doi.org/10.1016/j.jmmm.2009.03.028.

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33

Graça, M. P. F., M. Saraiva, F. N. A. Freire, M. A. Valente, and L. C. Costa. "Electrical analysis of niobium oxide thin films." Thin Solid Films 585 (June 2015): 95–99. http://dx.doi.org/10.1016/j.tsf.2015.02.047.

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34

Sridhar, N., J. M. Rickman, and D. J. Srolovitz. "Twinning in thin films—I. Elastic analysis." Acta Materialia 44, no. 10 (October 1996): 4085–96. http://dx.doi.org/10.1016/s1359-6454(96)00058-4.

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35

HANEDA, Yoko, Kiyotaka WASA, Toshifumi SATOH, Hideaki ADACHI, and Kentaro SETUNE. "Structure Analysis of Sputtered PbTiO3 Thin Films." Hyomen Kagaku 18, no. 8 (1997): 454–59. http://dx.doi.org/10.1380/jsssj.18.454.

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36

Mayer, M. "Ion beam analysis of rough thin films." Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 194, no. 2 (August 2002): 177–86. http://dx.doi.org/10.1016/s0168-583x(02)00689-4.

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37

Mansoor, Saad Bin, and Bekir Sami Yilbas. "Entropy analysis for thermally disturbed thin films." International Journal of Exergy 30, no. 1 (2019): 86. http://dx.doi.org/10.1504/ijex.2019.10022493.

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38

Mansoor, Saad Bin, and Bekir Sami Yilbas. "Entropy analysis for thermally disturbed thin films." International Journal of Exergy 30, no. 1 (2019): 86. http://dx.doi.org/10.1504/ijex.2019.101627.

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39

Joo, Han-Yong, Hyeong Joon Kim, Sang June Kim, and Sang Youl Kim. "Spectrophotometric analysis of aluminum nitride thin films." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 17, no. 3 (May 1999): 862–70. http://dx.doi.org/10.1116/1.582035.

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40

Manciu, Felicia S., Jose L. Enriquez, William G. Durrer, Young Yun, Chintalapalle V. Ramana, and Satya K. Gullapalli. "Spectroscopic analysis of tungsten oxide thin films." Journal of Materials Research 25, no. 12 (December 2010): 2401–6. http://dx.doi.org/10.1557/jmr.2010.0294.

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We present a detailed study of the morphology and composition of tungsten oxide (WO3) thin films, grown by radio frequency magnetron reactive sputtering at substrate temperatures varied from room temperature (RT) to 500 °C, using infrared (IR) absorption, Raman spectroscopy, and x-ray photoelectron spectroscopy (XPS). This work includes valuable new far-IR results about structural changes in microcrystalline WO3. Both IR absorption and Raman techniques reveal an amorphous sample grown at RT and initial crystallization into monoclinic structures for samples grown at temperatures between 100 and 300 °C. The Raman spectra of the samples grown at high temperatures indicate, apart from the monoclinic structure, a strain effect, with a distribution revealed by confocal Raman mapping. XPS indicates that the film surface maintains the stoichiometry WOx, with a value of x slightly greater than 3 at RT due to oxygen contamination, which decreases with increasing temperature.

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41

Katsuragawa, Tadao, Eriko Chiba, Kenji Okada, Katsuhiko Tani, and Hidenori Tomono. "Surface Structure Analysis of Polyacrylate Thin Films." Japanese Journal of Applied Physics 34, Part 1, No. 2A (February 15, 1995): 649–54. http://dx.doi.org/10.1143/jjap.34.649.

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42

Yogaraksa, Teguh, Muhammad Hikam, and Irzaman. "Rietveld analysis of ferroelectric PbZr0.525Ti0.475O3 thin films." Ceramics International 30, no. 7 (January 2004): 1483–85. http://dx.doi.org/10.1016/j.ceramint.2003.12.144.

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43

Plass, M. F., W. Fukarek, Andreas Kolitsch, and W. Möller. "Infrared Analysis of Boron Nitride Thin Films." Materials Science Forum 287-288 (August 1998): 269–70. http://dx.doi.org/10.4028/www.scientific.net/msf.287-288.269.

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44

Parshall, Elaine R., and Mark Cronin-Golomb. "Phase-conjugate interferometric analysis of thin films." Applied Optics 30, no. 34 (December 1, 1991): 5090. http://dx.doi.org/10.1364/ao.30.005090.

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45

Windisch, Charles F., and Gregory J. Exarhos. "Mott–Schottky analysis of thin ZnO films." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 18, no. 4 (July 2000): 1677–80. http://dx.doi.org/10.1116/1.582406.

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46

CAMUS, P. P., R. D. SHULL, and A. J. MELMED. "APFIM ANALYSIS OF COMPOSITE MAGNETIC THIN FILMS." Le Journal de Physique Colloques 50, no. C8 (November 1989): C8–343—C8–347. http://dx.doi.org/10.1051/jphyscol:1989858.

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47

Berg, Dominik M., Rabie Djemour, Levent Gütay, Susanne Siebentritt, Phillip J. Dale, Xavier Fontane, Victor Izquierdo-Roca, and Alejandro Pérez-Rodriguez. "Raman analysis of monoclinic Cu2SnS3 thin films." Applied Physics Letters 100, no. 19 (May 7, 2012): 192103. http://dx.doi.org/10.1063/1.4712623.

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48

Müller, K. H. "Elemental analysis of surfaces and thin films." Thin Solid Films 174 (July 1989): 117–32. http://dx.doi.org/10.1016/0040-6090(89)90879-1.

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49

Hou, Xiuyi, Ryota Takahashi, Takahisa Yamamoto, and Mikk Lippmaa. "Microstructure analysis of IrO 2 thin films." Journal of Crystal Growth 462 (March 2017): 24–28. http://dx.doi.org/10.1016/j.jcrysgro.2016.12.104.

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50

Šetrajčić, J. P., and M. Pantić. "Contribution to thermodynamic analysis of thin films." Physics Letters A 192, no. 2-4 (September 1994): 292–94. http://dx.doi.org/10.1016/0375-9601(94)90261-5.

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